GB1329589A - Hydrophilic-hydrophobic photon sensitive medium - Google Patents
Hydrophilic-hydrophobic photon sensitive mediumInfo
- Publication number
- GB1329589A GB1329589A GB5822770A GB5822770A GB1329589A GB 1329589 A GB1329589 A GB 1329589A GB 5822770 A GB5822770 A GB 5822770A GB 5822770 A GB5822770 A GB 5822770A GB 1329589 A GB1329589 A GB 1329589A
- Authority
- GB
- United Kingdom
- Prior art keywords
- medium
- exposed
- hydrophobic
- developed
- hydrophilic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
- G03F7/0044—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists involving an interaction between the metallic and non-metallic component, e.g. photodope systems
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/148—Light sensitive titanium compound containing
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Printing Plates And Materials Therefor (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Abstract
1329589 Photographic material HUGHES AIRCRAFT CO 8 Dec 1970 [8 Dec 1969] 58227/70 Heading G2C [Also in Division H1] A recording medium which is hydrophobic when unexposed and hydrophilic when exposed to photons, ions or electrons comprises a binder in which are dissolved or dispersed one of the following sensitive to electrons, ions or photons; oxides of Zn, Ti, Ta, In, Mg, Ge, Sn + Bi, sulphides and selenides of Ca, Zn, Cd, Fe and In, BN 3 , lithium carbonate and niobate, calcium tungstete, beryllium aluminide, zinc carbonate, cadmium niobate anthrecene and caesium activated Ca-Mg silicate one of a specified group of sensitization enhancing compounds e.g. Cu salts and one of a specified group inducing agents adapted to render the medium hydrophobic e.g. ethylene and propylene polymers containing F group polyvinylidene fluoride, polydimethyl siloxane, silene modified silica, Cu salts of fluorinated organic acids and fatty acids. The sensitive material may be photo-conductive or photoemissive. In the embodiments Zn0 with copoly butadienestyrene as binder in an organic solvent solution is mixed with copper acetylacetonate or cuprous chloride as the sensitizing agent and naphthenic acid, linoleic acid, siliconized silica optionally treated with formalin or a silicone resin as the hydrophobicity inducing agent, and coated on an aluminized polyester sheet. The medium is exposed to a U.V. image and developed in the exposed areas with aqueous colloidal graphite. Alternatively the medium may be developed by deposition of metal vapour either following or simultaneously with exposure. A hardenable oleophilic substance e.g., molten wax, may be applied to the unexposed areas of the developed medium to provide a gravure printing plate. Alternatively the imagewise exposed medium may be treated with an aqueous solution of dichromate and uniformly exposed to U.V. radiation to give a photo-resist. The medium may be self-supporting or on a substrate of paper or plastics.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US88295169A | 1969-12-08 | 1969-12-08 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1329589A true GB1329589A (en) | 1973-09-12 |
Family
ID=25381677
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB5822770A Expired GB1329589A (en) | 1969-12-08 | 1970-12-08 | Hydrophilic-hydrophobic photon sensitive medium |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US3640712A (en) |
| JP (1) | JPS4912282B1 (en) |
| FR (1) | FR2074974A5 (en) |
| GB (1) | GB1329589A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0932081A1 (en) * | 1997-08-08 | 1999-07-28 | Dai Nippon Printing Co., Ltd. | Pattern forming body, pattern forming method, and their applications |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3877939A (en) * | 1973-06-25 | 1975-04-15 | Nippon Paint Co Ltd | Photopolymer printing plates and coated relief printing plates |
| US3907562A (en) * | 1973-11-14 | 1975-09-23 | Xerox Corp | Process for preparing waterless lithographic masters |
| FR2359431A1 (en) * | 1976-07-21 | 1978-02-17 | Agfa Gevaert | Daylight insensitive recording element sensitive to ionising radiation - contg. stannic cpd., with a cpd. promoting formation of stannous ions on irradiation |
| FR2359430A1 (en) * | 1976-07-21 | 1978-02-17 | Agfa Gevaert | Daylight insensitive recording element sensitive to ionising radiation - contg. a stannic cpd. which forms a stannous cpd. image on irradiation |
| DE2725093C3 (en) * | 1977-06-03 | 1984-04-05 | Rudolf Dr.-Ing. 2300 Kiel Hell | Printing process and arrangement for its implementation |
| AU676299B2 (en) * | 1993-06-28 | 1997-03-06 | Akira Fujishima | Photocatalyst composite and process for producing the same |
| US6830785B1 (en) | 1995-03-20 | 2004-12-14 | Toto Ltd. | Method for photocatalytically rendering a surface of a substrate superhydrophilic, a substrate with a superhydrophilic photocatalytic surface, and method of making thereof |
| US6090489A (en) * | 1995-12-22 | 2000-07-18 | Toto, Ltd. | Method for photocatalytically hydrophilifying surface and composite material with photocatalytically hydrophilifiable surface |
| US5939194A (en) | 1996-12-09 | 1999-08-17 | Toto Ltd. | Photocatalytically hydrophilifying and hydrophobifying material |
| AU6125099A (en) | 1998-10-19 | 2000-05-08 | Toto Ltd. | Stainproof material and method for manufacturing the same, and coating composition and apparatus therefor |
| US8909683B1 (en) | 2009-07-17 | 2014-12-09 | Open Invention Network, Llc | Method and system for communicating with internet resources to identify and supply content for webpage construction |
| US9565298B1 (en) | 2010-03-25 | 2017-02-07 | Open Invention Network Llc | Method and device for appending information in a conversation in a voice based networking website |
| US9645996B1 (en) | 2010-03-25 | 2017-05-09 | Open Invention Network Llc | Method and device for automatically generating a tag from a conversation in a social networking website |
-
1969
- 1969-12-08 US US882951A patent/US3640712A/en not_active Expired - Lifetime
-
1970
- 1970-12-07 FR FR7043939A patent/FR2074974A5/fr not_active Expired
- 1970-12-08 GB GB5822770A patent/GB1329589A/en not_active Expired
- 1970-12-08 JP JP45108200A patent/JPS4912282B1/ja active Pending
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0932081A1 (en) * | 1997-08-08 | 1999-07-28 | Dai Nippon Printing Co., Ltd. | Pattern forming body, pattern forming method, and their applications |
| EP0932081A4 (en) * | 1997-08-08 | 2001-09-05 | Dainippon Printing Co Ltd | Pattern forming body, pattern forming method, and their applications |
| EP1376226A1 (en) * | 1997-08-08 | 2004-01-02 | Dai Nippon Printing Co., Ltd. | Structure for pattern formation, method for pattern formation, and application thereof |
| EP1376229A1 (en) * | 1997-08-08 | 2004-01-02 | Dai Nippon Printing Co., Ltd. | Structure for pattern formation, method for pattern formation, and application thereof |
| EP1376228A1 (en) * | 1997-08-08 | 2004-01-02 | Dai Nippon Printing Co., Ltd. | Structure for pattern formation, method for pattern formation, and application thereof |
| EP1376224A1 (en) * | 1997-08-08 | 2004-01-02 | Dai Nippon Printing Co., Ltd. | Structure for pattern formation, method for pattern formation, and application thereof |
| EP1376227A1 (en) * | 1997-08-08 | 2004-01-02 | Dai Nippon Printing Co., Ltd. | Structure for pattern formation, method for pattern formation, and application thereof |
| EP1376225A1 (en) * | 1997-08-08 | 2004-01-02 | Dai Nippon Printing Co., Ltd. | Structure for pattern formation, method for pattern formation, and application thereof |
| US7575845B2 (en) | 1997-08-08 | 2009-08-18 | Dai Nippon Printing Co., Ltd. | Structure for pattern formation, method for pattern formation, and application thereof |
| US8785108B2 (en) | 1997-08-08 | 2014-07-22 | Dai Nippon Printing Co., Ltd. | Structure for pattern formation, method for pattern formation, and application thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| US3640712A (en) | 1972-02-08 |
| JPS4912282B1 (en) | 1974-03-23 |
| FR2074974A5 (en) | 1971-10-08 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| GB1329589A (en) | Hydrophilic-hydrophobic photon sensitive medium | |
| US3152903A (en) | Reproduction system | |
| SE423003B (en) | DESENSIBILIZATION SOLUTION AND USE THEREOF TO TREAT A DEVELOPED, CLEARLY DIAZO PRINTING PLATE | |
| US3623865A (en) | Processes for producing photographic images utilizing leucophthalocyanines and photosensitive materials and products related thereto | |
| US4271256A (en) | Method for forming images | |
| GB2026186A (en) | Light-sensitive material for tanning development | |
| US3429706A (en) | Radiation-sensitive system | |
| US3635719A (en) | Heat developable light-sensitive elements | |
| NO150948B (en) | THERMOPLASTIC LIKELY MATERIAL, AND PROCEDURES FOR THE PREPARATION OF THIS | |
| DE2233868A1 (en) | METHOD OF MAKING A RECOVERABLE MESSAGE RECORD | |
| US3652276A (en) | Photographic photoconductor systems utilizing reversible redox materials to improve latent image life | |
| US3615559A (en) | Hydrophobic composition rendered hydrophilic by photon exposure | |
| US3634083A (en) | Photographic process for producing relief images by extended physical development | |
| US3790380A (en) | Image recording medium and process | |
| US3807304A (en) | Photographic process for producing coherent metallic image bonded to a roughened support and products produced thereby | |
| US3835780A (en) | Process of printing by driography | |
| US3751161A (en) | Photographic image transfer apparatus | |
| US3464820A (en) | Electrophotographic engraving plate | |
| US3717464A (en) | Photosensitization of printing masters | |
| GB1266151A (en) | ||
| US3829317A (en) | Physical development process utilizing viscous sensitizing metal solution | |
| US4199357A (en) | Compositions for recording materials | |
| US3713824A (en) | Physical development utilizing 1-phenyl-3-pyrazolidone or a benzene diamine combined with a polyhydroxybenzene in acidic medium | |
| US3492206A (en) | Printing method utilizing electrolysis | |
| US3825424A (en) | Process for transparent photographic images |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed [section 19, patents act 1949] | ||
| PLNP | Patent lapsed through nonpayment of renewal fees |