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IT1014209B - Procedimento ed apparecchiatura per il trattamento chimico auto matico di pezzi per lavorare par ticolarmente semiconduttori - Google Patents

Procedimento ed apparecchiatura per il trattamento chimico auto matico di pezzi per lavorare par ticolarmente semiconduttori

Info

Publication number
IT1014209B
IT1014209B IT68570/74A IT6857074A IT1014209B IT 1014209 B IT1014209 B IT 1014209B IT 68570/74 A IT68570/74 A IT 68570/74A IT 6857074 A IT6857074 A IT 6857074A IT 1014209 B IT1014209 B IT 1014209B
Authority
IT
Italy
Prior art keywords
semiconductor
procedure
work
equipment
parts
Prior art date
Application number
IT68570/74A
Other languages
English (en)
Italian (it)
Original Assignee
Allied Chem
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Allied Chem filed Critical Allied Chem
Application granted granted Critical
Publication of IT1014209B publication Critical patent/IT1014209B/it

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/02—Conveying systems characterised by their application for specified purposes not otherwise provided for for conveying workpieces through baths of liquid
    • B65G49/04—Conveying systems characterised by their application for specified purposes not otherwise provided for for conveying workpieces through baths of liquid the workpieces being immersed and withdrawn by movement in a vertical direction
    • B65G49/0409—Conveying systems characterised by their application for specified purposes not otherwise provided for for conveying workpieces through baths of liquid the workpieces being immersed and withdrawn by movement in a vertical direction specially adapted for workpieces of definite length
    • B65G49/0436—Conveying systems characterised by their application for specified purposes not otherwise provided for for conveying workpieces through baths of liquid the workpieces being immersed and withdrawn by movement in a vertical direction specially adapted for workpieces of definite length arrangements for conveyance from bath to bath
    • B65G49/044—Conveying systems characterised by their application for specified purposes not otherwise provided for for conveying workpieces through baths of liquid the workpieces being immersed and withdrawn by movement in a vertical direction specially adapted for workpieces of definite length arrangements for conveyance from bath to bath along a continuous circuit
    • B65G49/0445—Conveying systems characterised by their application for specified purposes not otherwise provided for for conveying workpieces through baths of liquid the workpieces being immersed and withdrawn by movement in a vertical direction specially adapted for workpieces of definite length arrangements for conveyance from bath to bath along a continuous circuit the circuit being movable vertically as a whole
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S134/00—Cleaning and liquid contact with solids
    • Y10S134/902—Semiconductor wafer
IT68570/74A 1973-05-21 1974-05-20 Procedimento ed apparecchiatura per il trattamento chimico auto matico di pezzi per lavorare par ticolarmente semiconduttori IT1014209B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US362621A US3869313A (en) 1973-05-21 1973-05-21 Apparatus for automatic chemical processing of workpieces, especially semi-conductors

Publications (1)

Publication Number Publication Date
IT1014209B true IT1014209B (it) 1977-04-20

Family

ID=23426833

Family Applications (1)

Application Number Title Priority Date Filing Date
IT68570/74A IT1014209B (it) 1973-05-21 1974-05-20 Procedimento ed apparecchiatura per il trattamento chimico auto matico di pezzi per lavorare par ticolarmente semiconduttori

Country Status (6)

Country Link
US (1) US3869313A (ja)
JP (1) JPS5020670A (ja)
DE (2) DE7417527U (ja)
FR (1) FR2230421B3 (ja)
GB (1) GB1460360A (ja)
IT (1) IT1014209B (ja)

Families Citing this family (45)

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CA1050864A (en) * 1973-08-29 1979-03-20 James K. Anderson Apparatus for automatically processing photogravure curvilinear surfaces
US3964957A (en) * 1973-12-19 1976-06-22 Monsanto Company Apparatus for processing semiconductor wafers
US3923567A (en) * 1974-08-09 1975-12-02 Silicon Materials Inc Method of reclaiming a semiconductor wafer
US4108683A (en) * 1975-05-15 1978-08-22 Anderson James K Method for automatically processing photogravure curvilinear surfaces
US3986518A (en) * 1975-11-24 1976-10-19 Toyo Giken Kogyo Kabushiki Kaisha Work article handling system in surface treatment apparatus
US4153363A (en) * 1977-11-07 1979-05-08 Cordell Engineering, Inc. Batch developing
DE3006045A1 (de) * 1980-02-18 1981-08-20 Siemens AG, 1000 Berlin und 8000 München Verfahren und vorrichtung zur behandlung, insbesondere reinigung, von flachen objekten
US4440594A (en) * 1982-09-29 1984-04-03 Stearns Llewelyn B Method and apparatus of chemical milling of chemical materials
US4520834A (en) * 1983-11-08 1985-06-04 Dicicco Paolo S Apparatus for processing articles in a series of process solution containers
DE3824138A1 (de) * 1988-07-15 1990-01-18 Siemens Ag Anordnung zum spuelen von in horden angeordneten halbleiterkristallscheiben
US4971715A (en) * 1988-11-18 1990-11-20 International Business Machines Corporation Phenolic-free stripping composition and use thereof
US5593507A (en) * 1990-08-22 1997-01-14 Kabushiki Kaisha Toshiba Cleaning method and cleaning apparatus
US5242468A (en) * 1991-03-19 1993-09-07 Startec Ventures, Inc. Manufacture of high precision electronic components with ultra-high purity liquids
GB9108641D0 (en) * 1991-04-23 1991-06-12 Oneida Plastic Fabrications Lt Front access unit
DE4302532C2 (de) * 1992-01-30 1994-12-22 Wurster Gerd Anlage zum Vorbehandeln von metallischen Teilen
JPH07103470B2 (ja) * 1992-03-10 1995-11-08 ミネベア株式会社 金属品洗浄方法、金属品洗浄装置及び金属品乾燥装置
JPH07100441A (ja) * 1993-09-30 1995-04-18 Nippon Seiki Co Ltd 洗浄装置
US5496778A (en) * 1994-01-07 1996-03-05 Startec Ventures, Inc. Point-of-use ammonia purification for electronic component manufacture
US6001223A (en) * 1995-07-07 1999-12-14 Air Liquide America Corporation On-site ammonia purification for semiconductor manufacture
US5714203A (en) * 1995-08-23 1998-02-03 Ictop Entwicklungs Gmbh Procedure for the drying of silicon
KR100232998B1 (ko) * 1996-06-05 1999-12-01 윤종용 식각량 조절수단을 갖는 케미컬 배스 유니트
AU3578597A (en) * 1996-06-25 1998-01-14 Cfm Technologies, Inc. Improved method for sulfuric acid resist stripping
US6630052B1 (en) 1996-06-26 2003-10-07 Lg. Philips Lcd Co., Ltd. Apparatus for etching glass substrate
KR0180850B1 (ko) 1996-06-26 1999-03-20 구자홍 유리기판 에칭장치
US5861064A (en) * 1997-03-17 1999-01-19 Fsi Int Inc Process for enhanced photoresist removal in conjunction with various methods and chemistries
KR100265556B1 (ko) * 1997-03-21 2000-11-01 구본준 식각장치
US5904156A (en) * 1997-09-24 1999-05-18 International Business Machines Corporation Dry film resist removal in the presence of electroplated C4's
US6327011B2 (en) * 1997-10-20 2001-12-04 Lg Electronics, Inc. Liquid crystal display device having thin glass substrate on which protective layer formed and method of making the same
JP3595441B2 (ja) * 1997-12-29 2004-12-02 三菱電機株式会社 塩酸過水を用いた洗浄方法
JPH11204478A (ja) * 1998-01-19 1999-07-30 Mitsubishi Electric Corp 半導体基板の洗浄方法およびその洗浄装置
US6864186B1 (en) * 1998-07-28 2005-03-08 Micron Technology, Inc. Method of reducing surface contamination in semiconductor wet-processing vessels
KR100272513B1 (ko) 1998-09-08 2001-01-15 구본준 유리기판의 식각장치
KR100308157B1 (ko) 1998-10-22 2001-11-15 구본준, 론 위라하디락사 액정표시소자용 유리기판
US6261845B1 (en) 1999-02-25 2001-07-17 Cfmt, Inc. Methods and systems for determining chemical concentrations and controlling the processing of semiconductor substrates
JP2001345544A (ja) * 2000-05-31 2001-12-14 Sony Corp プリント配線基板の表面処理装置及び表面処理方法
US20020023667A1 (en) * 2000-08-31 2002-02-28 Thuan Pham Apparatus and method for cleaning a probe tip
TWI221316B (en) * 2001-04-24 2004-09-21 Kobe Steel Ltd Process for drying an object having microstructure and the object obtained by the same
US20030183251A1 (en) * 2001-04-24 2003-10-02 Kabushiski Kaisha Kobe Seiko Sho Process for drying an object having microstructure and the object obtained by the same
US6635590B2 (en) * 2002-01-08 2003-10-21 Taiwan Semiconductor Manufacturing Co., Ltd. Apparatus and method for in-situ removal of polymer residue
US6941956B2 (en) * 2002-03-18 2005-09-13 Dainippon Screen Mfg. Co., Ltd. Substrate treating method and apparatus
JP2004259946A (ja) * 2003-02-26 2004-09-16 Dainippon Screen Mfg Co Ltd 基板処理方法及びその装置
DE102006003990A1 (de) * 2006-01-23 2007-08-02 Gebr. Schmid Gmbh & Co. Verfahren und Vorrichtung zum Aufbereiten bzw. Bearbeiten von Siliziummaterial
US20080163897A1 (en) * 2007-01-10 2008-07-10 Applied Materials, Inc. Two step process for post ash cleaning for cu/low-k dual damascene structure with metal hard mask
EP2072994A1 (en) * 2007-12-21 2009-06-24 Soitec S.A. Method for treating germanium surfaces and solutions to be employed therein
CN105717720A (zh) * 2016-03-18 2016-06-29 深圳市华星光电技术有限公司 一种具有防爆功能的铜制程装置及铜制程防爆方法

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US1871339A (en) * 1930-05-16 1932-08-09 Western Electric Co Apparatus for drying parts
US2270642A (en) * 1935-02-08 1942-01-20 Budd Induction Heating Inc Cleaning and degreasing system
US2510912A (en) * 1948-08-27 1950-06-06 Schurenberg Otto Automatic watch part cleaning machine
US2591681A (en) * 1950-03-08 1952-04-08 Udylite Corp Work-immersion machine with selected delayed immersion
US2896640A (en) * 1957-08-07 1959-07-28 Ramco Equipment Corp Degreasing apparatus
US3134070A (en) * 1960-07-20 1964-05-19 Remwood Chemical Company Unitary control device for detecting the minimum levels of concentration in a multiplicity of caustic washing solutions
US3106927A (en) * 1962-01-15 1963-10-15 Madwed Albert Vapor chamber-tank unit
US3310027A (en) * 1964-04-20 1967-03-21 Hooker Chemical Corp Liquid coating apparatus

Also Published As

Publication number Publication date
FR2230421A1 (ja) 1974-12-20
US3869313A (en) 1975-03-04
DE7417527U (de) 1977-10-27
FR2230421B3 (ja) 1977-03-11
JPS5020670A (ja) 1975-03-05
DE2424422A1 (de) 1974-12-12
GB1460360A (en) 1977-01-06

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