EP0367303A1 - Thermischer Tintenstrahldruckkopf - Google Patents
Thermischer Tintenstrahldruckkopf Download PDFInfo
- Publication number
- EP0367303A1 EP0367303A1 EP89123606A EP89123606A EP0367303A1 EP 0367303 A1 EP0367303 A1 EP 0367303A1 EP 89123606 A EP89123606 A EP 89123606A EP 89123606 A EP89123606 A EP 89123606A EP 0367303 A1 EP0367303 A1 EP 0367303A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- opening
- layer
- nozzle
- barrier layer
- orifice
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000000034 method Methods 0.000 claims abstract description 36
- 239000000758 substrate Substances 0.000 claims abstract description 22
- 230000004888 barrier function Effects 0.000 claims description 13
- 238000007747 plating Methods 0.000 claims description 12
- 229910052751 metal Inorganic materials 0.000 claims description 6
- 239000002184 metal Substances 0.000 claims description 6
- 239000010409 thin film Substances 0.000 claims 8
- 238000007641 inkjet printing Methods 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 abstract description 18
- 238000004519 manufacturing process Methods 0.000 abstract description 9
- 230000006378 damage Effects 0.000 abstract description 2
- 230000008021 deposition Effects 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 35
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 18
- 229910052759 nickel Inorganic materials 0.000 description 9
- 239000000126 substance Substances 0.000 description 9
- 238000007639 printing Methods 0.000 description 6
- 239000011241 protective layer Substances 0.000 description 5
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 4
- 238000009713 electroplating Methods 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 239000000872 buffer Substances 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 239000003989 dielectric material Substances 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 2
- 238000004518 low pressure chemical vapour deposition Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000000049 pigment Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- RVSGESPTHDDNTH-UHFFFAOYSA-N alumane;tantalum Chemical compound [AlH3].[Ta] RVSGESPTHDDNTH-UHFFFAOYSA-N 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000003631 wet chemical etching Methods 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
Images
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1642—Manufacturing processes thin film formation thin film formation by CVD [chemical vapor deposition]
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/14016—Structure of bubble jet print heads
- B41J2/14088—Structure of heating means
- B41J2/14112—Resistive element
- B41J2/1412—Shape
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/14016—Structure of bubble jet print heads
- B41J2/14088—Structure of heating means
- B41J2/14112—Resistive element
- B41J2/14129—Layer structure
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/14016—Structure of bubble jet print heads
- B41J2/14145—Structure of the manifold
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1601—Production of bubble jet print heads
- B41J2/1603—Production of bubble jet print heads of the front shooter type
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1626—Manufacturing processes etching
- B41J2/1629—Manufacturing processes etching wet etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1631—Manufacturing processes photolithography
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1632—Manufacturing processes machining
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1637—Manufacturing processes molding
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1643—Manufacturing processes thin film formation thin film formation by plating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1646—Manufacturing processes thin film formation thin film formation by sputtering
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2202/00—Embodiments of or processes related to ink-jet or thermal heads
- B41J2202/01—Embodiments of or processes related to ink-jet heads
- B41J2202/03—Specific materials used
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2202/00—Embodiments of or processes related to ink-jet or thermal heads
- B41J2202/01—Embodiments of or processes related to ink-jet heads
- B41J2202/11—Embodiments of or processes related to ink-jet heads characterised by specific geometrical characteristics
Definitions
- This invention concerns thermal ink jet (TIJ) printheads, and to methods for their manufacture.
- TIJ thermal ink jet
- TIJ printheads employ a liquid ink in a reservoir or well, the ink being fed via passages to a series of nozzles defined by a nozzle plate. Within each nozzle is a resistive heater which is independently energizable to evaporate the ink which emerges from the nozzle under pressure.
- Difficulties which arise with known printheads include detachment or misalignment of the nozzle plate which has been glued in place after formation of the heater and the structure of the well and passages; restricted ink flow through the passages, thus slowing the rate of printing; and unrealiability due to destruction of the resistive heater by the flow of ink and the cavitation forces of the expelled vapour.
- US Patent No. 4438191 proposes a new form of TIJ printhead which is an improvement on previous printheads.
- the fabrication of this device presents additional problems: formation of ink holes, removal of dry film residue from the firing chambers and other locations, proper alignment of the nozzle, and various manufacturing problems.
