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EP0156622B1 - Ionenflussmodulator - Google Patents

Ionenflussmodulator Download PDF

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Publication number
EP0156622B1
EP0156622B1 EP19850301919 EP85301919A EP0156622B1 EP 0156622 B1 EP0156622 B1 EP 0156622B1 EP 19850301919 EP19850301919 EP 19850301919 EP 85301919 A EP85301919 A EP 85301919A EP 0156622 B1 EP0156622 B1 EP 0156622B1
Authority
EP
European Patent Office
Prior art keywords
ion flow
insulating substrate
layer
control electrodes
electrodes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
EP19850301919
Other languages
English (en)
French (fr)
Other versions
EP0156622A2 (de
EP0156622A3 (en
Inventor
Sakae C/O Patent Division Tamura
Masahiro C/O Patent Division Hosoya
Takeshi C/O Patent Division Matsuo
Tsutomu C/O Patent Division Uehara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP5503884A external-priority patent/JPS60198559A/ja
Priority claimed from JP59062702A external-priority patent/JPH0679858B2/ja
Application filed by Toshiba Corp filed Critical Toshiba Corp
Publication of EP0156622A2 publication Critical patent/EP0156622A2/de
Publication of EP0156622A3 publication Critical patent/EP0156622A3/en
Application granted granted Critical
Publication of EP0156622B1 publication Critical patent/EP0156622B1/de
Expired legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G15/00—Apparatus for electrographic processes using a charge pattern
    • G03G15/05—Apparatus for electrographic processes using a charge pattern for imagewise charging, e.g. photoconductive control screen, optically activated charging means

Definitions

  • the present invention relates to an ion flow modulator.used in a photocopying machine.
  • Photocopying machines with an ion flow modulator have been conventionally proposed.
  • the principle of operation of a photocopying machine of this type is given as follows.
  • Light irradiates a document, and light (document image) reflected by the document is guided by an optical system to a photoconductive layer of an ion flow modulator to be described in detail later.
  • the ion flow modulator has an array of a plurality of holes so as to cause ions to flow therethrough. More specifically, ions flow through the respective holes in accordance with intensities of light components irradiating the respective portions of the photoconductive layer.
  • the ions passing through the holes charge a dielectric drum, thereby forming an electrostatic latent image corresponding to the document image. Toner is attracted to the latent image on the dielectric drum, and a toner image is transferred to a copy sheet, thus completing a copying cycle.
  • FIG. 1 An illustrative representation of a conventional ion flow modulator (Japanese Patent Disclosure No. 56-35150) is shown in Fig. 1.
  • Rectangular ion flow control electrodes 12 are formed on an insulating substrate 10 parallel to each other.
  • Ion flow passage holes 14 are formed near end portions of the control electrodes 12, in the substrate 10 and in a common electrode 24 to be described later.
  • a common photoconductive layer 16 is formed on the respective control electrodes 12,. and a transparent electrode 18 is formed on the layer 16.
  • a single resistance layer 20 common to the respective holes 14 of the control electrodes is formed at the other end portions of the control electrodes 12.
  • a transparent electrode 22 is formed on the layer 20.
  • a common electrode 24 is formed on the lower surface of the substrate 10.
  • Power sources 26 and 28 are connected to the electrodes 18 and 22 to apply positive and negative voltages to the layers 16 and 20, respectively. These power sources are also connected to the electrode 24.
  • a corona charger 30 as a means for generating an ion flow is arranged under the holes 14.
  • the charger 30 comprises a corona discharge electrode 32 and a shield electrode 34.
  • the electrode 32 is connected to a DC power source 36.
  • the number of ions flowing through the holes 14 is controlled by potentials of the electrodes 12 having the holes 14. More particularly, when ions generated from the corona discharge electrode are positive ions, the number of the ions flowing through the holes 14 is decreased by the positive potentials of the electrodes 12, and is increased by the negative potentials. In this manner, the latent image corresponding to the potentials at the electrodes 12 is formed on the dielectric drum (not shown).
  • the resistance of the photoconductive layer 16 is larger than that of the resistance layer 20, so that the potentials of the electrodes 12 are negative under the control of the power source 28 and the number of ions flowing through the holes is increased.
  • the resistance of the photoconductive layer 16 is decreased, and the potentials at the control electrodes 12 are controlled by the power source 26, thereby decreasing the number of ions passing through the holes. In this manner, the number of ions passing through control electrodes which receive light is small, but the number of ions flowing through control electrodes which do not receive light is large. Therefore, the latent image corresponding to the optical pattern obtained by the layer 16 is formed on the dielectric drum.
  • the above-described conventional ion flow modulator has the following problems.
  • a stripe pattern is often formed on the copied image, or linear omission of the resultant image tends to occur. These events are based upon variations in thickness of the photoconductive layer.
  • potential control of each control electrode is performed by utilizing the resistance of ther photoconductive layer along the direction of thickness thereof.
  • the thickness of the photoconductive layer on the respective control electrodes is nonuniform, the number of ions passing through the respective holes vary even if light uniformly irradiates the photoconductive layer, thereby degrading the copied image quality.
  • an ion flow modulator comprising: an insulating substrate; a common electrode formed on one major surface of said insulating substrate; a plurality of ion flow control electrodes formed on the other major surface of said insulating substrate, each of said plurality of ion flow control electrodes being provided with one ion flow passage hole, said ion flow passage hole being formed through said insulating substrate and said common electrode; means for generating ions passing through said ion flow passage hole; a photoconductive layer formed on said insulating substrate; a first voltage application electrode connected to said photoconductive layer; a resistance layer formed on said insulating substrate; a second voltage application electrode connected to said resistance layer; and a DC power source, connected to said common electrode, for applying voltages having different polarities to said first and second voltage application electrodes, characterised in that said first and second voltage application electrodes are formed on said insulating substrate, that the photoconductive layer is connected to one end of each of said plurality of ion flow control
  • an ion flow modulator comprising: an insulating substrate; a common electrode formed on one major surface of said insulating substrate; a plurality of ion flow control electrodes formed on the other major surface of said insulating substrate, each of said plurality of ion flow control electrodes being provided with one ion flow passage hole, said ion flow passage holes being formed through said insulating substrate and said common electrode; means for generating ions passing through said ion flow passage hole; a photoconductive layer formed on said insulating substrate and connected to a first voltage application electrode, a resistance layer formed on said insulating substrate and connected to a second voltage application electrode and a DC power source, connected to said common electrode, for applying voltages having different polarities to said first and second voltage application electrodes, characterised by said holes being formed in a staggered manner, a plurality of photoconductive layers which are formed on said insulating substrate and each of which is connected to one end of a corresponding one of said plurality
  • an ion flow modulator wherein the number of ions flowing through respective ion flow passage holes will not vary and stripe pattern and linear omission can be eliminated from the copied image when uniform light irradiates photoconductive layer, a copy function will not be impaired even if pinholes are formed in the photoconductive layer, and a high- sensitivity image can be obtained.
  • the resistance of the photoconductive layer along the planar direction thereof is utilised to control potentials at the control electrodes. For this reason, even if the thickness of the photoconductive layer varies, no influence is imposed on the potential control of the control electrodes.
  • the two-dimensional size of the photoconductive layer can be controlled with high precision, so that the number of ions passing through the holes will not vary.
  • the potential control of the control electrodes is performed by utilizing the planar direction of the photoconductive layer, the potentials at the control electrodes will not change even if pinholes are formed in the photoconductive layer along the direction of thickness thereof. Furthermore, light directly irradiates the photoconductive layer, thereby providing good sensitivity.
  • An ion flow modulator according to an embodiment of the present invention is illustrated in Fig. 2.
  • An ion flow modulator 37 includes an insulating substrate 38. Any material which has good insulating properties and which can be subjected to deposition of a metal such as gold or suitable plating material can be used as the substrate.
  • the substrate 38 may be a polyimide film having a thickness of 20 to 100 pm.
  • a common electrode 42 is formed on the lower surface of the substrate 38.
  • the electrode 42 may be, for example, a gold deposition film having a thickness of 100 nm to 1 Ilm.
  • Ion flow control electrodes 40 are formed on the substrate 38 and are parallel to each other.
  • Each electrode 40 may be, for example, a gold deposition film having a thickness of 100 nm to 1 itm.
  • the electrode 40 has a width (i.e., a length along a direction perpendicular to the longitudinal direction thereof) of approximately 30 to 70 pm. The distance between every two adjacent electrodes 40 is approximately 30 to 60 pm.
  • the electrode 40 may be formed of another non-rusting metal such as nickel.
  • Ion flow passage holes 44 extend through the substrate 38 and the electrode 42 and are aligned linearly. Each hole 44 is formed near one end of a corresponding one of the electrodes 40. Usually, each hole 44 has a diameter of 20 11m to 200 11 m.
  • a photoconductive layer 46 is formed on the substrate 38 and is connected to one end of each electrode 44.
  • a photoconductive material is known in the field of electrophotography and includes, for example, amorphous hydrogen silicide and a selenium compound.
  • an organic photoconductive material such as a phthalocyanine compound can be used in place of the above photoconductive material.
  • the photoconductive layer 46 preferably has a thickness of 1 to 2 um.
  • a first voltage application electrode 48 is formed on the substrate 38 and is connected to an end of the layer 46 which opposes the end overlapping the electrodes 40.
  • the electrode 48 serves to apply a positive voltage to the layer 46.
  • the end of the layer 46 which is located at the side of the electrode 48 overlaps the corresponding end of the electrode 48.
  • a first DC power source 49 is connected to the electrode 48 to apply a positive voltage thereto.
  • a resistance layer 50 is formed on the substrate 38 at the other end of each electrode 40.
  • the resistance layer 50 is connected to each control electrode.
  • the resistance layer 50 may be made of Si 3 N 4 .
  • a second voltage application electrode 52 is formed on the substrate 38 and is connected to the layer 50.
  • the electrode 52 serves to apply a voltage to the layer 50.
  • the two ends of the layer 50 overlap the corresponding ends of the electrodes 40 and 52, respectively.
  • a second DC power source 54 is connected to the electrode 52 so as to apply a negative voltage thereto.
  • Means 56 for generating ions passing through the holes 44 is arranged thereunder.
  • the ion generating means 56 has the same arrangement as that of the conventional ion flow modulator.
  • the means 56 usually comprises a corona discharge electrode 58 and a shield electrode 60.
  • a high-voltage source 62 is connected to the electrode 58.
  • a document image to be copied is guided by a conventional optical system to the photoconductive layer 46.
  • the photoconductive material has a large resistance when it does not receive light. However, the photoconductive material has a small resistance when it receives light. In the layer 46, the portion which actually receives light has a small resistance, but the portion which does not receive light has as large a resistance as usual.
  • the potential at the electrode 40 connected to the portion of the layer 46 which receives light is positive due to the potential at the electrode 48 since the portion has a small resistance.
  • the electrode 40 connected to the portion of the layer 46 which does not receive light is set at the negative potential under the control of the electrode 52 through the layer 50 since this portion has the large resistance.
  • the electrode 40 connected to the portion of the photoconductive layer 46 which receives light is set at a positive potential
  • the electrode 40 connected to the portion which does not receive light is set at a negative potential.
  • a positive voltage is applied to the electrode 48
  • positive ions are emitted thereform.
  • Positive ions passing through the holes 44 formed in the negatively charged electrodes 40 are attracted by the negative potentials thereof and accelerated, so that a large number of positive ions pass through the corresponding holes 44.
  • positive ions pass through the holes 44 of the positively charged electrodes 40 they are repelled by the positive potential of the holes 44, thereby decreasing the number of positive ions passing therethrough or preventing all the positive ions from passing therethrough.
  • an electromagnetic latent image corresponding to an optical pattern formed on the layer 46 i.e., corresponding to the density of the document to be copied is formed on the dielectric drum receiving the positive ions passing through the holes 44.
