DE69500375D1 - Quantenfadenvorrichtung und Herstellungsverfahren - Google Patents
Quantenfadenvorrichtung und HerstellungsverfahrenInfo
- Publication number
- DE69500375D1 DE69500375D1 DE69500375T DE69500375T DE69500375D1 DE 69500375 D1 DE69500375 D1 DE 69500375D1 DE 69500375 T DE69500375 T DE 69500375T DE 69500375 T DE69500375 T DE 69500375T DE 69500375 D1 DE69500375 D1 DE 69500375D1
- Authority
- DE
- Germany
- Prior art keywords
- manufacturing
- thread device
- quantum
- quantum thread
- thread
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000004519 manufacturing process Methods 0.000 title 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- H01L29/125—
-
- H01L29/127—
-
- H01L29/66469—
-
- H01L29/20—
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/962—Quantum dots and lines
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Semiconductor Lasers (AREA)
- Recrystallisation Techniques (AREA)
- Light Receiving Elements (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB9406488A GB2288274A (en) | 1994-03-31 | 1994-03-31 | Quantum device and method of making such a device |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69500375D1 true DE69500375D1 (de) | 1997-07-31 |
DE69500375T2 DE69500375T2 (de) | 1998-01-22 |
Family
ID=10752881
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69500375T Expired - Fee Related DE69500375T2 (de) | 1994-03-31 | 1995-03-16 | Quantenfadenvorrichtung und Herstellungsverfahren |
Country Status (5)
Country | Link |
---|---|
US (1) | US5571376A (de) |
EP (1) | EP0678946B1 (de) |
JP (1) | JP3575863B2 (de) |
DE (1) | DE69500375T2 (de) |
GB (1) | GB2288274A (de) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
ES2119697B1 (es) * | 1996-09-13 | 1999-04-16 | Infrarrojo Y Microelectronica | Fotosensor vectorial. |
JP2958442B2 (ja) * | 1996-09-18 | 1999-10-06 | 科学技術庁金属材料技術研究所長 | 半導体量子箱の形成方法 |
KR100234001B1 (ko) * | 1996-10-30 | 1999-12-15 | 박호군 | 양자세선 레이저 다이오드 제작방법 |
KR100238452B1 (ko) * | 1997-08-05 | 2000-01-15 | 정선종 | 초미세 구조 일괄 성장방법 |
GB2338592A (en) * | 1998-06-19 | 1999-12-22 | Secr Defence | Single electron transistor |
US6235638B1 (en) * | 1999-02-16 | 2001-05-22 | Micron Technology, Inc. | Simplified etching technique for producing multiple undercut profiles |
US6258286B1 (en) * | 1999-03-02 | 2001-07-10 | Eastman Kodak Company | Making ink jet nozzle plates using bore liners |
DE19958905C1 (de) * | 1999-12-07 | 2001-04-12 | Infineon Technologies Ag | Verfahren zur Herstellung einer Struktur in einem Substrat mittels einer Hartmaske |
US6653653B2 (en) * | 2001-07-13 | 2003-11-25 | Quantum Logic Devices, Inc. | Single-electron transistors and fabrication methods in which a projecting feature defines spacing between electrodes |
US20060009038A1 (en) | 2004-07-12 | 2006-01-12 | International Business Machines Corporation | Processing for overcoming extreme topography |
US20090242941A1 (en) | 2008-03-25 | 2009-10-01 | International Business Machines Corporation | Structure and method for manufacturing device with a v-shape channel nmosfet |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02238674A (ja) * | 1989-03-10 | 1990-09-20 | Fujitsu Ltd | 半導体装置及びその製造方法 |
FR2675634A1 (fr) * | 1991-04-16 | 1992-10-23 | France Telecom | Dispositif optoelectronique a tres faible capacite parasite. |
US5277755A (en) * | 1991-12-09 | 1994-01-11 | Xerox Corporation | Fabrication of three dimensional silicon devices by single side, two-step etching process |
-
1994
- 1994-03-31 GB GB9406488A patent/GB2288274A/en not_active Withdrawn
-
1995
- 1995-03-15 US US08/404,508 patent/US5571376A/en not_active Expired - Fee Related
- 1995-03-16 DE DE69500375T patent/DE69500375T2/de not_active Expired - Fee Related
- 1995-03-16 EP EP95301771A patent/EP0678946B1/de not_active Expired - Lifetime
- 1995-03-23 JP JP06459495A patent/JP3575863B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US5571376A (en) | 1996-11-05 |
DE69500375T2 (de) | 1998-01-22 |
JPH07321420A (ja) | 1995-12-08 |
EP0678946B1 (de) | 1997-06-25 |
JP3575863B2 (ja) | 2004-10-13 |
GB2288274A (en) | 1995-10-11 |
GB9406488D0 (en) | 1994-05-25 |
EP0678946A1 (de) | 1995-10-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |