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JP2000187106A - Semitransmissive reflecting plate - Google Patents

Semitransmissive reflecting plate

Info

Publication number
JP2000187106A
JP2000187106A JP10364584A JP36458498A JP2000187106A JP 2000187106 A JP2000187106 A JP 2000187106A JP 10364584 A JP10364584 A JP 10364584A JP 36458498 A JP36458498 A JP 36458498A JP 2000187106 A JP2000187106 A JP 2000187106A
Authority
JP
Japan
Prior art keywords
layer
light
semi
refractive index
transflective
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10364584A
Other languages
Japanese (ja)
Inventor
Takahiro Hishinuma
高広 菱沼
Akiko Shimizu
朗子 清水
Nobuyuki Kurata
信行 蔵田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
Original Assignee
Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Priority to JP10364584A priority Critical patent/JP2000187106A/en
Publication of JP2000187106A publication Critical patent/JP2000187106A/en
Pending legal-status Critical Current

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  • Optical Elements Other Than Lenses (AREA)
  • Liquid Crystal (AREA)

Abstract

PROBLEM TO BE SOLVED: To obtain a semitransmissive reflecting plate having sufficiently high utilization efficiency of light by disposing a 1st layer of an inorganic dielectric having a specified refractive index and a 2nd layer of metal having a specified thickness on the surface of a light transmissive substrate. SOLUTION: This semitransmissive reflecting plate has a 1st layer of an inorganic dielectric having a refractive index of 2.2-2.5 and 0.2λ-0.3λ thickness and a 2nd layer of metal having 30-300 Å thickness on a light transmissive substrate in order from the substrate side toward the air layer side. The reflecting plate has ruggedness on one or both faces so as to impart a light diffusing property. The inorganic dielectric forming the 1st layer may be any inorganic dielectric having a refractive index of 2.2-2.5 and capable of forming a layer which transmits visible light and TiO2 or ZnS having a refractive index of >=2.3 is preferably used. The metal forming the 2nd layer is preferably metal capable of giving a slightly colored layer and Al, Ag or Cr that ensures slight coloration and has a high reflectance is preferably used.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、半透過性反射板に
関する。
[0001] The present invention relates to a semi-transmissive reflector.

【0002】[0002]

【従来の技術】従来から反射型液晶表示装置は、薄型、
低消費電力が要求される電卓、時計等の表示素子の用途
に使用されてきた。近年、画質の向上やカラー化が進
み、携帯情報末端等に用いられるようになり、反射型の
液晶表示装置の利用は急速に広がってきている。
2. Description of the Related Art Conventionally, a reflection type liquid crystal display device is thin,
It has been used for display devices such as calculators and watches requiring low power consumption. 2. Description of the Related Art In recent years, image quality has been improved and colorization has been promoted, and it has been used for portable information terminals and the like, and the use of reflective liquid crystal display devices has been rapidly expanding.

【0003】これらの反射型液晶表示装置は、外光を利
用して表示しているために、暗いところでは表示が見え
ない。外光がない場合にも表示が見えるように、反射型
液晶表示装置と透過型液晶表示装置の特徴を併せ持った
半透過反射型の液晶表示装置が利用されている。この半
透過反射型の液晶表示装置は、液晶表示素子の背面側に
半透過半反射性を有する半透過反射板を配置して液晶表
示素子の前方からの光を反射する反射モードで使用し得
るとともに、外部が暗いときには該半透過反射板の背面
側に配置されたバックライトを点灯して半透過性反射板
を透過する光により表示する透過モードでも使用し得る
ものである。
[0003] Since these reflective liquid crystal display devices use external light for display, the display cannot be seen in a dark place. A transflective liquid crystal display device having both the characteristics of a reflective liquid crystal display device and a transmissive liquid crystal display device is used so that a display can be viewed even when there is no external light. This transflective liquid crystal display device can be used in a reflection mode in which a transflective plate having transflective properties is disposed on the back side of the liquid crystal display element to reflect light from the front of the liquid crystal display element. In addition, when the outside is dark, it can be used in a transmission mode in which a backlight disposed on the back side of the semi-transmissive reflection plate is turned on and display is performed by light transmitted through the semi-transmissive reflection plate.

