FR2598149B1 - Compositions de polymeres sequences. - Google Patents

Compositions de polymeres sequences.

Info

Publication number: FR2598149B1
Authority: FR; France
Prior art keywords: polymer compositions; sequence polymer; sequence; compositions; polymer
Prior art date: 1986-04-30
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Fee Related

Application number

FR8705799A

Other languages

English (en)

Other versions

FR2598149A1 (fr

Inventor

James Vincent Crivello

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

General Electric Co

Original Assignee

General Electric Co

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1986-04-30

Filing date

1987-04-24

Publication date

1990-09-21

1987-04-24 Application filed by General Electric Co filed Critical General Electric Co

1987-11-06 Publication of FR2598149A1 publication Critical patent/FR2598149A1/fr

1990-09-21 Application granted granted Critical

1990-09-21 Publication of FR2598149B1 publication Critical patent/FR2598149B1/fr

2007-04-24 Anticipated expiration legal-status Critical

Status Expired - Fee Related legal-status Critical Current

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G85/00—General processes for preparing compounds provided for in this subclass
- C08G85/004—Modification of polymers by chemical after-treatment
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
- C08K5/0025—Crosslinking or vulcanising agents; including accelerators
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/10—Block- or graft-copolymers containing polysiloxane sequences
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/122—Sulfur compound containing
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/126—Halogen compound containing

Landscapes

Chemical & Material Sciences (AREA)
Health & Medical Sciences (AREA)
Chemical Kinetics & Catalysis (AREA)
Medicinal Chemistry (AREA)
Polymers & Plastics (AREA)
Organic Chemistry (AREA)
Physics & Mathematics (AREA)
Spectroscopy & Molecular Physics (AREA)
General Physics & Mathematics (AREA)
General Chemical & Material Sciences (AREA)
Silicon Polymers (AREA)
Compositions Of Macromolecular Compounds (AREA)
Graft Or Block Polymers (AREA)

FR8705799A 1986-04-30 1987-04-24 Compositions de polymeres sequences. Expired - Fee Related FR2598149B1 (fr)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
US06/857,662 US4689289A (en)	1986-04-30	1986-04-30	Block polymer compositions

Publications (2)

Publication Number	Publication Date
FR2598149A1 FR2598149A1 (fr)	1987-11-06
FR2598149B1 true FR2598149B1 (fr)	1990-09-21

Family

ID=25326470

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
FR8705799A Expired - Fee Related FR2598149B1 (fr)	1986-04-30	1987-04-24	Compositions de polymeres sequences.

Country Status (11)

Country	Link
US (1)	US4689289A (fr)
JP (1)	JPS62277417A (fr)
KR (1)	KR950011919B1 (fr)
BE (1)	BE1001638A4 (fr)
CA (1)	CA1280231C (fr)
DE (1)	DE3710320A1 (fr)
FR (1)	FR2598149B1 (fr)
GB (1)	GB2190086B (fr)
IT (1)	IT1208032B (fr)
NL (1)	NL8700989A (fr)
SE (1)	SE463156B (fr)

Families Citing this family (41)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS62266537A (ja) *	1986-05-14	1987-11-19	Fuji Photo Film Co Ltd	マイクロカプセル及びそれを使用した感光性記録材料
US4931379A (en) *	1986-10-23	1990-06-05	International Business Machines Corporation	High sensitivity resists having autodecomposition temperatures greater than about 160° C.
US5736424A (en) *	1987-02-27	1998-04-07	Lucent Technologies Inc.	Device fabrication involving planarization
DE3721740A1 (de) *	1987-07-01	1989-01-12	Basf Ag	Sulfoniumsalze mit saeurelabilen gruppierungen
EP0307353A3 (fr) *	1987-09-07	1990-09-12	Ciba-Geigy Ag	Polymères contenant des composés organométalliques et leur usage
JP2597163B2 (ja) *	1988-09-22	1997-04-02	富士写真フイルム株式会社	感光性組成物
DE3902115A1 (de) *	1989-01-25	1990-08-02	Basf Ag	Strahlungsempfindliche polymere
EP0410606B1 (fr) *	1989-07-12	1996-11-13	Fuji Photo Film Co., Ltd.	Polysiloxanes et compositions photoréserves positives
US5057619A (en) *	1989-08-14	1991-10-15	Minnesota Mining And Manufacturing Co.	Siloxane iniferter compounds, block copolymers made therewith and a method of making the block copolymers
US5089336A (en) *	1989-08-14	1992-02-18	Minnesota Mining And Manufacturing Company	General purpose siloxane release coatings
US5032460A (en) *	1989-08-14	1991-07-16	Minnesota Mining And Manufacturing Company	Method of making vinyl-silicone copolymers using mercapto functional silicone chain-transfer agents and release coatings made therewith
US5202190A (en) *	1989-08-14	1993-04-13	Minnesota Mining And Manufacturing Company	Method of making vinyl-silicone copolymers using mercapto functional silicone chain-transfer agents and release coatings made therewith
US5200436A (en) *	1989-08-14	1993-04-06	Minnesota Mining And Manufacture Company	Siloxane iniferter compounds, block copolymers made therewith and a method of making the block copolymers
US5110711A (en) *	1989-10-10	1992-05-05	International Business Machines Corporation	Method for forming a pattern
US5059512A (en) *	1989-10-10	1991-10-22	International Business Machines Corporation	Ultraviolet light sensitive photoinitiator compositions, use thereof and radiation sensitive compositions
US5098816A (en) *	1989-10-10	1992-03-24	International Business Machines Corporation	Method for forming a pattern of a photoresist
US5252430A (en) *	1989-10-25	1993-10-12	Matsushita Electric Industrial Co., Ltd.	Fine pattern forming method
US5093385A (en) *	1989-12-21	1992-03-03	Minnesota Mining And Manufacturing Company	Method of accelerating photoiniferter polymerization, polymer produced thereby, and product produced therewith
US5069993A (en) *	1989-12-29	1991-12-03	Xerox Corporation	Photoreceptor layers containing polydimethylsiloxane copolymers
JP2607162B2 (ja) *	1990-02-02	1997-05-07	富士写真フイルム株式会社	感光性組成物
US5476753A (en) *	1991-07-22	1995-12-19	Matsushita Electric Industrial Co., Ltd.	Fine pattern forming method
DE4228790C1 (de)	1992-08-29	1993-11-25	Du Pont Deutschland	Tonbares strahlungsempfindliches Gemisch und Verfahren zur Herstellung von Mehrfarbenbildern mittels solch eines Gemischs
DE69515140T2 (de)	1994-05-18	2000-08-31	At & T Corp., New York	Planarisierung in der Herstellung von Anordnungen
US5731364A (en) *	1996-01-24	1998-03-24	Shipley Company, L.L.C.	Photoimageable compositions comprising multiple arylsulfonium photoactive compounds
WO1997033206A1 (fr) *	1996-03-07	1997-09-12	Clariant International, Ltd.	Processus de traitement thermique de composition de photoresine positive
US6093410A (en) *	1997-11-05	2000-07-25	The Procter & Gamble Company	Personal care compositions
US5997886A (en) *	1997-11-05	1999-12-07	The Procter & Gamble Company	Personal care compositions
US5968495A (en) *	1997-11-05	1999-10-19	The Procter & Gamble Company	Personal care compositions
US5985295A (en) *	1997-11-05	1999-11-16	The Procter & Gamble Company	Personal care compositions
US5985294A (en) *	1997-11-05	1999-11-16	The Procter & Gamble Company	Personal care compositions
US5965115A (en) *	1997-11-05	1999-10-12	The Procter & Gamble Company	Personal care compositions
US5981143A (en) *	1997-11-26	1999-11-09	Trw Inc.	Chemically treated photoresist for withstanding ion bombarded processing
US6149898A (en) *	1998-06-22	2000-11-21	The Procter & Gamble Company	Hair styling compositions containing silicone microemulsions and cationic non-polymeric liquids
KR100571453B1 (ko) *	1999-12-15	2006-04-17	신에쓰 가가꾸 고교 가부시끼가이샤	고분자 화합물, 화학 증폭 레지스트 재료 및 패턴 형성 방법
FR2809829B1 (fr) *	2000-06-05	2002-07-26	Rhodia Chimie Sa	Nouvelle composition photosensible pour la fabrication de photoresist
JP3962893B2 (ja)	2001-02-09	2007-08-22	信越化学工業株式会社	高分子化合物、レジスト材料及びパターン形成方法
US7459106B2 (en)	2001-03-30	2008-12-02	The Arizona Board Of Regents On Behalf Of The University Of Arizona	Materials, methods, and uses for photochemical generation of acids and/or radical species
TW589514B (en) *	2001-09-13	2004-06-01	Matsushita Electric Ind Co Ltd	Pattern formation material and pattern formation method
KR20060019140A (ko)	2004-08-26	2006-03-03	삼성전자주식회사	바코드 스캐너를 구비하는 전자레인지
US7585922B2 (en)	2005-02-15	2009-09-08	L'oreal, S.A.	Polymer particle dispersion, cosmetic compositions comprising it and cosmetic process using it
US8277788B2 (en)	2005-08-03	2012-10-02	Conopco, Inc.	Quick dispersing hair conditioning composition

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
GB1539192A (en) *	1975-01-27	1979-01-31	Ici Ltd	Photopolymerisable compositions
US4307177A (en) *	1975-12-09	1981-12-22	General Electric Company	Method of using polymerizable compositions containing onium salts
US4279717A (en) *	1979-08-03	1981-07-21	General Electric Company	Ultraviolet curable epoxy silicone coating compositions
ZA807425B (en) *	1979-12-26	1982-02-24	Gen Electric	Radiation curable organopolysiloxanes
JPS59500522A (ja) *	1982-04-01	1984-03-29	ゼネラル・エレクトリック・カンパニイ	ビニルオキシ官能性オルガノポリシロキサン組成物
US4491628A (en) *	1982-08-23	1985-01-01	International Business Machines Corporation	Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
US4584356A (en) *	1984-11-02	1986-04-22	General Electric Company	Method for making silicone-organic block polymers
US4677169A (en) *	1984-11-02	1987-06-30	General Electric Company	Silicone-organic block polymers and method for making

1986
- 1986-04-30 US US06/857,662 patent/US4689289A/en not_active Expired - Lifetime
1987
- 1987-03-28 DE DE19873710320 patent/DE3710320A1/de not_active Withdrawn
- 1987-04-15 GB GB8709102A patent/GB2190086B/en not_active Expired - Fee Related
- 1987-04-16 CA CA000534958A patent/CA1280231C/fr not_active Expired - Fee Related
- 1987-04-21 JP JP62096395A patent/JPS62277417A/ja active Pending
- 1987-04-24 FR FR8705799A patent/FR2598149B1/fr not_active Expired - Fee Related
- 1987-04-27 NL NL8700989A patent/NL8700989A/nl not_active Application Discontinuation
- 1987-04-29 IT IT8720304A patent/IT1208032B/it active
- 1987-04-29 KR KR1019870004141A patent/KR950011919B1/ko active IP Right Grant
- 1987-04-29 SE SE8701786A patent/SE463156B/sv not_active IP Right Cessation
- 1987-04-30 BE BE8700469A patent/BE1001638A4/fr not_active IP Right Cessation

Also Published As

Publication number	Publication date
SE8701786D0 (sv)	1987-04-29
NL8700989A (nl)	1987-11-16
JPS62277417A (ja)	1987-12-02
GB2190086A (en)	1987-11-11
GB8709102D0 (en)	1987-05-20
KR950011919B1 (ko)	1995-10-12
DE3710320A1 (de)	1987-11-05
CA1280231C (fr)	1991-02-12
IT1208032B (it)	1989-06-01
US4689289A (en)	1987-08-25
SE463156B (sv)	1990-10-15
GB2190086B (en)	1990-02-07
KR870010129A (ko)	1987-11-30
IT8720304A0 (it)	1987-04-29
SE8701786L (sv)	1987-10-31
BE1001638A4 (fr)	1990-01-09
FR2598149A1 (fr)	1987-11-06

Publication	Publication Date	Title
FR2598149B1 (fr)	1990-09-21	Compositions de polymeres sequences.
DE68904101D1 (de)	1993-02-11	Polymerzusammensetzungen.
DE3789475D1 (de)	1994-05-05	Organosilikon-Polymere.
DE3783618D1 (de)	1993-03-04	Polymerzusammensetzungen.
MX11578A (es)	1993-06-01	Polimeros modificadores de viscosidad, mejorados
DE3577575D1 (de)	1990-06-13	Polymer zusammensetzungen.
DE3783069D1 (de)	1993-01-28	Kopolymerzusammensetzung.
DE3786236D1 (de)	1993-07-22	Aethylen-copolymerzusammensetzung.
FI910123A0 (fi)	1991-01-09	Polymerkomposition foer att avlaegsna syre.
IT8921066A0 (it)	1989-07-03	Composizioni polimeriche autoestinguenti.
NO891982D0 (no)	1989-05-18	Polymer-sammensetning.
DE3584551D1 (de)	1991-12-05	Polymerzusammensetzungen.
DE3776052D1 (de)	1992-02-27	Leitende kunststoffzusammensetzungen.
DE69113496D1 (de)	1995-11-09	Polymerzusammensetzungen.
DE69030611D1 (de)	1997-06-05	Polymerzusammensetzungen
DE68920021D1 (de)	1995-01-26	Polymerzusammensetzung.
FI870279A0 (fi)	1987-01-22	Polymeriserade kompositioner.
NO883630D0 (no)	1988-08-15	Vannherdende polymertilberedning.
FI884126A (fi)	1989-03-10	Konduktiv polymerkomposition.
DE3650420D1 (de)	1995-11-23	Schlagfeste Polymerzusammensetzungen.
IT1224575B (it)	1990-10-04	Composizioni polimere
DE69020534D1 (de)	1995-08-03	Polysilanzusammensetzung.
DE3788091D1 (de)	1993-12-16	Hochsteife Propylen-Polymerzusammensetzungen.
FI873518A (fi)	1988-02-19	Foerfarande foer polymerisation av -olefin.
DE69013711D1 (de)	1994-12-08	Polymerzusammensetzung.

Legal Events

Date	Code	Title	Description
1996-03-29	ST	Notification of lapse