EP1440797B1 - Heat-sensitive lithographic printing plate precursor - Google Patents
Heat-sensitive lithographic printing plate precursor Download PDFInfo
- Publication number
- EP1440797B1 EP1440797B1 EP20040100163 EP04100163A EP1440797B1 EP 1440797 B1 EP1440797 B1 EP 1440797B1 EP 20040100163 EP20040100163 EP 20040100163 EP 04100163 A EP04100163 A EP 04100163A EP 1440797 B1 EP1440797 B1 EP 1440797B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- group
- product
- printing plate
- plate precursor
- independently represent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000007639 printing Methods 0.000 title claims description 47
- 239000002243 precursor Substances 0.000 title claims description 35
- -1 polysiloxane group Polymers 0.000 claims description 60
- 239000000975 dye Substances 0.000 claims description 58
- 239000011248 coating agent Substances 0.000 claims description 42
- 238000000576 coating method Methods 0.000 claims description 42
- 229920000642 polymer Polymers 0.000 claims description 24
- 125000003118 aryl group Chemical group 0.000 claims description 23
- 150000001875 compounds Chemical class 0.000 claims description 22
- 125000003342 alkenyl group Chemical group 0.000 claims description 20
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 20
- 125000000547 substituted alkyl group Chemical group 0.000 claims description 20
- 125000001424 substituent group Chemical group 0.000 claims description 18
- 125000005010 perfluoroalkyl group Chemical group 0.000 claims description 17
- 150000002500 ions Chemical class 0.000 claims description 16
- 239000005871 repellent Substances 0.000 claims description 13
- 229920001296 polysiloxane Polymers 0.000 claims description 12
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 9
- 125000000217 alkyl group Chemical group 0.000 claims description 8
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims description 8
- 229920005989 resin Polymers 0.000 claims description 8
- 239000011347 resin Substances 0.000 claims description 8
- 125000000129 anionic group Chemical group 0.000 claims description 6
- 125000002091 cationic group Chemical group 0.000 claims description 6
- 230000007935 neutral effect Effects 0.000 claims description 6
- 229910003849 O-Si Inorganic materials 0.000 claims description 5
- 229910003872 O—Si Inorganic materials 0.000 claims description 5
- 125000002947 alkylene group Chemical group 0.000 claims description 5
- HNYOPLTXPVRDBG-UHFFFAOYSA-N barbituric acid Chemical group O=C1CC(=O)NC(=O)N1 HNYOPLTXPVRDBG-UHFFFAOYSA-N 0.000 claims description 5
- 229920001400 block copolymer Polymers 0.000 claims description 5
- 125000004429 atom Chemical group 0.000 claims description 4
- 229920000578 graft copolymer Polymers 0.000 claims description 4
- 125000005843 halogen group Chemical group 0.000 claims description 4
- 229910052739 hydrogen Inorganic materials 0.000 claims description 4
- 239000001257 hydrogen Substances 0.000 claims description 4
- 230000005660 hydrophilic surface Effects 0.000 claims description 4
- 230000035515 penetration Effects 0.000 claims description 3
- 125000002373 5 membered heterocyclic group Chemical group 0.000 claims description 2
- 125000004070 6 membered heterocyclic group Chemical group 0.000 claims description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 2
- 125000003545 alkoxy group Chemical group 0.000 claims description 2
- 125000003277 amino group Chemical group 0.000 claims description 2
- 125000004104 aryloxy group Chemical group 0.000 claims description 2
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 2
- 238000010438 heat treatment Methods 0.000 claims description 2
- 125000005647 linker group Chemical group 0.000 claims description 2
- 229910052751 metal Inorganic materials 0.000 claims description 2
- 239000002184 metal Substances 0.000 claims description 2
- 229910052702 rhenium Inorganic materials 0.000 claims description 2
- 229910052703 rhodium Inorganic materials 0.000 claims description 2
- 125000004001 thioalkyl group Chemical group 0.000 claims description 2
- 125000005000 thioaryl group Chemical group 0.000 claims description 2
- ANRHNWWPFJCPAZ-UHFFFAOYSA-M thionine Chemical compound [Cl-].C1=CC(N)=CC2=[S+]C3=CC(N)=CC=C3N=C21 ANRHNWWPFJCPAZ-UHFFFAOYSA-M 0.000 claims description 2
- HOBCFUWDNJPFHB-UHFFFAOYSA-N indolizine Chemical compound C1=CC=CN2C=CC=C21 HOBCFUWDNJPFHB-UHFFFAOYSA-N 0.000 claims 1
- DZVCFNFOPIZQKX-LTHRDKTGSA-M merocyanine Chemical compound [Na+].O=C1N(CCCC)C(=O)N(CCCC)C(=O)C1=C\C=C\C=C/1N(CCCS([O-])(=O)=O)C2=CC=CC=C2O\1 DZVCFNFOPIZQKX-LTHRDKTGSA-M 0.000 claims 1
- 239000000047 product Substances 0.000 description 122
- 239000010410 layer Substances 0.000 description 55
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 39
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 36
- 230000015572 biosynthetic process Effects 0.000 description 28
- 238000003786 synthesis reaction Methods 0.000 description 25
- 239000000243 solution Substances 0.000 description 20
- 239000013067 intermediate product Substances 0.000 description 19
- 239000000463 material Substances 0.000 description 18
- 239000000203 mixture Substances 0.000 description 18
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 18
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 12
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 12
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 12
- 239000002253 acid Substances 0.000 description 12
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 10
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 9
- 239000000976 ink Substances 0.000 description 9
- 230000035945 sensitivity Effects 0.000 description 9
- 229910052782 aluminium Inorganic materials 0.000 description 8
- 239000011541 reaction mixture Substances 0.000 description 8
- LHENQXAPVKABON-UHFFFAOYSA-N 1-methoxypropan-1-ol Chemical compound CCC(O)OC LHENQXAPVKABON-UHFFFAOYSA-N 0.000 description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 7
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 7
- 229920001577 copolymer Polymers 0.000 description 7
- 239000002245 particle Substances 0.000 description 7
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 6
- 241001479434 Agfa Species 0.000 description 6
- 229910019142 PO4 Inorganic materials 0.000 description 6
- 239000011230 binding agent Substances 0.000 description 6
- 239000008119 colloidal silica Substances 0.000 description 6
- 238000004090 dissolution Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- SCVFZCLFOSHCOH-UHFFFAOYSA-M potassium acetate Chemical compound [K+].CC([O-])=O SCVFZCLFOSHCOH-UHFFFAOYSA-M 0.000 description 6
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical class OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 5
- 239000011888 foil Substances 0.000 description 5
- 239000004615 ingredient Substances 0.000 description 5
- 238000011282 treatment Methods 0.000 description 5
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- 230000004888 barrier function Effects 0.000 description 4
- 150000007524 organic acids Chemical class 0.000 description 4
- 239000012044 organic layer Substances 0.000 description 4
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 4
- 125000005373 siloxane group Chemical group [SiH2](O*)* 0.000 description 4
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- LDLCZOVUSADOIV-UHFFFAOYSA-N 2-bromoethanol Chemical compound OCCBr LDLCZOVUSADOIV-UHFFFAOYSA-N 0.000 description 3
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 150000008064 anhydrides Chemical class 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 3
- 239000012530 fluid Substances 0.000 description 3
- 229940093915 gynecological organic acid Drugs 0.000 description 3
- 230000002209 hydrophobic effect Effects 0.000 description 3
- 238000003384 imaging method Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 229920003986 novolac Polymers 0.000 description 3
- 235000005985 organic acids Nutrition 0.000 description 3
- 235000021317 phosphate Nutrition 0.000 description 3
- 239000002985 plastic film Substances 0.000 description 3
- 229920006255 plastic film Polymers 0.000 description 3
- 229920002451 polyvinyl alcohol Polymers 0.000 description 3
- 235000019422 polyvinyl alcohol Nutrition 0.000 description 3
- 235000011056 potassium acetate Nutrition 0.000 description 3
- NLKNQRATVPKPDG-UHFFFAOYSA-M potassium iodide Chemical compound [K+].[I-] NLKNQRATVPKPDG-UHFFFAOYSA-M 0.000 description 3
- 239000002244 precipitate Substances 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 229940086542 triethylamine Drugs 0.000 description 3
- MPPPKRYCTPRNTB-UHFFFAOYSA-N 1-bromobutane Chemical compound CCCCBr MPPPKRYCTPRNTB-UHFFFAOYSA-N 0.000 description 2
- HZNQSWJZTWOTKM-UHFFFAOYSA-N 2,3,4-trimethoxybenzoic acid Chemical compound COC1=CC=C(C(O)=O)C(OC)=C1OC HZNQSWJZTWOTKM-UHFFFAOYSA-N 0.000 description 2
- FALRKNHUBBKYCC-UHFFFAOYSA-N 2-(chloromethyl)pyridine-3-carbonitrile Chemical compound ClCC1=NC=CC=C1C#N FALRKNHUBBKYCC-UHFFFAOYSA-N 0.000 description 2
- SJSOFNCYXJUNBT-UHFFFAOYSA-N 3,4,5-trimethoxybenzoic acid Chemical compound COC1=CC(C(O)=O)=CC(OC)=C1OC SJSOFNCYXJUNBT-UHFFFAOYSA-N 0.000 description 2
- QZYCWJVSPFQUQC-UHFFFAOYSA-N 3-phenylfuran-2,5-dione Chemical compound O=C1OC(=O)C(C=2C=CC=CC=2)=C1 QZYCWJVSPFQUQC-UHFFFAOYSA-N 0.000 description 2
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 2
- 239000007848 Bronsted acid Substances 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 239000006096 absorbing agent Substances 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 229910001914 chlorine tetroxide Inorganic materials 0.000 description 2
- 239000000084 colloidal system Substances 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000000994 contrast dye Substances 0.000 description 2
- 125000004122 cyclic group Chemical group 0.000 description 2
- 230000004069 differentiation Effects 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- POULHZVOKOAJMA-UHFFFAOYSA-N dodecanoic acid Chemical compound CCCCCCCCCCCC(O)=O POULHZVOKOAJMA-UHFFFAOYSA-N 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 229940093499 ethyl acetate Drugs 0.000 description 2
- 235000019439 ethyl acetate Nutrition 0.000 description 2
- LEQAOMBKQFMDFZ-UHFFFAOYSA-N glyoxal Chemical compound O=CC=O LEQAOMBKQFMDFZ-UHFFFAOYSA-N 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 239000003112 inhibitor Substances 0.000 description 2
- 230000031700 light absorption Effects 0.000 description 2
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- LPNBBFKOUUSUDB-UHFFFAOYSA-N p-toluic acid Chemical compound CC1=CC=C(C(O)=O)C=C1 LPNBBFKOUUSUDB-UHFFFAOYSA-N 0.000 description 2
- VLTRZXGMWDSKGL-UHFFFAOYSA-M perchlorate Chemical compound [O-]Cl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-M 0.000 description 2
- 229920001568 phenolic resin Polymers 0.000 description 2
- 239000005011 phenolic resin Substances 0.000 description 2
- 150000002989 phenols Chemical class 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 2
- 239000010452 phosphate Substances 0.000 description 2
- XHXFXVLFKHQFAL-UHFFFAOYSA-N phosphoryl trichloride Chemical compound ClP(Cl)(Cl)=O XHXFXVLFKHQFAL-UHFFFAOYSA-N 0.000 description 2
- 229920000233 poly(alkylene oxides) Polymers 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 229920003987 resole Polymers 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 229940014800 succinic anhydride Drugs 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- 239000001003 triarylmethane dye Substances 0.000 description 2
- ZDPHROOEEOARMN-UHFFFAOYSA-N undecanoic acid Chemical compound CCCCCCCCCCC(O)=O ZDPHROOEEOARMN-UHFFFAOYSA-N 0.000 description 2
- OKJFKPFBSPZTAH-UHFFFAOYSA-N (2,4-dihydroxyphenyl)-(4-hydroxyphenyl)methanone Chemical compound C1=CC(O)=CC=C1C(=O)C1=CC=C(O)C=C1O OKJFKPFBSPZTAH-UHFFFAOYSA-N 0.000 description 1
- 229920002818 (Hydroxyethyl)methacrylate Polymers 0.000 description 1
- 238000005160 1H NMR spectroscopy Methods 0.000 description 1
- HTQNYBBTZSBWKL-UHFFFAOYSA-N 2,3,4-trihydroxbenzophenone Chemical compound OC1=C(O)C(O)=CC=C1C(=O)C1=CC=CC=C1 HTQNYBBTZSBWKL-UHFFFAOYSA-N 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- HWHFXXPMPGGCFJ-UHFFFAOYSA-N 2-methoxy-3,4-dimethylbenzoic acid Chemical compound COC1=C(C)C(C)=CC=C1C(O)=O HWHFXXPMPGGCFJ-UHFFFAOYSA-N 0.000 description 1
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 1
- IWPZKOJSYQZABD-UHFFFAOYSA-N 3,4,5-trimethoxybenzoic acid Natural products COC1=CC(OC)=CC(C(O)=O)=C1 IWPZKOJSYQZABD-UHFFFAOYSA-N 0.000 description 1
- CXJAFLQWMOMYOW-UHFFFAOYSA-N 3-chlorofuran-2,5-dione Chemical compound ClC1=CC(=O)OC1=O CXJAFLQWMOMYOW-UHFFFAOYSA-N 0.000 description 1
- LKVFCSWBKOVHAH-UHFFFAOYSA-N 4-Ethoxyphenol Chemical compound CCOC1=CC=C(O)C=C1 LKVFCSWBKOVHAH-UHFFFAOYSA-N 0.000 description 1
- WFCQTAXSWSWIHS-UHFFFAOYSA-N 4-[bis(4-hydroxyphenyl)methyl]phenol Chemical compound C1=CC(O)=CC=C1C(C=1C=CC(O)=CC=1)C1=CC=C(O)C=C1 WFCQTAXSWSWIHS-UHFFFAOYSA-N 0.000 description 1
- BTJIUGUIPKRLHP-UHFFFAOYSA-N 4-nitrophenol Chemical compound OC1=CC=C([N+]([O-])=O)C=C1 BTJIUGUIPKRLHP-UHFFFAOYSA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- USFZMSVCRYTOJT-UHFFFAOYSA-N Ammonium acetate Chemical compound N.CC(O)=O USFZMSVCRYTOJT-UHFFFAOYSA-N 0.000 description 1
- 239000005695 Ammonium acetate Substances 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-M Bicarbonate Chemical compound OC([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-M 0.000 description 1
- DPUOLQHDNGRHBS-UHFFFAOYSA-N Brassidinsaeure Natural products CCCCCCCCC=CCCCCCCCCCCCC(O)=O DPUOLQHDNGRHBS-UHFFFAOYSA-N 0.000 description 1
- KRKNYBCHXYNGOX-UHFFFAOYSA-K Citrate Chemical compound [O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O KRKNYBCHXYNGOX-UHFFFAOYSA-K 0.000 description 1
- 229920000742 Cotton Polymers 0.000 description 1
- URXZXNYJPAJJOQ-UHFFFAOYSA-N Erucic acid Natural products CCCCCCC=CCCCCCCCCCCCC(O)=O URXZXNYJPAJJOQ-UHFFFAOYSA-N 0.000 description 1
- IMROMDMJAWUWLK-UHFFFAOYSA-N Ethenol Chemical compound OC=C IMROMDMJAWUWLK-UHFFFAOYSA-N 0.000 description 1
- KIWBPDUYBMNFTB-UHFFFAOYSA-N Ethyl hydrogen sulfate Chemical compound CCOS(O)(=O)=O KIWBPDUYBMNFTB-UHFFFAOYSA-N 0.000 description 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
- 239000005639 Lauric acid Substances 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- CNCOEDDPFOAUMB-UHFFFAOYSA-N N-Methylolacrylamide Chemical compound OCNC(=O)C=C CNCOEDDPFOAUMB-UHFFFAOYSA-N 0.000 description 1
- 229910003827 NRaRb Inorganic materials 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- QLZHNIAADXEJJP-UHFFFAOYSA-N Phenylphosphonic acid Chemical compound OP(O)(=O)C1=CC=CC=C1 QLZHNIAADXEJJP-UHFFFAOYSA-N 0.000 description 1
- 229920001665 Poly-4-vinylphenol Polymers 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000004115 Sodium Silicate Substances 0.000 description 1
- VMHLLURERBWHNL-UHFFFAOYSA-M Sodium acetate Chemical compound [Na+].CC([O-])=O VMHLLURERBWHNL-UHFFFAOYSA-M 0.000 description 1
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 1
- 238000002679 ablation Methods 0.000 description 1
- 125000002777 acetyl group Chemical class [H]C([H])([H])C(*)=O 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 235000019257 ammonium acetate Nutrition 0.000 description 1
- 229940043376 ammonium acetate Drugs 0.000 description 1
- 125000000732 arylene group Chemical group 0.000 description 1
- 235000010323 ascorbic acid Nutrition 0.000 description 1
- 239000011668 ascorbic acid Substances 0.000 description 1
- 229960005070 ascorbic acid Drugs 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- 230000001588 bifunctional effect Effects 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 238000001311 chemical methods and process Methods 0.000 description 1
- 238000005345 coagulation Methods 0.000 description 1
- 230000015271 coagulation Effects 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 229920006037 cross link polymer Polymers 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- ILUAAIDVFMVTAU-UHFFFAOYSA-N cyclohex-4-ene-1,2-dicarboxylic acid Chemical compound OC(=O)C1CC=CCC1C(O)=O ILUAAIDVFMVTAU-UHFFFAOYSA-N 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 150000008049 diazo compounds Chemical class 0.000 description 1
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 1
- 239000012954 diazonium Substances 0.000 description 1
- 150000001989 diazonium salts Chemical class 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 1
- ASMQGLCHMVWBQR-UHFFFAOYSA-M diphenyl phosphate Chemical compound C=1C=CC=CC=1OP(=O)([O-])OC1=CC=CC=C1 ASMQGLCHMVWBQR-UHFFFAOYSA-M 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- DPUOLQHDNGRHBS-KTKRTIGZSA-N erucic acid Chemical compound CCCCCCCC\C=C/CCCCCCCCCCCC(O)=O DPUOLQHDNGRHBS-KTKRTIGZSA-N 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 1
- 229940015043 glyoxal Drugs 0.000 description 1
- 229910003439 heavy metal oxide Inorganic materials 0.000 description 1
- 125000005549 heteroarylene group Chemical group 0.000 description 1
- MUTGBJKUEZFXGO-UHFFFAOYSA-N hexahydrophthalic anhydride Chemical compound C1CCCC2C(=O)OC(=O)C21 MUTGBJKUEZFXGO-UHFFFAOYSA-N 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 229920001480 hydrophilic copolymer Polymers 0.000 description 1
- 229910001506 inorganic fluoride Inorganic materials 0.000 description 1
- 230000009878 intermolecular interaction Effects 0.000 description 1
- 239000004816 latex Substances 0.000 description 1
- 229920000126 latex Polymers 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- DNTMQTKDNSEIFO-UHFFFAOYSA-N n-(hydroxymethyl)-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NCO DNTMQTKDNSEIFO-UHFFFAOYSA-N 0.000 description 1
- 238000007645 offset printing Methods 0.000 description 1
- QQVIHTHCMHWDBS-UHFFFAOYSA-N perisophthalic acid Natural products OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 1
- CMPQUABWPXYYSH-UHFFFAOYSA-N phenyl phosphate Chemical compound OP(O)(=O)OC1=CC=CC=C1 CMPQUABWPXYYSH-UHFFFAOYSA-N 0.000 description 1
- MLCHBQKMVKNBOV-UHFFFAOYSA-N phenylphosphinic acid Chemical compound OP(=O)C1=CC=CC=C1 MLCHBQKMVKNBOV-UHFFFAOYSA-N 0.000 description 1
- 150000003009 phosphonic acids Chemical class 0.000 description 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 1
- 150000003014 phosphoric acid esters Chemical class 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N phthalic anhydride Chemical compound C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920006289 polycarbonate film Polymers 0.000 description 1
- 229920006290 polyethylene naphthalate film Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920001228 polyisocyanate Polymers 0.000 description 1
- 239000005056 polyisocyanate Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920005604 random copolymer Polymers 0.000 description 1
- 238000012216 screening Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000001235 sensitizing effect Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000001632 sodium acetate Substances 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 238000005063 solubilization Methods 0.000 description 1
- 230000007928 solubilization Effects 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 125000003107 substituted aryl group Chemical group 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 150000003455 sulfinic acids Chemical class 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- 238000012876 topography Methods 0.000 description 1
- ZQTYRTSKQFQYPQ-UHFFFAOYSA-N trisiloxane Chemical group [SiH3]O[SiH2]O[SiH3] ZQTYRTSKQFQYPQ-UHFFFAOYSA-N 0.000 description 1
- 238000005292 vacuum distillation Methods 0.000 description 1
- 239000008207 working material Substances 0.000 description 1
- 229910001845 yogo sapphire Inorganic materials 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
- B41C1/1016—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials characterised by structural details, e.g. protective layers, backcoat layers or several imaging layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/02—Positive working, i.e. the exposed (imaged) areas are removed
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/06—Developable by an alkaline solution
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/14—Multiple imaging layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/26—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds
- B41C2210/262—Phenolic condensation polymers, e.g. novolacs, resols
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
- B41M5/40—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used characterised by the base backcoat, intermediate, or covering layers, e.g. for thermal transfer dye-donor or dye-receiver sheets; Heat, radiation filtering or absorbing means or layers; combined with other image registration layers or compositions; Special originals for reproduction by thermography
- B41M5/46—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used characterised by the base backcoat, intermediate, or covering layers, e.g. for thermal transfer dye-donor or dye-receiver sheets; Heat, radiation filtering or absorbing means or layers; combined with other image registration layers or compositions; Special originals for reproduction by thermography characterised by the light-to-heat converting means; characterised by the heat or radiation filtering or absorbing means or layers
- B41M5/465—Infrared radiation-absorbing materials, e.g. dyes, metals, silicates, C black
Definitions
- the present invention relates to a positive working lithographic printing plate precursor that requires aqueous alkaline processing and comprises an infrared absorbing dye containing a polysiloxane group.
- Lithographic printing presses use a so-called printing master such as a printing plate which is mounted on a cylinder of the printing press.
- the master carries a lithographic image on its surface and a print is obtained by applying ink to said image and then transferring the ink from the master onto a receiver material, which is typically paper.
- ink as well as an aqueous fountain solution also called dampening liquid
- the lithographic image which consists of oleophilic (or hydrophobic, i.e. ink-accepting, water-repelling) areas as well as hydrophilic (or oleophobic, i.e. water-accepting, ink-repelling) areas.
- so-called driographic printing the lithographic image consists of ink-accepting and ink-abhesive (ink-repelling) areas and during driographic printing, only ink is supplied to the master.
- Printing masters are generally obtained by the so-called computer-to-film method wherein various pre-press steps such as typeface selection, scanning, color separation, screening, trapping, layout and imposition are accomplished digitally and each color selection is transferred to graphic arts film using an image-setter.
- the film can be used as a mask for the exposure of an imaging material called plate precursor and after plate processing, a printing plate is obtained which can be used as a master.
- a typical printing plate precursor for computer-to-film methods comprise a hydrophilic support and an image-recording layer of a photosensitive polymer layers which include UV-sensitive diazo compounds, dichromate-sensitized hydrophilic colloids and a large variety of synthetic photopolymers. Particularly diazo-sensitized systems are widely used.
- Upon image-wise exposure typically by means of a film mask in a UV contact frame, the exposed image areas become insoluble and the unexposed areas remain soluble in an aqueous alkaline developer.
- the plate is then processed with the developer to remove the diazonium salt or diazo resin in the unexposed areas.
- the exposed areas define the image areas (printing areas) of the printing master, and such printing plate precursors are therefore called 'negative-working'.
- positive-working materials wherein the exposed areas define the non-printing areas, are known, e.g. plates having a novolac/naphtoquinone-diazide coating which dissolves in the developer only at exposed areas.
- heat-sensitive printing plate precursors are known. Such materials offer the advantage of daylight stability and are especially used in the so-called computer-to-plate method wherein the plate precursor is directly exposed, i.e. without the use of a film mask.
- the material is exposed to heat or to infrared light and the generated heat triggers a (physico-)chemical process, such as ablation, polymerization, insolubilization by cross-linking of a polymer or by particle coagulation of a thermoplastic polymer latex, and solubilization by the destruction of intermolecular interactions.
- a (physico-)chemical process such as ablation, polymerization, insolubilization by cross-linking of a polymer or by particle coagulation of a thermoplastic polymer latex, and solubilization by the destruction of intermolecular interactions.
- US 5,466,557 describes a positive-working printing plate precursor which is sensitive to both ultraviolet (UV) and infrared (IR) light but not to visible light, comprising a support and a coating comprising an oleophilic polymer that is soluble in an aqueous alkaline developer and a latent Bronsted acid.
- UV ultraviolet
- IR infrared
- EP-A 864420 describes a positive-working heat-sensitive printing plate precursor comprising a support, a first layer containing an oleophilic polymer that is soluble in an aqueous alkaline developer and an IR-sensitive top layer of which the penetrability by or solubility in the aqueous alkaline developer is changed upon exposure to IR light.
- WO 97/39894 describes a positive-working heat-sensitive printing plate precursor which is sensitive to IR light but not to UV light comprising a support and an IR-sensitive coating comprising an oleophilic polymer that is soluble in an aqueous alkaline developer and a dissolution inhibitor which reduces the solubility of the polymer in the developer.
- WO99/21725 and WO99/21715 describe a positive-working heat sensitive printing plate precursor of which the coating comprises a compound which increases the developer resistance thereof.
- Said compound is selected from the group of poly(alkylene oxide), siloxanes and esters or amides of polyhydric alcohols.
- US 5 491 046 describes a method for imaging a positive and/or negative lithographic printing plate precursor wherein the imaging layer comprises a resole resin, a novolac resin, a latent Bronsted acid and an IR absorber.
- EP 1 162 078 describes an image formation material comprising a substrate and an image formation layer on the substrate which contains an infrared absorption dye having at least one surface orientation group as substituent for the purpose of improving sensitivity and/or image forming property of the image formation material.
- EP 1 256 444 describes a heat-sensitive lithographic printing plate precursor comprising a coating comprising in the order given a first layer containing an oleophilic resin soluble in an aqueous alkaline developer and a second layer capable of preventing penetration of the developer at unexposed areas, said second layer comprising a water-repellent compound selected from the group consisting of a polymer comprising siloxane and/or perfluoroalkyl monomeric units, and a block- or graft-copolymer comprising a poly- or oligo(alkylene oxide) and a polymer or oligomer comprising siloxane and/ or perfluoroalkyl monomeric units, and wherein the alkali-solubility of said coating increases on heating and said coating comprises an infrared light absorbing dye.
- the major problems associated with the prior art materials is (i) the low differentiation between the development kinetics of exposed and non-exposed areas - i.e. the dissolution of the exposed coating in the developer is not completely finished before the unexposed coating also starts dissolving in the developer - and (ii) thermal diffusion of heat into the substrate resulting in a reduced sensitivity of the printing plate precursor. This leads to low quality prints showing unsharp edges and toning (ink-acceptance in exposed areas) and narrow development latitude.
- the lithographic printing plate precursor of the present invention contains a support having a hydrophilic surface and a coating provided thereon.
- the coating comprises at least two layers, designated herein as first and second layer, the first layer being closest to the support, i.e. located between the support and the second layer.
- the printing plate precursor is positive-working, i.e. after exposure by light and development the exposed areas of the coating are removed from the support and define hydrophilic (non-printing) areas, whereas the unexposed coating is not removed from the support and defines an oleophilic (printing) area.
- the second layer is believed to act as a barrier that prevents penetration of the aqueous alkaline developer into the oleophilic resin of the first layer at unexposed areas.
- the barrier function of the second layer can be reduced due to the exposure and dissolution of the coating at those areas can be increased upon immersion in an aqueous alkaline developer.
- This reduction of the barrier function of the second layer upon exposure can be tested e.g. by measuring the water uptake, due to swelling of the oleophilic resin, of an exposed and a non-exposed sample: typically, the exposed sample absorbs a small amount of water whereas the average water-uptake of non-exposed samples is within statistical error not different from zero.
- the barrier function of the second layer arises from the presence of a water-repellent compound.
- a water-repellent compound Suitable examples thereof are polymers comprising siloxane and/or perfluoroalkyl units or block- or graft-copolymers comprising a poly- or oligo(alkylene oxide) block and a block of poly- or oligosiloxane and/or perfluoroalkyl units.
- the water-repellent polymer may be present in an amount of e.g. between 0.5 and 15 mg/m 2 , preferably between 0.5 and 10 mg/m 2 , more preferably between 0.5 and 5 mg/m 2 and most preferably between 0.5 and 2 mg/m 2 .
- the block comprising the siloxane and/or perfluoroalkyl units may be a linear, branched, cyclic or complex cross-linked polymer or copolymer.
- the perfluoroalkyl unit is e.g. a -(CF 2 )- unit.
- the number of such units may be larger than 10, preferably larger than 20.
- the term polysiloxane compound shall include any compound which contains more than one siloxane group -Si(R,R')-O-, wherein R and R' are optionally substituted alkyl or aryl groups.
- Preferred siloxanes are phenylalkylsiloxanes and dialkylsiloxanes, e.g.
- the number of siloxane groups -Si(R,R')-O- in the (co-)polymer is at least 2, preferably at least 10, more preferably at least 20. It may be less than 100, preferably less than 60.
- the alkylene-oxide block preferably includes units of the formula -C n H 2 n-O- wherein n is preferably an integer in the range 2 to 5.
- the moiety - C n H 2 n- may include straight or branched chains.
- the alkylene-oxide block moiety may also comprise optional substituents. Preferred embodiments and explicit examples of such polymers have been disclosed in WO99/21725 .
- a suitable water-repellent polysiloxane compound is preferably a random or block-copolymer comprising siloxane and alkyleneoxide groups, suitably comprising about 15 to 25 siloxane units and 50 to 70 alkyleneoxide groups.
- Preferred polysiloxanes include a copolymer of dimethyldichlorosilane, ethylene oxide and propylene oxide. Specific compounds are the following: wherein o, p, q, r and s are integers >1.
- a poly(alkylene oxide) block consisting of ethylene oxide and propylene oxide units is grafted to a polysiloxane block.
- long chain alcohols consisting of ethylene oxide and propylene oxide units are grafted to a trisiloxane group.
- the second layer may contain the oleophilic resin as well as the water-repellent compound.
- block- or graft-copolymers comprising a poly- or oligo(alkylene oxide) block and a block of poly- or oligosiloxane and/or perfluoroalkyl units due to their bifunctional structure, position themselves during coating at the interface between the coating solution and air and thereby automatically form a separate layer, corresponding to the second layer of the present invention, even when applied as an ingredient of the coating solution of the oleophilic layer.
- the water-repellent compound can be applied in a second solution, coated on top of the first layer.
- a solvent in the second coating solution that is not capable of dissolving in the ingredients present in the first layer so that a phase of highly concentrated water-repellent polymer is obtained at the top of the material.
- the oleophilic resin is preferably a polymer that is soluble in an aqueous developer, more preferably an aqueous alkaline developing solution with a pH between 7.5 and 14.
- Preferred polymers are phenolic resins e.g. novolac, resoles, polyvinyl phenols and carboxy substituted polymers. Typical examples of these polymers are described in DE-A-4007428 , DE-A-4027301 and DE-A-4445820 .
- the coating comprises an IR dye containing a polysiloxane group, which sensitizes the material to the IR light used during the exposure.
- the polysiloxane group can be linear, branched, cyclic or complex cross-linked.
- the number of silicium atoms in the polysiloxane group may be greater than 2, preferably 4 or greater than 4.
- Preferred siloxane groups -Si(R,R')-O- are groups wherein R and R' are optionally substituted alkyl or aryl groups.
- Preferred siloxane groups are phenylalkylsiloxanes and dialkylsiloxanes, e.g. phenylmethylsiloxanes and dimethylsiloxanes.
- the IR dye is preferably a compound having an absorption maximum in the wavelength range between 750 and 1500 nm, so that a daylight stable material is obtained which can be handled without the need for darkroom conditions.
- Daylight stable material means that no substantial dissolution in the developer is induced by exposure to visible light.
- the sensitizing dye may be present in the first layer, in the second layer discussed above or in an optional other layer. It is believed that the high hydrophobicity of the polysiloxane group comprised in the IR light absorbing dye makes the dye more compatible with the water-repellent compound and thereby promotes the tendency of the dye to position itself preferentially in the second layer, i.e. further away from the support. As a result, the heat generated by the exposure is concentrated in the second layer and a high sensitivity is observed.
- the concentration of the IR absorbing compound in the coating is typically between 0.25 and 10.0 wt %, more preferably between 0.5 and 7.5 wt %.
- Preferred IR absorbing compounds for use in this invention are represented by the general formula III: wherein
- a counter ion X with opposite charge is required to neutralize the compound.
- the dye can be anionic or cationic as the chromophore and/or polysiloxane containing substituents on the chromophore and/or other substituents on the chromophore can have a charge.
- the unit of charge of the dye is determined by the sum of the positive and/or negative charges of the substituents on the dye and one or more counter ions with equal sum of opposite charge is present to neutralize the dye.
- the unit of charge of the counter ions can be mono or multiple and/or positive or negative.
- -E 1 and -E 2 represent a neutral terminal group such as alkyl, -H, -OH,-F or -SiR a R b R c (and no other charged groups are present on the IR light absorbing dye)
- a counter ion X carrying a negative charge is present to neutralise the positively charged IR light absorbing dye.
- one of the terminal groups is represented by an anionic group such as-SO 3 - , -SO 4 - , or -COO (and the other terminal group is represented by a neutral group and no other charged groups are present on the IR light absorbing dye) no counter ion is required.
- One of the terminal groups can be a cationic group such as -[NR a R b R c ] + , than one counter ion carrying two negative charges (e.g. D-PO 4 2- , D-PO 3 2- ) or two counter ions each carrying one negative charge (e.g. Cl, Br - , I - , F - , D-SO 3 - , D-SO 4 - , D-COO - , ClO 4 - or BF 4 - ) are present.
- two counter ions each carrying one negative charge
- none, one or more counter ions are necessary to neutralise the IR light absorbing dye.
- R 3 represents a substituent carrying a negative charge, e.g. a negatively charged barbituric group, and no other substituents carrying a positive or negative charge are present on the IR light absorbing dye, a Zwitterion where the sum of charge of the dye is zero is obtained and no counter ion is present.
- Negatively charged barbituric group wherein R 4 and R 5 independently represent an optionally substituted alkyl, alkenyl, cycloalkyl, aryl or aralkyl group, a perfluoroalkyl group or a polysiloxane group; each of said groups may optionally comprise a terminal group E defined above as -E 1 and -E 2 .
- the negatively charged barbituric group is bonded to the heptamethine group by *.
- Suitable subclasses of the above IR light absorbing dyes are represented by the following formulae:
- P1, P2, a, b, -L 1 -, -L 2 -, -A 1 -, -A 2 -, -E 1 , -E 2 , R 1 , R 2 , R 3 , -Y 1 -, -Y 2 -, -Z 1 , -Z 2 and X have the same meaning as in formula III above;
- R 4 and R 5 have the same meaning as defined above, with the proviso that at least one of the following substituents is represented by a polysiloxane group: -A 1 -, -A 2 -, R 1 , R 2 , R 3 , R 4 , R 5 or X.
- IR light absorbing dyes are represented by formulae wherein two adjacent R 1 groups or two adjacent R 2 groups form an optionally substituted phenyl group, annelated with another phenyl group of the dye. So any of the formulae III to XIV wherein such phenyl group is present also represent dyes that are suitable for a precursor of the present invention. Two preferred embodiments of such dyes are represented by formulae XV and XVI: wherein
- two adjacent R 1 groups and/or two adjacent R 2 groups can form an optionally substituted annelated phenyl group and such subclasses also are part of the present invention.
- IR light absorbing dyes are represented by formula III in which the polysiloxane group is covalently linked to the dye and/or comprised in the counter ion X, if a counter ion X is present.
- the indices/substituents p 1 , p 2 , -L 1 -, -L 2 -, -E 1 , -E 2 , -A 1 -, -A 2 -, -Y 1 -, -Y 2 -, R 1 , R 2 , R 3 , -Z 1 , -Z 2 and X have the same meaning as in formula III above.
- IR light absorbing dyes are represented by formula III in which the polysiloxane group is not covalently linked to the dye but comprised in the counter ion X.
- the indices/substituents p 1 , p 2 , -L 1 -, -L 2 -, -E 1 , -E 2 , -A 1 -, -A 2 -, -Y 1 -, -Y 2 -, R 1 , R 2 , R 3 , -Z 1 , -Z 2 and X have the same meaning as in formula III above with the proviso that:
- IR absorbing dyes that are preferred for use in this invention include the following compounds:
- the coating can contain additional infrared absorbing dyes such as cyanine dyes or pigments such as carbon black.
- additional infrared absorbing dyes such as cyanine dyes or pigments such as carbon black.
- suitable IR absorbers are described in e.g. EP-A 823327 , EP-A 978376 , EP-A 1029667 , EP-A 1053868 , EP-A 1093934 ; WO 97/39894 and WO 00/29214 .
- the first layer may further contain other ingredients such as additional binders to improve the run length of the plate, colorants, development inhibitors as disclosed in WO 97/39894 and EP-A 823 327 or accelerators such as 3,4,5-trimethoxybenzoic acid.
- Said colorants are preferably dyes which during development remain in the coating at non-exposed areas and which are washed out at exposed areas, thereby producing a visible image.
- Such indicator dyes preferably do not sensitize the coating to visible light.
- Suitable development accelerators are described in e.g. EP-A933682 .
- Such compounds act as dissolution promoters because they are capable of reducing the dissolution time of the first layer.
- cyclic acid anhydrides, phenols or organic acids can be used in order to improve the aqueous developability.
- Example of the cyclic acid anhydride include phtalic anhydride, tetrahydrophtalic anhydride, hexahydrophtalic anhydride, 3,6-endoxy 4-tertrahydrophalic anhydride, tetrachlorophtalic anhydride, maleic anhydride, chloromaleic anhydride, alpha-phenylmaleic anhydride, succinic anhydride, alpha-phenylmaleic anhydride, succinic anhydride, and pyromellitic anhydride, as described in U.S. Patent No. 4,115,128 .
- phenols examples include bisphenol A, p-nitrophenol, p-ethoxyphenol, 2,4,4'-trihydroxybenzophenone, 2,3,4-trihydroxy-benzophenone, 4-hydroxyphenone, 4,4',4"-trihydroxytriphenylmethane, and 4,4',3",4"-tetrahydroxy-3,5,3',5'-tetramethyltriphenyl-methane, and the like.
- organic acids include sulfonic acids, sulfinic acids, alkylsulfuric acids, phosphonic acids, phosphates, and carboxylic acids, as described in, for example, JP-A Nos. 60-888,942 and 2-96,755 .
- organic acids include p-toluenesulfonic acid, dodecylbenzenesylfonic acid, p-tolenesulfinic acid, ethylsulfuric acid, phenylphosphonic acid, phenylphosphinic acid, phenyl phosphate, diphenyl phosphate, benzoic acid, isophtalic acid, adipic acid, p-toluic acid, 3,4-dimethylmethoxybenzoic acid, phtalic acid, terephtalic acid, 4-cyclohexene-1,2-dicarboxylic acid, erucic acid, lauric acid, n-undecanoic acid, and ascorbic acid.
- the amount of the cyclic acid anhydride, phenol, or organic acid contained in the image forming composition is preferably in the range of 0.05 to 20% by weight.
- the support has a hydrophilic surface or is provided with a hydrophilic layer.
- the support may be a sheet-like material such as a plate or it may be a cylindrical element such as a sleeve which can be slid around a print cylinder of a printing press.
- the support is a metal support such as aluminum or stainless steel.
- a particularly preferred lithographic support is an electrochemically grained and anodized aluminum support.
- the anodized aluminum support may be treated to improve the hydrophilic properties of its surface.
- the aluminum support may be silicated by treating its surface with a sodium silicate solution at elevated temperature, e.g. 95°C.
- a phosphate treatment may be applied which involves treating the aluminum oxide surface with a phosphate solution that may further contain an inorganic fluoride.
- the aluminum oxide surface may be rinsed with a citric acid or citrate solution. This treatment may be carried out at room temperature or may be carried out at a slightly elevated temperature of about 30 to 50°C.
- a further interesting treatment involves rinsing the aluminum oxide surface with a bicarbonate solution.
- the aluminum oxide surface may be treated with polyvinylphosphonic acid, polyvinylmethylphosphonic acid, phosphoric acid esters of polyvinyl alcohol, polyvinylsulfonic acid, polyvinylbenzenesulfonic acid, sulfuric acid esters of polyvinyl alcohol, and acetals of polyvinyl alcohols formed by reaction with a sulfonated aliphatic aldehyde. It is further evident that one or more of these post treatments may be carried out alone or in combination.
- the support can also be a flexible support, which is provided with a hydrophilic layer, hereinafter called 'base layer'.
- the flexible support is e.g. paper, plastic film, thin aluminum or a laminate thereof.
- Preferred examples of plastic film are polyethylene terephthalate film, polyethylene naphthalate film, cellulose acetate film, polystyrene film, polycarbonate film, etc.
- the plastic film support may be opaque or transparent.
- the base layer is preferably a cross-linked hydrophilic layer obtained from a hydrophilic binder cross-linked with a hardening agent such as formaldehyde, glyoxal, polyisocyanate or a hydrolyzed tetra-alkylorthosilicate.
- a hardening agent such as formaldehyde, glyoxal, polyisocyanate or a hydrolyzed tetra-alkylorthosilicate.
- the thickness of the hydrophilic base layer may vary in the range of 0.2 to 25 ⁇ m and is preferably 1 to 10 ⁇ m.
- the hydrophilic binder for use in the base layer is e.g. a hydrophilic (co)polymer such as homopolymers and copolymers of vinyl alcohol, acrylamide, methylol acrylamide, methylol methacrylamide, acrylate acid, methacrylate acid, hydroxyethyl acrylate, hydroxyethyl methacrylate or maleic anhydride/vinylmethylether copolymers.
- the hydrophilicity of the (co)polymer or (co)polymer mixture used is preferably the same as or higher than the hydrophilicity of polyvinyl acetate hydrolyzed to at least an extent of 60% by weight, preferably 80% by weight.
- the amount of hardening agent, in particular tetraalkyl orthosilicate, is preferably at least 0.2 parts per part by weight of hydrophilic binder, more preferably between 0.5 and 5 parts by weight, most preferably between 1 parts and 3 parts by weight.
- the hydrophilic base layer may also contain substances that increase the mechanical strength and the porosity of the layer.
- colloidal silica may be used.
- the colloidal silica employed may be in the form of any commercially available water dispersion of colloidal silica for example having an average particle size up to 40 nm, e.g. 20 nm.
- inert particles of larger size than the colloidal silica may be added e.g. silica prepared according to Stöber as described in J. Colloid and Interface Sci., Vol. 26, 1968, pages 62 to 69 or alumina particles or particles having an average diameter of at least 100 nm which are particles of titanium dioxide or other heavy metal oxides.
- the surface of the hydrophilic base layer is given a uniform rough texture consisting of microscopic hills and valleys, which serve as storage places for water in background areas.
- hydrophilic base layers for use in accordance with the present invention are disclosed in EP-A- 601 240 , GB-P- 1 419 512 , FR-P- 2 300 354 , US-P- 3 971 660 , and US-P- 4 284 705 .
- the amount of silica in the adhesion improving layer is between 200 mg/m 2 and 750 mg/m 2 .
- the ratio of silica to hydrophilic binder is preferably more than 1 and the surface area of the colloidal silica is preferably at least 300 m 2 /gram, more preferably at least 500 m 2 / gram.
- the printing plate precursor of the present invention can be exposed to light, e.g. by means of LEDs or a laser head.
- one or more lasers or a laser diode are used.
- the light used for the exposure is infrared light having a wavelength in the range from about 750 to about 1500 nm and preferably a laser such as a semiconductor laser diode, a Nd:YAG or a Nd:YLF laser is used.
- the required laser power depends on the sensitivity of the image-recording layer, the pixel dwell time of the laser beam, which is determined by the spot diameter (typical value of modern plate-setters at 1/e 2 of maximum intensity: 10-25 ⁇ m), the scan speed and the resolution of the exposure apparatus (i.e. the number of addressable pixels per unit of linear distance, often expressed in dots per inch or dpi; typical value: 1000-4000 dpi).
- ITD plate-setters for thermal plates are typically characterized by a very high scan speed up to 1500 m/sec and may require a laser power of several Watts.
- the Agfa Galileo T (trademark of Agfa Gevaert N.V.) is a typical example of a plate-setter using the ITD-technology.
- XTD plate-setters operate at a lower scan speed typically from 0.1 m/sec to 20 m/sec and have a typical laser-output-power per beam from 20 mW up to 500 mW.
- the Creo Trendsetter plate-setter family (trademark of Creo) and the Agfa Excalibur plate-setter family (trademark of Agfa Gevaert N.V.) both make use of the XTD-technology.
- the known plate-setters can be used as an off-press exposure apparatus, which offers the benefit of reduced press down-time.
- XTD plate-setter configurations can also be used for on-press exposure, offering the benefit of immediate registration in a multi-color press. More technical details of on-press exposure apparatuses are described in e.g. US 5,174,205 and US 5,163,368 .
- the non-exposed areas of the coating are removed by immersion in an aqueous alkaline developer, which may be combined with mechanical rubbing, e.g. by a rotating brush.
- the development step may be followed by a drying step, a rinsing step, a gumming step, and/or a post-baking step.
- the printing plate thus obtained can be used for conventional, so-called wet offset printing, in which ink and an aqueous dampening liquid are supplied to the plate.
- Another suitable printing method uses so-called single-fluid ink without a dampening liquid.
- Single-fluid inks which are suitable for use in the method of the present invention have been described in US 4,045,232 and US 4,981,517 .
- the single-fluid ink comprises an ink phase, also called the hydrophobic or oleophilic phase, and a polyol phase as described in WO 00/32705 .
- a 0.30 mm thick aluminum foil was degreased by immersing the foil in an aqueous solution containing 5 g/l of sodium hydroxide at 50°C and rinsed with demineralized water.
- the foil was then electrochemically grained using an alternating current in an aqueous solution containing 4 g/l of hydrochloric acid, 4 g/l of hydroboric acid and 5 g/l of aluminum ions at a temperature of 35°C and a current density of 1200 A/m 2 to form a surface topography with an average center-line roughness Ra of 0.5 ⁇ m.
- the aluminum foil was then etched with an aqueous solution containing 300 g/l of sulfuric acid at 60°C for 180 seconds and rinsed with demineralized water at 25°C for 30 seconds.
- the foil was subsequently subjected to anodic oxidation in an aqueous solution containing 200 g/l of sulfuric acid at a temperature of 45°C, a voltage of about 10 V and a current density of 150 A/m 2 for about 300 seconds to form an anodic oxidation film of 3.00 g/m 2 of Al 2 O 3 then washed with demineralized water, post-treated with a solution containing polyvinylphosphonic acid and subsequently with a solution containing aluminum trichloride, rinsed with demineralized water at 20°C during 120 seconds and dried.
- the IR-sensitivity of the different compositions corresponds to the minimum energy density setting that is required to obtain a 50% reduction of the light absorption of the coating, measured on the developed plate at the wavelength maximum of the contrast dye, in areas which have been exposed with a dot area of a 50% screen (@200 lpi).
- Table 1 The results in Table 1 indicate that the coating which comprises an infrared dye containing a polysiloxane group provide a higher sensitivity than the comparative coating in which the corresponding infrared dye does not contain a polysiloxane group.
- Table 1 Ingredients (g) Ex. 1 (inv.) Ex.
- the support was prepared as described in examples 1 and 2.
- the IR-sensitivity of the different compositions corresponds to the minimum energy density setting that is required to obtain a 50% reduction of the light absorption of the coating, measured on the developed plate at the wavelength maximum of the contrast dye, in areas which have been exposed with a dot area of a 50% screen (@200 lpi).
- Table 2 The results in Table 2 indicate that the coating which comprises an infrared dye containing a polysiloxane group provides a higher sensitivity than the comparative coating in which the corresponding infrared dye does not contain a polysiloxane group.
- Table 2 Ingredients (g) Ex. 3 (inv.) Ex.
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Thermal Sciences (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Materials For Photolithography (AREA)
Description
- The present invention relates to a positive working lithographic printing plate precursor that requires aqueous alkaline processing and comprises an infrared absorbing dye containing a polysiloxane group.
- Lithographic printing presses use a so-called printing master such as a printing plate which is mounted on a cylinder of the printing press. The master carries a lithographic image on its surface and a print is obtained by applying ink to said image and then transferring the ink from the master onto a receiver material, which is typically paper. In conventional lithographic printing, ink as well as an aqueous fountain solution (also called dampening liquid) are supplied to the lithographic image which consists of oleophilic (or hydrophobic, i.e. ink-accepting, water-repelling) areas as well as hydrophilic (or oleophobic, i.e. water-accepting, ink-repelling) areas. In so-called driographic printing, the lithographic image consists of ink-accepting and ink-abhesive (ink-repelling) areas and during driographic printing, only ink is supplied to the master.
- Printing masters are generally obtained by the so-called computer-to-film method wherein various pre-press steps such as typeface selection, scanning, color separation, screening, trapping, layout and imposition are accomplished digitally and each color selection is transferred to graphic arts film using an image-setter. After processing, the film can be used as a mask for the exposure of an imaging material called plate precursor and after plate processing, a printing plate is obtained which can be used as a master.
- A typical printing plate precursor for computer-to-film methods comprise a hydrophilic support and an image-recording layer of a photosensitive polymer layers which include UV-sensitive diazo compounds, dichromate-sensitized hydrophilic colloids and a large variety of synthetic photopolymers. Particularly diazo-sensitized systems are widely used. Upon image-wise exposure, typically by means of a film mask in a UV contact frame, the exposed image areas become insoluble and the unexposed areas remain soluble in an aqueous alkaline developer. The plate is then processed with the developer to remove the diazonium salt or diazo resin in the unexposed areas. So the exposed areas define the image areas (printing areas) of the printing master, and such printing plate precursors are therefore called 'negative-working'. Also positive-working materials, wherein the exposed areas define the non-printing areas, are known, e.g. plates having a novolac/naphtoquinone-diazide coating which dissolves in the developer only at exposed areas.
- In addition to the above photosensitive materials, also heat-sensitive printing plate precursors are known. Such materials offer the advantage of daylight stability and are especially used in the so-called computer-to-plate method wherein the plate precursor is directly exposed, i.e. without the use of a film mask. The material is exposed to heat or to infrared light and the generated heat triggers a (physico-)chemical process, such as ablation, polymerization, insolubilization by cross-linking of a polymer or by particle coagulation of a thermoplastic polymer latex, and solubilization by the destruction of intermolecular interactions.
-
US 5,466,557 describes a positive-working printing plate precursor which is sensitive to both ultraviolet (UV) and infrared (IR) light but not to visible light, comprising a support and a coating comprising an oleophilic polymer that is soluble in an aqueous alkaline developer and a latent Bronsted acid. -
EP-A 864420 -
WO 97/39894 -
WO99/21725 WO99/21715 -
US 5 491 046 describes a method for imaging a positive and/or negative lithographic printing plate precursor wherein the imaging layer comprises a resole resin, a novolac resin, a latent Bronsted acid and an IR absorber. -
EP 1 162 078 describes an image formation material comprising a substrate and an image formation layer on the substrate which contains an infrared absorption dye having at least one surface orientation group as substituent for the purpose of improving sensitivity and/or image forming property of the image formation material. -
EP 1 256 444 describes a heat-sensitive lithographic printing plate precursor comprising a coating comprising in the order given a first layer containing an oleophilic resin soluble in an aqueous alkaline developer and a second layer capable of preventing penetration of the developer at unexposed areas, said second layer comprising a water-repellent compound selected from the group consisting of a polymer comprising siloxane and/or perfluoroalkyl monomeric units, and a block- or graft-copolymer comprising a poly- or oligo(alkylene oxide) and a polymer or oligomer comprising siloxane and/ or perfluoroalkyl monomeric units, and wherein the alkali-solubility of said coating increases on heating and said coating comprises an infrared light absorbing dye. - The major problems associated with the prior art materials is (i) the low differentiation between the development kinetics of exposed and non-exposed areas - i.e. the dissolution of the exposed coating in the developer is not completely finished before the unexposed coating also starts dissolving in the developer - and (ii) thermal diffusion of heat into the substrate resulting in a reduced sensitivity of the printing plate precursor. This leads to low quality prints showing unsharp edges and toning (ink-acceptance in exposed areas) and narrow development latitude.
- It is an object of the present invention to provide a positive-working lithographic printing plate precursor which shows a high differentiation between exposed and non-exposed areas and which has a high sensitivity. These objects are realized by the material in claim 1 and by the specific embodiments in the dependent claims. By providing a water-repellent compound in the second layer of the coating and by the use of infrared absorbing dyes comprising specific substituents which increase the compatibility of the dye with the second layer of the coating the heat created during infrared exposure is concentrated in the second layer.
- The lithographic printing plate precursor of the present invention contains a support having a hydrophilic surface and a coating provided thereon. The coating comprises at least two layers, designated herein as first and second layer, the first layer being closest to the support, i.e. located between the support and the second layer. The printing plate precursor is positive-working, i.e. after exposure by light and development the exposed areas of the coating are removed from the support and define hydrophilic (non-printing) areas, whereas the unexposed coating is not removed from the support and defines an oleophilic (printing) area. The second layer is believed to act as a barrier that prevents penetration of the aqueous alkaline developer into the oleophilic resin of the first layer at unexposed areas. At exposed areas, the barrier function of the second layer can be reduced due to the exposure and dissolution of the coating at those areas can be increased upon immersion in an aqueous alkaline developer. This reduction of the barrier function of the second layer upon exposure can be tested e.g. by measuring the water uptake, due to swelling of the oleophilic resin, of an exposed and a non-exposed sample: typically, the exposed sample absorbs a small amount of water whereas the average water-uptake of non-exposed samples is within statistical error not different from zero.
- The barrier function of the second layer arises from the presence of a water-repellent compound. Suitable examples thereof are polymers comprising siloxane and/or perfluoroalkyl units or block- or graft-copolymers comprising a poly- or oligo(alkylene oxide) block and a block of poly- or oligosiloxane and/or perfluoroalkyl units. The water-repellent polymer may be present in an amount of e.g. between 0.5 and 15 mg/m2, preferably between 0.5 and 10 mg/m2, more preferably between 0.5 and 5 mg/m2 and most preferably between 0.5 and 2 mg/m2. Higher or lower amounts are also suitable, depending on the hydrophobic/oleophobic character of the compound. When the water-repellent polymer is also ink-repelling, higher amounts than 15 mg/m2 can result in poor ink-acceptance of the non-exposed areas. An amount lower than 0.5 mg/m2 on the other hand may lead to an unsatisfactory development latitude: development of the exposed areas is not completed before the start of the development of the non-exposed areas.
- The block comprising the siloxane and/or perfluoroalkyl units may be a linear, branched, cyclic or complex cross-linked polymer or copolymer. The perfluoroalkyl unit is e.g. a -(CF2)- unit. The number of such units may be larger than 10, preferably larger than 20. The term polysiloxane compound shall include any compound which contains more than one siloxane group -Si(R,R')-O-, wherein R and R' are optionally substituted alkyl or aryl groups. Preferred siloxanes are phenylalkylsiloxanes and dialkylsiloxanes, e.g. phenylmethylsiloxanes and dimethylsiloxanes. The number of siloxane groups -Si(R,R')-O- in the (co-)polymer is at least 2, preferably at least 10, more preferably at least 20. It may be less than 100, preferably less than 60. The alkylene-oxide block preferably includes units of the formula -CnH2n-O- wherein n is preferably an integer in the range 2 to 5. The moiety - CnH2n- may include straight or branched chains. The alkylene-oxide block moiety may also comprise optional substituents. Preferred embodiments and explicit examples of such polymers have been disclosed in
WO99/21725 - In formula I, a poly(alkylene oxide) block consisting of ethylene oxide and propylene oxide units is grafted to a polysiloxane block. In formula II, long chain alcohols consisting of ethylene oxide and propylene oxide units are grafted to a trisiloxane group.
- The second layer may contain the oleophilic resin as well as the water-repellent compound. However, it is believed that block- or graft-copolymers comprising a poly- or oligo(alkylene oxide) block and a block of poly- or oligosiloxane and/or perfluoroalkyl units due to their bifunctional structure, position themselves during coating at the interface between the coating solution and air and thereby automatically form a separate layer, corresponding to the second layer of the present invention, even when applied as an ingredient of the coating solution of the oleophilic layer.
- Alternatively, the water-repellent compound can be applied in a second solution, coated on top of the first layer. In that embodiment, it may be advantageous to use a solvent in the second coating solution that is not capable of dissolving in the ingredients present in the first layer so that a phase of highly concentrated water-repellent polymer is obtained at the top of the material.
- Whilst the applicants do not wish to be limited by any theoretical explanation of how their printing plate precursor operates, it is believed that the spreading of the second layer on the first layer is reduced by the exposure, e.g. by 'thermal dewetting', i.e. heat-induced decrease of the surface tension of the polysiloxane, to such an extent that the second layer breaks up, thereby forming an incomplete layer which can no longer shield the first layer from the developer completely. Rubbing with a cotton pad also removes a sufficient amount of the polysiloxane to trigger development. The removal of the polysiloxane by rubbing can be measured e.g. by comparing the ratio of the siloxane 1H-NMR signals versus the signals of the phenolic resin of a sample before and after rubbing.
- The oleophilic resin is preferably a polymer that is soluble in an aqueous developer, more preferably an aqueous alkaline developing solution with a pH between 7.5 and 14. Preferred polymers are phenolic resins e.g. novolac, resoles, polyvinyl phenols and carboxy substituted polymers. Typical examples of these polymers are described in
DE-A-4007428 ,DE-A-4027301 andDE-A-4445820 . - The coating comprises an IR dye containing a polysiloxane group, which sensitizes the material to the IR light used during the exposure. The polysiloxane group can be linear, branched, cyclic or complex cross-linked. The number of silicium atoms in the polysiloxane group may be greater than 2, preferably 4 or greater than 4. Preferred siloxane groups -Si(R,R')-O- are groups wherein R and R' are optionally substituted alkyl or aryl groups. Preferred siloxane groups are phenylalkylsiloxanes and dialkylsiloxanes, e.g. phenylmethylsiloxanes and dimethylsiloxanes. The IR dye is preferably a compound having an absorption maximum in the wavelength range between 750 and 1500 nm, so that a daylight stable material is obtained which can be handled without the need for darkroom conditions. Daylight stable material means that no substantial dissolution in the developer is induced by exposure to visible light.
- The sensitizing dye may be present in the first layer, in the second layer discussed above or in an optional other layer. It is believed that the high hydrophobicity of the polysiloxane group comprised in the IR light absorbing dye makes the dye more compatible with the water-repellent compound and thereby promotes the tendency of the dye to position itself preferentially in the second layer, i.e. further away from the support. As a result, the heat generated by the exposure is concentrated in the second layer and a high sensitivity is observed. The concentration of the IR absorbing compound in the coating is typically between 0.25 and 10.0 wt %, more preferably between 0.5 and 7.5 wt %.
-
- a and b each independently represent an integer from 0 to 4;
- -L1- and -L2- independently represent a divalent linking group such as alkylene, arylene, heteroarylene, -(CH2)t-O-, -(CH2)t-NH-,-(CH2)t-COO-, -(CH2)t-COO-(CH2)u-, -(CH2)t-OCO-,-(CH2)t-OCO-(CH2)u-,-(CH2)t-CONH- or -(CH2)t-CONH-SO2-, or combinations thereof;
- -E1 and -E2 independently represent a neutral, anionic or cationic terminal group selected from alkyl, -H, -OH, -Cl, -Br,-F, -SiRaRbRc (neutral groups); -SO3 - , -SO4 -, -PO3 2-, -PO4 2-, -COO- (anionic groups); -[NRdReRf]+(cationic group);
- Ra, Rb and Rc independently represent an optionally substituted alkyl, alkenyl, aryl or aralkyl group;
- Rd, Re and Rf independently represent a hydrogen atom or an optionally substituted alkyl, alkenyl, aryl or aralkyl group; -A1- and -A2- independently represent -[Si(RgRh)-O]m-, -CvF2v-, -[(CF2)2-O]w- or an optionally substituted alkyl, alkenyl, aryl or aralkyl group;
- Rg and Rh independently represent an optionally substituted alkyl, alkenyl, aryl or aralkyl group, -[O-Si(RaRb)]q-E1 or -[O-Si(RaRb)]q-E2;
- with p1 and p2 is 0 or 1;
- with t , u, q and m is 1 or an integer greater than 1;
- with v and w is 2 or an integer greater than 2;
- -Y1- and -Y2- independently represent one or two non-metallic atoms, which may be substituted, necessary to complete a 5- or 6-membered heterocyclic ring;
- -Z1 and -Z2 each independently represent a hydrogen atom, an alkyl group or -Z1 and -Z2 together represent the necessary atoms to complete a 5- or 6-membered ring;
- R1 and R2 each independently represent a hydrogen atom, an optionally substituted alkyl, alkenyl, aryl or aralkyl group or a group selected from a halogen atom, -NO2, -O-Ri, -CO-Ri, -CO-O-Ri, -O-CO-Ri, -CO-NRiRj, -NRiRj, -NRi-CO-Rj, -NRi-CO-O-Rj, -NRi-CO-NRjRk, -SRi, -SO-Ri, -SO2-Ri, -SO2-O-Ri, -SO2NRiRj, a perfluoroalkyl group or a polysiloxane group; each of said groups may optionally comprise a terminal group E defined above as -E1 and -E2 and/or wherein two adjacent groups selected from R1, R2 ,-Y1- and -Y2- together form an optionally substituted 5- or 6- membered ring;
- Ri, Rj and Rk independently represent a hydrogen or an optionally substituted alkyl, alkenyl, aryl or aralkyl group;
- R3 represents a substituent selected from a hydrogen, a halogen atom, an alkyl, alkenyl, aryl or aralkyl group, a perfluoroalkyl group, a polysiloxane group, an amino group, a thioalkyl group, a thioaryl group, an aryloxy group, an alkoxy group, a barbituric group or a thiobarbituric group, each of said groups being optionally substituted;
- X represents one or more optional counter ions selected from: Cl-, Br-, I-, F-, D-SO3 -, D-SO4 -, D-PO4 2-, D-PO3 2-, D-COO-,D-[NRoRpRq]+, ClO4 or BF4 -;
- D represents Si(RrRsRt)-[O-Si(RuRv)]n-, [(RrRsRt)SiO]3-Si-, CjF2j+1-, CF3-[(CF2)2-O]i-, an alkyl group, an aryl group or a substituted aryl group;
- with n and i are 1 or an integer greater than 1;
- with j is 3 or an integer greater than 3;
- Ro, Rp, Rq, independently represent a hydrogen atom or an optionally substituted alkyl, alkenyl, aryl or aralkyl group;
- Rr, Rs, Rt, Ru and Rv independently represent an optionally substituted alkyl, alkenyl, aryl or aralkyl group;
- with the proviso that for the general formula III above at least one of the following substituents is represented by a polysiloxane group: -A1-, -A2-, R1, R2, R or X.
- In the embodiment wherein the IR light absorbing dye carries a negative or positive electrical charge, a counter ion X with opposite charge is required to neutralize the compound. The dye can be anionic or cationic as the chromophore and/or polysiloxane containing substituents on the chromophore and/or other substituents on the chromophore can have a charge. The unit of charge of the dye is determined by the sum of the positive and/or negative charges of the substituents on the dye and one or more counter ions with equal sum of opposite charge is present to neutralize the dye. The unit of charge of the counter ions can be mono or multiple and/or positive or negative.
- In the embodiment wherein -E1 and -E2 represent a neutral terminal group such as alkyl, -H, -OH,-F or -SiRaRbRc (and no other charged groups are present on the IR light absorbing dye), a counter ion X carrying a negative charge is present to neutralise the positively charged IR light absorbing dye. If, on the other hand one of the terminal groups is represented by an anionic group such as-SO3 -, -SO4 -, or -COO (and the other terminal group is represented by a neutral group and no other charged groups are present on the IR light absorbing dye) no counter ion is required. One of the terminal groups can be a cationic group such as -[NRaRbRc]+, than one counter ion carrying two negative charges (e.g. D-PO4 2-, D-PO3 2-) or two counter ions each carrying one negative charge (e.g. Cl, Br-, I-, F-, D-SO3 -, D-SO4 -, D-COO-, ClO4 - or BF4 -) are present. Depending on the kind of the terminal groups -E1 and -E2 and their unit of charge, none, one or more counter ions are necessary to neutralise the IR light absorbing dye.
- In the embodiment wherein R3 represents a substituent carrying a negative charge, e.g. a negatively charged barbituric group, and no other substituents carrying a positive or negative charge are present on the IR light absorbing dye, a Zwitterion where the sum of charge of the dye is zero is obtained and no counter ion is present.
- Negatively charged barbituric group:
-
- In the above formulae IV to XIV, P1, P2, a, b, -L1-, -L2-, -A1 -, -A2-, -E1, -E2, R1, R2, R3, -Y1-, -Y2-, -Z1, -Z2 and X have the same meaning as in formula III above; R4 and R5 have the same meaning as defined above, with the proviso that at least one of the following substituents is represented by a polysiloxane group: -A1-, -A2-, R1, R2, R3, R4, R5 or X.
- Additional suitable subclasses of IR light absorbing dyes are represented by formulae wherein two adjacent R1 groups or two adjacent R2 groups form an optionally substituted phenyl group, annelated with another phenyl group of the dye. So any of the formulae III to XIV wherein such phenyl group is present also represent dyes that are suitable for a precursor of the present invention. Two preferred embodiments of such dyes are represented by formulae XV and XVI:
- P1, P2, a, b, -L1-, -L2-, -E1 , -E2 , -A1-,-A2-, -Y1-, -Y2 -, -Z1, - Z2, -R3 and X have the same meaning as in formula III above;
- c and d are independently 0, 1 or 2;
- each R6 to R9 independently represent a group as defined for R1 and R2 above;
- In formulae IV to XIV two adjacent R1 groups and/or two adjacent R2 groups can form an optionally substituted annelated phenyl group and such subclasses also are part of the present invention.
- Other preferred subclasses of IR light absorbing dyes are represented by formula III in which the polysiloxane group is covalently linked to the dye and/or comprised in the counter ion X, if a counter ion X is present. The indices/substituents p1, p2, -L1-, -L2-, -E1, -E2, -A1-, -A2-, -Y1-, -Y2-, R1, R2, R3, -Z1, -Z2 and X have the same meaning as in formula III above.
- Additional preferred subclasses of IR light absorbing dyes are represented by formula III in which the polysiloxane group is not covalently linked to the dye but comprised in the counter ion X. The indices/substituents p1, p2, -L1-, -L2-, -E1, -E2, -A1-, -A2-, -Y1-, -Y2-, R1, R2, R3, -Z1, -Z2 and X have the same meaning as in formula III above with the proviso that:
- -A1-, -A2-, R1, R2 and R3 can not represent a polysiloxane group;
- X contains a polysiloxane group.
-
- R10 represents -(CH2)e-Si-[OSi(R11R12R13)]3 or
-(CH2)e-OCO-(CH2)f-[Si(R14R15)-O]g-(CH2)h-CH3;
- R4 and R5 have the same meaning as defined above;
- R11, R12, R13, R14 and R15 independently represent an optionally substituted alkyl, alkenyl, aryl or aralkyl group;
- e, f, g and h are 1 or an integer greater than 1.
-
- Next to the preferred infrared dyes containing a polysiloxane group, the coating can contain additional infrared absorbing dyes such as cyanine dyes or pigments such as carbon black. Examples of suitable IR absorbers are described in e.g.
EP-A 823327 EP-A 978376 EP-A 1029667 ,EP-A 1053868 ,EP-A 1093934 ;WO 97/39894 WO 00/29214 - The first layer may further contain other ingredients such as additional binders to improve the run length of the plate, colorants, development inhibitors as disclosed in
WO 97/39894 EP-A 823 327 - Suitable development accelerators are described in e.g.
EP-A933682 U.S. Patent No. 4,115,128 . Examples of the phenols include bisphenol A, p-nitrophenol, p-ethoxyphenol, 2,4,4'-trihydroxybenzophenone, 2,3,4-trihydroxy-benzophenone, 4-hydroxyphenone, 4,4',4"-trihydroxytriphenylmethane, and 4,4',3",4"-tetrahydroxy-3,5,3',5'-tetramethyltriphenyl-methane, and the like. Examples of the organic acids include sulfonic acids, sulfinic acids, alkylsulfuric acids, phosphonic acids, phosphates, and carboxylic acids, as described in, for example,JP-A Nos. 60-888,942 2-96,755 - The support has a hydrophilic surface or is provided with a hydrophilic layer. The support may be a sheet-like material such as a plate or it may be a cylindrical element such as a sleeve which can be slid around a print cylinder of a printing press. Preferably, the support is a metal support such as aluminum or stainless steel.
- A particularly preferred lithographic support is an electrochemically grained and anodized aluminum support. The anodized aluminum support may be treated to improve the hydrophilic properties of its surface. For example, the aluminum support may be silicated by treating its surface with a sodium silicate solution at elevated temperature, e.g. 95°C. Alternatively, a phosphate treatment may be applied which involves treating the aluminum oxide surface with a phosphate solution that may further contain an inorganic fluoride. Further, the aluminum oxide surface may be rinsed with a citric acid or citrate solution. This treatment may be carried out at room temperature or may be carried out at a slightly elevated temperature of about 30 to 50°C. A further interesting treatment involves rinsing the aluminum oxide surface with a bicarbonate solution. Still further, the aluminum oxide surface may be treated with polyvinylphosphonic acid, polyvinylmethylphosphonic acid, phosphoric acid esters of polyvinyl alcohol, polyvinylsulfonic acid, polyvinylbenzenesulfonic acid, sulfuric acid esters of polyvinyl alcohol, and acetals of polyvinyl alcohols formed by reaction with a sulfonated aliphatic aldehyde. It is further evident that one or more of these post treatments may be carried out alone or in combination. More detailed descriptions of these treatments are given in
GB-A- 1 084 070 DE-A- 4 423 140 ,DE-A- 4 417 907 ,EP-A- 659 909 EP-A- 537 633 DE-A- 4 001 466 ,EP-A- 292 801 EP-A- 291 760 US-P- 4 458 005 . - According to another embodiment, the support can also be a flexible support, which is provided with a hydrophilic layer, hereinafter called 'base layer'. The flexible support is e.g. paper, plastic film, thin aluminum or a laminate thereof. Preferred examples of plastic film are polyethylene terephthalate film, polyethylene naphthalate film, cellulose acetate film, polystyrene film, polycarbonate film, etc. The plastic film support may be opaque or transparent.
- The base layer is preferably a cross-linked hydrophilic layer obtained from a hydrophilic binder cross-linked with a hardening agent such as formaldehyde, glyoxal, polyisocyanate or a hydrolyzed tetra-alkylorthosilicate. The latter is particularly preferred. The thickness of the hydrophilic base layer may vary in the range of 0.2 to 25 µm and is preferably 1 to 10 µm.
- The hydrophilic binder for use in the base layer is e.g. a hydrophilic (co)polymer such as homopolymers and copolymers of vinyl alcohol, acrylamide, methylol acrylamide, methylol methacrylamide, acrylate acid, methacrylate acid, hydroxyethyl acrylate, hydroxyethyl methacrylate or maleic anhydride/vinylmethylether copolymers. The hydrophilicity of the (co)polymer or (co)polymer mixture used is preferably the same as or higher than the hydrophilicity of polyvinyl acetate hydrolyzed to at least an extent of 60% by weight, preferably 80% by weight.
- The amount of hardening agent, in particular tetraalkyl orthosilicate, is preferably at least 0.2 parts per part by weight of hydrophilic binder, more preferably between 0.5 and 5 parts by weight, most preferably between 1 parts and 3 parts by weight.
- The hydrophilic base layer may also contain substances that increase the mechanical strength and the porosity of the layer. For this purpose colloidal silica may be used. The colloidal silica employed may be in the form of any commercially available water dispersion of colloidal silica for example having an average particle size up to 40 nm, e.g. 20 nm. In addition inert particles of larger size than the colloidal silica may be added e.g. silica prepared according to Stöber as described in J. Colloid and Interface Sci., Vol. 26, 1968, pages 62 to 69 or alumina particles or particles having an average diameter of at least 100 nm which are particles of titanium dioxide or other heavy metal oxides. By incorporating these particles the surface of the hydrophilic base layer is given a uniform rough texture consisting of microscopic hills and valleys, which serve as storage places for water in background areas.
- Particular examples of suitable hydrophilic base layers for use in accordance with the present invention are disclosed in
EP-A- 601 240 GB-P- 1 419 512 FR-P- 2 300 354 US-P- 3 971 660 , andUS-P- 4 284 705 . - It is particularly preferred to use a film support to which an adhesion improving layer, also called support layer, has been provided. Particularly suitable adhesion improving layers for use in accordance with the present invention comprise a hydrophilic binder and colloidal silica as disclosed in
EP-A- 619 524 EP-A- 620 502 EP-A- 619 525 - The printing plate precursor of the present invention can be exposed to light, e.g. by means of LEDs or a laser head. Preferably, one or more lasers or a laser diode are used. The light used for the exposure is infrared light having a wavelength in the range from about 750 to about 1500 nm and preferably a laser such as a semiconductor laser diode, a Nd:YAG or a Nd:YLF laser is used. The required laser power depends on the sensitivity of the image-recording layer, the pixel dwell time of the laser beam, which is determined by the spot diameter (typical value of modern plate-setters at 1/e2 of maximum intensity: 10-25 µm), the scan speed and the resolution of the exposure apparatus (i.e. the number of addressable pixels per unit of linear distance, often expressed in dots per inch or dpi; typical value: 1000-4000 dpi).
- Two types of laser-exposure apparatuses are commonly used: internal (ITD) and external drum (XTD) plate-setters. ITD plate-setters for thermal plates are typically characterized by a very high scan speed up to 1500 m/sec and may require a laser power of several Watts. The Agfa Galileo T (trademark of Agfa Gevaert N.V.) is a typical example of a plate-setter using the ITD-technology. XTD plate-setters operate at a lower scan speed typically from 0.1 m/sec to 20 m/sec and have a typical laser-output-power per beam from 20 mW up to 500 mW. The Creo Trendsetter plate-setter family (trademark of Creo) and the Agfa Excalibur plate-setter family (trademark of Agfa Gevaert N.V.) both make use of the XTD-technology.
- The known plate-setters can be used as an off-press exposure apparatus, which offers the benefit of reduced press down-time. XTD plate-setter configurations can also be used for on-press exposure, offering the benefit of immediate registration in a multi-color press. More technical details of on-press exposure apparatuses are described in e.g.
US 5,174,205 andUS 5,163,368 . - In the development step, the non-exposed areas of the coating are removed by immersion in an aqueous alkaline developer, which may be combined with mechanical rubbing, e.g. by a rotating brush. The development step may be followed by a drying step, a rinsing step, a gumming step, and/or a post-baking step.
- The printing plate thus obtained can be used for conventional, so-called wet offset printing, in which ink and an aqueous dampening liquid are supplied to the plate. Another suitable printing method uses so-called single-fluid ink without a dampening liquid. Single-fluid inks which are suitable for use in the method of the present invention have been described in
US 4,045,232 andUS 4,981,517 . In a most preferred embodiment, the single-fluid ink comprises an ink phase, also called the hydrophobic or oleophilic phase, and a polyol phase as described inWO 00/32705 -
- 2 mol of product 1 and 1 mol of product 2 are dissolved in 7.5 1 acetonitrile and stirred at 70°C for 90 minutes. After this period, 17 1 acetonitrile is added and the reaction mixture is cooled to room temperature. IR-1 is filtered and dried. (Yield = 46%)
-
- 1 mol of product 4, 1.4 mol of product 3 and 1 mol of potassium Iodide are added to 0.3 1 sulfolane. The reaction mixture is kept for 6 hours at 150°C; subsequently the mixture is cooled to room temperature and 2 1 methyl-tertiair-butylether is added. After extraction with 10 1 water, 2 1 butylacetate is added to the organic layer. The reaction mixture is stirred for 30 minutes and product 1 is filtered and dried. (yield = 21%)
-
- 1 mol of product 5 and 3.5 mol of product 6 are added to 0.3 1 ethylacetate and the mixture is kept at 65°C for 30 minutes. 0.75 1 methyl-tertiair-butylether and 0.7 1 hexane are added and product 2 is filtered and dried. (yield = 55%)
-
- To 1 mol of product 7 in 0.8 1 toluene and 1 mol of acetic acid, 1,13 mol of product 6 is added at room temperature. Subsequently 1,5 1 hexane is added and the reaction mixture is stirred for 1 hour at room temperature. Product 5 is filtered and dried. (yield = 79%)
-
- 1 mol of product 8, 1.1 mol cyclopentanon, 0.07 mol ammonium acetate and 0.15 1 methanol are mixed and refluxed for 4.5 hours. After that period, 1 l toluene is added and methanol and water are separated by distillation. The reaction solution obtained is used for synthesis of intermediate product 5.
-
- 1 mol of product 9, 1 mol of product 10, 2 mol of acetic acid anhydride and 0.15 l acetic acid are reacted at 90 °C for 2.5 hours. Acetic acid is removed by vacuum distillation and product 8 is obtained.
-
- 1 mol of product 11 is dissolved in 0.07 1 toluene and 1 mol of product 12 is added at 50°C. The solvent is evaporated and product 9 is obtained.
-
- 4 mol of product 14 and 2 mol of product 18 are stirred in 10 1 toluene for 10 minutes at 80 °C. Subsequently, 1 mol of product 13 and 40 l toluene are added. The reaction mixture is refluxed for 45 minutes. The organic layer is evaporated and the remaining product is dissolved in a mixture of 5 1 toluene and 5 1 methanol. 40 1 methanol is added and IR-2 is filtered and dried. (yield = 50%)
-
- 1 mol of product 15, 1.1 mol of product 16 and 1.5 mol of potassium acetate are dissolved in 4 1 methylene chloride and 6 1 methanol. The mixture is stirred for one hour at room temperature. Product 13 is filtered and dried. (yield = 30%)
-
- A mixture of 2 mol of product 19, 1 mol of product 20, 4 1 methanol, 0.5 1 triethyl amine and 0.4 1 acetic acid anhydride is stirred at 60°C for 2 hours. 200 g NaI and 4 l methyl-tertiair-butylether are added. Product 15 is filtered and dried. (yield = 25%)
- 1 mol of product 3 and 0.1 mol 2-bromoethanol are dissolved in 0,2 1 sulfolane and are kept at 100°C for 4 hours. Adding 1 l acetone precipitates the product. Product 19 is filtered and dried. (yield = 82%)
-
- A mixture of 1 mol of product 29, 0.5 1 toluene, 0.18 1 acetic acid, 1.05 mol of product 10 and 0.25 1 acetic acid anhydride are kept at 100°C for 2.5 hours. The reaction mixture is poured into methanol/water and product 16 is filtered and dried. (yield = 44%)
-
- 2 mol of product 17 and 1 mol of product 18 are stirred at 90°C for 30 minutes. The reaction mixture is poured into methanol/water and product 29 is filtered and dried. (yield = 28%)
-
- 4 mol of product 14, 10 l toluene and 2 mol of product 18 are kept at 80°C for 10 minutes. Subsequently 1 mol of product 24 and 50 l toluene are added and the mixture is refluxed for 45 minutes. The organic layer is evaporated and 5 1 toluene and 5 1 methanol is added. After addition of 40 1 methanol, IR-3 is filtered and dried. (yield = 75 %)
-
- 8 l methanol, 4 1 methylene chloride, 1 mol of product 25, 1 mol of product 16 and 1.5 mol of potassium acetate are stirred at room temperature for 3 hours. Adding methyl ethyl ketone precipitates the product. Product 19 is filtered, washed with water and dried. (yield = 67%)
-
- 2 l methanol, 0.25 1 triethylamine, 2 mol of product 26, 1 mol of product 20 and 0.2 1 acetic acid anhydride are stirred at 60°C for 2 hours. Product 25 is filtered and dried. (yield = 40%)
-
- 1 mol of product 27 and 1.1 mol of 2-bromoethanol are dissolved in 2 1 sulfolane and stirred at 100°C for 4 hours. Adding aceton precipitates the product. Product 26 is filtered and dried. (yield = 85%)
- 10 mol of dimethylformamide, 3 mol phosphorylchloride are heated to 65°C. Than 1 mol of cyclopentanon is dropped to this mixture and the mixture is stirred for 1 hour at 60°C. The reaction mixture is poured into 2 1 water containing 7 mol sodium acetate. Product 20 is filtered and dried. (yield = 60%)
-
- 4 mol of product 28 and 2 mol of product 18 are added to 50 1 toluene and the mixture is stirred for 10 minutes at 80°C. 1 mol of product 24 and 50 1 toluene are added and the mixture is refluxed for 45 minutes. The organic layer is evaporated and 500 1 hexane is added. The mixture is filtered and the filtrate is evaporated. IR-4 is obtained. (yield = 11%)
-
- 1 mol of product 30 and 1 mol of product 16 are dissolved in 15 1 methanol and 7 1 methylene chloride. 2 mol potassium acetate is added and the mixture is stirred for 3 hours at 40°C. After evaporation of methylene chloride, COMP-1 is filtered and dried. (Yield 46%)
-
- 1 mol of product 32 and 2 mol of product 31 are added to 2 1 acetic acid anhydride and 2.2 mol triethylamine. The mixture is stirred for 2 hours at room temperature. After stirring 40 l ethyl acetate is added and product 30 is filtered and dried. (Yield = 30%)
- 1 mol of product 27 and 2 mol n-butyl bromide are stirred in 0.5 1 sulfolane for four hours at 100°C. Product 31 is filtered, washed with ethyl acetate and dried. (Yield: 61%)
-
- 1 mol of product 33 and 2 mol of product 34 are dissolved in 5 1 acetone and 2 1 water and stirred for one hour at room temperature. Product 32 is filtered and dried. (Yield = 80%)
- These examples demonstrate the use of infrared dyes which contain a polysiloxane group in a coating according to the present invention in which the water repellent-compound is a polysiloxane containing polymer.
- A 0.30 mm thick aluminum foil was degreased by immersing the foil in an aqueous solution containing 5 g/l of sodium hydroxide at 50°C and rinsed with demineralized water. The foil was then electrochemically grained using an alternating current in an aqueous solution containing 4 g/l of hydrochloric acid, 4 g/l of hydroboric acid and 5 g/l of aluminum ions at a temperature of 35°C and a current density of 1200 A/m2 to form a surface topography with an average center-line roughness Ra of 0.5 µm.
- After rinsing with demineralized water the aluminum foil was then etched with an aqueous solution containing 300 g/l of sulfuric acid at 60°C for 180 seconds and rinsed with demineralized water at 25°C for 30 seconds.
- The foil was subsequently subjected to anodic oxidation in an aqueous solution containing 200 g/l of sulfuric acid at a temperature of 45°C, a voltage of about 10 V and a current density of 150 A/m2 for about 300 seconds to form an anodic oxidation film of 3.00 g/m2 of Al2O3 then washed with demineralized water, post-treated with a solution containing polyvinylphosphonic acid and subsequently with a solution containing aluminum trichloride, rinsed with demineralized water at 20°C during 120 seconds and dried.
- The solutions in Table 1 below were coated on the above support at a wet coating thickness of 20 µm and dried for 1 minute at 130°C. The materials were then imaged on a Creo Trendsetter 3244 (830 nm) using different energy density settings (intensity at the image plane) in the range from 80 mJ/cm2 up to 200 mJ/cm2. The plates were then processed by dipping for 60 seconds in a development tank filled with DP300 (aqueous alkaline developer commercially available from Agfa) at a temperature of 25°C. The IR-sensitivity of the different compositions corresponds to the minimum energy density setting that is required to obtain a 50% reduction of the light absorption of the coating, measured on the developed plate at the wavelength maximum of the contrast dye, in areas which have been exposed with a dot area of a 50% screen (@200 lpi).
- The results in Table 1 indicate that the coating which comprises an infrared dye containing a polysiloxane group provide a higher sensitivity than the comparative coating in which the corresponding infrared dye does not contain a polysiloxane group.
Table 1 Ingredients (g) Ex. 1 (inv.) Ex. 2 (comp.) Tetrahydrofuran 25.76 25.76 Alnovol SPN452* 6.59 6.59 Methoxypropanol 16.98 16.98 IR-2 0.1 - IR-COMP1 - 0.1 Flexo blau 630** 0.03 0.03 Tego Glide 410 *** 0.14 0.14 Tego Wet 265 **** 0.05 0.05 2,3,4-trimethoxybenzoic acid 0.36 0.36 IR sensitivity (mJ/cm2) 120 > 200 *Alnovol SPN452 is a 40.5% solution in Dowanol PM (commercially available from Clariant)
**Triaryl methane dye commercially available from BASF
***a polymer containing polysiloxane commercially available from Tego Chemie, Essen, Germany; 10 wt.% solution in methoxypropanol.
****a polymer containing polysiloxane commercially available from Tego Chemie, Essen, Germany; 10 wt.% solution in methoxypropanol. - These examples demonstrate the use of an infrared dye which contains a polysiloxane group in a coating according to the present invention in which the water repellent-compound is a perfluoroalkyl containing polymer.
- The support was prepared as described in examples 1 and 2.
- The solutions in Table 2 below were coated on the above support at a wet coating thickness of 20 µm and dries for 1 minute at 130°C. The materials were then imaged on a Creo Trendsetter 3244 (830 nm) using different energy density settings (intensity at the image plane) in the range from 80 mJ/cm2 up to 200 mJ/cm2. The plates were then processed by dipping for 60 seconds in a development tank filled with DP300 (aqueous alkaline developer commercially available from Agfa) at a temperature of 25°C. The IR-sensitivity of the different compositions corresponds to the minimum energy density setting that is required to obtain a 50% reduction of the light absorption of the coating, measured on the developed plate at the wavelength maximum of the contrast dye, in areas which have been exposed with a dot area of a 50% screen (@200 lpi).
- The results in Table 2 indicate that the coating which comprises an infrared dye containing a polysiloxane group provides a higher sensitivity than the comparative coating in which the corresponding infrared dye does not contain a polysiloxane group.
Table 2 Ingredients (g) Ex. 3 (inv.) Ex. 4 (comp.) Tetrahydrofuran 25.76 25.76 Alnovol SPN452* 6.59 6.59 Methoxypropanol 16.98 16.98 IR-2 0.1 - IR-COMP1 - 0.1 Flexo blau 630** 0.03 0.03 Fluorad FC431 *** 0.14 0.14 2,3,4-trimethoxybenzoic acid 0.36 0.36 IR sensitivity (mJ/cm2) 100 > 200 *Alnovol SPN452 is a 40.5% solution in Dowanol PM (commercially available from Clariant)
**Triaryl methane dye commercially available from BASF
***a polymer containing perfluoroalkyl commercially available from 3M; 10 wt.% solution in methoxypropanol.
Claims (13)
- A heat-sensitive lithographic printing plate precursor comprising a support having a hydrophilic surface and a coating provided on the hydrophilic surface, said coating comprising in the order given a first layer containing an oleophilic resin soluble in an aqueous alkaline developer and a second layer capable of preventing penetration of the developer at unexposed areas, said second layer comprising a water-repellent compound selected from the group consisting of- a polymer comprising siloxane and/or perfluoroalkyl monomeric units, and- a block- or graft-copolymer comprising a poly- or oligo(alkylene oxide) and a polymer or oligomer comprising siloxane and/ or perfluoroalkyl monomeric units, andwherein the alkali-solubility of said coating increases on heating and said coating comprises an infrared light absorbing dye characterised in that the infrared absorbing dye comprises at least one polysiloxane group.
- A lithographic printing plate precursor according to claim 1 wherein the polysiloxane group is covalently linked to the infrared light absorbing dye.
- A lithographic printing plate precursor according to claim 1 wherein the infrared light absorbing dye carries a charge and the polysiloxane group is comprised in a counter ion.
- A lithographic printing plate precursor according to claim 1 wherein at least one polysiloxane group is covalently linked to the infrared light absorbing dye and at least one polysiloxane is comprised in a counter ion.
- A lithographic printing plate precursor according to any of the preceding claims wherein the infrared light absorbing dye is selected from the group consisting of squarylium, croconate, merocyanine, cyanine, indolizine, pyrilium and metal dithioline dyes.
- A lithographic printing plate precursor according to any of the preceding claims wherein the amount of the water-repellent compound in the coating is between 0.5 and 15 mg/m2.
- A lithographic printing plate precursor according to any of the preceding claims wherein the second layer of the coating consists essentially of the water-repellent compound and the infrared light absorbing dye.
- A lithographic printing plate precursor according to any of the preceding claims wherein the infrared light absorbing dye corresponds to the following formula:a and b each independently represent an integer from 0 to 4;-L1- and -L2- independently represent a divalent linking group;-E1 and -E2 independently represent a neutral, anionic or cationic terminal group selected from alkyl, -OH, -H, -Cl, -Br, -F,-SiRaRbRc (neutral groups); SO3 -, -SO4 -, -PO3 2-, -PO4 2-, -COO (anionic groups); -[NRdReRf]+(cationic group);Ra, Rb and Rc independently represent an optionally substituted alkyl, alkenyl, aryl or aralkyl group;Rd, Re and Rf independently represent a hydrogen atom or an optionally substituted alkyl, alkenyl, aryl or aralkyl group;-A1- and -A2- independently represent -[Si(RgRh)-O]m- , -CvF2v-, -[(CF2)2-O]w- or an optionally substituted alkyl, alkenyl, aryl or aralkyl group;Rg and Rh independently represent an optionally substituted alkyl, alkenyl, aryl or aralkyl group, -[O-Si(RaRb)]q-E1 or -[O-Si(RaRb)]q-E2;with p1 and p2 is 0 or 1;with t, q and m is 1 or an integer greater than 1;with v and w is 2 or an integer greater than 2;-Y1- and -Y2- independently represent one or two non-metallic atoms, which may be substituted, necessary to complete a 5- or 6-membered heterocyclic ring;-Z1 and -Z2 each independently represent a hydrogen atom, an alkyl group or -Z and -Z together represent the necessary atoms to complete a 5- or 6-membered ring;R1 and R2 each independently represent a hydrogen atom, an optionally substituted alkyl, alkenyl, aryl or aralkyl group or a group selected from a halogen atom, -NO2, -O-Ri, -CO-Ri, -CO-O-Ri,-O-CO-Ri, -CO-NRiRj, -NRiRj, -NRi-CO-Rj, -NRi-CO-O-Rj, -NRi-CO-NRjRk, -SRi, -SO-Ri, -SO2-Ri, -SO2-O-Ri, -SO2NRiRj, a perfluoroalkyl group or a polysiloxane group; each of said groups optionally comprise a terminal group E defined above as -E1 and -E2 and/or wherein two adjacent groups selected from R1, R2 -Y1- and -Y2- together form an optionally substituted 5- or 6- membered ring;Ri , Rj and Rk independently represent a hydrogen or an optionally substituted alkyl, alkenyl, aryl or aralkyl group;R3 represents a substituent selected from a hydrogen, a halogen atom, an alkyl, alkenyl, aryl or aralkyl group, a perfluoroalkyl group, a polysiloxane group, an amino group, a thioalkyl group, a thioaryl group, an aryloxy group, an alkoxy group, a barbituric group or a thiobarbituric group, each of said groups being optionally substituted;X represents one or more optional counter ions having a total charge opposite to the dye and wherein X optionally comprises a polysiloxane group;with the provisio that at least one of the following substituents contains a polysiloxane group: R1, R2, R3, -A1-, -A2- or X.
- A printing plate precursor according to claim 8 wherein -Z1 and -Z2 together represent -(CH2)2- or -(CH2)3-.
- A lithographic printing plate precursor according to claims 8 or 9 wherein the IR light absorbing dye corresponds to the following formulae:-Z1, Z2, R3 and X have the same meaning as defined in claim 8; c and d are independently 0, 1 or 2;each R6 to R9 independently represent a group as defined for R1 and R2 in claim 8,with the provisio that at least one of the following substituents contains a polysiloxane group: R3, R6 to R9, -A1-, -A2 or X.
- A lithographic printing plate precursor according to any of the claims 8 to 10 wherein the IR light absorbing dye corresponds to the following formulae:P1, P2, a, b, -L1-, -L2-, -E1, -E2 , -A1-, -A2, R1, R2,R3 and X have the same meaning as defined in claim 8;R4 and R5 independently represent an optionally substituted alkyl, alkenyl, cycloalkyl, aryl or aralkyl group, a perfluoroalkyl group or a polysiloxane group; each of said groups optionally comprise a terminal group E defined in claim 8 as -E1 and -E2; with the provisio that at least one of the following substituents contains a polysiloxane group: R1, R2, R3, R4, R5, 1 2 -A -, -A or X.
- A lithographic printing plate precursor according to any of the claims 8 to 11 wherein the IR light absorbing dye corresponds to the following formulae:R10 represents -(CH2)e-Si-[OSi(R11R12R13)]3 or -(CH2)e-OCO-(CH2)f-[Si(R14R15)-O]g-(CH2)h-CH3;R4 and R5 have the same meaning as defined in claim 11;R11, R12, R13, R14 and R15 independently represent an optionally substituted alkyl, alkenyl, aryl or aralkyl group;e, f, g and h is 1 or an integer greater than 1.
- A lithographic printing plate precursor according to any of the preceding claims wherein the polysiloxane group has a linear or branched structure.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP20040100163 EP1440797B1 (en) | 2003-01-27 | 2004-01-20 | Heat-sensitive lithographic printing plate precursor |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP03100155 | 2003-01-27 | ||
EP03100155 | 2003-01-27 | ||
EP20040100163 EP1440797B1 (en) | 2003-01-27 | 2004-01-20 | Heat-sensitive lithographic printing plate precursor |
Publications (3)
Publication Number | Publication Date |
---|---|
EP1440797A2 EP1440797A2 (en) | 2004-07-28 |
EP1440797A3 EP1440797A3 (en) | 2005-06-29 |
EP1440797B1 true EP1440797B1 (en) | 2007-10-03 |
Family
ID=32598816
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP20040100163 Expired - Lifetime EP1440797B1 (en) | 2003-01-27 | 2004-01-20 | Heat-sensitive lithographic printing plate precursor |
Country Status (1)
Country | Link |
---|---|
EP (1) | EP1440797B1 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE602006021374D1 (en) | 2005-09-27 | 2011-06-01 | Fujifilm Corp | Lithographic printing process |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1080884B1 (en) * | 1999-08-31 | 2003-11-12 | Agfa-Gevaert | Processless thermal printing plate with well defined nanostructure |
EP1249341A1 (en) * | 2001-04-09 | 2002-10-16 | Agfa-Gevaert | Lithographic printing plate precursor |
EP1256444B1 (en) * | 2001-04-09 | 2004-06-30 | Agfa-Gevaert | Positive-working lithographic printing plate precursor |
-
2004
- 2004-01-20 EP EP20040100163 patent/EP1440797B1/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP1440797A3 (en) | 2005-06-29 |
EP1440797A2 (en) | 2004-07-28 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP1736312B1 (en) | Heat-sensitive imaging element | |
EP1554347B1 (en) | Polymer for heat-sensitive lithographic printing plate precursor | |
EP1554117B1 (en) | Heat-sensitive lithographic printing plate precursor | |
EP1554346B1 (en) | Polymer for heat-sensitive lithographic printing plate precursor | |
EP1554324B1 (en) | Polymer for heat-sensitive lithographic printing plate precursor | |
EP1985445B1 (en) | A lithographic printing plate precursor | |
US7041427B2 (en) | Heat-sensitive lithographic printing plate precursor | |
US7087359B2 (en) | Heat-sensitive lithographic printing plate precursor | |
EP1738901B1 (en) | Heat-sensitive lithographic printing plate precursor | |
US6953652B2 (en) | Heat-sensitive lithographic printing plate precursor | |
EP1297950B1 (en) | Heat-sensitive lithographic printing plate precursor | |
EP1473156B1 (en) | Heat-sensitive lithographic printing plate precursor | |
EP1440797B1 (en) | Heat-sensitive lithographic printing plate precursor | |
US20040048195A1 (en) | Heat-sensitive lithographic printing plate precursor | |
EP1256444B1 (en) | Positive-working lithographic printing plate precursor | |
US6846613B2 (en) | Positive-working lithographic printing plate precursors | |
EP1738900B1 (en) | Heat-sensitive lithographic printing plate precursor | |
US7294447B2 (en) | Positive-working lithographic printing plate precursor | |
EP1396338B1 (en) | Heat-sensitive lithographic printing plate precursor | |
EP1295717B1 (en) | Heat-sensitive positive-working lithographic printing plate precursor | |
US20070003869A1 (en) | Heat-sensitive lithographic printing plate-precursor |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
AK | Designated contracting states |
Kind code of ref document: A2 Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PT RO SE SI SK TR |
|
AX | Request for extension of the european patent |
Extension state: AL LT LV MK |
|
PUAL | Search report despatched |
Free format text: ORIGINAL CODE: 0009013 |
|
AK | Designated contracting states |
Kind code of ref document: A3 Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PT RO SE SI SK TR |
|
AX | Request for extension of the european patent |
Extension state: AL LT LV MK |
|
RIC1 | Information provided on ipc code assigned before grant |
Ipc: 7B 41N 1/08 B Ipc: 7B 41C 1/10 A |
|
17P | Request for examination filed |
Effective date: 20051229 |
|
AKX | Designation fees paid |
Designated state(s): DE FR GB IT NL |
|
RAP1 | Party data changed (applicant data changed or rights of an application transferred) |
Owner name: AGFA GRAPHICS N.V. |
|
GRAP | Despatch of communication of intention to grant a patent |
Free format text: ORIGINAL CODE: EPIDOSNIGR1 |
|
GRAS | Grant fee paid |
Free format text: ORIGINAL CODE: EPIDOSNIGR3 |
|
GRAA | (expected) grant |
Free format text: ORIGINAL CODE: 0009210 |
|
AK | Designated contracting states |
Kind code of ref document: B1 Designated state(s): DE FR GB IT NL |
|
REG | Reference to a national code |
Ref country code: GB Ref legal event code: FG4D |
|
REF | Corresponds to: |
Ref document number: 602004009227 Country of ref document: DE Date of ref document: 20071115 Kind code of ref document: P |
|
ET | Fr: translation filed | ||
PLBE | No opposition filed within time limit |
Free format text: ORIGINAL CODE: 0009261 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT |
|
26N | No opposition filed |
Effective date: 20080704 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: IT Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20080131 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: GB Payment date: 20101216 Year of fee payment: 8 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: NL Payment date: 20111220 Year of fee payment: 9 Ref country code: FR Payment date: 20111220 Year of fee payment: 9 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: DE Payment date: 20111214 Year of fee payment: 9 |
|
REG | Reference to a national code |
Ref country code: NL Ref legal event code: V1 Effective date: 20130801 |
|
GBPC | Gb: european patent ceased through non-payment of renewal fee |
Effective date: 20130120 |
|
REG | Reference to a national code |
Ref country code: FR Ref legal event code: ST Effective date: 20130930 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: NL Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20130801 Ref country code: DE Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20130801 |
|
REG | Reference to a national code |
Ref country code: DE Ref legal event code: R119 Ref document number: 602004009227 Country of ref document: DE Effective date: 20130801 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: GB Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20130120 Ref country code: FR Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20130131 |