JP2000284295A - Method and apparatus for assembling substrate - Google Patents
Method and apparatus for assembling substrateInfo
- Publication number
- JP2000284295A JP2000284295A JP11089612A JP8961299A JP2000284295A JP 2000284295 A JP2000284295 A JP 2000284295A JP 11089612 A JP11089612 A JP 11089612A JP 8961299 A JP8961299 A JP 8961299A JP 2000284295 A JP2000284295 A JP 2000284295A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- substrates
- held
- bonded
- pressure plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
Landscapes
- Liquid Crystal (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、真空チャンバ内で
貼り合せる基板同士をそれぞれ保持して対向させ真空中
で間隔を狭めて貼り合わせる基板の組立方法とその装置
に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method and an apparatus for assembling substrates to be bonded in a vacuum chamber while holding and opposing the substrates to be bonded to each other and narrowing the gap in a vacuum.
【0002】[0002]
【従来の技術】液晶表示パネルの製造には、透明電極や
薄膜トランジスタアレイを付けた2枚のガラス基板を数
μm程度の極めて接近した間隔をもって接着剤(以下、
シール剤ともいう)で貼り合わせ(以後、貼り合せ後の
基板をセルと呼ぶ)、それによって形成される空間に液
晶を封止する工程がある。2. Description of the Related Art In manufacturing a liquid crystal display panel, an adhesive (hereinafter, referred to as a glass substrate) having two glass substrates provided with a transparent electrode and a thin film transistor array at an extremely close interval of about several micrometers.
There is a step of bonding together (hereinafter, the substrate after bonding is called a cell) by sealing with a liquid crystal in a space formed by the bonding.
【0003】この液晶の封止には、注入口を設けないよ
うにシール剤をクローズしたパターンに描画した一方の
基板上に液晶を滴下しておいて他方の基板を一方の基板
上に配置し真空中で上下の基板を接近させて貼り合せる
特開昭62−165622号公報で提案された方法や、
一方の基板上に注入口を設けるようにシール剤をパター
ン描画して真空中で基板の貼り合わせ後にシール剤の注
入口から注入する特開平10−26763号公報で提案
された方法などがある。In order to seal the liquid crystal, the liquid crystal is dropped on one of the substrates in which a sealing agent is drawn in a closed pattern so that no injection port is provided, and the other substrate is disposed on the one of the substrates. A method proposed in Japanese Patent Application Laid-Open No. 62-165622, in which the upper and lower substrates are brought close together in a vacuum,
There is a method proposed in Japanese Patent Application Laid-Open No. Hei 10-26763 in which a pattern is drawn on a sealant so as to provide an injection port on one of the substrates, and the substrates are bonded in a vacuum and then injected from the injection port of the sealant.
【0004】[0004]
【発明が解決しようとする課題】上記従来技術では、シ
ール剤のパターン描画の前後に係わらず、いずれも両基
板は真空中で貼り合わせている。真空中では、大気状態
時のように、基板を大気との圧力差で吸引吸着すること
ができない。In the above prior art, both substrates are bonded in a vacuum regardless of before and after the pattern drawing of the sealant. In a vacuum, the substrate cannot be suction-adsorbed due to a pressure difference from the atmosphere as in the atmospheric state.
【0005】上側に位置する基板(以下、上基板と呼
ぶ。)の端部を機械的に保持すると基板の中央部がたわ
み、そのたわみは最近の基板大型化,薄板化傾向が強ま
るにつれて大きくなっている。When the edge of a substrate located above (hereinafter referred to as an upper substrate) is mechanically held, the central portion of the substrate bends, and the deflection increases with the recent tendency of the substrate to become larger and thinner. ing.
【0006】上下各基板の周縁端部に設けた位置合わせ
マークを利用して位置決めを行うため、たわみが大きい
程両基板の端部同士の間隔は拡がり位置合わせができな
い。Since the positioning is performed by using the alignment marks provided on the peripheral edges of the upper and lower substrates, the larger the deflection, the wider the distance between the ends of the two substrates and the more the alignment becomes impossible.
【0007】更に、上基板のたわみで上基板の中央部が
周縁部よりも先に下側の基板(以下、下基板と呼ぶ。)
に接触するので、基板間隔を一定にする為に基板間に散
布されているスペーサが動き、基板上に形成されている
配向膜などを傷つけてしまう。Further, the lower substrate (hereinafter, referred to as the lower substrate) has a central portion of the upper substrate which is bent before the peripheral portion due to the deflection of the upper substrate.
Therefore, the spacers scattered between the substrates move in order to keep the distance between the substrates constant, thereby damaging the alignment film and the like formed on the substrates.
【0008】実際には貼り合せる上下の基板は同サイズ
なので、保持代がほとんど取れない状態にある。Actually, since the upper and lower substrates to be bonded are the same size, the holding margin is hardly removed.
【0009】それゆえ本発明の目的は、基板サイズが大
型化,薄板化しても真空中で高精度に同程度の基板同士
を貼り合せることが可能な基板の組立方法およびその装
置を提供することにある。SUMMARY OF THE INVENTION It is an object of the present invention to provide a method and apparatus for assembling a substrate capable of bonding substrates of the same degree with high precision in a vacuum even if the substrate size is increased and thinned. It is in.
【0010】[0010]
【課題を解決するための手段】上記目的を達成する本発
明の特徴とするところは、加圧板から上基板に静電吸着
力を作用させて加圧板に上基板を保持させて真空中で貼
り合わせを行うことにある。The feature of the present invention to achieve the above object is to apply an electrostatic attraction force from the pressing plate to the upper substrate to hold the upper substrate on the pressing plate and to adhere the substrate in a vacuum. The point is to make adjustments.
