FR2864795B1 - Procede de traitement des gaz par des decharges hautes frequence - Google Patents
Procede de traitement des gaz par des decharges hautes frequenceInfo
- Publication number
- FR2864795B1 FR2864795B1 FR0450016A FR0450016A FR2864795B1 FR 2864795 B1 FR2864795 B1 FR 2864795B1 FR 0450016 A FR0450016 A FR 0450016A FR 0450016 A FR0450016 A FR 0450016A FR 2864795 B1 FR2864795 B1 FR 2864795B1
- Authority
- FR
- France
- Prior art keywords
- high frequency
- treating gases
- frequency discharges
- discharges
- gases
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/32—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2257/00—Components to be removed
- B01D2257/20—Halogens or halogen compounds
- B01D2257/206—Organic halogen compounds
- B01D2257/2066—Fluorine
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2258/00—Sources of waste gases
- B01D2258/02—Other waste gases
- B01D2258/0216—Other waste gases from CVD treatment or semi-conductor manufacturing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2259/00—Type of treatment
- B01D2259/80—Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
- B01D2259/818—Employing electrical discharges or the generation of a plasma
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
- Y02C20/00—Capture or disposal of greenhouse gases
- Y02C20/30—Capture or disposal of greenhouse gases of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Analytical Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Treating Waste Gases (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Chemical Vapour Deposition (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0450016A FR2864795B1 (fr) | 2004-01-06 | 2004-01-06 | Procede de traitement des gaz par des decharges hautes frequence |
JP2006548334A JP2007517650A (ja) | 2004-01-06 | 2004-12-23 | 高周波放電によるガス処理方法 |
EP04816598A EP1703961A1 (fr) | 2004-01-06 | 2004-12-23 | Procede de traitement des gaz par des decharges haute frequence |
SG200804063-6A SG143278A1 (en) | 2004-01-06 | 2004-12-23 | Method for the treatment of gases using high-frequency discharges |
US10/585,170 US20070284242A1 (en) | 2004-01-06 | 2004-12-23 | Method For Treating Gases By High Frequency Discharges |
KR1020067013582A KR20060128905A (ko) | 2004-01-06 | 2004-12-23 | 고주파 방전을 사용한 가스 처리 방법 |
PCT/FR2004/050751 WO2005075058A1 (fr) | 2004-01-06 | 2004-12-23 | Procede de traitement des gaz par des decharges haute frequence |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0450016A FR2864795B1 (fr) | 2004-01-06 | 2004-01-06 | Procede de traitement des gaz par des decharges hautes frequence |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2864795A1 FR2864795A1 (fr) | 2005-07-08 |
FR2864795B1 true FR2864795B1 (fr) | 2008-04-18 |
Family
ID=34673923
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR0450016A Expired - Fee Related FR2864795B1 (fr) | 2004-01-06 | 2004-01-06 | Procede de traitement des gaz par des decharges hautes frequence |
Country Status (7)
Country | Link |
---|---|
US (1) | US20070284242A1 (fr) |
EP (1) | EP1703961A1 (fr) |
JP (1) | JP2007517650A (fr) |
KR (1) | KR20060128905A (fr) |
FR (1) | FR2864795B1 (fr) |
SG (1) | SG143278A1 (fr) |
WO (1) | WO2005075058A1 (fr) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2888519B1 (fr) * | 2005-07-12 | 2007-10-19 | Air Liquide | Procede de traitement, par plasma, d'effluents gazeux |
KR20080032089A (ko) * | 2005-07-12 | 2008-04-14 | 레르 리키드 쏘시에떼 아노님 뿌르 레드 에렉스뿔라따시옹 데 프로세데 조르즈 클로드 | 기체 폐기물의 플라즈마 처리 방법 |
EP2007919A2 (fr) * | 2006-04-14 | 2008-12-31 | Silica Tech, LLC | Appareil de dépôt par plasma et procédé de fabrication de cellules solaires |
US20090005821A1 (en) * | 2007-06-29 | 2009-01-01 | Spineworks Medical, Inc. | Methods and devices for stabilizing bone compatible for use with bone screws |
WO2012028187A1 (fr) * | 2010-09-02 | 2012-03-08 | Jean-Michel Beaudouin | Dispositif et procédé de traitement d'un milieu gazeux et utilisation du dispositif pour le traitement d'un milieu gazeux, d'un liquide, d'un solide, d'une surface ou d'une de leurs associations |
