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FR2042416B1 - - Google Patents

Info

Publication number
FR2042416B1
FR2042416B1 FR7016423A FR7016423A FR2042416B1 FR 2042416 B1 FR2042416 B1 FR 2042416B1 FR 7016423 A FR7016423 A FR 7016423A FR 7016423 A FR7016423 A FR 7016423A FR 2042416 B1 FR2042416 B1 FR 2042416B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7016423A
Other versions
FR2042416A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Elektromat VEB
Original Assignee
Elektromat VEB
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Elektromat VEB filed Critical Elektromat VEB
Publication of FR2042416A1 publication Critical patent/FR2042416A1/fr
Application granted granted Critical
Publication of FR2042416B1 publication Critical patent/FR2042416B1/fr
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691Handling of masks or workpieces
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H01L21/682Mask-wafer alignment

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
FR7016423A 1969-05-05 1970-05-05 Expired FR2042416B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DD13960169A DD80779A1 (fr) 1969-05-05 1969-05-05

Publications (2)

Publication Number Publication Date
FR2042416A1 FR2042416A1 (fr) 1971-02-12
FR2042416B1 true FR2042416B1 (fr) 1974-06-14

Family

ID=5481173

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7016423A Expired FR2042416B1 (fr) 1969-05-05 1970-05-05

Country Status (6)

Country Link
DD (1) DD80779A1 (fr)
DE (1) DE2009307C3 (fr)
FR (1) FR2042416B1 (fr)
GB (1) GB1286793A (fr)
PL (1) PL69869B1 (fr)
SU (1) SU398067A3 (fr)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3674368A (en) * 1970-05-11 1972-07-04 Johannsmeier Karl Heinz Out of contact optical alignment and exposure apparatus
FR2507695B1 (fr) * 1981-06-12 1986-05-23 Marchal Equip Auto Distributeur de courant haute tension, notamment pour un allumage de moteur a combustion interne
AT406100B (de) * 1996-08-08 2000-02-25 Thallner Erich Kontaktbelichtungsverfahren zur herstellung von halbleiterbausteinen
US7578642B2 (en) 2005-08-05 2009-08-25 The Boeing Corporation Flexible single rail drilling system
CN117572732A (zh) * 2024-01-16 2024-02-20 上海图双精密装备有限公司 调平辅助装置及调平方法

Also Published As

Publication number Publication date
DE2009307C3 (de) 1974-06-27
DE2009307A1 (de) 1970-11-19
GB1286793A (en) 1972-08-23
FR2042416A1 (fr) 1971-02-12
DE2009307B2 (de) 1973-11-29
DD80779A1 (fr) 1971-03-20
PL69869B1 (fr) 1973-10-31
SU398067A3 (fr) 1973-09-17

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Legal Events

Date Code Title Description
ST Notification of lapse