JP2000111702A - Antireflection film - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an antireflection film having good spectral reflectance characteristics in a wide band from near UV ray region to near IR ray region by using not only a special resin material but a conventionally used dielectric material. SOLUTION: This antireflection film is produced by laminating two or more kinds of substances having different refractive indices on the surface of optical parts 10. In this film, the high refractive index material H having >=1.6 refractive index and low refractive index material L having <=1.5 refractive index are laminated into 14 layers in such a manner that, from the surface of the optical parts 10 to the air side, layers of odd numbers 11, 13, 15, 17, 19, 21, 23 are made of H and layers of even numbers 12, 14, 16, 18, 20, 22, 24 are made of L.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an antireflection film formed by laminating two or more substances having different refractive indices on the surface of an optical component, and more particularly, to a near-ultraviolet light region to a near-infrared light region. The present invention relates to an antireflection film having a wide band.

[0002]

2. Description of the Related Art An optical element represented by a lens, a prism, a filter, or the like can improve light use efficiency,
It is common practice to provide an antireflection film on the surface of an optical element for the purpose of preventing the function from being impaired by stray light due to the reflected light on the surface of the optical element. In particular, in recent years, with the progress of computerization of optical equipment, the frequency of using an optical element provided with such an antireflection film in an optical system using an imaging device such as a CCD has increased. And CCD
Since the sensitivity of the near-infrared light region of about 1 μm rather than the visible light region is good, the optical element having good transmittance characteristics not only in the visible light region of 400 to 700 nm but also in the near-infrared light region. Needs are growing. The high sensitivity in the near-infrared light region is not limited to CCDs, but also applies to other imaging devices using Si, and solar cell panels similarly using Si for the substrate. The antireflection films conventionally used for these optical elements have a narrow antireflection band, so that it was not possible to obtain good spectral reflectance characteristics over the entire wavelength range used.

Therefore, as an anti-reflection film for solving the above-mentioned problem, for example, a technique disclosed in Japanese Patent Application Laid-Open No. 9-96901 is disclosed. This technique uses a transparent substrate 111 made of quartz (refractive index 1, 48) as shown in FIG.
A first layer 113 made of magnesium fluoride (refractive index: 1.38) and a special fluororesin having a very low refractive index of 1.25 or less (AF manufactured by DuPont) are formed thereon.
2400 (trade name)) to obtain a broadband antireflection film. This antireflection film has a spectral reflectance characteristic of a reflectance of 1% or less in a wavelength range of 300 to 1000 nm.

[0004]

However, the above prior art has the following problems. That is, the fluororesin used in the antireflection film of the above-described conventional technology significantly changes optical characteristics such as a refractive index and an absorption coefficient depending on film forming conditions, and complicates management of a production process. Was low. In addition, there is a problem that the price is very high and the cost is increased.

[0005] The present invention has been made in view of the above-mentioned conventional problems, and an object of the invention according to claim 1 or 2 is to use not only a special resin material but also a dielectric material which has been used conventionally. An object of the present invention is to provide an antireflection film having good spectral reflectance characteristics in a wide band from the near ultraviolet region to the near infrared region.

[0006]

Means for Solving the Problems In order to solve the above problems, the invention according to claim 1 is directed to an antireflection film formed by laminating two or more kinds of substances having different refractive indexes on the surface of an optical component. A high-refractive-index substance having a refractive index of 1.6 or more is H, a low-refractive-index substance having a refractive index of 1.5 or less is L, and the odd-numbered layer is H and the even-numbered layer is H from the surface side of the optical component to the air side. As L, 14 layers were sequentially laminated. The invention according to claim 2 is
In an antireflection film formed by laminating two or more types of substances having different refractive indexes on the surface of an optical component, a high refractive index substance is H,
When the low refractive index material is L and the design wavelength is λ, the first layer (H) has an optical thickness of 0.3 × λ / 4 or less and the second layer (L) in order from the surface side of the optical component to the air side. Optical film thickness 0.75 × λ / 4 or less Third layer (H) Optical film thickness 0.25 × λ / 4 or more, 0.7
5 × λ / 4 or less Fourth layer (L) optical thickness 0.3 × λ / 4 or less Fifth layer (H) optical thickness 0.25 × λ / 4 or more, 1.2
5 × λ / 4 or less Sixth layer (L) Optical film thickness 0.1 × λ / 4 or more, 0.5 ×
λ / 4 or less Seventh layer (H) Optical film thickness 0.1 × λ / 4 or more, 0.5 ×
λ / 4 or less Eighth layer (L) Optical film thickness 1 × λ / 4 or more, 2 × λ / 4 or less Ninth layer (H) Optical film thickness 0.1 × λ / 4 or more, 0.5 ×
λ / 4 or less Tenth layer (L) Optical film thickness 0.1 × λ / 4 or more, 0.5
× λ / 4 or less Eleventh layer (H) Optical film thickness 0.5 × λ / 4 or more, 1.2
5 × λ / 4 or less 12th layer (L) optical thickness 0.3 × λ / 4 or less 13th layer (H) optical thickness 0.25 × λ / 4 or more 1 ×
λ / 4 or less Fourteenth layer (L) Optical film thickness 0.5 × λ / 4 or more, 1.2
The layers are stacked in 14 layers with a film thickness of 5 × λ / 4 or less.

In the antireflection film according to the first aspect of the present invention, a high refractive index material having a refractive index of 1.6 or more is H and a refractive index is 1.5.
The following low-refractive-index materials are L, and from the surface side of the optical component to the air side, the odd-numbered layers are H and the even-numbered layers are L, and 14 layers are sequentially laminated, and the thickness of each layer is further optimized. Thereby, a high antireflection function with a reflectance of 1% or less is exhibited in at least a wide band of near-ultraviolet light region and visible light region or visible light region and near-infrared light region.
In the antireflection film according to the second aspect of the present invention, the number of layers functioning as an antireflection film is set to 14 and the thickness of each layer is optimized, so that at least the near-ultraviolet region and the visible region, or the visible region. It exhibits a high antireflection function with a reflectance of 1% or less in a wide band of light region and near-infrared light region.

[0008]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, specific embodiments will be described.
Will be explained. Here, the high refractive index substance H and the low refractive index substance L
Need not be one type of substance each, for example,
Low refractive index material L of 12th layer and low refractive index material of 14th layer
It may be a substance different from L. Also, high refractive index material
H and the low refractive index substance L each have a refractive index of 1.6 or more.
TiO_Two, Ta_TwoO_Five, Nb_TwoO_Five, ZrO_Two, HfO
_Two, Y_TwoO_Three, Al_TwoO_Three, WO _Three, MoO_ThreeOr refraction
SiO with a ratio of 1.5 or less_Two, MgF_TwoOxides such as
It is best to use nitrides in consideration of productivity, etc.
is there. However, for the purpose of obtaining a broadband anti-reflection effect
Means that the material is not limited to these
Fluororesin having a refractive index of 1.5 or less as the substance L (for example,
For example, a tree such as AF2400 (trade name) manufactured by DuPont
There is no problem even if a fat material or the like is used.

In the film forming method, not only a dry process typified by a vacuum evaporation method or a sputtering method can be applied, but also a dipping method or the like can be used, as long as the film thickness can be controlled. . The antireflection film of the present invention is composed of 14 layers, and does not significantly contribute to the optical characteristics of the 14 layers. Another layer may be provided between the optical component and the first layer, or further above the fourteenth layer, or for the purpose of enhancing the water repellency and antifogging property of the surface (the outermost layer). There is no problem at all even if the adhesion strength of any of the layers is increased or the effect of increasing the water repellency or antifogging property is given. In the case of a film configuration other than 14 layers, as a result of an experiment, the spectral reflectance characteristics deteriorated when the number of layers was 12 or less, and the spectral reflectance characteristics and productivity deteriorated when the number of layers was 16 or more. could not. In this embodiment, a lens is used as an example of an optical component. However, the present embodiment can be applied to a prism or a filter.

(Embodiment 1) FIG. 1 shows Embodiments 1 to 6.
FIG. 2 is a schematic view of an optical component and an antireflection film laminated on the surface of the optical component. FIG. 2 is a table showing the first embodiment and showing a spectral reflectance characteristic of the antireflection film.

In FIG. 1, a glass lens 10 as an optical component is made of a glass material having a refractive index of 1.52, and 14 antireflection films are formed on the surface thereof.
An optical element on which four layers 24 are formed is schematically illustrated.

