JP2000351637A - Mold for forming optical element, its production and optical element formed by using the mold - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a mold for forming an optical element having an arbitrarily curved face which cannot be formed by conventional grinding work, enabling repeated press-forming without causing the fusion with glass, effective for precisely transferring the shape and resistant to scratch damage, provide a process for producing the mold for forming an optical element and provide an optical element produced by using the mold. SOLUTION: This forming mold has a transfer surface for forming an optical element on a part of a base material 1. The transfer surface has a worked layer 2 composed mainly of a metal, a mixture of a metal and carbide of the metal, a mixture of a metal and nitride of the metal or a mixture of a metal and carbonitride of the metal formed on the base material and worked to a desired shape and accuracy and a surface layer 4 formed on the worked layer and composed mainly of a hard carbon film or a noble metal alloy film.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a mold for forming an optical element used for manufacturing an optical element made of glass, such as a lens or a prism, with high precision by press-molding a glass material, a method for manufacturing the same, and a method for manufacturing the same. It relates to an optical element obtained by a molding die.

[0002]

2. Description of the Related Art The technology of manufacturing a lens by press molding of a glass material without the need for a polishing step eliminates the complicated steps required in conventional manufacturing, making it possible to manufacture a lens simply and inexpensively. In recent years, it has been used in the manufacture of optical elements made of not only lenses but also prisms and other glasses.

The properties required of a mold used for press molding of such a glass optical element include excellent hardness, oxidation resistance, heat resistance, mold release properties, mirror workability, and the like. Can be Conventionally, this type of mold material has been metal,
Many proposals have been made such as ceramics and materials coated with them. To give some examples,
JP 13Cr martensitic steels in JP 49-51112 is, SiC and Si ₃ N ₄ in JP-A-52-45613 is, Japanese Patent Publication No. Sho 59-121126 T
A mixed material of iC and a metal is disclosed in JP-A-60-246230.
Japanese Patent Application Laid-Open No. 61-183134 and Japanese Patent Application Laid-Open No. 61-183134 disclose a material obtained by coating a hard metal with a noble metal.
-281030 and JP-A-1-301864 disclose a diamond thin film or a diamond-like carbon film,
JP-A-64-83529 proposes a material coated with a hard carbon film.

However, in the conventional mold material, the hardness,
A product satisfying all of oxidation resistance, heat resistance, release property and mirror workability has not been obtained. For example, 13 martensitic steel is liable to be oxidized, and further has the disadvantage that Fe diffuses into the glass at a high temperature and the glass is colored.

Further, SiC, Si ₃ N ₄ , TiC, diamond thin film, diamond-like carbon film and hard carbon film are:
Although the hardness of the material is very high and the mechanical strength is excellent, the workability is poor and it is difficult to process the material into a highly accurate mold. Furthermore, in SiC, Si ₃ N ₄ and TiC,
Oxidation occurs at high temperature and fusion with glass occurs.

In a mold in which a precious metal thin film, a diamond thin film, a diamond-like carbon film and a hard carbon film are coated on a cemented carbide base material, it is possible to use a diamond grindstone as a means for processing the cemented carbide. Although it is general, it has a drawback that it cannot be processed into a spherical surface or a free-form surface with a small curvature. The free-form surface here means
This is a surface including a non-axisymmetric aspheric surface.

[0007] As a measure for improvement, a working layer which can be easily precision machined on a cemented carbide base material is disclosed in
No. 3230 discloses an electroless Ni-P plating film.
No. 41326 discloses a ternary alloy containing P ｛P- (N
i, Co, Fe)-(Si, Ti, Cu, Zr, Nb,
Mo, Ru, Rh, Pd, Hf, Ta, W, Re, O
s, Ir)}, a processing surface is formed by performing necessary precision machining (cutting) on the processed layer, and a noble metal based alloy thin film is coated on the processed layer. However, the processed layer does not have sufficient hardness, cannot be transferred to a precise shape, and the noble metal-based alloy thin film is soft and easily damaged.

[0008]

SUMMARY OF THE INVENTION An object of the present invention is to solve such a conventional problem and to repeatedly press-mold an optical element having a free-form surface which cannot be realized by conventional grinding. However, the present invention provides an optical element molding die that does not fuse with glass, transfers the shape precisely, is hardly scratched, a method of manufacturing the optical element forming mold, and an optical element obtained by the molding die. Is to do.

[0009]

According to the present invention, there is provided a molding die having a transfer surface for forming an optical element on a part of a base material, wherein the transfer surface is formed on the base material. ,
A processed layer processed with a desired shape and precision mainly containing a metal or a mixture of a metal and a metal carbide thereof, or a mixture of a metal and a metal nitride thereof, or a mixture of a metal and a metal carbonitride thereof; For forming an optical element having a surface layer mainly composed of a hard carbon film or a noble metal alloy film formed on a layer, a method of manufacturing the optical element forming mold, and an optical element obtained by the molding die An element is provided.

[0010]

Embodiments of the present invention will be described below in detail.

The base material is an oxide ceramic containing alumina or zirconia as a main component, a carbide / nitride ceramic containing silicon carbide, silicon nitride, titanium carbide, titanium nitride or tungsten carbide as a main component, and tungsten carbide as a main component. And a metal containing molybdenum, tungsten or tantalum as a main component, and preferably a cemented carbide mainly containing tungsten carbide.

The working layer is made of one selected from nickel (Ni), cobalt (Co), and iron (Fe), and copper (Cu), silicon (Si), titanium (Ti), chromium (Cr), Zirconium (Zr), niobium (Nb), molybdenum (Mo), hafnium (Hf), tantalum (T
a) an alloy with one selected from tungsten and tungsten (W), or a mixture of the alloy with a carbide of the alloy, a mixture of the alloy with a nitride, or a mixture of the alloy with a carbonitride, or , Nickel (Ni), cobalt (Co) and iron (Fe) binary alloys of phosphorus (P), or a mixture of the alloys and carbides of the alloys, or nitrides of the alloys Or a mixture of the alloy with a carbonitride, or nickel (N
i), one selected from cobalt (Co) and iron (Fe), and copper (Cu), silicon (Si), titanium (T
i), chromium (Cr), zirconium (Zr), niobium (Nb), molybdenum (Mo), hafnium (Hf),
One type selected from tantalum (Ta) and tungsten (W) and a ternary alloy of phosphorus (P), or a mixture of the alloy and a carbide of the alloy, or a mixture of a nitride of the alloy, or an alloy thereof And a mixture of a (Ni, Co, Fe) -P phosphorus compound and a metal carbide, a metal nitride, or a metal carbonitride thereof. When the material is a cemented carbide containing tungsten carbide as a main component, (Ni, Co, Fe)-
A mixture of a ternary alloy in which one of Cu, Cr and Ti is added to a phosphorus compound of P and a metal carbide, metal nitride, and metal carbonitride thereof is desirable.

As the coating method, a sputtering method, an ion plating method, a vapor deposition method and the like are used.
Preferably, in a sputtering method, a metal target is used, and as an introduction gas, an inert gas such as argon, an inert gas and methane gas, an inert gas and nitrogen gas, or an inert gas such as argon, methane gas and nitrogen. It is desirable to form a film using a gas in terms of adhesion to a base material. The thickness of the film varies depending on the desired shape of the transfer surface, but is generally preferably 200 μm or less.

Further, when sputtering, the base material is heated to a molding temperature or higher, and at the start of film formation, a film is formed by applying a voltage of -300 V or more to the base material. Is preferred.

The intermediate layer is one kind of carbide, nitride or carbonitride selected from titanium, tantalum, chromium and silicon, and is preferably titanium nitride (TiN). As the coating method, a sputtering method, an ion plating method, or the like is used. 0.1-3
μm is desirable.

As the surface layer, a hard carbon film is desirable in terms of surface hardness, and as a coating method, a high frequency plasma CVD method, an ion beam evaporation method, a sputtering method, or the like is used. The thickness is desirably 10 nm to 1 μm. Further, the term “hard carbon film” as used in the present invention refers to a hydrogenated amorphous carbon film, a diamond-like carbon film (or DLC film: diamond-like) by a researcher.
e carbon) or i-C film.