  • the ion flow modulator according to this embodiment can be easily manufactured by the following steps.
  • the insulating substrate 38 is prepared, and a metal such as gold is deposited on two surfaces thereof.
  • the deposited film on one surface is etched by a known photoetching technique to form the electrodes 40, the holes 44, and the electrodes 48 and 52.
  • the film deposited on the other surface is used as the common electrode 42 without modification.
  • the layers 46 and 50 are selectively deposited by the well-known CVD method on an exposed portion of the substrate 38 between the electrodes 40 and 48 and an exposed portion thereof between the electrodes 40 and 52.
  • the above individual steps are known to those who are skilled in the art, and a detailed description thereof will be omitted.
  • FIG. 3 Another preferable embodiment is illustrated in Fig. 3.
  • An ion flow modulator of Fig. 3 is substantially the same as that of Fig. 2, and the same parts as in Fig. 3 denote the same parts as in Fig. 2.
  • ion flow passage holes 44 are formed in a staggered manner.
  • Photoconductive layers.46 are formed on ion flow control electrodes 40.
  • the layers 46 are also staggered in the same manner as the holes 44.
  • the diameter of each hole 44 is larger than the width of each electrode 40.
  • the width of the electrodes 40 is approximately 70 pm, and the distance between every two adjacent holes is 30 pm.
  • the width and length of each layer 46 are 80 I lm .
  • the holes 44 are dense, and a high quality image can be obtained. The reason will be described with reference to Figs. 4 and 5.
  • Figs. 4 and 5 show enlarged images obtained when a single straight line extending along the holes is copied using photocopying machines having holes aligned in line and in a staggered manner, together with the corresponding arrangements of holes.
  • the straight line is divided into dashes since a gap is present between every two adjacent holes 44.
  • the modulator having the holes 44 aligned in a staggered manner is used, as shown in Fig. 5, the straight line will not be divided into dashes but is given as a continuous line along the alignment direction of the holes 44 since no gap is present between evry two adjacent holes.
  • the two sides of the straight line region are indented in correspondence with the staggered pattern of the holes 44, when the zigzag pattern of the holes 44 is made as straight as possible without forming a gap between every two adjacent holes 44, the indenta- t ion pattern cannot be visually perceived by the naked eye. In this manner, when the holes 44 are staggered, a continuous high-quality image can be obtained.
  • the ion flow modulator of the present invention can be manufactured in the same manner as in the conventional ion flow modulator.
  • Fig. 8 schematically shows a photocopying machine in which the ion flow modulator of the present invention is applied
  • Fig. 9 is an enlarged view showing the main part thererof.
  • some of the light components from a light source 64 are reflected by a document placed on a document table 66 and are guide'd to the ion flow modulator 37 through a light transmission mechanism constituted by a self-focusing lens array 67.
  • the modulator 37 comprises an equal-size copy mode ion flow modulation unit 37-1, an enlargement copy mode ion flow modulation unit 37-2 and a reduction copy mode ion flow modulation unit 37-3 which are arranged to form a cylinder.
  • one of the units 37-1, 37-2 and 37-3 is selected by a pivot mechanism (not shown).
  • Ion flow passage holes 44 of the ion flow modulation units are represented by reference numerals 44-1, 44-2 and 44-3.
  • the photoconductive layers 46 of the respective units are represented by reference numerals 46-1, 46-2 and 46-3.
  • Fig. 9 shows an example wherein the unit 37-1 is used.
  • the layer 46-1 opposes the focusing lens array 67, and the hole 44 oppose a dielectric drum 68 for forming a latent image thereon.
  • a corona charger 70 is arranged to negatively charge the dielectric drum 68.
  • the dielectric drum 68 is rotated in synchronism with movement of the document table 66.
  • Positive ions emitted from the ion generating means 56 and selectively supplied from the electrodes 40 so as to correspond to the density of the document are captured by the dielectric drum 68 through the corresponding holes 44.
  • a latent image is formed on the dielectric drum according to the density of the document.
  • Toner is supplied from a toner hopper 72 and is attracted to the latent image on the dielectric drum.
  • a visible image or toner image is transferred to a sheet 78 fed from a paper feed mechanism 76 to a transfer section 74.
  • the transferred image is then fixed by a fixing mechanism 80 by means of pressure or heat.
  • the residual toner particles on the dielectric drum 68 are removed by a cleaner 82.
  • the resultant image obtained by this photocopying machine is very precise since the machine incorporates an ion flow modulator having a specific structure.
  • enlargement and reduction copy modes can be easily selected although these modes hitherto have not been able to be set by using the self-focusing lens array.
  • a speed i.e., the moving speed of the document table 66 in Fig. 8 representing relative movement between the photoconductive layer and the document
  • a speed i.e., the rotational speed of the dielectric drum in Fig. 8 representing relative movement between the holes and the dielectric drum
  • the photocopying machine incorporating the ion flow modulator of the present invention need have only a structure wherein light components excluding light components transmitted and reflected from the object are not incident on the photoconductive layer. In this sense, the developing mechanism need not be situated in a dark place, thereby simplifying the modulator arrangement.
  • the holes 44 can be staggered in three rows.
  • photoconductive layers 46 need not be provided for each electrode 40.
  • a continuous photoconductive layer 46 can be formed to cover the disconnected portions of the electrodes 40 in units of rows of the electrodes 40.
  • the ion flow modulator shown in Fig. 2 was manufactured by the following steps. Nickel was plated on two surfaces of a polyamide film to a thickness of 1 pm. The polyamide film had a thickness of 100 pm. Thereafter, the gold film on one surface was etched to form the electrodes 40, 48 and 52. The nickel film on the other surface was not etched to constitute the common electrode 42.
  • the photoconductive amorphous silicon layer 46 was formed by a combination of a well-known CVD (Chemical Vapor Deposition) method and selective etching. Each of the electrodes 40 and the layer 46 had a width of 0.1 mm, and the layer 46 had a thickness of 1 pm.
  • the holes 44 each having a diameter of 80 ⁇ m were formed by a laser beam and extended from the electrodes 40 to the film 38 and to the common electrode 42. Machining was performed such that the distance between every two adjacent holes 44 was 0.15 mm.
  • the dielectric breakdown voltage of the normal photoconductive material is about 100,000 V/cm, so that the thickness of the photoconductive layer must be several ten um.
  • the ion flow modulator shown in Fig. 3 was manufactured by the following steps. Nickel was plated on two surfaces of a polyamide film to a thickness of 1 ⁇ m. The polyamide film had a thickness of 50 pm. The nickel film on one surface was etched to form the electrodes 40, 48 and 52, as shown in Fig. 3. The nickel film on the other surface was not etched, thereby constituting the common electrode 42. Each electrode 40 had a width of approximately 20 pm. Each hole 44 had a diameter of approximately 100 pm. Amorphous hydrogen silicide films were deposited by plasma CVD to form the layers 46 each having a size of 80 pm x 80 pm. Amorphous silicon was used to form the resistance layer 50 in the same step as in formation of the layers 46. The layer was adhered with a black insulating tape to shield it from light.
  • a dark resistance of each layer 46 of the resultant ion flow modulator was approximately 10 M ⁇ .
  • a dark resistance between the electrodes 48 and 40 was approximately 10 MQ.
  • the photocopying machine shown in Fig. 8 was prepared. Voltages of +100 V and -200 V with respect to the potential at the common electrode 42 were applied to the electrodes 48 and 52. A voltage of -1,000 V with respect to the ground potential was applied to the common electrode 42. A voltage of +7 KV was applied to the electrode 58, thereby performing image exposure. As a result, a high quality image was obtained.
  • the enlargement and reduction copy mode ion flow modulation units were prepared in the same manner as in Example 2.
  • every three layers 46 were formed to constitute an equilateral triangle whose side had a length of 200 pm.
  • the holes 44 were formed to constitute an equilateral triangle with a side of 200 x 1.414 ⁇ m.
  • Each hole 44 had a diameter of approximately 140 pm which was larger than that of Example 2.
  • one side of the equilateral triangle constituted by the holes 44 had a length of 200 um
  • one side of the equilateral triangle constituted by the layers 46 had a length of 200 x 1.414 11 m.
  • a high quality image was obtained by the photocopying machine using these ion flow modulation units.
  • a photocopying machine was prepared in the same manner as in Example 3, except that a phthalocyanine or perylene pigment was used to constitute the layers 46.
  • a high quality image was obtained in the same manner as Example 2 when either pigment was used.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Printers Or Recording Devices Using Electromagnetic And Radiation Means (AREA)
  • Electrophotography Using Other Than Carlson'S Method (AREA)

Claims (8)

1. lonenflußmodulator, umfassend
ein isolierendes Substrat (38),
eine auf der einen Hauptfläche des isolierenden Substrats ausgebildete Sammelelektrode (42),
mehrere auf der anderen Hauptfläche des isolierenden Substrats ausgebildete lonenflußsteuerelektroden (40), die jeweils mit einer lonenfluß-Durchlaßöffnung (44) versehen sind, welche ihrerseits durch das isolierende Substrat (38) und die Sammelelektrode (42) hindurch ausgebildet ist,
ein Einrichtung (58, 60) zum Erzeugen von die lonenfluß-Durchlaßöffnung passierenden lonen,
eine auf dem isolierenden Substrat ausgebildete photoleitende Schicht (46),
eine mit der photoleitenden Schicht verbundene erste Spannungsanlegungselektrode (48), eine auf dem isolierenden Substrat erzeugte Widerstandsschicht (50),
eine mit der Widerstandsschicht verbundene zweite Spannungsanlegungselektrode (52) und
eine an die Sammelelektrode angeschlossene Gleichstromquelle (49, 54) zum Anlegen von Splannungen unterschiedlicher Polaritäten an die ersten und (bzw.) zweiten Spannungsanlegungselektroden (48, 52), dadurch gekennzeichnet, daß die ersten und zweiten Spannungsanlegungselektroden auf dem isolierenden Substrat ausgebildet sind, daß die photoleitende Schicht (46) mit einem Ende jeder der mehreren lonenflußsteuerelektroden (40) verbunden ist und die Widerstandsschicht (50) mit dem anderen Ende jeder der mehreren lonenflußsteuerelektroden (40) so verbunden ist, daß die lonenflußsteuerelektroden zwischen die Widerstandsschicht und die photoleitende Schicht eingefügt sind.
2. lonenflußmodulator nach Anspruch 1, dadurch gekennzeichnet, daß die photoleitende Schicht (46) eine einzelne, gemeinsam mit den mehreren lonenflußsteuerelektroden (40) verbundene photoleitende Schicht ist.
3. lonenflußmodulator nach Anspruch 1, dadurch gekennzeichnet, daß die Widerstandsschicht (50) eine einzelne, gemeinsam mit den mehreren lonenflußsteuerelektroden verbundene Widerstandsschicht ist.
