JP2000064064A - Enameled sheet - Google Patents
Enameled sheetInfo
- Publication number
- JP2000064064A JP2000064064A JP22782898A JP22782898A JP2000064064A JP 2000064064 A JP2000064064 A JP 2000064064A JP 22782898 A JP22782898 A JP 22782898A JP 22782898 A JP22782898 A JP 22782898A JP 2000064064 A JP2000064064 A JP 2000064064A
- Authority
- JP
- Japan
- Prior art keywords
- pigment
- enamel
- glaze
- particle size
- enamel layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Glass Compositions (AREA)
- Laminated Bodies (AREA)
Abstract
Description
【発明の詳細な説明】
【0001】
【発明の属する技術分野】本発明は、高明度で、かつ高
光沢を有し、しかも後曲げ加工性にも優れた琺瑯板に関
する。
【0002】
【従来の技術】琺瑯(ホウロウ)製品は、下地となる金
属基板の表面上に、ガラス質(釉薬)琺瑯層を設けて、
耐食性、耐候性、耐薬品性を付与したものである。この
琺瑯製品は意匠性を要求されることも多いため、高明度
すなわち琺瑯層が充分に着色され、下地の金属基板が透
けて見えないような優れた遮蔽性に加えて、高光沢が要
求されることも多い。また曲げ加工しても亀裂、剥離な
どを生じて外観を損なうことがない加工性も要求され
る。
【0003】このうち明度(遮蔽性、隠蔽性)について
は、一般的に、琺瑯層中に着色顔料を含有させ、かつそ
の膜厚を厚くすれば上記要求を満たせることが知られて
いる。例えば特公平6−43256号公報には、アルミ
メッキ鋼板上に、P2 O5 を主成分とする釉薬の透明フ
リット100重量部に対して白色顔料である酸化チタン
を50重量部以上の割合で含ませた琺瑯層を設けた高明
度琺瑯製品が開示されている。
【0004】しかしながら本発明者の研究によれば、上
記のように基板金属が透けない程度に多量の顔料を透明
釉薬に添加すると、高明度(遮蔽性)は得られるが、琺
瑯表面には激しい凹凸を生じてしまい、高光沢が得られ
ないことがわかった。さらに凹凸表面の凹部に侵入した
汚れ物質は溶剤などの洗剤で洗浄して除去することが困
難であるため、表面汚れが残るだけでなく、汚れによる
光沢低下も起きる。
【0005】また琺瑯層は、膜厚が厚い程高明度を得る
ことができるので通常は100μm程度まで厚くしてい
る。しかしながら琺瑯板を曲げ加工(後曲げ加工)する
ときには、上記のように顔料を多量に含む琺瑯層の膜厚
が厚く、たとえば該公報の実施例に示されているように
70μm程度であると、割れが目立ち、外観の悪い製品
が得られる。
【0006】このように、明度、光沢、後曲げ加工性の
いずれをも満足する琺瑯板は、未だに得られていない。
なおアルミメッキ鋼板上に、P2 O5 を主成分とする釉
薬の透明フリットのみを用いて琺瑯層を設ける際には、
膜厚を10〜50μmとすると、加工性に優れた琺瑯製
品が得られる(特公平6−43257号公報)ことが知
られているが、このような着色顔料を含まない琺瑯層で
は高明度は得られない。またもし前述した透明フリット
100重量部に対して通常の顔料を50重量部以上の量
比で含む琺瑯層を、10〜50μmの膜厚で設けたとし
ても、光沢に劣るという問題点は依然として解決されな
い。
【0007】
【発明が解決しようとする課題】本発明は、高明度でか
つ高光沢であり、後曲げ加工性に優れる琺瑯板を提供す
ることを課題とする。
【0008】
【課題を解決するための手段】本発明者は、釉薬に顔料
を添加して琺瑯層を形成する際に、極めて限定された範
囲の平均粒径を有する顔料を用いることにより、顔料の
添加量が少なく、かつ琺瑯層の膜厚が薄くても、高明度
が得られ、しかも高光沢をも得られるという予想外の効
果が得られることを見出した。さらにこの琺瑯板は、後
曲げ加工を施しても、割れが目立たず、外観が良好であ
る。
【0009】すなわち本発明に係る琺瑯板は、下地基板
の少なくとも一方の表面に、平均粒径が0.2〜0.2
6μmの顔料を10〜25重量%含有し、膜厚が20〜
50μmである琺瑯層を有することを特徴としている。
前記顔料は、白色顔料であることが好ましく、白色の酸
化チタン顔料がより好ましい。また前記琺瑯層を形成す
る際に用いられる釉薬は、P2 O5 を主成分とするもの
が好ましい。
【0010】
【発明の実施の形態】「琺瑯」とは、金属等の基板表面
に無機質ガラス粉末を釉薬として塗布(施釉)し、これ
を焼成して得たガラス質被覆を言う。本発明に係る琺瑯
板は、下地基板の少なくとも一方の表面に、平均粒径が
0.2〜0.26μmである顔料を10〜25重量%含
有し、膜厚が20〜50μmである琺瑯層を有してい
る。以下にこのような構成の本発明を具体的に説明す
る。
【0011】下地基板としては、通常、鉄板、鋼板、ア
ルミニウム板などの金属板、これら金属板に、亜鉛メッ
キ、アルミニウムメッキ、アルミニウム亜鉛合金メッ
キ、鉄亜鉛合金メッキなどのメッキ処理、化成処理、ク
ロメート処理などの表面処理を施した金属板が用いられ
る。また下地基板は、琺瑯の焼成温度に耐えうる材質で
あれば、金属板以外であってもよい。上記のうちでも特
に、メッキなどの表面処理を施し、耐食性、耐候性等を
備えた金属板を使用することが好ましい。
【0012】本発明では、上記基板の少なくとも一方の
表面上に、特定粒径の顔料を特定量で含む琺瑯層が設け
られる。上記のような顔料を含む琺瑯層は、通常ベース
素材であるガラス質釉薬に顔料を添加した琺瑯釉薬を焼
成することにより形成され、具体的にはガラス質釉薬
に、後述するような特定の顔料を添加して、混合物スラ
リー(琺瑯釉薬)を調製した後、該スラリーを基板上に
施釉して焼成することにより形成される。
【0013】釉薬
ベース素材となる釉薬としては、公知の釉薬を広く用い
ることができ、たとえば、Ti O2 、Si O2 、Zr O
2 などのRO2 系化合物、P2 O5 、V2 O5などのR
2 O5 系化合物、Sb2O3 、Al2O3 、B2 O3 などの
R2 O3 系化合物、Na2O、K2 O、Li2OなどのR2
O系化合物、Zn O、Ba O、Ca OなどのRO系化合
物、ZrF4 、AlF3 などのフッ化物系化合物などの
鉱物原料から得られる釉薬を用いることができる。また
これらを組み合わせて釉薬を調製してもよい。
【0014】このなかでも後述するように、顔料の隠蔽
力の低下あるいは変色を防止するために、焼成温度の低
い釉薬が好ましく、特にR2 O5 系釉薬が好ましく、さ
らにP2 O5 を主成分として含む釉薬が好ましい。ここ
で主成分とは、釉薬中に50重量%以上の割合で含有さ
れる成分である。なお上記釉薬は、焼成により溶融して
膜状となるものであり、形成された琺瑯層中では通常粒
子形状の顔料とはならない。
【0015】顔料
本発明では、琺瑯層中に平均粒径が0.20〜0.26
μm、好ましくは0.21〜0.25μmの範囲内にあ
る顔料を含有させている。従来一般的に使用される顔料
の粒径は、0.1μm程度から0.3μm程度の広範囲
であるが、本発明では、使用した顔料は、実質的にその
ままの粒径で琺瑯層中に含ませており、したがって平均
粒径が0.20〜0.26μm、好ましくは0.21〜
0.25μmである顔料を使用している。平均粒径が上
記範囲内にある顔料を用いるならば、粒径の異なる2種
以上の顔料同士を組合わせて用いることもできる。また
平均粒径が上記範囲内であるとともに、粒径のばらつき
が小さく、揃っていることが好ましい。ここで平均粒径
とは、電子顕微鏡などを用いて測定される粒子1000
個の粒径の平均値をいう。上記のような平均粒径を有す
る顔料は、乾式および/または湿式粉砕後、沈降、風力
などにより分級して得ることができる。
【0016】本発明では、平均粒径が上記範囲であり、
焼成温度によっても溶融しないような顔料であれば公知
の顔料を広く用いることができる。具体的には、酸化チ
タン、酸化亜鉛などの白色顔料、酸化鉄、酸化クロムな
どの白色以外の顔料を用いることができる。異種の顔料
同士を組合わせて用いてもよい。これらのうちでも下地
基板の隠蔽性に優れる白色顔料が好ましく、さらに白色
顔料の中でも、特に隠蔽性に優れる酸化チタンが好まし
い。
【0017】また酸化チタンにはルチル型とアナターゼ
型の2種類の結晶相があり、いずれを用いてもよいが、
可視光域での波長を吸収・遮蔽する能力が高いルチル型
が好ましい。また酸化チタンでは、ルチル型からアナタ
ーゼ型への結晶相の変態は600℃以上で生じるため、
高温での焼成を行うと、隠蔽力の低下、変色等の不具合
を生じやすい。従って、ルチル型酸化チタンを顔料とし
て高明度琺瑯を得るには、焼成温度は550℃以下とす
ることが好ましい。本発明では、顔料の形状は特には粒
状、球状、鱗片状など特には限定されないが、混合物ス
ラリーの分散性を良好にするため粒状または球状が好ま
しい。
【0018】琺瑯層中に上記平均粒径の顔料を含ませる
と、顔料が可視光の光を充分に吸収し、遮蔽性が向上さ
れ高明度を得ることができ、しかも琺瑯層表面の凹凸が
少なく、高光沢が得られる。なお平均粒径が0.20μ
m未満の場合には、顔料が可視光の光を吸収、遮蔽する
ことができず、明度が不足する。一方0.26μmを越
える場合には、表面の凹凸が多くなり、光沢が不足す
る。
【0019】より具体的に説明する。たとえば白色顔料
の酸化チタンは、平均粒径が0.2〜0.3μmであれ
ば可視光域での波長を吸収して遮蔽することができる。
しかしながら顔料の粒径は琺瑯表面の凹凸に影響し、顔
料の粒径が大きいほど琺瑯表面の凹凸が大きくなり、ま
たその粒径が小さいほど琺瑯表面の凹凸は小さくなる。
具体的に平均粒径が0.26μmを越えるいわゆる“大
粒径”の酸化チタン顔料を用いると、琺瑯表面の凹凸が
大きくなり、高光沢が得られない。また平均粒径が0.
20μm未満であるいわゆる“小粒径”の酸化チタン顔
料を用いると、顔料が可視光域での波長を吸収・遮蔽す
ることが出来ず、高明度が得られない。
【0020】このように琺瑯層中に0.2〜0.26μ
mという特定の平均粒径の顔料を含ませたときには、一
般的に用いられる0.1μm程度から0.3μm程度の
粒径の顔料を含ませたときに比べて格段に明度の効果が
大きく、顔料含有量が少なくても高明度が得られ、しか
も高光度も得られるという知見は本発明者によって見出
されたものである。
【0021】本発明では、上記のような顔料は、最終的
に焼成形成された琺瑯層中に10〜25重量%、好まし
くは15〜23重量%の量で含有されている。琺瑯層を
形成する残りの成分は、通常、前記釉薬であるが、本発
明に係る発明の目的を損なわない範囲であれば、他の成
分を含んでいてもよい。なお顔料の含有量が10重量%
未満の場合、明度が不足し、25重量%を越える場合、
表面の凹凸が大きくなり、光沢が不足する。
【0022】また琺瑯層の膜厚は、20〜50μmであ
る。膜厚が20μm未満であると光沢、明度が低下し、
一方50μmを超えると後曲げ加工部の外観を損ないや
すい。上記膜厚は、好ましくは25〜45μm、より好
ましくは25〜40μm、特に好ましくは25〜37μ
mである。本発明では、琺瑯層の膜厚は20〜50μm
であって、従来一般的な厚さに比べて薄いが、このよう
な膜厚でも高明度を発現する。これは特定範囲の平均粒
径を有する顔料を使用したためと考えられる。具体的に
は、JISZ−8729に準拠して測定される明度(L
値)は、通常86以上、好ましくは88以上、特に好ま
しくは90以上であり、光度測定器により開き角度を4
5°で測定される光沢度は、通常70%以上、好ましく
は75%以上である。また上記のような琺瑯層を有する
琺瑯板は、曲げ加工性(後曲げ加工性)にも優れてお
り、琺瑯板を曲げ加工しても剥離しにくく、表面に亀裂
などを生じずに外観に優れた琺瑯製品を得ることができ
る。
【0023】次に、本発明に係る琺瑯板の製造方法の一
例を説明する。上記のような琺瑯板は、下地基板の少な
くとも一方の表面上に、釉薬および特定顔料を含むスラ
リー(琺瑯釉薬)を施釉し、これを焼成して琺瑯層を形
成することにより得られる。釉薬は、前述のRO2 系、
R2 O5 系などの鉱物原料を粉砕・混合し、これを加熱
・溶融した後、急冷してガラス状で得られる。次いで、
この釉薬と顔料とからスラリーを調製する。スラリー
は、釉薬、顔料、水に加えて分散剤などを含有していて
もよい。通常、釉薬に顔料、水、分散剤などを加えたも
のを、ボールミル、乳鉢、擂解機等を用いて混合・粉砕
してスラリーを調製する。
【0024】得られたスラリーを基板表面に、最終的に
得られる琺瑯層の膜厚が前記範囲となるような量で塗布
(施釉)する。この際、基板表面を脱脂、洗浄、必要に
応じてメッキ処理などを行った後に、スラリーを施釉す
ることが好ましい。施釉は、刷毛、ローラ等による塗布
法、スプレー、静電塗着等による噴霧法、ロールコータ
ー法、転写紙法などのうちのどの方法で行ってもよい。
なお、施釉を行う面を基板の片面とするか両面とするか
は、必要に応じて選択すればよい。また施釉の対象基板
は、平坦な基板のみならず曲げ加工された基板であって
もよい。施釉後の基板は、電気炉、ガス炉、トンネル
炉、バッチ炉等により高温保持し、基板上にあるスラリ
ーを焼成して琺瑯層を形成する。焼成温度は、釉薬が溶
融する温度であって、かつ顔料が溶融しない温度であれ
ばよいが、上述したように顔料の結晶変態が起きないよ
うな温度であることが好ましい。
【0025】
【実施例】以下の実施例または比較例において、下地基
板に施釉する際に用いた釉薬(フリット)の組成を表1
に示す。
(実施例1)琺瑯層中の酸化チタンの含有量が20重量
%になるように以下の琺瑯釉薬(スラリー)を調製し
た。表1に示す組成の釉薬A 100重量部に、顔料と
しての平均粒径0.2μmの酸化チタン25重量部、水
35重量部、分散剤(ピロリン酸ナトリウム)0.5重
量部を添加して、ボールミルに投入し、粉砕・混合して
スラリーを作製した。このスラリーを、合金処理溶融亜
鉛メッキ鋼板表面上に施釉した後、530℃で焼成し
て、琺瑯層を形成し、琺瑯板(サンプル)を得た。得ら
れたサンプルの光沢度、明度、琺瑯膜厚及び曲げ加工し
た琺瑯製品の外観を評価した。結果を表2に示す。
【0026】(明度)JISZ−8729「物体色の表
示方法」に準拠して、色差計を用いて明度(L値)を測
定した。L値は基板の隠蔽性を示す指標であり、L値が
86以上であれば下地の金属基板(鋼板)は透けて見え
ない。
【0027】(光沢度)光度測定機により開き角度を4
5°で光沢度を測定した。光沢度が70%以上あれば高
光沢である。
【0028】(曲げ加工後の外観)90°の曲げ加工を
行ない、曲げ加工部の外観を目視で観察し、琺瑯の剥
離、表面の亀裂の有無を調べた。琺瑯の剥離、表面亀裂
のないものを良好とした。
【0029】(琺瑯膜厚)琺瑯膜厚は琺瑯断面の電子顕
微鏡観察により測定した。
【0030】(実施例2〜10)表2に示すように、顔
料含有量、顔料粒径、膜厚、釉薬など変化させた以外
は、実施例1と同様にサンプルを試作し、実施例1と同
様の評価を行った。結果を表2に示す。
【0031】(比較例1〜6)表2に示すように、顔料
含有量、顔料粒径、膜厚、釉薬など変化させた以外は、
実施例1と同様にサンプルを試作し、実施例1と同様の
評価を行った。結果を表2に示す。
【0032】
【表1】
【0033】
【表2】
【0034】
【発明の効果】本発明によれば、高明度で、かつ高光沢
を有し、しかも後曲げ加工性にも優れた琺瑯板が提供さ
れる。Description: BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an enamel plate having high brightness, high gloss, and excellent post-bending workability. 2. Description of the Related Art Enamel products are provided with a vitreous (glaze) enamel layer on the surface of a metal substrate serving as a base.
It has corrosion resistance, weather resistance and chemical resistance. Since this enamel product often requires a design, high brightness, that is, the enamel layer is sufficiently colored, and in addition to excellent shielding properties such that the underlying metal substrate cannot be seen through, high gloss is required. Often. In addition, workability is required, which does not impair the appearance due to cracking, peeling, or the like even when bending. [0003] Of these, it is generally known that the above requirements can be satisfied by including a color pigment in the enamel layer and increasing the film thickness of the enamel layer. For example, Japanese Patent Publication No. 6-43256 discloses that, on an aluminum-plated steel sheet, titanium oxide as a white pigment is mixed in a proportion of 50 parts by weight or more with respect to 100 parts by weight of a transparent frit of glaze mainly composed of P 2 O 5. A high brightness enamel product provided with an enamel layer included therein is disclosed. However, according to the study of the present inventor, when a large amount of pigment is added to the transparent glaze to such an extent that the substrate metal is not transparent as described above, a high brightness (shielding property) can be obtained, but the enamel surface is severe. It turned out that unevenness was produced and high gloss could not be obtained. Further, it is difficult to remove the dirt substance that has entered the concave portions on the uneven surface by washing with a detergent such as a solvent, so that not only the surface dirt remains but also the gloss is reduced due to dirt. [0005] The enamel layer is usually thickened to about 100 µm because the thicker the film, the higher the brightness can be obtained. However, when the enamel plate is bent (post-bending), if the enamel layer containing a large amount of pigment has a large film thickness as described above, for example, about 70 μm as shown in the examples of the publication, Cracks are noticeable and a product with poor appearance is obtained. As described above, an enamel plate satisfying all of brightness, gloss, and post-bending workability has not yet been obtained.
In addition, when providing an enamel layer using only a transparent frit of glaze mainly composed of P 2 O 5 on an aluminum plated steel sheet,
It is known that when the film thickness is 10 to 50 μm, an enamel product having excellent workability can be obtained (Japanese Patent Publication No. 6-43257). I can't get it. Further, even if an enamel layer containing 50 parts by weight or more of a normal pigment with respect to 100 parts by weight of the transparent frit is provided in a thickness of 10 to 50 μm, the problem of poor gloss is still solved. Not done. SUMMARY OF THE INVENTION An object of the present invention is to provide an enamel plate having high brightness, high gloss, and excellent post-bending workability. SUMMARY OF THE INVENTION The present inventor has found that when an enamel layer is formed by adding a pigment to a glaze, a pigment having an average particle size in a very limited range is used. It was found that an unexpected effect of obtaining high brightness and high gloss even when the addition amount of the enamel layer was small and the thickness of the enamel layer was small was obtained. Furthermore, even if this enamel plate is subjected to post-bending processing, cracks are not noticeable, and the appearance is good. That is, the enamel plate according to the present invention has an average particle size of 0.2 to 0.2 on at least one surface of the base substrate.
6 to 10% by weight of a pigment having a thickness of 20 to
It is characterized by having an enamel layer of 50 μm.
The pigment is preferably a white pigment, and more preferably a white titanium oxide pigment. The glaze used for forming the enamel layer preferably has P 2 O 5 as a main component. DETAILED DESCRIPTION OF THE INVENTION The term "enamel" refers to a vitreous coating obtained by applying (glazing) an inorganic glass powder as a glaze on the surface of a substrate such as a metal and baking it. The enamel plate according to the present invention includes an enamel layer having a pigment having an average particle size of 0.2 to 0.26 μm on at least one surface of a base substrate at 10 to 25% by weight and a film thickness of 20 to 50 μm. have. Hereinafter, the present invention having such a configuration will be specifically described. The base substrate is usually a metal plate such as an iron plate, a steel plate, or an aluminum plate. These metal plates are subjected to a plating treatment such as zinc plating, aluminum plating, aluminum zinc alloy plating, iron zinc alloy plating, a chemical conversion treatment, and a chromate treatment. A metal plate subjected to a surface treatment such as a treatment is used. The base substrate may be made of a material other than a metal plate as long as the material can withstand the enamel firing temperature. Among these, it is particularly preferable to use a metal plate that has been subjected to surface treatment such as plating and has corrosion resistance, weather resistance, and the like. In the present invention, an enamel layer containing a pigment having a specific particle size in a specific amount is provided on at least one surface of the substrate. The enamel layer containing a pigment as described above is usually formed by firing an enamel glaze obtained by adding a pigment to a vitreous glaze as a base material, and specifically, a specific pigment as described below is applied to the vitreous glaze. Is added to prepare a mixture slurry (enamel glaze), and then the slurry is glazed on a substrate and fired. [0013] The glaze to be glaze base material, can be used widely known glaze, for example, Ti O 2, Si O 2 , Zr O
R 2 such as RO 2 compounds such as P 2 O 5 and V 2 O 5
2 O 5 compound, Sb 2 O 3, Al 2 O 3, B 2 O 3 R 2 O 3 based compounds such as, Na 2 O, K 2 O , R 2 , such as Li 2 O
O-based compound, Zn O, Ba O, RO-based compounds such as Ca O, can be used glaze obtained from mineral raw materials such as fluoride-based compounds such as ZrF 4, AlF 3. A glaze may be prepared by combining these. Among them, as described later, in order to prevent a decrease in the hiding power or discoloration of the pigment, a glaze having a low firing temperature is preferable, and an R 2 O 5 glaze is particularly preferable, and P 2 O 5 is mainly used. Glazes included as components are preferred. Here, the main component is a component contained in the glaze at a rate of 50% by weight or more. The glaze is melted by firing to form a film, and usually does not become a particle-shaped pigment in the formed enamel layer. In the present invention, the pigment has an average particle size of 0.20 to 0.26 in the enamel layer.
μm, preferably in the range of 0.21 to 0.25 μm. The particle size of pigments generally used in the past has a wide range from about 0.1 μm to about 0.3 μm, but in the present invention, the pigment used is contained in the enamel layer with substantially the same particle size. Therefore, the average particle size is 0.20 to 0.26 μm, preferably 0.21 to
A pigment of 0.25 μm is used. If a pigment having an average particle diameter within the above range is used, two or more kinds of pigments having different particle diameters can be used in combination. Further, it is preferable that the average particle diameter is within the above range, the particle diameter is small, and the particle diameters are uniform. Here, the average particle diameter refers to a particle 1000 measured using an electron microscope or the like.
It means the average value of the particle size of the individual pieces. The pigment having the above average particle size can be obtained by dry and / or wet pulverization, and then classification by sedimentation, wind power, or the like. In the present invention, the average particle size is in the above range,
Known pigments can be widely used as long as they do not melt even at the firing temperature. Specifically, white pigments such as titanium oxide and zinc oxide, and non-white pigments such as iron oxide and chromium oxide can be used. Different kinds of pigments may be used in combination. Among these, a white pigment excellent in concealing property of the underlying substrate is preferable, and among the white pigments, titanium oxide particularly excellent in concealing property is preferable. Titanium oxide has two types of crystal phases, a rutile type and an anatase type. Either type may be used.
A rutile type having a high ability to absorb and block a wavelength in a visible light region is preferable. In addition, in titanium oxide, the transformation of the crystal phase from rutile type to anatase type occurs at 600 ° C. or higher,
When firing at a high temperature, problems such as a decrease in hiding power and discoloration are likely to occur. Therefore, in order to obtain a high-brightness enamel using rutile-type titanium oxide as a pigment, the firing temperature is preferably 550 ° C. or lower. In the present invention, the shape of the pigment is not particularly limited, such as a granular shape, a spherical shape, and a flaky shape, but a granular shape or a spherical shape is preferable in order to improve the dispersibility of the mixture slurry. When the pigment having the above-mentioned average particle size is contained in the enamel layer, the pigment sufficiently absorbs visible light, the shielding property is improved, and a high brightness can be obtained. Low, high gloss is obtained. The average particle size is 0.20μ
If it is less than m, the pigment cannot absorb and block the visible light, resulting in insufficient lightness. On the other hand, if it exceeds 0.26 μm, the surface will have many irregularities and the gloss will be insufficient. This will be described more specifically. For example, titanium oxide, which is a white pigment, can absorb and block wavelengths in the visible light region if the average particle size is 0.2 to 0.3 μm.
However, the particle size of the pigment affects the unevenness of the enamel surface. The larger the particle size of the pigment, the larger the unevenness of the enamel surface, and the smaller the particle size, the smaller the unevenness of the enamel surface.
Specifically, when a titanium oxide pigment having a so-called “large particle size” having an average particle size exceeding 0.26 μm is used, irregularities on the surface of the enamel become large and high gloss cannot be obtained. Further, the average particle size is 0.
When a titanium oxide pigment having a so-called “small particle size” of less than 20 μm is used, the pigment cannot absorb or block a wavelength in a visible light range, and high brightness cannot be obtained. As described above, 0.2-0.26 μm
When a pigment having a specific average particle size of m is included, the effect of lightness is significantly larger than when a pigment having a particle size of about 0.1 μm to about 0.3 μm, which is generally used, is included. The finding that high brightness and high luminosity can be obtained even with a small pigment content has been found by the present inventors. In the present invention, the above pigment is contained in the enamel layer finally fired and formed in an amount of 10 to 25% by weight, preferably 15 to 23% by weight. The remaining component forming the enamel layer is usually the glaze, but may contain other components as long as the object of the present invention is not impaired. The pigment content is 10% by weight.
If less than, the lightness is insufficient, if more than 25% by weight,
Surface irregularities increase, resulting in insufficient gloss. The thickness of the enamel layer is 20 to 50 μm. When the film thickness is less than 20 μm, gloss and lightness are reduced,
On the other hand, if it exceeds 50 μm, the appearance of the post-bent portion tends to be impaired. The film thickness is preferably 25 to 45 μm, more preferably 25 to 40 μm, and particularly preferably 25 to 37 μm.
m. In the present invention, the thickness of the enamel layer is 20 to 50 μm
Although it is thinner than a conventional general thickness, high brightness is exhibited even with such a film thickness. This is probably because a pigment having an average particle diameter in a specific range was used. Specifically, the lightness (L) measured according to JISZ-8729
Value) is usually 86 or more, preferably 88 or more, particularly preferably 90 or more.
The gloss measured at 5 ° is usually at least 70%, preferably at least 75%. Further, the enamel plate having the enamel layer as described above is also excellent in bending workability (post-bending workability), hardly peels off even when the enamel plate is bent, and has an appearance without generating cracks on the surface. Excellent enamel products can be obtained. Next, an example of a method for producing an enamel plate according to the present invention will be described. The above-mentioned enamel plate is obtained by glazing a slurry (enamel glaze) containing a glaze and a specific pigment on at least one surface of the base substrate and firing the slurry to form an enamel layer. The glaze is RO 2 type mentioned above,
A mineral raw material such as R 2 O 5 is crushed and mixed, heated and melted, and then rapidly cooled to obtain a glassy material. Then
A slurry is prepared from the glaze and the pigment. The slurry may contain a dispersant and the like in addition to the glaze, pigment, and water. Usually, a slurry is prepared by mixing and pulverizing a glaze to which a pigment, water, a dispersant and the like have been added using a ball mill, a mortar, a grinder or the like. The obtained slurry is applied (glazed) on the substrate surface in such an amount that the thickness of the finally obtained enamel layer falls within the above range. At this time, it is preferable that the surface of the substrate is degreased, washed, and if necessary, plated, and then the slurry is glazed. Glazing may be performed by any of a coating method using a brush, a roller, or the like, a spraying method using a spray, an electrostatic coating, a roll coater method, a transfer paper method, and the like.
Whether the surface to be glazed is one side or both sides of the substrate may be selected as necessary. The substrate to be glazed may be not only a flat substrate but also a bent substrate. The glazed substrate is kept at a high temperature in an electric furnace, a gas furnace, a tunnel furnace, a batch furnace or the like, and the slurry on the substrate is fired to form an enamel layer. The firing temperature may be a temperature at which the glaze melts and a temperature at which the pigment does not melt, but is preferably a temperature at which crystal transformation of the pigment does not occur as described above. EXAMPLES In the following Examples or Comparative Examples, the composition of glaze (frit) used for glazing the underlying substrate is shown in Table 1.
Shown in Example 1 The following enamel glaze (slurry) was prepared such that the content of titanium oxide in the enamel layer was 20% by weight. To 100 parts by weight of glaze A having the composition shown in Table 1, 25 parts by weight of titanium oxide having an average particle size of 0.2 μm as a pigment, 35 parts by weight of water, and 0.5 part by weight of a dispersant (sodium pyrophosphate) were added. , And pulverized and mixed to prepare a slurry. This slurry was glazed on the surface of the alloy-treated hot-dip galvanized steel sheet and fired at 530 ° C. to form an enamel layer, thereby obtaining an enamel plate (sample). The obtained sample was evaluated for glossiness, lightness, enamel film thickness, and appearance of a bent enamel product. Table 2 shows the results. (Lightness) Lightness (L value) was measured using a color difference meter in accordance with JISZ-8729 "Display method of object color". The L value is an index indicating the concealability of the substrate. If the L value is 86 or more, the underlying metal substrate (steel plate) cannot be seen through. (Glossiness) The opening angle was set to 4 by a photometer.
The gloss was measured at 5 °. If the glossiness is 70% or more, the glossiness is high. (Appearance after bending) A 90 ° bending operation was performed, and the appearance of the bent portion was visually observed to check for peeling of the enamel and cracks on the surface. Those with no peeling of the enamel and no surface cracks were evaluated as good. (Enamel Thickness) The enamel thickness was measured by observing the cross section of the enamel with an electron microscope. (Examples 2 to 10) As shown in Table 2, except that the pigment content, the pigment particle size, the film thickness, the glaze, and the like were changed, a sample was made in the same manner as in Example 1 and a sample was produced. The same evaluation was performed. Table 2 shows the results. (Comparative Examples 1 to 6) As shown in Table 2, except that the pigment content, pigment particle size, film thickness, glaze, etc. were changed,
A sample was prototyped in the same manner as in Example 1, and the same evaluation as in Example 1 was performed. Table 2 shows the results. [Table 1] [Table 2] According to the present invention, an enamel plate having high brightness, high gloss, and excellent post-bending workability is provided.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 熊谷 正人 千葉県千葉市中央区川崎町1番地 川崎製 鉄株式会社技術研究所内 (72)発明者 浜原 京子 千葉県千葉市中央区川崎町1番地 川崎製 鉄株式会社技術研究所内 (72)発明者 鈴木 利英 千葉県千葉市中央区川崎町1番地 川崎製 鉄株式会社技術研究所内 (72)発明者 渡辺 浩司 千葉県習志野市東習志野2丁目18番13号 川鉄建材株式会社技術研究所内 (72)発明者 永石 博 千葉県習志野市東習志野2丁目18番13号 川鉄建材株式会社技術研究所内 (72)発明者 冨樫 房夫 千葉県習志野市東習志野2丁目18番13号 川鉄建材株式会社技術研究所内 ────────────────────────────────────────────────── ─── Continuation of front page (72) Inventor Masato Kumagai 1 Kawasaki-cho, Chuo-ku, Chiba-shi, Chiba Iron Research Institute (72) Inventor Kyoko Hamahara 1 Kawasaki-cho, Chuo-ku, Chiba-shi, Chiba Iron Research Institute (72) Inventor Toshihide Suzuki 1 Kawasaki-cho, Chuo-ku, Chiba-shi, Chiba Iron Research Institute (72) Inventor Koji Watanabe 2-18-13 Higashi Narashino, Narashino City, Chiba Prefecture Kawasaki Construction Materials Co., Ltd. (72) Inventor Hiroshi Nagaishi 2-18-13 Higashi Narashino, Narashino City, Chiba Prefecture Kawasaki Construction Materials Co., Ltd. (72) Inventor Fumio Togashi 2-18-13 Higashi Narashino, Narashino City, Chiba Prefecture Kawasaki Construction Materials Co., Ltd.
Claims (1)
粒径が0.2〜0.26μmの顔料を10〜25重量%
含有し、膜厚が20〜50μmである琺瑯層を有するこ
とを特徴とする琺瑯板。Claims: 1. A pigment having an average particle size of 0.2 to 0.26 μm is coated on at least one surface of a base substrate in an amount of 10 to 25% by weight.
An enamel plate comprising an enamel layer having a thickness of 20 to 50 μm.
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Cited By (2)
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---|---|---|---|---|
WO2015129647A1 (en) * | 2014-02-25 | 2015-09-03 | 東罐マテリアル・テクノロジー株式会社 | Glaze for aluminum porcelain enameling use |
JP2015161689A (en) * | 2014-02-26 | 2015-09-07 | Jfe建材株式会社 | Marker board and its manufacturing method |
-
1998
- 1998-08-12 JP JP22782898A patent/JP3913366B2/en not_active Expired - Lifetime
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
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WO2015129647A1 (en) * | 2014-02-25 | 2015-09-03 | 東罐マテリアル・テクノロジー株式会社 | Glaze for aluminum porcelain enameling use |
JP2015161689A (en) * | 2014-02-26 | 2015-09-07 | Jfe建材株式会社 | Marker board and its manufacturing method |
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