【0004】しかしながら、かかる半透過反射型液晶表
示装置に用いられる半透過反射板の光利用効率(透過率
と反射率との和)は必ずしも100%となるものではな
いため、反射モードおよび透過モードにおいて共に明る
い表示を得られるものであるとは言えなかった。
However, the light use efficiency (sum of the transmittance and the reflectance) of the transflective plate used in such a transflective liquid crystal display device is not always 100%, so that the reflective mode and the transmissive mode are used. However, it was not possible to obtain a bright display.

【0005】[0005]

【発明が解決しようとする課題】そこで、本発明者は、
光の利用効率が高く、半透過反射型液晶表示装置のおい
て反射モードであっても透過モードであっても共に十分
な明るさの表示を与え得る半透過反射板を開発するべ
く、鋭意検討した結果、基材の表面に特定の屈折率を有
する第1層と特定の厚みの金属からなる第2層とを設け
ることにより得られる半透過反射板は光の利用効率が十
分高い半透過反射板であることを見出し、本発明に至っ
た。
Therefore, the present inventor has proposed:
We are keenly studying to develop a transflective reflector that has high light utilization efficiency and can provide a display with sufficient brightness in both transflective and transmissive modes in transflective liquid crystal display devices. As a result, the transflective plate obtained by providing the first layer having a specific refractive index and the second layer made of a metal having a specific thickness on the surface of the base material has a transflective plate with sufficiently high light use efficiency. The present inventors have found that it is a plate, and have reached the present invention.

【0006】[0006]

【課題を解決するための手段】すなわち、本発明は、透
光性基板上に、該透光性基板側から空気層側へ順に、屈
折率が2.2〜2.5であり厚みが0.2λ〜0.3λ
である無機誘電体からなる第1層と、厚み30〜300
Åの金属からなる第2層とを有していることを特徴とす
る半透過性反射板を提供するものである。
That is, according to the present invention, a refractive index is 2.2 to 2.5 and a thickness is 0 on a light transmitting substrate in order from the light transmitting substrate side to the air layer side. .2λ to 0.3λ
A first layer made of an inorganic dielectric material having a thickness of 30 to 300
And a second layer made of a metal (1).

【0007】[0007]

【発明の実施の形態】以下、本発明を詳細に説明する。
本発明の半透過性反射板はに用いられる透光性基板は、
板状であってもよいし、フィルム状であってもよいし、
シート状であってもよい。透光性基板は、透光性であれ
ば特に限定されるものではなく、例えばセルロース系高
分子、ポリカーボネート系高分子、ポリアリレート系高
分子、ポリエステル系高分子、アクリル系高分子、ファ
ンクショナルノルボルネン系高分子、ポリサルフォン、
ポリエーテルサルホン等の樹脂製の基板やガラス製の基
板などが挙げられる。また、偏光板、バックライト用の
導光板などのような板状、フィルム状、シート上の光学
部品を基板として用いることも可能である。
BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, the present invention will be described in detail.
The translucent substrate used for the translucent reflector of the present invention is:
It may be plate-shaped, film-shaped,
It may be in the form of a sheet. The light-transmitting substrate is not particularly limited as long as it is light-transmitting. For example, a cellulose-based polymer, a polycarbonate-based polymer, a polyarylate-based polymer, a polyester-based polymer, an acrylic-based polymer, and functional norbornene Polymer, polysulfone,
Substrates made of resin such as polyethersulfone, glass substrates, and the like can be given. In addition, an optical component on a plate, a film, or a sheet such as a polarizing plate or a light guide plate for a backlight can be used as the substrate.

【0008】透光性基板はその表面上に、無機誘電体か
らなる第1層との密着性を向上するための中間層を有し
ていてもよい。中間層としては、例えばアクリル系樹
脂、ウレタン系樹脂、シリコン系樹脂、カルド樹脂、ポ
リシラザンなどの高分子からなる高分子膜が挙げられ
る。また、厚み30Å〜200Å程度のSiOx、Al2
3などの無機誘電体層やCrなどの金属層を用いるこ
とも可能である。透光性基板の無機誘電体層を形成する
面には、表面処理を行ってもよい。表面処理方法につい
ては特に限定されないが、真空中での加熱処理や、コロ
ナ処理、イオンボンバード処理、プラズマ処理、紫外線
照射、紫外線照射などが例示できる。
The translucent substrate has an inorganic dielectric material on its surface.
Having an intermediate layer for improving adhesion to the first layer made of
May be. As the intermediate layer, for example, an acrylic tree
Fat, urethane resin, silicon resin, cardo resin,
Polymer membranes composed of polymers such as lysilazane
You. In addition, SiO having a thickness of about 30 to 200 mm is used.x, AlTwo
O ThreeUse of an inorganic dielectric layer such as
Both are possible. Form inorganic dielectric layer on translucent substrate
The surface may be subjected to a surface treatment. About surface treatment method
Although not particularly limited, heat treatment in a vacuum, roller
Treatment, ion bombardment treatment, plasma treatment, ultraviolet light
Irradiation, ultraviolet irradiation and the like can be exemplified.

【0009】この半透過性反射板は、光拡散性を付与す
る目的で、その片面または両面に凹凸を有しているもの
を用いることもできる。凹凸は、例えばシリカゲル、樹
脂ビーズ、ガラスビーズなどを樹脂に分散した層を付与
する方法や、エッチング処理、マット処理などにより設
けることができる。
For the purpose of imparting light diffusing properties, the semi-transmissive reflecting plate may be one having unevenness on one or both sides. The unevenness can be provided by, for example, a method of providing a layer in which silica gel, resin beads, glass beads, or the like are dispersed in a resin, an etching treatment, a mat treatment, or the like.

【0010】無機誘電体からなる第1層を構成する無機
誘電体は、屈折率が2.2〜2.5であり、可視光で透
明である層を形成し得る無機誘電体であればよく、特に
屈折率が2.3以上であるTiO2(屈折率は2.3
3)、ZnS(屈折率は2.37)などが好ましい。
The inorganic dielectric constituting the first layer made of an inorganic dielectric may be any inorganic dielectric having a refractive index of 2.2 to 2.5 and capable of forming a layer transparent to visible light. In particular, TiO 2 having a refractive index of 2.3 or more (refractive index of 2.3
3), ZnS (having a refractive index of 2.37) and the like are preferable.

【0011】第1層は、厚みが0.2λ〜0.3λであ
ることが必要であり、特に好ましくは0.23〜0.2
7λである。ここでλとは、設計波長であり、液晶表示
装置に用いる場合には通常、500nm〜600nmの
波長範囲から任意に設定され、一般的には550nmと
して設定される。
The first layer needs to have a thickness of 0.2λ to 0.3λ, particularly preferably 0.23 to 0.2λ.
7λ. Here, λ is a design wavelength, and when used in a liquid crystal display device, is usually set arbitrarily from a wavelength range of 500 nm to 600 nm, and is generally set to 550 nm.

【0012】金属からなる第2層を構成する金属は、着
色の少ない層を与え得る金属であることが好ましく、中
でも着色が少なく反射率の大きいAl、Ag、Crなど
が特に好ましく使用される。かかる第2層の厚みは、透
光性の点で、30Å〜300Åの範囲であることが必要
である。また、金属からなる第2層が空気により酸化し
やすい場合や接着剤層なとによって腐食され易い場合な
どには、該第2層の上に保護層を設けてもよい。保護層
としては、SiOx層などが例示される。
The metal constituting the second layer made of a metal is preferably a metal capable of providing a layer with little coloring, and among them, Al, Ag, Cr, etc., with little coloring and high reflectivity, are particularly preferably used. The thickness of the second layer needs to be in the range of 30 ° to 300 ° from the viewpoint of translucency. When the second layer made of metal is easily oxidized by air or easily eroded by an adhesive layer, a protective layer may be provided on the second layer. Examples of the protective layer include a SiO x layer.

【0013】かかる第1層および第2層は、例えば電子
ビーム蒸着法、誘導加熱方式蒸着法、抵抗加熱蒸着法、
スパッタリング法などの方法を用いて透光性基板上に設
けることができる。第1層、2層を製造する装置として
は、透光性基板が板状、シート状である場合には、バッ
チ式、インライン式など製造装置が用いられる。透光性
基板がフィルム状である場合には、巻き取り式の真空成
膜装置を用いることもできる。
The first layer and the second layer are formed by, for example, electron beam evaporation, induction heating evaporation, resistance heating evaporation,
It can be provided over a light-transmitting substrate by a method such as a sputtering method. As an apparatus for manufacturing the first layer and the second layer, a manufacturing apparatus such as a batch type or an in-line type is used when the light-transmitting substrate has a plate shape or a sheet shape. When the light-transmitting substrate is in the form of a film, a roll-up type vacuum film forming apparatus can be used.

【0014】この半透過性反射板は、必要に応じて光拡
散性を付与する目的で、光拡散層と組み合わせて、拡散
性半透過反射板として用いることもできる。組み合わせ
の方法としては、シリカゲル、樹脂ビーズ、ガラスビー
ズなどを樹脂に分散した層を半透過半反射板上に設ける
方法、シリカゲル、樹脂ビーズ、ガラスビーズなどを樹
脂に分散した層を形成したフィルムやエッチング処理、
マット処理などにより凹凸面を形成したフィルムを接着
剤層を介して半透過性反射板に積層する方法や樹脂ビー
ズ、ガラスビーズなどを分散した光拡散性粘着剤層を半
透過性反射板上に形成する方法などが挙げられる。
This semi-transmissive reflector can be used as a diffusive semi-transmissive reflector in combination with a light-diffusing layer for the purpose of imparting light diffusing properties as required. As a method of combination, a method in which a layer in which silica gel, resin beads, glass beads, and the like are dispersed in a resin is provided on a semi-transmissive semi-reflective plate, a film in which a layer in which silica gel, resin beads, glass beads, and the like are dispersed in a resin are formed, Etching treatment,
A method in which a film with an uneven surface formed by a mat treatment or the like is laminated on a semi-transmissive reflector via an adhesive layer, and a light-diffusive adhesive layer in which resin beads, glass beads, etc. are dispersed is placed on the semi-transparent reflector. And the like.

【0015】この半透過性反射板は、偏光体層と組み合
わせて半透過性反射偏光板として使用することができ
る。組み合わせ方法としては、透光性基板に偏光板を用
いてその上に半透過性反射層を形成する方法や、この半
透過性反射板を粘着層を介して偏光板と積層する方法等
がある。
This transflective reflector can be used as a transflective reflector in combination with a polarizer layer. As a combination method, there is a method of forming a semi-transmissive reflective layer thereon using a polarizing plate on a light-transmitting substrate, a method of laminating this semi-transmissive reflective plate with a polarizing plate via an adhesive layer, and the like. .

【0016】[0016]

【発明の効果】本発明の半透明性反射板は、光の利用効
率が高く、半透過反射型液晶表示装置に装着したとき
に、反射モードのときも透過モードのときにも明るい表
示を得ることができる。
The translucent reflector of the present invention has a high light utilization efficiency and, when mounted on a transflective liquid crystal display, provides a bright display in both the reflection mode and the transmission mode. be able to.

【0017】[0017]

【実施例】本発明を実施例でさらに詳細に説明するが、
本発明はこれらの実施例に限定されるものではない。
EXAMPLES The present invention will be described in more detail with reference to Examples.
The present invention is not limited to these examples.

