DE68918149D1 - Vorrichtung und Verfahren zum Herstellen einer Vorrichtung. - Google Patents
Vorrichtung und Verfahren zum Herstellen einer Vorrichtung.Info
- Publication number
- DE68918149D1 DE68918149D1 DE68918149T DE68918149T DE68918149D1 DE 68918149 D1 DE68918149 D1 DE 68918149D1 DE 68918149 T DE68918149 T DE 68918149T DE 68918149 T DE68918149 T DE 68918149T DE 68918149 D1 DE68918149 D1 DE 68918149D1
- Authority
- DE
- Germany
- Prior art keywords
- manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
- H10N60/01—Manufacture or treatment
- H10N60/0268—Manufacture or treatment of devices comprising copper oxide
- H10N60/0744—Manufacture or deposition of electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
- H01L21/76886—Modifying permanently or temporarily the pattern or the conductivity of conductive members, e.g. formation of alloys, reduction of contact resistances
- H01L21/76891—Modifying permanently or temporarily the pattern or the conductivity of conductive members, e.g. formation of alloys, reduction of contact resistances by using superconducting materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
- H01L23/532—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body characterised by the materials
- H01L23/53204—Conductive materials
- H01L23/53285—Conductive materials containing superconducting materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/437—Superconductor materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/45—Ohmic electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/45—Ohmic electrodes
- H01L29/452—Ohmic electrodes on AIII-BV compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S505/00—Superconductor technology: apparatus, material, process
- Y10S505/70—High TC, above 30 k, superconducting device, article, or structured stock
- Y10S505/701—Coated or thin film device, i.e. active or passive
- Y10S505/702—Josephson junction present
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Ceramic Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Superconductor Devices And Manufacturing Methods Thereof (AREA)
- Superconductors And Manufacturing Methods Therefor (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Electrodes Of Semiconductors (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL8801032A NL8801032A (nl) | 1988-04-21 | 1988-04-21 | Inrichting en werkwijze voor het vervaardigen van een inrichting. |
Publications (2)
Publication Number | Publication Date |
---|---|
DE68918149D1 true DE68918149D1 (de) | 1994-10-20 |
DE68918149T2 DE68918149T2 (de) | 1995-04-06 |
Family
ID=19852173
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE68918149T Expired - Fee Related DE68918149T2 (de) | 1988-04-21 | 1989-04-17 | Vorrichtung und Verfahren zum Herstellen einer Vorrichtung. |
Country Status (6)
Country | Link |
---|---|
US (1) | US5104848A (de) |
EP (1) | EP0338631B1 (de) |
JP (1) | JPH0215682A (de) |
KR (1) | KR900017142A (de) |
DE (1) | DE68918149T2 (de) |
NL (1) | NL8801032A (de) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5084437A (en) * | 1990-02-28 | 1992-01-28 | Westinghouse Electric Corp. | Method for making high-current, ohmic contacts between semiconductors and oxide superconductors |
JPH0697522A (ja) * | 1990-11-30 | 1994-04-08 | Internatl Business Mach Corp <Ibm> | 超伝導材料の薄膜の製造方法 |
JPH06508481A (ja) * | 1991-06-24 | 1994-09-22 | フォルシュングスツェントルム・ユーリッヒ・ゲゼルシャフト・ミト・ベシュレンクテル・ハフツング | 配列化されたパターン導線とこの導線を製造する方法 |
US5356833A (en) * | 1993-04-05 | 1994-10-18 | Motorola, Inc. | Process for forming an intermetallic member on a semiconductor substrate |
DE19614458C2 (de) * | 1996-04-12 | 1998-10-29 | Grundfos As | Druck- oder Differenzdrucksensor und Verfahren zu seiner Herstellung |
KR100243286B1 (ko) * | 1997-03-05 | 2000-03-02 | 윤종용 | 반도체 장치의 제조방법 |
JP3097646B2 (ja) * | 1998-01-28 | 2000-10-10 | 日本電気株式会社 | 合金とその製造方法及びx線マスクとその製造方法及び半導体デバイスの製造方法 |
US6642567B1 (en) * | 2000-08-31 | 2003-11-04 | Micron Technology, Inc. | Devices containing zirconium-platinum-containing materials and methods for preparing such materials and devices |
US6794338B2 (en) | 2001-11-16 | 2004-09-21 | 3M Innovative Properties Company | Article with thermochemically stable, amorphous layer comprising tantalum or tantalum-containing material |
US6826207B2 (en) * | 2001-12-17 | 2004-11-30 | Peleton Photonic Systems Inc. | Multi-wavelength laser source based on two optical laser beat signal and method |
JP2004319411A (ja) * | 2003-04-21 | 2004-11-11 | Mitsubishi Materials Corp | マイクロマシンスイッチの接触電極用薄膜およびこの接触電極用薄膜を形成するためのスパッタリングターゲット |
US8161811B2 (en) * | 2009-12-18 | 2012-04-24 | Honeywell International Inc. | Flow sensors having nanoscale coating for corrosion resistance |
