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EP0578953A1 - Emetteur de rayonnement à haute puissance - Google Patents

Emetteur de rayonnement à haute puissance Download PDF

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Publication number
EP0578953A1
EP0578953A1 EP93108758A EP93108758A EP0578953A1 EP 0578953 A1 EP0578953 A1 EP 0578953A1 EP 93108758 A EP93108758 A EP 93108758A EP 93108758 A EP93108758 A EP 93108758A EP 0578953 A1 EP0578953 A1 EP 0578953A1
Authority
EP
European Patent Office
Prior art keywords
discharge space
dielectric
discharge
power radiator
radiator according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP93108758A
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German (de)
English (en)
Other versions
EP0578953B1 (fr
Inventor
Ulrich Dr. Kogelschatz
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Heraeus Noblelight GmbH
Original Assignee
Heraeus Noblelight GmbH
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Filing date
Publication date
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First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=6462570&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=EP0578953(A1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Heraeus Noblelight GmbH filed Critical Heraeus Noblelight GmbH
Publication of EP0578953A1 publication Critical patent/EP0578953A1/fr
Application granted granted Critical
Publication of EP0578953B1 publication Critical patent/EP0578953B1/fr
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J65/00—Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
    • H01J65/04—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels
    • H01J65/042—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field
    • H01J65/046—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field the field being produced by using capacitive means around the vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/54—Igniting arrangements, e.g. promoting ionisation for starting

Definitions

  • the invention relates to a high-power radiator, in particular for ultraviolet light, with a discharge space filled with filling gas emitting radiation under discharge conditions, the walls of which are formed by an outer and an inner dielectric, the outer surfaces of the outer dielectric being provided with first electrodes, with second electrodes Electrodes on the surface of the second dielectric facing away from the discharge space, and with an alternating current source connected to the first and second electrodes for supplying the discharge.
  • the invention relates to a prior art, such as that which results from EP-A 054 111, US patent application 07/485544 from February 27, 1990 or also EP patent application 90103082.5 from February 17, 1990.
  • UV sources The industrial use of photochemical processes depends heavily on the availability of suitable UV sources.
  • the classic UV lamps deliver low to medium UV intensities at some discrete wavelengths, such as the mercury low pressure lamps at 185 nm and especially at 254 nm.
  • Really high UV powers can only be obtained from high-pressure lamps (Xe, Hg), which then distribute their radiation over a larger wavelength range.
  • the new excimer lasers have provided some new wavelengths for basic photochemical experiments. for cost reasons for an industrial process probably only suitable in exceptional cases.
  • Excimer UV lamps based on the principle of silent electrical discharges require a significantly higher voltage than the voltage required for normal operation when they are first ignited or after longer breaks. This is due to the fact that surface charges form on the dielectrics during operation, which in each case ensure easier ignition in the subsequent voltage half-wave. These surface charges are missing the first time you ignite and after long breaks.
  • the object of the invention is to create a high-performance radiator, in particular for UV or VUV radiation, which ignites reliably without complex measures.
  • the invention is based on the knowledge of forcing an initial ignition at one point by local field distortion or field elevation.
  • the resulting UV radiation and the charge carriers of this local discharge then force the reliable ignition of the entire discharge volume.
  • the local field distortion can be e.g. by narrowing the discharge gap, e.g. cause a dent or hump directed against the gap volume, or preferably by means of a disturbing body made of dielectric material in the discharge gap.
  • This latter variant can be implemented in a simple manner by means of a quartz ball or a ball made of aluminum or titanium oxide in the discharge gap.
  • the invention makes it possible for the first time to create excimer UV lamps that ignite safely.
  • the measures to be taken are simple and economical. They can also be carried out retrospectively in existing units when using an interference body, which is considered the most preferred means for field distortion.
  • FIGS. 1 and 2 there is an outer quartz tube 1 with a wall thickness of approximately 0.5 to 1.5 mm and an outer diameter
  • An inner quartz tube 2 of approximately 20 to 30 mm is arranged coaxially.
  • a helical inner electrode 3 bears against the inner surface of the inner quartz tube 2.
  • An outer electrode 4 in the form of a wire mesh or an applied electrode structure extends over the entire outer circumference of the outer quartz tube 1.
  • a wire 4 is inserted into the inner quartz tube 3.
  • the quartz tubes 1 and 2 are closed or melted at both ends by a cover 5 and 6, respectively.
  • the space between the two tubes 1 and 2, the discharge space 7, is filled with a gas / gas mixture which emits radiation under discharge conditions.
  • This liquid also serves to cool the radiator.
  • the coolant is supplied or removed via the connections 9 and 10.
  • the cooling liquid also serves for the electrical coupling of the inner electrode 3 to the inner quartz tube 2, so that it is not necessary for the helical electrode 3 to rest against the inner wall everywhere.
  • the two electrodes 3, 4 are connected to the two poles of an alternating current source 11.
  • the alternating current source supplies an adjustable alternating voltage in the order of magnitude of several 100 volts to 20,000 volts at frequencies in the range of technical alternating current up to a few 1000 kHz - depending on the electrode geometry, pressure in the discharge space and composition of the filling gas.
  • the filling gas is, for example, mercury, noble gas, noble gas-metal vapor mixture, noble gas-halogen mixture, optionally under Use of an additional further noble gas, preferably Ar, He, Ne, as a buffer gas.
  • a substance / substance mixture according to the following table can be used: Filling gas radiation helium 60-100 nm neon 80 - 90 nm argon 107 - 165 nm Argon + fluorine 180-200 nm Argon + chlorine 165-190 nm Argon + krypton + chlorine 165-190, 200-240 nm xenon 160-190 nm nitrogen 337 - 415 nm krypton 124, 140-160 nm Krypton + fluorine 240 - 255 nm Krypton + chlorine 200-240 nm mercury 185, 254,320-370,390-420nm selenium 196, 204, 206 nm deuterium 150-250 nm Xenon + fluorine 340 - 360 nm, 400 - 550 nm Xenon + chlorine 300-320 nm
  • the electron energy distribution can be optimally adjusted by the thickness of the dielectrics and their properties as well as pressure and / or temperature in the discharge space.
  • FIG. 1 A first variant is shown in Fig. 1, right upper half (Fig. 2 in dashed lines).
  • the outer dielectric tube 1 is provided with an indentation or dent 12. This extends up to half the gap width to the inner dielectric tube 2.
  • a second variant shows Fig. 1, lower right half (Fig. 2 also dashed).
  • the inner dielectric tube 2 is provided with a dent or bump 12a, which reaches the outer dielectric tube 1 approximately up to half the gap width.
  • FIG. 1, left half, and FIG. 2 can also be used retrospectively in the case of emitters.
  • a ball 13 made of dielectric material, e.g. Quartz, preferably made of aluminum or titanium oxide, with an outer sphere diameter equal to or slightly smaller than the gap width of the discharge space 7.
  • This sphere can - but need not - be attached to one wire on both dielectric walls.
  • the exact spherical geometry is not important. Two or more of these balls can also be provided, in particular in the case of elongated radiators. The combination of ball (s) and dents or humps is also possible.
  • Another measure, which can also be taken subsequently with radiators, is to melt quartz drops 12b or 12c on the inner surface of the outer dielectric tube 1 or on the outer surface of the inner dielectric tube 2 in order to achieve the desired field distortion.

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Discharge Lamps And Accessories Thereof (AREA)
  • Vessels And Coating Films For Discharge Lamps (AREA)
  • Lasers (AREA)
  • Radiation-Therapy Devices (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)
EP93108758A 1992-07-06 1993-06-01 Emetteur de rayonnement à haute puissance Expired - Lifetime EP0578953B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE4222130 1992-07-06
DE4222130A DE4222130C2 (de) 1992-07-06 1992-07-06 Hochleistungsstrahler

Publications (2)

Publication Number Publication Date
EP0578953A1 true EP0578953A1 (fr) 1994-01-19
EP0578953B1 EP0578953B1 (fr) 1997-09-17

Family

ID=6462570

Family Applications (1)

Application Number Title Priority Date Filing Date
EP93108758A Expired - Lifetime EP0578953B1 (fr) 1992-07-06 1993-06-01 Emetteur de rayonnement à haute puissance

Country Status (5)

Country Link
US (1) US5432398A (fr)
EP (1) EP0578953B1 (fr)
JP (1) JP2771428B2 (fr)
CA (1) CA2099073C (fr)
DE (1) DE4222130C2 (fr)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0703602A1 (fr) * 1994-09-20 1996-03-27 Ushiodenki Kabushiki Kaisha Dispositif source de lumière utilisant une lampe à décharge à barrière diélectrique
WO1998011596A1 (fr) * 1996-09-11 1998-03-19 Patent-Treuhand-Gesellschaft für elektrische Glühlampen mbH Source de rayonnement electrique et systeme d'irradiation utilisant cette source
EP0871203A3 (fr) * 1997-04-11 1999-03-17 Nec Corporation Lampe à décharge à gaz rare
EP0948030A2 (fr) * 1998-03-30 1999-10-06 Toshiba Lighting & Technology Corporation Lampe à décharge à gaz rare, circuit d'éclairage et dispositif d'éclairage
EP1220285A2 (fr) * 2000-09-09 2002-07-03 GSF-Forschungszentrum für Umwelt und Gesundheit GmbH Source d' ions dans laquelle une source de lumière UV/VUV est utilisée pour l' ionisation
WO2011117045A1 (fr) * 2010-03-26 2011-09-29 Osram Gesellschaft mit beschränkter Haftung Lampe à décharge à barrière diélectrique avec disque de retenue

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB9519283D0 (en) * 1995-09-21 1995-11-22 Smiths Industries Plc Gas discharge lamps and systems
DE19543342A1 (de) * 1995-11-22 1997-05-28 Heraeus Noblelight Gmbh Verfahren und Strahlungsanordnung zur Erzeugung von UV-Strahlen zur Körperbestrahlung sowie Verwendung
DE19613502C2 (de) * 1996-04-04 1998-07-09 Heraeus Noblelight Gmbh Langlebiger Excimerstrahler und Verfahren zu seiner Herstellung
US6888041B1 (en) * 1997-02-12 2005-05-03 Quark Systems Co., Ltd. Decomposition apparatus of organic compound, decomposition method thereof, excimer UV lamp and excimer emission apparatus
DE19708149A1 (de) * 1997-02-28 1998-09-03 Umex Ges Fuer Umweltberatung U Vorrichtung zur UV-Bestrahlung von Flüssigkeiten und Gasen
DE19744940A1 (de) * 1997-02-28 1998-09-03 Umex Ges Fuer Umweltberatung U Vorrichtung zur Durchführung fotochemischer Reaktionen, vorzugsweise von Aufschlüssen im Labor
US6015759A (en) * 1997-12-08 2000-01-18 Quester Technology, Inc. Surface modification of semiconductors using electromagnetic radiation
US6049086A (en) * 1998-02-12 2000-04-11 Quester Technology, Inc. Large area silent discharge excitation radiator
DE19844720A1 (de) * 1998-09-29 2000-04-06 Patent Treuhand Ges Fuer Elektrische Gluehlampen Mbh Dimmbare Entladungslampe für dielektrisch behinderte Entladungen
JP3439679B2 (ja) * 1999-02-01 2003-08-25 株式会社オーク製作所 高輝度光照射装置
JP3604606B2 (ja) * 2000-01-07 2004-12-22 コニカミノルタビジネステクノロジーズ株式会社 発光制御装置とこの発光制御装置を使用した画像形成装置
DE10026781C1 (de) * 2000-05-31 2002-01-24 Heraeus Noblelight Gmbh Entladungslampe für dielektrisch behinderte Entladung
DE10133326A1 (de) * 2001-07-10 2003-01-23 Patent Treuhand Ges Fuer Elektrische Gluehlampen Mbh Dielektrische Barrieren-Entladungslampe mit Zündhilfe
EP1328007A1 (fr) 2001-12-14 2003-07-16 Patent-Treuhand-Gesellschaft für elektrische Glühlampen mbH Lampe à décharge à barrière diélectrique avec aide à l'allumage
US20050035711A1 (en) * 2003-05-27 2005-02-17 Abq Ultraviolet Pollution Solutions, Inc. Method and apparatus for a high efficiency ultraviolet radiation source
US20050199484A1 (en) * 2004-02-10 2005-09-15 Franek Olstowski Ozone generator with dual dielectric barrier discharge and methods for using same
CN1985348B (zh) * 2004-07-09 2011-05-25 皇家飞利浦电子股份有限公司 具有集成多功能装置的介电阻挡放电灯
DE102005062638A1 (de) * 2005-12-23 2007-07-05 Heraeus Noblelight Gmbh Zündhilfe
WO2008129440A2 (fr) * 2007-04-18 2008-10-30 Koninklijke Philips Electronics N.V. Lampe à décharge à barrière diélectrique
US9722550B2 (en) 2014-04-22 2017-08-01 Hoon Ahn Power amplifying radiator (PAR)
EP3457430B1 (fr) 2014-05-15 2023-10-25 Excelitas Technologies Corp. Lampe étanche avec doubles zones de focalisation commandée par un laser
US9741553B2 (en) 2014-05-15 2017-08-22 Excelitas Technologies Corp. Elliptical and dual parabolic laser driven sealed beam lamps
US10186416B2 (en) 2014-05-15 2019-01-22 Excelitas Technologies Corp. Apparatus and a method for operating a variable pressure sealed beam lamp
CN104701132B (zh) * 2015-03-17 2016-10-12 中国工程物理研究院激光聚变研究中心 一种大口径面状单向闪光氙灯
US10008378B2 (en) 2015-05-14 2018-06-26 Excelitas Technologies Corp. Laser driven sealed beam lamp with improved stability
US9576785B2 (en) 2015-05-14 2017-02-21 Excelitas Technologies Corp. Electrodeless single CW laser driven xenon lamp
US10057973B2 (en) 2015-05-14 2018-08-21 Excelitas Technologies Corp. Electrodeless single low power CW laser driven plasma lamp
US10109473B1 (en) 2018-01-26 2018-10-23 Excelitas Technologies Corp. Mechanically sealed tube for laser sustained plasma lamp and production method for same
JP6948606B1 (ja) 2020-08-28 2021-10-13 ウシオ電機株式会社 エキシマランプ及び光照射装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0184214A2 (fr) * 1984-12-06 1986-06-11 GTE Products Corporation Assemblage de lampe fluorescente compact
EP0477914A2 (fr) * 1990-09-25 1992-04-01 Toshiba Lighting & Technology Corporation Lampe à décharge à haute pression et son procédé d'allumage
EP0547366A1 (fr) * 1991-12-09 1993-06-23 Heraeus Noblelight GmbH Radiateur à haute puissance

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DE761839C (de) * 1941-08-09 1954-10-11 Patra Patent Treuhand Elektrische Gleichrichterroehre, insbesondere fuer hohe Spannungen
JPS56131983A (en) * 1980-03-19 1981-10-15 Mitsubishi Electric Corp Gas laser device
JPS56131985A (en) * 1980-03-19 1981-10-15 Mitsubishi Electric Corp Amplifying device for laser beam
US4392105A (en) * 1980-12-17 1983-07-05 International Business Machines Corp. Test circuit for delay measurements on a LSI chip
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JPS617676A (ja) * 1984-06-22 1986-01-14 Hitachi Ltd ガスレ−ザ発振装置用電極
US4845408A (en) * 1984-12-06 1989-07-04 Gte Products Corporation Compact fluorescent lamp assembly
CH670171A5 (fr) * 1986-07-22 1989-05-12 Bbc Brown Boveri & Cie
IL81439A (en) * 1987-01-30 1991-08-16 Alumor Lasers Ltd Ultra compact,rf excited gaseous lasers
JPH01264137A (ja) * 1988-04-14 1989-10-20 Dainippon Toryo Co Ltd プラズマディスプレイ装置
CH677292A5 (fr) * 1989-02-27 1991-04-30 Asea Brown Boveri
DE4010809A1 (de) * 1989-04-11 1990-10-18 Asea Brown Boveri Hochleistungsstrahler
DE4010190A1 (de) * 1990-03-30 1991-10-02 Asea Brown Boveri Bestrahlungseinrichtung

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0184214A2 (fr) * 1984-12-06 1986-06-11 GTE Products Corporation Assemblage de lampe fluorescente compact
EP0477914A2 (fr) * 1990-09-25 1992-04-01 Toshiba Lighting & Technology Corporation Lampe à décharge à haute pression et son procédé d'allumage
EP0547366A1 (fr) * 1991-12-09 1993-06-23 Heraeus Noblelight GmbH Radiateur à haute puissance

Non-Patent Citations (1)

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PATENT ABSTRACTS OF JAPAN vol. 11, no. 55 (E-481)(2502) 20. Februar 1987 & JP-A-61 216 232 ( MATSUSHITA ELECTRONICS ) 25. September 1986 *

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0703602A1 (fr) * 1994-09-20 1996-03-27 Ushiodenki Kabushiki Kaisha Dispositif source de lumière utilisant une lampe à décharge à barrière diélectrique
WO1998011596A1 (fr) * 1996-09-11 1998-03-19 Patent-Treuhand-Gesellschaft für elektrische Glühlampen mbH Source de rayonnement electrique et systeme d'irradiation utilisant cette source
US6060828A (en) * 1996-09-11 2000-05-09 Patent-Treuhand-Gesellschaft Fuer Elektrische Gluehlampen Mbh Electric radiation source and irradiation system with this radiation source
EP0871203A3 (fr) * 1997-04-11 1999-03-17 Nec Corporation Lampe à décharge à gaz rare
EP0948030A2 (fr) * 1998-03-30 1999-10-06 Toshiba Lighting & Technology Corporation Lampe à décharge à gaz rare, circuit d'éclairage et dispositif d'éclairage
EP0948030A3 (fr) * 1998-03-30 1999-12-29 Toshiba Lighting & Technology Corporation Lampe à décharge à gaz rare, circuit d'éclairage et dispositif d'éclairage
EP1220285A2 (fr) * 2000-09-09 2002-07-03 GSF-Forschungszentrum für Umwelt und Gesundheit GmbH Source d' ions dans laquelle une source de lumière UV/VUV est utilisée pour l' ionisation
EP1220285B1 (fr) * 2000-09-09 2014-08-20 Helmholtz Zentrum München Deutsches Forschungszentrum für Gesundheit und Umwelt (GmbH) Source d' ions dans laquelle une source de lumière UV/VUV est utilisée pour l' ionisation
WO2011117045A1 (fr) * 2010-03-26 2011-09-29 Osram Gesellschaft mit beschränkter Haftung Lampe à décharge à barrière diélectrique avec disque de retenue

Also Published As

Publication number Publication date
JPH06209131A (ja) 1994-07-26
CA2099073C (fr) 1999-03-02
DE4222130C2 (de) 1995-12-14
US5432398A (en) 1995-07-11
CA2099073A1 (fr) 1994-01-07
JP2771428B2 (ja) 1998-07-02
EP0578953B1 (fr) 1997-09-17
DE4222130A1 (de) 1994-01-13

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