【0018】なお、得られた半透過性反射膜の評価は次
の通りに行った。(株)島津製作所製、「UV−220
0」を用いて、反射スペクトル(絶対反射率)、透過ス
ペクトルを測定し、最も視感度の高い波長550nmの
ときの光の利用効率(反射率Rと透過率Tの和)を評価
した。
The evaluation of the obtained semi-transmissive reflective film was performed as follows. "UV-220" manufactured by Shimadzu Corporation
Using “0”, the reflection spectrum (absolute reflectance) and the transmission spectrum were measured, and the light utilization efficiency (the sum of the reflectance R and the transmittance T) at the wavelength of 550 nm with the highest visibility was evaluated.

【0019】実施例1 トリアセチルセルロースフィルム(商品名 フジTAC
SH−80 富士写真フィルム(株)製)上に厚さ約
5μmのアクリル系樹脂膜を形成した透明高分子フィル
ムを透光性基板として使用し、基板にZnS層(屈折率
2.37、厚み580Å)、Ag層(屈折率0.05
5、厚み200Å)を順次形成して半透過性反射板を得
た。それぞれの層の付与は以下のような条件で行った。
透光性基板を真空蒸着機内のホルダーにセットし、気圧
2×10-5Torrまで排気した後、電子銃出力1.5
KW、蒸着材料(ZnS)を用いて、真空蒸着法により
厚み580ÅのZnS層を形成した。続いて、電子銃出
力3.5KW、蒸着材料としてAgを用いて、真空蒸着
法により厚み200ÅのAg層を形成した。得られた半
透過性反射板の反射スペクトル、透過スペクトルを図1
に示す。この半透過性反射板の光の利用効率は97%で
あった。
Example 1 Triacetyl cellulose film (trade name: Fuji TAC)
A transparent polymer film in which an acrylic resin film having a thickness of about 5 μm is formed on SH-80 (manufactured by Fuji Photo Film Co., Ltd.) is used as a light-transmitting substrate, and a ZnS layer (refractive index: 2.37, thickness: 580 °), Ag layer (refractive index 0.05
5, a thickness of 200 °) was sequentially formed to obtain a semi-transmissive reflector. Each layer was applied under the following conditions.
The light-transmitting substrate was set in a holder in a vacuum evaporation machine, and after evacuating to a pressure of 2 × 10 −5 Torr, the electron gun output was 1.5.
Using KW and a deposition material (ZnS), a ZnS layer having a thickness of 580 ° was formed by a vacuum deposition method. Subsequently, an Ag layer having a thickness of 200 ° was formed by a vacuum deposition method using 3.5 KW of electron gun output and Ag as a deposition material. FIG. 1 shows the reflection spectrum and transmission spectrum of the obtained semi-transmissive reflector.
Shown in The light use efficiency of this semi-transmissive reflector was 97%.

【0020】実施例2 トリアセチルセルロースフィルム(商品名 フジTAC
SH−80 富士写真フィルム(株)製)上に厚み約
5μmのアクリル系樹脂膜を形成した透明高分子フィル
ムを透光性基板として使用し、基板にZnS層(屈折率
2.43、厚み580Å)、Cr層(屈折率2.38、
厚み50Å)を順次形成して半透過性反射板を得た。そ
れぞれの層の付与は以下のような条件で行った。透光性
基板を真空蒸着機内のホルダーにセットし、気圧2×1
-5Torrまで排気した後、電子銃出力1.5KW、
蒸着材料(ZnS)を用いて、真空蒸着法により厚み5
80ÅのZnS層を形成した。続いて電子銃出力1.8
KW、蒸着材料としてCrを用いて、真空蒸着法により
厚さ50ÅのCr層を形成した。得られた半透過性反射
板の反射スペクトル、透過スペクトルを図2に示す。こ
の半透過性反射板の光の利用効率は89%であった。
Example 2 Triacetyl cellulose film (trade name: Fuji TAC)
A transparent polymer film in which an acrylic resin film having a thickness of about 5 μm was formed on SH-80 (manufactured by Fuji Photo Film Co., Ltd.) was used as a light-transmitting substrate, and a ZnS layer (refractive index 2.43, thickness 580 °) was used as the substrate. ), Cr layer (refractive index 2.38,
A thickness of 50 °) was sequentially formed to obtain a semi-transmissive reflector. Each layer was applied under the following conditions. Place the translucent substrate in the holder in the vacuum evaporation machine and set the pressure to 2 × 1
After exhausting to 0 -5 Torr, the electron gun output was 1.5 KW,
Using a vapor deposition material (ZnS), a thickness of 5
An 80 ° ZnS layer was formed. Then the electron gun output 1.8
Using KW and Cr as a deposition material, a Cr layer having a thickness of 50 ° was formed by a vacuum deposition method. FIG. 2 shows the reflection spectrum and transmission spectrum of the obtained semi-transmissive reflector. The light use efficiency of this semi-transmissive reflector was 89%.

