EP1586221B1 - Ion accelerator arrangement - Google Patents
Ion accelerator arrangement Download PDFInfo
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- EP1586221B1 EP1586221B1 EP03782395A EP03782395A EP1586221B1 EP 1586221 B1 EP1586221 B1 EP 1586221B1 EP 03782395 A EP03782395 A EP 03782395A EP 03782395 A EP03782395 A EP 03782395A EP 1586221 B1 EP1586221 B1 EP 1586221B1
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- European Patent Office
- Prior art keywords
- longitudinal
- ionization chamber
- arrangement
- longitudinal direction
- wall
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- 150000002500 ions Chemical class 0.000 claims description 26
- 230000005684 electric field Effects 0.000 claims description 3
- 230000007935 neutral effect Effects 0.000 description 4
- 230000007704 transition Effects 0.000 description 4
- 239000004020 conductor Substances 0.000 description 3
- 230000004907 flux Effects 0.000 description 3
- 230000001133 acceleration Effects 0.000 description 2
- 229910052756 noble gas Inorganic materials 0.000 description 2
- 238000010276 construction Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012777 electrically insulating material Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 230000012447 hatching Effects 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F03—MACHINES OR ENGINES FOR LIQUIDS; WIND, SPRING, OR WEIGHT MOTORS; PRODUCING MECHANICAL POWER OR A REACTIVE PROPULSIVE THRUST, NOT OTHERWISE PROVIDED FOR
- F03H—PRODUCING A REACTIVE PROPULSIVE THRUST, NOT OTHERWISE PROVIDED FOR
- F03H1/00—Using plasma to produce a reactive propulsive thrust
- F03H1/0037—Electrostatic ion thrusters
- F03H1/0062—Electrostatic ion thrusters grid-less with an applied magnetic field
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/54—Plasma accelerators
Definitions
- the invention relates to an ion accelerator arrangement specified in the preamble of claim 1. Art.
- Ion accelerator arrangements are, for example, in use for surface treatment, in particular in semiconductor technology, or as a propulsion for spacecraft. Ions are typically generated and accelerated from a neutral working gas for propulsion purposes, particularly a noble gas. For the generation and acceleration of ions, in particular two construction principles have prevailed.
- the positively charged ions are transformed from a plasma by means of a lattice arrangement in which a first lattice adjacent to the plasma chamber lies at an anode potential and a second lattice displaced in the beam exit direction lies at a more negative cathode potential.
- a lattice arrangement in which a first lattice adjacent to the plasma chamber lies at an anode potential and a second lattice displaced in the beam exit direction lies at a more negative cathode potential.
- Space charge effects limit the ion current density of such an accelerator arrangement to low values.
- Another design provides for a plasma chamber which is interspersed on the one hand by an electric field for the acceleration of positively charged ions in the direction of a jet exit opening and on the other hand by a magnetic field for guiding electrons which serve to ionize a neutral working gas.
- accelerator arrangements with an annular plasma chamber in which the magnetic field proceeds predominantly radially and electrons under the influence of the electric and magnetic fields are reflected on closed drift paths have been in use for some time and magnetic fields move on closed drift paths.
- Such an accelerator arrangement is for example from the US 5,847,493 known.
- the magnetic field shows a special structure with a longitudinal direction parallel to the longitudinal field in longitudinal sections of the second kind and predominantly to the longitudinal direction perpendicular, in particular radial course in longitudinal sections of the first kind, which in particular one show as cusp course of the magnetic field.
- the arrangement is preferably constructed in multiple stages with alternating successive longitudinal sections of the first and second type.
- Such ion accelerator arrangements are known, for example DE 100 14 033 A1 or DE 198 28 704 A1 , At one of the DE 101 30 464 A1 known plasma accelerator arrangement are provided on the inner wall radially inwardly projecting electrodes.
- JP 61 066 868 A an RF ion generator is shown with excitation coil disposed on the sidewalls of a plasma chamber.
- a permanent magnet assembly generates a magnetic field with field lines curved around the coil turns to keep plasma away from the coil turns.
- the US Pat. No. 6,060,836 A describes a plasma generator with an axially protruding into a plasma chamber waveguide, which RF power of a magnetron is fed and carries its inner conductor at an end projecting into the chamber, a permanent magnet assembly.
- the present invention has for its object to further improve the efficiency of an ion accelerator arrangement.
- the invention is based on the itself from the DE 100 14 033 A1 known magnetic field structure, which in the ionization (or plasma) chamber in the longitudinal direction of the arrangement in a section of the second type has a field direction parallel to the longitudinal direction and in a section of the first kind a stronger, in particular predominant field component perpendicular to the longitudinal direction.
- the magnetic field continuously and monotonically transitions from a first-type portion to a second-type adjacent portion and vice versa, the adjacent first and second-type portions being longitudinally spaced apart or immediately adjacent to one another.
- the longitudinal direction of an ion accelerator arrangement coincides substantially with the mean direction of movement of the accelerated ions or an axis of symmetry of the ionization chamber.
- the working gas in this section available volume is reduced compared to a design with constant wall distance and at the same time the working gas in the middle between the opposite Concentrated wall surfaces.
- the distance of opposing wall surfaces in the section of the second type not only to each other but also with respect to a particular to the longitudinal direction parallel center line or center area reduced relative to the wall distance in an adjacent longitudinal section of the first kind.
- the minimum wall distance in a section of the second type is advantageously at least 15%, preferably at least 20%, in particular at least 25% less than the maximum wall distance in a neighboring section of the first kind.
- the opposing wall surfaces may be made of insulating material insulating or metallic or partially metallic, in particular in the way that in the section or sections of the second type is a metallic wall surface which forms an intermediate electrode at a fixed or sliding potential and in the longitudinal direction by insulating Wall sections is limited, and the wall surfaces in the first-type sections are electrically insulating.
- the ion accelerator arrangement in the longitudinal course of the plasma chamber is constructed in a plurality of stages such that several sections of the first type alternate with sections of the second type, wherein preferably the longitudinal components are alternately opposite in sections of the second type separated sections of the second type, the longitudinal component the magnetic field thus reverses when passing through a section of the first kind.
- a multi-stage magnetic field structure is known per se from the prior art.
- the invention essential reduction of the wall distance can then in only one, several or all sections be given second kind.
- the quantitative extent of the relative reduction can also vary from section to section.
- a reduction of the wall distance is present at least in the section of the second type which follows in the longitudinal direction of the anode, and / or if the quantity is quantitatively varied over several sections, the reduction in this section is greatest.
- the anode is preferably arranged on the end of the ionization chamber opposite the longitudinal direction of the ion outlet opening.
- the cathode is advantageously designed as a primary electron source from which primary electrons are conducted through the ion exit opening into the plasma chamber and / or which electrons serve to neutralize an ion or plasma jet emerging from the ionization chamber, and laterally offset outside the ionization chamber and against the outlet opening arranged.
- the ion accelerator arrangement according to the invention can serve both for delivering a positively charged ion beam and, in particular in the preferred application in the propulsion of a spacecraft, for emitting a neutral plasma jet.
- the accelerated ions can be used in particular for the treatment of solid surfaces and near-surface layers.
- FIG. 1 sketched arrangement of the prerequisite for the present invention magnetic field profile is schematically sketched in an ionization chamber IK.
- the ionization chamber is assumed to be rotationally symmetrical about a central longitudinal axis SA, which lies in the longitudinal direction LR of the arrangement.
- radially inner magnet assembly MGi and a radially outer magnet assembly MGe generate a magnetic field having at least a longitudinal portion MA1 N first type and at least one adjacent thereto in the longitudinal direction of the longitudinal section MA2 N of two species in the ionization chamber IK.
- the magnetic field in the ionization chamber in the longitudinal direction alternately successively comprises a plurality of longitudinal sections of the first and second types as in the in Fig. 2 sketched example and as in Fig. 1 indicated by a further longitudinal section MA2 N + 1 .
- the magnetic field shows a field direction parallel to the longitudinal axis SA, whereas in the longitudinal section MA1 N of the first type the magnetic field has a larger radial component, that is to say perpendicular to the longitudinal axis.
- the longitudinal section MA1 N first type is chosen in the example so that the radial field component significantly outweighs.
- Longitudinal sections of the first and second types can be defined directly adjacent to each other, but in the sketched example for clear delimitation with predominant longitudinal component in the section MA2 N and predominant radial component in the longitudinal section MA1 N but spaced by an unspecified transition section.
- the magnetic field structure described so far is in itself, for. B. off DE 10014033 A1 As well as magnet arrangements for generating such a magnetic field structure.
- the field distribution of the magnetic field in Fig. 1 is merely schematic and not quantitative.
- both opposing wall surfaces WF2i N , WF2e N are preferably displaced radially with respect to the longitudinally adjacent wall surfaces WF1i N, WF1e N radially toward the center of the ionization chamber.
- a concentration of the working gas in particular also of the non-ionized atoms in the radially inner region, is enforced in section MA2 N , where a higher electron density and therefore higher ionization probability are present due to lower magnetic flux.
- the course of the wall surfaces in the longitudinal direction can in each case be parallel to the longitudinal axis SA with a step or ramp as a transition.
- a course which is not parallel to the longitudinal axis SA is preferred, which is closer to the field line course of the magnetic field in this longitudinal section than a wall course parallel to SA.
- the wall surface WF2i N and / or WF2e N may be curved towards the radial center of the ionization chamber with a minimum wall distance D2L, which increases in the longitudinal direction of the adjacent portion MA1 N first type.
- the course of the wall surface WF2i N and / or WF2e N can be continuously monotonically curved or such a shape, for. B. be approximated with several straight part progressions.
- the wall surfaces WF1i N and / or WF1e N may have a straight or curved course in the longitudinal direction, wherein these surfaces for the sake of simplified production typically a parallel straight line to the longitudinal axis is usually favorable.
- the radial wall distance in the longitudinal section MA2 N second type or not parallel to SA wall of the local minimum radial distance D2L is preferably at least 15%, preferably at least 20%, in particular at least 25% less than the wall distance in the adjacent longitudinal section of the first kind or for non-SA parallel course of the local maximum wall distance D1M, ie D2L ⁇ 0.85 D1M or 0.80 D1M or 0.75 D1M.
- the wall surfaces of the chamber wall may consist of electrically insulating material or of electrically conductive material or else partially of electrically conductive material, in particular non-magnetizable metal.
- the metallic wall surfaces can then advantageously form, as parts of the electrode arrangement, intermediate electrodes at intermediate electrical potentials between the potentials of an anode and a cathode, wherein the intermediate potentials can be predeterminable or, in the case of isolated, non-contacted intermediate electrodes, adjust slidably during operation.
- WF2e N can also be provided in particular that metallic Are on a substantially cylindrical insulating chamber shell or inserted and fixed electrodes and facing away from the chamber shell, the ionization chamber and the opposite wall surface facing surfaces form the wall surfaces WF2i N or WF2e N.
- Fig. 2 is a longitudinally multi-level arrangement sketched, in which in itself, z. B. off DE 100 14 033 A1 known manner in the longitudinal direction a plurality of longitudinal sections of the first and second type alternately follow one another, wherein two to an intermediate portion of the first kind (MA1 N in Fig. 1 ) adjacent sections of the second kind (MA2 N , MA2 N + 1 in Fig. 1 ) show opposite longitudinal components of the magnetic field. While in Fig. 1 an annular chamber geometry is provided about a central longitudinal center axis SA and an inner and an outer magnet arrangement Mgi, Mge, is shown in the drawing Fig.
- the magnet arrangement consists in this case again in a known manner only of a surrounding the chamber envelope outer magnet assembly MG. Both wall surfaces facing one another then belong to the same chamber wall which is closed around the central longitudinal axis SAZ and laterally surrounding the ionization chamber.
- the ionization chamber shows a jet outlet opening, from which a usually slightly divergent ion or plasma jet PB exits with an average ion movement in the longitudinal direction LR.
- a cathode KA which is at cathode potential and emits electrons, is arranged as part of the electrode arrangement.
- a part IE of these electrons is passed through the electric field of the electrode assembly in the ionization chamber and serves there in a known Way for the ionization of the working gas and in particular also the generation of secondary electrons.
- Another part NE of the electrons emitted by the cathode can serve to neutralize a positively charged particle flow PB.
- no external electron source is provided for generating primary electrons for gas ionization and / or for neutralizing a plasma jet having excess positive charge.
- the cathode can then be given in particular by a housing part which surrounds the outlet opening of the ionization chamber and is located at the cathode potential.
- An anode A0 as part of the electrode arrangement is arranged at the end of the ionization chamber opposite the outlet opening AU in the longitudinal direction LR and is at anode potential.
- a neutral working gas for driving purposes preferably a heavy noble gas such as xenon (Xe) can be introduced into the ionization chamber, for which purpose an anode-side central supply line is entered in the sketch.
- Xe xenon
- a typical distribution of a plasma consisting of electrons and positive gas ions is shown in crossed hatching in the ionization chamber.
- the magnet arrangement forms a magnetic field in the ionization chamber IKZ, which in the longitudinal direction alternately has successively longitudinal sections MA11, MA12 of the first type and longitudinal sections MA21, MA22, MA23 of the second type.
- the distance of opposite wall surfaces which is equal in this case to the diameter of the ionization chamber in all longitudinal sections of the first type and in optionally present transition sections is constant DZ.
- the ionization chamber in the longitudinal section MA21 is narrowed to a minimum diameter D21 L by a concave curvature surrounding the central longitudinal axis with a wall surface WF21.
- the wall surface WF21 is assumed to be electrically insulating.
- the diameter of the ionization chamber is reduced to a value D22L, whereby larger dimensioning of D22L compared to D21 L may allow for any expansion of the plasma in the second compared to the first stage, and wall losses affecting the electrical efficiency are kept low can.
- the wall surface WF22 or the total diameter constriction at this distance is metallic and forms a first intermediate electrode A1 at a fixed intermediate potential.
- an electrode A2 of small radial thickness is provided, which does not reduce the diameter D23L in this section, or does not appreciably reduce it to DZ, and which uncontactively adopts an intermediate potential during operation.
- the electrode arrangement may also differ in the subdivision in the longitudinal direction from the division of the magnetic field into longitudinal sections of the first and second types.
- the wall surfaces in the sections of the second type can be shaped in various other ways and in this case be insulating, electrically conductive or else only partially conductive in an electrically conductive manner.
- the dimensions of the individual longitudinal sections and / or the intermediate electrodes may vary from stage to stage. characteristics known ion accelerator arrangements can be combined with the features essential to the invention.
- the cross section of the ionization chamber can also deviate from the rotationally symmetrical shape and assume an elongated shape.
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Description
Die Erfindung betrifft eine Ionenbeschleuniger-Anordnung der im Oberbegriff des Patentanspruchs 1 angegebenen Art.The invention relates to an ion accelerator arrangement specified in the preamble of
Ionenbeschleuniger-Anordnungen sind beispielsweise im Einsatz zur Oberflächenbehandlung, insbesondere in der Halbleitertechnologie, oder als Antrieb für Raumflugkörper. Ionen werden typischerweise aus einem neutralen Arbeitsgas für Antriebszwecke, insbesondere einem Edelgas erzeugt und beschleunigt. Zur Erzeugung und Beschleunigung von Ionen haben sich insbesondere zwei Bauprinzipien durchgesetzt.Ion accelerator arrangements are, for example, in use for surface treatment, in particular in semiconductor technology, or as a propulsion for spacecraft. Ions are typically generated and accelerated from a neutral working gas for propulsion purposes, particularly a noble gas. For the generation and acceleration of ions, in particular two construction principles have prevailed.
Bei den Gitterbeschleunigern werden aus einem Plasma die positiv geladenen Ionen mittels einer Gitteranordnung, bei welcher ein erstes, an die Plasma-kammer angrenzendes Gitter auf ein Anodenpotential und ein in Strahlaustrittsrichtung versetztes zweites Gitter auf einem negativeren Kathodenpotential liegen. Eine derartige Anordnung ist beispielsweise aus der
Eine andere Bauform sieht eine Plasmakammer vor, welche zum einen von einem elektrischen Feld zur Beschleunigung positiv geladener Ionen in Richtung einer Strahlaustrittsöffnung und zum anderen von einem Magnetfeld zur Führung von Elektronen, welche zur Ionisation eines neutralen Arbeitsgases dienen, durchsetzt ist. Seit längerer Zeit gebräuchlich sind insbesondere Beschleunigeranordnungen mit einer ringförmigen Plasmakammer, in welcher das Magnetfeld vorwiegend radial verläuft und Elektronen unter dem Einfluss derelektrischen und magnetischen Felder sich auf geschlossenen Driftbahnen belektrischen und magnetischen Felder sich auf geschlossenen Driftbahnen bewegen. Eine derartige Beschleunigeranordnung ist beispielsweise aus der
Bei einem neuen Typ einer Ionenbeschleuniger-Anordnung mit elektrischen und magnetischen Feldern in einer Plasmakammer zeigt das Magnetfeld eine besondere Struktur mit überwiegend zur Längsrichtung parallelem Feldverlauf in Längsabschnitten zweiter Art und überwiegend zur Längsrichtung senkrechtem, insbesondere radialem Verlauf in Längsabschnitten erster Art, welche insbesondere einen auch als cusp bezeichneten Verlauf des Magnetfelds zeigen. Die Anordnung ist vorzugsweise mehrstufig aufgebaut mit alternierend aufeinanderfolgenden Längsabschnitten erster und zweiter Art. Derartige lonenbeschleuniger-Anordnungen sind beispielsweise bekannt aus
In
Der vorliegenden Erfindung liegt die Aufgabe zugrunde, den Wirkungsgrad einer Ionenbeschleuniger-Anordnung weiter zu verbessern.The present invention has for its object to further improve the efficiency of an ion accelerator arrangement.
Die Erfindung ist im Patentanspruch 1 beschrieben. Die abhängigen Ansprüche enthalten vorteilhafte Ausgestaltungen und Weiterbildungen der Erfindung.The invention is described in
Die Erfindung geht aus von der an sich aus der
Durch die Verringerung des Abstands zwischen einander senkrecht zur Längsrichtung gegenüberstehender Wandflächen der die lonisationskammer begrenzenden Wände in dem Längsabschnitt zweiter Art wird das dem Arbeitsgas in diesem Abschnitt zur Verfügung stehende Volumen gegenüber einer Ausführung mit gleichbleibendem Wandabstand reduziert und zugleich das Arbeitsgas in der Mitte zwischen den gegenüberstehenden Wandflächen konzentriert.By reducing the distance between mutually perpendicular to the longitudinal direction of opposing wall surfaces of the ionization chamber limiting walls in the longitudinal section of the second type, the working gas in this section available volume is reduced compared to a design with constant wall distance and at the same time the working gas in the middle between the opposite Concentrated wall surfaces.
Es zeigt sich überraschenderweise, dass hierdurch der Gesamtwirkungsgrad der Anordnung, in welchen insbesondere der Ionisationswirkungsgrad und der elektrische Wirkungsgrad eingehen, deutlich ansteigt.It turns out, surprisingly, that in this way the overall efficiency of the arrangement, in which in particular the ionization efficiency and the electrical efficiency are received, increases significantly.
Vorzugsweise ist der Abstand gegenüberstehender Wandflächen in dem Abschnitt zweiter Art nicht nur zueinander sondern auch bezüglich einer insbesondere zur Längsrichtung parallelen Mittellinie oder Mittelfläche verringert gegenüber dem Wandabstand in einem benachbarten Längsabschnitt erster Art.Preferably, the distance of opposing wall surfaces in the section of the second type not only to each other but also with respect to a particular to the longitudinal direction parallel center line or center area reduced relative to the wall distance in an adjacent longitudinal section of the first kind.
Der minimale Wandabstand in einem Abschnitt zweiter Art ist vorteilhafterweise um wenigstens 15 %, vorzugsweise um wenigstens 20 %, insbesondere um wenigstens 25 % geringer als der maximale Wandabstand in einem benachbarten Abschnitt erster Art. Vorteilhafterweise ist wenigstens eine, vorzugsweise beide der sich gegenüberstehenden Wandflächen in einem Abschnitt zweiter Art zur Ionisationskammer hin versetzt, insbesondere in Form einer Wölbung mit einer in Längsrichtung kontinuierlich verlaufenden, vorzugsweise monoton gekrümmten Wandfläche.The minimum wall distance in a section of the second type is advantageously at least 15%, preferably at least 20%, in particular at least 25% less than the maximum wall distance in a neighboring section of the first kind. Advantageously, at least one, preferably both, of the opposing wall surfaces in FIG a section of the second type to the ionization chamber out, in particular in the form of a curvature with a continuously extending in the longitudinal direction, preferably monotonically curved wall surface.
Die einander gegenüberstehenden Wandflächen können isolierend aus dielektrischem Material bestehen oder metallisch oder teilweise metallisch sein, insbesondere in der Art, dass in dem Abschnitt bzw. Abschnitten zweiter Art eine metallische Wandfläche vorliegt, welche eine Zwischenelektrode auf festem oder gleitendem Potential bildet und in Längsrichtung durch isolierende Wandabschnitte begrenzt ist, und die Wandflächen in den Abschnitten erster Art elektrisch isolierend sind.The opposing wall surfaces may be made of insulating material insulating or metallic or partially metallic, in particular in the way that in the section or sections of the second type is a metallic wall surface which forms an intermediate electrode at a fixed or sliding potential and in the longitudinal direction by insulating Wall sections is limited, and the wall surfaces in the first-type sections are electrically insulating.
Vorteilhafterweise ist die Ionenbeschleuniger-Anordnung im Längsverlauf der Plasma-Kammer mehrstufig aufgebaut in der Art, dass mehrere Abschnitte erster Art alternierend mit Abschnitten zweiter Art aufeinanderfolgen, wobei vorzugsweise die Längskomponenten in durch einen Abschnitt erster Art getrennten Abschnitten zweiter Art abwechselnd entgegengesetzt sind, die Längskomponente des Magnetfelds somit bei Durchlaufen eines Abschnitts erster Art umkehrt. Eine derartige mehrstufige Magnetfeldstruktur ist aus dem Stand der Technik an sich bekannt. Die erfindungswesentliche Verringerung des Wandabstands kann dann in nur einem, mehreren oder allen Abschnitten zweiter Art gegeben sein. Bei Vorliegen der Verringerung des Wandabstands in mehreren oder allen Abschnitten zweiter Art gegenüber benachbarten Abschnitten erster Art kann dabei auch das quantitative Ausmaß der relativen Verringerung von Abschnitt zu Abschnitt variieren. Vorzugsweise liegt eine Verringerung des Wandabstands wenigstens in dem in Längsrichtung der Anode nächsten Abschnitt zweiter Art vor und/oder ist bei quantitativer Variation über mehrere Abschnitte die Verringerung in diesem Abschnitt am stärksten.Advantageously, the ion accelerator arrangement in the longitudinal course of the plasma chamber is constructed in a plurality of stages such that several sections of the first type alternate with sections of the second type, wherein preferably the longitudinal components are alternately opposite in sections of the second type separated sections of the second type, the longitudinal component the magnetic field thus reverses when passing through a section of the first kind. Such a multi-stage magnetic field structure is known per se from the prior art. The invention essential reduction of the wall distance can then in only one, several or all sections be given second kind. In this case, if the wall spacing is reduced in several or all sections of the second type relative to adjacent sections of the first type, the quantitative extent of the relative reduction can also vary from section to section. Preferably, a reduction of the wall distance is present at least in the section of the second type which follows in the longitudinal direction of the anode, and / or if the quantity is quantitatively varied over several sections, the reduction in this section is greatest.
Die Anode ist vorzugsweise am in Längsrichtung der Ionen-Austrittsöffnung entgegengesetzten Ende der Ionisationskammer angeordnet. Die Kathode ist vorteilhafterweise als Primärelektronenquelle ausgebildet, aus welcher Primärelektronen durch die Ionen-Austrittsöffnung in die Plasmakammer geleitet werden und/oder welche Elektronen zur Neutralisierung eines aus der lonisationskammer austretenden lonen- oder Plasmastrahls dienen, und vorzugsweise außerhalb der Ionisationskammer und gegen die Austrittsöffnung seitlich versetzt angeordnet.The anode is preferably arranged on the end of the ionization chamber opposite the longitudinal direction of the ion outlet opening. The cathode is advantageously designed as a primary electron source from which primary electrons are conducted through the ion exit opening into the plasma chamber and / or which electrons serve to neutralize an ion or plasma jet emerging from the ionization chamber, and laterally offset outside the ionization chamber and against the outlet opening arranged.
Die erfindungsgemäße Ionenbeschleuniger-Anordnung kann sowohl zur Abgabe eines positiv geladenen lonenstrahls als auch, insbesondere in der bevorzugten Anwendung im Antrieb eines Raumfahrzeugs zur Abgabe eines neutralen Plasmastrahls dienen. In anderer Anwendung können die beschleunigten Ionen insbesondere zur Behandlung von Festkörperoberflächen und oberflächennahen Schichten eingesetzt sein.The ion accelerator arrangement according to the invention can serve both for delivering a positively charged ion beam and, in particular in the preferred application in the propulsion of a spacecraft, for emitting a neutral plasma jet. In another application, the accelerated ions can be used in particular for the treatment of solid surfaces and near-surface layers.
Die Erfindung ist nachfolgend anhand bevorzugter Ausführungsbeispiele unter Bezugnahme auf die Abbildungen noch eingehend veranschaulicht. Dabei zeigt:
- Fig. 1
- einen Magnetfeldverlauf in einer Ionisationskammer,
- Fig. 2
- eine mehrstufige Anordnung.
- Fig. 1
- a magnetic field course in an ionization chamber,
- Fig. 2
- a multi-level arrangement.
Bei der in
Im Längsabschnitt zweiter Art MA2N zeigt das Magnetfeld eine überwiegend zur Längsachse SA parallele Feldrichtung, wogegen im Längsabschnitt MA1N erster Art das Magnetfeld eine demgegenüber größere radiale, d. h. senkrecht zur Längsachse gerichtete Komponente besitzt. Der Längsabschnitt MA1N erster Art ist im Beispiel so gewählt, dass die radiale Feldkomponente deutlich überwiegt. Längsabschnitte erster und zweiter Art können unmittelbar aneinander anschließend definiert sein, sind im skizzierten Beispiel zur klaren Abgrenzung mit überwiegender Längskomponente im Abschnitt MA2N und überwiegender Radialkomponente im Längsabschnitt MA1N aber durch einen nicht näher bezeichneten Übergangsabschnitt beabstandet. Im Längsabschnitt MA2N zweiter Art nimmt der Betrag des magnetischen Flusses von den seitlichen Kammerwänden zur Mitte hin ab, ebenso wie im Längsabschnitt erster Art der magnetische Fluss an den Kammerwänden größer ist als in der Mitte zwischen gegenüberliegenden Wandflächen. Die soweit beschriebene Magnetfeldstruktur ist an sich, z. B. aus
Wesentlich für die vorliegende Erfindung ist nun, dass im Bereich des Längsabschnitts MA2N zweiter Art der radiale Abstand der einander senkrecht zur Längsachse SA gegenüberstehenden Wandflächen WF2iN, WF2eN geringer ist als der radiale Wandabstand von Wandflächen WF1iN, WF1eN im Längsabschnitt MA1N erster Art. Die lichte radiale Weite der Ionisationskammer ist damit im Längsabschnitt MA2N zweiter Art gegenüber dem Längsabschnitt MA1N erster Art reduziert. Vorzugsweise sind im Abschnitt MA2N beide gegenüberstehenden Wandflächen WF2iN, WF2eN gegenüber den in Längsrichtung benachbarten Wandflächen WF1iN, WF1eN radial zur Mitte der Ionisationskammer hin verschoben. Gegenüber einer Kammergeometrie mit in Abschnitten erster und zweiter Art gleichem radialem Wandabstand wird dadurch im Abschnitt MA2N eine Konzentration des Arbeitsgases, insbesondere auch der nicht ionisierten Atome im radialen inneren Bereich erzwungen, wo aufgrund geringeren magnetischen Flusses eine höhere Elektronendichte und damit höhere lonisationswahrscheinlichkeit vorliegt.Essential to the present invention, that in the region of the longitudinal section MA2 N second type is the radial distance of the mutually perpendicular opposing to the longitudinal axis SA wall surfaces WF2i N, WF2e N is less than the radial distance from the wall of panels WF1i N, WF1e N is now in the longitudinal section MA1 N The clear radial width of the ionization chamber is thus reduced in the longitudinal section MA2 N of the second type with respect to the longitudinal section MA1 N of the first type. In the section MA2 N, both opposing wall surfaces WF2i N , WF2e N are preferably displaced radially with respect to the longitudinally adjacent wall surfaces WF1i N, WF1e N radially toward the center of the ionization chamber. In contrast to a chamber geometry with sections of the first and second type having the same radial wall spacing, a concentration of the working gas, in particular also of the non-ionized atoms in the radially inner region, is enforced in section MA2 N , where a higher electron density and therefore higher ionization probability are present due to lower magnetic flux.
Der Verlauf der Wandflächen in Längsrichtung kann in beiden Abschnitten jeweils parallel zur Längsachse SA sein mit einer Stufe oder Rampe als Übergang. Bevorzugt ist aber zumindest im Längsabschnitt MA2N zweiter Art ein nicht zur Längsachse SA paralleler Verlauf, welcher dem Feldlinienverlauf des Magnetfelds in diesen Längsabschnitt besser angenähert ist als ein zu SA paralleler Wandverlauf. Die Wandfläche WF2iN und/oder WF2eN kann zur radialen Mitte der Ionisationskammer hin gewölbt sein mit einem minimalen Wandabstand D2L, welcher in Längsrichtung zum benachbarten Abschnitt MA1N erster Art hin zunimmt. Der Verlauf der Wandfläche WF2iN und/oder WF2eN kann kontinuierlich monoton gekrümmt oder einer solchen Form, z. B. mit mehreren geraden Teilverläufen angenähert sein.The course of the wall surfaces in the longitudinal direction can in each case be parallel to the longitudinal axis SA with a step or ramp as a transition. However, at least in the longitudinal section MA2 N of the second type, a course which is not parallel to the longitudinal axis SA is preferred, which is closer to the field line course of the magnetic field in this longitudinal section than a wall course parallel to SA. The wall surface WF2i N and / or WF2e N may be curved towards the radial center of the ionization chamber with a minimum wall distance D2L, which increases in the longitudinal direction of the adjacent portion MA1 N first type. The course of the wall surface WF2i N and / or WF2e N can be continuously monotonically curved or such a shape, for. B. be approximated with several straight part progressions.
In entsprechender Weise können die Wandflächen WF1iN und/oder WF1eN einen in Längsrichtung geraden oder gekrümmten Verlauf aufweisen, wobei bei diesen Flächen der vereinfachten Herstellung halber typischerweise ein zur Längsachse paralleler gerader Verlauf im Regelfall günstig ist.In a corresponding manner, the wall surfaces WF1i N and / or WF1e N may have a straight or curved course in the longitudinal direction, wherein these surfaces for the sake of simplified production typically a parallel straight line to the longitudinal axis is usually favorable.
Der radiale Wandabstand im Längsabschnitt MA2N zweiter Art bzw. bei nicht zu SA parallelem Wandverlauf der dortige minimale radiale Wandabstand D2L ist vorzugsweise um wenigstens 15 %, vorzugsweise um wenigstens 20 %, insbesondere um wenigstens 25 % geringer als der Wandabstand im benachbarten Längsabschnitt erster Art bzw. bei nicht zu SA parallelem Verlauf der dortige maximale Wandabstand D1M, d. h. D2L ≤ 0,85 D1M bzw. 0,80 D1M bzw. 0,75 D1M.The radial wall distance in the longitudinal section MA2 N second type or not parallel to SA wall of the local minimum radial distance D2L is preferably at least 15%, preferably at least 20%, in particular at least 25% less than the wall distance in the adjacent longitudinal section of the first kind or for non-SA parallel course of the local maximum wall distance D1M, ie D2L ≤ 0.85 D1M or 0.80 D1M or 0.75 D1M.
Die Wandflächen der Kammerwand können aus elektrisch isolierendem Material oder aus elektrisch leitendem Material oder auch teilweise aus elektrisch leitendem Material, insbesondere nicht magnetisierbarem Metall bestehen. In einer bevorzugten Ausführungsform sind die Wandflächen WF2iN, WF2eN metallisch und die Wandflächen WF1N, WF1eN isolierend. Die metallischen Wandflächen können dann vorteilhafterweise als Teile der Elektrodenanordnung Zwischenelektroden auf elektrischen Zwischenpotentialen zwischen den Potentialen einer Anode und einer Kathode bilden, wobei die Zwischenpotentiale vorgebbar sein können oder bei isolierten, nicht kontaktierten Zwischenelektroden sich im Betrieb gleitend einstellen. Bei metallischen Wandflächen WF2iN, WF2eN kann insbesondere auch vorgesehen sein, dass metallische Elektroden auf eine im wesentlichen zylindrische isolierende Kammerhülle auf oder eingesetzt und fixiert sind und durch ihre der Kammerhülle abgewandten, der Ionisationskammer und der gegenüberliegenden Wandfläche zugewandten Flächen die Wandflächen WF2iN bzw. WF2eN bilden.The wall surfaces of the chamber wall may consist of electrically insulating material or of electrically conductive material or else partially of electrically conductive material, in particular non-magnetizable metal. In a preferred embodiment, the wall surfaces WF2i N , WF2e N metallic and the wall surfaces WF1 N , WF1e N insulating. The metallic wall surfaces can then advantageously form, as parts of the electrode arrangement, intermediate electrodes at intermediate electrical potentials between the potentials of an anode and a cathode, wherein the intermediate potentials can be predeterminable or, in the case of isolated, non-contacted intermediate electrodes, adjust slidably during operation. In metallic wall surfaces WF2i N , WF2e N can also be provided in particular that metallic Are on a substantially cylindrical insulating chamber shell or inserted and fixed electrodes and facing away from the chamber shell, the ionization chamber and the opposite wall surface facing surfaces form the wall surfaces WF2i N or WF2e N.
In
In anderer vorteilhafter Ausführungsform ist keine externe Elektronenquelle zur Erzeugung von Primärelektronen für die Gasionisation und/oder für die Neutralisation eines Plasmastrahls mit überschüssiger positiver Ladung vorgesehen. Die Kathode kann dann insbeosndere durch einen die Austrittsöffnung der lonisationskammer umgebenden, auf Kathodenpotential liegendem Gehäuseteil gegeben sein.In another advantageous embodiment, no external electron source is provided for generating primary electrons for gas ionization and / or for neutralizing a plasma jet having excess positive charge. The cathode can then be given in particular by a housing part which surrounds the outlet opening of the ionization chamber and is located at the cathode potential.
Eine Anode A0 als Teil der Elektrodenanordnung ist an dem der Austrittsöffnung AU in Längsrichtung LR entgegengesetzten Ende der Ionisationskammer angeordnet und liegt auf Anodenpotential. Ein neutrales Arbeitsgas, für Antriebszwecke vorzugsweise ein schweres Edelgas wie Xenon (Xe) ist in die lonisationskammer einleitbar, wofür in der Skizze eine anodenseitige zentrale Zuleitung eingetragen ist. Eine typische Verteilung eines aus Elektronen und positiven Gasionen bestehenden Plasmas ist in gekreuzter Schraffur in der lonisationskammer eingezeichnet.An anode A0 as part of the electrode arrangement is arranged at the end of the ionization chamber opposite the outlet opening AU in the longitudinal direction LR and is at anode potential. A neutral working gas, for driving purposes preferably a heavy noble gas such as xenon (Xe) can be introduced into the ionization chamber, for which purpose an anode-side central supply line is entered in the sketch. A typical distribution of a plasma consisting of electrons and positive gas ions is shown in crossed hatching in the ionization chamber.
Die Magnetanordnung bildet in der lonisationskammer IKZ ein Magnetfeld aus, welches in Längsrichtung alternierend aufeinanderfolgend Längsabschnitte MA11, MA12 erster Art und Längsabschnitte MA21, MA22, MA23 zweiter Art aufweist. Es sei angenommen, dass, wie skizziert, der in diesem Fall dem Durchmesser der Ionisationskammer gleiche Abstand gegenüberliegender Wandflächen in allen Längsabschnitten erster Art sowie in gegebenenfalls vorliegenden Übergangsabschnitten konstant gleich DZ sei.The magnet arrangement forms a magnetic field in the ionization chamber IKZ, which in the longitudinal direction alternately has successively longitudinal sections MA11, MA12 of the first type and longitudinal sections MA21, MA22, MA23 of the second type. Let it be assumed that, as outlined, the distance of opposite wall surfaces which is equal in this case to the diameter of the ionization chamber in all longitudinal sections of the first type and in optionally present transition sections is constant DZ.
In dem skizzierten Beispiel, welches der Anschaulichkeit halber mehrere Gestaltungsvarianten für die Längsabschnitte MA21, MA22, MA23 zweiter Art vereint zeigt, ist die Ionisationskammer im Längsabschnitt MA21 durch eine die zentrale Längsachse ringförmig umgebende Einwölbung mit einer Wandfläche WF21 auf einen minimalen Durchmesser D21 L eingeengt. Die Wandfläche WF21 sei als elektrisch isolierend angenommen. Im Längsabschnitt MA22 ist der Durchmesser der Ionisationskammer bis auf einen Wert D22L reduziert, wobei durch größere Bemessung von D22L gegenüber D21 L einer eventuell auftretenden Aufweitung des Plasmas in der zweiten gegenüber der ersten Stufe Rechnung getragen werden kann und den elektrischen Wirkungsgrad beeinträchtigende Wandverluste gering gehalten werden können. Die Wandfläche WF22 oder die gesamte Durchmesserverengung in diesem Abstand sei metallisch und bilde eine erste Zwischenelektrode A1 auf einem festen Zwischenpotential. Im Abschnitt MA23 schließlich ist eine Elektrode A2 geringer radialer Dicke vorgesehen, welche den Durchmesser D23L in diesem Abschnitt nicht oder nicht nennenswert gegenüber DZ reduziert, und welche unkontaktiert im Betrieb gleitend ein Zwischenpotential einnimmt. Die Elektrodenanordnung kann auch in der Unterteilung in Längsrichtung von der Unterteilung des Magnetfelds in Längsabschnitte erster und zweiter Art abweichen.In the sketched example, which for the sake of clarity combines several design variants for the longitudinal sections MA21, MA22, MA23 of the second kind, the ionization chamber in the longitudinal section MA21 is narrowed to a minimum diameter D21 L by a concave curvature surrounding the central longitudinal axis with a wall surface WF21. The wall surface WF21 is assumed to be electrically insulating. In the longitudinal section MA22, the diameter of the ionization chamber is reduced to a value D22L, whereby larger dimensioning of D22L compared to D21 L may allow for any expansion of the plasma in the second compared to the first stage, and wall losses affecting the electrical efficiency are kept low can. The wall surface WF22 or the total diameter constriction at this distance is metallic and forms a first intermediate electrode A1 at a fixed intermediate potential. In the section MA23, finally, an electrode A2 of small radial thickness is provided, which does not reduce the diameter D23L in this section, or does not appreciably reduce it to DZ, and which uncontactively adopts an intermediate potential during operation. The electrode arrangement may also differ in the subdivision in the longitudinal direction from the division of the magnetic field into longitudinal sections of the first and second types.
Die vorstehend und die in den Ansprüchen angegebenen sowie die den Abbildungen entnehmbaren Merkmale sind sowohl einzeln als auch in verschiedener Kombination vorteilhaft realisierbar. Die Erfindung ist nicht auf die beschriebenen Ausführungsbeispiele beschränkt, sondern im Rahmen fachmännischen Könnens in mancherlei Weise abwandelbar. Insbesondere können die Wandflächen in den Abschnitten zweiter Art auf verschiedene andere Weisen geformt und dabei isolierend, elektrisch leitend oder auch in sich nur teilflächenweise elektrisch leitend sein. Die Abmessungen der einzelnen Längsabschnitte und/oder der Zwischenelektroden können von Stufe zu Stufe variieren. Merkmale bekannter Ionenbeschleuniger-Anordnungen können mit den erfindungswesentlichen Merkmalen kombiniert werden. Der Querschnitt der lonisationskammer kann auch von der drehsymmetrischen Form abweichen und eine langgestreckte Form annehmen.The features indicated above and in the claims, as well as the features which can be seen in the figures, can be implemented advantageously both individually and in various combinations. The invention is not limited to the exemplary embodiments described, but can be modified in many ways within the scope of expert knowledge. In particular, the wall surfaces in the sections of the second type can be shaped in various other ways and in this case be insulating, electrically conductive or else only partially conductive in an electrically conductive manner. The dimensions of the individual longitudinal sections and / or the intermediate electrodes may vary from stage to stage. characteristics known ion accelerator arrangements can be combined with the features essential to the invention. The cross section of the ionization chamber can also deviate from the rotationally symmetrical shape and assume an elongated shape.
Claims (9)
- Ion accelerator arrangement with an ionization chamber (IK), an electrode arrangement and a magnet arrangement (MG),- the ionization chamber having an ion outlet opening in a longitudinal direction (LR) and being bounded by at least one side wall transverse to the longitudinal direction, and it being possible to introduce working gas into the ionization chamber via a feed opening at a spacing from the outlet opening,- the electrode arrangement including at least one cathode (KA) and one anode (A0), and an electric field for accelerating positively charged working gas ions in the direction of the outlet opening being generated in the ionization chamber,- the magnet arrangement generating a magnetic field in the ionization chamber, which has in the longitudinal direction at least one longitudinal portion of a second kind (MA2N) with a magnetic field direction substantially parallel to the longitudinal direction, and a longitudinal portion, adjacent thereto, of a first kind (MA1N) with, contrary thereto, a higher proportion of the field component perpendicular to the longitudinal direction, and- the wall spacing between opposite wall surfaces being less in the longitudinal portion of a second kind (MA2N) than in the longitudinal portion of a first kind (MA1N),characterized in that in the longitudinal portion of the second kind the extent of the wall in the longitudinal direction has a monotonic curvature towards the ionization chamber.
- Arrangement according to Claim 1, characterized in that the minimum wall spacing in the longitudinal portion of a second kind is less by at least 15%, in particular by at least 25%, than the maximum wall spacing in the longitudinal portion of a first kind.
- Arrangement according to Claim 1 or 2, characterized in that the longitudinal portions of a first and second kind follow one another in alternation.
- Arrangement according to one of Claims 1 to 3, characterized in that a reversal of direction of the longitudinal component of the magnetic field occurs in a longitudinal portion of a first kind.
- Arrangement according to one of Claims 1 to 4, characterized in that the chamber wall in a longitudinal portion of a second kind is formed at least partially by an intermediate electrode.
- Arrangement according to one of Claims 1 to 5, characterized in that the anode is arranged at the end of the ionization chamber opposite the outlet opening in the longitudinal direction.
- Arrangement according to one of Claims 1 to 6, characterized in that the cathode is designed as a primary electron source and is arranged outside the ionization chamber in a fashion offset laterally from the outlet opening.
- Arrangement according to one of Claims 1 to 7, characterized in that the cathode is designed as a primary electron source and is arranged outside the ionization chamber in a fashion offset laterally from the outlet opening.
- Arrangement according to one of Claims 1 to 7, characterized in that no external electron source is provided as neutralizer or primary electron source.
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DE10300776 | 2003-01-11 | ||
DE10300776A DE10300776B3 (en) | 2003-01-11 | 2003-01-11 | Ion accelerator arrangement |
PCT/EP2003/014210 WO2004064461A1 (en) | 2003-01-11 | 2003-12-13 | Ion accelerator arrangement |
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EP (1) | EP1586221B8 (en) |
JP (1) | JP4741245B2 (en) |
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SE529058C2 (en) * | 2005-07-08 | 2007-04-17 | Plasma Surgical Invest Ltd | Plasma generating device, plasma surgical device, use of a plasma surgical device and method for forming a plasma |
KR101094919B1 (en) * | 2005-09-27 | 2011-12-16 | 삼성전자주식회사 | Plasma accelerator |
US8006939B2 (en) * | 2006-11-22 | 2011-08-30 | Lockheed Martin Corporation | Over-wing traveling-wave axial flow plasma accelerator |
US7870720B2 (en) | 2006-11-29 | 2011-01-18 | Lockheed Martin Corporation | Inlet electromagnetic flow control |
DE102006059264A1 (en) * | 2006-12-15 | 2008-06-19 | Thales Electron Devices Gmbh | Plasma accelerator arrangement |
GB2480997A (en) * | 2010-06-01 | 2011-12-14 | Astrium Ltd | Plasma thruster |
CN102767496B (en) * | 2012-05-22 | 2014-12-03 | 北京卫星环境工程研究所 | Chemical-electromagnetic hybrid propeller with variable specific impulse |
CN102767497B (en) | 2012-05-22 | 2014-06-18 | 北京卫星环境工程研究所 | Fuel-free spacecraft propelling system based on spatial atomic oxygen and propelling method |
CN103835905B (en) * | 2014-03-03 | 2016-06-15 | 哈尔滨工业大学 | The variable section channel of multistage cusped magnetic field plasma pusher |
US9480140B2 (en) | 2014-11-21 | 2016-10-25 | Applied Materials, Inc. | Material modification by neutral beam source with selected collision angle |
US9253868B1 (en) * | 2014-11-21 | 2016-02-02 | Applied Materials, Inc. | Neutral beam source with plasma sheath-shaping neutralization grid |
DE102016206039A1 (en) * | 2016-04-12 | 2017-10-12 | Airbus Ds Gmbh | Ion-drive discharge chamber, ion drive with a discharge chamber, and a diaphragm for mounting in a discharge chamber of an ion drive |
CN105756875B (en) * | 2016-05-12 | 2018-06-19 | 哈尔滨工业大学 | Ionization accelerates integrated space junk plasma propeller |
RU2651578C1 (en) * | 2017-01-16 | 2018-04-23 | Российская Федерация, от имени которой выступает Государственная корпорация по атомной энергии "Росатом" (Госкорпорация "Росатом") | High voltage electronic supply system of high-frequency generator |
DE102017204590B3 (en) | 2017-03-20 | 2018-08-02 | Airbus Defence and Space GmbH | Cusp-field engine |
RU2764823C1 (en) * | 2020-11-16 | 2022-01-21 | Общество С Ограниченной Отвественностью «Эдвансд Пропалшн Системс» | Bidirectional wave plasma engine for a space vehicle |
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US3613370A (en) * | 1969-11-26 | 1971-10-19 | Nasa | Ion thruster |
DE3264478D1 (en) * | 1981-02-16 | 1985-08-08 | Comp Generale Electricite | Capacitor discharge excited gas laser |
FR2500220B1 (en) * | 1981-02-16 | 1986-01-10 | Comp Generale Electricite | EXCITED GAS LASER BY CAPACITY DISCHARGE |
JPS6166868A (en) * | 1984-09-11 | 1986-04-05 | Toshiba Corp | Rf type ion engine |
JPH0817116B2 (en) * | 1992-12-24 | 1996-02-21 | 核融合科学研究所長 | Plasma electromagnetic accelerator |
US5599745A (en) * | 1995-06-07 | 1997-02-04 | Micron Technology, Inc. | Method to provide a void between adjacent conducting lines in a semiconductor device |
RU2092983C1 (en) * | 1996-04-01 | 1997-10-10 | Исследовательский центр им.М.В.Келдыша | Plasma accelerator |
JP2959508B2 (en) * | 1997-02-14 | 1999-10-06 | 日新電機株式会社 | Plasma generator |
DE19828704A1 (en) * | 1998-06-26 | 1999-12-30 | Thomson Tubes Electroniques Gm | Plasma accelerator for space vehicles, increasing ion thruster motor efficiency |
DE10014033C2 (en) * | 2000-03-22 | 2002-01-24 | Thomson Tubes Electroniques Gm | Plasma accelerator arrangement |
DE10130464B4 (en) * | 2001-06-23 | 2010-09-16 | Thales Electron Devices Gmbh | Plasma accelerator configuration |
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RU2004123675A (en) | 2006-01-27 |
WO2004064461A1 (en) | 2004-07-29 |
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