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FR1329590A - Process for obtaining photographic images with polymeric resist - Google Patents

Process for obtaining photographic images with polymeric resist

Info

Publication number
FR1329590A
FR1329590A FR875134A FR875134A FR1329590A FR 1329590 A FR1329590 A FR 1329590A FR 875134 A FR875134 A FR 875134A FR 875134 A FR875134 A FR 875134A FR 1329590 A FR1329590 A FR 1329590A
Authority
FR
France
Prior art keywords
photographic images
polymeric resist
obtaining photographic
obtaining
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR875134A
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
GAF Chemicals Corp
Original Assignee
General Aniline and Film Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US61346A external-priority patent/US3110592A/en
Application filed by General Aniline and Film Corp filed Critical General Aniline and Film Corp
Priority to FR875134A priority Critical patent/FR1329590A/en
Application granted granted Critical
Publication of FR1329590A publication Critical patent/FR1329590A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/38—Polymerisation using regulators, e.g. chain terminating agents, e.g. telomerisation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
FR875134A 1960-10-10 1961-10-05 Process for obtaining photographic images with polymeric resist Expired FR1329590A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR875134A FR1329590A (en) 1960-10-10 1961-10-05 Process for obtaining photographic images with polymeric resist

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US61346A US3110592A (en) 1960-10-10 1960-10-10 Method of making photographic polymeric resist images
FR875134A FR1329590A (en) 1960-10-10 1961-10-05 Process for obtaining photographic images with polymeric resist

Publications (1)

Publication Number Publication Date
FR1329590A true FR1329590A (en) 1963-06-14

Family

ID=26192582

Family Applications (1)

Application Number Title Priority Date Filing Date
FR875134A Expired FR1329590A (en) 1960-10-10 1961-10-05 Process for obtaining photographic images with polymeric resist

Country Status (1)

Country Link
FR (1) FR1329590A (en)

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