EP2759874A1 - Circuit for preventing static electricity and display device having the same - Google Patents
Circuit for preventing static electricity and display device having the same Download PDFInfo
- Publication number
- EP2759874A1 EP2759874A1 EP14150424.1A EP14150424A EP2759874A1 EP 2759874 A1 EP2759874 A1 EP 2759874A1 EP 14150424 A EP14150424 A EP 14150424A EP 2759874 A1 EP2759874 A1 EP 2759874A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- static electricity
- clock signal
- electrode
- electricity prevention
- impurity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000005611 electricity Effects 0.000 title claims abstract description 134
- 230000003068 static effect Effects 0.000 title claims abstract description 133
- 230000002265 prevention Effects 0.000 claims abstract description 84
- 239000003990 capacitor Substances 0.000 claims abstract description 43
- 238000009413 insulation Methods 0.000 claims description 41
- 239000004065 semiconductor Substances 0.000 claims description 33
- 229910052751 metal Inorganic materials 0.000 claims description 27
- 239000002184 metal Substances 0.000 claims description 27
- 239000012535 impurity Substances 0.000 claims description 15
- 239000010410 layer Substances 0.000 description 86
- 239000011229 interlayer Substances 0.000 description 9
- 239000000758 substrate Substances 0.000 description 7
- 238000000034 method Methods 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 229910052814 silicon oxide Inorganic materials 0.000 description 5
- 239000000470 constituent Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 229910010272 inorganic material Inorganic materials 0.000 description 4
- 239000011147 inorganic material Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 238000000059 patterning Methods 0.000 description 3
- 229920001665 Poly-4-vinylphenol Polymers 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 239000011368 organic material Substances 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 229920005591 polysilicon Polymers 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000007717 exclusion Effects 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 239000012774 insulation material Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- -1 polyvinylpheno (PVI) Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/131—Interconnections, e.g. wiring lines or terminals
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D89/00—Aspects of integrated devices not covered by groups H10D84/00 - H10D88/00
- H10D89/60—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD]
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colourĀ
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colourĀ based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136204—Arrangements to prevent high voltage or static electricity failures
-
- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09G—ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
- G09G3/00—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes
- G09G3/20—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters
-
- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09G—ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
- G09G3/00—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes
- G09G3/20—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters
- G09G3/22—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters using controlled light sources
- G09G3/30—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters using controlled light sources using electroluminescent panels
- G09G3/32—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters using controlled light sources using electroluminescent panels semiconductive, e.g. using light-emitting diodes [LED]
- G09G3/3208—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters using controlled light sources using electroluminescent panels semiconductive, e.g. using light-emitting diodes [LED] organic, e.g. using organic light-emitting diodes [OLED]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/58—Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries
- H01L23/60—Protection against electrostatic charges or discharges, e.g. Faraday shields
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D64/00—Electrodes of devices having potential barriers
- H10D64/20—Electrodes characterised by their shapes, relative sizes or dispositionsĀ
- H10D64/27—Electrodes not carrying the current to be rectified, amplified, oscillated or switched, e.g. gates
- H10D64/311—Gate electrodes for field-effect devices
- H10D64/411—Gate electrodes for field-effect devices for FETs
- H10D64/511—Gate electrodes for field-effect devices for FETs for IGFETs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
- H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
- H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
- H10D86/60—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs wherein the TFTs are in active matrices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D89/00—Aspects of integrated devices not covered by groups H10D84/00 - H10D88/00
- H10D89/60—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD]
- H10D89/601—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD] for devices having insulated gate electrodes, e.g. for IGFETs or IGBTs
- H10D89/811—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD] for devices having insulated gate electrodes, e.g. for IGFETs or IGBTs using FETs as protective elements
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D89/00—Aspects of integrated devices not covered by groups H10D84/00 - H10D88/00
- H10D89/60—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD]
- H10D89/601—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD] for devices having insulated gate electrodes, e.g. for IGFETs or IGBTs
- H10D89/811—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD] for devices having insulated gate electrodes, e.g. for IGFETs or IGBTs using FETs as protective elements
- H10D89/813—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD] for devices having insulated gate electrodes, e.g. for IGFETs or IGBTs using FETs as protective elements specially adapted to provide an electrical current path other than the field-effect induced current path
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D89/00—Aspects of integrated devices not covered by groups H10D84/00 - H10D88/00
- H10D89/60—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD]
- H10D89/601—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD] for devices having insulated gate electrodes, e.g. for IGFETs or IGBTs
- H10D89/931—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD] for devices having insulated gate electrodes, e.g. for IGFETs or IGBTs characterised by the dispositions of the protective arrangements
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/121—Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements
- H10K59/1213—Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements the pixel elements being TFTs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/121—Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements
- H10K59/1216—Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements the pixel elements being capacitors
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2202/00—Materials and properties
- G02F2202/22—Antistatic materials or arrangements
-
- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09G—ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
- G09G2330/00—Aspects of power supply; Aspects of display protection and defect management
- G09G2330/04—Display protection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Definitions
- Embodiments of the present invention relate to a static electricity prevention circuit and a display device including the same.
- a flat display device such as an organic light emitting diode (OLED) display has several advantages, as compared to a cathode ray tube display, such as a decrease in size, thickness, and power consumption, and is capable of realizing images of full-color and high resolution. These advantages have led to flat display devices being widely applied in various fields.
- OLED display device has been used in computers, laptops, phones, TVs, audio/video devices, and the like.
- Such an OLED display displays an image by controlling the amount of driving current transmitted to an organic light emitting element according to an image data signal applied to each of a plurality of pixels arranged in a matrix format.
- a glass substrate is used as a substrate of the display device, but the glass substrate also acts as an insulator, so static electricity charges created during a panel manufacturing process collect on the glass substrate, thus causing foreign particles such as dusts to be easily attached to the glass substrate, thereby causing a process failure. Further, elements in the panel can be damaged due to the static electricity; therefore it is desirable for the collection of static electricity to be prevented in the flat display panel.
- a wire or a resistor for shielding static electricity is inserted into an edge of the display panel.
- a static electricity prevention circuit using a diode is installed between a wire for supplying a power source voltage for driving the display panel and a wire for supplying a signal for a lighting test.
- the conventional art such as the wire or the resistor for shielding static electricity, cannot effectively prevent static electricity from occurring in the large-sized display panel.
- damage caused by a short-circuit may frequently occur due to incidents such as a burst occurring in the static electricity prevention circuit as a result of high potential difference that is caused by the static electricity. Accordingly, driving of the display panel may fail.
- design of a display panel that is resistant to static electricity is used to prevent driving failure of the display panel, and to prevent damage to the display panel of the OLED display due to burst damage to the static electricity prevention circuit, and at the same time to effectively prevent occurrence of static electricity in the large-sized display panel.
- the present invention sets out to prevent inflow and occurrence of static electricity in a display panel to prevent malfunction and damage in the display panel, and to prevent manufacturing process failure of the display device due to the static electricity.
- the invention sets out to provide a static electricity prevention design circuit that can be effectively applied to a large-sized display panel in order to avoid driving failure due to the inflow of the static electricity in the display device, thereby providing a display panel having excellent quality.
- a static electricity prevention circuit of a display device including: a driving circuit configured to drive a display unit that displays an image; at least one clock signal wire configured to transmit a clock signal to the driving circuit, at least one transistor electrically coupled to the clock signal wire; and at least one capacitor including a first electrode coupled to a source electrode and to a drain electrode of the transistor, and a second electrode configured to be maintained at a voltage.
- the clock signal wire may be coupled with a gate electrode of the transistor through a gate metal wire.
- the transistor may include: a semiconductor layer including an impurity-doped area doped with a semiconductor impurity, and an intrinsic semiconductor area not doped with any semiconductor impurity; a gate electrode layer on the semiconductor layer; and a gate insulation layer between the gate electrode layer and the semiconductor layer, wherein the gate insulation layer is configured to create an electrical open or an electrical short-circuit by a static electricity current flowing through the clock signal wire.
- the impurity-doped area of the semiconductor layer may include: a first impurity-doped area; and a second impurity-doped area opposite to the first impurity-doped area and electrically coupled to a portion of the first impurity-doped area not overlapping the gate electrode layer.
- the static electricity prevention circuit may further include a capacitor including a first electrode that is electrically coupled to the impurity-doped area of the semiconductor layer, the capacitor being configured to accumulate an inflow static electricity current when the gate insulation layer is short-circuited.
- a display device including: a display unit including a plurality of pixels configured to display an image by emitting light based on a data voltage corresponding to an image data signal; a driving circuit configured to drive the display unit; at least one clock signal wire configured to transmit a clock signal to the driving circuit; and a static electricity prevention circuit including: at least one transistor electrically coupled to the clock signal wire; and at least one capacitor including a first electrode coupled to both of a source electrode and a drain electrode of the transistor, and a second electrode configured to be applied with a fixed voltage.
- the static electricity prevention circuit may be coupled between the clock signal wire and the driving circuit.
- the clock signal wire may be coupled to a gate electrode of the transistor of the static electricity prevention circuit through a gate metal wire.
- the transistor may include: a semiconductor layer including an impurity-doped area that is doped with a semiconductor impurity and is electrically coupled to the first electrode of the capacitor, and an intrinsic semiconductor layer that is not doped with any semiconductor impurity; a gate electrode layer on the semiconductor layer; and a gate insulation layer between the gate electrode layer and the semiconductor layer.
- the impurity-doped area of the semiconductor may include: a first impurity-doped area; and a second impurity-doped area opposite to the first impurity-doped area and electrically coupled to a portion of the first doped-impurity area not overlapping the gate electrode layer.
- the gate insulation layer may be configured to cause an electrical open circuit or to an electrical short-circuit due to a static electricity current flowing through at least one clock signal wire.
- the display device may further include a capacitor including a first electrode that is electrically coupled to the impurity-doped area of the semiconductor layer, the capacitor being configured to accumulate an inflow static electricity current when the gate insulation layer is short-circuited.
- FIG. 1 is a schematic diagram showing a static electricity prevention circuit of a display panel, according to an example embodiment of the present invention.
- the static electricity prevention circuit of the display panel is provided in a display device.
- the static electricity prevention circuit is provided in the display device that includes a display panel (or display unit) including a plurality of pixels for displaying an image and a driving circuit for driving the display panel.
- the static electricity prevention circuit may be provided between the driving circuit and a plurality of clock signal wires CL1 to CL4 for transmitting a clock signal to the driving circuit.
- the static electricity prevention circuit is provided in one side of the plurality of clock signals.
- the static electricity prevention circuit may be respectively electrically coupled (or electrically connected) to the clock signal wires to prevent, or to reduce the likelihood of, electrostatic discharge (ESD) flowing through the clock signal wires that transmit clock signals (e.g., predetermined clock signals) to the driving circuit, which transmits a gate signal or a scan signal to a pixel unit formed of a plurality of pixels that display an image, or to a data source output circuit in the display panel.
- ESD electrostatic discharge
- the static electricity prevention circuit is formed of static electricity prevention transistors and capacitors respectively coupled (or connected) to the clock signal wires CL1 to CL4.
- static electricity prevention circuits are electrically coupled to at least one of the plurality of clock signal wires, which transmit the plurality of clock signals, and are electrically coupled to capacitors, each of which has a first electrode electrically coupled with a source electrode and a drain electrode of the static electricity prevention transistor.
- FIG. 1 illustrates that the static electricity prevention circuit, according to the present example embodiment, includes three static electricity prevention transistors T1-T3 and three capacitors C1-C3, although the present invention is not limited thereto.
- the static electricity prevention circuit may include a plurality of static electricity prevention transistors and a plurality of capacitors corresponding to the plurality of clock signal wires.
- a static electricity prevention transistor T1 of the first line includes a source electrode 1 S and a drain electrode 1D, which are coupled to one another in the same line, and a gate electrode 1 G formed on top of the source electrode 1 S and the drain electrode 1D, with a gate insulation layer interposed between the gate electrode 1 G and the source and drain electrodes 1 S and 1D.
- the source electrode 1 S and the drain electrode 1D of the static electricity prevention transistor T1 of the first line are coupled to one another at lower portions thereof, and are separated from each other in upper portions where the gate electrode 1 G is layered.
- the gate electrode 1 G of the static electricity prevention transistor T1 is electrically coupled with the corresponding clock signal line CL3 through a gate metal wire GL1.
- the clock signal wire CL3 and the gate metal wire GL1 are electrically coupled through a plurality of contact holes CH, and the gate metal wire GL1 is extended in one side of the clock signal wires and is electrically coupled with the gate electrode 1 G of the static electricity prevention transistor T1 through a contact hole.
- the source electrode 1 S and the drain electrode 1D coupled with each other in the lower side of the static electricity prevention transistor T1, are both coupled to a first electrode CE1 of the capacitor C1 of the first line in the same layer.
- the capacitor C1 of the first line is formed of the first electrode CE1 coupled with both of the source electrode 1 S and the drain electrode 1D of the static electricity prevention transistor T1, an insulation layer layered on the first electrode CE1, and a second electrode FE layered on the insulation layer.
- the second electrode FE is a second electrode to each of the capacitors C1 to C3 forming the static electricity prevention circuit.
- a fixed voltage (e.g., a predetermined fixed voltage) is applied through the second electrode FE, and electrodes on one side of the plurality of capacitors forming the static electricity prevention circuit are set to a voltage of the fixed voltage.
- a static electricity prevention transistor and a capacitor that are coupled corresponding to the clock signal are formed in each line with the above-stated structure. That is, the static electricity prevention transistor T2 and the capacitor C2 are coupled to the clock signal wire CL2, and the static electricity prevention transistor T3 and the capacitor C3 are coupled to the clock signal wire CL1.
- the gate metal wires GL1 to GL3, which respectively electrically connect the clock signal wires CL1 to CL3 to the static electricity prevention circuit, are metal wires that are coupled for transmission of the clock signals to the driving circuits such as a data source output circuit, a gate driver, a scan driver, and the like.
- the static electricity prevention circuit which is coupled with the metal wires GL1 to GL3 between the clock signal wires and the driving circuit, is provided to prevent static electricity from flowing through the clock signal wires in the event that a gate metal wire that does not follow an antenna rule in a panel process is included in the gate metal wires.
- not following the antenna rule means that the ratio of an area of the extended gate metal wires to an area of the gate electrodes of the transistors coupled with the gate metal wires is greater than a particular value.
- the operation of the static electricity prevention circuit will be described.
- the gate insulation layer of the static electricity prevention transistor T2 coupled to the gate metal wire GL2, which does not follow the antenna rule, is burnt, or damaged, so as to prevent the external static electricity from being transmitted to other circuit elements in the display panel.
- static electricity prevention transistors that are not related to circuit operation of the image display in the display panel are added, and thus, when static electricity flows in through a part of the plurality of clock signal wires, a high or low static electricity current is induced to an added static electricity transistor, and the thinnest gate insulation layer among the static electricity prevention transistors is burnt to thereby protect the driving circuit of the display panel.
- the present example embodiment of the present invention is not limited to FIG. 1 , and at least one static electricity prevention circuit may be formed in a gate metal wire that couples the clock signal wire and the driving circuit.
- the second electrode FE of the capacitor which is coupled with the source electrode and the drain electrode of the static electricity prevention transistor, is applied with a fixed voltage and is maintained at the fixed voltage.
- the first electrode of the capacitor is coupled with the source electrode and the drain electrode of the static electricity prevention transistor to prevent an electrical short-circuit between the two electrodes of the capacitor during the conducting (or induction) of the static electricity, and the second electrode FE of the capacitor is coupled to a supply source of the fixed voltage.
- the meaning of the burning the gate insulation layer of the static electricity transistor by inducing the static electricity current may be changed depending on the amount of high-or-low-level static electricity current, but it implies that the static electricity current affects the gate insulation layer of the static electricity prevention circuit, thereby causing an electrical open (e.g., electrical open-circuit) or an electrical short-circuit.
- the static electricity prevention transistor When the static electricity prevention transistor is electrically opened, flow of electricity is ceased (or disconnected) so that external static electricity does not influence the operation of the circuit elements in the display panel.
- the static electricity prevention transistor when the static electricity prevention transistor is electricity short-circuited, an excessive amount of current flows through the static electricity prevention transistor, although the current is accumulated only in the first electrode of the capacitor, which is coupled with the source-drain electrode of the static electricity prevention transistor so that the corresponding capacitor maintains a voltage that is charged by as much as a difference between a static electricity voltage of the first electrode and the fixed voltage of the second electrode. Accordingly, the external static electricity can be prevented from flowing into the driving circuit of the display panel via the clock signal wires and the gate metal wires.
- FIG. 2 is a circuit diagram illustrating a basic unit "A" of the static electricity prevention circuit of FIG. 1 , according to the present example embodiment of the present invention.
- At least one transistor and at least one capacitor coupled to a gate metal wire that is electrically coupled with a corresponding one of a plurality of clock signal wires comprise a basic unit in the example embodiment of the present invention, and accordingly, the static electricity prevention circuit includes a plurality of such transistors and a plurality of such capacitors.
- the portion āAā is a basic unit of the static electricity prevention circuit, according to the present example embodiment of the present invention, and is a portion of the static electricity prevention circuit coupled to one of the plurality of clock signal wires (e.g., CL3 in FIG. 1 ).
- the portion āAā includes a static electricity prevention transistor T1 and a capacitor C1 of the first line that is coupled with a gate metal wire GL1, which is coupled with the clock signal wire CL3 in FIG. 3 .
- the static electricity prevention transistor T1 includes a gate electrode 1 G coupled with the gate metal wire GL1, which a clock signal or an external static electricity voltage is applied to, a source electrode 1 S, and a drain electrode 1D.
- the source electrode 1 S and the drain electrode 1D are commonly coupled to a first node N1.
- the capacitor C1 includes a first electrode that is coupled to the first node N1, and a second electrode that is coupled to a supply source that transmits a fixed voltage VDH.
- the capacitor C1 When an external static electricity current is induced to the gate electrode 1 G of the static electricity prevention transistor T1, and thus to a gate insulation layer, that is, a lower layer of the gate electrode is short-circuited, the capacitor C1 accumulates an excessive static electricity current in the first electrode. In addition, the capacitor C1 is charged with a voltage corresponding to a difference between the static electricity voltage accumulated in the first electrode and the fixed voltage VDH applied to the second electrode, and is maintained with the charged voltage. Then, the static electricity can be stored in the static electricity prevention circuit so that the static electricity cannot affect other circuit elements in the display panel, thereby protecting the display device from the static electricity.
- the gate insulation layer that is, the lower layer of the gate electrode, is electrically opened and thus electrically decoupled so that the static electricity cannot affect other circuit elements of the display panel.
- FIG. 3 is an enlarged cross-sectional view of the static electricity prevention circuit of FIG. 1 , taken along the line B-B' of FIG. 1 , according to the present example embodiment of the present invention.
- an insulation substrate may be provided depending on each constituent means in the lowest portion (or region) of the cross-sectional structure of the portion taken along the line B-B'.
- an insulation substrate and a buffer layer formed of silicon oxide may be formed in the lowest portions (or regions) of the static electricity prevention transistor T2 and the capacitor C2, but because such technical content is known in the art, further description of the cross-section of the static electricity prevention circuit structure will not be provided.
- the line B-B' is a line extended from the clock signal wire CL2 and then passing through the two clock signal wires CL3 and CL4, but for better comprehension and ease of description, the clock signal wires CL3 and CL4 that are not electrically coupled with the static electricity prevention transistor T2 will be omitted from FIG. 3 .
- the semiconductor layer SCL may be formed of, for example, polysilicon (Poly-Si).
- a gate insulation layer 20 is formed on the semiconductor layer SCL.
- a constituent material of the gate insulation layer 20 is not specifically restrictive, and may, for example, comprise: an inorganic material such as silicon oxide (SiO 2 ), silicon nitride (SiNx), and the like; a combination of the inorganic materials; and/or an organic material such as polyvinylpheno (PVI), polyimide, and the like.
- the gate insulation layer 20 is the thinnest layer, so that it may be burnt in the static electricity prevention transistor due to inflow of static electricity and thus may cause an electrical open or electrical short-circuit.
- a gate electrode layer 50 is formed by patterning in a portion above an area where the semiconductor layer SCL is formed.
- an impurity is doped using the gate electrode layer 50 as a doping prevention layer, and in the example embodiment of FIG. 3 , a p-type impurity is doped so that p-type impurity doping areas 11 and 12 are formed.
- An intrinsic semiconductor layer area 10 that is not doped with an impurity remains in the semiconductor layer SCL below a portion of the gate electrode layer 50.
- the p-type impurity doping areas 11 and 12 may respectively be formed as source and drain electrodes. Although it is not illustrated in FIG. 3 , the p-type impurity doping areas 11 and 12 may be coupled with each other so that a common node may be formed in another location of the static electricity prevention transistor T2. In addition, a conductive layer 70 of the capacitor C2 is formed in the same layer as the common node. That is, the p-type impurity doping areas 11 and 12 are coupled with each other and the conductive layer 70 is coupled with the p-type impurity doping areas 11 and 12, and forms a first electrode CE2 of the capacitor C2.
- a clock signal wire 40 may be formed by patterning in an area (e.g., a predetermined area) after the gate insulation layer 20 is formed.
- the present embodiment is not limited thereto, and the clock signal wire 40 may be formed through a process that is separate from a process of forming the static electricity prevention circuit.
- the clock signal wire 40 is a metal wire for transmitting a clock signal to the driving circuit from a controller.
- a material forming the metal wire is not restrictive, and may be a conductive material or an alloy thereof.
- the metal wire may be formed of a metal material such as molybdenum (Mo), tantalum (Ta), cobalt (Co), and the like or an alloy thereof.
- an interlayer insulation layer 30 may be formed on the gate electrode layer 50.
- FIG. 3 illustrates that the interlayer insulation layer 30 is formed such that it extends to an upper portion of the clock signal wire 40, but the example embodiment is not limited thereto.
- a material of the interlayer insulation layer 30 is not particularly restrictive, but, like the gate insulation layer 20, the interlayer insulation layer 30 may, for example, be formed of: an inorganic material such as silicon oxide (SiO 2 ), silicon nitride (SiNx), and the like; a combination of the inorganic materials; or an organic material such as polyvinylphenol (PVP), polyimide, and the like.
- the interlayer insulation layer 30 is formed as a single layer, but may be formed of at least two layers.
- the interlayer insulation layer 30 may be formed of the same insulation material of the gate insulation layer, or may be formed of a different material.
- the gate metal wire 60 may be formed of a conductive metallic material, although it is not limited thereto.
- the gate metal wire 60 may be formed of a conductive material, such as titanium (Ti), aluminum (Al), and the like, or an alloy thereof.
- the gate metal wire 60 (GL2) electrically connects the clock signal wire 40, which has been patterned and exposed, and the gate electrode layer 50 through the contact holes in the interlayer insulation layer 30 that expose the clock signal wire 40 and the gate electrode layer 50.
- the static electricity current flowing from the clock signal wire 40 is transmitted to the gate electrode layer 50.
- the gate insulation layer 20, being between the gate electrode layer 50 and the semiconductor layer SCL, is burnt and thus electrically opened or short-circuited.
- the conductive layer is formed as the first electrode 70 of the capacitor C2, an insulation layer 80 is layered thereon. Then, a conductive layer is formed on the insulation layer 80 as a second electrode 90 of the capacitor C2. A fixed voltage may be applied to the second electrode 90.
- the gate insulation layer 20 of the static electricity prevention transistor T2 is short-circuited due to static electricity current, the static electricity current is collected in the first electrode 70 of the capacitor C2, to which the source electrode and the drain electrode, which are the impurity-doped areas 11 and 12 of the semiconductor SCL, are coupled. As a result, the static electricity current does not flow into other circuit elements of the display panel.
- layers that can be formed in the upper portions of the gate metal wire 60 (GL2) and the second electrode 90 of the capacitor C2 may be known layers, such as an interlayer insulation layer, a protection layer, and the like, and those layers can be formed through a manufacturing process of a display panel. As this represents common knowledge in the art, no further description will be provided.
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Computer Hardware Design (AREA)
- Theoretical Computer Science (AREA)
- Optics & Photonics (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Power Engineering (AREA)
- Geometry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Thin Film Transistor (AREA)
- Liquid Crystal (AREA)
- Semiconductor Integrated Circuits (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Control Of Indicators Other Than Cathode Ray Tubes (AREA)
- Electroluminescent Light Sources (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Abstract
Description
- Embodiments of the present invention relate to a static electricity prevention circuit and a display device including the same.
- In general, a flat display device such as an organic light emitting diode (OLED) display has several advantages, as compared to a cathode ray tube display, such as a decrease in size, thickness, and power consumption, and is capable of realizing images of full-color and high resolution. These advantages have led to flat display devices being widely applied in various fields. Currently, the OLED display device has been used in computers, laptops, phones, TVs, audio/video devices, and the like.
- Such an OLED display displays an image by controlling the amount of driving current transmitted to an organic light emitting element according to an image data signal applied to each of a plurality of pixels arranged in a matrix format.
- Generally, a glass substrate is used as a substrate of the display device, but the glass substrate also acts as an insulator, so static electricity charges created during a panel manufacturing process collect on the glass substrate, thus causing foreign particles such as dusts to be easily attached to the glass substrate, thereby causing a process failure. Further, elements in the panel can be damaged due to the static electricity; therefore it is desirable for the collection of static electricity to be prevented in the flat display panel.
- Conventionally, a wire or a resistor for shielding static electricity is inserted into an edge of the display panel. In addition, a static electricity prevention circuit using a diode is installed between a wire for supplying a power source voltage for driving the display panel and a wire for supplying a signal for a lighting test.
- However, as the display size has increased, the occurrence of static charge has become more frequent during the manufacturing process and module assembling. Thus, the conventional art, such as the wire or the resistor for shielding static electricity, cannot effectively prevent static electricity from occurring in the large-sized display panel. In addition, when the static electricity prevention circuit is installed, damage caused by a short-circuit may frequently occur due to incidents such as a burst occurring in the static electricity prevention circuit as a result of high potential difference that is caused by the static electricity. Accordingly, driving of the display panel may fail.
- Therefore, design of a display panel that is resistant to static electricity is used to prevent driving failure of the display panel, and to prevent damage to the display panel of the OLED display due to burst damage to the static electricity prevention circuit, and at the same time to effectively prevent occurrence of static electricity in the large-sized display panel.
- The above information disclosed in this Background section is only for enhancement of understanding of the background of the invention, and therefore it may contain information that does not form the prior art that is already known in this country to a person of ordinary skill in the art.
- The present invention sets out to prevent inflow and occurrence of static electricity in a display panel to prevent malfunction and damage in the display panel, and to prevent manufacturing process failure of the display device due to the static electricity.
- In addition, the invention sets out to provide a static electricity prevention design circuit that can be effectively applied to a large-sized display panel in order to avoid driving failure due to the inflow of the static electricity in the display device, thereby providing a display panel having excellent quality.
- According to one aspect of the present invention, there is provided a static electricity prevention circuit of a display device including: a driving circuit configured to drive a display unit that displays an image; at least one clock signal wire configured to transmit a clock signal to the driving circuit, at least one transistor electrically coupled to the clock signal wire; and at least one capacitor including a first electrode coupled to a source electrode and to a drain electrode of the transistor, and a second electrode configured to be maintained at a voltage.
- The clock signal wire may be coupled with a gate electrode of the transistor through a gate metal wire.
- The transistor may include: a semiconductor layer including an impurity-doped area doped with a semiconductor impurity, and an intrinsic semiconductor area not doped with any semiconductor impurity; a gate electrode layer on the semiconductor layer; and a gate insulation layer between the gate electrode layer and the semiconductor layer, wherein the gate insulation layer is configured to create an electrical open or an electrical short-circuit by a static electricity current flowing through the clock signal wire.
- The impurity-doped area of the semiconductor layer may include: a first impurity-doped area; and a second impurity-doped area opposite to the first impurity-doped area and electrically coupled to a portion of the first impurity-doped area not overlapping the gate electrode layer.
- The static electricity prevention circuit may further include a capacitor including a first electrode that is electrically coupled to the impurity-doped area of the semiconductor layer, the capacitor being configured to accumulate an inflow static electricity current when the gate insulation layer is short-circuited.
- According to another aspect the present invention, there is provided a display device including: a display unit including a plurality of pixels configured to display an image by emitting light based on a data voltage corresponding to an image data signal; a driving circuit configured to drive the display unit; at least one clock signal wire configured to transmit a clock signal to the driving circuit; and a static electricity prevention circuit including: at least one transistor electrically coupled to the clock signal wire; and at least one capacitor including a first electrode coupled to both of a source electrode and a drain electrode of the transistor, and a second electrode configured to be applied with a fixed voltage.
- The static electricity prevention circuit may be coupled between the clock signal wire and the driving circuit.
- The clock signal wire may be coupled to a gate electrode of the transistor of the static electricity prevention circuit through a gate metal wire.
- The transistor may include: a semiconductor layer including an impurity-doped area that is doped with a semiconductor impurity and is electrically coupled to the first electrode of the capacitor, and an intrinsic semiconductor layer that is not doped with any semiconductor impurity; a gate electrode layer on the semiconductor layer; and a gate insulation layer between the gate electrode layer and the semiconductor layer.
- The impurity-doped area of the semiconductor may include: a first impurity-doped area; and a second impurity-doped area opposite to the first impurity-doped area and electrically coupled to a portion of the first doped-impurity area not overlapping the gate electrode layer.
- The gate insulation layer may be configured to cause an electrical open circuit or to an electrical short-circuit due to a static electricity current flowing through at least one clock signal wire.
- The display device may further include a capacitor including a first electrode that is electrically coupled to the impurity-doped area of the semiconductor layer, the capacitor being configured to accumulate an inflow static electricity current when the gate insulation layer is short-circuited.
- At least some of the above and other features of the invention are set out in the claims.
-
-
FIG. 1 is a schematic diagram showing a static electricity prevention circuit of a display panel, according to an example embodiment of the present invention. -
FIG. 2 is a circuit diagram of a basic unit of the static electricity prevention circuit of the embodiment shown inFIG. 1 , according to an example embodiment of the present invention. -
FIG. 3 is an enlarged cross-sectional view of a portion in the static electricity prevention circuit of the embodiment shown inFIG. 1 , taken along the line B-B', according to the example embodiment of the present invention shown inFIG. 1 . - Hereinafter, embodiments of the present invention will be described more fully with reference to the accompanying drawings, in which example embodiments of the invention are shown. As those skilled in the art would realize, the described embodiments may be modified in various different ways, all without departing from the spirit or scope of the present invention.
- The unrelated parts to the description of the example embodiments may be omitted to make the description clear. Further, like reference numerals designate like element throughout the specification.
- Throughout this specification and the claims that follow, when it is described that an element is "coupled" to another element, the element may be "directly coupled" to the other element, or may be "electrically coupled" to the other element through one or more other elements. In addition, unless explicitly described to the contrary, the word "comprise," and variations such as "comprises" or "comprising," will be understood to imply the inclusion of stated elements, although not necessarily to the exclusion of any other elements.
-
FIG. 1 is a schematic diagram showing a static electricity prevention circuit of a display panel, according to an example embodiment of the present invention. - Referring to
FIG. 1 , the static electricity prevention circuit of the display panel, according to the present example embodiment of the present invention is provided in a display device. In an example embodiment, the static electricity prevention circuit is provided in the display device that includes a display panel (or display unit) including a plurality of pixels for displaying an image and a driving circuit for driving the display panel. In further detail, the static electricity prevention circuit may be provided between the driving circuit and a plurality of clock signal wires CL1 to CL4 for transmitting a clock signal to the driving circuit. InFIG. 1 , the static electricity prevention circuit is provided in one side of the plurality of clock signals. - That is, the static electricity prevention circuit, according to the present example embodiment of the present invention, may be respectively electrically coupled (or electrically connected) to the clock signal wires to prevent, or to reduce the likelihood of, electrostatic discharge (ESD) flowing through the clock signal wires that transmit clock signals (e.g., predetermined clock signals) to the driving circuit, which transmits a gate signal or a scan signal to a pixel unit formed of a plurality of pixels that display an image, or to a data source output circuit in the display panel.
- Referring to
FIG. 1 , the static electricity prevention circuit, according to the present example embodiment, is formed of static electricity prevention transistors and capacitors respectively coupled (or connected) to the clock signal wires CL1 to CL4. - That is, static electricity prevention circuits are electrically coupled to at least one of the plurality of clock signal wires, which transmit the plurality of clock signals, and are electrically coupled to capacitors, each of which has a first electrode electrically coupled with a source electrode and a drain electrode of the static electricity prevention transistor.
-
FIG. 1 illustrates that the static electricity prevention circuit, according to the present example embodiment, includes three static electricity prevention transistors T1-T3 and three capacitors C1-C3, although the present invention is not limited thereto. The static electricity prevention circuit may include a plurality of static electricity prevention transistors and a plurality of capacitors corresponding to the plurality of clock signal wires. InFIG. 1 , a static electricity prevention transistor T1 of the first line includes asource electrode 1 S and adrain electrode 1D, which are coupled to one another in the same line, and agate electrode 1 G formed on top of thesource electrode 1 S and thedrain electrode 1D, with a gate insulation layer interposed between thegate electrode 1 G and the source anddrain electrodes source electrode 1 S and thedrain electrode 1D of the static electricity prevention transistor T1 of the first line are coupled to one another at lower portions thereof, and are separated from each other in upper portions where thegate electrode 1 G is layered. - In addition, the
gate electrode 1 G of the static electricity prevention transistor T1 is electrically coupled with the corresponding clock signal line CL3 through a gate metal wire GL1. The clock signal wire CL3 and the gate metal wire GL1 are electrically coupled through a plurality of contact holes CH, and the gate metal wire GL1 is extended in one side of the clock signal wires and is electrically coupled with thegate electrode 1 G of the static electricity prevention transistor T1 through a contact hole. - In addition, the
source electrode 1 S and thedrain electrode 1D, coupled with each other in the lower side of the static electricity prevention transistor T1, are both coupled to a first electrode CE1 of the capacitor C1 of the first line in the same layer. The capacitor C1 of the first line is formed of the first electrode CE1 coupled with both of thesource electrode 1 S and thedrain electrode 1D of the static electricity prevention transistor T1, an insulation layer layered on the first electrode CE1, and a second electrode FE layered on the insulation layer. As shown inFIG. 1 , as a single conductive layer, the second electrode FE is a second electrode to each of the capacitors C1 to C3 forming the static electricity prevention circuit. A fixed voltage (e.g., a predetermined fixed voltage) is applied through the second electrode FE, and electrodes on one side of the plurality of capacitors forming the static electricity prevention circuit are set to a voltage of the fixed voltage. - In the example embodiment of
FIG. 1 , a static electricity prevention transistor and a capacitor that are coupled corresponding to the clock signal are formed in each line with the above-stated structure. That is, the static electricity prevention transistor T2 and the capacitor C2 are coupled to the clock signal wire CL2, and the static electricity prevention transistor T3 and the capacitor C3 are coupled to the clock signal wire CL1. - The gate metal wires GL1 to GL3, which respectively electrically connect the clock signal wires CL1 to CL3 to the static electricity prevention circuit, are metal wires that are coupled for transmission of the clock signals to the driving circuits such as a data source output circuit, a gate driver, a scan driver, and the like. The static electricity prevention circuit, which is coupled with the metal wires GL1 to GL3 between the clock signal wires and the driving circuit, is provided to prevent static electricity from flowing through the clock signal wires in the event that a gate metal wire that does not follow an antenna rule in a panel process is included in the gate metal wires.
- Here, "not following the antenna rule" means that the ratio of an area of the extended gate metal wires to an area of the gate electrodes of the transistors coupled with the gate metal wires is greater than a particular value.
- Herein, the operation of the static electricity prevention circuit, according to an example embodiment of the present invention, will be described. As shown in
FIG. 1 , when an external static electricity flows through the clock signal wire CL2, the gate insulation layer of the static electricity prevention transistor T2 coupled to the gate metal wire GL2, which does not follow the antenna rule, is burnt, or damaged, so as to prevent the external static electricity from being transmitted to other circuit elements in the display panel. That is, static electricity prevention transistors that are not related to circuit operation of the image display in the display panel are added, and thus, when static electricity flows in through a part of the plurality of clock signal wires, a high or low static electricity current is induced to an added static electricity transistor, and the thinnest gate insulation layer among the static electricity prevention transistors is burnt to thereby protect the driving circuit of the display panel. - The present example embodiment of the present invention is not limited to
FIG. 1 , and at least one static electricity prevention circuit may be formed in a gate metal wire that couples the clock signal wire and the driving circuit. - To conduct (or induct) the external static electricity current to the static electricity prevention transistor, the second electrode FE of the capacitor, which is coupled with the source electrode and the drain electrode of the static electricity prevention transistor, is applied with a fixed voltage and is maintained at the fixed voltage. The first electrode of the capacitor is coupled with the source electrode and the drain electrode of the static electricity prevention transistor to prevent an electrical short-circuit between the two electrodes of the capacitor during the conducting (or induction) of the static electricity, and the second electrode FE of the capacitor is coupled to a supply source of the fixed voltage.
- Here, the meaning of the burning the gate insulation layer of the static electricity transistor by inducing the static electricity current may be changed depending on the amount of high-or-low-level static electricity current, but it implies that the static electricity current affects the gate insulation layer of the static electricity prevention circuit, thereby causing an electrical open (e.g., electrical open-circuit) or an electrical short-circuit.
- When the static electricity prevention transistor is electrically opened, flow of electricity is ceased (or disconnected) so that external static electricity does not influence the operation of the circuit elements in the display panel. In addition, when the static electricity prevention transistor is electricity short-circuited, an excessive amount of current flows through the static electricity prevention transistor, although the current is accumulated only in the first electrode of the capacitor, which is coupled with the source-drain electrode of the static electricity prevention transistor so that the corresponding capacitor maintains a voltage that is charged by as much as a difference between a static electricity voltage of the first electrode and the fixed voltage of the second electrode. Accordingly, the external static electricity can be prevented from flowing into the driving circuit of the display panel via the clock signal wires and the gate metal wires.
-
FIG. 2 is a circuit diagram illustrating a basic unit "A" of the static electricity prevention circuit ofFIG. 1 , according to the present example embodiment of the present invention. - At least one transistor and at least one capacitor coupled to a gate metal wire that is electrically coupled with a corresponding one of a plurality of clock signal wires comprise a basic unit in the example embodiment of the present invention, and accordingly, the static electricity prevention circuit includes a plurality of such transistors and a plurality of such capacitors.
- Thus, the portion "A" is a basic unit of the static electricity prevention circuit, according to the present example embodiment of the present invention, and is a portion of the static electricity prevention circuit coupled to one of the plurality of clock signal wires (e.g., CL3 in
FIG. 1 ). For example, the portion "A" includes a static electricity prevention transistor T1 and a capacitor C1 of the first line that is coupled with a gate metal wire GL1, which is coupled with the clock signal wire CL3 inFIG. 3 . - The static electricity prevention transistor T1 includes a
gate electrode 1 G coupled with the gate metal wire GL1, which a clock signal or an external static electricity voltage is applied to, asource electrode 1 S, and adrain electrode 1D. Thesource electrode 1 S and thedrain electrode 1D are commonly coupled to a first node N1. - The capacitor C1 includes a first electrode that is coupled to the first node N1, and a second electrode that is coupled to a supply source that transmits a fixed voltage VDH.
- When an external static electricity current is induced to the
gate electrode 1 G of the static electricity prevention transistor T1, and thus to a gate insulation layer, that is, a lower layer of the gate electrode is short-circuited, the capacitor C1 accumulates an excessive static electricity current in the first electrode. In addition, the capacitor C1 is charged with a voltage corresponding to a difference between the static electricity voltage accumulated in the first electrode and the fixed voltage VDH applied to the second electrode, and is maintained with the charged voltage. Then, the static electricity can be stored in the static electricity prevention circuit so that the static electricity cannot affect other circuit elements in the display panel, thereby protecting the display device from the static electricity. - Alternatively, when external static electricity is induced to the
gate electrode 1 G of the static electricity prevention transistor T1, the gate insulation layer, that is, the lower layer of the gate electrode, is electrically opened and thus electrically decoupled so that the static electricity cannot affect other circuit elements of the display panel. -
FIG. 3 is an enlarged cross-sectional view of the static electricity prevention circuit ofFIG. 1 , taken along the line B-B' ofFIG. 1 , according to the present example embodiment of the present invention. - Although not illustrated in
FIG. 3 , an insulation substrate may be provided depending on each constituent means in the lowest portion (or region) of the cross-sectional structure of the portion taken along the line B-B'. - That is, an insulation substrate and a buffer layer formed of silicon oxide may be formed in the lowest portions (or regions) of the static electricity prevention transistor T2 and the capacitor C2, but because such technical content is known in the art, further description of the cross-section of the static electricity prevention circuit structure will not be provided.
- In addition, the line B-B' is a line extended from the clock signal wire CL2 and then passing through the two clock signal wires CL3 and CL4, but for better comprehension and ease of description, the clock signal wires CL3 and CL4 that are not electrically coupled with the static electricity prevention transistor T2 will be omitted from
FIG. 3 . - Referring to
FIG. 3 , first, a semiconductor layer SCL of the static electricity prevention transistor T2 is formed. The semiconductor layer SCL may be formed of, for example, polysilicon (Poly-Si). - A
gate insulation layer 20 is formed on the semiconductor layer SCL. A constituent material of thegate insulation layer 20 is not specifically restrictive, and may, for example, comprise: an inorganic material such as silicon oxide (SiO2), silicon nitride (SiNx), and the like; a combination of the inorganic materials; and/or an organic material such as polyvinylpheno (PVI), polyimide, and the like. In general, thegate insulation layer 20 is the thinnest layer, so that it may be burnt in the static electricity prevention transistor due to inflow of static electricity and thus may cause an electrical open or electrical short-circuit. - After the
gate insulation layer 20 is formed, agate electrode layer 50 is formed by patterning in a portion above an area where the semiconductor layer SCL is formed. - After the
gate electrode layer 50 is patterned, an impurity is doped using thegate electrode layer 50 as a doping prevention layer, and in the example embodiment ofFIG. 3 , a p-type impurity is doped so that p-typeimpurity doping areas semiconductor layer area 10 that is not doped with an impurity remains in the semiconductor layer SCL below a portion of thegate electrode layer 50. - The p-type
impurity doping areas FIG. 3 , the p-typeimpurity doping areas conductive layer 70 of the capacitor C2 is formed in the same layer as the common node. That is, the p-typeimpurity doping areas conductive layer 70 is coupled with the p-typeimpurity doping areas - Meanwhile, a
clock signal wire 40 may be formed by patterning in an area (e.g., a predetermined area) after thegate insulation layer 20 is formed. However, the present embodiment is not limited thereto, and theclock signal wire 40 may be formed through a process that is separate from a process of forming the static electricity prevention circuit. - The
clock signal wire 40 is a metal wire for transmitting a clock signal to the driving circuit from a controller. A material forming the metal wire is not restrictive, and may be a conductive material or an alloy thereof. For example, the metal wire may be formed of a metal material such as molybdenum (Mo), tantalum (Ta), cobalt (Co), and the like or an alloy thereof. - After the
gate electrode layer 50 is formed, aninterlayer insulation layer 30 may be formed on thegate electrode layer 50.FIG. 3 illustrates that theinterlayer insulation layer 30 is formed such that it extends to an upper portion of theclock signal wire 40, but the example embodiment is not limited thereto. - A material of the
interlayer insulation layer 30 is not particularly restrictive, but, like thegate insulation layer 20, theinterlayer insulation layer 30 may, for example, be formed of: an inorganic material such as silicon oxide (SiO2), silicon nitride (SiNx), and the like; a combination of the inorganic materials; or an organic material such as polyvinylphenol (PVP), polyimide, and the like. InFIG. 3 , theinterlayer insulation layer 30 is formed as a single layer, but may be formed of at least two layers. In addition, theinterlayer insulation layer 30 may be formed of the same insulation material of the gate insulation layer, or may be formed of a different material. - After the
interlayer insulation layer 30 is formed, theclock signal wire 40 and thegate electrode layer 50 are partially exposed by patterning, and then a gate metal wire 60 (e.g., GL2) is formed. The gate metal wire 60 (GL2) may be formed of a conductive metallic material, although it is not limited thereto. For example, thegate metal wire 60 may be formed of a conductive material, such as titanium (Ti), aluminum (Al), and the like, or an alloy thereof. - The gate metal wire 60 (GL2) electrically connects the
clock signal wire 40, which has been patterned and exposed, and thegate electrode layer 50 through the contact holes in theinterlayer insulation layer 30 that expose theclock signal wire 40 and thegate electrode layer 50. - Hence, the static electricity current flowing from the
clock signal wire 40 is transmitted to thegate electrode layer 50. Then, thegate insulation layer 20, being between thegate electrode layer 50 and the semiconductor layer SCL, is burnt and thus electrically opened or short-circuited. - Meanwhile, after the conductive layer is formed as the
first electrode 70 of the capacitor C2, aninsulation layer 80 is layered thereon. Then, a conductive layer is formed on theinsulation layer 80 as asecond electrode 90 of the capacitor C2. A fixed voltage may be applied to thesecond electrode 90. Thus, when thegate insulation layer 20 of the static electricity prevention transistor T2 is short-circuited due to static electricity current, the static electricity current is collected in thefirst electrode 70 of the capacitor C2, to which the source electrode and the drain electrode, which are the impurity-dopedareas - In the example embodiment of
FIG. 3 , layers that can be formed in the upper portions of the gate metal wire 60 (GL2) and thesecond electrode 90 of the capacitor C2 may be known layers, such as an interlayer insulation layer, a protection layer, and the like, and those layers can be formed through a manufacturing process of a display panel. As this represents common knowledge in the art, no further description will be provided. - While this invention has been described in connection with what is presently considered to be practical example embodiments, it is to be understood that the invention is not limited to the disclosed embodiments, but, on the contrary, is intended to cover various modifications and equivalent arrangements included within the scope of the appended claims. Accordingly, those skilled in the art can choose and replace from the detailed description. Further, a person of ordinary skill in the art may remove a part of the constituent elements described in the specification without deterioration of performance or add constituent elements to improve performance. In addition, a person of ordinary skill in the art may change the order of the steps of the method described in the specification depending on process environment or equipment.
Claims (9)
- A static electricity prevention circuit of a display device, which display device comprises:a driving circuit configured to drive a display unit that displays an image; andat least one clock signal wire configured to transmit a clock signal to the driving circuit;the said static electricity prevention circuit comprising:at least one transistor electrically coupled to the clock signal wire; andat least one capacitor comprising a first electrode coupled to a source electrode and to a drain electrode of the transistor, and a second electrode configured to be maintained at a voltage.
- A static electricity prevention circuit according to claim 1, wherein the clock signal wire is coupled with a gate electrode of the transistor through a gate metal wire.
- A static electricity prevention circuit according to claim 1 or 2, wherein the transistor comprises:a semiconductor layer comprising an impurity-doped area doped with a semiconductor impurity, and an intrinsic semiconductor area not doped with any semiconductor impurity;a gate electrode layer on the semiconductor layer; anda gate insulation layer between the gate electrode layer and the semiconductor layer.
- A static electricity prevention circuit according to claim 3, wherein the gate insulation layer is configured to create an electrical open or an electrical short-circuit by a static electricity current flowing through the clock signal wire.
- A static electricity prevention circuit according to claim 4, further comprising a capacitor comprising a first electrode that is electrically coupled to the impurity-doped area of the semiconductor layer, the capacitor being configured to accumulate an inflow static electricity current when the gate insulation layer is short-circuited.
- A static electricity prevention circuit according to claim 3, 4 or 5, wherein the impurity-doped area of the semiconductor layer comprises:a first impurity-doped area; anda second impurity-doped area opposite to the first impurity-doped area and electrically coupled to a portion of the first impurity-doped area not overlapping the gate electrode layer.
- A static electricity prevention circuit according to one of claims 3 to 6, further comprising a capacitor comprising a first electrode that is electrically coupled to the impurity-doped area of the semiconductor layer, the capacitor being configured to accumulate an inflow static electricity current when the gate insulation layer is short-circuited.
- A display device comprising:a display unit comprising a plurality of pixels configured to display an image by emitting light based on a data voltage corresponding to an image data signal;a driving circuit configured to drive the display unit;at least one clock signal wire configured to transmit a clock signal to the driving circuit; anda static electricity prevention circuit according to any preceding claim.
- A display device according to claim 8, wherein the static electricity prevention circuit is coupled between the clock signal wire and the driving circuit.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020130009434A KR102000738B1 (en) | 2013-01-28 | 2013-01-28 | Circuit for preventing static electricity and display device comprising the same |
Publications (2)
Publication Number | Publication Date |
---|---|
EP2759874A1 true EP2759874A1 (en) | 2014-07-30 |
EP2759874B1 EP2759874B1 (en) | 2017-04-05 |
Family
ID=50023412
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP14150424.1A Active EP2759874B1 (en) | 2013-01-28 | 2014-01-08 | Circuit for preventing static electricity and display device having the same |
Country Status (6)
Country | Link |
---|---|
US (5) | US9058770B2 (en) |
EP (1) | EP2759874B1 (en) |
JP (1) | JP2014146777A (en) |
KR (1) | KR102000738B1 (en) |
CN (1) | CN103972228B (en) |
TW (1) | TW201430807A (en) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102000738B1 (en) * | 2013-01-28 | 2019-07-23 | ģ¼ģ±ėģ¤ķė ģ“ ģ£¼ģķģ¬ | Circuit for preventing static electricity and display device comprising the same |
CN104749844A (en) * | 2015-04-16 | 2015-07-01 | äøęµ·äøčŖå ēµåęéå ¬åø | Electrostatic protection circuit, array substrate, display panel and display device |
KR102381283B1 (en) * | 2015-07-24 | 2022-03-31 | ģ¼ģ±ėģ¤ķė ģ“ ģ£¼ģķģ¬ | Display apparatus |
KR102018440B1 (en) | 2017-12-11 | 2019-09-04 | ķźµģķģ°źµ¬ģ | Cellar and operation process of the same |
KR101989703B1 (en) | 2017-12-12 | 2019-06-14 | ķźµģķģ°źµ¬ģ | Process for removing harmful gas in cellar |
KR102508468B1 (en) * | 2018-02-08 | 2023-03-10 | ģ¼ģ±ėģ¤ķė ģ“ ģ£¼ģķģ¬ | Display device |
KR102505620B1 (en) * | 2018-07-06 | 2023-03-02 | ģģ§ėģ¤ķė ģ“ ģ£¼ģķģ¬ | Display panel, display device |
KR102498797B1 (en) * | 2018-09-28 | 2023-02-10 | ģ¼ģ±ėģ¤ķė ģ“ ģ£¼ģķģ¬ | Organic light emitting diode display device |
CN208904019U (en) * | 2018-11-22 | 2019-05-24 | äŗ¬äøę¹ē§ęéå¢č”份ęéå ¬åø | Display substrate, electrostatic discharge protection circuit and display device |
KR102595457B1 (en) * | 2018-11-26 | 2023-10-27 | ģģ§ėģ¤ķė ģ“ ģ£¼ģķģ¬ | Array substrate of organic light emitting display device including electrostatic force prevention circuit |
KR102752455B1 (en) * | 2019-09-09 | 2025-01-09 | ģ¼ģ±ėģ¤ķė ģ“ ģ£¼ģķģ¬ | Emission signal driver and display device including the same |
CN110767149B (en) * | 2019-11-18 | 2021-10-22 | åč„äŗ¬äøę¹åå°ē§ęęéå ¬åø | Gate drive circuit, display device and repairing method |
CN111243473A (en) * | 2020-03-11 | 2020-06-05 | Tclåęå ēµęęÆęéå ¬åø | Source driver electrostatic ignition protection method and display device |
CN111240113B (en) * | 2020-03-11 | 2021-07-06 | Tclåęå ēµęęÆęéå ¬åø | Array substrate and display panel |
KR102744149B1 (en) * | 2020-05-04 | 2024-12-20 | ģ¼ģ±ėģ¤ķė ģ“ ģ£¼ģķģ¬ | Gate testing part and display device including the same |
KR20230139886A (en) | 2022-03-24 | 2023-10-06 | ģ¼ģ±ėģ¤ķė ģ“ ģ£¼ģķģ¬ | Display device |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4072976A (en) * | 1976-12-28 | 1978-02-07 | Hughes Aircraft Company | Gate protection device for MOS circuits |
DE3929161A1 (en) * | 1989-09-02 | 1991-03-07 | Bosch Gmbh Robert | SEMICONDUCTOR COMPONENT |
EP0605176A1 (en) * | 1992-12-21 | 1994-07-06 | SHARP Corporation | An active matrix type liquid crystal display panel and a method for producing the same |
US20100073009A1 (en) * | 2008-09-23 | 2010-03-25 | Au Optronics (Suzhou) Corp., Ltd. | Test circuit adapted in a display panel of an electronic device |
Family Cites Families (38)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5345357A (en) * | 1992-06-05 | 1994-09-06 | At&T Bell Laboratories | ESD protection of output buffers |
JPH10198292A (en) * | 1996-12-30 | 1998-07-31 | Semiconductor Energy Lab Co Ltd | Semiconductor device and manufacturing method thereof |
KR100299686B1 (en) | 1997-10-14 | 2001-10-27 | ģ¤ģ¢ ģ© | Liquid crystal display device having static electricity preventing function and manufacturing method thereof |
JP4516638B2 (en) | 1997-10-14 | 2010-08-04 | äøęé»åę Ŗå¼ä¼ē¤¾ | Substrate for liquid crystal display device, liquid crystal display device and method for manufacturing the same |
KR100598735B1 (en) * | 1999-09-21 | 2006-07-10 | ģģ§.ķė¦½ģ¤ ģģė ģ£¼ģķģ¬ | Antistatic Circuit of Liquid Crystal Display Device |
JP2001339051A (en) * | 2000-05-30 | 2001-12-07 | Toshiba Corp | Protective circuit for circuit element |
US7256421B2 (en) * | 2002-05-17 | 2007-08-14 | Semiconductor Energy Laboratory, Co., Ltd. | Display device having a structure for preventing the deterioration of a light emitting device |
JP3772889B2 (en) * | 2003-05-19 | 2006-05-10 | ć»ć¤ć³ć¼ćØćć½ć³ę Ŗå¼ä¼ē¤¾ | Electro-optical device and driving device thereof |
US7262753B2 (en) * | 2003-08-07 | 2007-08-28 | Barco N.V. | Method and system for measuring and controlling an OLED display element for improved lifetime and light output |
US7405713B2 (en) * | 2003-12-25 | 2008-07-29 | Semiconductor Energy Laboratory Co., Ltd. | Light emitting device and electronic equipment using the same |
KR100557730B1 (en) * | 2003-12-26 | 2006-03-06 | ģģ§.ķė¦½ģ¤ ģģė ģ£¼ģķģ¬ | Dual panel type organic electroluminescent device and manufacturing method thereof |
KR100636483B1 (en) | 2004-06-25 | 2006-10-18 | ģ¼ģ±ģģ¤ėģģ“ ģ£¼ģķģ¬ | Transistors, manufacturing methods thereof, and light emitting display devices |
JP4207858B2 (en) * | 2004-07-05 | 2009-01-14 | ć»ć¤ć³ć¼ćØćć½ć³ę Ŗå¼ä¼ē¤¾ | Semiconductor device, display device and electronic apparatus |
TWI281740B (en) | 2004-09-08 | 2007-05-21 | Winbond Electronics Corp | Electrostatic discharge protection circuit |
KR100667075B1 (en) * | 2005-07-22 | 2007-01-10 | ģ¼ģ±ģģ¤ėģģ“ ģ£¼ģķģ¬ | Scan driver and organic light emitting display device comprising the same |
TWI306358B (en) | 2006-02-17 | 2009-02-11 | Himax Tech Inc | Organic light emitting display and pixel circuit thereof |
JP4203770B2 (en) * | 2006-05-29 | 2009-01-07 | ć½ćć¼ę Ŗå¼ä¼ē¤¾ | Image display device |
KR100967142B1 (en) * | 2006-08-01 | 2010-07-06 | ź°ģģ¤ź²ģ°ķ¤ ź°ė¶ģķ¤ź°ģ“ģ¤ | Display drive device and display device |
JP2008058940A (en) * | 2006-08-02 | 2008-03-13 | Sony Corp | Display apparatus, drive method for the display apparatus and electronic apparatus |
JP4211820B2 (en) * | 2006-08-15 | 2009-01-21 | ć½ćć¼ę Ŗå¼ä¼ē¤¾ | Pixel circuit, image display device and driving method thereof |
JP2008046377A (en) * | 2006-08-17 | 2008-02-28 | Sony Corp | Display device |
KR100839750B1 (en) | 2007-01-15 | 2008-06-19 | ģ¼ģ±ģģ¤ėģģ“ ģ£¼ģķģ¬ | Organic electroluminescent display |
KR101437868B1 (en) * | 2007-11-14 | 2014-09-05 | ģ¼ģ±ėģ¤ķė ģ“ ģ£¼ģķģ¬ | Display device |
JP4807365B2 (en) | 2008-03-10 | 2011-11-02 | ć»ć¤ć³ć¼ćØćć½ć³ę Ŗå¼ä¼ē¤¾ | Semiconductor device, display device and electronic apparatus |
JP5271661B2 (en) * | 2008-10-17 | 2013-08-21 | ę Ŗå¼ä¼ē¤¾ćøć£ćć³ćć£ć¹ćć¬ć¤ć¦ć§ć¹ć | Liquid crystal display |
KR20100073009A (en) * | 2008-12-22 | 2010-07-01 | ķźµģ ģķµģ ģ°źµ¬ģ | Multi-stage dual successive approximation register analog-digtal converter and analog-digtal converting method theerof |
JP5663231B2 (en) * | 2009-08-07 | 2015-02-04 | ę Ŗå¼ä¼ē¤¾åå°ä½ćØćć«ć®ć¼ē ē©¶ę | Light emitting device |
TWI596741B (en) * | 2009-08-07 | 2017-08-21 | åå°é«č½ęŗē ē©¶ęč”份ęéå ¬åø | Semiconductor device and method of manufacturing same |
KR101073542B1 (en) * | 2009-09-03 | 2011-10-17 | ģ¼ģ±ėŖØė°ģ¼ėģ¤ķė ģ“ģ£¼ģķģ¬ | Organic light emitting diode display and method for manufacturing the same |
WO2011027701A1 (en) * | 2009-09-04 | 2011-03-10 | Semiconductor Energy Laboratory Co., Ltd. | Light-emitting device and method for manufacturing the same |
KR101330421B1 (en) * | 2009-12-08 | 2013-11-15 | ģģ§ėģ¤ķė ģ“ ģ£¼ģķģ¬ | gate in panel type liquid crystal display device |
KR101113354B1 (en) * | 2010-04-16 | 2012-02-29 | ģ¼ģ±ėŖØė°ģ¼ėģ¤ķė ģ“ģ£¼ģķģ¬ | Display device and fabrication method of the same |
JP5489844B2 (en) * | 2010-04-27 | 2014-05-14 | åÆ士ćć¤ć«ć ę Ŗå¼ä¼ē¤¾ | Electronic equipment |
CN101859764B (en) * | 2010-06-03 | 2012-02-08 | åč¾¾å ēµč”份ęéå ¬åø | Electrostatic protection circuit and display device adopting such electrostatic protection circuit |
KR101815255B1 (en) | 2010-12-16 | 2018-01-08 | ģ¼ģ±ėģ¤ķė ģ“ ģ£¼ģķģ¬ | Organic light emitting display device and input pad thereof |
TWI405325B (en) | 2011-01-19 | 2013-08-11 | Global Unichip Corp | Esd protection circuit |
JP5724623B2 (en) * | 2011-05-23 | 2015-05-27 | ć½ćć¼ę Ŗå¼ä¼ē¤¾ | Signal transmission device and imaging display system |
KR102000738B1 (en) * | 2013-01-28 | 2019-07-23 | ģ¼ģ±ėģ¤ķė ģ“ ģ£¼ģķģ¬ | Circuit for preventing static electricity and display device comprising the same |
-
2013
- 2013-01-28 KR KR1020130009434A patent/KR102000738B1/en active IP Right Grant
- 2013-04-15 JP JP2013084890A patent/JP2014146777A/en active Pending
- 2013-08-01 US US13/957,371 patent/US9058770B2/en active Active
- 2013-10-17 TW TW102137579A patent/TW201430807A/en unknown
- 2013-12-05 CN CN201310653295.8A patent/CN103972228B/en active Active
-
2014
- 2014-01-08 EP EP14150424.1A patent/EP2759874B1/en active Active
-
2015
- 2015-05-08 US US14/708,116 patent/US10026798B2/en active Active
-
2018
- 2018-07-16 US US16/036,847 patent/US10199450B2/en active Active
- 2018-12-26 US US16/233,065 patent/US10461144B2/en active Active
-
2019
- 2019-10-28 US US16/665,958 patent/US10886357B2/en active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4072976A (en) * | 1976-12-28 | 1978-02-07 | Hughes Aircraft Company | Gate protection device for MOS circuits |
DE3929161A1 (en) * | 1989-09-02 | 1991-03-07 | Bosch Gmbh Robert | SEMICONDUCTOR COMPONENT |
EP0605176A1 (en) * | 1992-12-21 | 1994-07-06 | SHARP Corporation | An active matrix type liquid crystal display panel and a method for producing the same |
US20100073009A1 (en) * | 2008-09-23 | 2010-03-25 | Au Optronics (Suzhou) Corp., Ltd. | Test circuit adapted in a display panel of an electronic device |
Non-Patent Citations (2)
Title |
---|
FEI YUAN: "Electrostatic Discharge Protection", 2012, pages 1 - 40, XP055111206, Retrieved from the Internet <URL:http://www.ee.ryerson.ca/~fyuan/esd.pdf> [retrieved on 20140401] * |
NITIN MOHAN ET AL: "ESD Protection Design Methodology in Deep Sub-micron CMOS Technologies", 2003, University of Waterloo, Ontario, Canada, pages 1 - 47, XP055111209, Retrieved from the Internet <URL:http://citeseerx.ist.psu.edu/viewdoc/download?doi=10.1.1.115.6820&rep=rep1&type=pdf> [retrieved on 20140401] * |
Also Published As
Publication number | Publication date |
---|---|
EP2759874B1 (en) | 2017-04-05 |
US10886357B2 (en) | 2021-01-05 |
US20180342573A1 (en) | 2018-11-29 |
US10026798B2 (en) | 2018-07-17 |
TW201430807A (en) | 2014-08-01 |
JP2014146777A (en) | 2014-08-14 |
US20190131380A1 (en) | 2019-05-02 |
US20200066823A1 (en) | 2020-02-27 |
US10461144B2 (en) | 2019-10-29 |
US20150243726A1 (en) | 2015-08-27 |
US20140210807A1 (en) | 2014-07-31 |
KR102000738B1 (en) | 2019-07-23 |
KR20140096634A (en) | 2014-08-06 |
US9058770B2 (en) | 2015-06-16 |
CN103972228A (en) | 2014-08-06 |
US10199450B2 (en) | 2019-02-05 |
CN103972228B (en) | 2018-03-27 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US10886357B2 (en) | Circuit for preventing static electricity and display device having the same | |
CN106328689B (en) | Thin film transistor substrate and display device including the same | |
CN108022550A (en) | Display device | |
US20060017139A1 (en) | Thin film semiconductor device and method of manufacturing the same, electro-optical device, and electronic apparatus | |
US20250040194A1 (en) | Thin Film Transistor Array Substrate and Display Device | |
US20140027769A1 (en) | Semiconductor device and display device | |
WO2020015493A1 (en) | Electrostatic protection circuit, array substrate and display device | |
JP5269991B2 (en) | Semiconductor device | |
US9301377B2 (en) | Circuit for preventing static electricity of a display panel and display device including the same | |
KR102181003B1 (en) | Circuit for preventing static electricity and display device comprising the same | |
KR102077327B1 (en) | Circuit for preventing static electricity and display device comprising the same | |
US12089459B2 (en) | Display apparatus and electronic device | |
US20240260338A1 (en) | Organic Light Emitting Display Device and Method for Manufacturing the Same | |
CN113594139B (en) | Substrate and display panel | |
US20240276769A1 (en) | Display device | |
CN117337082A (en) | Organic light emitting display device | |
CN116916699A (en) | Organic light emitting display device | |
KR20210051382A (en) | Display device and manufacturing method for the same |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
17P | Request for examination filed |
Effective date: 20140328 |
|
AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR |
|
AX | Request for extension of the european patent |
Extension state: BA ME |
|
RAP1 | Party data changed (applicant data changed or rights of an application transferred) |
Owner name: SAMSUNG DISPLAY CO., LTD. |
|
GRAP | Despatch of communication of intention to grant a patent |
Free format text: ORIGINAL CODE: EPIDOSNIGR1 |
|
RIC1 | Information provided on ipc code assigned before grant |
Ipc: H01L 27/32 20060101ALI20160916BHEP Ipc: H01L 27/12 20060101ALI20160916BHEP Ipc: G02F 1/1362 20060101AFI20160916BHEP Ipc: H01L 27/02 20060101ALI20160916BHEP Ipc: G09G 3/3208 20160101ALI20160916BHEP Ipc: H01L 29/423 20060101ALI20160916BHEP Ipc: H01L 23/60 20060101ALI20160916BHEP |
|
INTG | Intention to grant announced |
Effective date: 20161017 |
|
GRAS | Grant fee paid |
Free format text: ORIGINAL CODE: EPIDOSNIGR3 |
|
GRAA | (expected) grant |
Free format text: ORIGINAL CODE: 0009210 |
|
AK | Designated contracting states |
Kind code of ref document: B1 Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR |
|
REG | Reference to a national code |
Ref country code: GB Ref legal event code: FG4D |
|
REG | Reference to a national code |
Ref country code: CH Ref legal event code: EP |
|
REG | Reference to a national code |
Ref country code: AT Ref legal event code: REF Ref document number: 882342 Country of ref document: AT Kind code of ref document: T Effective date: 20170415 |
|
REG | Reference to a national code |
Ref country code: IE Ref legal event code: FG4D |
|
REG | Reference to a national code |
Ref country code: DE Ref legal event code: R096 Ref document number: 602014008191 Country of ref document: DE |
|
REG | Reference to a national code |
Ref country code: NL Ref legal event code: MP Effective date: 20170405 |
|
REG | Reference to a national code |
Ref country code: LT Ref legal event code: MG4D |
|
REG | Reference to a national code |
Ref country code: AT Ref legal event code: MK05 Ref document number: 882342 Country of ref document: AT Kind code of ref document: T Effective date: 20170405 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: NL Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20170405 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: AT Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20170405 Ref country code: ES Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20170405 Ref country code: GR Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20170706 Ref country code: HR Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20170405 Ref country code: FI Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20170405 Ref country code: LT Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20170405 Ref country code: NO Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20170705 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: LV Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20170405 Ref country code: RS Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20170405 Ref country code: IS Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20170805 Ref country code: SE Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20170405 Ref country code: BG Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20170705 Ref country code: PL Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20170405 |
|
REG | Reference to a national code |
Ref country code: FR Ref legal event code: PLFP Year of fee payment: 5 |
|
REG | Reference to a national code |
Ref country code: DE Ref legal event code: R097 Ref document number: 602014008191 Country of ref document: DE |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: SK Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20170405 Ref country code: RO Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20170405 Ref country code: EE Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20170405 Ref country code: CZ Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20170405 Ref country code: DK Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20170405 |
|
PLBE | No opposition filed within time limit |
Free format text: ORIGINAL CODE: 0009261 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: SM Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20170405 Ref country code: IT Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20170405 |
|
26N | No opposition filed |
Effective date: 20180108 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: SI Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20170405 |
|
REG | Reference to a national code |
Ref country code: CH Ref legal event code: PL |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: LU Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20180108 |
|
REG | Reference to a national code |
Ref country code: IE Ref legal event code: MM4A |
|
REG | Reference to a national code |
Ref country code: BE Ref legal event code: MM Effective date: 20180131 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: CH Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20180131 Ref country code: LI Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20180131 Ref country code: BE Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20180131 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: IE Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20180108 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: MC Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20170405 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: MT Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20180108 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: TR Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20170405 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: PT Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20170405 Ref country code: HU Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT; INVALID AB INITIO Effective date: 20140108 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: MK Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20170405 Ref country code: CY Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20170405 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: AL Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20170405 |
|
P01 | Opt-out of the competence of the unified patent court (upc) registered |
Effective date: 20230515 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: GB Payment date: 20231220 Year of fee payment: 11 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: FR Payment date: 20231222 Year of fee payment: 11 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: DE Payment date: 20231220 Year of fee payment: 11 |