【0011】さらには、上基板を加圧板に大気中で吸引
吸着力で保持させ、減圧を進める過程で吸引吸着力が消
えた時に落下する上基板を加圧板から僅かに離れた程度
の位置に受け止めて、この上基板に加圧板から静電吸着
力を作用させて、再び加圧板に上基板を保持させて真空
中で貼り合わせを行なうことにある。Further, the upper substrate is held on the pressure plate by suction attraction in the atmosphere, and the upper substrate which falls when the suction attraction disappears in the process of decompression is moved to a position slightly away from the pressure plate. Then, an electrostatic attraction force is applied to the upper substrate from the pressing plate, and the upper substrate is again held by the pressing plate to perform bonding in a vacuum.
【0012】[0012]
【発明の実施の形態】以下,本発明の一実施形態を図に
基づいて説明する。DESCRIPTION OF THE PREFERRED EMBODIMENTS One embodiment of the present invention will be described below with reference to the drawings.
【0013】図1乃至図3において、本発明になる基板
組立装置は、液晶滴下部S1と基板貼合部S2から構成
され、この両部分は架台2上に隣接して配置される。架
台2の上方には基板貼合部S2を支持するフレーム3が
ある。また、架台2の上面には、XYθステージT1が
備えられている。Xステージ4aは、駆動モータ5によ
り、図面上で左右のX軸方向に、即ち、液晶滴下部S1
と基板貼合部S2間を往来できるようになっている。Y
ステージ4bはXステージ4a上にあり、駆動モータ6に
よりXステージと直交するY軸方向に往来できるように
なっている。θステージ4cはYステージ4b上にあり、
回転ベアリング7を介して駆動モータ8によりYステー
ジ4bに対して水平に回転可能になっていて、θステー
ジ4c上に基板を搭載するテーブル9が固定される。ま
た、Yステージ4bにプレート13で下チャンバ10が
固定されている。θステージ4cは、下チャンバ10に
対し回転ベアリング11と真空シール12を介して軸A
を回転中心として回転自由に取付けられ、θステージ4
cが回転しても下チャンバ10はつられて回転しない構
造としている。1 to 3, the substrate assembling apparatus according to the present invention comprises a liquid crystal dropping part S1 and a substrate bonding part S2, and these two parts are arranged adjacent to each other on the gantry 2. Above the gantry 2, there is a frame 3 that supports the substrate bonding portion S2. An XYθ stage T1 is provided on the upper surface of the gantry 2. The X stage 4a is driven by the drive motor 5 in the left and right X-axis directions on the drawing, that is, the liquid crystal dropping portion S1.
And the substrate bonding portion S2. Y
The stage 4b is on the X stage 4a, and can be moved by the drive motor 6 in the Y-axis direction orthogonal to the X stage. θ stage 4c is on Y stage 4b,
A table 9 on which a substrate is mounted is fixed on the θ stage 4c so as to be rotatable horizontally with respect to the Y stage 4b by a drive motor 8 via a rotary bearing 7. The lower chamber 10 is fixed to the Y stage 4b by a plate 13. stage 4c is connected to the lower chamber 10 via a rotary bearing 11 and a vacuum seal
Can be freely rotated about the center of rotation
Even if c rotates, the lower chamber 10 is suspended and does not rotate.
【0014】液晶滴下部S1は、テーブル9に保持され
た下基板1aに所望量の液晶剤を滴下するためのフレー
ム3から突出したブラケット14で支持されたディスペ
ンサ17とこれを上下移動させるためのZ軸ステージ1
5とそれを駆動するモータ16で構成される。下基板1
aをテーブル9上に保持搭載したXYθステージT1
は、液晶剤を滴下するディスペンサ17のノズル18に
対し、XおよびY方向に移動する。これにより、下基板1
a上の任意の個所に所望量の液晶剤が滴下される。The liquid crystal dropping section S1 is provided with a dispenser 17 supported by a bracket 14 protruding from the frame 3 for dropping a desired amount of liquid crystal agent onto the lower substrate 1a held on the table 9, and for moving the dispenser 17 up and down. Z axis stage 1
5 and a motor 16 for driving the same. Lower substrate 1
XYθ stage T1 holding a mounted on table 9
Moves in the X and Y directions with respect to the nozzle 18 of the dispenser 17 for dropping the liquid crystal agent. Thereby, the lower substrate 1
A desired amount of liquid crystal agent is dropped at an arbitrary position on a.
【0015】液晶滴下後の下基板1aを搭載保持したX
YθステージT1は基板貼合部S2の下部に駆動モータ
5によって移動する。X holding the lower substrate 1a after dropping the liquid crystal
The Yθ stage T1 is moved by the drive motor 5 below the substrate bonding portion S2.
【0016】基板貼合部S2では、上チャンバ21とそ
の内部の静電吸着板28がそれぞれ独立して上下動でき
る構造になっている。即ち、上チャンバ21は、リニア
ブッシュと真空シールを内蔵したハウジング30を有し
ており、シャフト29をガイドとしてフレーム2に固定
されたシリンダ22により上下のZ軸方向に移動する。The substrate bonding portion S2 has a structure in which the upper chamber 21 and the electrostatic attraction plate 28 therein can move up and down independently of each other. That is, the upper chamber 21 has a housing 30 containing a linear bush and a vacuum seal, and is moved in the vertical Z-axis direction by a cylinder 22 fixed to the frame 2 using the shaft 29 as a guide.