Further, platinum (Pt), palladium (Pd), iridium (Ir), rhodium (Rh), osmium (Os), ruthenium (Ru), rhenium (R
e) As a coating method of one or more metal or alloy thin films selected from gold (Au), tungsten (W), and tantalum (Ta), a sputtering method, a vacuum evaporation method, or the like is used. The thickness is desirably 0.1 to 1 μm from the viewpoint of surface hardness.

In the present invention, in particular, the mold base material is an oxide ceramic containing alumina or zirconia as a main component, a carbide / nitride ceramic containing silicon carbide, silicon nitride, titanium carbide, titanium nitride or tungsten carbide as a main component. , A metal mainly composed of molybdenum, tungsten or tantalum, or a cemented carbide mainly composed of tungsten carbide, has a hardness that can withstand press forming, and has a nickel (Ni), Cobalt (C
o) and one selected from iron (Fe) and copper (C
u), silicon (Si), titanium (Ti), chromium (C
r), zirconium (Zr), niobium (Nb), molybdenum (Mo), hafnium (Hf), tantalum (Ta)
And an alloy with one selected from tungsten (W),
Or a mixture of the alloy with a carbide of the alloy, or a mixture of the alloy with a nitride, or a mixture of the alloy with a carbonitride, or nickel (Ni), cobalt (C
o) and one selected from iron (Fe) and phosphorus (P)
Or a mixture of the alloy with a carbide of the alloy, or a mixture with a nitride of the alloy, or a mixture with a carbonitride of the alloy, or nickel (Ni), cobalt (Co) and One selected from iron (Fe), copper (Cu), silicon (Si), titanium (Ti),
Chromium (Cr), zirconium (Zr), niobium (N
b) one selected from molybdenum (Mo), hafnium (Hf), tantalum (Ta) and tungsten (W), and a ternary alloy of phosphorus (P), or a mixture of the alloy and a carbide of the alloy; Or, by forming a mixture with a nitride of the alloy or a mixture with a carbonitride of the alloy, it is possible to easily perform a cutting process and a uniform polishing with a diamond bite or the like to a desired shape, and when forming, the pressure is reduced. Hardness that does not deform even if it is applied is obtained, and one type of carbide, nitride or carbonitride selected from titanium, tantalum, chromium, silicon is formed as an intermediate layer on the processed layer, and further on the intermediate layer By forming the hard carbon film as the surface layer, it was possible to obtain an optical element molding die which was hardly damaged and excellent in releasability from glass.

In place of the hard carbon film, platinum (P
t), palladium (Pd), iridium (Ir), rhodium (Rh), osmium (Os), ruthenium (R
u), at least one metal or alloy thin film selected from rhenium (Re), gold (Au), tungsten (W) and tantalum (Ta) as long as the thickness is in the range of 0.1 to 1 μm. A sufficiently practical surface hardness can be obtained.

[0020]

EXAMPLES Hereinafter, the present invention will be described in more detail with reference to specific examples.

Example 1 FIG. 1 is a schematic sectional view of an optical element molding die of Example 1. The mold base material 1 is obtained by subjecting a cemented carbide mainly composed of WC to electric discharge machining into an approximate shape of a desired free-form surface, and then forming an electric discharge machine-affected layer on the electric discharge machined surface by 3.
μm is removed.

Next, the base material 1 is heated to 450 ° C.
Ni-P and Ni were formed by sputtering using an i-P target, using argon and methane as introduced gases, and applying a DC bias of -500 V to the base material 1 at the initial stage of film formation.
A processed layer 2 of a mixed film with -P carbide was formed to a thickness of 50 μm (DC bias applied to the base material 1 was applied until the thickness of the processed layer became 1 μm).

Then, the processed layer was cut into a desired free-form surface by a diamond tool, and finished by uniform polishing. Further, a surface layer 4 of a hard carbon film having a thickness of 100 nm was formed on the processed layer 2 by an ion beam evaporation method. The Vickers hardness of this mold was measured to be 1910 Kg / mm ² .

When a glass was formed at a molding temperature of 420 ° C. by a continuous molding machine using a phosphate glass in this mold,
Good molded products are obtained even after 000 shot molding,
No deterioration of the mold surface was observed.

