JP2000301089A - Method and device for treating planar workpiece - Google Patents

Abstract

PROBLEM TO BE SOLVED: To obtain a simple and inexpensive treating means capable of continuously executing in turn the finish polishing treatment for improving the roughness of a planar workpiece and later washing treatment and drying treatment in one line. SOLUTION: The treating device is constituted of a scrub polishing part 2 for improving the roughness of the surface by slidingly scrapping and polishing the surface of the planar workpiece in the polishing soln. containing a polishing agent, a scrub washing part 3 for washing the workpiece subjected to the scrub polishing with a slidingly scrapping brush in the washing soln., a finish washing part 4 for subjecting the workpiece subjected to the scrub polishing by immersing in a rinsing soln. and a drying part 5 for subjecting the workpiece subjected to the finish washing to the drying treatment.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a processing apparatus for sequentially and sequentially performing a polishing process, a cleaning process, and a drying process for improving roughness on a plate-like work such as a magnetic disk substrate. Things.

[0002]

2. Description of the Related Art In general, as a substrate for forming a magnetic disk for a computer, a substrate made of aluminum, glass or ceramic is used. These substrates are precisely polished over a plurality of stages using a plurality of polishing apparatuses having different polishing precisions, and then sequentially subjected to a cleaning process and a drying process, and then a recording magnetic layer is formed on the surfaces. Like that.
Specifically, there are many cases in which polishing is performed in multiple stages, such as primary and secondary, at the end of the polishing process, and then the cleaning process is performed. However, depending on the type of substrate, fine polishing is further performed to perform surface polishing. In many cases, it is necessary to increase the level.

[0003] In such a case, the precision polishing may be performed using a polishing apparatus having a necessary polishing precision. However, a polishing apparatus having a high polishing precision is usually very complicated, large-sized and expensive. Therefore, it is not preferable in terms of cost and space to further install such a polishing apparatus in the processing line. Moreover, it is often difficult to combine the large-size polishing apparatus with the small-sized cleaning apparatus and the drying apparatus to make the processing steps into a line because of the installation conditions thereof.

On the other hand, a work that exposes a solid active surface by polishing tends to adsorb peripheral abrasives, a polishing liquid, foreign matter, and the like in a short time. It is difficult to remove foreign matter and the like. These remaining foreign substances and the like form projections on the surface of the work, and consequently deteriorate the surface roughness of the work. Therefore, it is important to perform cleaning as soon as possible after polishing is completed.

[0005]

The main technical problem of the present invention is that a finish polishing process for improving the roughness of a plate-like work, a subsequent cleaning process and a drying process are successively performed in one line. An object of the present invention is to provide a simple and inexpensive processing means that can be performed efficiently and efficiently. Another technical object of the present invention is to provide a work processing means provided with a polishing means capable of polishing a work with high accuracy by a simple mechanism.

[0006]

According to the present invention, a plate-shaped work is immersed in a polishing liquid containing an abrasive contained in a processing tank, and the above-mentioned object is solved in the polishing liquid. A scrubbing step of rubbing and polishing the surface of the work with a rotating rubbing brush to improve the surface roughness; immersing the scrubbed work in a cleaning liquid, and rubbing the surface of the work in the cleaning liquid; A scrub cleaning step of cleaning by rubbing with a substrate; a finish cleaning step of finish cleaning the scrub-cleaned work; a drying step of drying the finish-cleaned work; Is provided.

[0007] According to the above-mentioned processing method, not only a polishing process for improving the roughness of a workpiece by a simple scrub means can be performed without using a large-sized and expensive polishing device having a complicated structure, Subsequently, the cleaning and drying of the workpiece can be performed sequentially and efficiently in a simple processing line.

In the scrub polishing step,
Since the work is rubbed with the brush in a state of being immersed in the polishing liquid, the abrasive is reliably and uniformly supplied to the brush, and the work is polished efficiently and with high precision. In addition, since the brush is automatically dressed by being immersed in the polishing liquid and rotated, there is an advantage that clogging by abrasive grains is not easily generated and dirt is hardly adhered.

In a specific embodiment of the present invention, in the scrub polishing step, the workpiece is immersed in a polishing liquid continuously flowing from one direction to the other direction in a direction parallel to the liquid flow, and Work is polished in the flow of.

In this case, it is preferable that one half of the work is sandwiched between two circular rubbing brushes for polishing. More preferably, the rubbing brush is provided at least on both sides in the diameter direction of the work. Two halves of the work are simultaneously held by the rubbing brush on one side and the rubbing brush on the other side, and the rubbing brushes on both sides are rotated in the same direction. Polishing is performed while supporting the work in a suspended state in the liquid by the rubbing force of the rubbing brush.

According to the latter method, since the work is supported only by the rubbing brush during polishing, not only the support means for rotatably supporting the work becomes unnecessary, but also the outer periphery of the work due to contact with the support means. There is no risk of damage to the workpiece, and a strong surface pressure can be applied to the workpiece by the rubbing brush, so that the polishing efficiency can be improved.

Further, according to the present invention, in order to carry out the above method, a processing tank for containing a polishing liquid containing an abrasive,
A rubbing brush for improving the surface roughness by rubbing and polishing a plate-like work immersed in a polishing liquid in the processing tank in the processing tank; and a rotation driving means for forcibly rotating the rubbing brush. A scrub polishing unit having: a treatment tank for containing a cleaning liquid, a plurality of rotatable rubbing brushes for cleaning the workpiece immersed in the cleaning liquid by sandwiching the workpiece from both sides, and rotating the rubbing brush A scrub cleaning unit having a rotation driving unit for performing the cleaning; a finish cleaning unit for finish-cleaning the scrub-cleaned work with a rinsing liquid; a drying unit for drying and processing the finished-washed work; A processing device characterized by having a mechanism;

According to a specific embodiment of the present invention, the processing tank in the scrub polishing section is a flow-type processing tank in which a polishing liquid continuously flows from one direction to another direction.
The workpiece is polished in the flow of the polishing liquid.

[0014] In this case, preferably, the scrub polisher is provided with at least two scrubbers mounted side by side on a brush shaft.
The present invention has a configuration in which a plurality of rubbing brushes are provided, and one half of the work is sandwiched between the rubbing brushes for polishing. More preferably, two brush shafts to which the rubbing brushes are attached are opposed to each other so as to be able to individually change the rotation direction at intervals in the diameter direction of the work, and the rubbing brushes on the two brush shafts are used for the work. The left and right halves are simultaneously sandwiched and polished.

The above-mentioned rubbing brush has a plurality of raised portions sliding on the surface of the work in a compressed state, and the positions of the raised portions are shifted between adjacent rubbing brushes so as not to contact each other. Some are preferably used. In this case, it is desirable that the protruding portion is formed radially.

As another example of the above-mentioned rubbing brush, there is a brush provided with short fibers on both sides in sliding contact with the surface of a work.

According to a preferred specific embodiment of the present invention, the processing apparatus has a carrier capable of accommodating a plurality of workpieces side by side, and transports the plurality of workpieces accommodated in the carrier together with the carrier. It is configured to process at the same time. In this case, preferably, the transfer mechanism includes a swing arm that is swingable at a fixed angle around a support shaft, and a suspension member provided so as to always vertically support the carrier at the tip of the swing arm. It is comprised so that it may have.

Further, the processing tank in the scrub cleaning section is also a flow-type processing tank in which the cleaning liquid continuously flows from one direction to the other direction, and is configured to wash the work in the flow of the cleaning liquid. It is desirable.

[0019]

FIG. 1 conceptually shows an example of the overall configuration of a processing apparatus according to the present invention. The processing apparatus includes a loader unit 1 for supplying a flat work,
The work is immersed in a polishing liquid containing an abrasive, and the surface of the work is rubbed and rubbed with a rubbing brush in the polishing liquid to improve the surface roughness by scrubbing, and scrub polished. A scrub cleaning unit 3 for immersing the work in a cleaning liquid and rubbing the surface of the work in the polishing liquid by rubbing the surface with a rubbing brush, and immersing the scrub-cleaned work in a rinsing liquid for finish cleaning. It has a finish cleaning section 4, a drying section 5 for drying the finished cleaned work, and an unloader section 6 for taking out the processed work. Transfer mechanisms 7a to 7 for transferring a work between
e is provided.

The work may be a flat plate having a circular, rectangular or other shape, such as an aluminum substrate, a glass substrate, or a ceramic substrate for a magnetic disk, or other electronic / electrical or mechanical parts. However, in this embodiment, as shown in FIGS. 2 and 3, a disk-shaped workpiece W is to be processed. A plurality of the works W are accommodated side by side in one carrier 8 and are simultaneously processed in the processing units 2 to 5 while conveying the works W together with the carrier 8.

The carrier 8 has a plurality of (four in the figure) work support rods 11 arranged side by side mounted between a pair of opposing frames 10 and 10 at fixed intervals on the outer periphery of each support rod. The workpieces W are placed vertically and side by side in the plurality of support grooves 12 provided in the above, so that the plurality of workpieces W can be accommodated in two rows. In this way, for example, if 25 pieces of works W can be accommodated on one set of support rods 11, a total of 50 works W can be batch-processed at the same time, which is very efficient. .

Roller-shaped hooks 13 are provided on the outer surfaces of the left and right frames 10 and 10, respectively. When the carrier 8 is transported by the transport mechanisms 7a to 7e, the hooks 13 are used to lift the carrier. Has become.

As shown in FIGS. 4 and 5, the scrub polishing unit 2 is used to continuously flow a polishing liquid 21 containing a polishing agent such as cerium, silica or alumina from one direction to another. A processing tank 20 having a groove shape, the carrier 8 in the processing tank 20, and a work W
A moving mechanism 22 for moving in parallel with the liquid flow from the downstream side to the upstream side in a state of being completely immersed in the work 1, and sliding each work W sent together with the carrier 8 by the moving mechanism 22 from both sides; It has a plurality of rubbing brushes 23 for rubbing and polishing, and a motor 24 for forcibly rotating the rubbing brushes 23.

The polishing liquid 21 may contain one or more hydrofluoric acid, an alkali, a surfactant and the like in addition to the above-mentioned abrasive depending on the kind of the work W and the like.

At one end of the processing tank 20, a liquid supply port 26a is provided.
Is provided at the other end, and a drain port 27 is provided at the other end.
a, and the liquid supply port 2 is provided.
6a is connected to a polishing liquid supply source (not shown),
a is connected to the drainage treatment device. Then, the polishing liquid supplied into the tank from the liquid supply port 26a through the liquid supply part 26 flows toward the drain part 27 at a required liquid depth and flow rate in the tank. The bottom of the processing tank 20
It is slightly inclined so as to gradually decrease from the liquid supply part 26 side to the liquid discharge part 27 side.

The liquid supply section 26 is formed in a closed box shape, and a boundary surface with the processing tank 20 is provided with a fiber such as a nonwoven fabric having a fiber density as high as possible within a range of a porosity through which an abrasive can pass. A rectifying member 29 composed of a plate and a perforated plate formed by perforating a plurality of water holes in a hard plate is attached, and pressure is applied to the polishing liquid 21 in the liquid supply section 26 to apply the rectifying member 29. The polishing liquid 21 is extruded into the processing tank 20 so that the polishing liquid 21 has a substantially uniform flow rate at all liquid depths. It is desirable that the liquid supply section 26 and the flow regulating member 29 be detachable.

If the polishing agent is likely to precipitate, a means for stirring the polishing liquid such as an ultrasonic oscillator may be provided at an appropriate position in the processing tank 20. Further, an abrasive supply means for supplementarily supplying the polishing liquid or the abrasive may be provided at an appropriate position on the upstream side of the processing tank 20 (closer to the liquid supply section 26), for example, on the side surface, the bottom surface or the upper surface. Alternatively, the polishing liquid may be adjusted by supplying a solvent such as pure water or tap water from the supply section 26 and supplying and mixing the abrasive from the abrasive supply means.

On the other hand, the drainage section 27 is provided with a perforated plate 30 at a boundary portion with the processing tank 20, and the polishing liquid 2 is provided.
1 passes through the water passage holes of the perforated plate 30, and a part thereof overflows the perforated plate 30 and flows out to the drainage unit 27.

A moving mechanism 22 for moving the carrier 8
Is composed of a support 33 on which the carrier 8 is placed, a screw rod 34 for moving the support 33, and a motor 35 for rotating the screw 34.

The support table 33 includes a concave first portion 33a fitted inside the processing tank 20 along the side walls and the bottom wall for mounting the carrier 8, and a processing tank 20.
And a second part 33b positioned so as to surround the outside of the processing tank 20. A nut member 36 is provided on the second part 33b, and the screw is positioned below the processing tank 20 in parallel with the axis of the processing tank 20. The nut member 36 is screwed to the rod 34, and can be reciprocated along the processing tank 20 by forward and reverse rotation of the screw rod 34.

