FR2593326B1 - Procede de fabrication d'un dispositif a cellule solaire - Google Patents
Procede de fabrication d'un dispositif a cellule solaireInfo
- Publication number
- FR2593326B1 FR2593326B1 FR878700045A FR8700045A FR2593326B1 FR 2593326 B1 FR2593326 B1 FR 2593326B1 FR 878700045 A FR878700045 A FR 878700045A FR 8700045 A FR8700045 A FR 8700045A FR 2593326 B1 FR2593326 B1 FR 2593326B1
- Authority
- FR
- France
- Prior art keywords
- manufacturing
- solar cell
- cell device
- solar
- cell
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers
- H01L31/068—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PN homojunction type, e.g. bulk silicon PN homojunction solar cells or thin film polycrystalline silicon PN homojunction solar cells
- H01L31/0693—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PN homojunction type, e.g. bulk silicon PN homojunction solar cells or thin film polycrystalline silicon PN homojunction solar cells the devices including, apart from doping material or other impurities, only AIIIBV compounds, e.g. GaAs or InP solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/184—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof the active layers comprising only AIIIBV compounds, e.g. GaAs, InP
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/544—Solar cells from Group III-V materials
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10S117/915—Separating from substrate
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/135—Removal of substrate
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/977—Thinning or removal of substrate
Landscapes
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Sustainable Development (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- Life Sciences & Earth Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- Sustainable Energy (AREA)
- Manufacturing & Machinery (AREA)
- Photovoltaic Devices (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61012874A JPS62171167A (ja) | 1986-01-23 | 1986-01-23 | 太陽電池の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2593326A1 FR2593326A1 (fr) | 1987-07-24 |
FR2593326B1 true FR2593326B1 (fr) | 1990-06-08 |
Family
ID=11817568
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR878700045A Expired - Fee Related FR2593326B1 (fr) | 1986-01-23 | 1987-01-06 | Procede de fabrication d'un dispositif a cellule solaire |
Country Status (3)
Country | Link |
---|---|
US (1) | US4774194A (fr) |
JP (1) | JPS62171167A (fr) |
FR (1) | FR2593326B1 (fr) |
Families Citing this family (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6415913A (en) * | 1987-07-09 | 1989-01-19 | Mitsubishi Monsanto Chem | Epitaxial growth method of substrate for high-brightness led |
US5300793A (en) * | 1987-12-11 | 1994-04-05 | Hitachi, Ltd. | Hetero crystalline structure and semiconductor device using it |
JPH0770755B2 (ja) * | 1988-01-21 | 1995-07-31 | 三菱化学株式会社 | 高輝度led用エピタキシャル基板及びその製造方法 |
US5032543A (en) * | 1988-06-17 | 1991-07-16 | Massachusetts Institute Of Technology | Coplanar packaging techniques for multichip circuits |
JPH042173A (ja) * | 1990-04-19 | 1992-01-07 | Sanyo Electric Co Ltd | 光起電力装置の製造方法 |
US5258236A (en) * | 1991-05-03 | 1993-11-02 | Ibm Corporation | Multi-layer thin film structure and parallel processing method for fabricating same |
US5827751A (en) * | 1991-12-06 | 1998-10-27 | Picogiga Societe Anonyme | Method of making semiconductor components, in particular on GaAs of InP, with the substrate being recovered chemically |
FR2684801B1 (fr) * | 1991-12-06 | 1997-01-24 | Picogiga Sa | Procede de realisation de composants semiconducteurs, notamment sur gaas ou inp, avec recuperation du substrat par voie chimique. |
FR2690278A1 (fr) * | 1992-04-15 | 1993-10-22 | Picogiga Sa | Composant photovoltaïque multispectral à empilement de cellules, et procédé de réalisation. |
JPH0690014A (ja) * | 1992-07-22 | 1994-03-29 | Mitsubishi Electric Corp | 薄型太陽電池及びその製造方法,エッチング方法及び自動エッチング装置,並びに半導体装置の製造方法 |
US5330918A (en) * | 1992-08-31 | 1994-07-19 | The United States Of America As Represented By The Secretary Of The Navy | Method of forming a high voltage silicon-on-sapphire photocell array |
US6756289B1 (en) | 1996-12-27 | 2004-06-29 | Canon Kabushiki Kaisha | Method of producing semiconductor member and method of producing solar cell |
EP0851513B1 (fr) * | 1996-12-27 | 2007-11-21 | Canon Kabushiki Kaisha | Méthode de fabrication d'un composant semiconducteur et méthode de fabrication d'une cellule solaire |
US6155909A (en) * | 1997-05-12 | 2000-12-05 | Silicon Genesis Corporation | Controlled cleavage system using pressurized fluid |
WO1999001594A1 (fr) * | 1997-07-03 | 1999-01-14 | Cbl Technologies | Compensation du desequilibre thermique pour obtenir des substrats autonomes par depot epitaxique |
US6071795A (en) * | 1998-01-23 | 2000-06-06 | The Regents Of The University Of California | Separation of thin films from transparent substrates by selective optical processing |
JP4738636B2 (ja) | 2001-05-29 | 2011-08-03 | 株式会社テクノ菱和 | 防爆型無発塵イオナイザー |
US7488890B2 (en) * | 2003-04-21 | 2009-02-10 | Sharp Kabushiki Kaisha | Compound solar battery and manufacturing method thereof |
US7202141B2 (en) * | 2004-03-29 | 2007-04-10 | J.P. Sercel Associates, Inc. | Method of separating layers of material |
JP4518886B2 (ja) * | 2004-09-09 | 2010-08-04 | シャープ株式会社 | 半導体素子の製造方法 |
WO2007025062A2 (fr) * | 2005-08-25 | 2007-03-01 | Wakonda Technologies, Inc. | Modele photovoltaique |
US8927392B2 (en) * | 2007-11-02 | 2015-01-06 | Siva Power, Inc. | Methods for forming crystalline thin-film photovoltaic structures |
US8236603B1 (en) | 2008-09-04 | 2012-08-07 | Solexant Corp. | Polycrystalline semiconductor layers and methods for forming the same |
US8415187B2 (en) * | 2009-01-28 | 2013-04-09 | Solexant Corporation | Large-grain crystalline thin-film structures and devices and methods for forming the same |
US20100248413A1 (en) * | 2009-03-31 | 2010-09-30 | David Strand | Monolithic Integration of Photovoltaic Cells |
CN102696115A (zh) | 2010-04-20 | 2012-09-26 | 松下电器产业株式会社 | 将膜接合到基板上的方法 |
EP2618385A1 (fr) | 2012-01-20 | 2013-07-24 | AZUR SPACE Solar Power GmbH | Demi-produit d'une cellule solaire multiple et procédé de fabrication d'une cellule solaire multiple |
US9831363B2 (en) * | 2014-06-19 | 2017-11-28 | John Farah | Laser epitaxial lift-off of high efficiency solar cell |
CN113948598B (zh) * | 2021-10-18 | 2024-04-02 | 北京工业大学 | 一种柔性薄膜太阳能电池及其制备方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5856962B2 (ja) * | 1975-12-18 | 1983-12-17 | セイコーエプソン株式会社 | ハンドウタイソウチノ セイゾウホウホウ |
US4227941A (en) * | 1979-03-21 | 1980-10-14 | Massachusetts Institute Of Technology | Shallow-homojunction solar cells |
EP0191503A3 (fr) * | 1980-04-10 | 1986-09-10 | Massachusetts Institute Of Technology | Méthode de fabrication de feuilles en matériau cristallin |
IL79735A0 (en) * | 1985-09-09 | 1986-11-30 | Hughes Aircraft Co | Thin semiconductor structures |
-
1986
- 1986-01-23 JP JP61012874A patent/JPS62171167A/ja active Pending
-
1987
- 1987-01-06 FR FR878700045A patent/FR2593326B1/fr not_active Expired - Fee Related
- 1987-12-31 US US06/948,086 patent/US4774194A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPS62171167A (ja) | 1987-07-28 |
FR2593326A1 (fr) | 1987-07-24 |
US4774194A (en) | 1988-09-27 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |