GB1223632A - Photoresist-forming compositions - Google Patents
Photoresist-forming compositionsInfo
- Publication number
- GB1223632A GB1223632A GB09469/68A GB1946968A GB1223632A GB 1223632 A GB1223632 A GB 1223632A GB 09469/68 A GB09469/68 A GB 09469/68A GB 1946968 A GB1946968 A GB 1946968A GB 1223632 A GB1223632 A GB 1223632A
- Authority
- GB
- United Kingdom
- Prior art keywords
- alkyl
- formula
- halogen
- heterocyclic ring
- dye
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/126—Halogen compound containing
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
1,223,632. Photocrosslinkable compositions. KONISHIBOKU PHOTO INDUSTRY CO. Ltd. 24 April, 1968 [25 April, 1967], No. 19469/68. Heading C3P. [Also in Division G2] A photoresist-forming (photocrosslinkable) composition comprises (a) a photoactivator containing a polyhalogenated methyl group which is capable of forming a free radical on exposure to light and (b) a polymer consisting of or containing units of the formula wherein A is H or a carboxylic acid or amide group, X is a divalent organic group, R 1 is H or C 1 -C 3 alkyl, R 2 is H, C 1 -C 3 alkyl or a substituted or unsubstituted phenyl group, and each of R 3 and R 4 , which may be the same or different, is H or C 1 -C 3 alkyl, with the proviso that in Formula II R 2 and R 3 , together with the N atom and benzene nucleus may form a heterocyclic ring system, or R 3 and R 4 together with the benzene nucleus may form a naphthalene ring system. Polymer (b) may be a homopolymer or a copolymer additionally containing units of one or more other monomers, e.g. styrene, acrylonitrile, vinyl acetate, acrylic, methacrylic or α- chloroacrylic acid or an alkyl ester thereof, itaconic acid, maleic anhydride or vinylidene chloride. In Formula I X may represent, for example, -COOCH 2 CH 2 -, -CONHCH 2 CH 2 - -COSCH 2 CH 2 -, -CONH-, -CH 2 -, -C 6 H 4 SO 2 NH-, -C 6 H 4 SO 2 O-C 6 H 4 - or -CONH-C 6 H 4 . Suitable as photoactivators (a) are compounds of the formula R<SP>1</SP>CX 2 R<SP>2</SP>, R<SP>4</SP>-SO-CX 2 R<SP>2</SP>, R<SP>4</SP>-SO 2 -CX 2 R<SP>2</SP> or where R<SP>1</SP> is H, alkyl, hydroxyalkyl, aryl, halogen or a heterocyclic ring, R<SP>2</SP> is H or halogen, R<SP>3</SP> is nitro, halogen or alkyl, R<SP>4</SP> is alkyl, haloalkyl, aryl or a heterocyclic ring, and X is Cl or Br. The compositions can be colour sensitized by including therein an acridine dye, a merocyanine dye or a styryl dye. The preparations are described of (i) poly- (2 - N - ethyl - N - phenylaminoethyl methacrylate) and (ii) a copolymer of N-(2-N-ethyl- N-phenylaminoethyl)-methacrylamide and styrene by polymerizing the corresponding monomer(s) in methyl ethyl ketone using azobisisobutyronitrile as initiator.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2598867 | 1967-04-25 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1223632A true GB1223632A (en) | 1971-03-03 |
Family
ID=12181077
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB09469/68A Expired GB1223632A (en) | 1967-04-25 | 1968-04-24 | Photoresist-forming compositions |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US3579343A (en) |
| DE (1) | DE1772262C3 (en) |
| GB (1) | GB1223632A (en) |
| NL (1) | NL6805927A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5011286B1 (en) * | 1971-07-15 | 1975-04-30 | ||
| JPS5024641B2 (en) * | 1972-10-17 | 1975-08-18 | ||
| JPS5315153A (en) * | 1976-07-27 | 1978-02-10 | Canon Inc | Hologram |
-
1968
- 1968-04-16 US US721621A patent/US3579343A/en not_active Expired - Lifetime
- 1968-04-23 DE DE1772262A patent/DE1772262C3/en not_active Expired
- 1968-04-24 GB GB09469/68A patent/GB1223632A/en not_active Expired
- 1968-04-25 NL NL6805927A patent/NL6805927A/xx unknown
Also Published As
| Publication number | Publication date |
|---|---|
| DE1772262C3 (en) | 1974-02-14 |
| DE1772262A1 (en) | 1971-11-11 |
| DE1772262B2 (en) | 1973-07-19 |
| US3579343A (en) | 1971-05-18 |
| NL6805927A (en) | 1968-10-28 |
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