GB731557A - Photopolymerization process and compositions - Google Patents

Abstract

Ethylenically unsaturated resinophors are photopolymerized in the presence of a minor proportion of a photopolymerization catalyst having the formula <FORM:0731557/IV (a)/1> where R represents halogen atoms and monovalent hydrocarbon groups consisting solely of hydrogen and carbon atoms, X is a halogen atom, X1 represents a halogen or hydrogen atom, and R1 represents a hydrogen atom and monovalent hydrocarbon groups consisting solely of hydrogen and carbon atoms, such as desyl chloride and bromide, chloral and bromal. Ethylenically unsaturated resinophors specified which may be polymerized or copolymerized in their monomeric or partially polymerized forms are acrylic and methacrylic acids, methyl and butyl acrylates, methyl, ethyl, butyl, isobutyl, allyl and methallyl methacrylates, ethylene glycol and hexamethylene glycol dimethacrylates, styrene, ortho-methyl and meta-methyl styrenes, chlorinated styrenes, chloroprene, vinyl acetate, allyl alcohol, diallyl maleate and phthalate, dimethallyl carbonate, vinyl and vinylidene chlorides, and unsaturated alkyd resins made from ethane and butane diols and unsaturated dicarboxylic acids such as maleic, fumaric, and itaconic acids. Polymerization may be carried out in bulk or solution, and, if desired, at elevated temperatures in the presence of a peroxide catalyst such as benzoyl, lauroyl, or tert-butyl hydrogen peroxide. The process may be used in the preparation of laminates and mouldings which after photopolymerization may be further polymerized by baking.