【0017】XYθステージT1が基板貼合部S2に移
動していて上チャンバ21が下降すると、下チャンバ1
0の周りに配置してあるOリング44に上チャンバ21
のフランジが接触し一体となり、この時真空チャンバと
して機能する状態になる。When the XYθ stage T1 is moved to the substrate bonding portion S2 and the upper chamber 21 is lowered, the lower chamber 1
O-ring 44 disposed around the upper chamber 21
Are brought into contact with each other and become integral with each other, and at this time, a state of functioning as a vacuum chamber is established.
【0018】Oリング44のつぶれ量は、上チャンバ2
1の下降停止位置を調整し、真空チャンバ内を真空に保
つことができ、かつ、最大の弾性が得られる程度に設定
する。The amount of collapse of the O-ring 44 depends on the upper chamber 2
The lowering stop position is adjusted so that the inside of the vacuum chamber can be kept at a vacuum and the maximum elasticity can be obtained.
【0019】ハウジング30は、上チャンバ21が下チ
ャンバ10と真空チャンバを形成して変形しても、シャ
フト29に対し真空漏れを起こさないで上下動可能な真
空シールを内蔵しているので、真空チャンバの変形がシ
ャフト29に与える力を吸収することができ、シャフト
29に固定され静電吸着板28を保持した加圧板27の
変形がほぼ防止でき、後述するように静電吸着板28に
保持された上基板1bとテーブル9に保持された下基板
1aとの平行を保って貼り合せが可能となる。The housing 30 has a built-in vacuum seal that can move up and down without causing a vacuum leak to the shaft 29 even if the upper chamber 21 forms a vacuum chamber with the lower chamber 10 and deforms. The deformation of the chamber can absorb the force applied to the shaft 29, and the deformation of the pressure plate 27 fixed to the shaft 29 and holding the electrostatic attraction plate 28 can be substantially prevented, and can be held at the electrostatic attraction plate 28 as described later. The bonded upper substrate 1b and the lower substrate 1a held on the table 9 can be bonded while maintaining the parallelism.
【0020】23は真空バルブ、24は配管ホースで図
示していない真空源に接続され、これらは真空チャンバ
を減圧し真空にする時に使用される。また、25はガス
パージバルブ、26はガスチューブで、N2やクリーンド
ライエアー等の圧力源に接続され、これらは真空チャン
バを大気圧に戻す時に使用される。Reference numeral 23 denotes a vacuum valve, and reference numeral 24 denotes a piping hose connected to a vacuum source (not shown), and these are used when the vacuum chamber is depressurized and evacuated. Reference numeral 25 denotes a gas purge valve, and reference numeral 26 denotes a gas tube, which is connected to a pressure source such as N 2 or clean dry air. These are used when returning the vacuum chamber to atmospheric pressure.
【0021】上基板1bは静電吸着板28の下面に密着
保持されるが、大気下において上基板1bは吸引吸着で
静電吸着板28に保持されるようになっている。即ち、
41は吸引吸着用継手、42は吸引チューブであり、図
示していない真空源に接続され、静電吸着板28面に
は、それにつながる複数の吸引孔が設けられている。The upper substrate 1b is held in close contact with the lower surface of the electrostatic attraction plate 28. Under the atmosphere, the upper substrate 1b is held by the electrostatic attraction plate 28 by suction. That is,
Reference numeral 41 denotes a suction / suction joint, and reference numeral 42 denotes a suction tube, which is connected to a vacuum source (not shown). The surface of the electrostatic suction plate 28 has a plurality of suction holes connected thereto.
【0022】尚、周りが大気の場合、静電吸着を併用し
てもよいし、静電吸着力が大きい場合は、吸引吸着を不
要としてもよい。When the surrounding area is the atmosphere, electrostatic suction may be used together, or when the electrostatic suction force is large, the suction suction may not be necessary.
【0023】静電吸着板28はシャフト29で支持され
た加圧板27に取付けられており、シャフト29はハウ
ジング31、32に固定されている。ハウジング31は
フレーム2に対してリニアガイド34で取付けられ、静
電吸着板28は上下動可能な構造になっている。その上
下駆動はフレーム2とつながるフレーム35上のブラケ
ット38に固定されたモータ40により行う。駆動の伝
達はボールねじ36とナットハウジング37で実行され
る。ナットハウジング37は荷重計33を介してハウジ
ング32とつながり、その下部の静電吸着板28と一体
で動作する。The electrostatic attraction plate 28 is attached to a pressure plate 27 supported by a shaft 29, and the shaft 29 is fixed to housings 31, 32. The housing 31 is attached to the frame 2 by a linear guide 34, and the electrostatic attraction plate 28 has a structure capable of moving up and down. The vertical drive is performed by a motor 40 fixed to a bracket 38 on a frame 35 connected to the frame 2. The transmission of the drive is executed by the ball screw 36 and the nut housing 37. The nut housing 37 is connected to the housing 32 via a load meter 33, and operates integrally with the electrostatic suction plate 28 below the nut 32.
【0024】従って、モータ40によってシャフト29
が下降し、上基板1bを保持した静電吸着板28が下降
し上基板1bがテーブル9上の下基板1aと密着して、加
圧力を与えることのできる構造となっている。この場
合、荷重計33は加圧力センサとして働き、逐次、フィ
ードバックされた信号を基にモータ40を制御すること
で、上下基板1a,1bに所望の加圧力を与えることが
可能となっている。Therefore, the shaft 29 is driven by the motor 40.
Is lowered, the electrostatic attraction plate 28 holding the upper substrate 1b is lowered, and the upper substrate 1b is brought into close contact with the lower substrate 1a on the table 9 to apply a pressing force. In this case, the load meter 33 functions as a pressing force sensor, and by sequentially controlling the motor 40 based on a signal fed back, a desired pressing force can be applied to the upper and lower substrates 1a and 1b.
