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EP2890833A4 - IMPROVED CURRENT MEASUREMENT AND MANAGEMENT SYSTEM FOR ELECTROLYTE PLANTS - Google Patents

IMPROVED CURRENT MEASUREMENT AND MANAGEMENT SYSTEM FOR ELECTROLYTE PLANTS

Info

Publication number
EP2890833A4
EP2890833A4 EP13832519.6A EP13832519A EP2890833A4 EP 2890833 A4 EP2890833 A4 EP 2890833A4 EP 13832519 A EP13832519 A EP 13832519A EP 2890833 A4 EP2890833 A4 EP 2890833A4
Authority
EP
European Patent Office
Prior art keywords
management system
electric current
current sensing
improved electric
electrolytic plants
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP13832519.6A
Other languages
German (de)
English (en)
French (fr)
Other versions
EP2890833A1 (en
Inventor
Chris Boon
Rob Fraser
Baron Jorge Garcés
Gerald Gill
Tim Johnston
Noel Johnston
John Yesberg
Sebastien Nolet
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hatch Pty Ltd
Original Assignee
Hatch Pty Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hatch Pty Ltd filed Critical Hatch Pty Ltd
Publication of EP2890833A1 publication Critical patent/EP2890833A1/en
Publication of EP2890833A4 publication Critical patent/EP2890833A4/en
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
    • C25C7/00—Constructional parts, or assemblies thereof, of cells; Servicing or operating of cells
    • C25C7/06—Operating or servicing
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F13/00—Inhibiting corrosion of metals by anodic or cathodic protection
    • C23F13/02—Inhibiting corrosion of metals by anodic or cathodic protection cathodic; Selection of conditions, parameters or procedures for cathodic protection, e.g. of electrical conditions
    • C23F13/04—Controlling or regulating desired parameters
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F13/00—Inhibiting corrosion of metals by anodic or cathodic protection
    • C23F13/02—Inhibiting corrosion of metals by anodic or cathodic protection cathodic; Selection of conditions, parameters or procedures for cathodic protection, e.g. of electrical conditions
    • C23F13/06—Constructional parts, or assemblies of cathodic-protection apparatus
    • C23F13/08—Electrodes specially adapted for inhibiting corrosion by cathodic protection; Manufacture thereof; Conducting electric current thereto
    • C23F13/22—Monitoring arrangements therefor
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B15/00—Operating or servicing cells
    • C25B15/02—Process control or regulation
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
    • C25C1/00—Electrolytic production, recovery or refining of metals by electrolysis of solutions
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/004—Sealing devices
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/12—Process control or regulation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Mechanical Engineering (AREA)
  • Automation & Control Theory (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Water Treatment By Electricity Or Magnetism (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
EP13832519.6A 2012-08-28 2013-08-26 IMPROVED CURRENT MEASUREMENT AND MANAGEMENT SYSTEM FOR ELECTROLYTE PLANTS Withdrawn EP2890833A4 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201261694208P 2012-08-28 2012-08-28
US201361765142P 2013-02-15 2013-02-15
PCT/AU2013/000948 WO2014032085A1 (en) 2012-08-28 2013-08-26 Improved electric current sensing and management system for electrolytic plants

Publications (2)

Publication Number Publication Date
EP2890833A1 EP2890833A1 (en) 2015-07-08
EP2890833A4 true EP2890833A4 (en) 2016-06-15

Family

ID=50182246

Family Applications (1)

Application Number Title Priority Date Filing Date
EP13832519.6A Withdrawn EP2890833A4 (en) 2012-08-28 2013-08-26 IMPROVED CURRENT MEASUREMENT AND MANAGEMENT SYSTEM FOR ELECTROLYTE PLANTS

Country Status (9)

Country Link
US (1) US20150211136A1 (ru)
EP (1) EP2890833A4 (ru)
CN (1) CN104769164B (ru)
AP (1) AP2015008290A0 (ru)
AU (1) AU2013308380B2 (ru)
CL (1) CL2015000493A1 (ru)
IN (1) IN2015MN00426A (ru)
RU (1) RU2641289C2 (ru)
WO (1) WO2014032085A1 (ru)

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FI125515B (en) 2013-03-01 2015-11-13 Outotec Oyj A method of measuring and arranging an electric current flowing at a single electrode of an electrolysis system
TWI687550B (zh) * 2014-08-01 2020-03-11 義大利商第諾拉工業公司 金屬電煉電解槽之單位電池及其陽極元件，和從電解浴初步萃取金屬用之電解槽，以及從含亞銅離子和／或銅離子之溶液取得銅之製法
GB201603224D0 (en) * 2016-02-24 2016-04-06 Barker Michael H And Grant Duncan A Equipment for a metal electrowinning or liberator process and way of operating the process
ES2580552B1 (es) * 2016-04-29 2017-05-31 Industrie De Nora S.P.A. Ánodo seguro para celda electroquímica.
CN109722677B (zh) * 2017-10-30 2023-07-18 江西瑞林装备有限公司 电解槽面智能调度系统
CN108254611B (zh) * 2018-01-30 2020-07-28 北方工业大学 一种电极电流测量方法及系统
CN109100598B (zh) * 2018-10-23 2021-01-26 攀钢集团攀枝花钢铁研究院有限公司 用于流水线式镁电解槽单槽运行状态的判定方法
US11512404B2 (en) 2019-08-23 2022-11-29 Fabric8Labs, Inc. Matrix-controlled printhead for an electrochemical additive manufacturing system
US11521864B2 (en) 2019-08-23 2022-12-06 Fabric8Labs, Inc. Electrochemical additive manufacturing method using deposition feedback control
US10914000B1 (en) 2019-08-23 2021-02-09 Fabric8Labs, Inc. Method for manufacturing a printhead of an electrochemical additive manufacturing system
CN110501561A (zh) * 2019-09-27 2019-11-26 贵阳铝镁设计研究院有限公司 铝电解槽阳极电流分布在线检测系统及其方法
US11373085B2 (en) 2020-02-11 2022-06-28 International Business Machines Corporation IoT based fire prediction
JP7577547B2 (ja) 2021-01-20 2024-11-05 株式会社荏原製作所 めっき装置における短絡検知方法、めっき装置の制御方法、およびめっき装置
CN114182305B (zh) * 2021-12-31 2023-03-24 理纯(上海)洁净技术有限公司 一种半导体刻蚀液的金属回收系统

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US3792457A (en) * 1972-01-05 1974-02-12 Kennecott Copper Corp Detection device for indicating short circuits in electrolytic cells
US4375617A (en) * 1980-03-20 1983-03-01 Schweitzer Edmund O Jun Fault indicator with flux concentrating means
WO2003057945A2 (en) * 2002-01-10 2003-07-17 Coventry University Stabilisation of molten metal/molten electrolyte systems
US20040000485A1 (en) * 2002-06-28 2004-01-01 Axel Preusse Apparatus and method for electrochemical metal deposition
US7445696B2 (en) * 2004-03-17 2008-11-04 Kennecott Utah Copper Corporation Monitoring electrolytic cell currents
US20090134017A1 (en) * 2007-11-28 2009-05-28 Mehlin Dean Matthews System and method for isotope selective chemical reactions

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US3215609A (en) * 1962-12-04 1965-11-02 Conversion Chem Corp Electroplating test cell and method
GB1313298A (en) * 1969-06-27 1973-04-11 Ici Ltd Anode assembly for electrolytic cells
US3793166A (en) * 1970-01-07 1974-02-19 American Smelting Refining Electrical current measurement and rapidly locating and positively identifying cathodes having abnormal electrical conditions associated therewith in an electrolytic copper refining process tankhouse
US3794257A (en) * 1972-06-05 1974-02-26 Eastman Kodak Co Winding device for a thin flexible material
US5516412A (en) * 1995-05-16 1996-05-14 International Business Machines Corporation Vertical paddle plating cell
ITTO20010835A1 (it) * 2001-08-28 2003-02-28 Olpidurr Spa Cella tubolare di elettrodeposizione ed elettrodialisi.
JP4094515B2 (ja) 2003-09-26 2008-06-04 株式会社ルネサステクノロジ 半導体装置の製造方法
DE10347991A1 (de) * 2003-10-15 2005-05-12 Metallglanz Gmbh Reaktionsbehälter für das Hochgeschwindigkeitsbeschichten von Behandlungsgut mittels galvanischer Metallabscheidung
US7470356B2 (en) * 2004-03-17 2008-12-30 Kennecott Utah Copper Corporation Wireless monitoring of two or more electrolytic cells using one monitoring device
DE102005020734B8 (de) * 2005-05-04 2007-02-15 Gesellschaft für Schwerionenforschung mbH Elektrolytische Zellenanordnung
CN101849039B (zh) * 2007-07-31 2013-04-10 恩克泰克敏股份公司 用于监测、控制和管理用于实施有色金属的湿法冶金电解提取和电解精炼过程的设备的系统
US7993501B2 (en) 2007-11-07 2011-08-09 Freeport-Mcmoran Corporation Double contact bar insulator assembly for electrowinning of a metal and methods of use thereof
US7854825B2 (en) 2007-12-01 2010-12-21 William Ebert Symmetical double contact electro-winning
US20100065433A1 (en) * 2008-09-12 2010-03-18 Victor Vidaurre Heiremans System and apparatus for enhancing convection in electrolytes to achieve improved electrodeposition of copper and other non ferrous metals in industrial electrolytic cells
AU2011238427B2 (en) * 2010-04-07 2015-05-14 Mipac Pty Ltd Monitoring device
MX352248B (es) * 2010-08-11 2017-11-15 Outotec Oyj Aparato para usar en electrorefinación y electroextracción.
CN201924090U (zh) * 2010-09-24 2011-08-10 张大波 预焙阳极铝电解槽信息跟踪监控系统
US20130321111A1 (en) * 2011-07-14 2013-12-05 Robert Neville O'Brien Magnetizer utilizing rotated assemblies of permanent magnets

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3792457A (en) * 1972-01-05 1974-02-12 Kennecott Copper Corp Detection device for indicating short circuits in electrolytic cells
US4375617A (en) * 1980-03-20 1983-03-01 Schweitzer Edmund O Jun Fault indicator with flux concentrating means
WO2003057945A2 (en) * 2002-01-10 2003-07-17 Coventry University Stabilisation of molten metal/molten electrolyte systems
US20040000485A1 (en) * 2002-06-28 2004-01-01 Axel Preusse Apparatus and method for electrochemical metal deposition
US7445696B2 (en) * 2004-03-17 2008-11-04 Kennecott Utah Copper Corporation Monitoring electrolytic cell currents
US20090134017A1 (en) * 2007-11-28 2009-05-28 Mehlin Dean Matthews System and method for isotope selective chemical reactions

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of WO2014032085A1 *

Also Published As

Publication number Publication date
AU2013308380B2 (en) 2017-10-05
WO2014032085A1 (en) 2014-03-06
EP2890833A1 (en) 2015-07-08
RU2015110618A (ru) 2016-10-20
IN2015MN00426A (ru) 2015-09-04
CL2015000493A1 (es) 2015-07-10
AU2013308380A1 (en) 2015-03-19
RU2641289C2 (ru) 2018-01-17
AP2015008290A0 (en) 2015-02-28
CN104769164A (zh) 2015-07-08
CN104769164B (zh) 2017-06-13
US20150211136A1 (en) 2015-07-30

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RIN1 Information on inventor provided before grant (corrected)

Inventor name: NOLET, SEBASTIAN

Inventor name: GILL, GERALD

Inventor name: GARCES BARON, JORGE

Inventor name: JOHNSTON, TIM

Inventor name: JOHNSTON, NOEL

Inventor name: FRASER, ROB

Inventor name: BOON, CHRIS

Inventor name: YESBERG, JOHN

RIN1 Information on inventor provided before grant (corrected)

Inventor name: GARCES BARON, JORGE

Inventor name: JOHNSTON, NOEL

Inventor name: NOLET, SEBASTIEN

Inventor name: JOHNSTON, TIM

Inventor name: GILL, GERALD

Inventor name: YESBERG, JOHN

Inventor name: FRASER, ROB

Inventor name: BOON, CHRIS

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