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HK1111773A1 - Pellicle and pellicle stripping device - Google Patents

Pellicle and pellicle stripping device

Info

Publication number
HK1111773A1
HK1111773A1 HK08102461.8A HK08102461A HK1111773A1 HK 1111773 A1 HK1111773 A1 HK 1111773A1 HK 08102461 A HK08102461 A HK 08102461A HK 1111773 A1 HK1111773 A1 HK 1111773A1
Authority
HK
Hong Kong
Prior art keywords
pellicle
stripping device
stripping
pellicle stripping
Prior art date
Application number
HK08102461.8A
Original Assignee
Shinetsu Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinetsu Chemical Co filed Critical Shinetsu Chemical Co
Publication of HK1111773A1 publication Critical patent/HK1111773A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
HK08102461.8A 2006-05-15 2008-03-04 Pellicle and pellicle stripping device HK1111773A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006135185A JP4637053B2 (en) 2006-05-15 2006-05-15 Pellicle and pellicle peeling device

Publications (1)

Publication Number Publication Date
HK1111773A1 true HK1111773A1 (en) 2008-08-15

Family

ID=38838450

Family Applications (1)

Application Number Title Priority Date Filing Date
HK08102461.8A HK1111773A1 (en) 2006-05-15 2008-03-04 Pellicle and pellicle stripping device

Country Status (5)

Country Link
JP (1) JP4637053B2 (en)
KR (1) KR101312478B1 (en)
CN (1) CN101075088B (en)
HK (1) HK1111773A1 (en)
TW (1) TWI329238B (en)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5051840B2 (en) * 2007-11-22 2012-10-17 信越化学工業株式会社 Method for storing a pellicle in a pellicle storage container
DE102007063383B4 (en) * 2007-12-18 2020-07-02 HAP Handhabungs-, Automatisierungs- und Präzisionstechnik GmbH Device and method for removing pellicles from masks
JP2010261987A (en) * 2009-04-30 2010-11-18 Shin-Etsu Chemical Co Ltd Photomask
JP4879308B2 (en) * 2009-10-29 2012-02-22 信越化学工業株式会社 Pellicle stripping jig and stripping method
JP2013195950A (en) * 2012-03-22 2013-09-30 Toppan Printing Co Ltd Pellicle and photomask
JP5746662B2 (en) * 2012-05-11 2015-07-08 信越化学工業株式会社 Pellicle frame
JP6304884B2 (en) * 2014-09-22 2018-04-04 信越化学工業株式会社 Pellicle pasting method
JP6805495B2 (en) * 2016-01-08 2020-12-23 大日本印刷株式会社 Dustproof body peeling method, dustproof body peeling device
US11143952B2 (en) * 2017-09-28 2021-10-12 Taiwan Semiconductor Manufacturing Company, Ltd. Pellicle removal method
TWI787522B (en) * 2018-06-12 2022-12-21 日商三井化學股份有限公司 Support frame for pellicle, manufacturing method of pellicle and support frame for pellicle, exposure master plate using pellicle, and exposure apparatus
JP7347789B2 (en) * 2019-07-09 2023-09-20 三井化学株式会社 Pellicle frame and pellicle
JP7442291B2 (en) * 2019-10-09 2024-03-04 信越化学工業株式会社 Assembly consisting of a pellicle and its dedicated pellicle case
JP7292420B2 (en) * 2019-12-13 2023-06-16 三井化学株式会社 Pellicle demount method and pellicle demount pretreatment device
WO2022266320A1 (en) * 2021-06-18 2022-12-22 Entegris, Inc. Bonded layer on extreme ultraviolet plate

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61169848A (en) * 1985-01-23 1986-07-31 Oki Electric Ind Co Ltd Separating method of pellicle for mask protection
US4828640A (en) * 1987-05-28 1989-05-09 Mitsui Petrochemical Industries, Ltd. Method of producing films using a peeling jig
JPH0190044U (en) * 1987-12-07 1989-06-14
JP3408000B2 (en) * 1994-11-28 2003-05-19 菱電セミコンダクタシステムエンジニアリング株式会社 Pellicle peeling method
JP3331996B2 (en) * 1998-12-25 2002-10-07 日本電気株式会社 Pellicle
KR100505283B1 (en) * 2001-10-31 2005-08-03 미쓰이 가가쿠 가부시키가이샤 Pellicle and method of manufacturing mask with pellicle
JP4101206B2 (en) * 2003-05-23 2008-06-18 旭化成エレクトロニクス株式会社 Large pellicle support device and mounting method
JP2007292995A (en) * 2006-04-25 2007-11-08 Matsushita Seiki Kk Handling instrument for pellicle

Also Published As

Publication number Publication date
CN101075088A (en) 2007-11-21
JP2007304491A (en) 2007-11-22
KR20070110768A (en) 2007-11-20
TW200742938A (en) 2007-11-16
JP4637053B2 (en) 2011-02-23
KR101312478B1 (en) 2013-09-27
CN101075088B (en) 2010-06-02
TWI329238B (en) 2010-08-21

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20210516