FR2204884B1 - - Google Patents
Info
- Publication number
- FR2204884B1 FR2204884B1 FR7338544A FR7338544A FR2204884B1 FR 2204884 B1 FR2204884 B1 FR 2204884B1 FR 7338544 A FR7338544 A FR 7338544A FR 7338544 A FR7338544 A FR 7338544A FR 2204884 B1 FR2204884 B1 FR 2204884B1
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/252—Tubes for spot-analysing by electron or ion beams; Microanalysers
- H01J37/256—Tubes for spot-analysing by electron or ion beams; Microanalysers using scanning beams
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10795172A JPS532599B2 (en) | 1972-10-30 | 1972-10-30 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2204884A1 FR2204884A1 (en) | 1974-05-24 |
| FR2204884B1 true FR2204884B1 (en) | 1977-05-27 |
Family
ID=14472173
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7338544A Expired FR2204884B1 (en) | 1972-10-30 | 1973-10-29 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US3881108A (en) |
| JP (1) | JPS532599B2 (en) |
| FR (1) | FR2204884B1 (en) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3916190A (en) * | 1974-03-01 | 1975-10-28 | Minnesota Mining & Mfg | Depth profile analysis apparatus |
| JPS5646299Y2 (en) * | 1974-12-09 | 1981-10-29 | ||
| JPS5856332A (en) * | 1981-09-30 | 1983-04-04 | Hitachi Ltd | Correction of defect in mask and device thereof |
| USRE33193E (en) * | 1981-09-30 | 1990-04-03 | Hitachi, Ltd. | Ion beam processing apparatus and method of correcting mask defects |
| JPS5871541A (en) * | 1981-10-23 | 1983-04-28 | Hitachi Ltd | Ion microanalyzer |
| DE3240653A1 (en) * | 1982-11-04 | 1984-05-10 | Dr.-Ing. Rudolf Hell Gmbh, 2300 Kiel | METHOD FOR CONTROLLING PRINTING FORM SURFACES BY MEANS OF ELECTRON BEAM |
| DE3335625A1 (en) * | 1983-09-30 | 1985-04-11 | Siemens AG, 1000 Berlin und 8000 München | METHOD AND DEVICE FOR STORING THE MEASURED DATA FROM PARTIAL AREAS OF A SPUTTER CRATER, WHICH IS GENERATED AND ANALYZED IN A SECOND EDITION MASS SPECTROMETER |
| US4661702A (en) * | 1984-10-24 | 1987-04-28 | The Perkin-Elmer Corporation | Primary ion beam raster gating technique for secondary ion mass spectrometer system |
| US4874946A (en) * | 1985-04-30 | 1989-10-17 | The United States Of America As Represented By The United States Department Of Energy | Method and apparatus for analyzing the internal chemistry and compositional variations of materials and devices |
| US4719349A (en) * | 1986-05-27 | 1988-01-12 | The United States Of America As Represented By The Department Of Health And Human Services | Electrochemical sample probe for use in fast-atom bombardment mass spectrometry |
| DE3636506A1 (en) * | 1986-10-27 | 1988-04-28 | Atomika Tech Physik Gmbh | SPIRAL SCAN PROCESS |
| JP2585616B2 (en) * | 1987-08-12 | 1997-02-26 | 株式会社日立製作所 | Secondary ion mass spectrometer method |
| JPH02183150A (en) * | 1989-01-09 | 1990-07-17 | Hitachi Ltd | Mass spectrometry method and apparatus for ion |
| DE4421517A1 (en) * | 1993-06-28 | 1995-01-05 | Schlumberger Technologies Inc | Method for removing or depositing material by means of a particle beam and device for carrying out the method |
| WO2006069469A1 (en) * | 2004-12-27 | 2006-07-06 | Sae Magnetics (H.K.) Ltd. | Method of nano thin film thickness measurement by auger electron spectrscopy |
| JP6233194B2 (en) * | 2014-05-30 | 2017-11-22 | 富士通株式会社 | Control method and control program for secondary ion mass spectrometer, secondary ion mass spectrometer |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3502870A (en) * | 1967-07-05 | 1970-03-24 | Hitachi Ltd | Apparatus for simultaneously displaying a plurality of images of an object being analyzed in an electron beam device |
| US3614311A (en) * | 1968-02-28 | 1971-10-19 | Hitachi Ltd | Apparatus for simultaneously displaying a plurality of images of an object being analyzed in an electron beam device |
| US3600573A (en) * | 1968-10-09 | 1971-08-17 | Jeol Ltd | Ion beam intensity control with pulsed beam deflection and synchronized ion source blanking |
| JPS5034439B1 (en) * | 1969-05-16 | 1975-11-08 |
-
1972
- 1972-10-30 JP JP10795172A patent/JPS532599B2/ja not_active Expired
-
1973
- 1973-10-26 US US409970A patent/US3881108A/en not_active Expired - Lifetime
- 1973-10-29 FR FR7338544A patent/FR2204884B1/fr not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS532599B2 (en) | 1978-01-30 |
| FR2204884A1 (en) | 1974-05-24 |
| US3881108A (en) | 1975-04-29 |
| JPS4966396A (en) | 1974-06-27 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |