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FR2627773B1 - Particules fines de polyorganosilsesquioxane et procede de production de ces particules - Google Patents

Particules fines de polyorganosilsesquioxane et procede de production de ces particules

Info

Publication number
FR2627773B1
FR2627773B1 FR8902442A FR8902442A FR2627773B1 FR 2627773 B1 FR2627773 B1 FR 2627773B1 FR 8902442 A FR8902442 A FR 8902442A FR 8902442 A FR8902442 A FR 8902442A FR 2627773 B1 FR2627773 B1 FR 2627773B1
Authority
FR
France
Prior art keywords
producing
same
polyorganosilsesquioxane particles
fine
fine polyorganosilsesquioxane
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR8902442A
Other languages
English (en)
Other versions
FR2627773A1 (fr
Inventor
Kimura Et Kenji Saito Hiroshi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Momentive Performance Materials Japan LLC
Original Assignee
Toshiba Silicone Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Silicone Co Ltd filed Critical Toshiba Silicone Co Ltd
Publication of FR2627773A1 publication Critical patent/FR2627773A1/fr
Application granted granted Critical
Publication of FR2627773B1 publication Critical patent/FR2627773B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/42—Block-or graft-polymers containing polysiloxane sequences
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J3/00—Processes of treating or compounding macromolecular substances
    • C08J3/12—Powdering or granulating
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/06—Preparatory processes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2383/00—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen, or carbon only; Derivatives of such polymers
    • C08J2383/04—Polysiloxanes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Silicon Polymers (AREA)
  • Processes Of Treating Macromolecular Substances (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
FR8902442A 1988-02-26 1989-02-24 Particules fines de polyorganosilsesquioxane et procede de production de ces particules Expired - Fee Related FR2627773B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63042303A JPH0618879B2 (ja) 1988-02-26 1988-02-26 ポリオルガノシルセスキオキサン微粒子

Publications (2)

Publication Number Publication Date
FR2627773A1 FR2627773A1 (fr) 1989-09-01
FR2627773B1 true FR2627773B1 (fr) 1994-02-25

Family

ID=12632257

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8902442A Expired - Fee Related FR2627773B1 (fr) 1988-02-26 1989-02-24 Particules fines de polyorganosilsesquioxane et procede de production de ces particules

Country Status (6)

Country Link
JP (1) JPH0618879B2 (fr)
KR (1) KR930006260B1 (fr)
DE (1) DE3905785C2 (fr)
FR (1) FR2627773B1 (fr)
GB (1) GB2216535B (fr)
IT (1) IT1230485B (fr)

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IT1237430B (it) * 1988-12-02 1993-06-04 Particelle fini di poliorganosilossano e procedimento per produrle.
JPH0633337B2 (ja) * 1989-04-18 1994-05-02 信越化学工業株式会社 球状ポリオルガノシルセスキオキサン微粒子及びその製造方法
JPH0699634B2 (ja) * 1989-09-28 1994-12-07 信越化学工業株式会社 熱硬化型シリコーンゴム組成物
JPH0633334B2 (ja) * 1990-02-22 1994-05-02 信越化学工業株式会社 シリコーン粉末の製造方法
JPH0488023A (ja) * 1990-07-30 1992-03-19 Toray Ind Inc 球状シリコーン微粒子の製造法
US5182174A (en) * 1991-05-13 1993-01-26 E. I. Du Pont De Nemours And Company Flexible etch-resistant finishes with siloxane cross-linking
US5488081A (en) * 1993-11-04 1996-01-30 Lord Corporation Highly damped organic elastomer composition
JP3970449B2 (ja) * 1998-12-21 2007-09-05 モメンティブ・パフォーマンス・マテリアルズ・ジャパン合同会社 球状ポリメチルシルセスキオキサン微粒子の製造方法
JP2003002973A (ja) * 2001-04-18 2003-01-08 Ge Toshiba Silicones Co Ltd 球状シリコーン微粒子の製造方法
JP2003183395A (ja) * 2001-12-21 2003-07-03 Ge Toshiba Silicones Co Ltd 球状シリコーン微粒子の製造方法
JP4040362B2 (ja) * 2002-05-20 2008-01-30 モメンティブ・パフォーマンス・マテリアルズ・ジャパン合同会社 球状ポリメチルフェニルシルセスキオキサン微粒子の製造方法
JP4138409B2 (ja) * 2002-09-04 2008-08-27 日東電工株式会社 ポリシルセスキオキサン微粒子の製造方法および該製造方法により得られたポリシルセスキオキサン微粒子
JP5061334B2 (ja) * 2004-12-27 2012-10-31 小西化学工業株式会社 ポリシルセスキオキサン微粒子有機溶媒分散液及びその製造方法、並びにポリシルセスキオキサン微粒子水分散液及びその製造方法
JP4890766B2 (ja) * 2005-01-28 2012-03-07 帝人化成株式会社 光拡散性芳香族ポリカーボネート樹脂組成物
KR100756676B1 (ko) 2006-11-23 2007-09-07 제일모직주식회사 실리콘계 미립자, 그 제조 방법, 및 그 미립자가 함유된열가소성 수지 조성물
JP5153163B2 (ja) * 2007-02-23 2013-02-27 日興リカ株式会社 球状ポリオルガノシルセスキオキサン微粒子の製造方法
KR101077274B1 (ko) 2007-05-28 2011-10-27 코오롱인더스트리 주식회사 폴리알킬실세스퀴옥산 미립자 및 그 제조방법
US8927636B2 (en) 2009-09-14 2015-01-06 Mitsubishi Engineering-Plastics Corporation Polycarbonate resin composition and molded article
US8927633B2 (en) 2011-09-02 2015-01-06 Mitsubishi Gas Chemical Company, Inc. Aromatic polycarbonate resin composition, and molded article comprising same
WO2014084180A1 (fr) 2012-11-28 2014-06-05 三菱瓦斯化学株式会社 Composition de résine de polycarbonate aromatique, procédé de production associé et article moulé formé à partir de la composition de résine de polycarbonate aromatique
EP3095805B1 (fr) * 2014-01-14 2018-10-24 Tokuyama Corporation Microparticules sphériques hydrophobisées de poly(alkylsilsesquioxane), additif externe pour toner, toner pour électrophotographie à sec et procédé de fabrication de microparticules sphériques hydrophobisées de poly(alkylsilsesquioxane)
JP6485244B2 (ja) * 2015-06-18 2019-03-20 Jnc株式会社 球状のシリコンオキシカーバイド粉粒体とその製造方法
EP3583154B1 (fr) * 2017-02-14 2020-06-24 Wacker Chemie AG Procédé pour la fabrication de particules de polysilsesquioxane sphériques
JP7284167B2 (ja) * 2018-07-03 2023-05-30 株式会社トクヤマ 球状ポリメチルシルセスキオキサン粒子
JP2021193167A (ja) * 2020-06-08 2021-12-23 株式会社日本触媒 ポリシロキサン粒子分散液及びその製造方法
EP4204492B1 (fr) 2020-08-31 2024-06-26 Covestro Deutschland AG Composition de polycarbonate résistant à l'hydrolyse
CN117730122A (zh) 2021-07-27 2024-03-19 科思创德国股份有限公司 耐水解聚碳酸酯组合物
EP4230697A1 (fr) 2022-02-16 2023-08-23 Covestro Deutschland AG Composition de polycarbonate résistant à l'hydrolyse
KR20240144208A (ko) 2022-02-16 2024-10-02 코베스트로 도이칠란트 아게 난연성 폴리카르보네이트 조성물

