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GB1293648A - Addition of metal ions to electrolytic plating baths - Google Patents

Addition of metal ions to electrolytic plating baths

Info

Publication number
GB1293648A
GB1293648A GB27417/70A GB2741770A GB1293648A GB 1293648 A GB1293648 A GB 1293648A GB 27417/70 A GB27417/70 A GB 27417/70A GB 2741770 A GB2741770 A GB 2741770A GB 1293648 A GB1293648 A GB 1293648A
Authority
GB
United Kingdom
Prior art keywords
plating
cell
metal ions
anode
separated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB27417/70A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Australian Iron and Steel Pty Ltd
Original Assignee
Australian Iron and Steel Pty Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Australian Iron and Steel Pty Ltd filed Critical Australian Iron and Steel Pty Ltd
Publication of GB1293648A publication Critical patent/GB1293648A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/12—Process control or regulation
    • C25D21/14—Controlled addition of electrolyte components

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Automation & Control Theory (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)

Abstract

1293648 Electro-plating AUSTRALIAN IRON & STEEL PTY Ltd 5 June 1970 [6 June 1969] 27417/70 Heading C7B A controlled addition of metal ions to electrolyte used in electro-plating is effected by dissolving electrolytically an anode of the plating metal in a cell containing at least two compartments separated by an ion exchange membrane, and adding the resulting metal ions to the plating electrolyte, the addition taking place independantly of the metal plating process. As shown dissolution cell 5 comprises an anode compartment 9 containing a soluble anode 13 separated by an ionexchange membrane 10 from cathode compartment 8 containing cathode 12 and stirrer 11; the metalion containing anolyte being circulated via pipe 6 to plating cell 3, and exhausted plating electrolyte being returned to the dissolution cell via pipe 7 by means of pump 4. The dissolution cell may be integral of the plating cell, the anode compartment being formed by the main plating bath, separated by an ion-exchange membrane from an appended cathode compartment.
GB27417/70A 1969-06-06 1970-06-05 Addition of metal ions to electrolytic plating baths Expired GB1293648A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
AU5611769 1969-06-06

Publications (1)

Publication Number Publication Date
GB1293648A true GB1293648A (en) 1972-10-18

Family

ID=3741739

Family Applications (1)

Application Number Title Priority Date Filing Date
GB27417/70A Expired GB1293648A (en) 1969-06-06 1970-06-05 Addition of metal ions to electrolytic plating baths

Country Status (6)

Country Link
JP (1) JPS4825617B1 (en)
BE (1) BE751590A (en)
DE (1) DE2027793A1 (en)
FR (1) FR2049165B1 (en)
GB (1) GB1293648A (en)
ZA (1) ZA703750B (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1997015704A2 (en) * 1995-10-26 1997-05-01 Lea Ronal Gmbh Electroplating plant
EP1029954A1 (en) * 1998-09-08 2000-08-23 Ebara Corporation Substrate plating device
CN101935862A (en) * 2010-08-17 2011-01-05 苏州铨笠电镀挂具有限公司 Cation generating device
CN101962796A (en) * 2010-08-17 2011-02-02 苏州铨笠电镀挂具有限公司 Method for sustainably complementing metallic cations in plating solution
US9303329B2 (en) 2013-11-11 2016-04-05 Tel Nexx, Inc. Electrochemical deposition apparatus with remote catholyte fluid management
CN112714803A (en) * 2018-08-27 2021-04-27 叶涛 Plating solution production and regeneration process and device for insoluble anode acid copper electroplating

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51101726U (en) * 1975-02-13 1976-08-16
DE2713392C2 (en) * 1977-03-23 1981-11-12 Ruwel-Werke Spezialfabrik für Leiterplatten GmbH, 4170 Geldern Process for the preparation of metal complex solutions
GB2058409A (en) * 1979-09-07 1981-04-08 Nat Res Dev Controlling ph or ion concentration of a stream
FR2479856A1 (en) * 1980-04-04 1981-10-09 Electricite De France Regeneration of metal plating soln. - using cell contg. anodic membrane and soluble metal anode
NL8602730A (en) * 1986-10-30 1988-05-16 Hoogovens Groep Bv METHOD FOR ELECTROLYTIC TINNING TIN USING AN INSOLUBLE ANODE.

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB310099A (en) * 1928-01-26 1929-04-25 George Lawton Electro copper (or other metal similarly deposited) lined hollow drill steel, for goldmining and similar purposes
FR1522251A (en) * 1966-12-26 1968-04-26 Plating process with and without electrolysis
US3486992A (en) * 1967-02-15 1969-12-30 Cincinnati Milling Machine Co Process for electrolytic oxidation of thallium or cerium salts

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1997015704A2 (en) * 1995-10-26 1997-05-01 Lea Ronal Gmbh Electroplating plant
WO1997015704A3 (en) * 1995-10-26 1997-07-10 Lea Ronal Gmbh Electroplating plant
EP1029954A1 (en) * 1998-09-08 2000-08-23 Ebara Corporation Substrate plating device
EP1029954A4 (en) * 1998-09-08 2006-07-12 Ebara Corp Substrate plating device
CN101935862A (en) * 2010-08-17 2011-01-05 苏州铨笠电镀挂具有限公司 Cation generating device
CN101962796A (en) * 2010-08-17 2011-02-02 苏州铨笠电镀挂具有限公司 Method for sustainably complementing metallic cations in plating solution
US9303329B2 (en) 2013-11-11 2016-04-05 Tel Nexx, Inc. Electrochemical deposition apparatus with remote catholyte fluid management
CN112714803A (en) * 2018-08-27 2021-04-27 叶涛 Plating solution production and regeneration process and device for insoluble anode acid copper electroplating

Also Published As

Publication number Publication date
BE751590A (en) 1970-11-16
ZA703750B (en) 1971-01-27
DE2027793A1 (en) 1970-12-10
FR2049165B1 (en) 1975-01-10
JPS4825617B1 (en) 1973-07-30
FR2049165A1 (en) 1971-03-26

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Legal Events

Date Code Title Description
PS Patent sealed
PLNP Patent lapsed through nonpayment of renewal fees