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DE69730738D1 - Verfahren zur herstellung von polysilanen - Google Patents

Verfahren zur herstellung von polysilanen

Info

Publication number
DE69730738D1
DE69730738D1 DE69730738T DE69730738T DE69730738D1 DE 69730738 D1 DE69730738 D1 DE 69730738D1 DE 69730738 T DE69730738 T DE 69730738T DE 69730738 T DE69730738 T DE 69730738T DE 69730738 D1 DE69730738 D1 DE 69730738D1
Authority
DE
Germany
Prior art keywords
producing polysilanes
polysilanes
producing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69730738T
Other languages
English (en)
Other versions
DE69730738T2 (de
Inventor
Ryoichi Nishida
Shinichi Kawasaki
Hiroaki Murase
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Osaka Gas Co Ltd
Original Assignee
Osaka Gas Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Osaka Gas Co Ltd filed Critical Osaka Gas Co Ltd
Application granted granted Critical
Publication of DE69730738D1 publication Critical patent/DE69730738D1/de
Publication of DE69730738T2 publication Critical patent/DE69730738T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/60—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which all the silicon atoms are connected by linkages other than oxygen atoms

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Silicon Polymers (AREA)
DE69730738T 1996-12-27 1997-12-26 Verfahren zur herstellung von polysilanen Expired - Lifetime DE69730738T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP35046196 1996-12-27
JP35046196 1996-12-27
PCT/JP1997/004893 WO1998029476A1 (fr) 1996-12-27 1997-12-26 Procede de preparation de polysilanes

Publications (2)

Publication Number Publication Date
DE69730738D1 true DE69730738D1 (de) 2004-10-21
DE69730738T2 DE69730738T2 (de) 2005-09-22

Family

ID=18410656

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69730738T Expired - Lifetime DE69730738T2 (de) 1996-12-27 1997-12-26 Verfahren zur herstellung von polysilanen

Country Status (7)

Country Link
US (1) US6174982B1 (de)
EP (1) EP0949289B1 (de)
JP (1) JP3496097B2 (de)
KR (1) KR100297007B1 (de)
CN (1) CN1092215C (de)
DE (1) DE69730738T2 (de)
WO (1) WO1998029476A1 (de)

Families Citing this family (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4564642B2 (ja) * 2000-10-30 2010-10-20 大阪瓦斯株式会社 ポリシラン系コポリマーの製造方法
JP4559642B2 (ja) * 2001-01-30 2010-10-13 大阪瓦斯株式会社 活性金属マグネシウム及びそれを用いたポリシランの製造方法
KR100979868B1 (ko) 2002-07-23 2010-09-02 오사까 가스 가부시키가이샤 전자 사진 감광체 및 이것을 사용한 전자 사진 장치
JP4542758B2 (ja) * 2003-07-17 2010-09-15 大阪瓦斯株式会社 コポリシランとその製造方法
DE102004038145A1 (de) 2004-08-05 2006-03-16 Wacker Chemie Ag Vernetzte und verzweigte Organopolysilane
US7485691B1 (en) 2004-10-08 2009-02-03 Kovio, Inc Polysilane compositions, methods for their synthesis and films formed therefrom
DE102004052423A1 (de) 2004-10-28 2006-05-04 Wacker Chemie Ag Verfahren zur Herstellung von vernetzten und verzweigten Organopolysilanen
JP5010127B2 (ja) * 2005-09-12 2012-08-29 大阪瓦斯株式会社 高屈折率ポリシラン
JP5888831B2 (ja) * 2005-10-05 2016-03-22 シン フィルム エレクトロニクス エーエスエー 架橋済みポリマー及びその製造方法
CN100345880C (zh) * 2005-10-31 2007-10-31 杭州师范学院 含稠环基聚硅烷制备方法
CN100402584C (zh) * 2005-10-31 2008-07-16 杭州师范学院 有机聚硅烷的制备方法
KR101308790B1 (ko) * 2005-12-07 2013-09-17 오사까 가스 가부시키가이샤 폴리실란 및 폴리실란을 함유하는 수지 조성물
JP2010506001A (ja) 2006-10-06 2010-02-25 コヴィオ インコーポレイテッド シリコンポリマー、シリコン化合物の重合方法、及びそのようなシリコンポリマーから薄膜を形成する方法
WO2008081883A1 (ja) 2006-12-28 2008-07-10 Dow Corning Toray Co., Ltd. 多孔性ケイ素含有炭素系複合材料並びにそれからなる電極及び電池
US8349217B2 (en) 2007-03-27 2013-01-08 Tokyo Institute Of Technology Method for producing positive electrode material for secondary battery
KR20100120166A (ko) * 2008-01-30 2010-11-12 다우 코닝 도레이 캄파니 리미티드 함규소 입자, 이의 제조 방법, 유기 중합체 조성물, 세라믹, 및 이의 제조 방법
KR20110008220A (ko) * 2008-04-30 2011-01-26 다우 코닝 도레이 캄파니 리미티드 규소-함유 입자, 이의 제조 방법, 오일 조성물, 세라믹 재료 및 이의 제조 방법
EP2135844A1 (de) * 2008-06-17 2009-12-23 Evonik Degussa GmbH Verfahren zur Herstellung höherer Hydridosilane
JP4702464B2 (ja) 2009-03-05 2011-06-15 富士ゼロックス株式会社 電気泳動表示用白色粒子、電気泳動表示媒体、及び電気泳動表示装置
JP5704610B2 (ja) 2009-05-22 2015-04-22 リンテック株式会社 成形体、その製造方法、電子デバイス用部材および電子デバイス
US20120121981A1 (en) 2009-07-31 2012-05-17 Yukinari Harimoto Electrode Active Material, Electrode, And Electricity Storage Device
EP2466670A1 (de) 2009-07-31 2012-06-20 Dow Corning Toray Co., Ltd. Elektrodenaktives material, elektrode und elektrizitätsspeichervorrichtung
JP2012178224A (ja) 2011-01-31 2012-09-13 Dow Corning Toray Co Ltd 表面炭素被覆ケイ素含有炭素系複合材料の製造方法
JP5658608B2 (ja) * 2011-04-18 2015-01-28 大阪瓦斯株式会社 ポリシランの精製方法
CN102250356B (zh) * 2011-06-20 2012-11-28 厦门大学 一种共聚硅烷及其制备方法
TWI552883B (zh) 2011-07-25 2016-10-11 Lintec Corp Gas barrier film laminates and electronic components
JP2013157221A (ja) 2012-01-30 2013-08-15 Dow Corning Toray Co Ltd ケイ素含有炭素系複合材料
TWI602855B (zh) * 2012-03-07 2017-10-21 日本曹達股份有限公司 聚二烷基矽烷之製造方法
CN104185877B (zh) 2012-03-22 2017-06-13 琳得科株式会社 透明导电性层叠体和电子设备或模块
US8865850B2 (en) 2012-06-14 2014-10-21 Dow Corning Corporation Method of selectively forming a reaction product in the presence of a metal silicide
JP7421186B2 (ja) * 2018-04-27 2024-01-24 東京応化工業株式会社 感エネルギー性組成物、硬化物、及びパターン形成方法
CN110931638A (zh) * 2019-11-07 2020-03-27 深圳市华星光电半导体显示技术有限公司 钙钛矿膜的制备方法及用于制备钙钛矿膜的组合物
JP2022075180A (ja) 2020-11-06 2022-05-18 東京応化工業株式会社 感エネルギー性組成物、硬化物、及び硬化物の形成方法
JP2022075182A (ja) 2020-11-06 2022-05-18 東京応化工業株式会社 感エネルギー性組成物、硬化物、及びパターン化された硬化物の形成方法
JP2023146618A (ja) 2022-03-29 2023-10-12 日産化学株式会社 ポリシラン化合物の金属除去方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04178430A (ja) * 1990-11-09 1992-06-25 Canon Inc ポリシラン化合物の新規な製造方法
JP2803360B2 (ja) * 1990-11-20 1998-09-24 信越化学工業株式会社 ポリシランの製造方法
JP3598388B2 (ja) * 1994-03-22 2004-12-08 大阪瓦斯株式会社 ポリシラン類の製造方法
JP3538686B2 (ja) * 1994-03-30 2004-06-14 大阪瓦斯株式会社 Ｓｉ−Ｓｉ結合を骨格とする網目状ポリマーを製造する方法
US5599892A (en) * 1994-10-07 1997-02-04 Shin-Etsu Chemical Co., Ltd. Preparation of polysilanes
US5905139A (en) * 1996-12-19 1999-05-18 Shin-Etsu Chemical Co., Ltd. Purification of polysilane

Also Published As

Publication number Publication date
KR100297007B1 (ko) 2001-09-22
CN1240459A (zh) 2000-01-05
DE69730738T2 (de) 2005-09-22
WO1998029476A1 (fr) 1998-07-09
EP0949289A4 (de) 2000-07-19
EP0949289A1 (de) 1999-10-13
US6174982B1 (en) 2001-01-16
EP0949289B1 (de) 2004-09-15
JP3496097B2 (ja) 2004-02-09
KR20000062347A (ko) 2000-10-25
CN1092215C (zh) 2002-10-09

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