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GB2011100B - Production of transfer materials - Google Patents

Production of transfer materials

Info

Publication number
GB2011100B
GB2011100B GB7849668A GB7849668A GB2011100B GB 2011100 B GB2011100 B GB 2011100B GB 7849668 A GB7849668 A GB 7849668A GB 7849668 A GB7849668 A GB 7849668A GB 2011100 B GB2011100 B GB 2011100B
Authority
GB
United Kingdom
Prior art keywords
production
transfer materials
transfer
materials
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB7849668A
Other versions
GB2011100A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Letraset International Ltd
Original Assignee
Letraset International Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Letraset International Ltd filed Critical Letraset International Ltd
Priority to GB7849668A priority Critical patent/GB2011100B/en
Publication of GB2011100A publication Critical patent/GB2011100A/en
Application granted granted Critical
Publication of GB2011100B publication Critical patent/GB2011100B/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G03F7/0955—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer one of the photosensitive systems comprising a non-macromolecular photopolymerisable compound having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C11/00—Auxiliary processes in photography
    • G03C11/12—Stripping or transferring intact photographic layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/34—Imagewise removal by selective transfer, e.g. peeling away

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
GB7849668A 1977-12-21 1978-12-21 Production of transfer materials Expired GB2011100B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB7849668A GB2011100B (en) 1977-12-21 1978-12-21 Production of transfer materials

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB5324277 1977-12-21
GB7849668A GB2011100B (en) 1977-12-21 1978-12-21 Production of transfer materials

Publications (2)

Publication Number Publication Date
GB2011100A GB2011100A (en) 1979-07-04
GB2011100B true GB2011100B (en) 1982-05-26

Family

ID=26267222

Family Applications (1)

Application Number Title Priority Date Filing Date
GB7849668A Expired GB2011100B (en) 1977-12-21 1978-12-21 Production of transfer materials

Country Status (1)

Country Link
GB (1) GB2011100B (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4546064A (en) * 1982-04-02 1985-10-08 North American Philips Corporation Positive-working photoresist composition and method for forming a light-absorbing matrix
GB2182888A (en) * 1985-11-13 1987-05-28 Colin George Thompson Method of making transfers
US4988607A (en) * 1989-05-30 1991-01-29 Minnesota Mining And Manufacturing Company High speed photopolymerizable element with initiator in a topcoat

Also Published As

Publication number Publication date
GB2011100A (en) 1979-07-04

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee