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IT7927810A0 - Composizione fotosensibile di rivestimento. - Google Patents

Composizione fotosensibile di rivestimento.

Info

Publication number
IT7927810A0
IT7927810A0 IT7927810A IT2781079A IT7927810A0 IT 7927810 A0 IT7927810 A0 IT 7927810A0 IT 7927810 A IT7927810 A IT 7927810A IT 2781079 A IT2781079 A IT 2781079A IT 7927810 A0 IT7927810 A0 IT 7927810A0
Authority
IT
Italy
Prior art keywords
coating composition
photosensitive coating
photosensitive
composition
coating
Prior art date
Application number
IT7927810A
Other languages
English (en)
Other versions
IT1162598B (it
Inventor
Skarvinko Eugene Roman
Original Assignee
Ibm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibm filed Critical Ibm
Publication of IT7927810A0 publication Critical patent/IT7927810A0/it
Application granted granted Critical
Publication of IT1162598B publication Critical patent/IT1162598B/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/026—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from the reaction products of polyepoxides and unsaturated monocarboxylic acids, their anhydrides, halogenides or esters with low molecular weight
    • C08F299/028—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from the reaction products of polyepoxides and unsaturated monocarboxylic acids, their anhydrides, halogenides or esters with low molecular weight photopolymerisable compositions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Epoxy Resins (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
IT27810/79A 1978-12-08 1979-12-04 Composizione fotosensibile di rivestimento IT1162598B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/967,742 US4237216A (en) 1978-12-08 1978-12-08 Photosensitive patternable coating composition containing novolak type materials

Publications (2)

Publication Number Publication Date
IT7927810A0 true IT7927810A0 (it) 1979-12-04
IT1162598B IT1162598B (it) 1987-04-01

Family

ID=25513244

Family Applications (1)

Application Number Title Priority Date Filing Date
IT27810/79A IT1162598B (it) 1978-12-08 1979-12-04 Composizione fotosensibile di rivestimento

Country Status (6)

Country Link
US (1) US4237216A (it)
EP (1) EP0014237B1 (it)
JP (1) JPS5579439A (it)
CA (1) CA1115587A (it)
DE (1) DE2965255D1 (it)
IT (1) IT1162598B (it)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5622364A (en) * 1979-08-01 1981-03-02 Matsushita Electric Ind Co Ltd Coating composition
ATE14803T1 (de) * 1981-09-17 1985-08-15 Ciba Geigy Ag Lichtempfindliches beschichtungsmittel und seine verwendung fuer schutzzwecke.
US4447512A (en) * 1982-01-25 1984-05-08 Polychrome Corporation Method for making a negative working lithographic printing plate
US4483758A (en) * 1982-01-25 1984-11-20 Polychrome Corporation Method for making a negative working lithographic printing plate
US4464458A (en) * 1982-12-30 1984-08-07 International Business Machines Corporation Process for forming resist masks utilizing O-quinone diazide and pyrene
GB8307220D0 (en) * 1983-03-16 1983-04-20 Ciba Geigy Ag Production of images
EP0207188B1 (en) * 1985-06-29 1996-06-19 Dainippon Ink And Chemicals, Inc. Resin composition for solder resist ink
US4882245A (en) * 1985-10-28 1989-11-21 International Business Machines Corporation Photoresist composition and printed circuit boards and packages made therewith
JP2604173B2 (ja) * 1987-02-25 1997-04-30 東京応化工業株式会社 耐熱性感光性樹脂組成物
JP2571800B2 (ja) * 1987-11-27 1997-01-16 イビデン株式会社 無電解めっき用感光性接着剤およびプリント配線板
US4948707A (en) * 1988-02-16 1990-08-14 International Business Machines Corporation Conditioning a non-conductive substrate for subsequent selective deposition of a metal thereon
US5041470A (en) * 1989-03-03 1991-08-20 International Business Machines Corporation Flame retardant photocurable adhesive for wires and circuit boards
US5054872A (en) * 1990-03-16 1991-10-08 Ibm Corporation Polymeric optical waveguides and methods of forming the same
US5667934A (en) * 1990-10-09 1997-09-16 International Business Machines Corporation Thermally stable photoimaging composition
JP2772227B2 (ja) * 1993-11-15 1998-07-02 イビデン株式会社 プリント配線板
US5561194A (en) * 1995-03-29 1996-10-01 International Business Machines Corporation Photoresist composition including polyalkylmethacrylate co-polymer of polyhydroxystyrene
US6259036B1 (en) * 1998-04-13 2001-07-10 Micron Technology, Inc. Method for fabricating electronic assemblies using semi-cured conductive elastomeric bumps
JP3964326B2 (ja) * 2000-09-20 2007-08-22 太陽インキ製造株式会社 カルボキシル基含有感光性樹脂、それを含有するアルカリ現像可能な光硬化性・熱硬化性組成物及びその硬化物
US6811937B2 (en) 2001-06-21 2004-11-02 Dsm Desotech, Inc. Radiation-curable resin composition and rapid prototyping process using the same
US20030138731A1 (en) * 2001-12-21 2003-07-24 Treliant Fang Photoresist formulation for high aspect ratio plating
US20130017374A1 (en) 2009-11-18 2013-01-17 Ecole Polytechnique Federale De Lausanne Carbon nanotubes nanocomposites for microfabrication applications

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3301743A (en) * 1963-06-12 1967-01-31 Robertson Co H H Polyhydroxy polyacrylate esters of epoxidized phenol-formaldehyde novolac resins and laminates therefrom
US3450613A (en) * 1964-03-09 1969-06-17 Bausch & Lomb Epoxy adhesive containing acrylic acid-epoxy reaction products and photosensitizers
US3637618A (en) * 1970-03-11 1972-01-25 Shell Oil Co Unsaturated polyesters from epoxides and ethylenically unsaturated monocarboxylic acid mixed with solid epoxide resin
DE2206387B2 (de) * 1971-02-10 1974-05-02 Showa Highpolymer Co., Ltd., Tokio Verfahren zur Herstellung eines ungesättigten Epoxyesterharzes
US3776729A (en) * 1971-02-22 1973-12-04 Ibm Photosensitive dielectric composition and process of using the same
US3804735A (en) * 1972-04-10 1974-04-16 Continental Can Co Photopolymerizable compositions prepared from beta-hydroxy esters and polyitaconates
US3847770A (en) * 1972-04-10 1974-11-12 Continental Can Co Photopolymerizable compositions prepared from beta hydroxy esters and polyitaconates
US3968016A (en) * 1972-05-17 1976-07-06 Ppg Industries, Inc. Mixture of unsaturated polyester resins with an epoxy diacrylate and the actinic light treatment of same
NL7207743A (en) * 1972-06-07 1973-12-11 Acrylic esters of polyepoxy cpds - crosslinkable by uv light and ionizing radiation
JPS4967709A (it) * 1972-10-28 1974-07-01
US3912670A (en) * 1973-02-28 1975-10-14 O Brien Corp Radiation curable can coating composition
DE2349979A1 (de) * 1973-10-04 1975-04-17 Bayer Ag Uv-licht-haertende massen hoher reaktivitaet
JPS5128677A (en) * 1974-09-04 1976-03-11 Alps Electric Co Ltd Suitsuchi no tanshiban no seizohoho
US4169732A (en) * 1978-01-09 1979-10-02 International Business Machines Corporation Photosensitive coating composition and use thereof

Also Published As

Publication number Publication date
EP0014237A3 (en) 1980-12-10
JPS5579439A (en) 1980-06-14
CA1115587A (en) 1982-01-05
EP0014237B1 (de) 1983-04-20
DE2965255D1 (en) 1983-05-26
JPS6213657B2 (it) 1987-03-27
EP0014237A2 (de) 1980-08-20
US4237216A (en) 1980-12-02
IT1162598B (it) 1987-04-01

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