GB2089524B - High resolution lithographic process - Google Patents
High resolution lithographic processInfo
- Publication number
- GB2089524B GB2089524B GB8136287A GB8136287A GB2089524B GB 2089524 B GB2089524 B GB 2089524B GB 8136287 A GB8136287 A GB 8136287A GB 8136287 A GB8136287 A GB 8136287A GB 2089524 B GB2089524 B GB 2089524B
- Authority
- GB
- United Kingdom
- Prior art keywords
- high resolution
- lithographic process
- resolution lithographic
- resolution
- lithographic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US21734280A | 1980-12-17 | 1980-12-17 |
Publications (2)
Publication Number | Publication Date |
---|---|
GB2089524A GB2089524A (en) | 1982-06-23 |
GB2089524B true GB2089524B (en) | 1984-12-05 |
Family
ID=22810664
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB8136287A Expired GB2089524B (en) | 1980-12-17 | 1981-12-02 | High resolution lithographic process |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPS57124352A (en) |
DE (1) | DE3150056A1 (en) |
GB (1) | GB2089524B (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3232498A1 (en) * | 1982-09-01 | 1984-03-01 | Philips Patentverwaltung Gmbh, 2000 Hamburg | MASK FOR PATTERN PRODUCTION IN LACQUER LAYERS BY MEANS OF X-RAY RAY LITHOGRAPHY AND METHOD FOR THEIR PRODUCTION |
DE3435177A1 (en) * | 1983-09-26 | 1985-04-11 | Canon K.K., Tokio/Tokyo | MASK FOR LITHOGRAPHIC PURPOSES |
DE3339624A1 (en) * | 1983-11-02 | 1985-05-09 | Philips Patentverwaltung Gmbh, 2000 Hamburg | METHOD FOR PRODUCING A MASK FOR PATTERN PRODUCTION IN LACQUER LAYERS BY MEANS OF X-RAY RAY LITHOGRAPHY |
JPS6365621A (en) * | 1986-09-05 | 1988-03-24 | Nec Corp | Mask for x-ray exposure |
DE8717448U1 (en) * | 1987-02-06 | 1988-12-29 | Dr. Johannes Heidenhain Gmbh, 83301 Traunreut | Irradiation mask for lithographic pattern creation |
US5781607A (en) * | 1996-10-16 | 1998-07-14 | Ibm Corporation | Membrane mask structure, fabrication and use |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL7412033A (en) * | 1973-09-17 | 1975-03-19 | Siemens Ag | DEVICE FOR FITTING SEMICONDUCTOR DISCS WITH REGARD TO AN IRRADIATION MASK, FOR FORMING A STRUCTURE IN PHOTO PAINT BY IRRADIATION WITH X-RAYS. |
US3963489A (en) * | 1975-04-30 | 1976-06-15 | Western Electric Company, Inc. | Method of precisely aligning pattern-defining masks |
JPS5286778A (en) * | 1976-01-14 | 1977-07-19 | Toshiba Corp | Mask aligning method for x-ray exposure |
DE2626851C3 (en) * | 1976-06-15 | 1982-03-18 | Siemens AG, 1000 Berlin und 8000 München | Process for the production of masks for X-ray lithography |
-
1981
- 1981-12-02 GB GB8136287A patent/GB2089524B/en not_active Expired
- 1981-12-14 JP JP20026181A patent/JPS57124352A/en active Pending
- 1981-12-17 DE DE19813150056 patent/DE3150056A1/en not_active Ceased
Also Published As
Publication number | Publication date |
---|---|
JPS57124352A (en) | 1982-08-03 |
GB2089524A (en) | 1982-06-23 |
DE3150056A1 (en) | 1982-07-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PCNP | Patent ceased through non-payment of renewal fee |
Effective date: 19921202 |