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FR2933501B1 - Pastille optique a indice de refraction variable, correctrice de distorsion negative, et procede de fabrication d'une telle pastille - Google Patents

Pastille optique a indice de refraction variable, correctrice de distorsion negative, et procede de fabrication d'une telle pastille

Info

Publication number
FR2933501B1
FR2933501B1 FR0854470A FR0854470A FR2933501B1 FR 2933501 B1 FR2933501 B1 FR 2933501B1 FR 0854470 A FR0854470 A FR 0854470A FR 0854470 A FR0854470 A FR 0854470A FR 2933501 B1 FR2933501 B1 FR 2933501B1
Authority
FR
France
Prior art keywords
pastille
optical
manufacturing
refractive index
distortion correction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR0854470A
Other languages
English (en)
Other versions
FR2933501A1 (fr
Inventor
Blanc Emmanuelle Vigier
Guillaume Cassar
Thierry Lepine
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
STMicroelectronics Grenoble 2 SAS
Universite Jean Monnet Saint Etienne
Original Assignee
STMicroelectronics Grenoble 2 SAS
Universite Jean Monnet Saint Etienne
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by STMicroelectronics Grenoble 2 SAS, Universite Jean Monnet Saint Etienne filed Critical STMicroelectronics Grenoble 2 SAS
Priority to FR0854470A priority Critical patent/FR2933501B1/fr
Priority to US12/496,276 priority patent/US8253092B2/en
Publication of FR2933501A1 publication Critical patent/FR2933501A1/fr
Application granted granted Critical
Publication of FR2933501B1 publication Critical patent/FR2933501B1/fr
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02—Details
    • H01L31/0232—Optical elements or arrangements associated with the device
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0087—Simple or compound lenses with index gradient
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/005—Diaphragms
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02—Details
    • H01L31/0232—Optical elements or arrangements associated with the device
    • H01L31/02325—Optical elements or arrangements associated with the device the optical elements not being integrated nor being directly associated with the device
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144—Devices controlled by radiation
    • H01L27/146—Imager structures
    • H01L27/14601—Structural or functional details thereof
    • H01L27/14625—Optical elements or arrangements associated with the device

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Optical Integrated Circuits (AREA)
FR0854470A 2008-07-02 2008-07-02 Pastille optique a indice de refraction variable, correctrice de distorsion negative, et procede de fabrication d'une telle pastille Expired - Fee Related FR2933501B1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
FR0854470A FR2933501B1 (fr) 2008-07-02 2008-07-02 Pastille optique a indice de refraction variable, correctrice de distorsion negative, et procede de fabrication d'une telle pastille
US12/496,276 US8253092B2 (en) 2008-07-02 2009-07-01 Optical die with variable refractive index, corrective of negative distortion, and method of fabricating such a die

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0854470A FR2933501B1 (fr) 2008-07-02 2008-07-02 Pastille optique a indice de refraction variable, correctrice de distorsion negative, et procede de fabrication d'une telle pastille

Publications (2)

Publication Number Publication Date
FR2933501A1 FR2933501A1 (fr) 2010-01-08
FR2933501B1 true FR2933501B1 (fr) 2010-09-10

Family

ID=40227889

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0854470A Expired - Fee Related FR2933501B1 (fr) 2008-07-02 2008-07-02 Pastille optique a indice de refraction variable, correctrice de distorsion negative, et procede de fabrication d'une telle pastille

Country Status (2)

Country Link
US (1) US8253092B2 (fr)
FR (1) FR2933501B1 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011091358A1 (fr) * 2010-01-22 2011-07-28 The Trustees Of Columbia University In The City Of New York Systèmes, procédés et supports permettant d'enregistrer une image au moyen d'un diffuseur optique

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4639094A (en) * 1982-10-04 1987-01-27 Nippon Kogaku K. K. Gradient index lens system
US4805997A (en) * 1985-05-31 1989-02-21 Hoya Corporation Gradient refractive index type anamorphic planar microlens and method of producing the same
US5136428A (en) * 1991-06-03 1992-08-04 At&T Bell Laboratories Flat-plate optical device having a gradient index of refraction for correcting spatial distortions
US5870638A (en) * 1996-09-03 1999-02-09 Asahi Kogaku Kogyo Kabushiki Kaisha Camera having two operative modes
KR100359768B1 (ko) * 1999-03-18 2002-11-07 주식회사 하이닉스반도체 고체 촬상 소자 및 그 제조방법
EP1424570A1 (fr) * 2002-11-28 2004-06-02 Avanex Corporation Dispositif à focalisation
CN1862289A (zh) * 2005-05-13 2006-11-15 鸿富锦精密工业（深圳）有限公司 梯度折射率透镜及其制备方法
JP4492533B2 (ja) * 2005-12-27 2010-06-30 船井電機株式会社 複眼撮像装置
EP1944808A1 (fr) * 2007-01-15 2008-07-16 Stmicroelectronics Sa Module optique imageur destiné à être associé à un composant semi-conducteur optique et procédé pour sa fabrication.
US8411375B2 (en) * 2008-01-25 2013-04-02 Aptina Imaging Corporation Method and apparatus providing gradient index of refraction lens for image sensors
FR2933500B1 (fr) * 2008-07-02 2010-09-10 St Microelectronics Grenoble Pastille optique a indice de refraction variable, adaptatrice d'angle d'incidence, et procede de fabrication d'une telle pastille

Also Published As

Publication number Publication date
FR2933501A1 (fr) 2010-01-08
US20100001176A1 (en) 2010-01-07
US8253092B2 (en) 2012-08-28

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Legal Events

Date Code Title Description
ST Notification of lapse

Effective date: 20140331