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JP2000185939A - Glass composition - Google Patents

Glass composition

Info

Publication number
JP2000185939A
JP2000185939A JP10366808A JP36680898A JP2000185939A JP 2000185939 A JP2000185939 A JP 2000185939A JP 10366808 A JP10366808 A JP 10366808A JP 36680898 A JP36680898 A JP 36680898A JP 2000185939 A JP2000185939 A JP 2000185939A
Authority
JP
Japan
Prior art keywords
less
glass
composition
glass substrate
composition ratio
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10366808A
Other languages
Japanese (ja)
Inventor
Katsunari Takenaka
克成 竹中
Shinji Fukumoto
真次 福本
Hiroshi Yugame
博 遊亀
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Minolta Co Ltd
Original Assignee
Minolta Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minolta Co Ltd filed Critical Minolta Co Ltd
Priority to JP10366808A priority Critical patent/JP2000185939A/en
Publication of JP2000185939A publication Critical patent/JP2000185939A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C10/00Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition
    • C03C10/0036Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition containing SiO2, Al2O3 and a divalent metal oxide as main constituents
    • C03C10/0045Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition containing SiO2, Al2O3 and a divalent metal oxide as main constituents containing SiO2, Al2O3 and MgO as main constituents
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/076Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/097Glass compositions containing silica with 40% to 90% silica, by weight containing phosphorus, niobium or tantalum

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Glass Compositions (AREA)
  • Magnetic Record Carriers (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a glass of high specific modulus. SOLUTION: In the glass composition, the composition ranges of the main components are adjusted to the following: 35 wt.%<=SiO2<=60 wt.%, 10 wt.% <=Al2O3 <=30 wt.%, 8 wt.%<=MgO<=30-wt.%, 1 wt.% <=Nb2O5<=10 wt.%, 1 wt.%<=TiO2<=15 wt.%, and 1 wt.%<=ZnO<=15 wt.%.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明はガラス組成、特に結
晶化ガラスに適したガラス組成に関する。さらに詳しく
は、結晶化ガラス磁気ディスクの組成に関する。
The present invention relates to a glass composition, particularly a glass composition suitable for crystallized glass. More specifically, it relates to the composition of a crystallized glass magnetic disk.

【0002】[0002]

【従来の技術】従来、磁気ディスク用の基板としては、
アルミニウム基板、ガラス基板等が実用化されている。
中でもガラス基板は、表面の平滑性や機械的強度が優れ
ていることから、最も注目されている。そのようなガラ
ス基板としては、ガラス基板表面をイオン交換で強化し
た化学強化ガラス基板や、基板に結晶成分を析出させて
結合の強化を図る結晶化ガラス基板が知られている。
2. Description of the Related Art Conventionally, as a substrate for a magnetic disk,
Aluminum substrates and glass substrates have been put to practical use.
Among them, a glass substrate has received the most attention because of its excellent surface smoothness and mechanical strength. As such a glass substrate, a chemically strengthened glass substrate in which the surface of the glass substrate is strengthened by ion exchange, and a crystallized glass substrate in which a crystal component is precipitated on the substrate to strengthen the bond are known.

【0003】[0003]

【発明が解決しようとする課題】ところで最近の基板に
対する性能の要求は、日に日に厳しくなってきており、
とくに高速回転時のたわみやそりに直接的に関わる強度
に対する性能の向上が求められている。これは基板材料
の比弾性率(=ヤング率/比重)によって表すことがで
き、数値が高ければ高いほど望ましい。そこで本発明
は、ガラスの比弾性率が向上した組成を提供することを
目的とする。
By the way, the recent demand for the performance of the substrate is becoming stricter day by day.
In particular, there is a demand for an improvement in performance with respect to strength directly related to deflection and warpage during high-speed rotation. This can be represented by the specific elastic modulus (= Young's modulus / specific gravity) of the substrate material, and the higher the numerical value, the more desirable. Therefore, an object of the present invention is to provide a composition in which the specific elastic modulus of glass is improved.

【0004】[0004]

【課題を解決するための手段】上記目的を達成するため
に請求項1に記載された発明は、主成分の組成範囲を、
SiO2が35wt%以上で且つ 60wt%以下、A
23が10wt%以上で且つ 30wt%以下、Mg
Oが8wt%以上で且つ 30wt%以下、Nb25
1wt%以上で且つ 10wt%以下、TiO2が1w
t%以上で且つ 15wt%以下、ZnOが1wt%以
上で且つ 15wt%以下、にしたことを特徴とする。
Means for Solving the Problems In order to achieve the above object, the invention described in claim 1 provides a composition range of a main component,
SiO 2 is 35 wt% or more and 60 wt% or less, A
l 2 O 3 is 10 wt% or more and 30 wt% or less, Mg
O is 8 wt% or more and 30 wt% or less, Nb 2 O 5 is 1 wt% or more and 10 wt% or less, TiO 2 is 1 w
It is characterized in that the content is not less than t% and not more than 15 wt%, and the content of ZnO is not less than 1 wt% and not more than 15 wt%.

【0005】また請求項2に記載された発明は、前記請
求項1に記載されたガラス組成を、溶融、結晶化するこ
とによって得られるガラス基板において、析出する結晶
相が、ガーナイト、コーディエライト、ムライトのうち
少なくとも一つであることを特徴とする。
According to a second aspect of the present invention, there is provided a glass substrate obtained by melting and crystallizing the glass composition according to the first aspect, wherein a crystal phase precipitated is garnitite, cordierite, or the like. , Mullite.

【0006】[0006]

【発明の実施の形態】以下、本発明の実施形態について
説明する。本発明に係る実施形態のガラス基板は、主成
分の組成範囲が、SiO2が35wt%以上で且つ 6
0wt%以下、Al23が10wt%以上で且つ30w
t%以下、MgOが8wt%以上で且つ30wt%以
下、Nb25が1wt%以上で且つ10wt%以下、T
iO2が1wt%以上で且つ15wt%以下、ZnOが
1wt%以上で且つ15wt%以下であることを特徴と
している。
Embodiments of the present invention will be described below. In the glass substrate of the embodiment according to the present invention, the composition range of the main component is 35 wt% or more of SiO 2 and 6
0 wt% or less, Al 2 O 3 is 10 wt% or more and 30 w
t% or less, MgO is 8 wt% or more and 30 wt% or less, Nb 2 O 5 is 1 wt% or more and 10 wt% or less, T
It is characterized in that iO 2 is 1 wt% or more and 15 wt% or less, and ZnO is 1 wt% or more and 15 wt% or less.

【0007】SiO2はガラス形成酸化物であり、結晶
の構成成分である。組成比が35wt%より少ないと溶
融性が悪くなり、60wt%を越えるとガラスとして安
定状態になるため、結晶が析出しにくくなる。
[0007] SiO 2 is a glass-forming oxide and is a constituent of crystals. If the composition ratio is less than 35% by weight, the meltability deteriorates. If the composition ratio exceeds 60% by weight, the glass becomes a stable state, so that it is difficult to precipitate crystals.

【0008】Al23はガラス中間酸化物であり、結晶
の構成成分である。組成比が10wt%より少ないと析
出結晶が少なく、強度が得られず、30wt%を越える
と溶融温度が高くなり失透しやすくなる。
[0008] Al 2 O 3 is a glass intermediate oxide and is a component of the crystal. If the composition ratio is less than 10% by weight, the number of precipitated crystals is small and the strength cannot be obtained.

【0009】MgOは融剤としての役割を果たすととも
に、結晶の構成成分である。組成比が8wt%より少な
いと析出結晶が少なく強度が得られず、30wt%を越
えると結晶相が析出しにくくなり耐失透性が悪くなる。
[0009] MgO plays a role as a flux and is a component of the crystal. If the composition ratio is less than 8 wt%, the number of precipitated crystals is small and strength cannot be obtained. If the composition ratio exceeds 30 wt%, the crystal phase is difficult to precipitate and the devitrification resistance deteriorates.

【0010】Nb25は融剤として働き、溶融性を向上
させ、強度を向上させる。組成比が1wt%より少ない
と強度の向上が望めず、10wtを越えると比重が重く
なり比弾性率が小さくなる。
[0010] Nb 2 O 5 acts as a flux, improves the meltability and improves the strength. If the composition ratio is less than 1 wt%, no improvement in strength can be expected, and if it exceeds 10 wt%, the specific gravity increases and the specific elastic modulus decreases.

【0011】TiO2は核形成剤として働く重要な成分
で、かつ強度を向上させる。組成比が1wt%より少な
いと、核形成剤としての働きが望めなく、強度の向上も
望めなず、15wt%を越えると耐失透性が悪くなる。
TiO 2 is an important component acting as a nucleating agent and improves the strength. When the composition ratio is less than 1 wt%, the function as a nucleating agent cannot be expected, and the strength cannot be improved. When the composition ratio exceeds 15 wt%, the devitrification resistance deteriorates.

【0012】ZnOは融材として働き、溶融性を向上さ
せるとともに結晶の構成成分である。組成比が1wt%
より少ないと、溶融が困難になり、15wt%を越える
と耐失透性が悪くなる。
[0012] ZnO acts as a flux, improves the meltability, and is a component of the crystal. Composition ratio is 1wt%
If the amount is less than the above, melting becomes difficult, and if it exceeds 15% by weight, the devitrification resistance becomes poor.

【0013】以下製造方法を説明する。最終的に生成さ
れるガラス基板の主成分の組成を含む原料を所定の割合
にて充分に混合し、これを白金るつぼに入れ、約155
0度で溶融を行う。溶融後金型に流し概略の形状を形成
する。これを室温までアニールする。続いて、示される
1次熱処理温度と1次処理時間により保持し(熱処
理)、結晶核生成が行われる。引き続き、2次熱処理温
度と2次処理時間により保持し結晶核成長を行う。これ
を除冷することにより目的とする結晶化ガラスが得られ
る。
The manufacturing method will be described below. Raw materials containing the composition of the main components of the finally produced glass substrate are thoroughly mixed at a predetermined ratio, and the mixture is put into a platinum crucible, and the mixture is mixed for about 155.
Melt at 0 degrees. After melting, it is poured into a mold to form a rough shape. This is annealed to room temperature. Subsequently, the temperature is maintained at the indicated primary heat treatment temperature and primary treatment time (heat treatment), and crystal nucleation is performed. Subsequently, the crystal nucleus is grown while maintaining the temperature at the secondary heat treatment and the secondary treatment time. By cooling this, the desired crystallized glass is obtained.

【0014】以上の製造方法によって得られたガラス基
板は、主成分をSiO2が35wt%以上で且つ 60
wt%以下、Al23が10wt%以上で且つ30wt
%以下、MgOが8wt%以上で且つ30wt%以下、
Nb25が1wt%以上で且つ10wt%以下、TiO
2が1wt%以上で且つ15wt%以下、ZnOが1w
t%以上で且つ15wt%以下とするために、非常に高
い比弾性率を得ることが可能となった。
The glass substrate obtained by the above manufacturing method has a main component of SiO 2 of 35% by weight or more and 60% by weight.
wt% or less, and in Al 2 O 3 is more than 10 wt% 30 wt
% Or less, MgO is 8 wt% or more and 30 wt% or less,
Nb 2 O 5 ≧ 1 wt% and ≦ 10 wt%, TiO
2 is 1 wt% or more and 15 wt% or less, ZnO is 1 w
Since the content is set to not less than t% and not more than 15 wt%, it is possible to obtain a very high specific elastic modulus.

【0015】[0015]

【実施例】次に実施形態を実施した具体的な実施例につ
いて説明する。第1〜第4実施例のガラスを構成する材
料組成比(単位:wt%)、1次熱処理温度と1次処理
時間、2次熱処理温度と2次処理時間、主析出結晶相、
副析出結晶相、比重、ヤング率、比弾性率を表1に示
す。また、比較例を表2に、表1と同様のデータで示
す。
Next, a specific example of the embodiment will be described. Material composition ratio (unit: wt%) constituting the glasses of the first to fourth embodiments, primary heat treatment temperature and primary treatment time, secondary heat treatment temperature and secondary treatment time, main precipitated crystal phase,
Table 1 shows the precipitated crystal phase, specific gravity, Young's modulus, and specific elastic modulus. Table 2 shows a comparative example with the same data as in Table 1.

【0016】[0016]

【表1】 [Table 1]

【0017】[0017]

【表2】 [Table 2]

【0018】第1の実施例のガラス組成は、SiO2
39wt%、Al23を27wt%、MgOを8.5w
t%、Nb25を5wt%、ZnOを11wt%、Ti
2を9wt%、Sb23を0.5wt%の組成比であ
る。
The glass composition of the first embodiment is as follows: 39 wt% of SiO 2 , 27 wt% of Al 2 O 3, and 8.5 w of MgO.
t%, Nb 2 O 5 5 wt%, ZnO 11 wt%, Ti
The composition ratio of O 2 is 9 wt% and Sb 2 O 3 is 0.5 wt%.

【0019】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、1次処理温度800度、1次処理
時間2時間、2次処理温度1000度、2次処理時間4
時間にて処置した結果、主出結晶相がガーナイト、コー
ディエライト、ムライトで、比弾性率が46.8という
特性のガラス基板が得られた。
The raw materials are prepared so as to have the above composition ratio, and the primary processing temperature is 800 ° C., the primary processing time is 2 hours, the secondary processing temperature is 1000 ° C., and the secondary processing time is 4 according to the above-mentioned manufacturing method.
As a result of the treatment with time, a glass substrate having a characteristic of a specific elastic modulus of 46.8 was obtained in which the main crystal phases were garnite, cordierite, and mullite.

【0020】第2の実施例のガラス組成は、SiO2
49.4wt%、Al23を11.5wt%、MgOを
25wt%、Nb25を2wt%、ZnOを1wt%、
TiO2を11.1wt%、の組成比である。
The glass composition of the second embodiment is as follows: 49.4 wt% of SiO 2 , 11.5 wt% of Al 2 O 3 , 25 wt% of MgO, 2 wt% of Nb 2 O 5 , 1 wt% of ZnO,
The composition ratio of TiO 2 is 11.1 wt%.

【0021】上記組成比を含むよう原料を調合し、前述
の製造方法に従って、1次処理温度820度、1次処理
時間4時間、2次処理温度1000度、2次処理時間2
時間にて処理した結果、析出結晶相がガーナイト、コー
ディエライトで、比弾性率が48.3という特性のガラ
ス基板が得られた。
The raw materials are prepared so as to have the above composition ratio, and the primary processing temperature is 820 ° C., the primary processing time is 4 hours, the secondary processing temperature is 1000 ° C., and the secondary processing time is 2 in accordance with the above-mentioned manufacturing method.
As a result of the treatment over time, a glass substrate having a characteristic that the precipitated crystal phase was garnite and cordierite and the specific elastic modulus was 48.3 was obtained.

【0022】第3の実施例のガラス組成は、SiO2
46wt%、Al23を15wt%、MgOを18wt
%、CaOを3wt%、Nb25を4wt%、ZnOを
1.2wt%、TiO2を12.3wt%、Sb23
0.5wt%の組成比である。
The glass composition of the third embodiment is as follows: 46% by weight of SiO 2 , 15% by weight of Al 2 O 3 and 18% by weight of MgO.
%, 3 wt% of CaO, 4 wt% of Nb 2 O 5 , 1.2 wt% of ZnO, 12.3 wt% of TiO 2 , and 0.5 wt% of Sb 2 O 3 .

【0023】上記組成比を含むように原料を調合し、前
述の製造方法に従って、1次処理温度770度、1次処
理時間2時間、2次処理温度1050度、2次処理時間
2時間にて処理した結果、析出結晶相がコーディエライ
ト、ガーナイトで、比弾性率が48.5という特性のガ
ラス基板が得られた。
The raw materials are prepared so as to have the above composition ratio, and the first processing temperature is 770 ° C., the first processing time is 2 hours, the second processing temperature is 1050 ° C., and the second processing time is 2 hours according to the above-mentioned manufacturing method. As a result of the treatment, a glass substrate was obtained in which the precipitated crystal phases were cordierite and garnite and the specific elastic modulus was 48.5.

【0024】第4の実施例のガラス組成は、SiO2
56wt%、Al23を17wt%、MgOを10wt
%、Nb25を7wt%、ZnOを2wt%、TiO2
を8wt%、の組成比である。
The glass composition of the fourth embodiment is as follows: 56% by weight of SiO 2 , 17% by weight of Al 2 O 3 , and 10% by weight of MgO.
%, Nb 2 O 5 at 7 wt%, ZnO at 2 wt%, TiO 2
Is 8 wt%.

