GB1467354A - Power transistor - Google Patents
Power transistorInfo
- Publication number
- GB1467354A GB1467354A GB2085674A GB2085674A GB1467354A GB 1467354 A GB1467354 A GB 1467354A GB 2085674 A GB2085674 A GB 2085674A GB 2085674 A GB2085674 A GB 2085674A GB 1467354 A GB1467354 A GB 1467354A
- Authority
- GB
- United Kingdom
- Prior art keywords
- wafer
- monocrystalline
- semi
- grooves
- conductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 235000012431 wafers Nutrition 0.000 abstract 5
- 229910021421 monocrystalline silicon Inorganic materials 0.000 abstract 2
- 239000004065 semiconductor Substances 0.000 abstract 2
- 238000009792 diffusion process Methods 0.000 abstract 1
- 239000011521 glass Substances 0.000 abstract 1
- 239000012535 impurity Substances 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 229910001092 metal group alloy Inorganic materials 0.000 abstract 1
- 238000001465 metallisation Methods 0.000 abstract 1
- 230000003014 reinforcing effect Effects 0.000 abstract 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/185—Joining of semiconductor bodies for junction formation
- H01L21/187—Joining of semiconductor bodies for junction formation by direct bonding
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/12—Mountings, e.g. non-detachable insulating substrates
- H01L23/14—Mountings, e.g. non-detachable insulating substrates characterised by the material or its electrical properties
- H01L23/147—Semiconductor insulating substrates
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
- H01L23/3157—Partial encapsulation or coating
- H01L23/3178—Coating or filling in grooves made in the semiconductor body
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/0657—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by the shape of the body
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
- H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
- H01L29/73—Bipolar junction transistors
- H01L29/732—Vertical transistors
- H01L29/7325—Vertical transistors having an emitter-base junction leaving at a main surface and a base-collector junction leaving at a peripheral surface of the body, e.g. mesa planar transistor
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01005—Boron [B]
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01006—Carbon [C]
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- H—ELECTRICITY
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- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01013—Aluminum [Al]
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- H—ELECTRICITY
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- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01014—Silicon [Si]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01024—Chromium [Cr]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01033—Arsenic [As]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01046—Palladium [Pd]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01047—Silver [Ag]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01078—Platinum [Pt]
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- H—ELECTRICITY
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- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/013—Alloys
- H01L2924/0132—Binary Alloys
- H01L2924/01322—Eutectic Alloys, i.e. obtained by a liquid transforming into two solid phases
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/1015—Shape
- H01L2924/10155—Shape being other than a cuboid
- H01L2924/10157—Shape being other than a cuboid at the active surface
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Bipolar Transistors (AREA)
Abstract
1467354 Semi-conductor devices GENERAL ELECTRIC CO 10 May 1974 20856/74 Heading H1K A plurality of transistors are formed in a structure, which is eventually subdivided to obtain single devices, comprising a first wafer of monocrystalline Si having stacked collectors 4, 12 a base 10 and an array of emitters 16 and a second semi-conductor wafer 24 bonded to the first with a metallic alloy 28 to reinforce and support it. The first wafer has grooves 36 extending partly through an outer collector layer 4 which are coated with glass passivating material 44 and it is along such grooves that subdivision 62 of the structure is made. An oxide layer 20 is used as a mask during impurity diffusion to form the emitter array. The two wafers are both preferably of monocrystalline Si, but the reinforcing wafer 24 has a low resistivity of 0À001 ohm. cm. and carries metallization 56 containing Ag, Ni and Cr to form the collector terminal. Other terminals 50, 52 are of evaporated Al.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB2085674A GB1467354A (en) | 1974-05-10 | 1974-05-10 | Power transistor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB2085674A GB1467354A (en) | 1974-05-10 | 1974-05-10 | Power transistor |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1467354A true GB1467354A (en) | 1977-03-16 |
Family
ID=10152903
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB2085674A Expired GB1467354A (en) | 1974-05-10 | 1974-05-10 | Power transistor |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB1467354A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0323549A2 (en) * | 1987-12-28 | 1989-07-12 | Motorola Inc. | Bipolar semiconductor device having a conductive recombination layer |
EP0700079A3 (en) * | 1994-09-05 | 1996-03-27 | Ngk Insulators Ltd | |
WO2000011713A1 (en) * | 1998-08-25 | 2000-03-02 | Commissariat A L'energie Atomique | Integrated electronic circuit comprising at least an electronic power component |
WO2000011714A1 (en) * | 1998-08-25 | 2000-03-02 | Commissariat A L'energie Atomique | Collective method for conditioning a plurality of components initially formed in a common substrate |
-
1974
- 1974-05-10 GB GB2085674A patent/GB1467354A/en not_active Expired
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0323549A2 (en) * | 1987-12-28 | 1989-07-12 | Motorola Inc. | Bipolar semiconductor device having a conductive recombination layer |
EP0323549A3 (en) * | 1987-12-28 | 1989-12-06 | Motorola Inc. | Bipolar semiconductor device having a conductive recombination layer |
EP0700079A3 (en) * | 1994-09-05 | 1996-03-27 | Ngk Insulators Ltd | |
US5602405A (en) * | 1994-09-05 | 1997-02-11 | Ngk Insulators, Ltd. | Semiconductor device with base formed by the junction of two semiconductors of the same conductive type |
WO2000011713A1 (en) * | 1998-08-25 | 2000-03-02 | Commissariat A L'energie Atomique | Integrated electronic circuit comprising at least an electronic power component |
WO2000011714A1 (en) * | 1998-08-25 | 2000-03-02 | Commissariat A L'energie Atomique | Collective method for conditioning a plurality of components initially formed in a common substrate |
FR2782840A1 (en) * | 1998-08-25 | 2000-03-03 | Commissariat Energie Atomique | ELECTRONIC CIRCUIT AND METHOD FOR PRODUCING AN INTEGRATED ELECTRONIC CIRCUIT COMPRISING AT LEAST ONE ELECTRONIC POWER COMPONENT IN A SUBSTRATE PLATE |
FR2783354A1 (en) * | 1998-08-25 | 2000-03-17 | Commissariat Energie Atomique | COLLECTIVE PROCESS FOR CONDITIONING A PLURALITY OF COMPONENTS FORMED INITIALLY IN THE SAME SUBSTRATE |
US6423573B1 (en) | 1998-08-25 | 2002-07-23 | Commissariat A L'energie Atomique | Integrated electronic circuit comprising at least an electronic power component |
US6581279B1 (en) | 1998-08-25 | 2003-06-24 | Commissariat A L'energie Atomique | Method of collectively packaging electronic components |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
CSNS | Application of which complete specification have been accepted and published, but patent is not sealed |