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EP3607204B1 - Pumpeinheit und verwendung - Google Patents

Pumpeinheit und verwendung Download PDF

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Publication number
EP3607204B1
EP3607204B1 EP18712883.0A EP18712883A EP3607204B1 EP 3607204 B1 EP3607204 B1 EP 3607204B1 EP 18712883 A EP18712883 A EP 18712883A EP 3607204 B1 EP3607204 B1 EP 3607204B1
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EP
European Patent Office
Prior art keywords
pumping
vacuum pump
stage
roots
volume displacement
Prior art date
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Active
Application number
EP18712883.0A
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English (en)
French (fr)
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EP3607204A1 (de
Inventor
Philippe D'HARBOULLE
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Pfeiffer Vacuum SAS
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Pfeiffer Vacuum SAS
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Publication of EP3607204A1 publication Critical patent/EP3607204A1/de
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Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C23/00—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids
    • F04C23/001—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids of similar working principle
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C18/00—Rotary-piston pumps specially adapted for elastic fluids
    • F04C18/08—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing
    • F04C18/12—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing of other than internal-axis type
    • F04C18/126—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing of other than internal-axis type with radially from the rotor body extending elements, not necessarily co-operating with corresponding recesses in the other rotor, e.g. lobes, Roots type
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C25/00—Adaptations of pumps for special use of pumps for elastic fluids
    • F04C25/02—Adaptations of pumps for special use of pumps for elastic fluids for producing high vacuum
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C2220/00—Application
    • F04C2220/10—Vacuum
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C2220/00—Application
    • F04C2220/10—Vacuum
    • F04C2220/12—Dry running
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C2220/00—Application
    • F04C2220/30—Use in a chemical vapor deposition [CVD] process or in a similar process
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C2270/00—Control; Monitoring or safety arrangements
    • F04C2270/18—Pressure
    • F04C2270/185—Controlled or regulated
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C2270/00—Control; Monitoring or safety arrangements
    • F04C2270/21—Pressure difference
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F05—INDEXING SCHEMES RELATING TO ENGINES OR PUMPS IN VARIOUS SUBCLASSES OF CLASSES F01-F04
    • F05B—INDEXING SCHEME RELATING TO WIND, SPRING, WEIGHT, INERTIA OR LIKE MOTORS, TO MACHINES OR ENGINES FOR LIQUIDS COVERED BY SUBCLASSES F03B, F03D AND F03G
    • F05B2210/00—Working fluid
    • F05B2210/10—Kind or type
    • F05B2210/12—Kind or type gaseous, i.e. compressible

Definitions

  • the present invention relates to a pumping unit comprising a primary vacuum pump of the multi-stage dry type and a vacuum pump of the two-stage Roots type, mounted in series and upstream of the primary vacuum pump.
  • the present invention also relates to a use of said pumping unit.
  • Primary vacuum pumps have several pumping stages in series in which a gas to be pumped circulates between a suction and a discharge.
  • a gas to be pumped circulates between a suction and a discharge.
  • rotary lobes also known under the name "Roots” with two or three lobes or those with double nozzle, also known under the name "Claw”.
  • Primary vacuum pumps include two rotors of identical profiles, rotating inside a stator in opposite directions. During rotation, the gas to be pumped is trapped in the volume generated by the rotors and the stator, and is driven by the rotors towards the next stage and then step by step until the discharge of the vacuum pump. The operation is carried out without any mechanical contact between the rotors and the stator, which allows the absence of oil in the pumping stages. We thus obtain a so-called dry pumping.
  • An example of a primary vacuum pump is described in the document EP1710440A2 .
  • Roots-type vacuum pump (known under the name of “Roots Blower” in English) is generally used, mounted in series and upstream of the primary vacuum pump.
  • An example of a Roots Blower type vacuum pump is described in the document US2013 / 0164147A1 .
  • the flow rate generated by the Roots vacuum pump can be of the order of twenty times the flow rate generated by the primary vacuum pump.
  • Certain applications such as thin film production applications in the semiconductor manufacturing industry or "CVD applications” (for “chemical vapor deposition”), require high pumping performance, especially for ranges of. working pressure between 53Pa and 266Pa, for continuously pumped flows between 50Pa.m 3 .s -1 and 170Pa.m 3 .s -1 .
  • Roots vacuum pump with the desired generated flow rate to achieve 3000m 3 / h mounted in series with a multi-stage primary vacuum pump, of the order of 300m 3 / h.
  • the flow generated by the Roots vacuum pump can thus be of the order of ten times the flow generated by the multistage primary vacuum pump.
  • such a pumping device consumes a great deal of energy and it is also sought to limit electrical consumption.
  • One of the aims of the present invention is therefore to provide a pumping unit having better pumping performance in the operating range of CVD applications, as well as in limiting pressure, while having minimal electrical consumption.
  • the ultimate vacuum pumping performance is satisfactory and less than 0.1Pa.
  • the subject of the invention is also a use of the pumping unit as described above for pumping an enclosure of a semiconductor manufacturing installation, in which the pumping unit is used for controlling the pressure at the bottom. 'inside the enclosure to values between 53Pa and 266Pa and for gas flows pumped into the enclosure between 50Pa.m 3 .s -1 and 170Pa.m 3 .s -1 .
  • generated flow rate is used to define the displacement corresponding to the volume generated between the rotors and the stator of the vacuum pump multiplied by the number of revolutions per second.
  • limit pressure is used to define the minimum pressure obtained for a pumping device in the absence of a flow of pumped gas.
  • a dry-type primary vacuum pump is defined as a positive-displacement vacuum pump which, using two rotors sucks, transfers and then discharges the gas to be pumped at atmospheric pressure.
  • the rotors are driven in rotation by a motor of the primary vacuum pump.
  • Roots-type vacuum pump also called “Roots Blower” is defined as a positive-displacement vacuum pump which, using Roots-type rotors, sucks in, transfers and then discharges the gas to be pumped.
  • the Roots type vacuum pump is mounted upstream and in series with a primary vacuum pump. Roots type rotors are rotated by a Roots type vacuum pump motor.
  • upstream is understood to mean an element which is placed before another with respect to the direction of flow of the gas.
  • downstream is understood to mean an element placed after another relative to the direction of circulation of the gas to be pumped, the element located upstream being at a lower pressure than the element located downstream, at a higher pressure.
  • the figure 1 shows a schematic view of a pumping unit 1.
  • the pumping unit 1 is for example used in an installation 100 of the semiconductor manufacturing industry ( figure 6 ).
  • the pumping unit 1 is for example connected to an enclosure 101 intended for the production of thin films or CVD (“chemical vapor deposition”) applications, for which the operating range includes pressures between 53Pa and 266Pa and flows. of gas pumped into enclosure 101, generally between 50Pa.m 3 .s -1 and 170Pa.m 3 .s -1 .
  • the pumping group 1 comprises a primary vacuum pump 2 of the multi-stage dry type and a two-stage Roots 3 type vacuum pump (or "double stage blower” in English), mounted in series and upstream of the primary vacuum pump 2 .
  • the primary vacuum pump 2 shown comprises five pumping stages T1, T2, T3, T4, T5 connected in series between a suction 4 and a discharge 5 of the primary vacuum pump 2 and in which a gas to be pumped can circulate.
  • Each T1-T5 pumping stage has a respective inlet and outlet.
  • the successive pumping stages T1-T5 are connected in series one after the other by respective inter-stage channels 6 connecting the outlet (or the discharge) of the preceding pumping stage to the inlet (or the suction) of the next floor (see figure 2 ).
  • the inter-stage channels 6 are for example arranged laterally in the body 8 of the vacuum pump 2, on either side of a central housing 9 receiving the rotors 10.
  • the inlet of the first pumping stage T1 communicates with the suction 4 of the vacuum pump 2 and the output of the last pumping stage T5 communicates with the discharge 5 of the vacuum pump 2.
  • the stators of the pumping stages T1-T5 form a body 8 of the vacuum pump 2 .
  • the primary vacuum pump 2 comprises two rotors 10 with rotary lobes extending in the pumping stages T1-T5.
  • the rotor shafts 10 are driven on the side of the discharge stage T5 by a motor M1 of the primary vacuum pump 2 ( figure 1 ).
  • the rotors 10 have lobes of identical profiles.
  • the rotors shown are of the “Roots” type (section in the shape of an “eight” or “bean”).
  • the invention also applies to other types of multi-stage primary vacuum pumps of the dry type, such as of the "Claw” type or of the spiral or screw type or of another similar principle of positive displacement vacuum pump.
  • the rotors 10 are angularly offset and driven to rotate synchronously in the opposite direction in the central housing 9 of each stage T1-T5. During rotation, the gas sucked in from the inlet is trapped in the volume generated by the rotors 10 and the stator, then is driven by the rotors to the next stage (the direction of gas flow is illustrated by the arrows G on the figures 1 and 2 ).
  • the primary vacuum pump 2 is said to be “dry” because in operation, the rotors 10 rotate inside the stator without any mechanical contact with the stator, which allows the absence of oil in the pumping stages T1-T5. .
  • the pumping stages T1-T5 have a generated volume, that is to say a volume of pumped gas, decreasing (or equal) with the pumping stages, the first pumping stage T1 having the highest generated flow and the last pumping stage T5 having the lowest flow rate generated.
  • the discharge pressure of the primary vacuum pump 2 is atmospheric pressure.
  • the primary vacuum pump 2 further comprises a non-return valve at the outlet of the last pumping stage T5, at the level of the discharge 5, to prevent the return of the gases pumped into the vacuum pump 2.
  • a two-stage Roots-type vacuum pump 3 is schematically illustrated on the figure. figure 3 .
  • the Roots-type vacuum pump 3 is, like the primary vacuum pump 2, a positive-displacement vacuum pump which, using rotors sucks, transfers and then discharges the gas to be pumped.
  • the two-stage Roots type vacuum pump 3 comprises a first and a second pumping stage B1, B2 connected in series between a suction 11 and a discharge 12 and in which a gas to be pumped can circulate.
  • Each pumping stage B1-B2 comprises a respective inlet and outlet, the inlet 16 (or suction) of the second pumping stage B2 being connected to the outlet (or delivery) of the first pumping stage B1 by an inter-stage channel 13.
  • the inlet of the first pumping stage B1 communicates with the suction 11 of the pumping group 1 and the outlet of the second pumping stage B2 (the discharge 12) is connected to the suction 4 of the primary vacuum pump 2 .
  • the Roots-type vacuum pump 3 comprises two rotors 14 with rotary lobes extending in the pumping stages B1-B2.
  • the shafts of the rotors 14 are driven by a motor M2 of the Roots type vacuum pump 3 ( figure 1 ).
  • the rotors 14 have lobes of identical "Roots" type profiles.
  • the rotors 14 are angularly offset and driven to rotate synchronously in the opposite direction in the central housing defining the chambers of each stage B1-B2. During rotation, the gas sucked in from the inlet is trapped in the volume generated by the rotors and the stator and is then driven by the rotors to the next stage (the direction of gas flow is illustrated by the arrows G on the figures 1 and 3 ).
  • Roots type vacuum pump 3 is said to be “dry” because in operation, the rotors rotate inside the stator without any mechanical contact with the stator, which allows the absence of oil in the pumping stages B1- B2.
  • the Roots-type vacuum pump 3 differs mainly from the primary vacuum pump 2 by the larger dimensions of pumping stages B1-B2 due to the greater pumping capacities, by larger clearance tolerances and by the that the Roots type vacuum pump 3 does not deliver at atmospheric pressure but must be used in series assembly upstream of a primary vacuum pump.
  • the pumping unit 1 further comprises a pipe 15 connecting the suction 11 of the Roots-type vacuum pump 3 to the inlet 16 of the second pumping stage B2 of the Roots-type vacuum pump 3.
  • the pipe 15 comprises a discharge module 17, such as a valve or a piloted valve, configured to open as soon as the pressure difference between the suction 11 and the discharge of the first pumping stage B1 exceeds a predefined value, for example between 5.10 3 Pa and 3.10 4 Pa.
  • a discharge module 17 such as a valve or a piloted valve
  • the opening of the discharge module 17 makes it possible to recirculate the surplus of the gas flow from the discharge of the first pumping stage B1 to the suction 11 of the vacuum pump 3 of the Roots type. This recirculation takes place at the time of the pressure drop of the enclosure 101 from atmospheric pressure, due to the strong gas flow at the start of pumping. This prevents a high pressure from being generated at the discharge of the first pumping stage B1 which could cause very high electrical consumption, excessive heating and a risk of malfunction.
  • the ratio of the flow generated by the first pumping stage B1 of the Roots type vacuum pump 3 to the flow generated by the second pumping stage B2 of the Roots-type vacuum pump 3 is less than six, such as less than 5.5, such as between 4.5 and 5.5.
  • the flow rate generated by the first pumping stage B1 of the vacuum pump 3 of the two-stage Roots type is for example greater than or equal to 3000 m 3 / h, such as between 3500 m 3 / h and 5000 m 3 / h.
  • the flow generated by the second pumping stage B2 of the two-stage Roots type vacuum pump 3 is for example greater than or equal to 500 m 3 / h, such as between 500 m 3 / h and 1000 m 3 / h.
  • the flow rate generated by the first pumping stage B1 of the Roots-type vacuum pump 3 is for example of the order of 4459 m 3 / h.
  • the flow rate generated by the second pumping stage B2 of the Roots-type vacuum pump 3 is for example of the order of 876 m 3 / h.
  • the ratio of the flow generated by the first pumping stage B1 to the flow generated by the second pumping stage B2 is thus of the order of 5.1.
  • the ratio of the flow generated by the second pumping stage B2 of the Roots-type vacuum pump 3 to the flow generated by the first pumping stage T1 of the primary vacuum pump 2 is less than six, such as less than or equal to five.
  • the flow rate generated by the first pumping stage T1 of the primary vacuum pump 2 is for example greater than or equal to 100 m 3 / h, such as between 100 m 3 / h and 400 m 3 / h.
  • the first pumping stage T1 of the primary vacuum pump 2 has, for example, a flow rate generated of the order of 187 m 3 / h.
  • the ratio of the flow generated by the second pumping stage B2 to the flow generated by the first pumping stage T1 is thus equal to the order of 4.7.
  • the ratio of the flow generated by the first pumping stage T1 of the primary vacuum pump 2 over the flow generated by the second pumping stage T2 of the primary vacuum pump 2 is for example less than or equal to three.
  • the second pumping stage T2 has, for example, a generated flow rate of the order of 93 m 3 / h.
  • the ratio of the flow generated by the first pumping stage T1 to the flow generated by the second pumping stage T2 is thus substantially equal to two.
  • the ratio of the flow generated by the first pumping stage B1 of the two-stage Roots type vacuum pump 3 to the flow generated by the third stage of pumping T3 of the primary vacuum pump 2 is for example less than or equal to one hundred and twenty.
  • the at least two last pumping stages T4, T5, T6 of the primary vacuum pump 2 can have the same values of flow rates generated.
  • the ratio of the flow generated by the last pumping stage T5 of the primary vacuum pump 2 over the flow generated by the penultimate pumping stage T4 of the primary vacuum pump 2 is for example less than or equal to two.
  • the last three pumping stages T3, T4 and T5 have, for example, a flow rate generated of the order of 44 m 3 / h.
  • the ratio of the flow generated by the first pumping stage B1 of the secondary vacuum pump 3 of the two-stage Roots type to the flow generated by the third pumping stage T3 of the primary vacuum pump 2 is thus of the order of 101, 3.
  • the ratio of the flow generated by the last pumping stage T5 of the primary vacuum pump 2 to the flow generated by the penultimate pumping stage T4 of the primary vacuum pump 2 is thus here equal to one.
  • the last pumping stages T4, T5, T6 of the primary vacuum pump 2 with the same values of flow rates generated make it possible to simplify manufacture and reduce costs.
  • This sizing of the pumping unit 1 makes it possible to optimize the pumping performance which is optimal in the operating range of the CVD processes. Also, the ultimate vacuum pumping performance is satisfactory. In addition, power consumption is minimal, whether at ultimate vacuum or for operating pressures.
  • Curve A is a curve of the pumping speed as a function of the pressure obtained for a pumping device of the prior art comprising a single-stage Roots vacuum pump having an estimated generated flow rate of 4459 m 3 / h mounted in series and in upstream of a primary vacuum pump with an estimated flow rate of 510m 3 / h.
  • This pumping device makes it possible to achieve a pumping speed of the order of 3000 m 3 / h for pressures between 13Pa and 26 Pa (or 0.1Torr and 0.2Torr). However, beyond 53Pa (or 0.4Torr), performance deteriorates very markedly, so that in the desired operating range (Pf on the graphs of figures 4 and 5 ), the performance of the pumping device is insufficient. Also, the pumping speed for pressures lower than 13Pa (or 0.1Torr), (in ultimate vacuum) is less good. In addition, the power consumption at limit pressure is of the order of 3.3kW, which is significant.
  • Curve B shows the pumping performance as a function of the pressure obtained for a pumping device of the prior art comprising a single-stage Roots vacuum pump with a generated flow rate estimated at 4459m 3 / h mounted in series and upstream of a primary vacuum pump with an estimated flow rate of 260m 3 / h.
  • the pumping performance at limit pressure is better than for the pumping device of curve A.
  • the pumping speed does not reach the desired performance of 3000 m 3 / h in the operating range Pf.
  • Curve C shows the pumping performance as a function of pressure obtained for a pumping device of the prior art comprising a Roots vacuum pump with an estimated generated flow rate of 4459 m 3 / h mounted in series and upstream of a pump. at primary vacuum with an estimated flow rate of 510m 3 / h.
  • the dimensioning of the last pumping stage of the primary vacuum pump of the pumping device of curve C with an estimated generated flow rate of around 109 m 3 / h is much greater than that of the pumping device of curve A an estimated flow rate of around 58m 3 / h.
  • Curve D shows the pumping performance as a function of the pressure obtained for a pumping unit 1 according to the invention
  • the flow rate generated by the first pumping stage B1 of the vacuum pump 3 of the Roots type is of the order of 4459m 3 / h
  • the flow generated by the second pumping stage B2 of the Roots-type vacuum pump 3 is of the order of 876 m 3 / h
  • the first pumping stage T1 of the primary vacuum pump 2 has a flow generated in the order of 187m 3 / h
  • the second pumping stage T2 of the primary vacuum pump 2 has a flow generated in the order of 93m 3 / h
  • the last three pumping stages T3, T4 and T5 of the primary vacuum pump 2 have a flow generated in the order of 44m 3 / h.
  • the pumping performance is maximum, of the order of 3000 m 3 / h, in the desired operating range Pf.
  • the ultimate vacuum pumping performance is also satisfactory.
  • the level of power consumption is satisfactory. It is less than 2.5kW in limit pressure.

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  • General Engineering & Computer Science (AREA)
  • Applications Or Details Of Rotary Compressors (AREA)

Claims (11)

  1. Pumpeinheit (1), welche aufweist:
    - eine primäre Vakuumpumpe (2) vom mehrstufigen trockenen Typ, die mindestens vier in Reihe geschaltete Pumpstufen (T1, T2, T3, T4, T5) aufweist,
    - eine Vakuumpumpe (3) vom Typ einer zweistufigen Wälzkolbenpumpe, die eine erste und eine zweite Pumpstufe (B1, B2) aufweist, die in Reihe geschaltet sind, wobei die zweite Pumpstufe (B2) der Vakuumpumpe (3) vom Typ einer zweistufigen Wälzkolbenpumpe mit einer ersten Pumpstufe (T1) der primären Vakuumpumpe (2) in Reihe geschaltet und, bezogen auf die Strömungsrichtung der zu pumpenden Gase, stromaufwärts von dieser angeordnet ist,
    dadurch gekennzeichnet, dass:
    - das Verhältnis der von der ersten Pumpstufe (B1) der Vakuumpumpe (3) vom Typ einer zweistufigen Wälzkolbenpumpe erzeugten Förderleistung zu der von der zweiten Pumpstufe (B2) der Vakuumpumpe (3) vom Typ einer zweistufigen Wälzkolbenpumpe (3) erzeugten Förderleistung kleiner als sechs ist, und
    - das Verhältnis der von der zweiten Pumpstufe (B2) der Vakuumpumpe (3) vom Typ einer zweistufigen Wälzkolbenpumpe erzeugten Förderleistung zu der erzeugten Förderleistung der ersten Pumpstufe (T1) der primären Vakuumpumpe (2) kleiner als sechs ist.
  2. Pumpeinheit (1) nach dem vorhergehenden Anspruch, dadurch gekennzeichnet, dass die von der ersten Pumpstufe (B1) der Vakuumpumpe (3) vom Typ einer zweistufigen Wälzkolbenpumpe erzeugte Förderleistung größer oder gleich 3000 m3/h ist, wie zum Beispiel 3500 m3/h bis 5000 m3/h.
  3. Pumpeinheit (1) nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass die von der zweiten Pumpstufe (B2) der Vakuumpumpe (3) vom Typ einer zweistufigen Wälzkolbenpumpe erzeugte Förderleistung größer oder gleich 500 m3/h ist, wie zum Beispiel 500 m3/h bis 1000 m3/h.
  4. Pumpeinheit (1) nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass das Verhältnis der von der ersten Pumpstufe (B1) der Vakuumpumpe (3) vom Typ einer zweistufigen Wälzkolbenpumpe erzeugten Förderleistung zu der von der zweiten Pumpstufe (B2) der Vakuumpumpe (3) vom Typ einer zweistufigen Wälzkolbenpumpe (3) erzeugten Förderleistung kleiner als 5,5 ist.
  5. Pumpeinheit (1) nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass das Verhältnis der von der zweiten Pumpstufe (B2) der Vakuumpumpe (3) vom Typ einer zweistufigen Wälzkolbenpumpe erzeugten Förderleistung zu der erzeugten Förderleistung der ersten Pumpstufe (T1) der primären Vakuumpumpe (2) kleiner oder gleich fünf ist.
  6. Pumpeinheit (1) nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass die von der ersten Pumpstufe (T1) der primären Vakuumpumpe (2) erzeugte Förderleistung größer oder gleich 100 m3/h ist, wie zum Beispiel 100 m3/h bis 400 m3/h.
  7. Pumpeinheit (1) nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass das Verhältnis der von der ersten Pumpstufe (T1) der primären Vakuumpumpe (2) erzeugten Förderleistung zu der von der zweiten Pumpstufe (T2) der primären Vakuumpumpe (2) erzeugten Förderleistung kleiner oder gleich drei ist.
  8. Pumpeinheit (1) nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass das Verhältnis der von der ersten Pumpstufe (B1) der Vakuumpumpe (3) vom Typ einer zweistufigen Wälzkolbenpumpe erzeugten Förderleistung zu der von der dritten Pumpstufe (T3) der primären Vakuumpumpe (2) erzeugten Förderleistung kleiner oder gleich einhundertzwanzig ist.
  9. Pumpeinheit (1) nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass die primäre Vakuumpumpe (2) mindestens fünf in Reihe geschaltete Pumpstufen (T1, T2, T3, T4, T5) aufweist.
  10. Pumpeinheit (1) nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass sie außerdem eine Rohrleitung (15) aufweist, welche die Saugseite (11) der Vakuumpumpe (3) vom Typ einer zweistufigen Wälzkolbenpumpe an den Einlass (16) der zweiten Pumpstufe (B2) der Vakuumpumpe (3) vom Typ einer zweistufigen Wälzkolbenpumpe anschließt, wobei die Rohrleitung (15) ein Entlastungsmodul (17) aufweist, das dafür ausgelegt ist, sich zu öffnen, sobald die Druckdifferenz zwischen der Saugseite (11) und der Druckseite der ersten Pumpstufe (B1) einen vordefinierten Wert überschreitet.
  11. Verwendung einer Pumpeinheit (1) nach einem der vorhergehenden Ansprüche zum Pumpen einer Kammer (101) einer Anlage (100) zur Herstellung von Halbleitern, wobei die Pumpeinheit (1) zur Regelung des Druckes im Inneren der Kammer (101) auf Werte zwischen 53 Pa und 266 Pa und für gepumpte Gasströme in der Kammer (101) zwischen 50 Pa.m3.s-1 und 170 Pa.m3.s-1 verwendet wird.
EP18712883.0A 2017-04-07 2018-03-21 Pumpeinheit und verwendung Active EP3607204B1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR1753029A FR3065040B1 (fr) 2017-04-07 2017-04-07 Groupe de pompage et utilisation
PCT/EP2018/057211 WO2018184853A1 (fr) 2017-04-07 2018-03-21 Groupe de pompage et utilisation

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EP (1) EP3607204B1 (de)
JP (1) JP2020513088A (de)
KR (1) KR102561996B1 (de)
CN (1) CN110506163B (de)
FR (1) FR3065040B1 (de)
TW (1) TWI735764B (de)
WO (1) WO2018184853A1 (de)

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ES2984721T3 (es) * 2019-12-04 2024-10-30 Ateliers Busch S A Sistema de bombeo redundante y método de bombeo mediante este sistema de bombeo
FR3118650B1 (fr) * 2021-01-05 2023-03-24 Pfeiffer Vacuum Etage de pompage et pompe à vide sèche

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CN110506163B (zh) 2021-09-24
WO2018184853A1 (fr) 2018-10-11
CN110506163A (zh) 2019-11-26
TW201837310A (zh) 2018-10-16
TWI735764B (zh) 2021-08-11
EP3607204A1 (de) 2020-02-12
US11078910B2 (en) 2021-08-03
FR3065040A1 (fr) 2018-10-12
FR3065040B1 (fr) 2019-06-21
US20200191147A1 (en) 2020-06-18
JP2020513088A (ja) 2020-04-30
KR20190132483A (ko) 2019-11-27
KR102561996B1 (ko) 2023-07-31

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