【0025】上記組成比を含むように原料を調合し、前
述の製造方法に従って、1次処理温度780度、1次処
理時間4時間、2次処理温度970度、2次処理時間4
時間にて処理した結果、析出結晶相がガーナイト、ムラ
イトで、比弾性率が45.7という特性のガラス基板が
得られた。
The raw materials are prepared so as to contain the above composition ratio, and the primary processing temperature is 780 ° C., the primary processing time is 4 hours, the secondary processing temperature is 970 ° C., and the secondary processing time is 4 according to the above-mentioned manufacturing method.
As a result of the treatment with time, a glass substrate having a characteristic that the precipitated crystal phase was garnet and mullite and the specific elastic modulus was 45.7 was obtained.

【0026】次に表2に示される比較例について説明す
る。比較例1ではNb25が、規定される範囲の下限を
割り込んでいるため、析出結晶が少なく比弾性率が4
4.2しか得られていない。比較例2では、Al2
3が、規定される範囲の上限を超えているため、溶融温
度が高くなり失透し、不均一となり結晶化しにくい。比
較例3では、SiO2が、規定される範囲の上限を超え
ているため、ガラスとして安定し、鋳込めなくなるので
結晶化できない。
Next, a comparative example shown in Table 2 will be described. In Comparative Example 1, since Nb 2 O 5 was below the lower limit of the specified range, the amount of precipitated crystals was small and the specific elastic modulus was 4%.
Only 4.2 was obtained. In Comparative Example 2, Al 2 O
3 exceeds the upper limit of the specified range, so that the melting temperature becomes high, devitrification occurs, becomes non-uniform, and hardly crystallizes. In Comparative Example 3, since SiO 2 exceeds the upper limit of the specified range, it is stable as glass, cannot be cast, and cannot be crystallized.

【0027】[0027]

【発明の効果】本発明によると、比弾性率が45以上の
ガラス基板を得ることができる。
According to the present invention, a glass substrate having a specific elastic modulus of 45 or more can be obtained.

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Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 主成分の組成範囲を、 SiO2が35wt%以上で且つ 60wt%以下、 Al23が10wt%以上で且つ 30wt%以下、 MgOが8wt%以上で且つ 30wt%以下、 Nb25が1wt%以上で且つ 10wt%以下、 TiO2が1wt%以上で且つ 15wt%以下、 ZnOが1wt%以上で且つ 15wt%以下、とした
ことを特徴とするガラス組成。
1. The composition range of a main component is as follows: SiO 2 is 35 wt% or more and 60 wt% or less; Al 2 O 3 is 10 wt% or more and 30 wt% or less; MgO is 8 wt% or more and 30 wt% or less; A glass composition characterized in that 2 O 5 is 1 wt% or more and 10 wt% or less, TiO 2 is 1 wt% or more and 15 wt% or less, and ZnO is 1 wt% or more and 15 wt% or less.
【請求項2】 前記請求項1に記載されたガラス組成
を、溶融、結晶化することによって得られるガラス基板
において、析出する結晶相が、ガーナイト、コーディエ
ライト、ムライトのうち少なくとも一つであることを特
徴とするガラス基板。
2. A glass substrate obtained by melting and crystallizing the glass composition according to claim 1, wherein a crystal phase precipitated is at least one of garnite, cordierite, and mullite. A glass substrate, characterized in that:
JP10366808A 1998-12-24 1998-12-24 Glass composition Pending JP2000185939A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10366808A JP2000185939A (en) 1998-12-24 1998-12-24 Glass composition

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE1015774A3 (en) * 2003-11-07 2005-08-02 Ct De Rech S De L Ind Belge De Ceramic tile pavement mechanical properties and improved abrasion resistance.
JP2011246290A (en) * 2010-05-21 2011-12-08 Ohara Inc Glass substrate

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE1015774A3 (en) * 2003-11-07 2005-08-02 Ct De Rech S De L Ind Belge De Ceramic tile pavement mechanical properties and improved abrasion resistance.
EP1529763A3 (en) * 2003-11-07 2009-03-18 Centre De Recherche De L'industrie Belge De La Ceramique Ceramic paving tiles having wear and abrasion resistance
JP2011246290A (en) * 2010-05-21 2011-12-08 Ohara Inc Glass substrate

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