Example 2 FIG. 2 is a schematic sectional view of an optical element molding die according to Example 2. The mold base material 1 is obtained by subjecting a cemented carbide mainly composed of WC to electric discharge machining into an approximate shape of a desired free-form surface, and then forming an electric discharge machine-affected layer on the electric discharge machined surface by 3.
μm is removed.

Next, the base material 1 is heated to 450 ° C.
Ni-P and Ni were formed by sputtering using an i-P target, using argon and methane as introduced gases, and applying a DC bias of -500 V to the base material 1 at the initial stage of film formation.
A processed layer 2 of a mixed film with -P carbide was formed to a thickness of 50 μm (DC bias applied to the base material 1 was applied until the thickness of the processed layer became 1 μm).

Then, this processed layer was cut into a desired free-form surface by a diamond tool, and finished by uniform polishing. Further, an intermediate layer 3 of a TiN film is formed on the processed layer 2 by an ion plating method.
Was formed to a thickness of 1 μm. Finally, a surface layer 4 of a hard carbon film having a thickness of 100 nm was formed on the intermediate layer 3 by an ion beam evaporation method. The Vickers hardness of this mold was measured to be 2110 kg / mm ² .

The glass was formed at a molding temperature of 420 ° C. by a continuous molding machine using phosphate glass in this mold.
Good molded products are obtained even after 000 shot molding,
No deterioration of the mold surface was observed.

(Example 3) In Example 1, instead of forming a mixed film of Ni-P and a carbide of Ni-P of the working layer, Ni-P-Cu and a carbide of Ni-P-Cu were used. An optical element molding die was manufactured in the same manner as in Example 1 except that a mixed film was formed. The Vickers hardness and glass moldability of this mold were measured and found to be the same as in Example 1.

(Example 4) In Example 2, instead of forming a mixed film of Ni-P and a carbide of Ni-P of the processed layer, Ni-P-Cu and a carbide of Ni-P-Cu were used. An optical element molding die was manufactured in the same manner as in Example 2 except that a mixed film was formed. The Vickers hardness and glass moldability of this mold were measured and found to be the same as in Example 2.

(Comparative Example 1) In Example 1, instead of forming the intermediate layer and the hard carbon film, a surface layer 5 of a Pt-Ir film is formed to a thickness of 3 μm on the processed layer 2 by sputtering. Except for the above, an optical element molding die was manufactured in the same manner as in Example 1. When the Vickers hardness of this mold was measured, it was 160 kg / mm ² .

When this mold was subjected to glass molding (crown-based glass) using a continuous molding machine, a good molded product was obtained even after 3000 shot molding, and no deterioration of the mold material surface was observed. When the mold was wiped with silbon paper, small scratches were thought to have appeared on the surface, which seemed to involve dust (foreign matter).

(Example 5) In Example 1, instead of forming a mixed film of Ni-P and a carbide of Ni-P of the processing layer, except that the introduced gas was only argon, a Ni-P film was formed. In the same manner as in Example 1, an optical element molding die was manufactured. When the Vickers hardness of this mold was measured,
It was 800 kg / mm ² .

The glass was formed at a molding temperature of 420 ° C. by a continuous molding machine using phosphate glass in this mold.
Good molded products are obtained even after 000 shot molding,
No deterioration of the mold surface was observed.

(Example 6) In Example 2, instead of forming a mixed film of Ni-P and a carbide of Ni-P of the processing layer, Ni-P was introduced by using argon and nitrogen gas as the introduced gas.
An optical element molding die was manufactured in the same manner as in Example 2 except that a mixed film of P and Ni-P nitride was formed. When the Vickers hardness of this mold was measured, it was 2300 kg / m.
m ² .

Glass molding was performed at a molding temperature of 420 ° C. by a continuous molding machine using phosphoric acid glass in this mold.
Good molded products are obtained even after 000 shot molding,
No deterioration of the mold surface was observed.

(Example 7) In Example 2, instead of forming a mixed film of Ni-P and a carbide of Ni-P of the processed layer, Ni-P was introduced by using argon, methane gas and nitrogen gas as an introduction gas. An optical element molding die was manufactured in the same manner as in Example 2, except that a mixed film of Ni and a carbonitride film of Ni-P was formed. When the Vickers hardness of this mold was measured,
It was 2420 kg / mm ² .