A brush holder 39 is supported by a support mechanism (not shown) so as to be movable up and down substantially at the upper center of the processing tank 20.
9 are provided with the above-mentioned rubbing brushes 23 in two rows.
That is, the brush holder 39 has two brush shafts 4
Reference numerals 0 and 40 are attached horizontally and parallel to a direction crossing the processing tank 20, and the disc-shaped rubbing brushes 23 are respectively provided on the brush shafts 40 at intervals such that the rubbing brushes 23 can pinch and rub the work W from both sides. Attached. The brush shafts 40 are rotatably driven by a motor 24 on a brush holder 39 in a required direction at a required speed.

The above-mentioned rubbing brush 23 is shown in FIG.
As can be seen from (B), both sides of the disc-shaped hard substrate 23a made of a metal such as aluminum or a synthetic resin have soft and compressive properties such as sponge, cloth or short fiber. A rubbing member 23b made of a material is attached. The rubbing member 23b is attached so as to cover the entire surface of the substrate 23a, and a plurality of raised portions 23c which are in sliding contact with the work in a compressed state are radially formed on the surface, and the work is mainly formed by the raised portions 23c. It is designed to be polished. In this case, the raised portions 23c of the adjacent rubbing brushes 23, 23 are brought into contact with each other so that a compression habit does not occur between the brushes.
Are desirably shifted from each other.

In the illustrated example, the raised portion 23c has a linear shape and is provided radially.
c may be point-like, and such point-like protrusions 23
c may be provided radially or may be randomly scattered over the entire substrate 23a. Further, the rubbing member 23b is
It is not necessary to cover the entire surface of the substrate 23a, but it is also possible to partially mount only the necessary portions in a required pattern. In this case, the rubbing member 23b forms the raised portion 23c as it is.

In the scrub polishing section 2, the carrier 8 containing a plurality of works W is carried into the processing tank 20 from the loading section 1 by the transfer mechanism 7a, and stands by at the receiving position at the downstream end of the processing tank 20. When the support 33 is placed on the first portion 33 a of the support 33, the support 33 moves upstream in the polishing liquid 21 by rotation of the screw rod 34, and stops at the center of the processing tank 20. I do. Then, each of the rubbing brushes 23 is lowered while rotating by the lowering of the brush holder 39, and the lower half of the rubbing brushes 23 is half in the polishing liquid 21 as shown in FIGS. The upper half of each work W is sandwiched between two adjacent brushes 23 at the immersion position, and both surfaces of each work W are rubbed in the polishing liquid 21. At this time, each work W is
Due to the frictional force with the members 3 and 23, the rotor is driven to rotate and the entire surface is rubbed. Therefore, the carrier 8 needs to be able to rotatably support the work.

It should be noted that the work W is moved by the carrier 8 during the above rubbing.
The upper end of each work W is rotatable by one or more pressing members 41 such as one or more rollers having a length spanning all of the work W in a row so as not to protrude from the work W. It is desirable to hold down. Further, an ultrasonic wave irradiating means may be provided at an appropriate position such as a bottom surface or a side surface of the processing tank 20, and the polishing treatment may be performed while irradiating the ultrasonic wave.

By rubbing both surfaces of each work W with the rubbing brush 23 in the polishing liquid 21 in this manner, the work W
Is polished to improve the roughness. Therefore, the finish polishing of the work W can be performed by a simple scrub means having the same principle as that of the cleaning without using a large and expensive polishing apparatus having a complicated structure such as a polishing machine.

The work W is immersed in the polishing liquid.
Is rubbed by the brush 23, so that the abrasive is supplied to the brush 23 reliably and uniformly, and the work W is polished efficiently and with high precision. Moreover,
As the brush 23 is immersed in the polishing liquid 21 and rotated, the dressing of the brush 23 is automatically performed. Therefore, not only is it difficult for the brush to be clogged by abrasive grains, but also it is difficult for dirt to adhere to the brush. There is also an advantage.

When the scrub polishing is completed, the rubbing brush 23 rises and stops its rotation. On the other hand, work W
The carrier 8 is transferred together with the carrier 8 toward the upstream side by the support table 33 and stopped at the take-out position at the upstream end. After that, the carrier 8 is taken out of the processing tank 20 by the transport mechanism 7b, and the scrub cleaning in the subsequent stage is performed. Sent to unit 3.

The support table 33 from which the carrier 8 has been taken out moves to the downstream side in the processing tank 20 and stops at the receiving position at the downstream end. Is supplied, and the above-described operation is repeated.

The transport mechanism 7b has the same configuration as the other transport mechanisms 7a, tc, 7d, and 7e provided between the components. The configuration is as follows.

That is, as can be seen from FIGS. 4 and 7, the transport mechanism 7b has a swing arm 44 that can swing 180 degrees about a support shaft 43 attached to the base end. A horizontally extending suspension shaft 45 is attached to the tip of the swing arm 44.
In addition, a pair of suspension members 46, 46, which are engaged with the hooks 13 on both side surfaces of the carrier 8, are vertically mounted at a slightly wider interval than the length of the carrier 8. These suspension members 46, 46 have an inverted T-shape, and have horizontal portions 4 at the lower end.
The upper edge of 6a has a depression 46b, and the hook 13 is hooked from below at the position of the depression 46b to lift up the carrier 8. The support shaft 43 and the suspension support shaft 45 are connected to each other by a timing belt, so that the suspension support members 46 always maintain a vertical position regardless of the swing position of the swing arm 44. As a result, the carrier 8 can be transported to an adjacent work unit while always being horizontally oriented.

The transfer of the carrier 8 by the transfer mechanism 7b is performed as follows. This transfer operation is substantially the same as other transfer mechanisms. That is, the swing arm 44 is rotated toward the scrub polishing unit 2, and the suspension members 46, 46 at the upstream end of the processing tank 20 are slightly lowered below the positions where they are engaged with the hooks 13 on both side surfaces of the carrier 8. When the carrier 8 is sent by the support stand 33 and is sent between the pair of suspending members 46, 46, the swing arm 44 slightly rises and the suspending member 4
After the carrier 8 is lifted by engaging the hooks 6 and 46 with the hooks 13, the carrier 8 is swung 180 degrees and sent into the adjacent scrub cleaning section 3. Then, the swing arm 44 is lowered to a position where the suspension members 46, 46 are disengaged from the hooks 13 and stands by, and the carrier 8 is separated from the space between the suspension members 46 by the moving mechanism in the scrub cleaning unit 3. When the swing arm 44
Rises again and performs the next operation.

Thus, the carrier 8 can be sequentially conveyed by the swing arm 44 to the adjacent processing section while keeping the horizontal orientation, and the time required for the conveyance can be reduced to about 3 to 5 seconds. Further, by using such a transfer method using the swing arm for transferring the carrier, the work accommodated in the carrier can be transferred safely and smoothly without giving an impact. That is, in the transport method combining vertical movement and horizontal movement by an air cylinder or the like, the work moves or hits the carrier due to an impact to temporarily stop the arm at a position where the direction changes, and the work is displaced or damaged. Although there is a problem that the arm is easy to perform, such a problem does not occur at all in the swing transfer method since it is not necessary to temporarily stop the arm in the middle.

It should be noted that the suspension members 46, 46 are locked to the carrier 8 or the transported carrier 8 is connected to the suspension members 46, 46.
The method of releasing from the 46 is not limited to the above-mentioned method, and a method of changing the interval between the pair of suspension members 46, 46, or attaching a key-shaped metal fitting instead of the recess, and attaching the metal fitting to the hook 13
It may be a method such as disengagement.

The scrub cleaning section 3 at the subsequent stage of the scrub polishing section 2 cleans the work W to which the abrasive or the like has adhered after the scrub polishing by rubbing with a rubbing brush. Scrub polishing part 2 shown in 4
A device having substantially the same configuration as that described above can be used. Then, scrub cleaning is performed by supplying a cleaning liquid such as pure water or tap water from the liquid supply unit 26. Therefore, a further illustration and description of the configuration of the scrub cleaning section 3 will be omitted.

When expensive scrubbing water is used in the scrub cleaning section 3, a pure water recycling system is connected between the supply port 26a and the drain port 27a, and the drain port 27a is connected. Regenerates the washing water recovered from the
6a, it is desirable to be configured to be reused cyclically. Also, this scrub cleaning unit 3
Also in the above, the cleaning treatment can be performed while irradiating the cleaning liquid with ultrasonic waves by providing an ultrasonic irradiation means to the treatment tank 20.

The work W that has been cleaned in the scrub cleaning section 3 is sent to the subsequent finishing cleaning section 4 by the transport mechanism 7c. As shown in FIG. 8, the finish cleaning unit 4
A groove-shaped processing tank 50 for continuously flowing a rinsing liquid 49 such as pure water from one direction to the other direction;
And a moving mechanism 22 for moving the carrier 8 from the downstream side to the upstream side in a state where the work W is completely immersed in the rinsing liquid 49. Finish cleaning is carried out by contacting countercurrently in parallel with the flow. In this case, it is the same as the scrub polishing unit 2 and the scrub cleaning unit 3 that the processing tank 50 may be provided with an ultrasonic irradiation unit so that the cleaning process may be performed while irradiating the ultrasonic waves.

The configuration of the finish cleaning section 4 is different from that of the scrub cleaning section 3 in that there is no brush 23 for rubbing and a mechanism related thereto, but other configurations are substantially the same. Therefore, common portions are denoted by common reference numerals, and description thereof is omitted.

In the figure, reference numeral 28 denotes a rinse liquid recycling system which regenerates the rinse liquid collected from the drain port 27a into the tank 28a and regenerates the rinse liquid by the pump 28b.
By supplying to (a), it is configured to be reused cyclically.

The finish cleaning section 4 is provided with a rinse made of pure water, a substance obtained by adding an organic solvent or the like to pure water, or a substance adjusted to be alkaline, etc., in the preceding stage according to the type of the work W or the like. The work is immersed in the liquid in a stationary state, and the work is irradiated with ultrasonic waves to perform the first pretreatment for cleaning.
A cleaning unit can be provided. In this case, the above-described counter-current transport type cleaning unit is the second cleaning unit. In addition, it is desirable that the first cleaning section is also of a flowing liquid type.

The drying section 5 for drying the rinsed workpiece W is provided with a vapor for removing water by condensing and flowing the solvent vapor on the surface of the workpiece W by bringing the workpiece W into contact with the high-temperature solvent vapor. It is of a dry type and is configured as follows.

That is, as shown in FIG. 9, the drying section 5
There is a drying tank 60 formed at the bottom with a housing 61 for an organic solvent such as isopropyl alcohol (IPA), methanol or ethanol. Inside the drying tank 60, a first heating pipe 62 for heating the solvent to generate steam, a second heating pipe 63 for reheating the generated steam to increase the temperature, and a solvent vapor A processing region 64 for contacting the work W with the drain W and a drain discharge mechanism 65 for discharging drain that condenses on the surface of the work W and flows down with moisture are provided. Further, at a position below the processing region 64, a first cooling pipe 66 for controlling the flow so that the solvent vapor always collects in the processing region 64 by cooling and condensing the solvent vapor is provided,
An opening 69 for taking the carrier 8 in and out is formed in the upper part of the drying tank 60 so as to be openable and closable by a lid, and a second cooling for preventing the solvent vapor from flowing out from the opening 69. A tube 67 is provided. Numeral 72 is a transport means for taking the carrier in and out.

In the drying section 5, the carrier 8 with the work is moved by the conveying means 72 from the supply port 69 to the drying tank 60.
When carried in, the high-temperature solvent vapor is condensed by coming into contact with each work W, and flows down the surface of the work W to wash away moisture and other attached matter. And
Condensation of the solvent vapor gradually decreases as the temperature of the work increases, and the drying of the work proceeds, and the drying is completed in about 60 seconds. When the drying is completed, the carrier 8 is taken out to the unloading section by the transporting means 72 and sent to the next step.

In order to allow the solvent vapor to efficiently condense when it comes into contact with the work W, a pre-processing section for cooling the work W is provided at a stage preceding the drying section 5. The work W can be immersed in a low-temperature liquid solvent placed in the processing tank.

The work W is located downstream of the drying section 5.
Work W that has been dried as necessary depending on the type of
An ultraviolet processing unit may be provided to remove static electricity by irradiating the workpiece with ultraviolet rays, or to perform decomposing / removing / cleaning of organic residue on the surface of the work.

In the above-described embodiment, the scrub polishing unit 2 is configured to polish the workpiece W with the rubbing brush 23 while rotatably supporting the work W on the carrier 8, but the second embodiment shown in FIG. As described above, the work W may be lifted from the carrier 8 and polished in a non-contact state with the carrier 8.

That is, in the second embodiment, the two brush shafts 40A and 40B on which the plurality of rubbing brushes 23A and 23B are respectively mounted are opposed to each other at a required interval in the diameter direction of the work W. It is attached to a brush holder, and is connected to rotation driving means so that each rotation direction can be individually changed.