4. lonenflußmodulator, umfassend
ein isilierendes Substrat (38),
eine auf der einen Hauptfläche des isolierenden Substrats ausgebildete Sammelelektrode (42), mehrere auf der anderen Hauptfläche des isolierenden Substrats ausgebildete lonenflußsteuerelektroden (40), die jeweils mit einer lonenfluß-Durchlaßöffnung (44) versehen sind, welche ihrerseits durch das isolierende Substrat (38) und die Sammelelektrode (42) hindurch ausgebildet ist,
eine Einrichtung (58, 60) zum Erzeugen von die lonenfluß-Durchlaßöffnung passierenden lonen,
eine auf dem isolierenden Substrat ausgebildete und mit mit einer ersten Spanungsanlegungselektrode (48) verbundene photoleitende Schicht (46), eine auf dem isolierenden Substrat ausgebildete und mit einer zweiten Spannungsanlegugselektrode (52) verbundene Widerstandsschicht (50) sowie eine an die sammelelektrode angeschlossene Gleichstromquelle (54, 49) zum Anlegen von Spannungen unterschiedlicher Polaritäten an die ersten und zweiten Spannungslegungselektroden (48, 52), dadurch gekennzeichnet, daß
die Öffnungen in einem zueinander versetzten Muster ausgebildet sind,
mehrere photoleitende Schichten (46) auf dem isolierenden Substrat ausgebildet und jeweils mit einem Ende einer betreffenden der mehreren lonenflußsteuerelektroden (40) verbunden sind, wobei die mehreren photoleitenden Schichten in einem zueinander versetzten Muster, ähnlich dem der lonenfluß-Durchlaßöffnungen, ausgerichtet sind,
die erste Spannungsanlegungselektrode (48) mit den mehreren photoleitenden Schichten verbunden ist,
die Widerstandsschicht (50) mit dem anderen Ende jeder der mehreren lonenflußsteuerelektroden zwischen der Widerstandsschicht und der photoleitenden Schicht verbunden ist,
und die zweite Spannungsanlegungselektrode (52) auf dem isolierenden Substrat ausgebildet ist.
5. lonenflußmodulator nach Anspruch 4, dadurch gekennzeichnet, daß jede der mehreren lonenflußsteuerelektroden (40) eine Rechteckform aufweist und jede der lonenfluß-Durchlaßöffnungen (44) einen Durchmesser besitzt, der größer ist als eine Breite jeder der lonenflußsteuerelektroden (40) längs einer Richtung senkrecht zu einer Längsrichtung derselben.
6. lonenflußmodulator nach Anspruch 4, dadurch gekennzeichnet, daß ein Ähnlichkeitsverhältnis eines versetzten Musters der mehreren lonenfluß-Durchlaßöffnungen (44) zu dem der mehreren photoleitenden Schichten (46) 1:1 beträgt.
7. lonenflußmodulator nach Anspruch 4, dadurch gekennzeichnet, daß ein Ähnlichkeitsverhältnis eines versetzten Musters der mehreren lonenfluß-Durchlaßöffnungen (44) zu dem der mehreren photoleitenden Schichten (46) nicht 1:1 entspricht.
8. Ionenflußmodulator nach Anspruch 4, dadurch gekennzeichnet, daß die Widerstandsschicht (50) eine einzelne Widerstandsschicht (50) ist, die gemeinsam an die mehreren lonenflußSteuerelektroden (40) ausgeschlossen ist.
EP19850301919 1984-03-22 1985-03-19 Ionenflussmodulator Expired EP0156622B1 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP5503884A JPS60198559A (ja) 1984-03-22 1984-03-22 イオン流変調装置
JP55038/84 1984-03-22
JP59062702A JPH0679858B2 (ja) 1984-03-30 1984-03-30 イオン流変調装置
JP62702/84 1984-03-30

Publications (3)

Publication Number Publication Date
EP0156622A2 EP0156622A2 (de) 1985-10-02
EP0156622A3 EP0156622A3 (en) 1985-11-13
EP0156622B1 true EP0156622B1 (de) 1988-06-01

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DE (1) DE3563130D1 (de)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4737805A (en) * 1986-09-11 1988-04-12 Xerox Corporation Multifunction ionographic marking apparatus

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3680954A (en) * 1965-04-30 1972-08-01 Eastman Kodak Co Electrography
US3623122A (en) * 1970-06-04 1971-11-23 Horizons Research Inc Electric recording apparatus employing liquid developer
DE2654563A1 (de) * 1976-12-02 1978-06-08 Battelle Institut E V Anordnung zur elektronischen erzeugung eines elektrostatischen ladungsbildes
US4155093A (en) * 1977-08-12 1979-05-15 Dennison Manufacturing Company Method and apparatus for generating charged particles

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EP0156622A2 (de) 1985-10-02
EP0156622A3 (en) 1985-11-13
DE3563130D1 (en) 1988-07-07

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