GB2497273B (en) * | 2011-11-19 | 2017-09-13 | Edwards Ltd | Apparatus for treating a gas stream |
US9279722B2 (en) | 2012-04-30 | 2016-03-08 | Agilent Technologies, Inc. | Optical emission system including dichroic beam combiner |
CN103237405B (zh) * | 2013-05-14 | 2015-05-06 | 哈尔滨工业大学 | 一体化等离子体发生装置 |
CN103237402B (zh) * | 2013-05-14 | 2015-10-21 | 哈尔滨工业大学 | 大气等离子体加工装置 |
KR101418358B1 (ko) * | 2013-05-15 | 2014-07-09 | 주식회사 케이피씨 | 스크러버의 하이브리드 연소챔버 |
KR101448449B1 (ko) * | 2014-01-13 | 2014-10-13 | 주식회사 테라텍 | 고밀도 구속 플라즈마 소스를 이용한 과불화탄소 및 유해 가스 분해 장치 |
CN103953474B (zh) * | 2014-04-22 | 2016-11-23 | 中国科学院西安光学精密机械研究所 | 定向自旋等离子体助燃系统 |
US10187966B2 (en) * | 2015-07-24 | 2019-01-22 | Applied Materials, Inc. | Method and apparatus for gas abatement |
MY194952A (en) * | 2015-07-29 | 2022-12-28 | Semb Eco R&D Pte Ltd | Method and system for applying superimposed time-varying frequency electromagnetic wave to target object or target region |
CN110519904B (zh) * | 2019-08-16 | 2020-09-29 | 中国地质大学(武汉) | 一种基于集磁器的icp等离子源形成装置及方法 |
CN114682064B (zh) * | 2022-04-08 | 2023-02-17 | 武汉大学 | 一种sf6废气的射频放电降解方法 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4883570A (en) * | 1987-06-08 | 1989-11-28 | Research-Cottrell, Inc. | Apparatus and method for enhanced chemical processing in high pressure and atmospheric plasmas produced by high frequency electromagnetic waves |
JPH01297141A (ja) * | 1988-05-25 | 1989-11-30 | Canon Inc | マイクロ波プラズマ処理装置 |
US5187344A (en) * | 1988-11-10 | 1993-02-16 | Agency Of Industrial Science And Technology | Apparatus for decomposing halogenated organic compound |
US5256854A (en) * | 1990-12-18 | 1993-10-26 | Massachusetts Institute Of Technology | Tunable plasma method and apparatus using radio frequency heating and electron beam irradiation |
JP3877082B2 (ja) * | 1995-08-10 | 2007-02-07 | 東京エレクトロン株式会社 | 研磨装置及び研磨方法 |
EP0792091B1 (fr) * | 1995-12-27 | 2002-03-13 | Nippon Telegraph And Telephone Corporation | Procédé d'analyse élémentaire |
FR2751565B1 (fr) * | 1996-07-26 | 1998-09-04 | Air Liquide | Procede et installation de traitement de gaz perfluores et hydrofluorocarbones en vue de leur destruction |
US6277347B1 (en) * | 1997-02-24 | 2001-08-21 | Applied Materials, Inc. | Use of ozone in process effluent abatement |
FR2764163B1 (fr) * | 1997-05-30 | 1999-08-13 | Centre Nat Rech Scient | Torche a plasma inductif a injecteur de reactif |
SE516336C2 (sv) * | 1999-04-28 | 2001-12-17 | Hana Barankova | Apparat för plasmabehandling av ytor |
US6303007B1 (en) * | 1999-11-15 | 2001-10-16 | Archimedes Technology Group, Inc. | Plasma injector |
JP5000061B2 (ja) * | 2000-02-24 | 2012-08-15 | シーシーアール ゲゼルシャフト ミト ベシュレンクテル ハフツング ベーシッヒツングステクノロジー | 高周波プラズマ源 |
US6620394B2 (en) * | 2001-06-15 | 2003-09-16 | Han Sup Uhm | Emission control for perfluorocompound gases by microwave plasma torch |
DE10159152A1 (de) * | 2001-12-01 | 2003-06-12 | Mtu Aero Engines Gmbh | Verfahren zur Gasreinigung |
-
2004
- 2004-01-06 FR FR0450016A patent/FR2864795B1/fr not_active Expired - Fee Related
- 2004-12-23 WO PCT/FR2004/050751 patent/WO2005075058A1/fr active Application Filing
- 2004-12-23 US US10/585,170 patent/US20070284242A1/en not_active Abandoned
- 2004-12-23 JP JP2006548334A patent/JP2007517650A/ja active Pending
- 2004-12-23 KR KR1020067013582A patent/KR20060128905A/ko not_active Application Discontinuation
- 2004-12-23 SG SG200804063-6A patent/SG143278A1/en unknown
- 2004-12-23 EP EP04816598A patent/EP1703961A1/fr not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
KR20060128905A (ko) | 2006-12-14 |
WO2005075058A1 (fr) | 2005-08-18 |
JP2007517650A (ja) | 2007-07-05 |
SG143278A1 (en) | 2008-06-27 |
US20070284242A1 (en) | 2007-12-13 |
EP1703961A1 (fr) | 2006-09-27 |
FR2864795A1 (fr) | 2005-07-08 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |
Effective date: 20140930 |