A method for manufacturing the antireflection film will be described. After placing the glass lens 10 in a vacuum chamber and evacuating it to 1 × 10 ⁻⁴ Pa, ZrO as a high-refractive-index substance H is deposited on the glass lens 10 from the glass lens substrate side by electron beam evaporation.
₂ and MgF ₂ as the low-refractive-index substance L were sequentially formed into seven layers each, for a total of 14 layers.

The optical thickness of each layer is as follows, assuming that λ = 600 nm. First layer 11 ZrO ₂ 0.224 × λ / 4 Second layer 12 MgF ₂ 0.332 × λ / 4 Third layer 13 ZrO ₂ 0.660 × λ / 4 Fourth layer 14 MgF ₂ 0.111 × λ / 4 Fifth layer 15 ZrO ₂ 0.992 × λ / 4 Sixth layer 16 MgF ₂ 0.277 × λ / 4 Seventh layer 17 ZrO ₂ 0.277 × λ / 4 Eighth layer 18 MgF ₂ 1.597 × λ / 4 9th layer 19 ZrO ₂ 0.212 × λ / 4 10th layer 20 MgF ₂ 0.288 × λ / 4 11th layer 21 ZrO ₂ 0.972 × λ / 4 12th layer 22 MgF ₂₀ .111 × λ / 4 13th layer 23 ZrO ₂ 0.538 × λ / 4 14th layer 22 MgF ₂ 0.938 × λ / 4

The spectral reflectance characteristics of the thus-prepared antireflection film in the range of the wavelength of normal incident light of 300 to 1000 nm were measured. As shown in FIG.
A good spectral reflectance characteristic of a reflectance of 0.5% or less was obtained in the entire wavelength range of 0 to 870 nm, that is, in the near ultraviolet region to the near infrared region.

Further, this optical element is left at -40 ° C. for 1 hour under the condition of 95% relative humidity, left at 80 ° C. for 30 minutes, left for 1 hour, and then for another 30 minutes. A heat cycle test was repeated for 3 days, in which a cycle in which the temperature was lowered to −40 ° C. and then left for 1 hour was repeated. After performing this test, the appearance of the antireflection film of the present embodiment was observed with an optical microscope (magnification: 50 times). As a result, no change such as crack generation was observed, and the spectral reflectance was similarly measured after the test. When the characteristics were measured, there was no change in the characteristics before and after the test, and a favorable spectral reflectance characteristic of a reflectance of 0.5% was maintained over the entire wavelength range of 390 to 870 nm.

According to the present embodiment, an antireflection film having good spectral reflectance characteristics in a wide band from near-infrared light region to near-ultraviolet light region by using a conventionally used dielectric material. Can be obtained.

(Embodiment 2) FIG. 3 is a table showing Embodiment 2 and showing the spectral reflectance characteristics of an antireflection film. The basic configuration of the optical component of the present embodiment and the 14-layer antireflection film laminated on the surface thereof is the same as that of the first embodiment, and therefore will be described with reference to FIG.

In FIG. 1, a glass lens 10 as an optical component is made of a glass material having a refractive index of 1.52, and 14 antireflection films are formed on the surface thereof to form a first layer 11 to a first layer 11.
An optical element on which four layers 24 are formed is schematically illustrated.

A method for manufacturing the antireflection film will be described. After placing the glass lens 10 in a vacuum chamber and evacuating to 1 × 10 ⁻⁴ Pa, Ta ₂ as a high-refractive-index substance H was deposited on the glass lens 10 from the glass lens substrate side by electron beam evaporation.
O ₅ and SiO ₂ as the low-refractive-index substance L are sequentially formed into six layers, and TaO ₅ and M as the low-refractive-index substance L are further formed.
gF ₂ was deposited one by one to form a total of 14 layers.

The optical thickness of each layer is as follows, assuming that λ = 500 nm. First layer 11 Ta ₂ O ₅ 0.195 × λ / 4 Second layer 12 SiO ₂ 0.407 × λ / 4 Third layer 13 Ta ₂ O ₅ 0.610 × λ / 4 Fourth layer 14 SiO ₂₀ .174 × λ / 4 Fifth layer 15 Ta ₂ O ₅ 0.857 × λ / 4 Sixth layer 16 SiO ₂ 0.336 × λ / 4 Seventh layer 17 Ta ₂ O ₅ 0.263 × λ / 4 8 layer 18 SiO ₂ 1.386 × λ / 4 ninth layer _{19 Ta 2 O 5 0.202 × λ} / 4 10th layer 20 SiO ₂ 0.336 × λ / 4 11th layer 21 Ta ₂ O ₅ 1. 123 × λ / 4 12th layer 22 SiO ₂ 0.106 × λ / 4 13th layer 23 Ta ₂ O ₅ 0.504 × λ / 4 14th layer 24 MgF ₂ 0.938 × λ / 4

When the spectral reflectance characteristics of the thus-prepared antireflection film in the range of the wavelength of normal incident light of 300 to 800 nm were measured, as shown in FIG.
Good spectral reflectance characteristics of a reflectance of 0.4% or less could be obtained in the entire wavelength range of ７710 nm, that is, in the near ultraviolet region to the visible region.

Further, a heat cycle test was continuously performed on this optical element for 3 days at a temperature of -40 ° C. to 80 ° C. and a relative humidity of 95%, as in the first embodiment.
No change was observed in the appearance and properties of the antireflection film.

According to the present embodiment, an antireflection film having good spectral reflectance characteristics in a wide band from the near ultraviolet region to the visible region is obtained by using a conventionally used dielectric material. be able to.

(Embodiment 3) FIG. 4 is a table showing Embodiment 3 and showing the spectral reflectance characteristics of an antireflection film. The basic configuration of the optical component of the present embodiment and the 14-layer antireflection film laminated on the surface thereof is the same as that of the first embodiment, and therefore will be described with reference to FIG.

In FIG. 1, a plastic lens 10 as an optical component is made of polymethyl methacrylate (PMMA) having a refractive index of 1.49. On this surface, 14 antireflection films are formed. The optical element on which the fourteenth layer 24 is formed is schematically illustrated.

A method for manufacturing an antireflection film will be described. After putting the plastic lens 10 in a vacuum chamber and evacuating it to 1 × 10 ⁻⁴ Pa, Ta ₂ O ₅ as a high refractive index substance H and a low refractive index are deposited on the plastic lens 10 from the plastic lens substrate side by electron beam evaporation. Si as substance L
A total of 14 layers of O ₂ and 7 layers each were formed.

The optical thickness of each layer is as follows, with λ = 500 nm. First layer 11 Ta ₂ O ₅ 0.163 × λ / 4 Second layer 12 SiO ₂ 0.427 × λ / 4 Third layer 13 Ta ₂ O ₅ 0.517 × λ / 4 Fourth layer 14 SiO ₂₀ .155 × λ / 4 Fifth layer 15 Ta ₂ O ₅ 1.138 × λ / 4 Sixth layer 16 SiO ₂ 0.249 × λ / 4 Seventh layer 17 Ta ₂ O ₅ 0.330 × λ / 4 8 layer 18 SiO ₂ 1.391 × λ / 4 ninth layer _{19 Ta 2 O 5 0.129 × λ} / 4 10th layer 20 SiO ₂ 0.417 × λ / 4 11th layer 21 Ta ₂ O ₅ 0. 775 × λ / 4 12th layer 22 SiO ₂ 0.117 × λ / 4 13th layer 23 Ta ₂ O ₅ 0.703 × λ / 4 14th layer 24 SiO ₂ 0.943 × λ / 4

When the spectral reflectance characteristics of the thus-prepared antireflection film in the range of the wavelength of the vertically incident light of 300 to 800 nm were measured, as shown in FIG.
A good spectral reflectance characteristic of a reflectance of 0.6% or less was obtained in the entire wavelength range of ７710 nm, that is, in the near ultraviolet region to the visible region.

Further, this optical element was subjected to a heat cycle test for three consecutive days at a temperature of -40 ° C. to 80 ° C. and a relative humidity of 95%, as in the first embodiment.
No change was observed in the appearance and properties of the antireflection film.

According to the present embodiment, an antireflection film having good spectral reflectance characteristics in a wide band from the near ultraviolet region to the visible region is obtained by using a conventionally used dielectric material. be able to.

(Embodiment 4) FIG. 5 shows Embodiment 4 and is a table showing the spectral reflectance characteristics of an antireflection film. The basic configuration of the optical component of the present embodiment and the 14-layer antireflection film laminated on the surface thereof is the same as that of the first embodiment, and therefore will be described with reference to FIG.

In FIG. 1, a glass lens 10 as an optical component is made of a glass material having a refractive index of 1.52, and on its surface, 14 antireflection films are formed.
An optical element on which a layer 24 is formed is schematically illustrated.

The method for manufacturing the antireflection film will be described. After placing the glass lens 10 in a vacuum chamber and evacuating to 1 × 10 ⁻⁴ Pa, Ta ₂ as a high-refractive-index substance H was deposited on the glass lens 10 from the glass lens substrate side by electron beam evaporation.
O ₅ and SiO ₂ as the low-refractive-index substance L are sequentially formed into six layers, and TaO ₅ and M as the low-refractive-index substance L are further formed.
gF ₂ was deposited one by one to form a total of 14 layers.

The optical thickness of each layer is as follows, assuming that λ = 500 nm. First layer 11 Ta ₂ O ₅ 0.172 × λ / 4 Second layer 12 SiO ₂ 0.429 × λ / 4 Third layer 13 Ta ₂ O ₅ 0.536 × λ / 4 Fourth layer 14 SiO ₂₀ .158 × λ / 4 Fifth layer 15 Ta ₂ O ₅ 1.045 × λ / 4 Sixth layer 16 SiO ₂ 0.271 × λ / 4 Seventh layer 17 Ta ₂ O ₅ 0.307 × λ / 4 8 layer 18 SiO ₂ 1.376 × λ / 4 ninth layer _{19 Ta 2 O 5 0.169 × λ} / 4 10th layer 20 SiO ₂ 0.341 × λ / 4 11th layer 21 Ta ₂ O ₅ 1. 102 × λ / 4 12th layer 22 SiO ₂ 0.077 × λ / 4 13th layer 23 Ta ₂ O ₅ 0.538 × λ / 4 14th layer 24 MgF ₂ 0.938 × λ / 4

The spectral reflectance characteristics of the thus-prepared antireflection film in the range of the wavelength of normal incident light of 300 to 800 nm were measured, and as shown in FIG.
The reflectance is 1% or less, particularly 400 to 68, in the entire wavelength range of from about 710 nm to about 710 nm, that is, in the near ultraviolet range to the visible range.
In the visible light region of 0 nm, favorable spectral reflectance characteristics of a reflectance of 0.25% or less could be obtained.

A heat cycle test was performed on the optical element for three consecutive days at a temperature of -40 ° C. to 80 ° C. and a relative humidity of 95%, as in the first embodiment.
No change was observed in the appearance and properties of the antireflection film.

According to the present embodiment, the reflectance is 1% or less, particularly 400 to 400, in a wide band from the near ultraviolet region to the visible region by using a conventionally used dielectric material.
In the visible light region of 680 nm, it is possible to obtain an antireflection film having excellent spectral reflectance characteristics of a reflectance of 0.25% or less.

(Embodiment 5) FIG. 6 is a table showing Embodiment 5 and showing the spectral reflectance characteristics of an antireflection film. The basic configuration of the optical component of the present embodiment and the 14-layer antireflection film laminated on the surface thereof is the same as that of the first embodiment, and therefore will be described with reference to FIG.

In FIG. 1, a glass lens 10 as an optical component is made of a glass material having a refractive index of 1.8, and 14 antireflection films are formed on the surface thereof to form first to eleventh layers 24. 1 schematically illustrates a coated optical element.

The method for manufacturing the antireflection film will be described. After placing the glass lens 10 in a vacuum chamber and evacuating to 1 × 10 ⁻⁴ Pa, Ta ₂ as a high-refractive-index substance H was deposited on the glass lens 10 from the glass lens substrate side by electron beam evaporation.
O ₅ and MgF ₂ as the low-refractive-index substance L were sequentially formed into seven layers each, and a total of 14 layers were formed.

