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GB8608374D0 - Semiconductor manufacture - Google Patents

Semiconductor manufacture

Info

Publication number
GB8608374D0
GB8608374D0 GB868608374A GB8608374A GB8608374D0 GB 8608374 D0 GB8608374 D0 GB 8608374D0 GB 868608374 A GB868608374 A GB 868608374A GB 8608374 A GB8608374 A GB 8608374A GB 8608374 D0 GB8608374 D0 GB 8608374D0
Authority
GB
United Kingdom
Prior art keywords
semiconductor manufacture
semiconductor
manufacture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
GB868608374A
Other versions
GB2188748B (en
GB2188748A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
STC PLC
Original Assignee
STC PLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by STC PLC filed Critical STC PLC
Priority to GB8608374A priority Critical patent/GB2188748B/en
Publication of GB8608374D0 publication Critical patent/GB8608374D0/en
Publication of GB2188748A publication Critical patent/GB2188748A/en
Application granted granted Critical
Publication of GB2188748B publication Critical patent/GB2188748B/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Liquid Crystal (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
GB8608374A 1986-04-05 1986-04-05 Semiconductor device manufacture Expired GB2188748B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB8608374A GB2188748B (en) 1986-04-05 1986-04-05 Semiconductor device manufacture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB8608374A GB2188748B (en) 1986-04-05 1986-04-05 Semiconductor device manufacture

Publications (3)

Publication Number Publication Date
GB8608374D0 true GB8608374D0 (en) 1986-05-08
GB2188748A GB2188748A (en) 1987-10-07
GB2188748B GB2188748B (en) 1989-12-13

Family

ID=10595761

Family Applications (1)

Application Number Title Priority Date Filing Date
GB8608374A Expired GB2188748B (en) 1986-04-05 1986-04-05 Semiconductor device manufacture

Country Status (1)

Country Link
GB (1) GB2188748B (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4814799A (en) * 1988-04-15 1989-03-21 The Mead Corporation Method and apparatus for creating a photomask for projecting an image
GB9401566D0 (en) * 1994-01-27 1994-03-23 Univ Dundee Method
JP3263517B2 (en) * 1994-02-08 2002-03-04 株式会社小松製作所 Driving method of liquid crystal mask marker

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2296197A1 (en) * 1974-12-24 1976-07-23 Thomson Csf METHOD AND DEVICE USING A THERMO-OPTICAL EFFECT IN A THIN LAYER IN SMECTIC PHASE FOR THE REPRODUCTION OF IMAGES WITH MEMORY
GB2093206B (en) * 1981-01-23 1984-11-07 Standard Telephones Cables Ltd Liquid crystal cell operation
GB2136142B (en) * 1983-03-03 1987-01-21 Marconi Co Ltd Apparatus for forming an image on a photo-sensitive member
GB2142180B (en) * 1983-06-24 1986-12-17 Standard Telephones Cables Ltd Liquid crystal display cell
JPS60144721A (en) * 1984-01-06 1985-07-31 Canon Inc Method and device for image forming
GB2161951B (en) * 1984-07-17 1988-01-20 Stc Plc Laser addressed smectic displays
GB2162333B (en) * 1984-07-20 1987-10-28 Stc Plc Recording spatially modulated light patterns

Also Published As

Publication number Publication date
GB2188748B (en) 1989-12-13
GB2188748A (en) 1987-10-07

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee