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GB1391177A - Vitreous siliceous material - Google Patents

Vitreous siliceous material

Info

Publication number
GB1391177A
GB1391177A GB3727371A GB3727371A GB1391177A GB 1391177 A GB1391177 A GB 1391177A GB 3727371 A GB3727371 A GB 3727371A GB 3727371 A GB3727371 A GB 3727371A GB 1391177 A GB1391177 A GB 1391177A
Authority
GB
United Kingdom
Prior art keywords
oxygen
compound
vitreous
silica
refractive index
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB3727371A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thermal Syndicate Ltd
Original Assignee
Thermal Syndicate Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thermal Syndicate Ltd filed Critical Thermal Syndicate Ltd
Priority to GB3727371A priority Critical patent/GB1391177A/en
Priority to FR7228410A priority patent/FR2150327B1/fr
Priority to CA148,867A priority patent/CA974413A/en
Priority to NL7210831A priority patent/NL174341C/en
Priority to DE19722239249 priority patent/DE2239249C2/en
Priority to JP47079219A priority patent/JPS4826208A/ja
Publication of GB1391177A publication Critical patent/GB1391177A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1415—Reactant delivery systems
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
    • C03B37/01807—Reactant delivery systems, e.g. reactant deposition burners
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C13/00—Fibre or filament compositions
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C13/00—Fibre or filament compositions
    • C03C13/04—Fibre optics, e.g. core and clad fibre compositions
    • C03C13/045—Silica-containing oxide glass compositions
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/02—Frit compositions, i.e. in a powdered or comminuted form
    • C03C8/06—Frit compositions, i.e. in a powdered or comminuted form containing halogen
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/31—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with germanium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/40—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/40—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • C03B2201/42—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn doped with titanium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/30—Doped silica-based glasses containing metals
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/30—Doped silica-based glasses containing metals
    • C03C2201/31—Doped silica-based glasses containing metals containing germanium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/30—Doped silica-based glasses containing metals
    • C03C2201/40—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • C03C2201/42—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn containing titanium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/40—Gas-phase processes
    • C03C2203/42—Gas-phase processes using silicon halides as starting materials
    • C03C2203/44—Gas-phase processes using silicon halides as starting materials chlorine containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Glass Compositions (AREA)
  • Optical Integrated Circuits (AREA)
  • Optical Fibers, Optical Fiber Cores, And Optical Fiber Bundles (AREA)
  • Manufacture, Treatment Of Glass Fibers (AREA)

Abstract

1391177 Silica; silica-based glass THERMAL SYNDICATE Ltd 3 Aug 1972 [9 Aug 1971] 37273/71 Headings C1A and C1M A vitreous siliceous material having a refractive index higher than that of pure vitreous silica, and substantially devoid of hydroxyl groups is formed by heating a gas stream comprising (a) at least one oxidizable hydrogen-free silicon compound, (b) at least one additive material comprising at least one oxidizable, hydrogen-free compound of Ti, Sn, Ga and/or Ge, and (c) elemental oxygen or a hydrogen-free compound with available oxygen, to oxidize compounds (a) and (b) to the corresponding oxides, and depositing the reaction products from the stream on to a refractory target, the amounts of (a) and (b) being such as to give a vitreous material comprising 1-20% by weight of oxides of Ti, Sn, Ge and/or Ga. The reaction may be carried out in a plasma burner, or an un-augmented flame used. The gas (c) may be an argon/oxygen, cyanogen/oxygen, carbon monoxide/oxygen or carbon disulphide/oxygen mixture. Compound (b) may be TiCl 4 , while compound (a) may be silicon halide (e.g. SiCl 4 ), oxyhalide, sulphohalide, monoxide, monosulphide, disulphide, cyanate, isocyanate and/or thiocyanate. The target is preferably silica, a rod of vitreous material being built up on the target. Such a rod, which may have a refractive index (u D ) of 1À57 to 1À50, may be coated with vitreous silica of lower refractive index (e.g. not including an oxide of Ti, Sn, Ge and/or Ga), and drawn down to form an optical fibre wave-guide. The rod may be given a further coating of glass containing at least one Cr, Co and/or V compound. Preferred amounts of the additive oxides (b) are (in weight per cent), TiO 2 1-12, SnO 2 3-10, GeO 2 2À25-7À5 or Ga 2 O 3 3-10.
GB3727371A 1971-08-09 1971-08-09 Vitreous siliceous material Expired GB1391177A (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
GB3727371A GB1391177A (en) 1971-08-09 1971-08-09 Vitreous siliceous material
FR7228410A FR2150327B1 (en) 1971-08-09 1972-08-07
CA148,867A CA974413A (en) 1971-08-09 1972-08-08 Siliceous material
NL7210831A NL174341C (en) 1971-08-09 1972-08-08 METHOD FOR PREPARING CORE MATERIAL FOR OPTICAL WAVE CONDUCTORS
DE19722239249 DE2239249C2 (en) 1971-08-09 1972-08-09 Method of manufacturing a silicon dioxide material and application of the method of manufacturing optical waveguides
JP47079219A JPS4826208A (en) 1971-08-09 1972-08-09

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB3727371A GB1391177A (en) 1971-08-09 1971-08-09 Vitreous siliceous material

Publications (1)

Publication Number Publication Date
GB1391177A true GB1391177A (en) 1975-04-16

Family

ID=10395137

Family Applications (1)

Application Number Title Priority Date Filing Date
GB3727371A Expired GB1391177A (en) 1971-08-09 1971-08-09 Vitreous siliceous material

Country Status (6)

Country Link
JP (1) JPS4826208A (en)
CA (1) CA974413A (en)
DE (1) DE2239249C2 (en)
FR (1) FR2150327B1 (en)
GB (1) GB1391177A (en)
NL (1) NL174341C (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0028155A1 (en) * 1979-10-29 1981-05-06 International Standard Electric Corporation Single mode optical fibre and method of making it
EP0960073A2 (en) * 1996-06-17 1999-12-01 Corning Incorporated Process for forming a titania-containing preform silica glass blank
DE102009015076A1 (en) * 2009-03-31 2010-10-14 Heraeus Quarzglas Gmbh & Co. Kg Doped quartz glass optical filter material for use with a UV lamp

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4401461A (en) * 1969-05-28 1983-08-30 Rohm And Haas Company Herbicidal 4-nitro-diphenyl ethers
JPS4945117B1 (en) * 1970-12-30 1974-12-02
GB1368868A (en) * 1971-11-25 1974-10-02 Siemens Ag Optical wave guides
JPS5758641B2 (en) * 1972-12-27 1982-12-10 Fujitsu Ltd
US3884550A (en) * 1973-01-04 1975-05-20 Corning Glass Works Germania containing optical waveguide
JPS5025240A (en) * 1973-06-07 1975-03-17
JPS5646124B2 (en) * 1973-06-08 1981-10-31
DE2463097C2 (en) * 1973-08-21 1984-05-24 International Standard Electric Corp., New York, N.Y. Process for the production of fiber optic light guides
JPS59454B2 (en) * 1973-09-22 1984-01-06 住友電気工業株式会社 Manufacturing method of fiber base material for optical transmission
JPS572658B2 (en) * 1973-12-28 1982-01-18
JPS5429263B2 (en) * 1974-01-14 1979-09-21
US4360250A (en) * 1974-05-31 1982-11-23 National Research Development Corp. Optical waveguides
JPS51112817A (en) * 1975-03-31 1976-10-05 Fujikura Ltd Manufacture of multiicomponent glass for optical fibers
GB1586119A (en) * 1976-07-05 1981-03-18 Fujitsu Ltd Method of producing an optical fibre preform
JPS5521059A (en) * 1978-07-31 1980-02-14 Nippon Telegr & Teleph Corp <Ntt> Optical fiber
FR2476058A1 (en) * 1980-02-15 1981-08-21 Quartz Silice Sa SEMI-PRODUCT FOR THE PRODUCTION OF OPTICAL FIBERS, PROCESS FOR PREPARING THE SEMICONDUCTOR AND OPTICAL FIBERS OBTAINED FROM THE SEMICONDUCTOR
JPS59137333A (en) * 1983-01-21 1984-08-07 Nippon Telegr & Teleph Corp <Ntt> Manufacture of base material for optical fiber
US4548640A (en) * 1983-10-21 1985-10-22 Fmc Corporation Allylthiodiphenyl ether herbicides

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1287541A (en) * 1961-02-02 1962-03-16 Saint Gobain Improvement in the manufacture of silicic glasses
FR1287540A (en) * 1961-02-02 1962-03-16 Saint Gobain Further training in the manufacture of silica glass or silicic glasses
US3228812A (en) * 1962-12-04 1966-01-11 Dickson Electronics Corp Method of forming semiconductors
NL128054C (en) * 1963-01-29
FR2002589A1 (en) * 1968-02-26 1969-10-31 Corning Glass Works

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0028155A1 (en) * 1979-10-29 1981-05-06 International Standard Electric Corporation Single mode optical fibre and method of making it
EP0960073A2 (en) * 1996-06-17 1999-12-01 Corning Incorporated Process for forming a titania-containing preform silica glass blank
EP0960073A4 (en) * 1996-06-17 2004-04-07 Corning Inc Process for forming a titania-containing preform silica glass blank
DE102009015076A1 (en) * 2009-03-31 2010-10-14 Heraeus Quarzglas Gmbh & Co. Kg Doped quartz glass optical filter material for use with a UV lamp

Also Published As

Publication number Publication date
FR2150327A1 (en) 1973-04-06
JPS4826208A (en) 1973-04-06
FR2150327B1 (en) 1977-04-01
DE2239249C2 (en) 1983-09-15
NL174341B (en) 1984-01-02
NL7210831A (en) 1973-02-13
DE2239249A1 (en) 1973-03-08
CA974413A (en) 1975-09-16
NL174341C (en) 1986-03-17

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Legal Events

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PCNP Patent ceased through non-payment of renewal fee