Glass molding was performed at a molding temperature of 420 ° C. by a continuous molding machine using phosphate glass in this mold.
Good molded products are obtained even after 000 shot molding,
No deterioration of the mold surface was observed.

Comparative Example 2 An optical element molding die was manufactured in the same manner as in Example 2 except that the hard carbon film was not formed. When the Vickers hardness of this mold was measured, it was 1900 kg / mm ² .

The glass was formed at a molding temperature of 420 ° C. by a continuous molding machine using phosphoric acid glass in this mold.
From the shot, fusion with glass occurred, and a good molded product could not be obtained.

Comparative Example 3 A mold for molding an optical element was molded in the same manner as in Comparative Example 2. When a glass was formed at a molding temperature of 560 ° C. by a continuous molding machine using boric acid glass in this mold, cracks occurred in the processed layer after 100 shots were formed, and a good molded product was not obtained.

(Comparative Example 4) In Example 2, the DC bias applied to the base material 1 at the initial stage of film formation was 0 V, -150.
A mold for molding an optical element was manufactured in the same manner as in Example 2 except that V and -300 V were changed.

Glass molding was performed at a molding temperature of 420 ° C. using a phosphoric acid-based glass in this mold by a continuous molding machine.
After the 0-shot molding, the processed layer was peeled off from the base material, and a good molded product was not obtained.

When the DC bias is -300 V,
The same result as in Example 2 was obtained.

(Eighth Embodiment) In the second embodiment, when forming a processed layer, instead of using a target Ni-P film, (Ni, Co, Fe)-(Cu, Si, Ti, C
An optical element molding die was manufactured in the same manner as in Example 2 except that a target was a binary alloy of a combination of r, Zr, Nb, Mo, Hf, Ta, and W). When the Vickers hardness and glass moldability of this mold were measured, Example 2
Was equivalent to Table 1 shows the results.

[0046]

[Table 1]

Further, in place of argon and methane gas, only argon, argon and nitrogen gas, or argon, methane gas and nitrogen gas were used.
The same result as was obtained.

(Embodiment 9) In Embodiment 2, when forming a processed layer, instead of using Ni-P as a target,
(Ni, Co, Fe) -P- (Cu, Si, Ti, C
An optical element molding die is manufactured in the same manner as in Example 2 except that a binary and ternary alloy target of a combination of r, Zr, Nb, Mo, Hf, Ta, and W) is used. When measuring the Vickers hardness and glass moldability of this mold,
It was equivalent to Example 2. Table 2 shows the results.

[0049]

[Table 2]

Also, in place of argon and methane gas, only argon, argon and nitrogen gas, or argon, methane gas and nitrogen gas were used.
The same result as was obtained.

(Example 10) In Example 2, a carbide, nitride or carbonitride selected from titanium, tantalum, chromium and silicon is formed instead of forming the TiN film of the intermediate layer. In the same manner as in Example 2, an optical element molding die was manufactured. The Vickers hardness and glass moldability of this mold were measured and found to be the same as in Example 2. Table 3 shows the results.

[0052]

[Table 3]

Example 11 Instead of forming the hard carbon film of the surface layer in Example 2, Pt, Pd, Ir,
An optical element molding die was manufactured in the same manner as in Example 2, except that a binary alloy of a combination of Rh, Os, Ru, Re, Au, W, and Ta was formed to a thickness of 0.5 μm. The Vickers hardness and glass moldability of this mold were measured and found to be the same as in Example 2. Table 4 shows the results.

[0054]

[Table 4]

(Example 12) In Example 2, instead of using a cemented carbide mainly composed of WC as the base material of the molding die,
Except for using oxide ceramics mainly composed of alumina or zirconia, silicon carbide, silicon nitride, carbide / nitride ceramics mainly composed of titanium carbide or titanium nitride, molybdenum, tungsten or metal mainly composed of tantalum. In the same manner as in Example 2, an optical element molding die is manufactured. The Vickers hardness and glass moldability of this mold were measured and found to be the same as in Example 2. Table 5 shows the results.

[0056]

[Table 5]

In the embodiment of the present invention, the components are changed in the base material, the processed layer, the intermediate layer, and the surface layer. However, it is needless to say that the same effect can be obtained by combining these.

[0058]

As described above, in particular, oxide-based ceramics whose base material is mainly alumina or zirconia, carbides whose main components are silicon carbide, silicon nitride, titanium carbide, titanium nitride or tungsten carbide. By using nitride-based ceramics, metal containing molybdenum, tungsten or tantalum as a main component, and cemented carbide containing tungsten carbide as a main component, it has hardness enough to withstand press forming. Ni), one selected from cobalt (Co) and iron (Fe), and copper (Cu), silicon (Si), titanium (Ti), chromium (Cr), zirconium (Zr), niobium (Nb) , Molybdenum (Mo), hafnium (Hf), tantalum (T
a) and an alloy with one selected from tungsten (W), a mixture of the alloy and a carbide of the alloy, or a mixture of the alloy with a nitride, or a mixture of the alloy with a carbonitride, or Nickel (Ni), cobalt (C
o) and one selected from iron (Fe) and phosphorus (P)
Or a mixture of the alloy with a carbide of the alloy, or a mixture with a nitride of the alloy, or a mixture with a carbonitride of the alloy, or nickel (Ni), cobalt (Co) and One selected from iron (Fe), copper (Cu), silicon (Si), titanium (Ti),
Chromium (Cr), zirconium (Zr), niobium (N
b) one selected from molybdenum (Mo), hafnium (Hf), tantalum (Ta) and tungsten (W), and a ternary alloy of phosphorus (P), or a mixture of the alloy and a carbide of the alloy; Or by a mixture with a nitride of the alloy, or a mixture with a carbonitride of the alloy,
Cutting and uniform polishing with a diamond tool or the like can be easily performed into a desired shape, and a hardness that does not deform even when pressure is applied during molding is obtained. Then, on the processed layer, a hard carbon film or platinum (Pt), palladium (Pd), iridium (Ir), rhodium (R
h) by forming at least one metal or alloy thin film selected from osmium (Os), ruthenium (Ru), rhenium (Re), gold (Au), tungsten (W) and tantalum (Ta). It was possible to obtain an optical element molding die which was hardly damaged and excellent in mold releasability from glass.
Further, as an intermediate layer between the processed layer and the surface layer, one kind of carbide selected from titanium, tantalum, chromium, and silicon;
By forming a nitride or a carbonitride, the hardness was further improved.

[Brief description of the drawings]

FIG. 1 is a schematic sectional view of an optical element molding die according to Example 1 of the present invention.

FIG. 2 is a schematic sectional view of an optical element molding die according to Example 2 of the present invention.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Mold base material 2 Working layer 3 Intermediate layer 4 Surface layer

 ────────────────────────────────────────────────── ─── Continued on the front page (72) Inventor Nobuhiro Yamamichi 3-30-2 Shimomaruko, Ota-ku, Tokyo Inside Canon Inc. (72) Inventor Nao Miyazaki 3-30-2 Shimomaruko, Ota-ku, Tokyo Canon Co., Ltd. F-term (reference) 4G015 HA01

Claims (9)

[Claims] 1. A molding die having a transfer surface for forming an optical element on a part of a base material, wherein the transfer surface is formed of a metal or a metal and a metal carbide thereof formed on the base material. A, or a processed layer processed with a desired shape and accuracy mainly containing a mixture of a metal and a metal nitride thereof, or a mixture of a metal and a metal carbonitride formed on the processed layer, An optical element molding die having a surface layer mainly composed of a hard carbon film or a noble metal alloy film. 2. The optical device according to claim 1, further comprising an intermediate layer mainly composed of one selected from a metal carbide, a metal nitride, and a metal carbonitride, between the processed layer and the surface layer. Element molding die. 3. The base material is an oxide ceramic containing alumina or zirconia as a main component, silicon carbide, silicon nitride,
Titanium carbide, titanium nitride or carbide / nitride-based ceramics containing tungsten carbide as a main component, cemented carbide containing tungsten carbide as a main component, metal containing molybdenum (Mo), tungsten (W) or tantalum (Ta) as a main component And the processing layer is made of nickel (Ni), cobalt (C
o) and one selected from iron (Fe) and copper (C
u), silicon (Si), titanium (Ti), chromium (C
r), zirconium (Zr), niobium (Nb), molybdenum (Mo), hafnium (Hf), tantalum (Ta)
And an alloy with one selected from tungsten (W),
Or a mixture of the alloy with a carbide of the alloy, or a mixture of the alloy with a nitride, or a mixture of the alloy with a carbonitride, or nickel (Ni), cobalt (C
o) and one selected from iron (Fe) and phosphorus (P)
Or a mixture of the alloy with a carbide of the alloy, or a mixture with a nitride of the alloy, or a mixture with a carbonitride of the alloy, or nickel (Ni), cobalt (Co) and One selected from iron (Fe), copper (Cu), silicon (Si), titanium (Ti),
Chromium (Cr), zirconium (Zr), niobium (N
b) one selected from molybdenum (Mo), hafnium (Hf), tantalum (Ta) and tungsten (W), and a ternary alloy of phosphorus (P), or a mixture of the alloy and a carbide of the alloy; Or a mixture with a nitride of the alloy or a mixture with a carbonitride of the alloy, and the surface layer is a hard carbon film, or platinum (Pt), palladium (P
d), iridium (Ir), rhodium (Rh), osmium (Os), ruthenium (Ru), rhenium (R
The optical element molding die according to claim 1, wherein the optical element is at least one metal or alloy thin film selected from e), gold (Au), tungsten (W), and tantalum (Ta). 4. The metal carbide, metal nitride or metal carbonitride of the intermediate layer is one kind of carbide, nitride or carbonitride selected from titanium, tartan, chromium and silicon. The optical molding die according to any one of the above. 5. An oxide ceramic mainly composed of alumina or zirconia as a base material, a carbide / nitride ceramic mainly composed of silicon carbide, silicon nitride, titanium carbide, titanium nitride or tungsten carbide, and tungsten carbide. On a cemented carbide as a component, a metal containing molybdenum, tungsten or tantalum as a main component, and the processed layer is one selected from nickel (Ni), cobalt (Co), and iron (Fe); Copper (Cu), silicon (Si),
Titanium (Ti), chromium (Cr), zirconium (Z
r), niobium (Nb), molybdenum (Mo), hafnium (Hf), tantalum (Ta), and tungsten (W)
Or a mixture of the alloy with a carbide of the alloy, or a mixture of the alloy with a nitride, or a mixture of the alloy with a carbonitride, or nickel (Ni), cobalt A binary alloy of one selected from (Co) and iron (Fe) and phosphorus (P), or a mixture of the alloy and a carbide of the alloy, or a mixture of a nitride of the alloy, or an alloy thereof Or one selected from nickel (Ni), cobalt (Co) and iron (Fe), and copper (Cu), silicon (Si), titanium (Ti), chromium ( Cr), zirconium (Zr), niobium (Nb), molybdenum (M
o), one selected from hafnium (Hf), tantalum (Ta) and tungsten (W), and phosphorus (P)
The original alloy, or a mixture of the alloy and a carbide of the alloy,
Or a mixture of the alloy with a nitride thereof, or a mixture of the alloy with a carbonitride, using a metal target as an inert gas or an inert gas and a nitrogen gas, or an inert gas and a methane gas, or an inert gas or a nitrogen gas. And a methane gas, and after the processed layer is cut into a desired shape and uniformly polished, a hard carbon film of a surface layer, platinum (Pt), palladium (P) is formed on the processed layer.
d), iridium (Ir), rhodium (Rh), osmium (Os), ruthenium (Ru), rhenium (R
e) A method for producing an optical element molding die, wherein at least one metal or alloy thin film selected from gold (Au), tungsten (W) and tantalum (Ta) is formed. 6. An intermediate layer of one kind of carbide, nitride or carbonitride selected from titanium, tartan, chromium and silicon is further formed between the processed layer and the surface layer.
3. The method for producing an optical element molding die according to item 1. 7. The method for manufacturing an optical element molding die according to claim 5, wherein when forming the processing layer by sputtering, the base material is heated to a molding temperature or higher to form the film. 8. The optical element molding die according to claim 5, wherein when forming the processing layer by sputtering, a film is formed by applying a voltage of −300 V or more to the base material at the start of the film formation. Production method. 9. An optical element having a free-form surface, molded using the optical element molding die according to claim 1. Description: