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ES2110987T3 - Composiciones fotopolimerizables. - Google Patents

Composiciones fotopolimerizables.

Info

Publication number
ES2110987T3
ES2110987T3 ES91810833T ES91810833T ES2110987T3 ES 2110987 T3 ES2110987 T3 ES 2110987T3 ES 91810833 T ES91810833 T ES 91810833T ES 91810833 T ES91810833 T ES 91810833T ES 2110987 T3 ES2110987 T3 ES 2110987T3
Authority
ES
Spain
Prior art keywords
photopolymerizable compositions
alpha
dialoxioxone
benzoyloenzilalkane
photopolymerization
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES91810833T
Other languages
English (en)
Inventor
Katsuyuki Ohta
Toshiya Takagi
Toshimi Aoyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Novartis AG
BASF Schweiz AG
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Ciba Geigy AG
Ciba Spezialitaetenchemie Holding AG
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy AG, Ciba Spezialitaetenchemie Holding AG, Tokyo Ohka Kogyo Co Ltd filed Critical Ciba Geigy AG
Application granted granted Critical
Publication of ES2110987T3 publication Critical patent/ES2110987T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/117—Free radical
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/124—Carbonyl compound containing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymerisation Methods In General (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

COMPUESTOS QUE COMPRENDEN UN POLIMERO DE BASE LINEAL, UN COMPUESTO POLIMERIZABLE POR ADICION, INSATURADO ETILENICAMENTE Y UNA COMBINACION DE (A) UN 1-BENZOILOENZILALKANO CON (B) UN (ALFA) -FENIL-(ALFA), (ALFA)-DIALKOXIACETOFENONA COMO INICIADORA DE LA FOTOPOLIMERIZACION IDONEAS PARA LA PRODUCCION DE PLACAS DE IMPRESION DE PELICULA GRUESA.
ES91810833T 1990-11-05 1991-10-28 Composiciones fotopolimerizables. Expired - Lifetime ES2110987T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP29708890 1990-11-05

Publications (1)

Publication Number Publication Date
ES2110987T3 true ES2110987T3 (es) 1998-03-01

Family

ID=17842051

Family Applications (1)

Application Number Title Priority Date Filing Date
ES91810833T Expired - Lifetime ES2110987T3 (es) 1990-11-05 1991-10-28 Composiciones fotopolimerizables.

Country Status (5)

Country Link
US (2) US5541038A (es)
EP (1) EP0485334B1 (es)
JP (1) JP2839974B2 (es)
DE (1) DE69128274T2 (es)
ES (1) ES2110987T3 (es)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0623688A1 (en) * 1993-05-04 1994-11-09 Nagoya Oilchemical Co., Ltd. Decomposable masking member
CA2134156A1 (en) * 1993-11-22 1995-05-23 Thomas P. Klun Coatable compositions, abrasive articles made therefrom, and methods of making and using same
DE19614267A1 (de) * 1996-04-11 1997-10-16 Atec Weiss Gmbh & Co Kg Elastische, axial- und winkelbewegliche Kupplung
TW452575B (en) * 1996-12-06 2001-09-01 Ciba Sc Holding Ag New Α-aminoacetophenone photoinitiators and photopolymerizable compositions comprising these photoinitiators
DE19855709B4 (de) 1998-12-03 2008-01-24 Helmut Hechinger Gmbh & Co. Führungsstangen für eine Jacquard-Webeinrichtung
EP1285012B1 (en) * 2000-05-26 2007-01-10 Akzo Nobel Coatings International B.V. Photoactivatable coating composition
KR100583095B1 (ko) * 2000-06-30 2006-05-24 주식회사 하이닉스반도체 광산 발생제와 함께 광 라디칼 발생제(ｐｒｇ)를 포함하는포토레지스트 조성물
JP2004043433A (ja) * 2002-04-26 2004-02-12 Kitai Kagi Kofun Yugenkoshi モルフォリノケトン誘導体及びその用途
US7632625B2 (en) * 2004-05-25 2009-12-15 Roberts David H Method of pre-exposing relief image printing plate
US7125650B2 (en) * 2004-07-20 2006-10-24 Roberts David H Method for bump exposing relief image printing plates
DE602007004749D1 (de) * 2006-11-20 2010-03-25 Akzo Nobel Coatings Int Bv Beschichtungszusammensetzung
US7767383B2 (en) * 2007-08-08 2010-08-03 Roberts David H Method of pre-exposing relief image printing plate
US8236479B2 (en) * 2008-01-23 2012-08-07 E I Du Pont De Nemours And Company Method for printing a pattern on a substrate
US20090191482A1 (en) * 2008-01-30 2009-07-30 E.I. Du Pont De Nemours And Company Device and method for preparing relief printing form
US8241835B2 (en) 2008-01-30 2012-08-14 E I Du Pont De Nemours And Company Device and method for preparing relief printing form
WO2011002967A1 (en) 2009-07-02 2011-01-06 E. I. Du Pont De Nemours And Company Method for printing a material onto a substrate
US8795950B2 (en) 2010-06-30 2014-08-05 Jonghan Choi Method of improving print performance in flexographic printing plates
WO2013032860A1 (en) 2011-08-26 2013-03-07 E. I. Du Pont De Nemours And Company Method for preparing a relief printing form
US9097974B2 (en) 2012-08-23 2015-08-04 E I Du Pont De Nemours And Company Method for preparing a relief printing form
US10108087B2 (en) * 2016-03-11 2018-10-23 Macdermid Graphics Solutions Llc Method of improving light stability of flexographic printing plates featuring flat top dots
WO2017168699A1 (ja) * 2016-03-31 2017-10-05 日立化成株式会社 感光性樹脂組成物、感光性樹脂フィルム、硬化物の製造方法、積層体、及び電子部品

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4287367A (en) * 1976-04-14 1981-09-01 Basf Aktiengesellschaft Manufacture of symmetrical or unsymmetrical monoacetals of aromatic 1,2-diketones
IT1147805B (it) * 1982-01-22 1986-11-26 Lamberti Flli Spa Metodo per la preparazione di monoacetali simmetrici degli 1,2-dichetoni aromatici a partire dai corrispondenti alfa idrossi chetoni
JPS6063532A (ja) * 1983-08-16 1985-04-11 Fuji Photo Film Co Ltd 光重合性組成物
JPS61185542A (ja) * 1985-02-13 1986-08-19 Denki Kagaku Kogyo Kk 感光性組成物
JPH0658537B2 (ja) * 1985-02-28 1994-08-03 富士写真フイルム株式会社 受像シ−ト
DE3606155A1 (de) * 1986-02-26 1987-08-27 Basf Ag Photopolymerisierbares gemisch, dieses enthaltendes lichtempfindliches aufzeichnungselement sowie verfahren zur herstellung einer flachdruckform mittels dieses lichtempfindlichen aufzeichnungselements
ATE89262T1 (de) * 1987-03-26 1993-05-15 Ciba Geigy Ag Neue alpha-aminoacetophenone als photoinitiatoren.
EP0287516B1 (de) * 1987-04-14 1993-03-31 Ciba-Geigy Ag Klebstoffe
JPH02230152A (ja) * 1987-06-18 1990-09-12 Napp Syst Usa Inc 感光性樹脂組成物
JPH02188756A (ja) * 1989-01-18 1990-07-24 Asahi Chem Ind Co Ltd 感光性樹脂組成物

Also Published As

Publication number Publication date
US5645974A (en) 1997-07-08
DE69128274D1 (de) 1998-01-08
EP0485334A3 (en) 1992-12-30
EP0485334B1 (en) 1997-11-26
DE69128274T2 (de) 1998-04-23
US5541038A (en) 1996-07-30
EP0485334A2 (en) 1992-05-13
JPH05249672A (ja) 1993-09-28
JP2839974B2 (ja) 1998-12-24

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