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GB1319765A - Resistive elements - Google Patents

Resistive elements

Info

Publication number
GB1319765A
GB1319765A GB1319765DA GB1319765A GB 1319765 A GB1319765 A GB 1319765A GB 1319765D A GB1319765D A GB 1319765DA GB 1319765 A GB1319765 A GB 1319765A
Authority
GB
United Kingdom
Prior art keywords
thick
polyimide
sputtered
ohms
resistance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
UK Atomic Energy Authority
Original Assignee
UK Atomic Energy Authority
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by UK Atomic Energy Authority filed Critical UK Atomic Energy Authority
Publication of GB1319765A publication Critical patent/GB1319765A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/20—Metallic material, boron or silicon on organic substrates
    • C23C14/205—Metallic material, boron or silicon on organic substrates by cathodic sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
    • H01C17/075—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques
    • H01C17/12—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques by sputtering

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)

Abstract

1319765 Making resistors by sputtering UNITED KINGDOM ATOMIC ENERGY AUTHORITY 1 Sept 1970 [15 Oct 1969] 50790/69 Heading C7F [Also in Division H1] A resistor is made by sputtering metal on to a polyimide plastics backing material. The polyimide may be in the form of a thin film and the metal may be N1; this is either sputtered through a mask to give a convoluted strip resistor, or preferably, sputtered as a continuous film, e.g. 500A‹ thick, and subsequently photo-etched to leave the desired pattern. Resistors for temperature measuring elements may be formed from Ni 500A‹ thick and 0À02" wide on 0À0005" polyimide film (resistance # 1000 ohms), or from Ni 500A‹ thick as a convoluted 20" strip of width 0À002" (resistance # 100,000 ohms).
GB1319765D 1969-10-15 1969-10-15 Resistive elements Expired GB1319765A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB5079069 1969-10-15

Publications (1)

Publication Number Publication Date
GB1319765A true GB1319765A (en) 1973-06-06

Family

ID=10457362

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1319765D Expired GB1319765A (en) 1969-10-15 1969-10-15 Resistive elements

Country Status (1)

Country Link
GB (1) GB1319765A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2391538A1 (en) * 1977-05-16 1978-12-15 Asahi Chemical Ind THIN LAYER STRENGTH AND MANUFACTURING PROCESS
EP0016263A1 (en) * 1979-03-21 1980-10-01 BBC Brown Boveri AG Thin film resistor having a high temperature coefficient and method of manufacturing the same
FR2457482A1 (en) * 1979-05-23 1980-12-19 Heidenhain Gmbh Dr Johannes BOLOMETER WITH MEANDER-SHAPED CONNECTION STRIP ON A PHOTORESIST STRUCTURED LAYER
EP0025529A2 (en) * 1979-09-12 1981-03-25 Battelle-Institut e.V. Bolometric radiation receiver and process for its production
EP0568960A2 (en) * 1992-05-05 1993-11-10 Cardiac Pacemakers, Inc. Energy dissipation resistor for implantable defibrillator
WO2004032154A1 (en) * 2002-09-30 2004-04-15 General Electric Company Techniques for fabricating a resistor on a flexible base material

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2391538A1 (en) * 1977-05-16 1978-12-15 Asahi Chemical Ind THIN LAYER STRENGTH AND MANUFACTURING PROCESS
EP0016263A1 (en) * 1979-03-21 1980-10-01 BBC Brown Boveri AG Thin film resistor having a high temperature coefficient and method of manufacturing the same
FR2457482A1 (en) * 1979-05-23 1980-12-19 Heidenhain Gmbh Dr Johannes BOLOMETER WITH MEANDER-SHAPED CONNECTION STRIP ON A PHOTORESIST STRUCTURED LAYER
EP0025529A2 (en) * 1979-09-12 1981-03-25 Battelle-Institut e.V. Bolometric radiation receiver and process for its production
EP0025529A3 (en) * 1979-09-12 1981-12-16 Battelle-Institut E.V. Bolometric radiation receiver and process for its production
EP0568960A2 (en) * 1992-05-05 1993-11-10 Cardiac Pacemakers, Inc. Energy dissipation resistor for implantable defibrillator
EP0568960A3 (en) * 1992-05-05 1995-05-10 Cardiac Pacemakers Inc Energy dissipation resistor for implantable defibrillator.
WO2004032154A1 (en) * 2002-09-30 2004-04-15 General Electric Company Techniques for fabricating a resistor on a flexible base material

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Legal Events

Date Code Title Description
PS Patent sealed
PLNP Patent lapsed through nonpayment of renewal fees