The optical thickness of each layer is as follows, with λ = 700 nm. First layer 11 Ta ₂ O ₅ 0.219 × λ / 4 Second layer 12 MgF ₂ 0.146 × λ / 4 Third layer 13 Ta ₂ O ₅ 0.471 × λ / 4 Fourth layer 14 MgF ₂₀ .183 × λ / 4 Fifth layer 15 Ta ₂ O ₅ 0.471 × λ / 4 Sixth layer 16 MgF ₂ 0.344 × λ / 4 Seventh layer 17 Ta ₂ O ₅ 0.241 × λ / 4 Eighth layer 18 MgF ₂ 1.868 × λ / 4 Ninth layer 19 Ta ₂ O ₅ 0.277 × λ / 4 Tenth layer 20 MgF ₂ 0.277 × λ / 4 Eleventh layer 21 Ta ₂ O ₅ 168 × λ / 4 12th layer 22 MgF ₂ 0.107 × λ / 4 13th layer 23 Ta ₂ O ₅ 0.382 × λ / 4 14th layer 24 MgF ₂ 0.845 × λ / 4

The spectral reflectance characteristics of the thus-prepared antireflection film when the wavelength of the vertically incident light was in the range of 300 to 1200 nm were measured. As shown in FIG.
Good spectral reflectance characteristics of a reflectance of 0.5% or less were obtained in the entire wavelength range of 0 to 980 nm, that is, in the visible light region to the near infrared light region.

Further, a heat cycle test was performed on the optical element for three consecutive days at a temperature of -40 ° C. to 80 ° C. and a relative humidity of 95% as in the first embodiment.
No change was observed in the appearance and properties of the antireflection film.

According to the present embodiment, an antireflection film having good spectral reflectance characteristics in a wide band from the visible light region to the near infrared light region is formed by using a conventionally used dielectric material. Obtainable.

(Embodiment 6) FIG. 7 shows Embodiment 6 and is a table showing the spectral reflectance characteristics of an antireflection film. The basic configuration of the optical component of the present embodiment and the 14-layer antireflection film laminated on the surface thereof is the same as that of the first embodiment, and therefore will be described with reference to FIG.

In FIG. 1, a glass lens 10 as an optical component is made of a glass material having a refractive index of 1.52, on which a 14-layer anti-reflection film is formed.
An optical element on which a layer 24 is formed is schematically illustrated.

The method for manufacturing the antireflection film will be described. After placing the glass lens 10 in a vacuum chamber and evacuating to 1 × 10 ⁻⁴ Pa, TiO as a high-refractive-index substance H is deposited on the glass lens 10 from the glass lens substrate side by electron beam evaporation.
₂ and SiO ₂ as the low-refractive-index substance L are sequentially formed into six layers, and TiO ₂ and Mg as the low-refractive-index substance L are further formed.
And F ₂ layer by layer, and a total of 14 layer deposition.

The optical thickness of each layer is as follows, assuming that λ = 500 nm. First layer 11 TiO ₂ 0.170 × λ / 4 Second layer 12 SiO ₂ 0.335 × λ / 4 Third layer 13 TiO ₂ 0.466 × λ / 4 Fourth layer 14 SiO ₂ 0.100 × λ / 4 Fifth layer 15 TiO ₂ 1.112 × λ / 4 Sixth layer 16 SiO ₂ 0.194 × λ / 4 Seventh layer 17 TiO ₂ 0.306 × λ / 4 Eighth layer 18 SiO ₂ 1.757 × λ / 4 9th layer 19 TiO ₂ 0.311 × λ / 4 10th layer 20 SiO ₂ 0.195 × λ / 4 11th layer 21 TiO ₂ 1.008 × λ / 4 12th layer 22 SiO ₂ 0 .158 × λ / 4 13th layer 23 TiO ₂ 0.350 × λ / 4 14th layer 24 MgF ₂ 0.851 × λ / 4

The spectral reflectance characteristics of the thus-prepared antireflection film when the wavelength of the normal incident light was in the range of 300 to 800 nm were measured. As shown in FIG.
The reflectance is 1% or less, particularly 325 to 50, in the entire wavelength range of from 700 nm to 700 nm, that is, in the near ultraviolet region to the visible region.
In the region of 0 nm, a favorable spectral reflectance characteristic of a reflectance of 0.5% or less could be obtained.

Further, this optical element was subjected to a heat cycle test for three consecutive days at a temperature of -40 ° C. to 80 ° C. and a relative humidity of 95% as in the first embodiment.
No change was observed in the appearance and properties of the antireflection film.

According to the present embodiment, the reflectance is 1% or less, particularly 325 to 280, in a wide band from the near ultraviolet region to the visible region by using a conventionally used dielectric material.
In the visible light region of 500 nm, it is possible to obtain an antireflection film having a favorable spectral reflectance characteristic of a reflectance of 0.5% or less.