【0021】比較例1 トリアセチルセルロースフィルム(商品名 フジTAC
SH−80 富士写真フィルム(株)製)上に厚さ約
5μmのアクリル系樹脂膜を形成した透明高分子フィル
ムを透光性基板として使用し、基板にAl層(屈折率
0.76、厚み50Å)を一層形成して半透過性反射板
を得た。Al層の付与は以下のような条件で行った。基
板を真空蒸着機内のホルダーにセットし、気圧2×10
-5Torrまで排気した後、電子銃出力3.5KW、蒸
着材料としてAlを用いて、真空蒸着法により厚さ50
ÅのAl層を形成した。得られた半透過性反射板の反射
スペクトル、透過スペクトルを図3に示す。この半透過
性反射板の光の利用効率は80%であった。
Comparative Example 1 Triacetyl cellulose film (trade name: Fuji TAC)
A transparent polymer film having an acrylic resin film having a thickness of about 5 μm formed on SH-80 Fuji Photo Film Co., Ltd. was used as a light-transmitting substrate, and an Al layer (refractive index: 0.76, thickness: 50 °) was further formed to obtain a semi-transmissive reflector. The Al layer was formed under the following conditions. The substrate was set on the holder in the vacuum evaporation machine, and the pressure was 2 × 10
After exhausting to -5 Torr, the electron gun output was 3.5 KW, and the thickness was 50 by a vacuum evaporation method using Al as an evaporation material.
An Al layer of Å was formed. FIG. 3 shows the reflection spectrum and transmission spectrum of the obtained semi-transmissive reflector. The light use efficiency of this semi-transmissive reflector was 80%.

【図面の簡単な説明】[Brief description of the drawings]

【図1】実施例1で得た半透過性反射板の分光反射率と
分光透過率を示すグラフである。
FIG. 1 is a graph showing a spectral reflectance and a spectral transmittance of a semi-transmissive reflector obtained in Example 1.

【図2】実施例2で得た半透過性反射板の分光反射率と
分光透過率を示すグラフである。
FIG. 2 is a graph showing a spectral reflectance and a spectral transmittance of a semi-transmissive reflector obtained in Example 2.

【図3】比較例1で得た半透過性反射板の分光反射率と
分光透過率を示すグラフである。
FIG. 3 is a graph showing the spectral reflectance and the spectral transmittance of the semi-transmissive reflector obtained in Comparative Example 1.

フロントページの続き (72)発明者 蔵田 信行 大阪府高槻市塚原2丁目10番1号 住友化 学工業株式会社内 Fターム(参考) 2H042 DA02 DA03 DA04 DA11 DA12 DA14 DA15 DA18 DA21 DB01 DC02 DE00 2H091 FA08X FA08Z FA15Z FB06 FB08 FC18 FC23 FC25 FC26 FC27 FD06 FD14 GA17 KA01 LA03 Continued on the front page (72) Inventor Nobuyuki Kurata 2-10-1, Tsukahara, Takatsuki-shi, Osaka Sumitomo Chemical Company, Ltd. F-term (reference) 2H042 DA02 DA03 DA04 DA11 DA12 DA14 DA15 DA18 DA21 DB01 DC02 DE00 2H091 FA08X FA08Z FA15Z FB06 FB08 FC18 FC23 FC25 FC26 FC27 FD06 FD14 GA17 KA01 LA03

Claims (8)