- the nozzles of the monolithic printhead do not diverge.
- the present invention aims to reduce or avoid some or all the disadvantages mentioned above.
- a monolithic ink jet printhead for ejecting a substance comprising a nozzle enclosing a heating chamber, means for storing the substance contiguous with the heating chamber, and a heating element for propelling the substance through the nozzle, characterised in that means is provided for flexibly supporting the heating element within the flow of the substance.
- a monolithic printhead has the advantages of lower cost and increased precision.
- An advantage of placing the heating element within the flow of the substance is that the substance (e.g. ink) buffers the heating element from cavitation forces that result from collapsing bubbles. These cavitation forces could otherwise destroy the heating element. Additionally, the supporting means can flex and absorb energy from the collapsing bubbles that would otherwise be absorbed by the heating element.
- the storing means is brought directly adjacent the nozzle, and there is then no restriction on the rate of ink flow which permits an increased printing speed.
- the nozzle and heating element are formed integrally on a substrate by deposition techniques. This ensures automatic alignment of the nozzle, and means the nozzle plate cannot be detached.
- a method of producing a monolithic ink jet printhead comprising the steps of: using integrated circuit techniques to construct in a first part of a substrate a means for supporting a heating element, using integrated circuit techniques to form in a second part of the substrate a means for storing ink that is contiguous with the supporting means, using integrated circuit techniques to form a heating element on the supporting means, and using integrated circuit techniques to form nozzle on the substrate and over the heating element.
- FIG. 1 A prior-art thermal ink jet printhead 2 is shown in Figure 1.
- the advancement of thermal ink jet technology falls upon an assembly problem: detachment of the nozzle plate 1.
- each nozzle plate 1 is individually attached with epoxy to the resistor structure 3 as shown in Figure 2A.
- This costly procedure is problem-prone. For example, this procedure often misaligns the nozzle plate 1.
- Figure 2A a simplified representation of the prior art, omits many of the details.
- the differences in thermal expansion coefficients among different components of the printhead 2 tend to debond the nozzle plate 1 during the curing process of the glue. This adhesion problem limits the number of nozzles in the printhead 2.
- prior-art TIJ print head 2 presents another problem. It limits the printing speed.
- ink reaches the nozzle 6 after travelling through high friction channels 7 which restrict the ink flow.
- a monolithic thermal ink jet printhead is proposed.
- This monolithic structure makes page-width array thermal ink jet printheads possible.
- the monolithic structure can be manufactured by standard integrated circuit and printed circuit processing techniques.
- a nickel-plating process constructs a nozzle on top of resistors, thereby eliminating adhesion and alignment problems.
- a rigid substrate supports a flexible cantilever beam upon which the resistors are constructed.
- the monolithic printhead allows a smoother ink supply since the ink is fed directly from the backside past the resistor from a well in the thickness of the rigid substrate.
- the orifice structure is constructed by a self-aligned, two-step plating process which results in compound bore shape nozzles.
- Figure 3 shows a cross-section of the preferred embodiment of the invention, a monolithic thermal ink jet printhead with integrated nozzle 19 and ink well 11.
- Figure 4 shows a top view of the monolithic printhead 20.
- a well 11 Within the thickness of the substrate 10 a well 11 resides to hold ink.
- the gaseous ink (water vapour, glycol, and ink pigment particles) migrates to the nozzle area 17.
- the compound bore nozzle 19 directs the gaseous ink as it is expelled from the nozzle area 17 by pressure from the accumulated gaseous ink.
- a thermal barrier, layer 21, prevents heat from flowing to nickel cantilever beams 12 which form part of the nickel deposit 40.
- the beams 12 are formed by apertures which communicate between wall 11 and nozzle 17. Because of layer 21 heat from the resistive layer 15 heats the ink and is not wasted on the printhead 20.
- a patterned conducting layer 23 shorts out the resistive layer 15 except on the cantilever beams 12.
- a protective layer 25 prevents electrical shorts during the nickel plating process to form the nozzle 19. The protective layer 25 also protects layers from chemical and mechanical wear.
- a conducting layer 27 is deposited during the manufacturing process to provide a surface upon which the nozzle 19 can be constructed.
- Advantages of the present invention include the automatically-aligned nozzle 19, shown in Figure 3.
- Prior-art processes misalign the nozzle plate 1 shown in Figure 1. This misalignment causes dot spread and slanted printing.
- the new monolithic TIJ printhead 20 reduces resistor failure.
- prior-art TIJ printheads shown in Figure 1 the collapsing bubble and refilling ink impact the resistor surface. The cavitation force eventually destroys the resistor.
- the collapsing bubble collides with the refilling ink. The ink absorbs most of the cavitation forces.
- the cantilever beams constructed from ductile nickel, lie in a reservoir of ink. The mechanical forces on resistors will be buffered by the flexibility of the cantilever beams as well as the ink itself.
- printing speed is not limited by the ink refilling rate.
- the ink well 11 is directly connected to the heating elements 15 as shown in Figure 3. This direct connection reduces resistance to ink flow.
- printing speed is not limited by the ink refilling rate.
- Figures 5 to 7 illustrate the process to manufacture monolithic thermal ink jet printheads 20 and involves several steps.
- a conducting, layer 30 approximately 1000 A is deposited using a sputter deposition technique. By conducting electricity through the conducting layer 30, a surface is formed to which nickel plating can be attached.
- a dry film mask 32 is laminated on the conducting layer 30 as shown in Figure 5B.
- This mask 32 having a diameter of 50.8 to 76.2 ⁇ m (2 to 3 mils), defines the location of the cantilever beams 12 in Figure 3 as well as 13 in Figure 8.
- Figure 5C shows the various shapes a mask 32 can have.
- Mask 38 corresponds to the printhead 20 shown in Figure 4.
- Mask 34 corresponds to printhead 60 shown in Figure 9.
- an electroplating process deposits a nickel layer 40 from 25.4 to 38.1 um (1 to 1.5 mils) thick onto the exposed substrate 10.
- cantilever beams 12 are formed.
- removal of the dry film mask 38 exposes the cantilever beams 12 shown in Figure 6B.
- the well 11 is formed through a multi-step process.
- a sputtering process deposits a protective metal layer 42. This layer is made of gold and has a thickness of 1000 ⁇ .
- a mask 44 defines the well 11.
- a wet chemical etching process such as KOH for silicon or HF for glass, forms the well 11.
- the protective layer 42 and the mask layer 44 are removed, the device appears as shown in Figure 6C.
- the thermal insulation layer 21 encourages the efficient operation of the resistor layer 15.
- a resistive layer 15 made of a material such as tantalum-aluminium is deposited to a thickness of 1000 ⁇ to 3000 ⁇ , as shown in Figure 3.
- a conducting layer 23 made of gold or aluminium to a thickness of 5000 ⁇ is selectively patterned on resistive layer 15 to short out portions of the resistive layer 15.
- the conducting layer 23 is not present on the cantilever beam 12 so that the resistive layer 15 is operative there.
- a protective layer 25 made of Si Carbide (SiC) and Si3N4 or other dielectric material is deposited using an LPCVD process. This layer protects the device from chemical and mechanical wear.
- the conducting layer 27 provides a surface upon which the nozzle 19 can be formed with an electroplating process.
- portions of the conducting layer 27 are etched away through a wet-etching process, so that the only conducting layer 27 remaining is located where the nozzle will be constructed.
- donut-shaped dry film blocks 52 are laminated onto the conducting layer 27. These blocks 52 form a frame for the construction of the nozzle 19.
- the nozzle 19 is constructed in a two-step plating process. The results of the first step are shown in Figure 7A.
- the base of nozzle 19 is formed by electroplating nickel onto the conducting layer 27 to a thickness of 38.1 to 5.08 ⁇ m (1.5 mil to 2.0 mil), which equals the height of the nozzle 19.
- a glass slab or any other flat dielectric material 56 is pressed on the nozzle 19 as shown in Figure 7B. This slab 56 acts as a nozzle 19 mould for the second part of the nickel plating process.
- Figure 7C the electroplating process is continued to form the nozzle 19. Now that the nozzle is completed, the slab 56 is removed.
- the resulting product is the printhead 20 shown in Figure 3.
- the nozzle 19 could be constructed by a one-step plating process without the use of the slab 56.
- Figures 8 and 9 show an alternative embodiment of the printhead 20.
- a nozzle 19 having this shape is called a compound-bore nozzle 19. It controls the stream of ink ejected from the nozzle 19.
- the ink stream ejected from a compound-bore nozzle has a narrow diameter and minimum spread.
- the cantilever beams 13 protrude inward and the heating element 15 rests on top of the cantilever beam 13.
- This embodiment of the printhead 20 would be formed in the same way as the printhead 20 shown in Figure 3.
- the primary difference in the process would be in the type of mask 32 used when layer 40 is plated onto substrate 10.
- a mask similar to mask 34 or 36 is used.
- the printhead ejects ink.
- This ink contains water, glycol, and pigment particles. However, it can be used to eject other substances.
- the present invention a monolithic thermal ink jet printhead with integrated nozzle and ink well and a process for making it, solves the nozzle attachment and ink flow problems of prior-art printheads mentioned above. Also, the present invention reduces manufacturing costs and improves reliability. The reduced manufacturing costs are partially achieved through an automated manufacturing procedure. The increased reliability is partially achieved through longer resistor life and smoother ink flow in the printhead. With these improvements, page-width TIJ print arrays are possible.
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US85674086A | 1986-04-28 | 1986-04-28 | |
US856740 | 1986-04-28 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP87303785.7 Division | 1987-04-28 |
Publications (1)
Publication Number | Publication Date |
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EP0367303A1 true EP0367303A1 (de) | 1990-05-09 |
Family
ID=25324393
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP89123606A Withdrawn EP0367303A1 (de) | 1986-04-28 | 1987-04-28 | Thermischer Tintenstrahldruckkopf |
EP19870303785 Expired EP0244214B1 (de) | 1986-04-28 | 1987-04-28 | Thermischer Tintenstrahldruckkopf |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP19870303785 Expired EP0244214B1 (de) | 1986-04-28 | 1987-04-28 | Thermischer Tintenstrahldruckkopf |
Country Status (3)
Country | Link |
---|---|
EP (2) | EP0367303A1 (de) |
JP (2) | JP2635043B2 (de) |
DE (1) | DE3771269D1 (de) |
Cited By (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1991017891A1 (de) * | 1990-05-21 | 1991-11-28 | Mannesmann Ag | Tintenschreibkopf für eine nach dem thermalwandlerprinzip arbeitende flüssigkeitsstrahlaufzeichnungsvorrichtung und verfahren zu seiner herstellung |
GB2267254A (en) * | 1992-04-28 | 1993-12-01 | Inkjet Systems Gmbh Co Kg | Structure of single-integrated-chip ink-jet print head. |
EP0594310A2 (de) * | 1992-10-23 | 1994-04-27 | Hewlett-Packard Company | Farbstrahldruckkopf und Verfahren seiner Herstellung |
EP0742102A2 (de) * | 1995-05-12 | 1996-11-13 | Lexmark International, Inc. | Druckkopf und Verfahren zu seiner Herstellung durch einstufiges Spritzgiessen |
US6508546B2 (en) | 1998-10-16 | 2003-01-21 | Silverbrook Research Pty Ltd | Ink supply arrangement for a portable ink jet printer |
WO2004048109A1 (en) * | 2002-11-23 | 2004-06-10 | Silverbrook Research Pty Ltd | Thermal ink jet printhead with symmetric bubble formation |
US6805435B2 (en) | 1998-10-16 | 2004-10-19 | Silverbrook Research Pty Ltd | Printhead assembly with an ink distribution arrangement |
EP1567353A1 (de) * | 2002-11-23 | 2005-08-31 | Silverbrook Research Pty. Limited | Thermotintenstrahldruckkopfmit kavitationsspalt |
EP1567350A1 (de) * | 2002-11-23 | 2005-08-31 | Silverbrook Research Pty. Limited | Thermotintenstrahlmit durch cvd hergestellter düsenplatte |
US7281782B2 (en) | 2002-11-23 | 2007-10-16 | Silverbrook Research Pty Ltd | Thermal ink jet with thin nozzle plate |
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Also Published As
Publication number | Publication date |
---|---|
DE3771269D1 (de) | 1991-08-14 |
JPH08230192A (ja) | 1996-09-10 |
JPS62259864A (ja) | 1987-11-12 |
JP2716418B2 (ja) | 1998-02-18 |
EP0244214A1 (de) | 1987-11-04 |
JP2635043B2 (ja) | 1997-07-30 |
EP0244214B1 (de) | 1991-07-10 |
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