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BE572412A (fr) *
BE572727A (fr) *
DE883180C (de) * 1950-10-31 1953-07-16 Union Chimique Belge Sa Verfahren zur Herstellung von Lacken aus Organo-Polysiloxanen
DE950462C (de) * 1951-10-31 1956-10-11 Dow Corning Verfahren zur Herstellung von Kieselsaeure oder Siloxanen in Pulverform
DE1183687B (de) * 1957-10-31 1964-12-17 Bayer Ag Verfahren zur Herstellung gleichmaessig feinteiliger fester Hydrolyseprodukte aus fluessigen Silanderivaten
DE1173659B (de) * 1957-10-31 1964-07-09 Bayer Ag Verfahren zur Herstellung gleichmaessig feinteiliger fester Hydrolyseprodukte aus fluessigen Silanderivaten
DE1236205B (de) * 1959-01-21 1967-03-09 Gen Electric Verfahren zur Herstellung von Dodekaphenylsilsesquioxan
US3354095A (en) * 1964-07-23 1967-11-21 Owens Illinois Inc Solid, substantially spherical, hard particles and preparation thereof
JPS5212219B1 (fr) * 1965-01-21 1977-04-05
CH106968D (fr) * 1965-01-21 1900-01-01
US3496126A (en) * 1967-10-10 1970-02-17 Owens Illinois Inc Process for preparing organopolysiloxane beads
DE2357184A1 (de) * 1973-11-16 1975-05-22 Merck Patent Gmbh Verfahren zur herstellung von organisch modifizierten siliciumdioxiden
JPS5212219A (en) * 1975-07-18 1977-01-29 Sony Corp Method of fusing ferrite by glass
JPS5472300A (en) * 1977-11-21 1979-06-09 Shin Etsu Chem Co Ltd Preparation of polymethylsilsesquioxane
US4242250A (en) * 1979-06-25 1980-12-30 Owens-Illinois, Inc. Organopolysiloxane resins formed with catalysts of formic acid and hydrocarbyl substituted ammonium hydroxide
JPS578279A (en) * 1980-06-17 1982-01-16 Konishiroku Photo Ind Co Ltd Abrasive material
US4483107A (en) * 1980-06-17 1984-11-20 Konishiroku Photo Industry Co., Ltd. Polishing method for electrophotographic photoconductive member
FR2523590B1 (fr) * 1982-03-16 1984-06-29 Inst Nat Rech Chimique Composition liquide de base convenant pour la realisation de revetements transparents ou vernis sur des surfaces solides, procede d'obtention de ces vernis et vernis en resultant
US4424297A (en) * 1982-07-08 1984-01-03 Dow Corning Corporation Colloidal silesquioxanes
JPS6013813A (ja) * 1983-07-05 1985-01-24 Toshiba Silicone Co Ltd ポリメチルシルセスキオキサンの製造方法
JPS61243828A (ja) * 1985-04-23 1986-10-30 Nippon Soda Co Ltd 有機基を有する有機酸化硅素粉体及びその製造法
DE3518879A1 (de) * 1985-05-25 1986-11-27 Degussa Ag, 6000 Frankfurt Phenylengruppen-haltige organopolysiloxane und verfahren zu ihrer herstellung
JPS6243424A (ja) * 1985-08-20 1987-02-25 Shin Etsu Chem Co Ltd シルセスキオキサン乳濁液の製造方法
JPS6377940A (ja) * 1986-09-19 1988-04-08 Toshiba Silicone Co Ltd 真球状ポリメチルシルセスキオキサン粉末およびその製造方法
JPS63295637A (ja) * 1987-05-28 1988-12-02 Toshiba Silicone Co Ltd 球状ポリメチルシルセスキオキサン粉末及びその製造方法
JP3026977B2 (ja) * 1988-10-03 2000-03-27 ノーリツ鋼機株式会社 感光体シートの搬送装置
US5063529A (en) * 1989-12-29 1991-11-05 Texas Instruments Incorporated Method for calibrating a phased array antenna

Also Published As

Publication number Publication date
JPH0618879B2 (ja) 1994-03-16
IT8947687A0 (it) 1989-02-24
DE3905785C2 (de) 1994-06-09
GB2216535B (en) 1992-08-05
KR930006260B1 (ko) 1993-07-09
GB8904201D0 (en) 1989-04-05
IT1230485B (it) 1991-10-24
KR890013091A (ko) 1989-09-21
JPH01217039A (ja) 1989-08-30
GB2216535A (en) 1989-10-11
FR2627773A1 (fr) 1989-09-01
DE3905785A1 (de) 1989-08-31

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Legal Events

Date Code Title Description
ST Notification of lapse