GB2057351A - Laminated blanks - Google Patents
Laminated blanks Download PDFInfo
- Publication number
- GB2057351A GB2057351A GB8012343A GB8012343A GB2057351A GB 2057351 A GB2057351 A GB 2057351A GB 8012343 A GB8012343 A GB 8012343A GB 8012343 A GB8012343 A GB 8012343A GB 2057351 A GB2057351 A GB 2057351A
- Authority
- GB
- United Kingdom
- Prior art keywords
- foil
- blank
- polymer
- metal
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 claims abstract description 76
- 239000011888 foil Substances 0.000 claims abstract description 66
- 239000000758 substrate Substances 0.000 claims abstract description 58
- 229910052751 metal Inorganic materials 0.000 claims abstract description 51
- 239000002184 metal Substances 0.000 claims abstract description 51
- 229920001169 thermoplastic Polymers 0.000 claims abstract description 37
- 238000004519 manufacturing process Methods 0.000 claims abstract description 24
- 239000004020 conductor Substances 0.000 claims abstract description 19
- 238000000151 deposition Methods 0.000 claims abstract description 12
- 230000008021 deposition Effects 0.000 claims abstract description 5
- 229920002492 poly(sulfone) Polymers 0.000 claims description 54
- 229920000642 polymer Polymers 0.000 claims description 31
- 239000000463 material Substances 0.000 claims description 27
- 239000011347 resin Substances 0.000 claims description 22
- 229920005989 resin Polymers 0.000 claims description 22
- 239000004416 thermosoftening plastic Substances 0.000 claims description 21
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical group CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims description 12
- 239000002904 solvent Substances 0.000 claims description 12
- 125000003118 aryl group Chemical group 0.000 claims description 10
- 238000005530 etching Methods 0.000 claims description 10
- 238000005476 soldering Methods 0.000 claims description 10
- 230000003197 catalytic effect Effects 0.000 claims description 8
- 239000007800 oxidant agent Substances 0.000 claims description 8
- 230000008569 process Effects 0.000 claims description 8
- 230000001590 oxidative effect Effects 0.000 claims description 7
- 239000004417 polycarbonate Substances 0.000 claims description 7
- 229920000515 polycarbonate Polymers 0.000 claims description 7
- 238000009713 electroplating Methods 0.000 claims description 6
- 239000003795 chemical substances by application Substances 0.000 claims description 5
- 239000004695 Polyether sulfone Substances 0.000 claims description 4
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 claims description 4
- 239000011810 insulating material Substances 0.000 claims description 4
- 229920006393 polyether sulfone Polymers 0.000 claims description 4
- 238000007596 consolidation process Methods 0.000 claims description 3
- 229920001577 copolymer Polymers 0.000 claims description 3
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical group C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims description 3
- 239000002798 polar solvent Substances 0.000 claims description 3
- 230000008961 swelling Effects 0.000 claims description 3
- 238000000454 electroless metal deposition Methods 0.000 claims description 2
- 239000000835 fiber Substances 0.000 claims description 2
- 230000000873 masking effect Effects 0.000 claims 1
- 229920006254 polymer film Polymers 0.000 claims 1
- 239000011521 glass Substances 0.000 abstract description 11
- 239000003822 epoxy resin Substances 0.000 abstract description 7
- 229920000647 polyepoxide Polymers 0.000 abstract description 7
- 230000001464 adherent effect Effects 0.000 abstract description 5
- 238000002360 preparation method Methods 0.000 abstract description 5
- 239000013043 chemical agent Substances 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 28
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 25
- 229910052802 copper Inorganic materials 0.000 description 24
- 239000010949 copper Substances 0.000 description 24
- 239000000243 solution Substances 0.000 description 12
- 239000000203 mixture Substances 0.000 description 11
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 10
- -1 e.g. Substances 0.000 description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- 238000010030 laminating Methods 0.000 description 9
- 239000000853 adhesive Substances 0.000 description 8
- 230000001070 adhesive effect Effects 0.000 description 8
- 239000004593 Epoxy Substances 0.000 description 7
- 239000002253 acid Substances 0.000 description 7
- 238000000137 annealing Methods 0.000 description 7
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 239000004744 fabric Substances 0.000 description 6
- 229920002120 photoresistant polymer Polymers 0.000 description 6
- 239000002344 surface layer Substances 0.000 description 6
- 229920001187 thermosetting polymer Polymers 0.000 description 6
- 239000000654 additive Substances 0.000 description 5
- 230000003647 oxidation Effects 0.000 description 5
- 238000007254 oxidation reaction Methods 0.000 description 5
- 239000004721 Polyphenylene oxide Substances 0.000 description 4
- XECAHXYUAAWDEL-UHFFFAOYSA-N acrylonitrile butadiene styrene Chemical compound C=CC=C.C=CC#N.C=CC1=CC=CC=C1 XECAHXYUAAWDEL-UHFFFAOYSA-N 0.000 description 4
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 4
- 239000004676 acrylonitrile butadiene styrene Substances 0.000 description 4
- WGLPBDUCMAPZCE-UHFFFAOYSA-N chromium trioxide Inorganic materials O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 4
- 238000001465 metallisation Methods 0.000 description 4
- 229920006380 polyphenylene oxide Polymers 0.000 description 4
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 description 4
- 229910000679 solder Inorganic materials 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 230000000996 additive effect Effects 0.000 description 3
- 235000014121 butter Nutrition 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- 239000011651 chromium Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000005553 drilling Methods 0.000 description 3
- 239000003365 glass fiber Substances 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 238000005691 oxidative coupling reaction Methods 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- 239000011253 protective coating Substances 0.000 description 3
- 230000035882 stress Effects 0.000 description 3
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 239000001913 cellulose Substances 0.000 description 2
- 229920002678 cellulose Polymers 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- NEHMKBQYUWJMIP-UHFFFAOYSA-N chloromethane Chemical compound ClC NEHMKBQYUWJMIP-UHFFFAOYSA-N 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 230000032798 delamination Effects 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229920001971 elastomer Polymers 0.000 description 2
- 238000001125 extrusion Methods 0.000 description 2
- 239000011152 fibreglass Substances 0.000 description 2
- SLGWESQGEUXWJQ-UHFFFAOYSA-N formaldehyde;phenol Chemical compound O=C.OC1=CC=CC=C1 SLGWESQGEUXWJQ-UHFFFAOYSA-N 0.000 description 2
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- 230000003301 hydrolyzing effect Effects 0.000 description 2
- 230000005660 hydrophilic surface Effects 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 238000010899 nucleation Methods 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- 229920001568 phenolic resin Polymers 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 238000007788 roughening Methods 0.000 description 2
- 239000005060 rubber Substances 0.000 description 2
- 230000001235 sensitizing effect Effects 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 239000011775 sodium fluoride Substances 0.000 description 2
- 235000013024 sodium fluoride Nutrition 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 2
- 125000001174 sulfone group Chemical group 0.000 description 2
- 150000003457 sulfones Chemical class 0.000 description 2
- 239000004634 thermosetting polymer Substances 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- 239000002966 varnish Substances 0.000 description 2
- TXUICONDJPYNPY-UHFFFAOYSA-N (1,10,13-trimethyl-3-oxo-4,5,6,7,8,9,11,12,14,15,16,17-dodecahydrocyclopenta[a]phenanthren-17-yl) heptanoate Chemical compound C1CC2CC(=O)C=C(C)C2(C)C2C1C1CCC(OC(=O)CCCCCC)C1(C)CC2 TXUICONDJPYNPY-UHFFFAOYSA-N 0.000 description 1
- MGAXYKDBRBNWKT-UHFFFAOYSA-N (5-oxooxolan-2-yl)methyl 4-methylbenzenesulfonate Chemical compound C1=CC(C)=CC=C1S(=O)(=O)OCC1OC(=O)CC1 MGAXYKDBRBNWKT-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- MXHKJQTYOAFPBY-UHFFFAOYSA-N 2-(2,3-dihydroxypropoxycarbonyl)benzoic acid Chemical class OCC(O)COC(=O)C1=CC=CC=C1C(O)=O MXHKJQTYOAFPBY-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- GPAPPPVRLPGFEQ-UHFFFAOYSA-N 4,4'-dichlorodiphenyl sulfone Chemical compound C1=CC(Cl)=CC=C1S(=O)(=O)C1=CC=C(Cl)C=C1 GPAPPPVRLPGFEQ-UHFFFAOYSA-N 0.000 description 1
- OMIHGPLIXGGMJB-UHFFFAOYSA-N 7-oxabicyclo[4.1.0]hepta-1,3,5-triene Chemical group C1=CC=C2OC2=C1 OMIHGPLIXGGMJB-UHFFFAOYSA-N 0.000 description 1
- 239000005749 Copper compound Substances 0.000 description 1
- 229920004934 Dacron® Polymers 0.000 description 1
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical class F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 1
- HYBBIBNJHNGZAN-UHFFFAOYSA-N Furaldehyde Natural products O=CC1=CC=CO1 HYBBIBNJHNGZAN-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical compound C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 229910004039 HBF4 Inorganic materials 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- 229920000459 Nitrile rubber Polymers 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 229920000297 Rayon Polymers 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 1
- 229910021626 Tin(II) chloride Inorganic materials 0.000 description 1
- 229920001807 Urea-formaldehyde Polymers 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000012190 activator Substances 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 238000007605 air drying Methods 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- 239000011260 aqueous acid Substances 0.000 description 1
- 238000010420 art technique Methods 0.000 description 1
- 230000000712 assembly Effects 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- QUDWYFHPNIMBFC-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,2-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=CC=C1C(=O)OCC=C QUDWYFHPNIMBFC-UHFFFAOYSA-N 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 150000001642 boronic acid derivatives Chemical class 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- NTXGQCSETZTARF-UHFFFAOYSA-N buta-1,3-diene;prop-2-enenitrile Chemical compound C=CC=C.C=CC#N NTXGQCSETZTARF-UHFFFAOYSA-N 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- JOPOVCBBYLSVDA-UHFFFAOYSA-N chromium(6+) Chemical compound [Cr+6] JOPOVCBBYLSVDA-UHFFFAOYSA-N 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000003750 conditioning effect Effects 0.000 description 1
- 238000002508 contact lithography Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 150000001880 copper compounds Chemical class 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 235000013365 dairy product Nutrition 0.000 description 1
- 230000002939 deleterious effect Effects 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 239000002657 fibrous material Substances 0.000 description 1
- 235000013305 food Nutrition 0.000 description 1
- IVJISJACKSSFGE-UHFFFAOYSA-N formaldehyde;1,3,5-triazine-2,4,6-triamine Chemical compound O=C.NC1=NC(N)=NC(N)=N1 IVJISJACKSSFGE-UHFFFAOYSA-N 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- 239000005340 laminated glass Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 150000002739 metals Chemical group 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- 229940050176 methyl chloride Drugs 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 235000010755 mineral Nutrition 0.000 description 1
- WHQSYGRFZMUQGQ-UHFFFAOYSA-N n,n-dimethylformamide;hydrate Chemical compound O.CN(C)C=O WHQSYGRFZMUQGQ-UHFFFAOYSA-N 0.000 description 1
- 238000010534 nucleophilic substitution reaction Methods 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 238000010525 oxidative degradation reaction Methods 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000013618 particulate matter Substances 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- ODGAOXROABLFNM-UHFFFAOYSA-N polynoxylin Chemical compound O=C.NC(N)=O ODGAOXROABLFNM-UHFFFAOYSA-N 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000002964 rayon Substances 0.000 description 1
- 230000002787 reinforcement Effects 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 235000011121 sodium hydroxide Nutrition 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 239000001119 stannous chloride Substances 0.000 description 1
- 235000011150 stannous chloride Nutrition 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 235000011149 sulphuric acid Nutrition 0.000 description 1
- 229920003051 synthetic elastomer Polymers 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 239000005061 synthetic rubber Substances 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 238000003878 thermal aging Methods 0.000 description 1
- 239000012815 thermoplastic material Substances 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
- B32B37/14—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers
- B32B37/16—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers with all layers existing as coherent layers before laminating
- B32B37/22—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers with all layers existing as coherent layers before laminating involving the assembly of both discrete and continuous layers
- B32B37/223—One or more of the layers being plastic
- B32B37/226—Laminating sheets, panels or inserts between two continuous plastic layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/12—Layered products comprising a layer of synthetic resin next to a fibrous or filamentary layer
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B3/00—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form
- B32B3/26—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form characterised by a particular shape of the outline of the cross-section of a continuous layer; characterised by a layer with cavities or internal voids ; characterised by an apertured layer
- B32B3/266—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form characterised by a particular shape of the outline of the cross-section of a continuous layer; characterised by a layer with cavities or internal voids ; characterised by an apertured layer characterised by an apertured layer, the apertures going through the whole thickness of the layer, e.g. expanded metal, perforated layer, slit layer regular cells B32B3/12
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/0353—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement
- H05K1/036—Multilayers with layers of different types
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- H—ELECTRICITY
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- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/386—Improvement of the adhesion between the insulating substrate and the metal by the use of an organic polymeric bonding layer, e.g. adhesive
- H05K3/387—Improvement of the adhesion between the insulating substrate and the metal by the use of an organic polymeric bonding layer, e.g. adhesive for electroless plating
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
- H05K3/4661—Adding a circuit layer by direct wet plating, e.g. electroless plating; insulating materials adapted therefor
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2260/00—Layered product comprising an impregnated, embedded, or bonded layer wherein the layer comprises an impregnation, embedding, or binder material
- B32B2260/02—Composition of the impregnated, bonded or embedded layer
- B32B2260/021—Fibrous or filamentary layer
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2260/00—Layered product comprising an impregnated, embedded, or bonded layer wherein the layer comprises an impregnation, embedding, or binder material
- B32B2260/04—Impregnation, embedding, or binder material
- B32B2260/046—Synthetic resin
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/20—Properties of the layers or laminate having particular electrical or magnetic properties, e.g. piezoelectric
- B32B2307/206—Insulating
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2457/00—Electrical equipment
- B32B2457/08—PCBs, i.e. printed circuit boards
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/01—Dielectrics
- H05K2201/0104—Properties and characteristics in general
- H05K2201/0129—Thermoplastic polymer, e.g. auto-adhesive layer; Shaping of thermoplastic polymer
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- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/06—Lamination
- H05K2203/068—Features of the lamination press or of the lamination process, e.g. using special separator sheets
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0703—Plating
- H05K2203/0709—Catalytic ink or adhesive for electroless plating
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- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0779—Treatments involving liquids, e.g. plating, rinsing characterised by the specific liquids involved
- H05K2203/0786—Using an aqueous solution, e.g. for cleaning or during drilling of holes
- H05K2203/0796—Oxidant in aqueous solution, e.g. permanganate
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- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/108—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by semi-additive methods; masks therefor
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- H—ELECTRICITY
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- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
- H05K3/181—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
- H05K3/182—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method
- H05K3/184—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method using masks
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- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
- H05K3/42—Plated through-holes or plated via connections
- H05K3/425—Plated through-holes or plated via connections characterised by the sequence of steps for plating the through-holes or via connections in relation to the conductive pattern
- H05K3/426—Plated through-holes or plated via connections characterised by the sequence of steps for plating the through-holes or via connections in relation to the conductive pattern initial plating of through-holes in substrates without metal
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- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/44—Manufacturing insulated metal core circuits or other insulated electrically conductive core circuits
- H05K3/445—Manufacturing insulated metal core circuits or other insulated electrically conductive core circuits having insulated holes or insulated via connections through the metal core
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- Engineering & Computer Science (AREA)
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- Manufacturing Of Printed Wiring (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
Abstract
A blank and method for its manufacture which blank is useful in the preparation of printed circuit boards, comprises an insulating substrate, e.g., a glass fibre-reinforced epoxy-resin impregnated laminate. Superimposed and adhered to at least one surface of the substrate is a high temperature thermoplastic polymer foil or sheet having a substantially uniform thickness between about 10 and 500 microns. The thermoplastic polymer surface can be chemically treated, e.g., exposed to chemical agents to activate it and facilitate subsequent deposition of an adherent film of electrolessly deposited metal thereon. The printed circuits formed on said substrates are characterized by excellent adherence of the conductor pattern to the thermoplastic polymer surface, have excellent electrical properties and resist heat in continuous use or when soldered.
Description
SPECIFICATION
Polysulfone surfaces laminated blanks
The present invention relates to a blank or substrate suitable for use in the manufacture of printed circuit
boards. More particularly, the present invention relates to a blank comprised of an insulating substrate
having a thin, high temperature, thermoplastic polymer sheet or foil superimposed and adhered to at least
one surface thereof and a method of its manufacture.
Printed circuit boards generally comprise an electrically insulating substrate associated with one or more electrically # electrically conductive circuit pattern(s). Typically, the insulating substrate comprises a synthetic resin composition reinforced with non-conductive fibrous materials, e.g., fibrous glass sheets or papers or webs
or mats of glass fibers in either woven or unwoven form, or cellulose paper sheets; the electrically 'conductive circuit pattern may be a metal such as copper, nickel, cobalt, gold, silver or the like.
The use of insulating substrates to prepare printed circuits by electroless deposition techniques is well
known, and it is also known to provide suitable substrates with a thermosetting rubber-resin film before electrolessly depositing a metal in order to improve adhesion. The insulating resinous film layer adhered to
the base has uniformly distributed therein particles of a rubber oxidizable and/or degradable by suitable
oxidizing chemicals.
This technique has been and is successfully employed in the printed circuits industry since a number of
years. The surface resistance of printed circuits employing said techniques have been as low as 5000
megohms when conditions according to ASTM D618-61 procedure C and measured on an insulation
resistance pattern as shown in IPC Test Method Number 5.8.1. (April 1973) (Institute for Interconnecting and
Packaging Electronic Circuitry). As circuits have become more complex and conductors spaced closer
together, relatively low surface resistance becomes a problem.
The prior art techniques for adhesion promotion can also be better understood by the type of substrates
used. Organic coatings and materials whose surfaces may be provided with electroless metal deposits
having commercially acceptable adhesion, that is, peel strengths of at least 1,2 newtons/mm of width, have
heretofore fallen into distinct categorities according to the method of preparing them and the requisite
chemical treatment for insuring sufficiently adherent electroless metal plating on them.
Materials of a first type used to form an adhesive coating on a suitable substrate typically comprise a
dispersed phase of synthetic rubber such as butadiene or acrylonitrile butadiene copolymers in a matrix of
materials such as epoxy/phenolic blends. The material ofthe dispersed phase of such substrates is readily
degraded by oxidizing agents, such as chromic or permanganate etching solutions, while the matrix phase is
less reactive to such agents. Following the oxidation treatment, the substrate surface is microporous and
hydrophilic and is suitable for further processing in known electroless metal plating procedures combined or
not with electro-plating steps.
Another general type of resinous substrates, such as certain epoxy- and polysulfone materials, sometimes
referred to as singlephase materials, requires a mandatory step preceding the etching step for forming
microporous surfaces; polar and strained sites or domaines that are selectively attacked in the oxidation
steps must be created, usually by contacting the surface with an organic solvent, to permit preferential attack
at these sites on exposure to the etchant. This process has become known as the "swell and etch" technique.
In the "swell and etch" technique, the surface of glass reinforced epoxy resin impregnated laminate is
first treated with a solvent and then with a strong oxidizer, e.g., chromic acid, to etch away part of the surface
and produce a microporous, hydrophilic surface suitable for adherent electroless metal deposition. This
technique by itself did not give acceptable surface resistance because the oxidation process could penetrate
deep enough to allow contamination of the glass cloth laminate core. To avoid this problem, special grades
of laminates have been suggested having thick, epoxy resin "butter coates" over the glass fibres. Using such
grades of laminates it has been possible to produce printed circuits with an insulation resistance of 100000 megohms.However, the variation of the cure of the epoxy "butter coat" from one manufacturer to another
and from lot to lot of the same manufacturer requires the process to be redefined for each lot. For this
reason, and because of difficulties in reliably achieving uniform "butter coates", attempts to achieve commercial production have not been successful. A further disadvantage of this process is the frequent
failure of the bond in large areas of exposed metal during soldering.
It is also well known that certain plastic materials may be metal plated for decorative applications by first
conditioning them in strong oxidizing acids. Among the plastic materials that have been successfully plated
are acrylonitrile butadiene styrene copolymers, polyphenylene oxides, polysulfones, polycarbonates and
nylon. Acrylonitrile butadiene styrene has been proposed for use as a film in the manufacture of printed
circuit boards but was found to be not suitable: its bond strength was only 1 newtonimm and the respective
printed circuit board could not withstand soldering temperatures.
Molded polysulfones have been used in very limited quantities as printed circuit base material, and only in
high frequency applications where the low dielectric constant and dissipation factor of the polysulfone is of
sufficient importance. Circuit base materials consisting of polysulfone have not achieved wide usage firstly
because of the extreme processing difficulties and secondly the high price of said material. In processing
molded polysulfone material for use as printed circuit substrates, it is necessary to anneal or stress relieve a
minimum of 2 to 4 hours; 6 to 8 hours is preferred. These laborious steps are required two or more times during a typical circuit board manufacturing cycle. Over-annealing the polysulfone materials also must be avoided to prevent resulting embrittlement and other deleterious effects.
It is an object of this invention to provide improved methods for forming substrates for adherent metallization and improved substrates for the electroless deposition of metals thereon.
An object of this invention is to provide new and improved insulating blanks having a surface which can be activated to receive electrolessly formed metal deposits.
Another object of this invention is to provide rugged and durable metallized objects from such insulating blanks.
Afurther object of this invention is to make from such blanks printed circuit boards, including one-layer, two-layer and multi-layer boards, which are provided with conductive passageways.
An object of the present invention is to provide printed circuits utilizing such blanks, the circuits having high surface resistance, excellent bond strength between the surface of the circuit and the electrolessly deposited metal adhered thereto, excellent stability at soldering temperatures, reproducible methods of manufacturing and field repairability.
Another object of this invention is to provide a multi-layer circuit board with controlled impedence for high speed logic and other controlled impedence uses.
To achieve the foregoing objects, the present invention provides an improved blank and method for its preparation, an improved metal clad insulating substrate and method of its manufacture, improved method of producing printed circuit boards employing the improved blanks and the improved circuit boards formed thereby. As will be clear from the following description, the base material or blank of this invention suitable for the manufacture of printed circuit boards comprises a substrate having adhered to at least one surface thereof a preformed film or foil of a thermoplastic organic high-temperature polymer, said polymer having an aromatic backbone that does not liquefy or decompose at the temperature of mass soldering and during such soldering process.
In accordance with the present invention blanks for the manufacture of printed circuits are produced by the method comprising the steps of providing at least one of the surfaces of a substrate selected from metal blanks and insulating materials with a superimposed layer of a preformed film or foil of a thermoplastic polymer having an aromatic backbone that does not liquefy or decompose under exposure to mass soldering procedures; and consolidate the assembly so produced by heating under pressure.
It is a further object of the present invention to provide an assembly comprising a metallic or insulating substrate and on at least one of the surfaces of said substrate a preformed foil of said thermoplastic polymer adhered thereto by the application of heat and pressure.
It has been found that such assemblies do not embrittle during processing and use and provide printed circuit boards with excellent surface resistance values.
In another embodiment of the present invention printed circuit boards are produced by treating the surface or surfaces of the polymer foil after consolidation, such treatment comprising the steps of pretreating the polymer surface(s) with a polar solvent thus swelling the outer layer of said polymer and exposing the thus pretreated surface(s) to a strong oxidizing solution; and electrolessly depositing metal, followed or not by electrodeposition on at least portions of said surface(s), thus forming printed circuit patterns by methods known as such.
A further embodiment of this invention is directed to printed circuit boards having more than one circuit pattern on one side of the substrate and to manufacture of such boards by a method comprising the steps of providing at least one surface of a suitable base material with a first printed circuit, and providing at least the surface area provided with said circuit pattern with a layer consisting of a preformed foil of the thermoplastic polymer, and treating the surface of said foil with a solvent and subsequently with an oxidizing agent; and providing the thus prepared surface of said foil with a second printed circuit pattern; and repeating said sequence of applying preformed polymer foil and forming conductor pattern as many times as desired.
In order for connecting selected conductors of different levels holes intersecting said conductors and
having metallized walls may be employed.
In another embodiment the areas of conductors of one level to be connected to conductors of a subsequent arranged level are kept free of the polymer foil, or are freed after applying said foil, and the respective conductors of said second level are formed in such a way that the metal deposit formed covers the exposed conductor areas of the respective conductors of the first level.
Other embodiments of the present invention will become obvious from the following description.
By "B-Stage" as used through the the specification and claims, is meant that condition of a composition where some but not all of the active molecules are cross-linked and the composition is still softened by heat.
By "C-Stage" as used throughout the specification and claims, is meant that condition where a composition has substantially reached the final stage of polymerisation where cross-linking becomes
general and the composition, assumes a thermoset, is substantially insoluble and infusable.
The laminated blanks of the present invention and methods of their manufacture represent an
improvement over the substrates heretofore employed. The methods of this invention utilize thermoplastic,
organic, high temperature polymers as the surface layers) of a blank. The surface layer has a thickness of
preferably not less than 10 microns, e.g., above 25 microns and most preferably above 50 microns;
generally, the thickness of the polymer surface is below 500 microns, preferably below 125 microns and
most preferably below 75 microns. One or more plies of a thermoplastic polymer is superimposed and laminated onto one or more plies of a "B-Stage", resin impregnated reinforcement, such as glass-film, cloth or paper, under heat and pressure to form a rigid printed wiring board substrate.
The present invention provides a simple and economical method of preparing blanks having substantially planar surfaces which surfaces may be adapted to receive a layer or pattern of conductive metal by electroless deposition techniques. In one aspect, this invention relates to an insulating substrate suitable for use in printed circuits and the method of its preparation which method comprises:: providing thermoplastics films or sheets having a substantially uniform thickness between about 10 and about 500 lim, the thermoplastic material having an aromatic backbone that does not liquefy or decompose at a temperature of, e.g., 2450C after five seconds exposure at the temperature;
- providing a fibrous sheet or web impregnated with a thermosettable resin or plies of the impregnated fibrous sheets or webs;
- superimposing at least one of said films or sheets on at least one of said plies of thermosettable resin impregnated fibrous sheets of webs; and
- consolidating, preferably between planar press plates, the assembly so produced and curing the thermosettable resin by heating under pressure.
In another aspect, this invention relates to a blank suitable for use in printed circuits which comprises:
- an insulating substrate having adhered to a surface thereof or opposite surfaces thereof a thermoplastic organic high temperature polymer having a thickness between about 10 and about 500 microns, the polymer having an aromatic backbone that does not liquefy or decompose at a temperature of 2450C after five seconds exposure at the temperature.
In still another aspect, this invention relates to a laminate and the method of its preparation as subsequently described herein which laminate comprises the blank as described hereinabove and further including an electro-conductive metal layer superimposed on an adhered to the polymer surface layer(s).
The surface layer of polymer foil serves as an adhesive means between said metal layer and the reinforced thermoset substrate. Consequently, to laminate a metal to a reinforced polyester substrate, for example, a metal film and thin thermoplastic film may be pressed together with a reinforced polyester substrate to bond the three together or the thermoplastic film surface of the blank may be treated with an oxidizing media or a plasma to produce a hydrophilic surface receptive to subsequent metallization and provided with an electrolessly formed metal deposit.
In another aspect, this invention relates to a multi-layer printed circuit board and method of its preparation which method comprises the steps of:
- providing an insulating substrate having a circuit pattern adhered to at least one surface thereof;
- applying a layer of, e.g., a polysulfone foil over the circuit pattern(s); - treating the polysulfone surfaces with a solvent and oxidizing agent to render said surface(s) microporous and hydrophilic; and
- electrolessly depositing a metal onto the treated surface(s).
Anythermosettable resin known for use in preparing insulating substrates for printed circuits may be employed in applicants' method and blank provided it or they produce, together with the other materials employed, the desired properties in the finished substrates. Examples are allyl phthalate, furane, allyl resins, glyceryl phthalates, silicones, polyacrylic esters, phenol formaldehyde and phenol furfural copolymer, alone or compounded with butadiene acrylonitrile compolymer or acrylonitrile butadiene styrene copolymers, ureaformaldehyde, melamine formaldehyde, modified methacrylic, polyester and epoxy resins. Phenol formaldehydes may be used if requirements of use are not stringent. Epoxy resins are preferred when stringent properties are required.For impregnating the fibrous webs or sheets utilized in applicants' methods, the thermosettable resin may be employed in any convenient form and manner, but a varnish is preferably employed wherein the resin is dispersed or dissolved in a suitable medium. The weight of resin solids in the varnish is not generally critical, but it is selected to achieve epoxy glass cloth composites comprising about 35 to 70%, e.g., about 35 to about 55 % resin solids by weight.
The insulating base of this invention need not be organic. Thus, it could be made of inorganic insulating materials, e.g., inorganic clays and minderals such as ceramic, ferrite, carborundum, glass, glass bonded mica, steatite and the like.
Furthermore, sheet metal may be used as the substrate to be covered with the preferred thermoplastic foil with or without an interlayer of a thermosetting resin or of a material impregnated with such resin.
Suitable thermoplastic foil materials are high temperature thermoplastic polymers having an aromatic backbone and which do not liquefy or decompose at a temperature of mass soldering, e.g., of 245"C, after five seconds exposure at such a temperature. Examples including polycarbonate, polysulfone having the following recurring unit:
polyethersulfone having the following recurring unit:
and polysulfone.
As can be seen in the structural formula set forth hereinabove, each aromatic unit in the polysul
fone is linked to its neighbor by an -S04- substituent, called a sulfone linkage.
Similarly, each aromatic unit in the polyethersulfone is linked to its neighbor by an -S04- substituent at one end, and an -0- substituent at the other end, called an ether linkage. Furthermore, it also can be seen that each substituent is separated by four carbon atoms of the aromatic unit; e.g., para substitution.
Certain grades ofthesethermoplastics in molded sheets, rods and/or foil form can be treated to render the surfaces of these materials receptive to adherent metal deposition. These materials have been used widely in the decorative, automotive, electronic component, medical appliance, food processing and dairy equipment industries. For illustrative purposes, the following discussion will be directed to certain grades of polysulfone. It is known that the various grades of polysulfone are characterized by toughness, low creap, and long term thermal and hydrolytic stability, including years of continuous service in boiling water or steam, and in air in excess of 150 C, with little change in properties.Polysulfones qualify for Underwriters'
Laboratories Thermal Index ratings of 150 C; they maintain their properties over a temperature range from -1000C to above 150"C. They have a heat deflection temperature of about 1740C at 264 psi (1.8 MPa) and about 181"C at 6 psi (41 MPa). Long term thermal aging at 150 to 200"C has little effect on the physical or electrical properties of polysulfones.
Polysulfone may be prepared by the nucleophilic substitution reaction between the sodium salt of 2,2-bis(4-hydroxyphenyl)propane and 4,4'-dichlorodiphenyl sulfone. The sodium phenoxide and groups are reacted with methyl chloride to terminate the polymerization. This controls the molecular weight of the polymer and contributes to thermal stability.
The chemical structure of polysulfone is characterized by the diaryl sulfone grouping. This is a highly resonating structure, in which the sulfone group tends to draw electrons from the phenyl rings. The resonance is enhanced by having oxygen atoms para to the sulfone group. Having electrons tied up in resonance imparts excellent oxidation resistance to polysulfones. Also, the sulfur atom is in its highest state of oxidation: it increases the strength of the bonds involved and fixes this grouping spatially into a planar configuration. This provides rigidity to the polymer chain, which is retained at high temperatures.
The ether linkage imparts some flexibility to the polymer chain, giving inherent toughness to the material.
The sulfone and ether linkages connecting the benzene rings are hydrolytically stable. Therefore, as indicated previously hereinabove, polysulfones are resistant to hydrolysis and to aqueous acid and alkaline environments.
Suitable grades of polysulfone according to the present invention include, e.g., an unfilled grade such as the P-1700 series which is used for injection molding or extrusion; a higher molecular weight series for extrusion applications, such as P-3500 series; and a mineral-filled polysulfone useful for plating applications such as the P-6050 series (the P-1700, P-3500 and P-6050 series all commercially available from Union
Carbide Corporation, 270 Park Avenue, New York, NY 10017).
Polycarbonates are linear, low-crystalline, high molecular weight (about 18.000) polymers in which the linking elements are carbonate radicals. Polycarbonates possess a combination of very useful properties including:
(1) very high impact strength (16 ft-lb/in notch) combined with good ductility;
(2) excellent dimensional stability combined with low water absorption (0.35 % immersed in water at room temperature; boiling water immersion does not cause dimensions to alter more than 0,001 in/in);
(3) high heat distortion temperature of about 135 C; (4) superior heat resistance showing excellent resistance to thermal oxidative degradation; and
(5) good electrical resistance.
Polyphenylene oxide may be prepared via oxidative coupling of phenols. By oxidative coupling is meant a reaction of oxygen with active hydrogens from different monomers to produce water and a dimerized molecule. If the monomer has two active hydrogens, oxidative coupling continues resulting in polymerization. The polymer structure of polyphenylene oxide is characterized by a high degree of symmetry, no strongly polar groups, rigid phenylene oxide backbone, a high glass transition temperature (210C) and no other observable transition in the range of - 273O to 21 00C.
Polyphenylene oxide possesses a combination of useful properties including:
(1) a temperature range between about - 1 80"C and about 180 C; (2) excellent hydrolytic stability;
(3) dimensional stability with very low water absorption, low creep and high modulus; and
(4) excellent dielectric properties over a wide range of temperatures (- 180 C to 180 C).
The laminated thermoplastic polymer foils of this invention provide a high performance adhesive means suitable for printed circuit application with reliable properties and performance superior to that obtainable with the resin-rich and rubber thermoset adhesive blends of the prior art. The thermoplastic foil surface(s) of the blank of this invention have a substantially uniform thickness and can be chemically treated by techniques known in the art to achieve excellent adhesion of subsequent deposits of electroless metal during the manufacture of printed circuit boards.
It is generally known that these high temperature polymers, specifically polysulfones, when used by themselves require prolonged secondary annealing bakes to prevent stress cracking. Typical recommenda tins for annealing conditions are two to four hours and up to nine hours at 170"C prior to processing. An additional extended annealing cycle is required after machining the material prior to etching the surface for subsequent metal depositions. As subsequently described herein, annealing and production of the blank and/or laminate of this invention occur simultaneously in one step. It has been found that when the thermoplastic polymer foils of this invention, such as polysulfone, were laminated to an insulating substrate according to the present invention, the thermoplastic polymer foils are stress relieved during the laminating cycle.This eliminates the need for the previously mentioned laborious and time consuming secondary annealing steps.
According to one method of the present invention, the blank is formed by arranging impregnated plies of the insulating substrate and preformed thermoplastic foils or sheets in the form of a laminate and laminating the same under heat and pressure, e.g., at 1600C and 1,4 MPa for up to 60 minutes. The lamination step can be carried out in a conventional press using conditions known for preparing thermosettable resin impregnated laminates with substantially planar surfaces. Suitable cure cycles are, e.g., 10 to 60 minutes at 1200Cto 180"C and 1,5 to 10 MPa.
Other methods of manufacturing the blank of this invention may be employed. E.g., a laminated insulating substrate may be dipped into a polysulfone adhesive to the preformed thermoplastic foil. It is well known that a 2 to 5% solution of polysulfone in methylene chloride can be used to achieve a strong bond at room temperature. A polysulfone foil, e.g., may be clad to, e.g., an insulating substrate by dipping the foil and the substrate in the polysulfone-methylene chloride solution, air drying for 15 seconds, and then assembling them in a jig and placing them under a pressure of about 500 psi for 5 minutes.
After removal from the press plates or the like employed in the lamination step described hereinabove, the blank thus formed may be employed in the manufacture of printed circuit boards.
In another preferred embodiment, a thin metal foil may be superimposed on one or more surfaces of the blank and adhered thereto to form a laminate.
Blanks of the type described hereinabove may be used to prepare one-layer, two-layer and multi-layer printed circuit boards with and without plated through holes in the manner more particularly described hereinafter.
In one method of producing printed circuit boards, the so-called "semi-additive" technique is employed.
The insulating blank of this invention is cut to size and holes are prepared therein by drilling, punching, or the like. The surface of the blank is subjected to a pre-etch solvent attack or an abrasive treatment thereon. It is believed that the surface of the blank may be mechanically roughened before the oxidizing treatment to replace the solvent pretreatment. Whereeverthe expression "solvent pretreatment" is used herein, it shall also mean the use of a mechanical roughening step instead of the treatment with a solvent. A typical mechanical roughening is grit blasting the surface of the blank with a slurry of abrasive particulate matter such as sand, aluminum oxide, quartz, carborundum, and the like, sized finer than 100 USA Sieve Series mash.
The solvent attacked board is then mechanically and chemically treated with an oxidizing solution to activate the surface of the blank.
A conventional electroless plating process is employed is deposit a thin conductive layer of copper on the
activated surface of the blank and, if and when desired, on the hole walls.
A temporary, protective coating or resist layer is employed to silk screen print circuit pattern having 0,35 mm lines; the temporary resist is heat cured. The circuit pattern is built up by electroplating a metal onto the exposed areas of the substrate. The temporary resist is removed and the thin layer of electrolessly deposited metal which had been covered by the mask is etched away with an acid. Alternatively, the temporary protective coating may be a photoresist.
In another method of producing printed circuit boards, known as "fully additive" technique, a suitable insulating blank according to the present invention is prepared having a polysulfone, polyethylsulfone or polycarbonate surface layer laminated to a suitable substrate, e.g., such as an epoxy-resin fiber glass reinforced base. Holes are formed in the blank at preselected sites. The blank and walls of the holes are surface pretreated as described hereinbefore. A photoimaging technique is then employed. The blanks and holes are completely coated with an aqueous, ultraviolet light reducible, copper compound and dried. An ultraviolet light photoimage is formed by projection- or contact-printing on the sensitized substrate and a metal such as copper is electrolessly deposited onto the exposed pattern and in the holes until a circuit is built up to the desired thickness.
In general, it is desirable to pretreat the surface with an agent, e.g., dimethyl formamide or dimethvl sulfoxide before or during the etching process in an oxidizing agent.
Suitable solvents and blends thereof for swelling polysulfone in particular include dimethyl formamide, acetophenone, chloroform, cyclohexanone, chlorobenzene, dioxane, methylene chloride and tetrahydrofurane.
Depending upon the particular surface of the blanks, other ion exchange imparting materials may be utilized to effect the aforementioned temporary polarization reaction. For example, acidified sodium fluoride, hydrochloric and hydrofluoric acids, chromic acids, borates, fluoroborates and caustic soda, as well as mixtures thereof, have been found effective to polarize the various synthetic thermoplastic insulating materials described herein.
The acid oxidizing agents typically used for etching acrylonitrile butadiene styrene substrates are found to be satisfactory for polysulfone substrates. Atypical composition comprises on a weight basis:
60% H2S04 10% Cr03 30% H20
During etching, the chromium that comes in contact with the pretreated polysulfone surface is reduced from Cr+6 to Cr+3. When most of the chromium is reduced, the acid is no longer as effective in improving adhesion of metal coatings. For this reason, it is desirable to have as much chromium in the acid conditioner as possible. However, with dimethyl formamide as the pre-conditioner bath, chromic acid contents above about 3% result in macro-crazing and poor adhesion.A preferred acid conditioner for the polysulfone surface(s) is, therefore, on a weight basis:
55,9 % H2S04 (96%) 10,4% H3P04 (85 to 87 %) 30,7 % H20 3,0 % CrO3
In an alternative 'fully additive" technique after exposing the surface to render it polar and microporous, the blank and walls of the holes are activated using known seeding and sensitizing agents such as, e.g., stannous chloride - palladium chloride, activators. A permanent protective coating or resist is screened to
produce a permanent background resist leaving the desired circuit pattern exposed. The resist is cured and copper is electrolessly deposited on the exposed pattern and in the holes.
The blank according to the present invention may alternately be catalytic, e.g., having catalytic materials
distributed throughout. In the aforementioned techniques for manufacturing printed circuit boards, this
eliminates the need for a separate seeding or sensitizing step.
For printed circuits, among the materials which preferably are used as the insulating substrates for the
blanks, may be mentioned insulating thermosetting resins, thermoplastic resins and mixtures of the foregoing, including fiber, e.g., fiber-glass, impregnated embodiments of the foregoing.
An adhesive layer can be on the blank. The blanks can include metal substrates such as aluminum or steel which are coated with insulating layers of preformed foils of thermoplastic polymers. If the conductive
pattern is to include plated through holes, it may be preferable to first provide the metal blank with holes and
coat the blank by powder fusing techniques such as fluidized bed with a suitable insulating layer.
Among its embodiments, the present invention contemplates metallized blanks in which the electroless
metal, e.g., copper, nickel, gold or the like, has been further built up by attaching an electrode to the
electroless metal surface and electrolytically depositing on it more of the same or different metal, e.g.,
copper, nickel, silver, gold, rhodium, tin, alloys thereof and the like. Electroplating procedures are
conventional and well known to those skilled in the art.
The invention is more fully described hereinafter with reference to the accompanying drawings which
illustrate certain embodiments of the invention and together with the specification serve to explain the
principles of the invention.
Figure 1 to 3 illustrate procedures which can be used to produce printed circuit boards from insulating
blanks produced in accordance with the teachings of the present invention.
Figure 4 illustrates a production process apparatus for making a blank in a roll to roll fashion following the
teachings of this invention.
Figure 5 illustrates a production process apparatus for making a blank in a roll application of polysulfone
to a rigid substrate.
Referring to Figure 1 A, there is shown an insulating blank 10 according to the present invention. The
insulating blank 10 comprises a thermoset resin inner core 12 and outer surface layers of preformed
polysulfone foil 14. The core 12 is catalytic to the deposition of electroless metal. The polysulfone foil 14,
also, is catalytic to the electroless deposition of metal. In Figure 1 B holes 16 and 18 are drilled through the
blank 10. The blank 10 is then immersed in a pre-treatment solvent followed by a chemical treatment with an
acid etching solution such as
20 g/l CrO# 350 mg/l H2SO4
50 g/l NaF at a temperature between 45 and 65 C to expose the catalyst and activate the surface of the blank 10 as shown in Figure 1 C.A photoresist 24 is applied (shown in Figure 1 D) on a surface of the blank to mask areas not to be subsequently copper plated. Copper is then electrolessly deposited, by methods known in the art, on the walls of holes 16 and 18 and onto the exposed surface areas of the blank 10 to form a copper conductive pattern 22 about 35 um thick, as shown in Figure 1 E. The photo-resist 24 is then stripped as shown in Figure 1 F. A registered solder mask 30 may be applied over the circuit pattern leaving holes 16 and 18 exposed (Figure 1G).
In Figure 2, there is shown an additive method for manufacturing a multi-layer printed circuit board. In
Figure 2A, printed circuit pattern 102 is adhered on insulating blank 100. A preformed polysulfone foil 104 is superimposed and bonded over the printed circuit pattern 102 (Figure 2B). A hole 106 is then drilled through polysulfone foil 104, printed circuit pattern 102 and the insulating blank 100 (Figure 2C). The surface of the polysulfone foil 104 is adhesion promoted employing the techniques described previously herein. The polysulfone foil 104 surface is activated by dipping in a palladium and tin solution. In Figure 2D, a photoresist image 110 is imposed on the outer surface of the polysulfone foil 104. The exposed foil surface 104 and the hole 106 are electrolessly plated with copper 112 to a thickness of about 35 um (Figure 2E).In Figure 2F, the photo-resist image 110 has been stripped providing the multi-layer printed circuit board.
In Figure 3, there is shown a semi-additive method of manufacturing a multi-layer printed circuit board. In
Figure 3A, blank 200 is clad on opposite surfaces with copper 201. A first or interior circuit pattern 202 is produced by conventional etching technology and covered with a layer of a preformed polysulfone foil 204 (Figure 3B). A hole 216 is drilled through the blank 200. The blank 200 is adhesion promoted and catalysed to the reception of electrolessly formed metal layers and an electrolessly deposited copper film 211 is applied onto the polysulfone surface 204 and in the hole 216 to a thickness of, e.g., 2 um (Figure 3C). A photoresist image 210 is applied and additional copper 212 is electroplated to provide a copper layer having a thickness of about 35 cm (Figure 3D).In Figure 3E, the photoresist image 210 is removed and the copper film 211 under the photoresist 210 is etched away with a suitable etchant.
In Figure 4there is shown a method for making an insulating blank according to the present invention.
There are shown feed rollers 100, 102 and 104. Wound on roller 100 isa flexible support carrier 106 with a thickness of about 1,6 mm, the carrier being woven glass, non-woven glass, dacron, rayon, cellulose paper and the like impregnated with resins, preferably thermoset resins such as epoxy, but high temperature thermoplastics, e.g., polyimides and polycarbonates may also be used. Wound on feed roller 102 is a thermoplastic foil 108 having a thickness of 1 to 5 mm. Wound on feed roller 104 is also a thermoplastic foil having a thickness of about 1 to 5 mm. The thermoplastic foil may be, e.g., a polysulfone, polyether-sulfone or folycarbonate foil.
Also shown are combining-take-up rollers 110 which apply heat and pressure to the laminate passing therebetween. A temperature of about 160 to 200'C and a pressure of about 30 to 400 N/mm is typically applied between rollers 110. Exiting from the rollers is a flexible laminated base material 10 according to the present invention.
In Figure 5 there is shown a roll application to a rigid substrate 12, e.g., 8 mm thick epoxy glass cloth reinforced laminate. There are shown feed rollers 100, 102 and 104. Wound on rollers 102 and 104 are respective thermoplastic foils 108 having a thickness of 1 to 5 mm. Also shown are combining-take-up rollers 110 which apply heat and pressure to the laminate passing therebetween. A temperature of about 160 to 200 C and a pressure of about 30 to 400 N/mm is typically applied between rollers 110. The insulating substrate 12 passes between rollers 110 and the thermoplastic foils 108 are laminated to opposed surfaces of 12 under heat and pressure to form the blank 10 which is severed from the web after exiting from the rollers 110.Optionally, the insulating base 12 is coated with a polysulfone adhesive comprised of polysulfone dissolved in solvent prior to applying the thermoplastic foil.
The following examples illustrate at least one of the best modes of the insulating blanks, printed circuit boards and methods of the present invention.
Example 1
Eight plies of glass cloth impregnated with 45 to 55% by weight epoxy resin were placed in a laminating press with a sheet of preformed polysulfone foil, 50 um thick, both on top and bottom. The polysulfone foil was made from Udel P-1700RTM polysulfone resin. A laminating temperature of 175 C, a pressure of 600 psi (4.1 MPa) and a dwell time in the hot press of 15 minutes were employed. After 15 minutes, the press was cooled to room temperature and the blank was removed. The blank was processed into a printed circuit board employing the following steps:
(1) Through-holes were drilled in the blank;
(2) the blank was brushed to remove drilling debris (it is noted that no annealing or oven baking was required after drilling);
(3) the blank was immersed in a dimethyl formamide water solution (specific gravity of 0.955 to 0.965) for 3 to 6 minutes;
(4) the blank was rinsed in hot water for 45 seconds;
(5) the surface of the blank was adhesion promoted at a temperature of 550C for a time period of 7 minutes with the following solution::
Cr03 20 g/l
H3P04 100 ml/l
H2S04 600 ml/l
FC-98* 0,5 g/l
*FC-98 is an anionic perfluoroalkyl sulfonate
(6) the blank was rinsed in still water;
(7) Cr(VI) was neutralized with a solution containing 10% H202 and 15% H2S04; (8)-(11) the blank was rinsed in water, immersed successively in 2,5- MHCI, a seeder solution described in
Example 1 of patent and an accelerator (5% HBF4);
(12) copper was electrolessly deposited onto the blank to a thickness of 2,5 um; (13)-(14) the copper clad blank was rinsed in water and dried at 1250C for 10 minutes.
A printed circuit board was manufactured using said copper clad blank and employing techniques well known in the art, e.g., a background resist image was printed, a copper circuit pattern was formed by electroplating, the resist was removed and the exposed copper etched away.
A peel strength of 1,7 N/mm was measured for the printed circuit board. A solder float test was also employed. A one-inch square copper pattern (the printed circuit board) produced according to this example was floated on 2600C molten solder for 10 seconds. The sample was removed for examination of potential blisters and/or delamination of the copper pattern from the blank. No blistering or delamination was detected.
Example 2
Example 1 was repeated except a laminating pressure of 400 psi (2.8 MPa) and a dwell time on the laminating press of 1 hour were used. A final peel strength of 2,4 N/mm was measured and a one-inch square copper pattern sample floated in 260"C molten solder for more than 10 seconds without blistering or delaminating.
Example 3
Example 1 was repeated except that a laminating pressure of 200 psi (1,4 MPa) and a dwell time in the laminating press of 5 minutes were employed. After laminating, the blank was stabilized at 1600C for 1 hour in a circulating hot air oven to prevent shrinkage and warping during processing. A final peel strength of 1,9
N/mm was measured.
Example 4
An epoxy glass laminate, G10 FRRTM was clad with 35 um thick copper foil top and bottom. A copper circuit was produced by conventional etching techniques. A polysulfone adhesive was prepared by dissolving pellets of Udel P-1700 NTRTM polysulfone resin in methylene chloride. The etched panel was dipped in the polysulfone solution and air dried. A 75,am thick preformed polysulfone foil was laminated to the adhesive coated sides of the panel in a press at 175#C for 10 minutes at 200 psi (1,4 MPa).
Through-holes were drilled in the panel and the debris removed by brushing. The panel was converted into a multi-layer printed circuit board following the procedure of Example 1.
Example 5
A single layer of epoxy impregnated glass cloth was placed between two sheets of 25 um polysulfone foil and laminated in a press at 400 psi (2,8 MPa) at 175"C for 10 minutes. This produced a flexible blank useful in the manufacture of printed circuit boards.
Claims (24)
1. A base material or blank suitable for the manufacture of printed circuit boards which comprises a substrate having adhered to at least one surface thereof a preformed foil or film of a thermoplastic organic high temperature polymer, said polymer having an aromatic backbone that does not liquefy or decompose at a temperature of mass-soldering and during such soldering process.
2. The blank of claim 1 wherein the polymer does not liquefy or decompose at a temperature of 245"C after 3 x 5 seconds exposure time.
3. The blank of claim 1 wherein said preformed foil or film has a thickness of 10 to 500 um.
4. The blank of one or more of claims 1 to 3 wherein the polymer of the preformed foil or film is selected from polysulfone, polycarbonate and polyethersulfone.
5. The blank of claim 1 wherein said substrate is an insulating substrate.
6. The blank of claim 1 wherein said substrate is a metal.
7. The blank of claims 1 to 5 wherein said substrate is a laminate comprising fiber impregnated thermosettable resins.
8. The blank of claims 1 to 5 and 7 further comprising a layer of metal superimposed and adhered to at least a portion of the surface of the polymer film or foil.
9. The blank of claim 8 wherein the metal layer is formed by electroless deposition in combination with electroplating.
10. A method for the manufacture of printed circuit boards comprising the steps of providing at least one of the surfaces of a substrate selected from metal blanks and insulating material with a superimposed layer of a preformed film or foil of a thermoplastic polymer having an aromatic backbone that does not liquefy or decompose under exposure to mass soldering producing and consolidating the assembly so produced by heating under pressure.
11. The method of claim 10 wherein the preformed polymer foil superimposed has a thickness of 10 to 500 um and preferably less than 125um.
12. The method of claims 10 and 11 wherein the substrate is composed of thermosettable resin impregnated fibrous sheets or webs.
13. The method of claim 12 wherein curing ofthethermosettable resin is performed concurrent with the consolidation of the assembly comprising the preformed foil of the thermoplastic polymers.
14. The method of claims 10 or 13 wherein the consolidation step takes place at a temperature of 120 to 180"C and a pressure of 1,5 to 10 MPa.
15. The method of one or more of claims 10 to 14 further comprising treating the consolidated assembly, said treatment comprising the steps of pretreating the polymer surface with a polar solvent suitable for swelling the outer layer of said polymer foil and exposing the thus pretreated surface to a strong oxidizing solution; and catalyzing at least portions of the thus prepared surface to render it receptive to electrolessly formed metal deposits; and electrolessly depositing metal on said areas.
16. The method of claim 15 wherein the polar solvent is a dimethylformamide solution and the oxidizing agent is chromic acid.
17. The method of claim 10 wherein the substrate is provided, at least one one surface, with a first circuit pattern employing known methods and applying a layer of a preformed foil of a thermoplastic copolymer over said surface or surfaces provided with a circuit pattern, and treating the surface(s) of the copolymer foil with a solvent and an oxidizing agent and providing the thus pretreated surface or surfaces with an additional circuit pattern or patterns and, if so desired, repeating the steps of providing the formed circuit pattern or patterns with layers of preformed foils of the thermoplastic polymer; and providing the surface(s) of said polymer foil with an additional circuit pattern or patterns and repeating said procedure until all circuit pattern layers are formed.
18. The method of claim 17 wherein the conductors of said circuit patterns of different layers are connected as desired by providing holes at selected areas and forming a metal deposit on the walls of said holes thus producing electrical connections between the respective conductors.
19. The method of claim 17 wherein the preformed foil is removed from areas of conductors to be connected to conductors to be formed on the surface of said foil and producing a connection between said conductors by forming a metal deposit reaching from the respective conductor on the foil surface to the exposed area of the respective conductor of the underlying layer, the said metal deposit thus covering at least a part of said exposed area of said conductors.
20. The method of claim 17 wherein the circuit pattern is formed by catalysing the surface of the polymer foil to render it catalytic to the reception of electrolessly deposited metal.
21. The method of claim 18 wherein the circuit pattern or patterns is or are formed by catalysing the surface of the polymer foil to render it catalytic to the reception of electrolessly formed metal deposits; and providing the pattern areas with a metal deposit formed by electroless metal deposition alone or in combination with electroplating.
22. The method of claim 21 wherein the total surface of the polymer foil is catalysed and metallized and the conductor pattern is formed employing known methods of masking and etching.
23. The method of claims 20 and 21 wherein the polymer foil comprises an agent which is catalytic to the reception of electrolessly formed metal deposits.
24. The method of one of claims 12 to 17 wherein the substrate is provided with an agent which renders it catalytic to the reception of electrolessly formed metal deposits.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US3481179A | 1979-04-30 | 1979-04-30 |
Publications (2)
Publication Number | Publication Date |
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GB2057351A true GB2057351A (en) | 1981-04-01 |
GB2057351B GB2057351B (en) | 1983-04-07 |
Family
ID=21878759
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB8012343A Expired GB2057351B (en) | 1979-04-30 | 1980-04-15 | Laminated blanks |
Country Status (12)
Country | Link |
---|---|
JP (1) | JPS564460A (en) |
AT (1) | AT384144B (en) |
AU (1) | AU539984B2 (en) |
CA (1) | CA1157622A (en) |
CH (1) | CH657571A5 (en) |
DE (2) | DE3012889C2 (en) |
DK (1) | DK184980A (en) |
FR (1) | FR2455616A1 (en) |
GB (1) | GB2057351B (en) |
IT (1) | IT1146956B (en) |
NL (1) | NL188674C (en) |
SE (1) | SE454125B (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0180220A2 (en) * | 1984-11-02 | 1986-05-07 | AMP-AKZO CORPORATION (a Delaware corp.) | A process for producing metal clad thermoplastic base materials |
WO2002021886A2 (en) * | 2000-09-07 | 2002-03-14 | Oak-Mitsui Inc. | Manufacturing fire retardant circuit boards without the use of fire retardant resin additives |
EP1260359A2 (en) * | 2001-05-24 | 2002-11-27 | Sumitomo Bakelite Co., Ltd. | Method for manufacturing a laminated board |
US6572954B1 (en) | 1998-11-04 | 2003-06-03 | Thomson Licensing, S.A. | Electromechanical component |
AT511758A3 (en) * | 2011-05-17 | 2013-12-15 | Ksg Leiterplatten Gmbh | Method for producing a semifinished product for a single-layer or multilayer printed circuit board and semifinished product |
EP4011593A1 (en) * | 2020-12-14 | 2022-06-15 | Intops. Co., Ltd. | In-mold electronic structure using plating process and method therefor |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4339303A (en) * | 1981-01-12 | 1982-07-13 | Kollmorgen Technologies Corporation | Radiation stress relieving of sulfone polymer articles |
DE3124639C2 (en) * | 1981-06-23 | 1985-01-17 | Albert-Frankenthal Ag, 6710 Frankenthal | Device for lifting folded products out of a jaw cylinder |
JPS58153399A (en) * | 1982-03-04 | 1983-09-12 | 昭和アルミニウム株式会社 | Heat sink board for electric part |
ZA823981B (en) * | 1982-05-21 | 1983-06-29 | Kollmorgen Tech Corp | Radiation stress relieving of polymer articles |
DE3343745A1 (en) * | 1983-12-02 | 1985-06-13 | Siemens AG, 1000 Berlin und 8000 München | MULTI-LAYER CIRCUITS MADE OF THERMOPLAST COPPER |
JPS60121791A (en) * | 1983-12-05 | 1985-06-29 | 日本写真印刷株式会社 | Method of producing printed circuit board |
FR2587273B1 (en) * | 1985-09-19 | 1988-04-08 | Darragon Sa | METHOD AND AUTOCLAVE PRESSURE FOR LAMINATING MULTI-LAYER PRINTED CIRCUITS AND / OR PLASTIFICATION OF FLAT ELEMENTS, AND DEVICE FOR CONVERTING INTO AUTOCLAVE PRESS OF THIS TYPE |
DE3735109A1 (en) * | 1987-10-16 | 1989-05-03 | Basf Ag | PCB |
WO1989005712A1 (en) * | 1987-12-15 | 1989-06-29 | Oy Partek Ab | A grindstone |
FR2660671B1 (en) * | 1990-04-06 | 1993-05-07 | Thomson Csf | PROCESS FOR METALLIZING POLYETHERSULFONE. |
JP2570283Y2 (en) * | 1990-08-22 | 1998-05-06 | 三菱重工業株式会社 | Three-fold winding and three-fold outer folding machine |
FR2678468A1 (en) * | 1991-06-26 | 1992-12-31 | Set Services Tech | Method of insulating a flexible electric circuit, device for implementing the said method and products thus obtained |
US7105235B2 (en) * | 2002-05-17 | 2006-09-12 | Her Majesty The Queen In Right Of Canada As Represented By The Minister Of Natural Resources | Isotropic zero CTE reinforced composite materials |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR1490081A (en) * | 1965-08-20 | 1967-07-28 | Union Carbide Corp | Method for increasing the adhesion of metallic coatings on aromatic polymer substrates |
DE1590305A1 (en) * | 1966-06-08 | 1970-06-04 | Dynamit Nobel Ag | Process for applying printed circuits to laminates |
JPS4521995Y1 (en) * | 1967-07-15 | 1970-09-01 | ||
GB1415778A (en) * | 1973-04-16 | 1975-11-26 | Ici Ltd | Increasing the molecular weight of aromatic polysulphones |
JPS569420B2 (en) * | 1973-09-06 | 1981-03-02 | ||
JPS5531741B2 (en) * | 1974-04-10 | 1980-08-20 | ||
CH581474A5 (en) * | 1974-06-27 | 1976-11-15 | Draegerwerk Ag | |
JPS5125393A (en) * | 1974-08-27 | 1976-03-01 | Kyoei Steel Ltd | HOKOTEIISAISEIGATAHOCHOKI |
JPS5134287A (en) * | 1974-09-19 | 1976-03-23 | Hideaki Takahashi | HORIKAABONEETOOSHUTAITOSHIAKURIRU MATAHA TANOJUSHITOOBURENDOSHITA GOSEIJUSHISHIITO TO KINZOKUARUIHAHITETSUKINZOKU MATAHA GURASUMATAHAKINOSUITANOKAKUSHIITOTOO RAMINEETOSHITASHIITO OYOBI SONOSEI |
US4148969A (en) * | 1976-03-03 | 1979-04-10 | Exxon Research & Engineering Co. | Polyparabanic acid/copper foil laminates obtained by direct solution casting |
JPS5735950Y2 (en) * | 1976-06-24 | 1982-08-09 |
-
1980
- 1980-03-31 DE DE3012889A patent/DE3012889C2/en not_active Expired
- 1980-04-02 DE DE3013130A patent/DE3013130C2/en not_active Expired
- 1980-04-15 GB GB8012343A patent/GB2057351B/en not_active Expired
- 1980-04-24 AU AU57777/80A patent/AU539984B2/en not_active Ceased
- 1980-04-25 CA CA000350711A patent/CA1157622A/en not_active Expired
- 1980-04-25 AT AT0224680A patent/AT384144B/en not_active IP Right Cessation
- 1980-04-28 SE SE8003203A patent/SE454125B/en not_active IP Right Cessation
- 1980-04-28 CH CH3278/80A patent/CH657571A5/en not_active IP Right Cessation
- 1980-04-29 NL NLAANVRAGE8002514,A patent/NL188674C/en not_active IP Right Cessation
- 1980-04-29 IT IT48536/80A patent/IT1146956B/en active
- 1980-04-29 DK DK184980A patent/DK184980A/en not_active Application Discontinuation
- 1980-04-30 JP JP5938180A patent/JPS564460A/en active Pending
- 1980-04-30 FR FR8009783A patent/FR2455616A1/en active Granted
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0180220A2 (en) * | 1984-11-02 | 1986-05-07 | AMP-AKZO CORPORATION (a Delaware corp.) | A process for producing metal clad thermoplastic base materials |
EP0180220A3 (en) * | 1984-11-02 | 1988-01-27 | Kollmorgen Technologies Corporation | A process for producing metal clad thermoplastic base materials and printed circuit conductors on said base materials |
US6572954B1 (en) | 1998-11-04 | 2003-06-03 | Thomson Licensing, S.A. | Electromechanical component |
WO2002021886A2 (en) * | 2000-09-07 | 2002-03-14 | Oak-Mitsui Inc. | Manufacturing fire retardant circuit boards without the use of fire retardant resin additives |
WO2002021886A3 (en) * | 2000-09-07 | 2002-06-20 | Oak Mitsui Inc | Manufacturing fire retardant circuit boards without the use of fire retardant resin additives |
US6495244B1 (en) | 2000-09-07 | 2002-12-17 | Oak-Mitsui, Inc. | Manufacturing fire retardant circuit boards without the use of fire retardant resin additives |
CN1293792C (en) * | 2000-09-07 | 2007-01-03 | 奥克-三井有限公司 | Manufacturing fire retardant circuit boards without the use of fire retardant resin additives |
EP1260359A2 (en) * | 2001-05-24 | 2002-11-27 | Sumitomo Bakelite Co., Ltd. | Method for manufacturing a laminated board |
EP1260359A3 (en) * | 2001-05-24 | 2003-11-26 | Sumitomo Bakelite Co., Ltd. | Method for manufacturing a laminated board |
AT511758A3 (en) * | 2011-05-17 | 2013-12-15 | Ksg Leiterplatten Gmbh | Method for producing a semifinished product for a single-layer or multilayer printed circuit board and semifinished product |
AT511758B1 (en) * | 2011-05-17 | 2014-03-15 | Ksg Leiterplatten Gmbh | Method for producing a semifinished product for a single-layer or multilayer printed circuit board and semifinished product |
EP4011593A1 (en) * | 2020-12-14 | 2022-06-15 | Intops. Co., Ltd. | In-mold electronic structure using plating process and method therefor |
Also Published As
Publication number | Publication date |
---|---|
DE3013130C2 (en) | 1983-01-20 |
IT8048536A0 (en) | 1980-04-29 |
NL188674B (en) | 1992-03-16 |
DE3013130A1 (en) | 1980-11-13 |
FR2455616B1 (en) | 1983-12-09 |
SE8003203L (en) | 1980-10-31 |
AU5777780A (en) | 1980-11-06 |
CH657571A5 (en) | 1986-09-15 |
AT384144B (en) | 1987-10-12 |
IT1146956B (en) | 1986-11-19 |
DE3012889C2 (en) | 1984-01-12 |
DK184980A (en) | 1980-10-31 |
SE454125B (en) | 1988-03-28 |
JPS564460A (en) | 1981-01-17 |
ATA224680A (en) | 1987-02-15 |
DE3012889A1 (en) | 1980-11-06 |
GB2057351B (en) | 1983-04-07 |
NL8002514A (en) | 1980-11-03 |
FR2455616A1 (en) | 1980-11-28 |
AU539984B2 (en) | 1984-10-25 |
CA1157622A (en) | 1983-11-29 |
NL188674C (en) | 1992-08-17 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
732 | Registration of transactions, instruments or events in the register (sect. 32/1977) | ||
732 | Registration of transactions, instruments or events in the register (sect. 32/1977) | ||
PCNP | Patent ceased through non-payment of renewal fee |
Effective date: 19930415 |