IT8319598A0 - PROCEDURE FOR TREATING SILICON FOR THE PURPOSE OF PRODUCING CHLOROSILANES. - Google Patents
PROCEDURE FOR TREATING SILICON FOR THE PURPOSE OF PRODUCING CHLOROSILANES.Info
- Publication number
- IT8319598A0 IT8319598A0 IT8319598A IT1959883A IT8319598A0 IT 8319598 A0 IT8319598 A0 IT 8319598A0 IT 8319598 A IT8319598 A IT 8319598A IT 1959883 A IT1959883 A IT 1959883A IT 8319598 A0 IT8319598 A0 IT 8319598A0
- Authority
- IT
- Italy
- Prior art keywords
- procedure
- treating silicon
- producing chlorosilanes
- chlorosilanes
- producing
- Prior art date
Links
- 239000005046 Chlorosilane Substances 0.000 title 1
- 229910052710 silicon Inorganic materials 0.000 title 1
- 239000010703 silicon Substances 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
- C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
- C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
- C01B33/10715—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by reacting chlorine with silicon or a silicon-containing material
- C01B33/10731—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by reacting chlorine with silicon or a silicon-containing material with the preferential formation of trichlorosilane
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
- C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
- C01B33/10715—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by reacting chlorine with silicon or a silicon-containing material
- C01B33/10731—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by reacting chlorine with silicon or a silicon-containing material with the preferential formation of trichlorosilane
- C01B33/10736—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by reacting chlorine with silicon or a silicon-containing material with the preferential formation of trichlorosilane from silicon
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
- C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
- C01B33/10742—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material
- C01B33/10757—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material with the preferential formation of trichlorosilane
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
- C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
- C01B33/10742—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material
- C01B33/10757—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material with the preferential formation of trichlorosilane
- C01B33/10763—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material with the preferential formation of trichlorosilane from silicon
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US34940182A | 1982-02-16 | 1982-02-16 |
Publications (3)
Publication Number | Publication Date |
---|---|
IT8319598A0 true IT8319598A0 (en) | 1983-02-15 |
IT8319598A1 IT8319598A1 (en) | 1984-08-15 |
IT1163105B IT1163105B (en) | 1987-04-08 |
Family
ID=23372246
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IT19598/83A IT1163105B (en) | 1982-02-16 | 1983-02-15 | PROCEDURE FOR TREATING SILICON FOR THE PURPOSE OF PRODUCING CHLOROSILANS |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPS58172221A (en) |
DE (1) | DE3303903A1 (en) |
IT (1) | IT1163105B (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3809784C1 (en) * | 1988-03-23 | 1989-07-13 | Huels Ag, 4370 Marl, De | |
DE3828344C1 (en) * | 1988-08-20 | 1989-07-06 | Huels Ag, 4370 Marl, De | |
US5530151A (en) * | 1995-06-26 | 1996-06-25 | General Electric Company | Method of passivating organochlorosilane reactor fines and salvaging chlorosilane values therefrom |
US5871705A (en) * | 1996-09-19 | 1999-02-16 | Tokuyama Corporation | Process for producing trichlorosilane |
US6013235A (en) * | 1999-07-19 | 2000-01-11 | Dow Corning Corporation | Conversion of direct process high-boiling residue to monosilanes |
DE102006009954A1 (en) * | 2006-03-03 | 2007-09-06 | Wacker Chemie Ag | Recycling of high-boiling compounds within a chlorosilane composite |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3704104A (en) * | 1970-06-01 | 1972-11-28 | Texas Instruments Inc | Process for the production of trichlorosilane |
BE792542A (en) * | 1971-12-11 | 1973-03-30 | Degussa | PROCESS FOR THE MANUFACTURE OF METAL-FREE CHLOROSILANES DURING THE CHLORINATION OR HYDROCHLORINATION OF FERROSILICIUM |
DE2630542C3 (en) * | 1976-07-07 | 1981-04-02 | Dynamit Nobel Ag, 5210 Troisdorf | Process for the production of trichlorosilane and silicon tetrahedral |
US4307242A (en) * | 1980-10-03 | 1981-12-22 | General Electric Company | Process for removing impurities from residual silicon powder |
-
1983
- 1983-02-05 DE DE19833303903 patent/DE3303903A1/en not_active Withdrawn
- 1983-02-14 JP JP58021749A patent/JPS58172221A/en active Granted
- 1983-02-15 IT IT19598/83A patent/IT1163105B/en active
Also Published As
Publication number | Publication date |
---|---|
IT8319598A1 (en) | 1984-08-15 |
IT1163105B (en) | 1987-04-08 |
JPS58172221A (en) | 1983-10-11 |
DE3303903A1 (en) | 1983-08-25 |
JPH0448725B2 (en) | 1992-08-07 |
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