【0025】下基板1aは重力方向の搭載なので、図2
に示すようにテーブル9に設けた位置決め部材81に押
付ローラ82による水平方向での押付けによる位置決め
の固定で十分であるが、貼り合わす直前の微小位置決め
の際、上基板1bが下基板1a上のシール剤や液晶剤と接
触した影響で下基板1aがずれたり持上がる可能性があ
ることや真空チャンバ内が減圧され真空になる過程で下
基板1aとテーブル9との間に入り込んでいる空気が逃
げて下基板1aが踊りずれる可能性があるので、テーブ
ル9に対しても静電吸着の機能を持たせても良い。そし
て、テーブル9に上下Z軸方向に移動できるピンを設け
接地しておくと、基板貼り合わせ後のセルの帯電防止と
テーブル9からのセル取り外しを容易に行なうことがで
きる。Since the lower substrate 1a is mounted in the direction of gravity, FIG.
As shown in the figure, it is sufficient to fix the positioning by pressing the positioning member 81 provided on the table 9 in the horizontal direction by the pressing roller 82, but at the time of the minute positioning immediately before bonding, the upper substrate 1b is placed on the lower substrate 1a. There is a possibility that the lower substrate 1a may shift or lift due to the contact with the sealing agent or the liquid crystal agent. Since there is a possibility that the lower substrate 1a may escape and fluctuate, the table 9 may be provided with a function of electrostatic attraction. If the table 9 is provided with pins that can move in the vertical Z-axis direction and is grounded, it is possible to easily prevent the cells from being charged after the substrates are bonded and to remove the cells from the table 9 easily.
【0026】図2に示す60は、静電吸着板28が吸引
吸着をしていて真空チャンバが減圧され吸引吸着力が消
えて上基板1bが落下するときに静電吸着板28の僅か
下の位置で受け止める受止爪で、上基板1bの2個の対
角の位置にあって下方に伸びたシャフト59で釣り下げ
た形に支持されている。具体的には、図3に示すよう
に、シャフト59は上チャンバ21のハウジング58を
介して真空シールされて回転と上下移動ができるように
なっている。即ち,シャフト59は、シャフト29に設
けたブラケット63に固定された昇降アクチェータ62
でシャフト29の上下移動とは独立してさらに上下に移
動できるだけでなく、回転アクチェータ61によって回
転できるようになっている。In FIG. 2, reference numeral 60 denotes a position slightly below the electrostatic attraction plate 28 when the upper substrate 1b falls when the vacuum chamber is depressurized and the suction attraction force disappears and the upper substrate 1b falls. The receiving claw is received at the position, and is supported by the shaft 59 extending downward at two diagonal positions of the upper substrate 1b. More specifically, as shown in FIG. 3, the shaft 59 is vacuum-sealed through the housing 58 of the upper chamber 21 so that it can rotate and move up and down. That is, the shaft 59 is provided with a lifting actuator 62 fixed to a bracket 63 provided on the shaft 29.
As a result, not only can the shaft 29 be moved up and down independently of the up and down movement, but also the shaft 29 can be rotated by the rotary actuator 61.
【0027】次に、基板を吸着する静電吸着板28につ
いて説明する。Next, the electrostatic attraction plate 28 for attracting a substrate will be described.
【0028】静電吸着板28は絶縁物の板であり、方形
の凹部を2個有していて、各凹部に内蔵された平板電極
を誘電体で覆ってその誘電体の主面が静電吸着板28の
下面と同一平面になっている。埋め込まれた各平板電極
はそれぞれ正負の直流電源に適宜なスイッチを介して接
続されている。The electrostatic attraction plate 28 is an insulating plate and has two rectangular concave portions. The flat electrode built in each concave portion is covered with a dielectric, and the main surface of the dielectric is electrostatic. It is flush with the lower surface of the suction plate 28. Each buried plate electrode is connected to a positive / negative DC power supply via an appropriate switch.
【0029】従って、各平板電極に正あるいは負の電圧
が印加されると、静電吸着板28の下面と同一平面にな
っている誘電体の主面に負あるいは正の電荷が誘起さ
れ、それら電荷によって上基板1bの透明電極膜との間
に発生するクーロン力で上基板1bが静電吸着される。
各平板電極に印加する電圧は同極でもよいしそれぞれ異
なる双極でもよい。Therefore, when a positive or negative voltage is applied to each plate electrode, a negative or positive charge is induced on the main surface of the dielectric which is flush with the lower surface of the electrostatic attraction plate 28, and The upper substrate 1b is electrostatically attracted by a Coulomb force generated between the upper substrate 1b and the transparent electrode film due to the electric charge.
The voltage applied to each plate electrode may be the same polarity or different bipolar electrodes.
【0030】次に、本基板組立装置で基板を貼り合わせ
る工程について説明する。Next, a step of bonding substrates by the present substrate assembling apparatus will be described.
【0031】先ず、テーブル9に上基板1bを保持した
治具を搭載し、駆動モータ5でXYθステージT1を基
板貼合部S2に移動させる。そこでモータ40によりシ
ャフト29を介して加圧板27や静電吸着板28を降下
させ、テーブル9上の上基板1bを吸引吸着させてか
ら、モータ40で上昇させて、上基板1bを待機状態と
する。First, the jig holding the upper substrate 1b is mounted on the table 9, and the XYθ stage T1 is moved by the drive motor 5 to the substrate bonding section S2. Then, the pressure plate 27 and the electrostatic attraction plate 28 are lowered by the motor 40 via the shaft 29, and the upper substrate 1b on the table 9 is sucked and adsorbed. I do.
【0032】XYθステージT1は液晶滴下部S1に戻
って、空になった治具が外されテーブル9上に下基板1
aが搭載され、図2に示すように所望位置に固定保持さ
れる。The XYθ stage T1 returns to the liquid crystal dropping unit S1 and the empty jig is removed, and the lower substrate 1 is placed on the table 9.
a is mounted and fixedly held at a desired position as shown in FIG.
【0033】図1には示していないが、フレーム3にシ
ール剤を吐出するデイスペンサがあって、XYθステー
ジT1の各モータ5,6で下基板1aをXY軸方向に移
動させつつシール剤を吐出させると、下基板1a上にク
ローズ(閉鎖)したパターンでシール剤を描画できる。
その後、デイスペンサ17から液晶剤を下基板1a上に
滴下する。この場合、シール剤がダムとなって、滴下し
た液晶剤は流失することはない。Although not shown in FIG. 1, there is a dispenser for discharging the sealant on the frame 3, and the sealant is discharged while moving the lower substrate 1a in the X and Y directions by the motors 5 and 6 of the XYθ stage T1. Then, the sealant can be drawn on the lower substrate 1a in a closed (closed) pattern.
Thereafter, a liquid crystal agent is dropped from the dispenser 17 onto the lower substrate 1a. In this case, the sealing agent does not function as a dam, and the dropped liquid crystal agent does not flow away.
【0034】次に、XYθステージT1を基板貼合部S
2に移動させ、シリンダ22で上チャンバ21を降下さ
せ、そのフランジ部21aをOリング44に当接させて
下チャンバ10と真空チャンバを形成させる。そして、
真空バルブ23を開放して真空チャンバ内を減圧してい
く。この時、上基板1bは静電吸着板28に吸引吸着さ
れた状態になっているので、減圧が進み真空化していく
と上基板1bに作用していた吸引吸着力は消えて行き、
上基板1bが自重で落下する。これを図2に示すように
受止爪60で受け止めて、図3に示すように静電吸着板
28の僅か下の位置に保持しておく。Next, the XYθ stage T1 is connected to the substrate bonding portion S
Then, the upper chamber 21 is lowered by the cylinder 22, and the flange portion 21a is brought into contact with the O-ring 44 to form the lower chamber 10 and the vacuum chamber. And
The vacuum valve 23 is opened to reduce the pressure inside the vacuum chamber. At this time, since the upper substrate 1b is in a state of being suction-adsorbed by the electrostatic attraction plate 28, as the decompression proceeds and the vacuum is applied, the suction-adsorbing force acting on the upper substrate 1b disappears,
The upper substrate 1b falls under its own weight. This is received by the receiving claw 60 as shown in FIG. 2 and is held at a position slightly below the electrostatic attraction plate 28 as shown in FIG.
【0035】真空チャンバ内が充分真空になった時点
で、静電吸着板28に電圧を印加して受止爪60上の上
基板1bを、静電吸着板28にクーロン力で吸引保持す
る。この場合、既に真空になっているので、静電吸着板
28と上基板1bの間に空気が残るようなことは無い
し、その空気が逃げるときに上基板1bが踊ることもな
い。より重要なことは空気を介在させることなく、静電
吸着板28に上基板1bが密着していることである。そ
のため、誘起電荷で放電を発生することがない。When the inside of the vacuum chamber becomes sufficiently vacuum, a voltage is applied to the electrostatic attraction plate 28 to hold the upper substrate 1b on the receiving claw 60 on the electrostatic attraction plate 28 by Coulomb force. In this case, since the vacuum has already been established, no air remains between the electrostatic attraction plate 28 and the upper substrate 1b, and the upper substrate 1b does not dance when the air escapes. More importantly, the upper substrate 1b is in close contact with the electrostatic attraction plate 28 without air. Therefore, no discharge is generated by the induced charge.
【0036】空気を残したまま放電を生じると空気が膨
張し、上基板1bを静電吸着板28から剥離させたり薄
ガラス製の上基板1bを破壊することがあるが、本実施
形態によれば空気が存在しないので、そのような異常事
故は発生しない。When a discharge is generated while leaving air, the air expands, and the upper substrate 1b may be peeled off from the electrostatic attraction plate 28 or the upper substrate 1b made of thin glass may be destroyed. Since no air is present, such abnormal accidents do not occur.
【0037】その後、昇降アクチェータ62でシャフト
59を下降させ、次に、回転アクチェータ61でシャフ
ト59を回転させ、受止爪60が上下両基板の貼り合わ
せの邪魔にならぬようにしてから、モータ40で加圧板
27を降下させ、荷重計33で加圧力を計測しつつモー
タ40を制御して上下両基板1a,1bを所望間隔に貼
り合わせる。After that, the shaft 59 is lowered by the lifting actuator 62, and then the shaft 59 is rotated by the rotating actuator 61 so that the receiving claw 60 does not hinder the bonding of the upper and lower substrates. The pressure plate 27 is lowered at 40 and the motor 40 is controlled while measuring the pressing force with the load meter 33 to bond the upper and lower substrates 1a and 1b at a desired interval.
【0038】この場合、上基板1bは静電吸着板28に
密着していて中央部が垂れ下がっていることはないか
ら、液晶剤中のスペーサに悪影響を与えたり、基板同士
の位置合わせが不可能になることはない。因みに、位置
合わせは図示を省略した上チャンバ21に設けた覗き窓
から画像認識カメラで上下各基板1a,1bに設けられ
ている位置合わせマークを読み取って画像処理により位
置を計測し、XYθステージT1の各ステージ4a乃至
4cを微動させて、高精度な位置合わせを行なう。In this case, since the upper substrate 1b is in close contact with the electrostatic attraction plate 28 and its central portion does not hang down, it adversely affects the spacers in the liquid crystal agent and makes it impossible to align the substrates. Never be. Incidentally, the alignment is performed by reading the alignment marks provided on the upper and lower substrates 1a and 1b with an image recognition camera from a viewing window provided in the upper chamber 21 (not shown), and measuring the position by image processing, and the XYθ stage T1 Each of the stages 4a to 4c is slightly moved to perform high-accuracy positioning.
【0039】貼り合わせが終了すると、真空バルブ23
を締めてガスパージバルブ25を開き、真空チャンバ内
にN2やクリーンドライエアーを供給し、大気圧に戻して
からガスパージバルブ25を閉じて、シリンダ22で上
チャンバ21を上昇させ、XYθステージT1を液晶滴
下部S1に戻して、テーブル9からセルを外し次の貼り
合わせに備える。ここで、貼合後のセルは帯電している
場合があるので、接地した除電バーに接触させたりイオ
ン風を吹き当てるなどの除電処理をしてから、テーブル
9からセルを外すと良い。テーブル9から外したセルは
下流のUV光照射装置や加熱装置などでシール剤が硬化
される。When the bonding is completed, the vacuum valve 23
, The gas purge valve 25 is opened, and N 2 or clean dry air is supplied into the vacuum chamber. After returning to the atmospheric pressure, the gas purge valve 25 is closed, the upper chamber 21 is raised by the cylinder 22, and the XYθ stage T1 is Returning to the liquid crystal dropping section S1, the cell is removed from the table 9 and the next lamination is prepared. Here, since the cell after bonding may be charged, it is preferable to remove the cell from the table 9 after performing a charge removal treatment such as contacting with a grounded charge removal bar or blowing ion wind. The sealing agent is hardened in the cell removed from the table 9 by a UV light irradiation device or a heating device on the downstream side.
【0040】以上の実施形態では、シール剤を吐出して
液晶を滴下し直ちに貼り合せに移行するので、基板が塵
埃を受けづらく生産歩留まりを向上できる。また、XY
θステージT1を上基板1bの真空チャンバ内への搬送
に利用でき、装置の小型化が図られている。In the above embodiment, since the sealing agent is discharged, the liquid crystal is dropped, and the process immediately proceeds to bonding, the production yield can be improved since the substrate is less likely to receive dust. Also, XY
The θ stage T1 can be used to transfer the upper substrate 1b into the vacuum chamber, and the size of the apparatus is reduced.
【0041】本発明は以上説明した実施形態に限らず、
以下の様に実施しても良い。The present invention is not limited to the embodiment described above.
You may implement as follows.
【0042】(1) 上基板1bの静電吸着板28への
供給は、XYθステージT1に上下方向に伸縮可能な複
数の受止爪(図2の受止爪60相当のもの)を設けてお
いて、XYθステージT1が液晶滴下部S1にあるとき
にその複数の受止爪上に上基板1bを載せて、XYθス
テージT1を基板貼合部S2に移動させるようにしても
よい。(1) For supplying the upper substrate 1b to the electrostatic attraction plate 28, a plurality of receiving claws (equivalent to the receiving claws 60 in FIG. 2) which can expand and contract in the vertical direction are provided on the XYθ stage T1. Here, when the XYθ stage T1 is at the liquid crystal dropping portion S1, the upper substrate 1b may be placed on the plurality of receiving claws, and the XYθ stage T1 may be moved to the substrate bonding portion S2.
【0043】(2) また、ロボットハンドから直接静
電吸着板28に吸引吸着をしてよい。(2) Further, the suction may be directly performed on the electrostatic suction plate 28 by the robot hand.
【0044】(3) 上記(1)で説明したXYθステ
ージT1に設けた受止爪で、減圧が進む際に落下する上
基板1bを受け止めるようにしてもよい。(3) The receiving claw provided on the XYθ stage T1 described in (1) above may receive the upper substrate 1b which falls as the pressure reduction proceeds.
【0045】(4) さらに、図2の受止爪60や上記
(1)で説明したXYθステージT1に設けた受止爪
で、上基板1bが落下する前に上基板1bを静電吸着板
28に押し付けておいて、静電吸着板28に吸引吸着さ
れた状態から減圧を進めて、静電吸着に切替えてもよ
い。この場合、物理的に上基板1bが静電吸着板28に
密着しているということがないようにしておくことで、
上基板1bと静電吸着板28の間の空気を減圧とともに
真空化することができる。(4) Further, the receiving claw 60 shown in FIG. 2 or the receiving claw provided on the XYθ stage T1 described in the above (1) is used to hold the upper substrate 1b before the upper substrate 1b falls. Alternatively, the pressure may be switched to the electrostatic attraction by advancing the pressure reduction from the state of being attracted and attracted to the electrostatic attraction plate 28 after being pressed against the electrostatic attraction plate 28. In this case, by preventing the upper substrate 1b from being physically in close contact with the electrostatic attraction plate 28,
The air between the upper substrate 1b and the electrostatic attraction plate 28 can be evacuated and reduced in pressure.
【0046】(5) さらにまた、図2の受止爪60や
上記(1)で説明したXYθステージT1に設けた受止
爪で、上基板1bを静電吸着板28から僅かに離れた位
置に保持しておいて、吸引吸着をしないで減圧を進める
途中で静電吸着を行なってもよい。(5) Further, the upper substrate 1b is slightly separated from the electrostatic attraction plate 28 by the receiving claw 60 of FIG. 2 or the receiving claw provided on the XYθ stage T1 described in the above (1). And the electrostatic attraction may be performed during the decompression without suction and attraction.
【0047】(6) また、図2では受止爪60により
上基板1bの2個の角部(対角を構成する2隅)を保持
しているが、上基板1bの4個の角部(4隅)を保持し
たり、上基板1bの4辺あるいは長手方向の2辺または
幅方向の2辺を適宜な手段で保持するようにしてもよ
い。(6) In FIG. 2, two corners (two corners forming a diagonal) of the upper substrate 1b are held by the receiving claws 60, but four corners of the upper substrate 1b are held. (Four corners) may be held, or four sides, two sides in the longitudinal direction, or two sides in the width direction of the upper substrate 1b may be held by appropriate means.
【0048】[0048]
【発明の効果】以上説明したように本発明によれば,基
板サイズが大型化,薄板化しても真空中で高精度に同程
度の基板同士を貼り合せることができる。As described above, according to the present invention, even if the size of the substrate is increased and the thickness of the substrate is reduced, it is possible to bond substrates of the same degree with high precision in a vacuum.
【図1】本発明の一実施形態を示す基板組立装置の概略
図である。FIG. 1 is a schematic view of a substrate assembling apparatus showing an embodiment of the present invention.
【図2】上下の各基板を貼り合わせるときの状況を示す
斜視図である。FIG. 2 is a perspective view showing a situation when upper and lower substrates are bonded together.
【図3】上基板に静電吸着力を作用させ上下両基板を貼
り合わせる直前の状況を示す要部の断面図である。FIG. 3 is a cross-sectional view of a main part showing a state immediately before the upper and lower substrates are bonded by applying an electrostatic attraction force to an upper substrate.
S2 基板貼合部 1a 下基板 1b 上基板 9 テーブル 10 下チャンバ 21 上チャンバ 23 真空バルブ 27 加圧板 28 静電吸着板 59 シャフト 61 回転アクチェータ 62 昇降アクチェータ S2 Substrate bonding portion 1a Lower substrate 1b Upper substrate 9 Table 10 Lower chamber 21 Upper chamber 23 Vacuum valve 27 Pressing plate 28 Electrostatic suction plate 59 Shaft 61 Rotating actuator 62 Elevating actuator
───────────────────────────────────────────────────── フロントページの続き (72)発明者 齊藤 正行 茨城県竜ヶ崎市向陽台5丁目2番 日立テ クノエンジニアリング株式会社開発研究所 内 (72)発明者 川隅 幸宏 茨城県竜ヶ崎市向陽台5丁目2番 日立テ クノエンジニアリング株式会社開発研究所 内 (72)発明者 三階 春夫 茨城県竜ヶ崎市向陽台5丁目2番 日立テ クノエンジニアリング株式会社開発研究所 内 (72)発明者 平井 明 茨城県竜ヶ崎市向陽台5丁目2番 日立テ クノエンジニアリング株式会社開発研究所 内 Fターム(参考) 2H088 FA01 FA10 FA16 FA30 HA01 2H089 NA49 NA60 QA11 2H090 JC12 LA02 5C094 AA14 AA42 AA43 AA55 BA43 GB01 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Masayuki Saito 5-2-2 Koyodai, Ryugasaki-shi, Ibaraki Pref. Hitachi Techno Engineering Co., Ltd. (72) Inventor Yukihiro Kawasumi 5-2-2 Koyodai, Ryugasaki-shi, Ibaraki (72) Inventor Haruo Mika 5-5-2 Koyodai, Ryugasaki-shi, Ibaraki Pref. Hitachi-Techno Engineering Co., Ltd. (72) Inventor Akira Hirai 5 Koyodai, Ryugasaki-shi, Ibaraki F-term (reference) No. 2 in Hitachi R & D Co., Ltd. Development Laboratory 2H088 FA01 FA10 FA16 FA30 HA01 2H089 NA49 NA60 QA11 2H090 JC12 LA02 5C094 AA14 AA42 AA43 AA55 BA43 GB01
Claims (5)
保持し、貼り合わせる他方の基板をテーブル上に保持し
て対向させ、いづれかの基板に設けた接着剤により真空
中で間隔を狭めて貼り合わせる基板の組立方法におい
て、 加圧板から一方の基板に静電吸着力を作用させて一方の
基板を加圧板に保持させて貼り合わせを行うことを特徴
とする基板の組立方法。1. A substrate to be bonded is held on the lower surface of a pressure plate, the other substrate to be bonded is held on a table and opposed to each other, and the gap is reduced in vacuum by an adhesive provided on any one of the substrates. What is claimed is: 1. A method for assembling substrates to be bonded, comprising: applying an electrostatic attraction force from a pressing plate to one of the substrates to hold one substrate on the pressing plate;
保持し、貼り合わせる他方の基板をテーブル上に保持し
て対向させ、いづれかの基板に設けた接着剤により真空
中で間隔を狭めて貼り合わせる基板の組立方法におい
て、 一方の基板を加圧板に大気中で吸引吸着力によって保持
させ、減圧を進める過程で吸引吸着力が消えて落下する
一方の基板を加圧板から僅かに離れた程度の位置に受け
止めて、この一方の基板に加圧板から静電吸着力を作用
させて加圧板に一方の基板を保持させて貼り合わせを行
なうことを特徴とする基板の組立方法。2. The substrate to be bonded is held on the lower surface of a pressure plate, the other substrate to be bonded is held on a table and opposed to each other, and the gap is reduced in vacuum by an adhesive provided on one of the substrates. In the method of assembling the substrates to be bonded, one substrate is held on the pressure plate by suction attraction in the air, and the suction attraction disappears in the process of decompression, and the other substrate that falls is slightly separated from the pressure plate. And applying the electrostatic attraction force to the one substrate from the pressing plate to hold the one substrate on the pressing plate for bonding.
保持し、貼り合わせる他方の基板をテーブル上に保持し
て対向させ、いづれかの基板に設けた接着剤により真空
中で間隔を狭めて貼り合わせる基板の組立方法におい
て、 一方の基板を加圧板に大気中で吸引吸着力によって保持
させるとともに押し当てておき、減圧を進める過程で吸
引吸着力が消える前後でこの一方の基板に加圧板から静
電吸着力を作用させて加圧板に一方の基板を引き続き保
持させて貼り合わせを行なうことを特徴とする基板の組
立方法。3. The substrate to be bonded is held on the lower surface of the pressure plate, the other substrate to be bonded is held on a table and opposed to each other, and the gap is reduced in vacuum by an adhesive provided on one of the substrates. In the method of assembling the substrates to be bonded, one of the substrates is held against the pressure plate by suction attraction in the atmosphere and pressed against the other, and before and after the suction attraction disappears in the process of decompression, the pressure is applied to this one substrate from the pressure plate. A method of assembling a substrate, wherein one of the substrates is continuously held on a pressure plate by applying an electrostatic attraction force to perform bonding.
下面に貼り合わせる一方の基板を保持し、貼り合わせる
他方の基板を真空チャンバ内の下方に位置するテーブル
上に保持して両基板を対向させ、いづれかの基板に設け
た接着剤により真空中で両基板の間隔を狭めて基板同士
を貼り合わせる基板の組立装置において、 加圧板に一方の基板を吸引吸着力で保持させる手段と静
電吸着力で保持させる手段を設け、真空チャンバ内の減
圧を進める過程で吸引吸着力が消えた時に落下する一方
の基板を加圧板から僅かに離れた程度の位置に受け止め
る手段あるいは加圧板に一方の基板を押し付ける手段を
設け、この受け止め手段あるいは押し付ける手段上に一
方の基板があるときに少なくとも静電吸着力を作用させ
て加圧板に一方の基板を保持させる手段を設けたことを
特徴とする基板の組立装置。4. A substrate to be bonded is held on the lower surface of a pressure plate located above in a vacuum chamber, and the other substrate to be bonded is held on a table located below in a vacuum chamber to hold both substrates. In a substrate assembling apparatus in which the distance between both substrates is reduced in a vacuum with an adhesive provided on one of the substrates and the substrates are attached to each other, a means for holding one of the substrates with a suction force by a pressure plate and an electrostatic device Providing means for holding by suction force, means for receiving one substrate that falls when suction suction force disappears in the process of decompression in the vacuum chamber at a position slightly away from the pressure plate or one of the pressure plates A means for pressing the substrate is provided, and when one of the substrates is on the receiving means or the pressing means, at least an electrostatic attraction force is applied to hold the one substrate on the pressing plate. A substrate assembling apparatus, characterized in that the substrate assembling means is provided.
下面に貼り合わせる一方の基板を保持し、貼り合わせる
他方の基板を真空チャンバ内の下方に位置するテーブル
上に保持して両基板を対向させ、いづれかの基板に設け
た接着剤により真空中で両基板の間隔を狭めて基板同士
を貼り合わせる基板の組立装置において、 テーブルは真空チャンバの内外間を水平に移動できるも
のであり、真空チャンバの外に位置したテーブル上の他
方の基板に接着剤を閉鎖したパターンに描画する手段
と、テーブル上における他方の基板上の接着剤の閉鎖し
たパターン内に液晶を滴下する手段を設け、加圧板に一
方の基板を吸引吸着力で保持させる手段と静電吸着力で
保持させる手段を設け、真空チャンバ内の減圧を進める
過程で吸引吸着力が消えた時に落下する一方の基板を加
圧板から僅かに離れた程度の位置に受け止める手段ある
いは加圧板に一方の基板を押し付ける手段を設け、この
受け止め手段あるいは押し付ける手段上に一方の基板が
あるときに少なくとも静電吸着力を作用させて加圧板に
一方の基板を保持させる手段を設けたことを特徴とする
基板の組立装置。5. A substrate to be bonded is held on the lower surface of a pressure plate located above in a vacuum chamber, and the other substrate to be bonded is held on a table located below in a vacuum chamber to hold both substrates together. In a substrate assembling apparatus in which two substrates are attached to each other in a vacuum by using an adhesive provided on one of the substrates to reduce the distance between the two substrates in a vacuum, the table can be moved horizontally between inside and outside of a vacuum chamber. A means for drawing an adhesive on the other substrate on the table located outside the chamber in a closed pattern; and a means for dropping liquid crystal in the closed pattern of the adhesive on the other substrate on the table. The pressure plate is provided with means for holding one substrate with suction and suction force and means for holding it with electrostatic suction force. Means for receiving one of the substrates to be lowered at a position slightly away from the pressure plate or means for pressing one of the substrates against the pressure plate are provided. A substrate assembling apparatus, comprising: means for holding one substrate on a pressing plate by applying an attraction force.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP08961299A JP3410983B2 (en) | 1999-03-30 | 1999-03-30 | Substrate assembly method and apparatus |
SG200001561A SG87888A1 (en) | 1999-03-30 | 2000-03-20 | Substrater assembling apparatus |
TW089105073A TW526367B (en) | 1999-03-30 | 2000-03-20 | Substrate assembling apparatus |
KR1020000015984A KR100360833B1 (en) | 1999-03-30 | 2000-03-29 | Substrate assembling apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP08961299A JP3410983B2 (en) | 1999-03-30 | 1999-03-30 | Substrate assembly method and apparatus |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
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