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ES469410A2 - Improvements introduced in the object of the main patent no. 452.982, procedure for preparation of a printed relief. (Machine-translation by Google Translate, not legally binding) - Google Patents

Improvements introduced in the object of the main patent no. 452.982, procedure for preparation of a printed relief. (Machine-translation by Google Translate, not legally binding)

Info

Publication number
ES469410A2
ES469410A2 ES469410A ES469410A ES469410A2 ES 469410 A2 ES469410 A2 ES 469410A2 ES 469410 A ES469410 A ES 469410A ES 469410 A ES469410 A ES 469410A ES 469410 A2 ES469410 A2 ES 469410A2
Authority
ES
Spain
Prior art keywords
translation
machine
legally binding
google translate
procedure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES469410A
Other languages
Spanish (es)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hercules LLC
Original Assignee
Hercules LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from ES452982A external-priority patent/ES452982A1/en
Application filed by Hercules LLC filed Critical Hercules LLC
Publication of ES469410A2 publication Critical patent/ES469410A2/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/035—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/06—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyurethanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/67—Unsaturated compounds having active hydrogen
    • C08G18/671—Unsaturated compounds having only one group containing active hydrogen

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)

Abstract

This invention relates to photopolymer compositions and more particularly to water dispersible liquid compositions which by exposure to actinic radiation will give crosslinked structures having properties, including hardness, flexibility, elasticity, abrasion resistance, and resistance to the inks of alcohol base, which makes them perfectly suitable for use as flexographic printing plates. The invention also relates to photopolymer elements, for example, plates that materialize a layer of such compositions, and to methods of manufacturing print reliefs from such elements. (Machine-translation by Google Translate, not legally binding)
ES469410A 1976-11-04 1978-05-03 Improvements introduced in the object of the main patent no. 452.982, procedure for preparation of a printed relief. (Machine-translation by Google Translate, not legally binding) Expired ES469410A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
ES452982A ES452982A1 (en) 1975-11-05 1976-11-04 Printing plates from polymer with terminal unsaturation
US79368777A 1977-05-04 1977-05-04

Publications (1)

Publication Number Publication Date
ES469410A2 true ES469410A2 (en) 1979-04-01

Family

ID=25160547

Family Applications (1)

Application Number Title Priority Date Filing Date
ES469410A Expired ES469410A2 (en) 1976-11-04 1978-05-03 Improvements introduced in the object of the main patent no. 452.982, procedure for preparation of a printed relief. (Machine-translation by Google Translate, not legally binding)

Country Status (13)

Country Link
JP (1) JPS53137132A (en)
AU (1) AU3573578A (en)
BE (1) BE866688R (en)
BR (1) BR7802777A (en)
DE (1) DE2818455A1 (en)
DK (1) DK195078A (en)
ES (1) ES469410A2 (en)
FR (1) FR2389924A2 (en)
GB (1) GB1598894A (en)
IT (1) IT1108811B (en)
NL (1) NL7804729A (en)
SE (1) SE7805122L (en)
ZA (1) ZA782548B (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58140737A (en) * 1982-02-15 1983-08-20 Toyobo Co Ltd Photosensitive resin composition
US4572610A (en) * 1984-05-21 1986-02-25 Desoto, Inc. Optical fiber buffer coated with halogenated dihydroxy-terminated polybutadienes
US5407784A (en) * 1990-04-26 1995-04-18 W. R. Grace & Co.-Conn. Photocurable composition comprising maleic anhydride adduct of polybutadiene or butadiene copolymers
US5268257A (en) * 1990-08-01 1993-12-07 W. R. Grace & Co.-Conn. Aqueous developable, photocurable composition, and flexible, photosensitive articles made therefrom
JPH0495960A (en) * 1990-08-08 1992-03-27 Hayakawa Rubber Co Ltd Composition for photosensitive flexographic printing plate
JPH05216225A (en) * 1992-02-06 1993-08-27 Nippon Paint Co Ltd Photosensitive composition for flexographic printing plate
CN102566283B (en) * 2011-12-23 2014-05-07 乐凯华光印刷科技有限公司 Washed flexible resin plate capable of achieving laser direct imaging

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1253757A (en) * 1968-08-31 1971-11-17 Nippon Soda Co Thermosetting resin, manufacture and composition thereof
DE2250105B2 (en) * 1971-10-13 1977-04-14 Meisei Churchill Co. Ltd., Sakai, Osaka (Japan) LIGHT-CURING PLASTIC COMPOUND
US3960572A (en) * 1973-02-21 1976-06-01 Asahi Kasei Kogyo Kabushiki Kaisha Photosensitive compositions comprising a polyester-polyether block polymer
JPS5290304A (en) * 1976-01-24 1977-07-29 Asahi Chemical Ind Photoosensitive resin composition for making flexo graphic printing plate

Also Published As

Publication number Publication date
ZA782548B (en) 1979-04-25
FR2389924A2 (en) 1978-12-01
DK195078A (en) 1978-11-05
BE866688R (en) 1978-11-03
BR7802777A (en) 1979-01-16
JPS53137132A (en) 1978-11-30
DE2818455A1 (en) 1978-11-09
IT1108811B (en) 1985-12-09
NL7804729A (en) 1978-11-07
GB1598894A (en) 1981-09-23
AU3573578A (en) 1979-11-08
SE7805122L (en) 1978-11-05
IT7822983A0 (en) 1978-05-03

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Legal Events

Date Code Title Description
FD2A Announcement of lapse in spain

Effective date: 20170706