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EP2164705B1 - Verfahren zur herstellung eines nahtlosen endlosmaterials für sicherheitselemente, ein nahtloses endlosmaterial für sicherheitselemente und verfahren zur herstellung von druck- oder prägezylindern - Google Patents

Verfahren zur herstellung eines nahtlosen endlosmaterials für sicherheitselemente, ein nahtloses endlosmaterial für sicherheitselemente und verfahren zur herstellung von druck- oder prägezylindern Download PDF

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Publication number
EP2164705B1
EP2164705B1 EP08758776.2A EP08758776A EP2164705B1 EP 2164705 B1 EP2164705 B1 EP 2164705B1 EP 08758776 A EP08758776 A EP 08758776A EP 2164705 B1 EP2164705 B1 EP 2164705B1
Authority
EP
European Patent Office
Prior art keywords
lattice
grid
motif
elements
vectors
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
EP08758776.2A
Other languages
German (de)
English (en)
French (fr)
Other versions
EP2164705A2 (de
Inventor
Wittich Kaule
Wolfgang Rauscher
Marius Dichtl
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Giesecke and Devrient Currency Technology GmbH
Original Assignee
Giesecke and Devrient GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Giesecke and Devrient GmbH filed Critical Giesecke and Devrient GmbH
Publication of EP2164705A2 publication Critical patent/EP2164705A2/de
Application granted granted Critical
Publication of EP2164705B1 publication Critical patent/EP2164705B1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • D—TEXTILES; PAPER
    • D05—SEWING; EMBROIDERING; TUFTING
    • D05B—SEWING
    • D05B93/00—Stitches; Stitch seams
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41F—PRINTING MACHINES OR PRESSES
    • B41F19/00—Apparatus or machines for carrying out printing operations combined with other operations
    • B41F19/02—Apparatus or machines for carrying out printing operations combined with other operations with embossing
    • B41F19/06—Printing and embossing between a negative and a positive forme after inking and wiping the negative forme; Printing from an ink band treated with colour or "gold"
    • B41F19/062—Presses of the rotary type
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/342—Moiré effects
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/355—Security threads
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M3/00—Printing processes to produce particular kinds of printed work, e.g. patterns
    • B41M3/14—Security printing
    • B42D2035/44—
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/324—Reliefs
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T83/00—Cutting
    • Y10T83/04—Processes
    • Y10T83/0524—Plural cutting steps
    • Y10T83/0538—Repetitive transverse severing from leading edge of work

Definitions

  • the invention relates to a continuous material for security elements with micro-optical moiré magnification arrangements and to a method for producing such continuous material.
  • Data carriers such as valuables or identity documents, but also other valuables, such as branded goods, are often provided with security elements for the purpose of security, which permit verification of the authenticity of the data carrier and at the same time serve as protection against unauthorized reproduction.
  • the security elements can be embodied, for example, in the form of a security thread embedded in a banknote, a covering film for a banknote with a hole, an applied security strip or a self-supporting transfer element which is applied to a value document after its manufacture.
  • Security elements with optically variable elements which give the viewer a different image impression under different viewing angles, play a special role, since they can not be reproduced even with high-quality color copying machines.
  • the security elements can be equipped with security features in the form of diffraction-optically effective microstructures or nanostructures, such as with conventional embossed holograms or other hologram-like diffraction structures, as described, for example, in the publications EP 0 330 33 A1 or EP 0 064 067 A1 are described.
  • lens systems it is also known to use lens systems as security features.
  • a security thread of a transparent material described on the surface of a grid of several parallel cylindrical lenses is imprinted.
  • the Thickness of the security thread is chosen so that it corresponds approximately to the focal length of the cylindrical lenses.
  • the print image is designed taking into account the optical properties of the cylindrical lenses. Due to the focusing effect of the cylindrical lenses and the position of the printed image in the focal plane different subregions of the printed image are visible depending on the viewing angle.
  • By appropriate design of the printed image so that information can be introduced, which are visible only at certain angles.
  • By appropriate design of the printed image while "moving" images can be generated.
  • the subject moves only approximately continuously from one location on the security thread to another location.
  • Moire magnification arrangements are used as security features.
  • the principal operation of such Moire magnification arrangements is in the article "The Moire Magnifier", MC Hutley, R. Hunt, RF Stevens and P. Savander, Pure Appl. Opt. 3 (1994), pp. 133-142 , described.
  • moiré magnification thereafter refers to a phenomenon that occurs when viewing a raster of identical image objects through a lenticular of approximately the same pitch. As with each pair of similar rasters, this results in a moire pattern, in which case each of the moire fringes appears in the form of an enlarged and / or rotated image of the repeated element of the image raster.
  • an endless security element film is usually first produced as roll material, with the use of conventional production methods always being used Breakage, especially gaps or misalignment in the appearance of the security elements occur. These fractures are due to the fact that the precursors for the stamping tools used in the manufacture are generally manufactured as flat sheets which are mounted on a printing or embossing cylinder. At the seams, the mutually adjacent image patterns usually do not match and lead after printing or embossing in the appearance of the finished security elements to motive disorders of the type mentioned.
  • the publication DE 10 2005 028162 A1 relates to a security element and a method for its production.
  • the publication DE 199 47 397 A1 discloses a method for seamless engraving of patterns.
  • the object of the invention is to avoid the disadvantages of the prior art and, in particular, to provide a method for producing security elements with micro-optical moiré magnification arrangements with trouble-free motif images, as well as a corresponding continuous material.
  • the invention relates to a method for producing continuous material for security elements with micro-optical moiré magnification arrangements according to claim 1.
  • the distortion according to the invention can relate only to the motif grid, only the focusing element grid or both screens.
  • the motif grid and the focusing element grid may also require different distortions, as explained in more detail below.
  • a repeat q is set in step c) along the endless longitudinal direction of the endless material.
  • the longitudinal direction repeat q is given by the circumference of a stamping or printing cylinder for the generation of the motif grid and / or the focusing element grid.
  • a grid point P of the first and / or the second grid is selected, which is close to the end point Q of the vector given by the longitudinal direction repeat 0 q and a linear transformation V is detected which maps P to Q.
  • a grid point P whose distance from Q along the grid vector or the two grid vectors is less than 10 grid periods, preferably less than 5, more preferably less than 2 and in particular less than one grid period, is chosen as the grid point lying near the end point Q is.
  • the grid point closest to the end point Q can be selected as the grid point P.
  • the vectors differ a and b with advantage for amount and direction only a little or are even the same.
  • the grid points located near the end points Q and B are those grid points P and A whose distances of Q or B along the grid vector or the two grid vectors are each less than 10 grid periods, preferably less than 5, particularly preferably less than 2 and in particular less than one grating period.
  • the grid point closest to the end point Q can be selected as grid point P and the grid point closest to the end point B can be selected as grid point A.
  • the cross direction repeat b can be specified.
  • the vectors u 1 and u 2 , or w 1 and w 2 are spatially dependent, with the local period parameters
  • , ⁇ ( w 1 , w 2 ) change only slowly in relation to the periodicity length.
  • the motif grid and the focusing element grid are expediently arranged on opposite surfaces of an optical spacer layer.
  • the spacer layer may comprise, for example, a plastic film and / or a lacquer layer.
  • step e) comprises providing a printing or embossing cylinder with the distorted focusing element grid.
  • a flat plate may be provided with the distorted focusing element grid, and the flat plate or a flat impression of the plate may be mounted on a printing or embossing cylinder to form a cylinder with sutures having a cylinder circumference q.
  • a coated cylinder with cylinder circumference q can be provided with the distorted focusing element grid by a material-removing method, in particular by laser ablation.
  • Method step e) may comprise impressing the distorted focusing element grid in an embossable lacquer layer, in particular in a thermoplastic lacquer or UV lacquer, which is arranged on the front side of an optical spacer layer.
  • the step e) comprises providing a printing or embossing cylinder with the distorted motif grid.
  • a flat plate may be provided with the distorted motif grid, and the flat plate or a flat impression of the plate may be mounted on a printing or embossing cylinder so that a cylinder with seams with a cylinder circumference q is formed.
  • a coated cylinder with cylinder circumference q can be provided with the distorted motif grid by a material-removing method, in particular by laser ablation.
  • Method step e) may also include impressing the distorted motif grid in an embossable lacquer layer, in particular in a thermoplastic lacquer or UV lacquer, which is arranged on the back of an optical spacer layer.
  • step e) comprises printing the distorted motif grid on a carrier layer, in particular on the back side of an optical spacer layer.
  • the invention further relates to a continuous material for security elements for security papers, documents of value and the like according to claim 12.
  • the motif grid and the focusing element grid of the continuous material are arranged with a repeat q along the endless longitudinal direction of the endless material and with a repeat b along the transverse direction of the endless material.
  • the invention further comprises a method for producing a security element for security papers, value documents and the like, in which an endless material of the described type is produced and cut in the desired form of the security element.
  • the endless material is thereby cut into longitudinal strips of the same width and with an identical arrangement of the micro-optical moire magnification arrangements.
  • a security element for security papers, value documents and the like can be made from a continuous material of the type described are produced, in particular with the method just mentioned.
  • the invention comprises a method for producing a printing or embossing cylinder according to claim 14 for the production of the focusing element grid in a production method for continuous material of the type described.
  • a flat plate can be provided with the distorted focusing element grid, and the flat plate or a flat impression of the plate is mounted on a printing or embossing cylinder, so that a cylinder with seams with a cylinder circumference q is formed.
  • a coated cylinder with cylinder circumference q is provided with the distorted focusing element grid by a material-removing method, in particular by laser ablation.
  • the first and second grids are two-dimensional Bravais grids.
  • the invention comprises a method for producing a printing or embossing cylinder according to claim 15 for the production of the motif grid in a production method for continuous material of the type described.
  • a flat plate with the distorted motif grid can be provided, and the flat plate or a flat impression of the plate is mounted on a printing or embossing cylinder, so that a cylinder with seams with a cylinder circumference q is formed.
  • a coated cylinder with cylinder circumference q provided with the distorted motif grid by a material-removing process, in particular by laser ablation.
  • the first and second grids are two-dimensional Bravais grids.
  • the moiré magnification arrangements as sierelementraster, in particular lenticular, but also other types of grid, such as hole grids or grid of concave mirrors, have.
  • the inventive method can be used with advantage when cylindrical tools are used for embossing or printing.
  • Fig. 1 shows a schematic representation of a banknote 10, which is provided with two security elements 12 and 16.
  • the first security element represents a security thread 12 that emerges at certain window areas 14 on the surface of the banknote 10, while it is embedded in the intervening areas inside the banknote 10.
  • the second security element is formed by a glued transfer element 16 of any shape.
  • the security element 16 can also be designed in the form of a cover film, which is arranged over a window area or a through opening of the banknote.
  • Both the security thread 12 and the transfer element 16 may include a moire magnification arrangement.
  • the mode of operation and the production method according to the invention for such arrangements will be described in more detail below with reference to the security thread 12.
  • Fig. 2 schematically shows the layer structure of the security thread 12 in cross section, wherein only the parts of the layer structure required for the explanation of the functional principle are shown.
  • the security thread 12 includes a carrier 20 in the form of a transparent plastic film, in the embodiment an approximately 20 micron thick polyethylene terephthalate (PET) film.
  • PET polyethylene terephthalate
  • the upper side of the carrier film 20 is provided with a grid-like arrangement of microlenses 22 which form on the surface of the carrier film a two-dimensional Bravais grid with a preselected symmetry.
  • the Bravais lattice has a hexagonal lattice symmetry or the symmetry of a parallelogram lattice.
  • the spacing of adjacent microlenses 22 is preferably chosen as small as possible in order to ensure the highest possible area coverage and thus a high-contrast representation.
  • the spherically or aspherically configured microlenses 22 preferably have a diameter between 5 ⁇ m and 50 ⁇ m and in particular a diameter between only 10 ⁇ m and 35 ⁇ m and are therefore not visible to the naked eye. It is understood that in other designs, larger or smaller dimensions come into question.
  • the microlenses can have a diameter of between 50 ⁇ m and 5 mm for decorative purposes, while in the case of Moire Magnifier structures, which are to be decipherable only with a magnifying glass or a microscope, dimensions below 5 ⁇ m are also used can come.
  • a motif layer 26 is arranged, which also contains a grid-like arrangement of identical micromotif elements 28.
  • the arrangement of the micromotif elements 28 forms a two-dimensional Bravais lattice with a preselected symmetry, again assuming a parallelogram lattice for illustration.
  • the Bravais lattice of the micromotif elements differs 28 in its symmetry and / or in the size of its lattice parameters according to the invention slightly from the Bravais lattice of the microlenses 22 to produce the desired moire magnification effect.
  • the grating period and the diameter of the micromotif elements 28 are of the same order of magnitude as those of the microlenses 22, ie preferably in the range of 5 .mu.m to 50 .mu.m and in particular in the range of 10 .mu.m to 35 .mu.m, so that the micromotif elements 28 themselves are visible to the naked eye are not recognizable. In designs with the above-mentioned larger or smaller microlenses, of course, the micromotif elements are correspondingly larger or smaller.
  • the optical thickness of the carrier film 20 and the focal length of the microlenses 22 are coordinated so that the micromotif elements 28 are located approximately at the distance of the lens focal length.
  • the carrier foil 20 thus forms an optical spacer layer which ensures a desired constant spacing of the microlenses 22 and the micromotif elements 28.
  • the observer sees a slightly different subregion of the micromotif elements 28 when viewed from above through the microlenses 22, so that the multiplicity of microlenses 22 as a whole produces an enlarged image of the micromotif elements 28.
  • the resulting moiré magnification depends on the relative difference of the lattice parameters of the Bravais gratings used. If, for example, the grating periods of two hexagonal gratings differ by 1%, the result is a 100-fold moire magnification.
  • an endless security element film is usually first produced as a roll material, with known production methods always breaking points 30 occur in appearance 32, as in Fig. 3 (a) illustrated. These breakages in appearance are due to the fact that the precursors for the stamping tools used in the manufacture are generally made as flat sheets which are mounted on a printing or embossing cylinder 34, as shown schematically in FIG Fig. 3 (b) shown.
  • the adjacent motif grids 38, 38 'and / or the associated lenticular grid generally do not coincide and, after printing or embossing, lead to motif disturbances in the form of gaps or an offset in the appearance of the finished security elements.
  • the micromotif elements 28 and the microlenses 22 are each in the form of a raster, wherein in the context of this description raster is understood to mean a two-dimensional periodic or at least locally periodic arrangement of the lenses or the motif elements.
  • a periodic raster can always be described here by a two-dimensional Bravais lattice with constant lattice parameters.
  • the period parameters may change from place to place, but only slowly in relation to the periodicity length, so that the microasters can always be described locally with sufficient accuracy by means of Bravais gratings with constant grid parameters.
  • a periodic arrangement of the microelements is therefore always assumed below.
  • FIGS. 4 and 5 schematically show a non-scale illustrated moire magnification arrangement 50 with a motif plane 52 in which a in Fig. 4 more precisely arranged motif grid 40 is arranged and with a lens plane 54 in which the microlens grid is located.
  • the moiré magnification arrangement 50 produces a moiré image plane 56 in which the magnified image perceived by the viewer 58 is described.
  • the motif grid 40 includes a plurality of micromotif elements 42 in the form of the letter "F" arranged at the lattice sites of a low-symmetry Bravais lattice 44.
  • the unit cell of in Fig. 4 shown parallelogram grating can by vectors u 1 and u 2 (with the components u 11 , u 21 and u 12 , u 22 ) are shown.
  • the arrangement of microlenses in the lens plane 54 is described by a two-dimensional Bravais lattice whose lattice cell is represented by the vectors w 1 and w 2 (with the components w 11 , w 21 and w 12 , w 22 ) is given.
  • the vectors t 1 and t 2 With the vectors t 1 and t 2 (with the components t 11 , t 21 and t 12 , t 22 ), the grid cell in the moire image plane 56 is described.
  • the grating vectors of the micromotif element array result from the lenticular grid and the desired moiré image grating
  • U ⁇ W ⁇ ⁇ T ⁇ + W ⁇ - 1 ⁇ T ⁇
  • r ⁇ W ⁇ ⁇ T ⁇ + W ⁇ - 1 ⁇ R ⁇ + r ⁇ 0 ,
  • the transformation matrix A also describes the movement of a moire image as the moire-forming assembly 50 moves, resulting from the movement of the motif plane 52 against the lens plane 54.
  • the vector a 1 indicates in which direction the moiré image moves when tilting the arrangement of motif and lenticular raster laterally
  • the vector a 2 indicates in which direction the Moirestory moves, if one tilts the arrangement of subject and lenticular grid forward.
  • the images given in particular by (M1) to (M4) are now supplemented by further linear transformations which describe a distortion of the Bravais grid of the motif grid or of the lens grid, and which are selected so that the motif grid and / or the Lenticular grid periodically repeated in a predetermined repeat.
  • the procedure according to the invention will now be explained in more detail with reference to a few concrete examples.
  • the procedure according to the invention is as follows:
  • All grid points of the given motif grid are through m ⁇ u ⁇ 1 + n ⁇ u ⁇ 2 recorded with integers m and n.
  • the end point Q of this vector defined by the circumference of the cylinder 0 q is in Fig. 6 also marked.
  • a motif grid calculated according to aspects such as motif size, magnification, movement or a correspondingly calculated lenticular grid usually do not satisfy condition (1).
  • the Bravais lattice of the motif grid 70 is slightly distorted by a linear transformation so that the condition (1) for the distorted Bravais lattice is satisfied.
  • the distorted grid then repeats periodically with a longitudinal direction repeat q and therefore fits without gaps and without offset on an associated printing or embossing cylinder with circumference q.
  • a grid point P p x p y of the undistorted Bravais lattice located near the endpoint Q. For as little distortion as possible, such as in Fig. 6 , the grid point P closest to the end point Q is selected.
  • the concrete selection of the grid point P can be effected, for example, by the coordinates of all grid points in the computer be determined a surface which is slightly larger than a roll of the cylinder (at least some grid cells larger in size and in width) and that from these grid points then the one with the smallest distance to Q is determined.
  • the effect of lattice distortion can be estimated from the typical dimensions of the embossing cylinders and grid cells.
  • the grid cell dimensions are on the order of 20 microns, the circumference of a suitable embossing cylinder at about 20 cm or more.
  • a relative change of the grating of only 1: 10000 results.
  • the properties of the generated moiré image such as magnification and movement angle, change only in the per thousand range and are therefore not recognizable to a viewer.
  • the above-mentioned larger distances between grid point P and end point Q still provide very good to acceptable results with relative changes in the grid in the range of up to several percent.
  • Example 2 proceeds from a given motif image from a motif grid in the form of a two-dimensional Bravais grid with the unit cell side vectors u 1 , and u 2 and the circumference q of the intended for the generation of the motif grid printing cylinder.
  • the untransformed grating and the transformed grating differ as little as possible when the vectors b and a differ as little as possible or even equal.
  • Example 3 As in Example 1, a motif image 80 having a motif grid in the form of a two-dimensional Bravais lattice with the unit cell side vectors is shown u 1 and u 2 and the circumference q of the intended for the generation of the motif grid printing or embossing cylinder specified.
  • the embossed endless material is to be cut in a subsequent process step in strips of width b, the moire pattern on all strips should be the same side.
  • the distorted Bravais grid of the motif image 80 in this example should therefore be repeated periodically in the ⁇ direction with the longitudinal direction repeat q and periodically in the x direction with the transverse direction repeat b.
  • a lattice point P p x p y of the undistorted Bravais lattice located near the endpoint Q.
  • a grid point A a x a y selected near the endpoint B of the vector given by the desired cross-direction repeat b 0 lies.
  • the motive image transformed via the relationships (2c) and (3) and the motive image transformed via the relations (2c) and (4) are structurally repeated in the x-direction with period b and in the ⁇ -direction with period q.
  • the motif image therefore fits seamlessly and without offset on the given printing or embossing cylinder and can be cut after production in identical strips of width b.
  • a motif image arranged in a motif grid grid calculated according to the relationship (5) will generally not fit without interruption to an independently given cylinder diameter, so that one with This cylinder-embossed film material in the rhythm of the cylinder circumference disturbances in the motif image and thus also in the moiré image shows.
  • This also gives you a new motion matrix A ', by the motion matrix A 'described new magnification and movement behavior in accordance with inventive method only insignificantly from that by the original motion matrix A described, desired magnification and movement behavior deviates.
  • Example 5 gives a calculation example for moiré-forming gratings for the procedures explained in Examples 1 to 4. The simpler For the sake of illustration, a hexagonal lattice symmetry is assumed for each raster.
  • the lenticular grid is a hexagonal lattice with 20 ⁇ m side length.
  • the motif grid should have the same side length, but be rotated by an angle of 0.573 ° relative to the lenticular grid.
  • the moire pattern should have an approximately 100-fold magnification and approximately orthoparallactic motion in the image plane.
  • the moire magnification of the original motif grid is by design 100.0 times, the magnification with the transformed motif grid is horizontally 100.4-fold and vertically 100.0-fold, so has changed only insignificantly.
  • the transformed motif grid grid results in a trouble-free motif image on a printing or embossing cylinder with a circumference of 200 mm, whereas the original motif grid lattice creates motif distortions in the motif Fig. 3 (a) shown type leads.
  • Example 6 is based on Example 5, in addition to the endless material produced in this example is cut into identical strips with a width of 40 mm.
  • the moiré magnification of the original motif grid lattice is 100.0-fold by design, the magnification with the transformed motif grid is horizontally 100.4-fold and perpendicular 102.6-fold, so has changed only slightly.
  • results with the transformed motif grid grid on a printing or embossing cylinder with 200 mm circumference a trouble-free motif image, which has adjacent strips of a width of 40 mm adjacent to each other for further processing.
  • moiré magnifiers can be realized not only with two-dimensional gratings but also with linear translation structures, for example with cylindrical lenses as microfocusing elements and with motifs that are arbitrarily extended in one direction as micromotif elements. Even with such linear translation structures, the Moire Magnifier data can be adapted to a given rapport with advantage, as now with reference to the motif images 90 and 95 of FIGS. 8 and 9 explained.
  • a linear translation structure can be defined by a translation vector u describe, so by a displacement width d and a shift direction ⁇ , as in Fig. 8 shown.
  • the parallel lines 92 in FIG Fig. 8 stand schematically for a with the translation vector u moved repeatedly arranged motif.
  • a vector of length q is drawn with the end point Q, which stands for the given longitudinal repeat.
  • a transformation matrix V can be found with the aid of which the motif structure and the movement behavior can be adapted to the repeat with a minimum change.
  • Fig. 8 is a point P located on the translation structure near the point Q.
  • an adaptation to a transverse repeat can also be effected in the case of a linear translation structure in addition to adaptation to the longitudinal repeat, as can be seen from the motif image 95 of FIG Fig. 9 explained.
  • the longitudinal repeat is in Fig. 9 represented by a vector (0, q) with end point Q, the transverse repeat by a vector (b, 0) with end point B. Furthermore, points P and A are selected with the coordinates (p x , p y ) and (a x , a y ) in the translation structure, which are close to Q and B, respectively.
  • this information provides a transformation matrix V, with the help of which the motif structure and the movement behavior can be adapted with minimal change to both repetitions, namely with equation (2c):
  • V b 0 0 q ⁇ a x p x a y p y - 1
  • the printing or embossing cylinders themselves have seams
  • the design of moire magnification arrangements is inventively designed so that it fits together before and after a seam.
  • plates can be produced with latticed, free-standing, generally cylindrical resist structures, which are referred to as lacquer points. These paint spots are produced in a lattice-like arrangement which results for the lenticular grid using the above-described relationships (1) to (8).
  • Such plates can be produced for example by means of classical photolithography, by means of lithographic direct-write methods, such as laser-writing or e-beam lithography, or by suitable combinations of both approaches.
  • the plate is then heated with the paint dots, so that the resist structures flow away and generally form lattice-shaped arranged small hills, preferably small spherical caps. Shaped in transparent materials These hill lens properties, lens diameter, lens curvature, focal length on the geometric structure of the paint dots, especially their diameter and the thickness of the paint layer, can be determined.
  • Another possibility is the direct structuring of the plates with latticed, free-standing hills, for example by means of laser ablation.
  • plastic, ceramic or metal surfaces are processed with high-energy laser radiation, for example with excimer laser radiation.
  • a nickel layer for example 0.05 to 0.2 mm thick, is deposited and this is lifted off the plate.
  • This nickel foil is suitable as an embossing stamp for embossing a lenticular grid.
  • the nickel foil is precisely cut to size and welded with the embossing recesses outwards to a cylindrical tube, the sleeve.
  • the sleeve can be attached to an embossing cylinder.
  • the grating period also fits in the area of the weld.
  • the calculated lens grid is then embossed into an embossable lacquer layer, for example a thermoplastic lacquer or UV lacquer, on the front side of a foil.
  • an embossable lacquer layer for example a thermoplastic lacquer or UV lacquer
  • the production takes place analogously to the lenticular cylinder, wherein plates are prepared with lattice-shaped, free-standing, freely designed motifs.
  • lens raster, motif raster and cylinder circumference are in the relationships given by equations (1) to (8), so that the grating period also fits in the area of the weld seam.
  • the motif grid is embossed into an embossable lacquer layer, for example a thermoplastic lacquer or UV lacquer, on the back side of the foil, which contains the associated lenticular grid on the front side.
  • an embossable lacquer layer for example a thermoplastic lacquer or UV lacquer
  • the motif grid can be colored.
  • the further processing of the double-sided with lenticular grid and motif grid embossed film can be done in different ways.
  • the motif grid can be metallized over the entire area, or the motif grid can be obliquely vapor-deposited, and then a two-dimensional application of a color layer to the partially metallized areas can take place, or the embossed motif grid can be applied by full-surface application of Colored layers and subsequent wiping be colored.
  • Seamless cylinders for use in embossing or printing machines as such are state of the art and, for example, from the documents WO 2005/036216 A2 or DE 10126264 A1 known. However, there is no teaching how to design such cylinders to meet the special requirements of moire magnification arrangements.
  • a lenticular grid is mounted on one side of a film and a matching motif grid on the other side of the film.
  • embossing or impression cylinders are imaged, for example, according to the methods described in the prior art, wherein the design is carried out according to the above-described inventive calculation using the relationships (1) to (8).
  • Such cylinders can be made, for example, as follows.
  • trough-shaped lattice-like recesses created which serve as embossing or printing forms for a lenticular grid.
  • the programming of the laser feed control according to the invention is carried out using the relationships (1) to (8), so that a seamless pattern without interruption arises on the cylinder.
  • a metal, ceramic or plastic-coated cylinder lattice-like arranged recessed motifs or relief-like raised motifs are introduced in recessed environment by laser ablation, in particular by material removal using a computer-controlled laser, which serve as embossing or printing forms for a motif grid.
  • the programming of the laser feed control according to the invention is carried out using the relationships (1) to (8), so that a seamless pattern without interruption arises on the cylinder.
  • embossable layers of lacquer for example thermoplastic lacquer or UV lacquer
  • the motif grid can be colored, as described in Example 7.
  • lenticular, motif and cylinder circumferences are in the relationships given by equations (1) to (8) so as to obtain moiré magnification arrangements having an enlarged and moved motive, and moreover exhibit no discontinuities in roll material in periodicity ,
  • the cylinder circumferences of lens and motif cylinders may be the same or different, and the calculation by the relationships (1) to (8) provides the desired results in magnification and motion performance of the moiré magnification arrangement in the latter case in the latter case as well.
  • the further processing of the double-sided impressed with lenticular grid and motif grid film can be done in the manner described in Example 7 types.
  • the mentioned lenticular and motif grid cylinders can be used as printing forms. This is particularly suitable for the motif grid cylinder.
  • a particularly preferred production method is obtained when a lenticular grid is introduced by means of embossing in an embossable lacquer layer, for example a thermoplastic lacquer or UV lacquer, of a foil, and the associated motif grid is applied to the opposite side of the foil by means of classical printing processes.
  • an embossable lacquer layer for example a thermoplastic lacquer or UV lacquer

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  • Engineering & Computer Science (AREA)
  • Textile Engineering (AREA)
  • Credit Cards Or The Like (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
EP08758776.2A 2007-06-01 2008-05-27 Verfahren zur herstellung eines nahtlosen endlosmaterials für sicherheitselemente, ein nahtloses endlosmaterial für sicherheitselemente und verfahren zur herstellung von druck- oder prägezylindern Active EP2164705B1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE200710025667 DE102007025667A1 (de) 2007-06-01 2007-06-01 Endlosmaterial für Sicherheitselemente
PCT/EP2008/004190 WO2008145333A2 (de) 2007-06-01 2008-05-27 Nahtloses endlosmaterial für sicherheitselemente und verfahren und zylinder zu dessen herstellung

Publications (2)

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EP2164705A2 EP2164705A2 (de) 2010-03-24
EP2164705B1 true EP2164705B1 (de) 2017-12-27

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US (1) US8783728B2 (zh)
EP (1) EP2164705B1 (zh)
CN (1) CN101687414B (zh)
DE (1) DE102007025667A1 (zh)
WO (1) WO2008145333A2 (zh)

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SE537104C2 (sv) * 2012-11-02 2015-01-07 Rolling Optics Ab Höghastighetstillverkning av tryckta produktmikrokännemärken
DE102012021724A1 (de) * 2012-11-06 2014-05-08 Giesecke & Devrient Gmbh Sicherheitselement mit Linsenrasterbild
EP3145728B1 (en) * 2014-05-20 2020-02-12 Lumenco, LLC Slant lens interlacing with linearly arranged lenses
NL2014690B1 (en) * 2015-04-22 2017-01-18 Morpho Bv Security document and method of manufacturing.
CN106378534B (zh) * 2016-11-24 2018-03-16 天津大学 一种激光驱动形成近球状飞片的方法
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EP3470231B1 (en) * 2017-10-10 2021-06-02 HP Scitex Ltd Printing fluid drying assembly, method and system

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Also Published As

Publication number Publication date
EP2164705A2 (de) 2010-03-24
WO2008145333A3 (de) 2009-03-26
DE102007025667A1 (de) 2008-12-04
US20100187806A1 (en) 2010-07-29
WO2008145333A2 (de) 2008-12-04
CN101687414B (zh) 2012-01-25
CN101687414A (zh) 2010-03-31
US8783728B2 (en) 2014-07-22

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