[0052]

According to the first aspect of the present invention, by optimizing the film thickness of each layer, at least in a wide band of near-ultraviolet light region and visible light region or visible light region and near-infrared light region, Since it exhibits a high antireflection function with a reflectance of 1% or less, it uses not only special resin materials but also dielectric materials that have been used in the past to cover a wide band from near-infrared light region to near-ultraviolet light region. An antireflection film having good spectral reflectance characteristics can be obtained. According to the invention according to claim 2, by optimizing the thickness of each layer, at least near-ultraviolet light region and visible light region,
Or in a wide band of visible light region and near infrared light region,
Since it exhibits a high anti-reflection function with a reflectance of 1% or less,
To obtain an antireflection film with good spectral reflectance characteristics in a wide band from near-infrared light region to near-ultraviolet light region using not only special resin materials but also dielectric materials that have been used in the past. Can be.

[Brief description of the drawings]

FIG. 1 is a schematic diagram of an optical component according to Embodiments 1 to 6 and an antireflection film laminated on the surface thereof.

FIG. 2 is a table showing spectral reflectance characteristics of the antireflection film according to the first embodiment.

FIG. 3 is a table showing spectral reflectance characteristics of an antireflection film according to a second embodiment.

FIG. 4 is a table showing spectral reflectance characteristics of an antireflection film according to a third embodiment.

FIG. 5 is a table showing spectral reflectance characteristics of an antireflection film according to a fourth embodiment.

FIG. 6 is a table showing spectral reflectance characteristics of an antireflection film according to a fifth embodiment.

FIG. 7 is a table showing spectral reflectance characteristics of an antireflection film according to a sixth embodiment.

FIG. 8 is a cross-sectional view showing the stacking relationship of a conventional antireflection film.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 10 Optical component 11 1st layer 12 2nd layer 13 3rd layer 14 4th layer 15 5th layer 16 6th layer 17 7th layer 18 8th layer 19 9th layer 20 10th layer 21 11th layer 22 12th Layer 23 13th layer 24 14th layer

Claims (2)

[Claims] 1. An anti-reflection film comprising two or more substances having different refractive indexes laminated on the surface of an optical component, wherein a high refractive index substance having a refractive index of 1.6 or more is H, and a refractive index is 1.
An antireflection film comprising 14 layers, in which 5 or less low-refractive-index substances are L, and odd-numbered layers are H and even-numbered layers are L from the surface side of the optical component to the air side. 2. An antireflection film comprising two or more substances having different refractive indexes laminated on the surface of an optical component, wherein H is a high refractive index substance, L is a low refractive index substance, and λ is a design wavelength. The first layer (H) has an optical thickness of 0.3 × λ / 4 or less, and the second layer (L) has an optical thickness of 0.75 × λ / 4 or less. 3 layers (H) Optical film thickness 0.25 × λ / 4 or more, 0.7
5 × λ / 4 or less Fourth layer (L) optical thickness 0.3 × λ / 4 or less Fifth layer (H) optical thickness 0.25 × λ / 4 or more, 1.2
5 × λ / 4 or less Sixth layer (L) Optical film thickness 0.1 × λ / 4 or more, 0.5 ×
λ / 4 or less Seventh layer (H) Optical film thickness 0.1 × λ / 4 or more, 0.5 ×
λ / 4 or less Eighth layer (L) Optical film thickness 1 × λ / 4 or more, 2 × λ / 4 or less Ninth layer (H) Optical film thickness 0.1 × λ / 4 or more, 0.5 ×
λ / 4 or less Tenth layer (L) Optical film thickness 0.1 × λ / 4 or more, 0.5
× λ / 4 or less Eleventh layer (H) Optical film thickness 0.5 × λ / 4 or more, 1.2
5 × λ / 4 or less 12th layer (L) optical thickness 0.3 × λ / 4 or less 13th layer (H) optical thickness 0.25 × λ / 4 or more 1 ×
λ / 4 or less Fourteenth layer (L) Optical film thickness 0.5 × λ / 4 or more, 1.2
An antireflection film, wherein the antireflection film is laminated in 14 layers with a thickness of 5 × λ / 4 or less.