FI20106059A - Changing the operating frequency in an LBAW filter - Google Patents
Changing the operating frequency in an LBAW filter Download PDFInfo
- Publication number
- FI20106059A FI20106059A FI20106059A FI20106059A FI20106059A FI 20106059 A FI20106059 A FI 20106059A FI 20106059 A FI20106059 A FI 20106059A FI 20106059 A FI20106059 A FI 20106059A FI 20106059 A FI20106059 A FI 20106059A
- Authority
- FI
- Finland
- Prior art keywords
- changing
- operating frequency
- lbaw filter
- lbaw
- filter
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/46—Filters
- H03H9/54—Filters comprising resonators of piezoelectric or electrostrictive material
- H03H9/56—Monolithic crystal filters
- H03H9/564—Monolithic crystal filters implemented with thin-film techniques
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
- H03H3/04—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks for obtaining desired frequency or temperature coefficient
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02007—Details of bulk acoustic wave devices
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02228—Guided bulk acoustic wave devices or Lamb wave devices having interdigital transducers situated in parallel planes on either side of a piezoelectric layer
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/46—Filters
- H03H9/54—Filters comprising resonators of piezoelectric or electrostrictive material
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/01—Manufacture or treatment
Landscapes
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FI20106059A FI20106059A (en) | 2010-10-14 | 2010-10-14 | Changing the operating frequency in an LBAW filter |
PCT/FI2011/050893 WO2012049373A1 (en) | 2010-10-14 | 2011-10-14 | Changing operation frequency in a lbaw filter |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FI20106059A FI20106059A (en) | 2010-10-14 | 2010-10-14 | Changing the operating frequency in an LBAW filter |
Publications (2)
Publication Number | Publication Date |
---|---|
FI20106059A0 FI20106059A0 (en) | 2010-10-14 |
FI20106059A true FI20106059A (en) | 2012-04-15 |
Family
ID=43064217
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FI20106059A FI20106059A (en) | 2010-10-14 | 2010-10-14 | Changing the operating frequency in an LBAW filter |
Country Status (2)
Country | Link |
---|---|
FI (1) | FI20106059A (en) |
WO (1) | WO2012049373A1 (en) |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4908226A (en) * | 1988-05-23 | 1990-03-13 | Hughes Aircraft Company | Selective area nucleation and growth method for metal chemical vapor deposition using focused ion beams |
KR20010073196A (en) * | 1997-04-24 | 2001-07-31 | 다니구찌 이찌로오, 기타오카 다카시 | Thin film piezoelectric element, method for manufacturing the same, and circuit element |
US6456173B1 (en) * | 2001-02-15 | 2002-09-24 | Nokia Mobile Phones Ltd. | Method and system for wafer-level tuning of bulk acoustic wave resonators and filters |
-
2010
- 2010-10-14 FI FI20106059A patent/FI20106059A/en not_active IP Right Cessation
-
2011
- 2011-10-14 WO PCT/FI2011/050893 patent/WO2012049373A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
FI20106059A0 (en) | 2010-10-14 |
WO2012049373A1 (en) | 2012-04-19 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM | Patent lapsed |