Then, as shown in FIG. 10A, when the work W is carried to a specific position by the carrier 8, the two brush shafts 40A and 40B descend, and the respective brush shafts 40A and 40B. The upper end of the work W is inserted and clamped between the upper two adjacent rubbing brushes 23A, 23A and between 23B, 23B. In this state, the left brush shaft 40A rotates counterclockwise, and the right brush shaft 40A rotates.
When B rotates clockwise, the rubbing brush 23
The work W is lifted from the carrier 8 by the sliding force of A, 23A and 23B, 23B.

Next, as shown in FIG. 7B, the left and right brush shafts 40A and 40B (the rubbing brushes 23A and 23B) are used.
B) are rotated clockwise or counterclockwise, so that these rubbing brushes 23A, 23A and 23B, 2
With the sliding force of 3B, the work W is polished while rotating while being supported in a suspended state in the liquid.

When the above-mentioned polishing is completed, the workpiece W is lowered and the carrier is moved by rotating the left brush shaft 40A clockwise and the right brush shaft 40B counterclockwise as shown in FIG. It is stored in the original position of 8.

When the work W is accommodated in the carrier 8 in two rows, it goes without saying that two sets of the left and right rubbing brushes 23A and 23B are provided so as to correspond to the work in each row.

According to the second embodiment, since the work W is suspended in the liquid by the rubbing brushes 23A and 23B during polishing, the work W needs to be rotatably supported by the carrier 8. Therefore, there is no risk of damage to the outer periphery of the work due to contact with the carrier, and it is not necessary to consider damage due to contact with the carrier. Efficiency is also improved.

In the illustrated embodiment, the scrub polishing unit 2, the scrub cleaning unit 3, and the finish cleaning unit 4 have a horizontal groove-shaped processing tank. Although the processing is performed by immersing the work W in its entirety, the processing may be performed with a part of the work W partially immersed. Alternatively, at least one of the steps may use an overflow type processing tank to process a workpiece in an upward flow of a processing liquid supplied from a tank bottom and overflowing from the tank top.
Or without processing the workpiece in the flow of the processing liquid,
The treatment may be performed in the treatment liquid stored in the tank.
Regardless of which processing method is used, it is not always necessary to move the work in the tank. Furthermore, in the finish cleaning section, the finish cleaning may be performed with a rinse liquid sprayed from a nozzle in a shower shape without processing the work while immersing the work in the rinse liquid stored in the tank.

The drying section 5 may be of a type other than the steam drying type, for example, a heat drying type in which the work is dried by radiant heat or hot air, or the work is rotated at a high speed to drain the water. Spin drying, vacuum plasma drying, suction blow drying, and the like, in which a work is placed in the middle of a suction duct where air is sucked at high speed and dried, can also be used.

Further, in the above embodiment, a plurality of works are accommodated in the carrier for batch processing. However, the work may be processed in a sheet mode while continuously feeding the works one by one.

[0066]

As described above, according to the present invention, the polishing for improving the roughness of the workpiece can be performed by a simple scrub means having the same principle as the cleaning without using a large and expensive polishing apparatus having a complicated structure. The processing can be performed, and at the same time, the cleaning and drying of the workpiece can be sequentially and continuously performed in one line.

[Brief description of the drawings]

FIG. 1 is a plan view conceptually showing the entire processing apparatus according to the present invention.

FIG. 2 is a partially broken front view showing a state in which a work is accommodated in a carrier.

FIG. 3 is a sectional view taken along line AA in FIG. 2;

FIG. 4 is a cross-sectional view illustrating a configuration of a scrub polishing unit.

FIG. 5 is a sectional view taken along line BB in FIG. 4;

6A is an enlarged view of a main part of FIG. 5 showing the principle of scrub polishing, and FIG. 6B is a side view thereof.

FIG. 7 is a side view of a main part of the transport mechanism.

FIG. 8 is a cross-sectional view illustrating a configuration of a finish cleaning unit.

FIG. 9 is a cross-sectional view illustrating a configuration of a drying unit.

FIGS. 10A, 10B, and 10C are side views schematically showing main parts of a second embodiment of the scrub polishing unit, showing different operation states.

[Explanation of symbols]

 W Work 2 Scrub polishing unit 3 Scrub cleaning unit 4 Finish cleaning unit 5 Drying unit 7a to 7e Transport mechanism 8 Carrier 20 Processing tank 21 Polishing liquid 23, 23A, 23B Rubbing brush 23c Raised part 40, 40A, 40B Brush shaft 43 Shaft 44 Swing arm 45 Suspension support shaft 46 Suspension support member 49 Rinse liquid 50 Treatment tank

Continued on the front page F term (reference) 3B116 AA03 AB33 AB44 BA02 BA08 BA12 BB02 BB82 CC01 CC03 3B201 AA03 AB33 AB44 BA02 BA12 BB02 BB12 BB14 BB82 BB83 BB95 CC01 CC11 CD22 3C058 AA06 AA07 AA14 AA03 AB04 AB04 AB04 AB04 DA17

Claims (13)

[Claims] A plate-like work is immersed in a polishing liquid containing an abrasive contained in a processing tank, and the surface of the work is rubbed and polished in the polishing liquid with a rotating rubbing brush. Scrub polishing step of improving surface roughness; scrub cleaning step of immersing the scrub-polished work in a cleaning liquid and rubbing the surface of the work with a rubbing brush in the cleaning liquid; scrub-cleaned work A finish cleaning step of finish-cleaning the workpiece; and a drying step of drying the finish-washed workpiece. 2. The processing method according to claim 1, wherein the scrub polishing step includes immersing the workpiece in a polishing liquid continuously flowing from one direction to the other direction in a direction parallel to the liquid flow. It is characterized by polishing the work in the flow of liquid. 3. The processing method according to claim 1, wherein the scrub polishing step is performed by holding one half of the work between two circular rubbing brushes. What to do. 4. A processing method according to claim 3, wherein said at least two rubbing brushes are arranged at a predetermined interval in the diametrical direction of the workpiece, and at least two rubbing brushes are provided on one side and at the other side. By simultaneously holding both halves of the work with the rubbing brush and rotating the rubbing brushes on both sides in the same direction,
The polishing is performed while the work is suspended in the liquid while being supported by the rubbing force of these rubbing brushes. 5. A processing tank for containing a polishing liquid containing an abrasive, and a plate-like work immersed in the polishing liquid in the processing tank is rubbed and polished in the liquid to improve the surface roughness. A scrubbing unit having a rubbing brush and a rotation driving means for forcibly rotating the rubbing brush; a processing tank for containing a cleaning liquid; and a cleaning by rubbing a work immersed in the cleaning liquid. A scrub cleaning section having a rubbing brush and a rotation driving means for rotating the rubbing brush; a finish cleaning section for finish-cleaning the scrub-washed work with a rinsing liquid; a drying section for drying the finish-cleaned work; A transport device for transporting the work between the processing units; and a plate-like workpiece processing apparatus. 6. The processing apparatus according to claim 5, wherein the processing tank in the scrub polishing unit is a flow-type processing tank in which a polishing liquid continuously flows from one direction to another. It is characterized in that the work is polished in the flow of liquid. 7. The processing apparatus according to claim 5, wherein said scrub polishing section has at least two circular rubbing brushes mounted side by side on a brush shaft. It is characterized in that one half of the work is held between the brushes and polished. 8. A processing apparatus according to claim 7, wherein the two brush shafts to which the rubbing brushes are attached are arranged to be able to individually change the rotation direction at a required interval in the diameter direction of the work. The two halves of the work are simultaneously nipped and polished by the rubbing brushes on the two brush shafts. 9. A processing apparatus according to claim 7, wherein a plurality of raised portions are provided on both surfaces of said rubbing brush, which slidably contact the surface of the work in a compressed state, and the ridges of adjacent rubbing brushes are provided. The parts are shifted so that they do not abut each other. 10. A processing apparatus according to claim 9, wherein said raised portions are formed radially. 11. A processing apparatus according to claim 5, wherein said processing apparatus has a carrier capable of accommodating a plurality of workpieces side by side, and said plurality of workpieces accommodated in said carrier. , And simultaneously processing while transporting the entire carrier. 12. The processing apparatus according to claim 11, wherein
The transfer mechanism has a swing arm that is swingable at a fixed angle around a support shaft, and a suspension member that is provided at a tip of the swing arm so as to always vertically support the carrier. What to do. 13. The processing apparatus according to claim 5, wherein the processing tank in the scrub cleaning unit is a flow-type processing tank in which a cleaning liquid continuously flows from one direction to another. Wherein the work is sandwiched between two circular rubbing brushes in the flow of the cleaning liquid for cleaning.