EP1477684B1 - Molecular,turbo-molecular or hybrid pump with intergral valve - Google Patents
Molecular,turbo-molecular or hybrid pump with intergral valve Download PDFInfo
- Publication number
- EP1477684B1 EP1477684B1 EP04291161A EP04291161A EP1477684B1 EP 1477684 B1 EP1477684 B1 EP 1477684B1 EP 04291161 A EP04291161 A EP 04291161A EP 04291161 A EP04291161 A EP 04291161A EP 1477684 B1 EP1477684 B1 EP 1477684B1
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- European Patent Office
- Prior art keywords
- drag
- turbo
- turbomolecular
- molecular
- pump according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 230000002093 peripheral effect Effects 0.000 claims abstract description 31
- 238000005086 pumping Methods 0.000 claims abstract description 6
- 239000007789 gas Substances 0.000 claims description 27
- 238000000034 method Methods 0.000 claims description 26
- 230000008569 process Effects 0.000 claims description 24
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 10
- 238000011144 upstream manufacturing Methods 0.000 claims description 9
- 238000007789 sealing Methods 0.000 claims description 8
- 229910052757 nitrogen Inorganic materials 0.000 claims description 5
- 238000006073 displacement reaction Methods 0.000 claims description 4
- 238000002955 isolation Methods 0.000 abstract description 8
- 230000001105 regulatory effect Effects 0.000 abstract description 8
- 230000001276 controlling effect Effects 0.000 abstract description 6
- 230000007935 neutral effect Effects 0.000 description 7
- 238000002347 injection Methods 0.000 description 5
- 239000007924 injection Substances 0.000 description 5
- 230000008901 benefit Effects 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 2
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- 238000009413 insulation Methods 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000000593 degrading effect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000000644 propagated effect Effects 0.000 description 1
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- 239000000758 substrate Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
Images
Classifications
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04D—NON-POSITIVE-DISPLACEMENT PUMPS
- F04D27/00—Control, e.g. regulation, of pumps, pumping installations or pumping systems specially adapted for elastic fluids
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04D—NON-POSITIVE-DISPLACEMENT PUMPS
- F04D19/00—Axial-flow pumps
- F04D19/02—Multi-stage pumps
- F04D19/04—Multi-stage pumps specially adapted to the production of a high vacuum, e.g. molecular pumps
Definitions
- the present invention relates to gas pumping systems for establishing and regulating a suitable vacuum in a process chamber such as a chamber used in particular in the semiconductor industry.
- MEMS microelectronic mechanical systems
- the vacuum line of a process chamber generally comprises a secondary pump, of molecular, turbomolecular or hybrid type, connected at the chamber outlet with the interposition of an isolation valve, and which discharges into a connecting pipe connected to the input of a primary pump whose output is discharged at atmospheric pressure.
- An isolation valve is usually provided at the outlet of the secondary pump.
- Controlling the pressure in the process chamber requires the provision of means for modifying the pumping conditions in the vacuum line, in order to adapt them to the successive steps of the processes.
- the pressure in the process chambers has been controlled by the operation of a control valve placed directly at the outlet of the process chamber, upstream of the secondary pump. A problem is then the risk of fouling of the control valve by the pumped gases, and the risk of retrograde pollution from the control valve to the process chamber during subsequent steps of the processes.
- a solution that has been considered until now is to place the control valve in the connecting pipe, that is to say between the discharge of the secondary pump and the suction of the primary pump.
- the document WO 99/04325 describes in particular this solution of providing a control valve connected to the input of the primary pump not controlled in speed, while providing an injection of neutral gas upstream of the control valve.
- the problem proposed by the present invention is both to significantly reduce the risk of clogging of the control valve and the risks of retro-diffused pollution from the control valve to the process chamber, without significantly degrading the pressure regulation conditions in the process chamber.
- it is necessary to guarantee a rapid reaction of the pressure regulating means during the transitions between the successive steps of the processes.
- the invention makes it possible to reduce the space requirement resulting from the presence of the control valve itself.
- the idea underlying the invention is to integrate the control valve with the structure of the secondary pump, by providing a particular valve structure whose shutter acts directly on a radial outlet orifice in the cylindrical peripheral wall of the pump.
- a secondary pump of molecular, turbomolecular or hybrid type with an output stage is provided, and the shutter acts directly on the radial outlet orifice provided in the cylindrical peripheral wall of this output stage.
- control valve is placed closer to the secondary pump, which is itself closer to the process chamber, thus reducing the reaction time upstream disturbances in the atmosphere of the process chamber .
- the invention also benefits from the natural heating of the secondary pump, which heats the integrated valve and thus reduces the risk of deposition and condensation of the gases pumped on the parts of the control valve.
- the invention provides a molecular, turbomolecular or hybrid pump, comprising an output stage having a cylindrical peripheral wall and a radial output orifice passing through the cylindrical peripheral wall; the pump according to the invention further comprises a valve integrated regulating and / or isolating device having a coaxial annular obturator with passage lumen which cooperates directly with the radial outlet orifice of the output stage for sealing and / or regulating.
- the coaxial annular shutter is placed inside the cylindrical peripheral wall in an annular discharge space, bearing on the internal face of the radial outlet orifice.
- the coaxial annular shutter is supported on the outer face of the radial outlet orifice, and housed around the cylindrical peripheral wall of the output stage.
- the annular coaxial shutter may advantageously be biased in axial rotation by a motor to adjustably position the passage lumen relative to the radial outlet orifice.
- the rotation of the coaxial annular shutter displaces the passage lumen vis-à-vis the radial outlet orifice, and thus performs the control of the gas flow through the control valve and / or insulation.
- the coaxial annular shutter may comprise a rack engaged with a gear wheel driven in rotation by the motor.
- the motor can advantageously be housed in a casing mounted radially against the cylindrical peripheral wall of the pump, with the interposition of seals.
- the valve makes a total sealing tight in the closed position.
- the coaxial annular shutter may comprise sealing means mounted to seal the shutter in the closed position.
- the coaxial annular shutter may comprise a total shutter flap mounted radially on the annular coaxial shutter, and biased in radial displacement by displacement means which press against the periphery of the radial orifice of exit when it is opposite said radial outlet orifice, and that away from the cylindrical peripheral wall in its other angular positions.
- the nitrogen injection can be carried out inside the housing containing the drive motor of the coaxial annular shutter of the control valve, which further protects the engine itself against any risk of pollution by pumped gases.
- the passage lumen of the coaxial annular shutter may be shaped to form a suitable conductance curve for stable and efficient control.
- the shape of the passage lumen defines the variation of the conductance as a function of the rotation angle of the coaxial annular shutter.
- a system for pumping the gases from a process chamber comprising at least one molecular, turbomolecular or hybrid secondary pump with an output stage, and comprising at least one control valve and / or or insulation controlling the flow of pumped gases; according to the invention, the control valve and / or isolation is integrated in the output stage as defined above.
- control valve and / or isolation can advantageously be controlled by a motor and control means for performing a pressure regulation upstream of the secondary pump.
- a primary pump 2 which delivers at atmospheric pressure and whose suction is connected, by means of a connecting pipe 3, discharge 4 of a secondary pump 5 whose suction 6 is connected to the process chamber 1.
- the discharge 4 of the secondary pump 5 comprises, integrated in the secondary pump 5 itself, a control valve 7 associated with means 8 for controlling the control valve 7.
- control valve 7 may comprise a shutter mechanically displaceable by a motor constituting the means 8 for controlling the control valve 7.
- the motor 8 can be controlled by control means 9 such as a microprocessor or a microcontroller.
- control means 9 can receive a setpoint signal produced by a setpoint 10, and measurement signals produced for example by a pressure sensor 11 in the process chamber 1 .
- the pressure in the process chamber 1 can be controlled by the greater or smaller opening of the control valve 7, obtained by actuating the motor 8.
- the control means 9 control a power supply. 12 which controls the speed of the primary pump 2, and / or a supply 13 which controls the speed of the secondary pump 5.
- a source of neutral gas 14, for example containing nitrogen, may advantageously be connected, via a pipe 15 and a control valve 16, to a housing containing the engine 8, for injecting a neutral gas which is propagated towards the inside the output stage of the secondary pump 5 through the regulating valve 7.
- FIGS. 2 to 11 which illustrate an advantageous embodiment of a secondary pump 5 according to the present invention, will now be considered.
- the invention applies to secondary pumps that can be of the molecular type, of the turbomolecular type or of the hybrid type.
- the stator comprises a cylindrical peripheral wall around an inner stator skirt from which it is separated by an annular space of discharge.
- a radial outlet orifice passes through the cylindrical peripheral wall and thus communicates the external atmosphere with the annular discharge space.
- a rotor with helical ribs is engaged coaxially in the interior space defined by the inner stator skirt and is rotated along the axis of the pump.
- the rotor and the stator comprise stages of fins which fit into each other.
- a hybrid-type secondary pump there are, starting from the suction of the pump, finned turbomolecular type compression stages followed by at least one Holweck type output stage.
- FIGS. 2 to 11 there is shown only the output stage of such a secondary pump 5 of molecular or hybrid type, which stage can be associated with other stages such as turbo stages.
- the output stage of such a molecular or hybrid pump 5 comprises a cylindrical peripheral wall 17, a coaxial internal stator skirt 18 with helical inner ribs 19, and a Holweck rotor, not shown in the figures, which is engaged coaxially in the internal space 20 defined by the inner stator skirt 18 and which is rotated along the axis of the pump by a not shown main motor.
- the secondary pump 5 is seen from its downstream face, from which the downstream closure wall has been removed to make it possible to distinguish the internal members of the pump.
- the downstream face of the pump is closed by a disk-shaped sealed wall fixed to the cylindrical peripheral wall 17 and defining a downstream chamber 21 (see in particular FIG. 6).
- the pumped gases are discharged by the Holweck rotor to the downstream chamber 21 which itself communicates with an annular discharge space 22 located between the cylindrical peripheral wall 17 and the inner stator skirt 18.
- the cylindrical peripheral wall 17 has a radial outlet orifice 23 through which the discharged gases escape from the annular discharge space 22.
- a particular regulating valve structure whose closure element is directly adjacent to the radial outlet orifice 23 in the cylindrical peripheral wall 17 of the Holweck stage of the secondary pump 5.
- control valve comprises a coaxial annular shutter 24, of cylindrical shape, in sealing engagement against one of the faces of the radial outlet orifice 23, having a passage opening 25 (FIG. a portion of its periphery, and biased in axial rotation to adjustably position said passage lumen 25 in an angular orientation more or less aligned or offset from the radial outlet orifice 23 in order to adjust the conductance of the valve. regulation.
- Such a coaxial annular shutter 24 is illustrated in isolation in perspective in a particular embodiment in FIG. 5. It can be seen in this figure that the coaxial annular shutter 24 has a cylindrical shape constituted by a continuous cylindrical wall 24a and limited by an upstream circular edge 24b and a downstream circular edge 24c. A guide groove 24d is provided on the outer wall of the wall 24a, to cooperate with guide means which fix the axial position of the cylindrical annular shutter 24 in the pump body.
- the upstream circular edge 24b includes a toothed portion 24e for cooperating with a driving pinion urged by a motor for driving in axial rotation the coaxial annular shutter 24 in the pump body.
- FIG. 5 also distinguishes the passage lumen 25 which, when the angular position of the coaxial annular shutter 24 faces the radial outlet orifice 23 (FIG. 6) of the pump, defines the position of total opening of the valve, and which more or less closes the control valve when it is offset away from the radial outlet orifice 23.
- the passage light 25 is given a shape adapted to obtain a curve of conductance suitable for achieving a stable and effective control by angular position control of the coaxial annular shutter 24 about the axis of the pump.
- FIG. 5 there is also a total shutter shutter 26, radially movable on the coaxial annular shutter 24, to be radially biased by radial displacement means which will be described later.
- the total shutter 26 comprises a front seal 26a to ensure complete sealing in the closed position.
- the coaxial annular shutter 24 is placed inside the annular discharge space 22, and is displaceable by axial rotation about the axis of the pump as illustrated by the double arrow 27 in Figure 2.
- the coaxial annular shutter 24 is driven by the motor 8 placed in a casing 28 mounted radially on the cylindrical peripheral wall 17, as is best seen in FIG. 6.
- the motor 8 drives a wheel toothed 29 which engages on the toothed portion 24e of the upstream circular edge 24b of the annular coaxial shutter 24.
- the housing 28 is radially mounted on the cylindrical peripheral wall 17 of the pump body with the interposition of a front annular seal 30.
- a second radial annular seal 31 is also provided in the cylindrical peripheral wall. 17 inside the passage opening of the shaft carrying the toothed wheel 29.
- FIG. 6 further distinguishes the arrival of the neutral gas injection pipe 15 in the housing 28 containing the engine 8.
- Such an injection of neutral gas causes a flow of neutral gas through the engine 8 in the direction of the secondary pump 5, avoiding a circulation of gas pumped from the secondary pump 5 to the engine 8 to reduce the risk of pollution of the engine 8, and simultaneously ensuring a dilution of the gases in the Holweck stage, which further reduces the risks of deposit.
- the unidirectional flow of neutral gas is provided by providing at least one calibrated axial through hole in the toothed wheel 29.
- the coaxial annular shutter 24 Due to its position inside the annular discharge space 22, the coaxial annular shutter 24 takes advantage of the heating at the outlet of the Holweck stage, which reduces the risk of deposits of gas pumped on the elements of the control valve. But above all, this position of the coaxial annular shutter 24 minimizes the high pressure gas volume upstream of the control valve 7, thus improving the reaction capacity of the control.
- control valve is shown in the full shutter position.
- the coaxial annular shutter 24 is placed in an angular position such that the total shutter 26 is exactly opposite the radial outlet orifice 23.
- the total shutter shutter 26 is pressed against the face internal cylindrical peripheral wall 17, around the entire periphery of the radial outlet orifice 23, and its annular seal 26a is pressed against the periphery of the radial outlet orifice 23 to ensure a perfect seal.
- FIG. 7 the secondary pump 5 is illustrated in a state in which the control valve is in the fully open position.
- This figure shows the elements of FIG. 6, which are identified by the same reference numerals.
- the coaxial annular shutter 24 has been pivoted by actuation of the motor 8 to place the passage lumen 25 in correspondence with the radial outlet orifice 23, in order to allow the maximum passage of the discharged gases. by the pump.
- the shutter shutter 26 is then retracted laterally, and is not shown in the figure.
- the secondary pump 5 of FIG. 6 is shown in diametral section in partial open position, a position also illustrated in plan view in FIG. 9.
- the coaxial annular shutter 24 is pivoted. angularly by the motor to place the passage lumen 25 partially in front of the radial outlet orifice 23, which radial outlet orifice 23 is partially closed by the total shutter shutter 26.
- the valve is illustrated in the half position. opening.
- the total shutter shutter 26 is radially displaceable, to be spaced from the cylindrical peripheral wall 17 in all the angular positions of the coaxial annular shutter 24 except in the position of total closure shown in Figure 6.
- the total shutter 26 has an inner face 26b ramp, with a portion 26c thinner and a portion 26d thicker.
- the inner face 26b is supported radially on rollers 32a and 32b, clearly visible in the figures in diametral section.
- the rollers such as the roll 32a bear against the thinnest part 26c of the total shutter shutter 26, allowing the total shutter shutter to retract radially. 26 in the direction of the axis of the pump, away from the cylindrical peripheral wall 17.
- the total closure position illustrated in FIG.
- the rollers such as the roll 32a are in pressing on the thickest part 26d of the total shutter 26, pushing the shutter 26 to the outside to press against the cylindrical peripheral wall 17 around the periphery of the radial outlet orifice 23, the seal 26a then ensuring the perfect seal.
- FIG. 3 illustrates in perspective the secondary pump 5 in the position of FIG. 11: the total shutter shutter 26 is slightly off-center with respect to the radial outlet orifice 23.
- FIG. 4 illustrates the secondary pump 5 in the half-opening position illustrated in FIG. 8 and in FIG. 9.
- the total shutter shutter 26 is offset by half the width of the radial outlet orifice 23, and we also distinguish half of the passage light 25.
- control valve provided with a total shutter 26, can also provide the function of isolation valve.
- the coaxial annular shutter 24 comprises only a passage lumen 25, and is devoid of a total shutter flap 26.
- the valve only fulfills the function of the control valve, the complete shutter of the valve being not tight.
- the coaxial annular shutter 24 is disposed inside the pump, and bears against the inner face of the cylindrical peripheral wall 17 around the radial outlet orifice 23.
- annular coaxial shutter 24 can be placed outside the cylindrical peripheral wall 17, resting on the edges of the radial outlet orifice 23.
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Abstract
Description
La présente invention concerne les systèmes de pompage des gaz permettant d'établir et de réguler un vide approprié dans une chambre de procédés telle qu'une chambre utilisée notamment dans l'industrie des semi-conducteurs.The present invention relates to gas pumping systems for establishing and regulating a suitable vacuum in a process chamber such as a chamber used in particular in the semiconductor industry.
Les procédés de fabrication des semi-conducteurs et des systèmes mécaniques microélectroniques (MEMS) comprennent généralement des étapes successives qui se déroulent dans une chambre de procédés sous atmosphère à faible pression. Chaque étape de procédé est caractérisée par une pression gazeuse qu'il faut réguler, par exemple pour l'entretien d'un plasma ou d'un bombardement de particules qui agit sur un substrat en semi-conducteur.Semiconductor fabrication processes and microelectronic mechanical systems (MEMS) generally comprise successive steps that take place in a process chamber under a low pressure atmosphere. Each process step is characterized by a gas pressure that must be regulated, for example for the maintenance of a plasma or a bombardment of particles that acts on a semiconductor substrate.
La plupart des étapes de procédés se réalisent en présence d'un vide approprié, généré et maintenu par une ligne de vide comprenant des pompes à vide raccordées à la chambre de procédés.Most of the process steps are carried out in the presence of a suitable vacuum, generated and maintained by a vacuum line comprising vacuum pumps connected to the process chamber.
La ligne de vide d'une chambre de procédés comprend généralement une pompe secondaire, de type moléculaire, turbomoléculaire ou hybride, raccordée en sortie de chambre avec interposition d'une vanne d'isolation, et qui refoule dans une canalisation de liaison raccordée à l'entrée d'une pompe primaire dont la sortie refoule à la pression atmosphérique. On prévoit généralement une vanne d'isolation à la sortie de la pompe secondaire.The vacuum line of a process chamber generally comprises a secondary pump, of molecular, turbomolecular or hybrid type, connected at the chamber outlet with the interposition of an isolation valve, and which discharges into a connecting pipe connected to the input of a primary pump whose output is discharged at atmospheric pressure. An isolation valve is usually provided at the outlet of the secondary pump.
Le contrôle de la pression dans la chambre de procédés nécessite de prévoir des moyens pour modifier les conditions de pompage dans la ligne de vide, pour les adapter aux étapes successives des procédés. De façon traditionnelle, on a contrôlé la pression dans les chambres de procédés par la manoeuvre d'une vanne de régulation placée directement en sortie de la chambre de procédés, en amont de la pompe secondaire. Un problème est alors le risque d'encrassement de la vanne de régulation par les gaz pompés, et le risque de pollution rétrograde depuis la vanne de régulation vers la chambre de procédés au cours d'étapes ultérieures des procédés.Controlling the pressure in the process chamber requires the provision of means for modifying the pumping conditions in the vacuum line, in order to adapt them to the successive steps of the processes. In the traditional way, the pressure in the process chambers has been controlled by the operation of a control valve placed directly at the outlet of the process chamber, upstream of the secondary pump. A problem is then the risk of fouling of the control valve by the pumped gases, and the risk of retrograde pollution from the control valve to the process chamber during subsequent steps of the processes.
Une solution qui a été envisagée jusqu'à présent est de placer la vanne de régulation dans la canalisation de liaison, c'est-à-dire entre le refoulement de la pompe secondaire et l'aspiration de la pompe primaire. Le document
On constate alors une dégradation de la régulation, vraisemblablement due à un temps de réponse allongé qui résulte de la présence d'un plus grand volume gazeux à haute pression entre le refoulement de la pompe secondaire et la vanne de régulation.There is then a degradation of the regulation, probably due to an elongated response time that results from the presence of a larger volume of gas at high pressure between the discharge of the secondary pump and the control valve.
Le problème proposé par la présente invention est à la fois de réduire de façon sensible les risques d'encrassement de la vanne de régulation et les risques de pollution rétro diffusée depuis la vanne de régulation vers la chambre de procédés, sans dégrader de façon sensible les conditions de régulation de pression dans la chambre de procédés. Il faut en particulier garantir une réaction rapide des moyens de régulation de pression lors des transitions entre les étapes successives des procédés.The problem proposed by the present invention is both to significantly reduce the risk of clogging of the control valve and the risks of retro-diffused pollution from the control valve to the process chamber, without significantly degrading the pressure regulation conditions in the process chamber. In particular, it is necessary to guarantee a rapid reaction of the pressure regulating means during the transitions between the successive steps of the processes.
Simultanément, l'invention permet de réduire l'encombrement résultant de la présence de la vanne de régulation elle-même.Simultaneously, the invention makes it possible to reduce the space requirement resulting from the presence of the control valve itself.
L'idée qui est à la base de l'invention est d'intégrer la vanne de régulation à la structure même de la pompe secondaire, en prévoyant une structure particulière de vanne dont l'obturateur agit directement sur un orifice radial de sortie dans la paroi périphérique cylindrique de la pompe.The idea underlying the invention is to integrate the control valve with the structure of the secondary pump, by providing a particular valve structure whose shutter acts directly on a radial outlet orifice in the cylindrical peripheral wall of the pump.
En pratique, on prévoit une pompe secondaire de type moléculaire, turbomoléculaire ou hybride à étage de sortie, et l'obturateur agit directement sur l'orifice radial de sortie prévu dans la paroi périphérique cylindrique de cet étage de sortie.In practice, a secondary pump of molecular, turbomolecular or hybrid type with an output stage is provided, and the shutter acts directly on the radial outlet orifice provided in the cylindrical peripheral wall of this output stage.
De la sorte, la vanne de régulation est placée au plus près de la pompe secondaire, qui est elle-même au plus près de la chambre de procédés, réduisant ainsi le temps de réaction aux perturbations amont dans l'atmosphère de la chambre de procédés.In this way, the control valve is placed closer to the secondary pump, which is itself closer to the process chamber, thus reducing the reaction time upstream disturbances in the atmosphere of the process chamber .
L'invention profite en outre de l'échauffement naturel de la pompe secondaire, qui échauffe la vanne intégrée et réduit ainsi les risques de dépôt et de condensation des gaz pompés sur les parties de la vanne de régulation.The invention also benefits from the natural heating of the secondary pump, which heats the integrated valve and thus reduces the risk of deposition and condensation of the gases pumped on the parts of the control valve.
On peut également chercher à conférer à cette structure de vanne de régulation des qualités d'étanchéité suffisantes pour remplir des fonctions de vanne d'isolation aval. On élimine ainsi le besoin d'une vanne d'isolation aval supplémentaire.It is also possible to provide this control valve structure with sufficient sealing qualities to fulfill downstream valve functions. This eliminates the need for an additional downstream isolation valve.
Pour atteindre ces buts ainsi que d'autres, l'invention prévoit une pompe moléculaire, turbomoléculaire ou hybride, comprenant un étage de sortie ayant une paroi périphérique cylindrique et un orifice radial de sortie traversant la paroi périphérique cylindrique ; la pompe selon l'invention comprend en outre une vanne de régulation et/ou d'isolation intégrée ayant un obturateur annulaire coaxial à lumière de passage qui coopère directement avec l'orifice radial de sortie de l'étage de sortie pour réaliser l'obturation et/ou la régulation.To achieve these and other objects, the invention provides a molecular, turbomolecular or hybrid pump, comprising an output stage having a cylindrical peripheral wall and a radial output orifice passing through the cylindrical peripheral wall; the pump according to the invention further comprises a valve integrated regulating and / or isolating device having a coaxial annular obturator with passage lumen which cooperates directly with the radial outlet orifice of the output stage for sealing and / or regulating.
Selon un premier mode de réalisation, l'obturateur annulaire coaxial est placé à l'intérieur de la paroi périphérique cylindrique dans un espace annulaire de refoulement, en appui sur la face interne de l'orifice radial de sortie.According to a first embodiment, the coaxial annular shutter is placed inside the cylindrical peripheral wall in an annular discharge space, bearing on the internal face of the radial outlet orifice.
Selon un autre mode de réalisation, l'obturateur annulaire coaxial est en appui sur la face externe de l'orifice radial de sortie, et logé autour de la paroi périphérique cylindrique de l'étage de sortie.According to another embodiment, the coaxial annular shutter is supported on the outer face of the radial outlet orifice, and housed around the cylindrical peripheral wall of the output stage.
L'obturateur annulaire coaxial peut avantageusement être sollicité en rotation axiale par un moteur pour positionner de façon réglable la lumière de passage par rapport à l'orifice radial de sortie. La rotation de l'obturateur annulaire coaxial déplace la lumière de passage vis-à-vis de l'orifice radial de sortie, et réalise ainsi le contrôle du flux gazeux traversant la vanne de régulation et/ou d'isolation.The annular coaxial shutter may advantageously be biased in axial rotation by a motor to adjustably position the passage lumen relative to the radial outlet orifice. The rotation of the coaxial annular shutter displaces the passage lumen vis-à-vis the radial outlet orifice, and thus performs the control of the gas flow through the control valve and / or insulation.
En pratique, l'obturateur annulaire coaxial peut comporter une crémaillère en prise sur une roue dentée entraînée en rotation par le moteur.In practice, the coaxial annular shutter may comprise a rack engaged with a gear wheel driven in rotation by the motor.
Le moteur peut avantageusement être logé dans un boîtier rapporté radialement contre la paroi périphérique cylindrique de la pompe, avec interposition de joints d'étanchéité.The motor can advantageously be housed in a casing mounted radially against the cylindrical peripheral wall of the pump, with the interposition of seals.
De préférence, la vanne réalise une obturation totale étanche en position fermée.Preferably, the valve makes a total sealing tight in the closed position.
A cet effet, l'obturateur annulaire coaxial peut comprendre des moyens d'étanchéité montés pour assurer l'étanchéité d'obturation en position fermée.For this purpose, the coaxial annular shutter may comprise sealing means mounted to seal the shutter in the closed position.
Selon une réalisation pratique, l'obturateur annulaire coaxial peut comprendre un volet d'obturation totale monté mobile radialement sur l'obturateur annulaire coaxial, et sollicité en déplacement radial par des moyens de déplacement qui le plaquent contre le pourtour de l'orifice radial de sortie lorsqu'il est au regard dudit orifice radial de sortie, et qui l'écartent de la paroi périphérique cylindrique dans ses autres positions angulaires.According to a practical embodiment, the coaxial annular shutter may comprise a total shutter flap mounted radially on the annular coaxial shutter, and biased in radial displacement by displacement means which press against the periphery of the radial orifice of exit when it is opposite said radial outlet orifice, and that away from the cylindrical peripheral wall in its other angular positions.
Pour réduire encore les risques d'encrassement de la vanne de régulation, on peut avantageusement prévoir une injection d'azote dans un espace annulaire de refoulement de l'étage de sortie.To further reduce the risk of fouling of the control valve, it is advantageous to provide a nitrogen injection in an annular discharge space of the output stage.
De préférence, l'injection d'azote peut être réalisée à l'intérieur du boîtier contenant le moteur d'entraînement de l'obturateur annulaire coaxial de la vanne de régulation, ce qui protège en outre le moteur lui-même contre tout risque de pollution par les gaz pompés.Preferably, the nitrogen injection can be carried out inside the housing containing the drive motor of the coaxial annular shutter of the control valve, which further protects the engine itself against any risk of pollution by pumped gases.
On peut avantageusement donner à la lumière de passage de l'obturateur annulaire coaxial une forme adaptée pour obtenir une courbe de conductance appropriée pour une régulation stable et efficace. La forme de la lumière de passage définit la variation de la conductance en fonction de l'angle de rotation de l'obturateur annulaire coaxial.Advantageously, the passage lumen of the coaxial annular shutter may be shaped to form a suitable conductance curve for stable and efficient control. The shape of the passage lumen defines the variation of the conductance as a function of the rotation angle of the coaxial annular shutter.
Selon un autre aspect de l'invention, on prévoit un système de pompage des gaz d'une chambre de procédés, comprenant au moins une pompe secondaire moléculaire, turbomoléculaire ou hybride à étage de sortie, et comprenant au moins une vanne de régulation et/ou d'isolation commandant le flux des gaz pompés ; selon l'invention, la vanne de régulation et/ou d'isolation est intégrée dans l'étage de sortie comme défini ci-dessus.According to another aspect of the invention, there is provided a system for pumping the gases from a process chamber, comprising at least one molecular, turbomolecular or hybrid secondary pump with an output stage, and comprising at least one control valve and / or or insulation controlling the flow of pumped gases; according to the invention, the control valve and / or isolation is integrated in the output stage as defined above.
La vanne de régulation et/ou d'isolation peut avantageusement être pilotée par un moteur et des moyens de commande pour réaliser une régulation de pression en amont de la pompe secondaire.The control valve and / or isolation can advantageously be controlled by a motor and control means for performing a pressure regulation upstream of the secondary pump.
D'autres objets, caractéristiques et avantages de la présente invention ressortiront de la description suivante de modes de réalisation particuliers, faite en relation avec les figures jointes, parmi lesquelles:
- la figure 1 est une vue schématique d'un système de pompage des gaz d'une chambre de procédés selon un mode de réalisation de la présente invention ;
- la figure 2 est une vue en perspective d'un étage Holweck de pompe moléculaire ou hybride selon un mode de réalisation de l'invention ;
- les figures 3 et 4 sont deux autres vues, à plus petite échelle, de l'étage Holweck de la figure 2, respectivement dans un état d'obturation presque totale et dans un état d'ouverture partielle ;
- la figure 5 est une vue en perspective d'un obturateur annulaire coaxial de la pompe de la figure 2 ;
- la figure 6 est une coupe diamétrale de l'étage Holweck de la figure 2, à l'état d'obturation totale ;
- la figure 7 est une coupe diamétrale de l'étage Holweck de la figure 2, dans l'état d'ouverture totale ;
- la figure 8 est une coupe diamétrale de l'étage Holweck de la figure 2, à l'état d'ouverture partielle ;
- la figure 9 est une vue de dessus de l'étage Holweck de la figure 2, dans l'état d'ouverture partielle illustré sur la figure 8 ;
- la figure 10 est une vue partielle de dessus montrant le détail du volet d'obturation totale en position d'obturation totale ; et
- la figure 11 est une vue de détail de dessus montrant le volet d'obturation totale en position de recul pour l'ouverture.
- Figure 1 is a schematic view of a gas pump system of a process chamber according to an embodiment of the present invention;
- FIG. 2 is a perspective view of a molecular or hybrid pump Holweck stage according to one embodiment of the invention;
- Figures 3 and 4 are two other views, on a smaller scale, of the Holweck stage of Figure 2, respectively in a state of almost total shutter and in a partial open state;
- Figure 5 is a perspective view of a coaxial annular shutter of the pump of Figure 2;
- FIG. 6 is a diametral section of the Holweck stage of FIG. 2, in the state of total closure;
- Figure 7 is a diametral section of the Holweck stage of Figure 2, in the fully open state;
- Figure 8 is a diametral section of the Holweck stage of Figure 2, in the partial opening state;
- Figure 9 is a top view of the Holweck stage of Figure 2, in the partially open state illustrated in Figure 8;
- Figure 10 is a partial top view showing the detail of the total shutter shutter in full shutter position; and
- Figure 11 is a detail view from above showing the shutter shutter total recoil position for opening.
Dans le mode de réalisation illustré sur la figure 1, dans une ligne de vide pour commander le vide d'une chambre de procédés 1, on prévoit une pompe primaire 2 qui refoule à la pression atmosphérique et dont l'aspiration est raccordée, par une canalisation de liaison 3, au refoulement 4 d'une pompe secondaire 5 dont l'aspiration 6 est connectée à la chambre de procédés 1.In the embodiment illustrated in FIG. 1, in a vacuum line for controlling the vacuum of a
Le refoulement 4 de la pompe secondaire 5 comporte, intégrée dans la pompe secondaire 5 elle-même, une vanne de régulation 7 associée à des moyens 8 pour piloter la vanne de régulation 7.The discharge 4 of the
Comme on le verra plus loin, la vanne de régulation 7 peut comprendre un obturateur mécaniquement déplaçable par un moteur constituant les moyens 8 pour piloter la vanne de régulation 7. Le moteur 8 peut être commandé par des moyens de commande 9 tels qu'un microprocesseur ou un microcontrôleur. Pour réaliser la régulation de pression dans la chambre de procédés 1, les moyens de commande 9 peuvent recevoir un signal de consigne produit par une consigne 10, et des signaux de mesure produits par exemple par un capteur de pression 11 dans la chambre de procédés 1.As will be seen below, the control valve 7 may comprise a shutter mechanically displaceable by a motor constituting the
La pression dans la chambre de procédés 1 peut être pilotée par l'ouverture plus ou moins grande de la vanne de régulation 7, obtenue par actionnement du moteur 8. En outre, on peut prévoir si nécessaire que les moyens de commande 9 commandent une alimentation 12 qui pilote la vitesse de la pompe primaire 2, et/ou une alimentation 13 qui pilote la vitesse de la pompe secondaire 5.The pressure in the
Une source de gaz neutre 14, par exemple contenant de l'azote, peut avantageusement être raccordée, par une canalisation 15 et une vanne de commande 16, à un boîtier contenant le moteur 8, pour injecter un gaz neutre qui se propage vers l'intérieur de l'étage de sortie de la pompe secondaire 5 à travers la vanne de régulation 7.A source of
On considérera maintenant les figures 2 à 11, qui illustrent un mode de réalisation avantageux d'une pompe secondaire 5 selon la présente invention.FIGS. 2 to 11, which illustrate an advantageous embodiment of a
L'invention s'applique à des pompes secondaires pouvant être de type moléculaire, de type turbomoléculaire ou de type hybride.The invention applies to secondary pumps that can be of the molecular type, of the turbomolecular type or of the hybrid type.
Dans une pompe moléculaire, en particulier une pompe moléculaire de type Holweck, le stator comprend une paroi périphérique cylindrique autour d'une jupe intérieure de stator de laquelle elle est séparée par un espace annulaire de refoulement. Un orifice radial de sortie traverse la paroi périphérique cylindrique et met ainsi en communication l'atmosphère extérieure avec l'espace annulaire de refoulement. Un rotor à nervures hélicoïdales est engagé coaxialement dans l'espace intérieur défini par la jupe intérieure de stator et est entraîné en rotation selon l'axe de la pompe.In a molecular pump, in particular a Holweck type molecular pump, the stator comprises a cylindrical peripheral wall around an inner stator skirt from which it is separated by an annular space of discharge. A radial outlet orifice passes through the cylindrical peripheral wall and thus communicates the external atmosphere with the annular discharge space. A rotor with helical ribs is engaged coaxially in the interior space defined by the inner stator skirt and is rotated along the axis of the pump.
Dans une pompe secondaire de type turbomoléculaire, le rotor et le stator comportent des étages d'ailettes qui s'imbriquent les uns dans les autres.In a turbomolecular-type secondary pump, the rotor and the stator comprise stages of fins which fit into each other.
Dans une pompe secondaire de type hybride, on trouve, en partant de l'aspiration de la pompe, des étages de compression de type turbomoléculaire à ailettes suivis d'au moins un étage de sortie de type Holweck.In a hybrid-type secondary pump, there are, starting from the suction of the pump, finned turbomolecular type compression stages followed by at least one Holweck type output stage.
Dans le mode de réalisation des figures 2 à 11, on a représenté seulement l'étage de sortie d'une telle pompe secondaire 5 de type moléculaire ou hybride, étage qui peut être associé à d'autres étages tels que des étages turbo.In the embodiment of FIGS. 2 to 11, there is shown only the output stage of such a
L'étage de sortie d'une telle pompe moléculaire ou hybride 5 comprend une paroi périphérique cylindrique 17, une jupe intérieure coaxiale de stator 18 à nervures intérieures hélicoïdales 19, et un rotor Holweck, non représenté sur les figures, qui est engagé coaxialement dans l'espace intérieur 20 défini par la jupe intérieure de stator 18 et qui est entraîné en rotation selon l'axe de la pompe par un moteur principal non représenté.The output stage of such a molecular or
On notera que, sur la figure 2, la pompe secondaire 5 est vue depuis sa face aval, de laquelle on a oté la paroi d'obturation aval pour permettre de distinguer les organes intérieurs de la pompe. En fonctionnement, la face aval de la pompe est obturée par une paroi étanche en forme de disque, fixée à la paroi périphérique cylindrique 17 et définissant une chambre aval 21 (voir notamment la figure 6). Les gaz pompés sont refoulés par le rotor Holweck vers la chambre aval 21 qui elle-même communique avec un espace annulaire de refoulement 22 situé entre la paroi périphérique cylindrique 17 et la jupe intérieure de stator 18.It will be noted that, in FIG. 2, the
La paroi périphérique cylindrique 17 comporte un orifice radial de sortie 23 par lequel s'échappent les gaz refoulés de l'espace annulaire de refoulement 22.The cylindrical
Selon l'invention, on prévoit une structure particulière de vanne de régulation dont l'élément d'obturation est directement adjacent à l'orifice radial de sortie 23 dans la paroi périphérique cylindrique 17 de l'étage Holweck de la pompe secondaire 5.According to the invention, there is provided a particular regulating valve structure whose closure element is directly adjacent to the
A cet effet, la vanne de régulation comprend un obturateur annulaire coaxial 24, de forme cylindrique, en appui étanche contre l'une des faces de l'orifice radial de sortie 23, comportant une lumière de passage 25 (figure 5) sur une portion de sa périphérie, et sollicité en rotation axiale pour positionner de façon réglable ladite lumière de passage 25 selon une orientation angulaire plus ou moins alignée ou décalée par rapport à l'orifice radial de sortie 23 afin de régler la conductance de la vanne de régulation.For this purpose, the control valve comprises a coaxial
Un tel obturateur annulaire coaxial 24 est illustré de façon isolée en perspective dans un mode de réalisation particulier sur la figure 5. On distingue sur cette figure que l'obturateur annulaire coaxial 24 a une forme cylindrique, constituée d'une paroi cylindrique continue 24a et limitée par un bord circulaire amont 24b et un bord circulaire aval 24c. Une rainure de guidage 24d est prévue sur la paroi externe de la paroi 24a, pour coopérer avec des moyens de guidage qui fixent la position axiale de l'obturateur annulaire cylindrique 24 dans le corps de pompe.Such a coaxial
Le bord circulaire amont 24b comporte une portion 24e dentée pour coopérer avec un pignon d'entraînement sollicité par un moteur pour entraîner en rotation axiale l'obturateur annulaire coaxial 24 dans le corps de pompe.The upstream
Sur la figure 5, on distingue également la lumière de passage 25 qui, lorsque la position angulaire de l'obturateur annulaire coaxial 24 la place face à l'orifice radial de sortie 23 (figure 6) de la pompe, définit la position d'ouverture totale de la vanne, et qui ferme plus ou moins la vanne de régulation lorsqu'elle est décalée à l'écart de l'orifice radial de sortie 23. On donne à la lumière de passage 25 une forme adaptée pour obtenir une courbe de conductance appropriée permettant de réaliser une régulation stable et efficace par commande de position angulaire de l'obturateur annulaire coaxial 24 autour de l'axe de la pompe.FIG. 5 also distinguishes the
Sur la figure 5, on distingue également un volet d'obturation totale 26, mobile radialement sur l'obturateur annulaire coaxial 24, pour être sollicité radialement par des moyens de déplacement radial qui seront décrits plus loin. Le volet d'obturation totale 26 comporte un joint frontal 26a pour assurer une étanchéité totale en position fermée.In FIG. 5, there is also a
Dans la réalisation illustrée sur les figures, l'obturateur annulaire coaxial 24 est placé à l'intérieur de l'espace annulaire de refoulement 22, et est déplaçable par rotation axiale autour de l'axe de la pompe comme illustré par la double flèche 27 sur la figure 2.In the embodiment illustrated in the figures, the coaxial
Pour ce mouvement de rotation axiale 27, l'obturateur annulaire coaxial 24 est entraîné par le moteur 8 placé dans un boîtier 28 rapporté radialement sur la paroi périphérique cylindrique 17, comme on le voit mieux sur la figure 6. Le moteur 8 entraîne une roue dentée 29 qui vient en prise sur la partie dentée 24e du bord circulaire amont 24b de l'obturateur annulaire coaxial 24.For this
Le boîtier 28 est rapporté radialement sur la paroi périphérique cylindrique 17 du corps de pompe avec interposition d'un joint d'étanchéité annulaire frontal 30. Un second joint d'étanchéité annulaire 31, à action radiale, est également prévu dans la paroi périphérique cylindrique 17 à l'intérieur de l'orifice de passage de l'arbre portant la roue dentée 29.The
Sur la figure 6, on distingue encore l'arrivée de la canalisation 15 d'injection de gaz neutre dans le boîtier 28 contenant le moteur 8. Une telle injection de gaz neutre provoque un flux de gaz neutre à travers le moteur 8 en direction de la pompe secondaire 5, évitant une circulation de gaz pompé depuis la pompe secondaire 5 vers le moteur 8 pour réduire les risques de pollution du moteur 8, et assurant simultanément une dilution des gaz dans l'étage Holweck, ce qui réduit encore les risques de dépôt. Le flux unidirectionnel de gaz neutre est assuré en prévoyant au moins un trou axial calibré traversant dans la roue dentée 29.FIG. 6 further distinguishes the arrival of the neutral
Grâce à sa position à l'intérieur de l'espace annulaire de refoulement 22, l'obturateur annulaire coaxial 24 profite de l'échauffement en sortie de l'étage Holweck, ce qui réduit les risques de dépôts de gaz pompés sur les éléments de la vanne de régulation. Mais surtout, cette position de l'obturateur annulaire coaxial 24 réduit au maximum le volume gazeux à haute pression en amont de la vanne de régulation 7, améliorant ainsi la capacité de réaction de la régulation.Due to its position inside the
Sur la figure 6, la vanne de régulation est illustrée dans la position d'obturation totale. Dans ce cas, l'obturateur annulaire coaxial 24 est placé dans une position angulaire telle que le volet d'obturation totale 26 est exactement en regard de l'orifice radial de sortie 23. Le volet d'obturation totale 26 est plaqué contre la face intérieure de paroi périphérique cylindrique 17, selon tout le pourtour de l'orifice radial de sortie 23, et son joint annulaire d'étanchéité 26a est plaqué contre le pourtour de l'orifice radial de sortie 23 pour assurer une étanchéité parfaite.In Figure 6, the control valve is shown in the full shutter position. In this case, the coaxial
Sur la figure 7, on a illustré la pompe secondaire 5 dans un état dans lequel la vanne de régulation est en position d'ouverture totale. On retrouve sur cette figure les éléments de la figure 6, qui sont repérés par les mêmes références numériques.In FIG. 7, the
Dans cette position d'ouverture totale, l'obturateur annulaire coaxial 24 a été pivoté par actionnement du moteur 8 pour placer la lumière de passage 25 en correspondance de l'orifice radial de sortie 23, afin d'autoriser le passage maximum des gaz refoulés par la pompe. Le volet d'obturation totale 26 est alors escamoté latéralement, et n'est pas représenté sur la figure.In this fully open position, the coaxial
Sur la figure 8, on a illustré en coupe diamétrale la pompe secondaire 5 de la figure 6 en position d'ouverture partielle, position également illustrée en vue de dessus sur la figure 9. Dans ce cas, l'obturateur annulaire coaxial 24 est pivoté angulairement par le moteur pour placer la lumière de passage 25 partiellement en face de l'orifice radial de sortie 23, lequel orifice radial de sortie 23 est partiellement obturé par le volet d'obturation totale 26. La vanne est illustrée en position de demi-ouverture.In FIG. 8, the
Pour permettre la rotation libre de l'obturateur annulaire coaxial 24, le volet d'obturation totale 26 est déplaçable radialement, pour être écarté de la paroi périphérique cylindrique 17 dans toutes les positions angulaires de l'obturateur annulaire coaxial 24 sauf dans la position de fermeture totale illustrée sur la figure 6.To allow free rotation of the coaxial
Pour cela, comme on le voit plus en détail sur les figures 10 et 11, le volet d'obturation totale 26 comporte une face intérieure 26b en rampe, avec une portion 26c plus mince et une portion 26d plus épaisse. La face intérieure 26b vient en appui radial sur des rouleaux 32a et 32b, bien visibles sur les figures en coupe diamétrale. En position d'ouverture totale ou partielle, illustrées sur la figure 11, les rouleaux tels que le rouleau 32a sont en appui sur la partie la plus mince 26c du volet d'obturation totale 26, autorisant le recul radial du volet d'obturation totale 26 en direction de l'axe de la pompe, à l'écart de la paroi périphérique cylindrique 17. Par contre, au voisinage de la position d'obturation totale, illustrée sur la figure 10, les rouleaux tels que le rouleau 32a sont en appui sur la partie la plus épaisse 26d du volet d'obturation totale 26, repoussant le volet d'obturation totale 26 vers l'extérieur pour le plaquer contre la paroi périphérique cylindrique 17 selon le pourtour de l'orifice radial de sortie 23, le joint 26a assurant alors l'étanchéité parfaite.For this, as seen in more detail in Figures 10 and 11, the
La figure 3 illustre en perspective la pompe secondaire 5 dans la position de la figure 11 : le volet d'obturation totale 26 est légèrement décentré par rapport à l'orifice radial de sortie 23.FIG. 3 illustrates in perspective the
La figure 4 illustre la pompe secondaire 5 en position de demi-ouverture illustrée sur la figure 8 et sur la figure 9. Le volet d'obturation totale 26 est décalé de la moitié de la largeur de l'orifice radial de sortie 23, et l'on distingue également la moitié de la lumière de passage 25.FIG. 4 illustrates the
Dans le mode de réalisation illustré sur les figures, la vanne de régulation, munie d'un volet d'obturation totale 26, peut assurer également la fonction de vanne d'isolation.In the embodiment illustrated in the figures, the control valve, provided with a
On comprend que, selon l'invention, on peut prévoir un mode de réalisation simplifié dans lequel l'obturateur annulaire coaxial 24 comporte seulement une lumière de passage 25, et est dépourvu de volet d'obturation totale 26. Dans ce cas, la vanne remplit seulement la fonction de vanne de régulation, l'obturation complète de la vanne n'étant pas étanche.It will be understood that, according to the invention, provision can be made for a simplified embodiment in which the coaxial
Egalement, dans le mode de réalisation illustré sur les figures, l'obturateur annulaire coaxial 24 est disposé à l'intérieur de la pompe, et vient en appui contre la face intérieure de la paroi périphérique cylindrique 17 autour de l'orifice radial de sortie 23.Also, in the embodiment illustrated in the figures, the coaxial
En alternative, on peut placer l'obturateur annulaire coaxial 24 à l'extérieur de la paroi périphérique cylindrique 17, en appui sur les bords de l'orifice radial de sortie 23.Alternatively, the annular
La présente invention n'est pas limitée aux modes de réalisation qui ont été explicitement décrits, mais elle en inclut les diverses variantes et généralisations qui sont à la portée de l'homme du métier.The present invention is not limited to the embodiments that have been explicitly described, but it includes the various variants and generalizations that are within the reach of those skilled in the art.
Claims (14)
- A molecular drag, turbomolecular, or turbo/drag hybrid pump (5) having an outlet stage with a cylindrical peripheral wall (17) and a radial outlet orifice (23) passing through the cylindrical peripheral wall (17), the pump being characterized in that it further comprises an integrated regulator and/or isolator valve having an annular coaxial closure member (24) with a through slot (25) that co-operates directly with the radial outlet orifice (23) of the outlet stage in order to perform closure and/or regulation.
- A molecular drag, turbomolecular, or turbo/drag hybrid pump according to claim 1, in which the annular coaxial closure member (24) is placed inside the cylindrical peripheral wall (17) in an annular delivery space (22), the member bearing against the inside face of the radial outlet orifice (23).
- A molecular drag, turbomolecular, or turbo/drag hybrid pump according to claim 1, in which the annular coaxial closure member (24) bears against the outside face of the radial outlet orifice (23), and is disposed around the cylindrical peripheral wall (17) of the outlet stage.
- A molecular drag, turbomolecular, or turbo/drag hybrid pump according to any one of claims 1 to 3, in which the annular coaxial closure member (24) is driven to turn about the axis of the cylinder by a motor (8) to position the through slot (25) in adjustable manner relative to the radial outlet orifice (23).
- A molecular drag, turbomolecular, or turbo/drag hybrid pump according to claim 4, in which the annular coaxial closure member (24) includes a rack (24e) meshing with a gearwheel (29) rotated by the motor (8).
- A molecular drag, turbomolecular, or turbo/drag hybrid pump according to claim 4 or claim 5, in which the motor (8) is housed in a housing (28) fitted radially against the cylindrical peripheral wall (17) of the pump, with sealing gaskets (30, 31) interposed between them.
- A molecular drag, turbomolecular, or turbo/drag hybrid pump according to any one of claims 1 to 6, in which the valve provides leaktight total closure in the closed position.
- A molecular drag, turbomolecular, or turbo/drag hybrid pump according to claim 7, in which the annular coaxial closure member (24) includes sealing means (26, 26a) mounted to provide leaktight closure in the closed position.
- A molecular drag, turbomolecular, or turbo/drag hybrid pump according to claim 8, in which the annular coaxial closure member (24) includes a total closure shutter (26) mounted to move radially on the annular coaxial closure member (24) and urged to move radially by displacement means (26b, 32a, 32b) which press it against the periphery of the radial outlet orifice (23) when it is in register with said radial outlet orifice (23), and which move it away from the cylindrical peripheral wall (17) in other angular positions thereof.
- A molecular drag, turbomolecular, or turbo/drag hybrid pump according to any one of claims 1 to 9, in which provision is further made to inject nitrogen into the annular delivery space (22) of the outlet stage.
- A molecular drag, turbomolecular, or turbo/drag hybrid pump according to claim 10, in which nitrogen is injected into a housing (28) containing a motor (8) for driving the annular coaxial closure member (24).
- A molecular drag, turbomolecular, or turbo/drag hybrid pump according to any one of claims 1 to 11, in, which the through slot (25) of the annular coaxial closure member (24) is of a shape that is adapted to obtain a conductance curve that is appropriate for regulation that is stable and effective.
- A system for pumping gas from a process chamber (1), the system comprising at least one secondary pump (5) of the molecular drag, turbomolecular, or turbo/drag hybrid type with an an outlet stage as defined in any one of claims 1 to 12, and in which the regulator and/or isolator valve controls the flow of pumped gas.
- A gas pumping system according to claim 13, in which the regulator and/or isolator valve is controlled by a motor (8) and by control means (9) so as to regulate pressure upstream from the secondary pump (5).
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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FR0305724 | 2003-05-13 | ||
FR0305724A FR2854933B1 (en) | 2003-05-13 | 2003-05-13 | MOLECULAR, TURBOMOLECULAR OR HYBRID PUMP WITH INTEGRATED VALVE |
Publications (2)
Publication Number | Publication Date |
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EP1477684A1 EP1477684A1 (en) | 2004-11-17 |
EP1477684B1 true EP1477684B1 (en) | 2007-11-07 |
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Application Number | Title | Priority Date | Filing Date |
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EP04291161A Expired - Lifetime EP1477684B1 (en) | 2003-05-13 | 2004-05-05 | Molecular,turbo-molecular or hybrid pump with intergral valve |
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US (1) | US7311491B2 (en) |
EP (1) | EP1477684B1 (en) |
JP (1) | JP4560331B2 (en) |
AT (1) | ATE377711T1 (en) |
DE (1) | DE602004009857T2 (en) |
FR (1) | FR2854933B1 (en) |
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GB2498816A (en) | 2012-01-27 | 2013-07-31 | Edwards Ltd | Vacuum pump |
DE102013207269A1 (en) * | 2013-04-22 | 2014-10-23 | Pfeiffer Vacuum Gmbh | Stator element for a Holweckpumpstufe, vacuum pump with a Holweckpumpstufe and method for producing a stator element for a Holweckpumpstufe |
WO2018039578A1 (en) * | 2016-08-26 | 2018-03-01 | Applied Materials, Inc. | Low pressure lift pin cavity hardware |
US10559451B2 (en) * | 2017-02-15 | 2020-02-11 | Applied Materials, Inc. | Apparatus with concentric pumping for multiple pressure regimes |
US10655638B2 (en) | 2018-03-15 | 2020-05-19 | Lam Research Corporation | Turbomolecular pump deposition control and particle management |
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DE3410905A1 (en) * | 1984-03-24 | 1985-10-03 | Leybold-Heraeus GmbH, 5000 Köln | DEVICE FOR CONVEYING GASES IN SUBATMOSPHAERIC PRESSURES |
US5443368A (en) * | 1993-07-16 | 1995-08-22 | Helix Technology Corporation | Turbomolecular pump with valves and integrated electronic controls |
JPH02102385A (en) * | 1988-10-08 | 1990-04-13 | Toyo Eng Corp | Gas exhaust system |
FR2656658B1 (en) * | 1989-12-28 | 1993-01-29 | Cit Alcatel | MIXED TURBOMOLECULAR VACUUM PUMP, WITH TWO ROTATION SHAFTS AND WITH ATMOSPHERIC PRESSURE DISCHARGE. |
KR100190310B1 (en) * | 1992-09-03 | 1999-06-01 | 모리시따 요오이찌 | Two stage primary dry pump |
DE19632375A1 (en) * | 1996-08-10 | 1998-02-19 | Pfeiffer Vacuum Gmbh | Gas friction pump |
DE19634095A1 (en) * | 1996-08-23 | 1998-02-26 | Pfeiffer Vacuum Gmbh | Entry stage for a double-flow gas friction pump |
US5944049A (en) * | 1997-07-15 | 1999-08-31 | Applied Materials, Inc. | Apparatus and method for regulating a pressure in a chamber |
JP3038432B2 (en) * | 1998-07-21 | 2000-05-08 | セイコー精機株式会社 | Vacuum pump and vacuum device |
JP3010529B1 (en) * | 1998-08-28 | 2000-02-21 | セイコー精機株式会社 | Vacuum pump and vacuum device |
FR2822200B1 (en) * | 2001-03-19 | 2003-09-26 | Cit Alcatel | PUMPING SYSTEM FOR LOW THERMAL CONDUCTIVITY GASES |
-
2003
- 2003-05-13 FR FR0305724A patent/FR2854933B1/en not_active Expired - Fee Related
-
2004
- 2004-05-05 DE DE602004009857T patent/DE602004009857T2/en not_active Expired - Lifetime
- 2004-05-05 EP EP04291161A patent/EP1477684B1/en not_active Expired - Lifetime
- 2004-05-05 AT AT04291161T patent/ATE377711T1/en not_active IP Right Cessation
- 2004-05-12 US US10/843,354 patent/US7311491B2/en not_active Expired - Fee Related
- 2004-05-12 JP JP2004142872A patent/JP4560331B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
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ATE377711T1 (en) | 2007-11-15 |
FR2854933A1 (en) | 2004-11-19 |
JP2004340147A (en) | 2004-12-02 |
JP4560331B2 (en) | 2010-10-13 |
DE602004009857D1 (en) | 2007-12-20 |
FR2854933B1 (en) | 2005-08-05 |
US20040228747A1 (en) | 2004-11-18 |
US7311491B2 (en) | 2007-12-25 |
EP1477684A1 (en) | 2004-11-17 |
DE602004009857T2 (en) | 2008-08-28 |
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