【特許請求の範囲】[Claims] 【請求項1】透光性基板上に、該透光性基板側から空気
層側へ順に、屈折率が2.2〜2.5である無機誘電体
からなる厚みが0.2λ〜0.3λである第1層と、金
属からなり厚み30〜300Åである第2層とを有して
いることを特徴とする半透過性反射板。
1. An inorganic dielectric having a refractive index of 2.2 to 2.5 on a light-transmitting substrate in order from the light-transmitting substrate side to the air layer side. A semi-transmissive reflector comprising: a first layer having a wavelength of 3λ; and a second layer made of metal and having a thickness of 30 to 300 °.
【請求項2】無機誘電体が、ZnSまたはTiO2であ
る請求項1に記載の半透過性反射板。
2. The semi-transparent reflector according to claim 1, wherein the inorganic dielectric is ZnS or TiO 2 .
【請求項3】金属からなる第2層がAl、AgまたはC
rからなる層である請求項1または請求項2に記載の半
透過性反射板。
3. The method according to claim 1, wherein the second layer made of a metal is Al, Ag or C.
The transflective plate according to claim 1 or 2, which is a layer made of r.
【請求項4】透明基板は片面または両面に凹凸を有する
請求項1、請求項2または請求項3に記載の半透過反射
板。
4. The transflective plate according to claim 1, wherein the transparent substrate has irregularities on one or both sides.
【請求項5】透光性基板が偏光板である請求項1に記載
の半透過性反射板。
5. The translucent reflector according to claim 1, wherein the translucent substrate is a polarizing plate.
【請求項6】請求項1に記載の半透過反射板の片面また
は両面に、光拡散性物質が分散されている接着剤層を有
する拡散性半透過反射板。
6. A diffusive transflective plate having an adhesive layer in which a light diffusing substance is dispersed on one or both surfaces of the transflective plate according to claim 1.
【請求項7】請求項1に記載の半透過性反射板が偏光板
に積層されている半透過性反射偏光板。
7. A transflective reflective polarizing plate, wherein the transflective reflector according to claim 1 is laminated on a polarizing plate.
【請求項8】請求項1記載の半透過性反射板が組込まれ
ている液晶表示装置。
8. A liquid crystal display device incorporating the semi-transmissive reflection plate according to claim 1.
JP10364584A 1998-12-22 1998-12-22 Semitransmissive reflecting plate Pending JP2000187106A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10364584A JP2000187106A (en) 1998-12-22 1998-12-22 Semitransmissive reflecting plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10364584A JP2000187106A (en) 1998-12-22 1998-12-22 Semitransmissive reflecting plate

Publications (1)

Publication Number Publication Date
JP2000187106A true JP2000187106A (en) 2000-07-04

Family

ID=18482175

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP2000187106A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002169150A (en) * 2000-11-30 2002-06-14 Kyocera Corp Liquid crystal display
JP2002214602A (en) * 2001-01-22 2002-07-31 Kyocera Corp Liquid crystal display device
JP2006010854A (en) * 2004-06-23 2006-01-12 Sharp Corp Liquid crystal display and method for manufacturing the liquid crystal display
US7820252B2 (en) 2001-07-02 2010-10-26 Sumitomo Chemical Company, Limited Transflective film, transflective polarizer, and polarizing light source device and liquid crystal display device using the same

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002169150A (en) * 2000-11-30 2002-06-14 Kyocera Corp Liquid crystal display
JP2002214602A (en) * 2001-01-22 2002-07-31 Kyocera Corp Liquid crystal display device
US7820252B2 (en) 2001-07-02 2010-10-26 Sumitomo Chemical Company, Limited Transflective film, transflective polarizer, and polarizing light source device and liquid crystal display device using the same
JP2006010854A (en) * 2004-06-23 2006-01-12 Sharp Corp Liquid crystal display and method for manufacturing the liquid crystal display
JP4531458B2 (en) * 2004-06-23 2010-08-25 シャープ株式会社 Liquid crystal display device and method of manufacturing liquid crystal display device

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