WO2013095523A1 (en) * | 2011-12-22 | 2013-06-27 | Intel Corporation | Cmos-compatible gold-free contacts |
US9741918B2 (en) | 2013-10-07 | 2017-08-22 | Hypres, Inc. | Method for increasing the integration level of superconducting electronics circuits, and a resulting circuit |
CN113122784A (zh) * | 2021-04-19 | 2021-07-16 | 西南大学 | 一种钼基块体非晶合金及其制备方法 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2086887A5 (de) * | 1970-04-13 | 1971-12-31 | Air Liquide | |
US4316200A (en) * | 1980-03-07 | 1982-02-16 | International Business Machines Corporation | Contact technique for electrical circuitry |
JPS5916430B2 (ja) * | 1980-10-31 | 1984-04-16 | 理化学研究所 | ジヨセフソン接合素子とその製造方法 |
JPS586188A (ja) * | 1981-07-02 | 1983-01-13 | Nec Corp | ジヨセフソン接合素子 |
US4454522A (en) * | 1981-11-05 | 1984-06-12 | The Board Of Trustees Of The Leland Stanford Junior University | Microbridge superconducting device having support with stepped parallel surfaces |
US4470190A (en) * | 1982-11-29 | 1984-09-11 | At&T Bell Laboratories | Josephson device fabrication method |
JPS60147179A (ja) * | 1984-01-11 | 1985-08-03 | Hitachi Ltd | 超電導多端子素子 |
JPS60169175A (ja) * | 1984-02-13 | 1985-09-02 | Rikagaku Kenkyusho | 弱結合ジョセフソン接合素子 |
JPS61102788A (ja) * | 1984-10-26 | 1986-05-21 | Agency Of Ind Science & Technol | サンドイツチ型ジヨセフソン接合装置 |
JPS62248272A (ja) * | 1986-04-21 | 1987-10-29 | Nippon Telegr & Teleph Corp <Ntt> | 超伝導マイクロブリツジ |
DE3810494C2 (de) * | 1987-03-27 | 1998-08-20 | Hitachi Ltd | Integrierte Halbleiterschaltungseinrichtung mit supraleitender Schicht |
US4837609A (en) * | 1987-09-09 | 1989-06-06 | American Telephone And Telegraph Company, At&T Bell Laboratories | Semiconductor devices having superconducting interconnects |
SG28390G (en) * | 1987-12-25 | 1995-09-01 | Sumitomo Electric Industries | A semiconductor substrate having a superconducting thin film |
-
1988
- 1988-04-21 NL NL8801032A patent/NL8801032A/nl not_active Application Discontinuation
-
1989
- 1989-04-14 US US07/338,922 patent/US5104848A/en not_active Expired - Fee Related
- 1989-04-17 EP EP89200961A patent/EP0338631B1/de not_active Expired - Lifetime
- 1989-04-17 DE DE68918149T patent/DE68918149T2/de not_active Expired - Fee Related
- 1989-04-19 JP JP1097664A patent/JPH0215682A/ja active Pending
- 1989-04-19 KR KR1019890005130A patent/KR900017142A/ko not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
NL8801032A (nl) | 1989-11-16 |
US5104848A (en) | 1992-04-14 |
KR900017142A (ko) | 1990-11-15 |
EP0338631A1 (de) | 1989-10-25 |
DE68918149T2 (de) | 1995-04-06 |
EP0338631B1 (de) | 1994-09-14 |
JPH0215682A (ja) | 1990-01-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE68911621D1 (de) | Verfahren zum Herstellen einer Einrichtung. | |
DE68917046D1 (de) | Verfahren und Vorrichtung zum automatischen Abfasen einer Halbleiterplatte. | |
DE3871721D1 (de) | Vorrichtung und verfahren zum nachweisen einer partiellen okklusion. | |
DE58906609D1 (de) | Verfahren und Vorrichtung zum Reinigen einer Sprühvorrichtung. | |
DE3888283D1 (de) | Verfahren und Vorrichtung zum Herstellen einer texturierten gelochten Folie. | |
DE69107009D1 (de) | Verfahren und Vorrichtung zum Herstellen einer wiederverschliessbaren Verpackung. | |
DE68917995D1 (de) | Verfahren zum Herstellen einer Halbleitervorrichtung. | |
DE68919549D1 (de) | Verfahren zum Herstellen einer Halbleiteranordnung. | |
DE68901201D1 (de) | Verfahren und vorrichtung zum desodorieren von toilettenraeumen. | |
DE68916616D1 (de) | Verfahren und Vorrichtung zum Gruppenlochen. | |
DE3765131D1 (de) | Formgepresster gegenstand mit einer mehrschichtstruktur sowie verfahren und vorrichtung zum herstellen desselben. | |
DE69016763D1 (de) | Verfahren und Vorrichtung zum Herstellen einer gürtelartigen Bahn. | |
DE3761542D1 (de) | Verfahren und vorrichtung zum steuern einer radaufhaengung. | |
DE3876019D1 (de) | Verfahren und vorrichtung zum herstellen von pyramidenstumpffoermiger dosenzargen. | |
DE68928295D1 (de) | Verfahren und vorrichtung zum antrieb einer hydraulischen vorrichtung | |
DE68920094D1 (de) | Verfahren zum Herstellen einer Halbleiteranordnung. | |
DE3871987D1 (de) | Verfahren und vorrichtung zum keimfreien fuellen einer verpackung. | |
DE69016818D1 (de) | Verfahren und Vorrichtung zum Aufwickeln. | |
DE68918149D1 (de) | Vorrichtung und Verfahren zum Herstellen einer Vorrichtung. | |
DE3784605D1 (de) | Verfahren zum herstellen einer halbleitervorrichtung und halbleitervorrichtung. | |
DE58901200D1 (de) | Verfahren und vorrichtung zum oszillieren einer stahlstranggiesskokille. | |
DE3771416D1 (de) | Verfahren und vorrichtung zum mikroloeten. | |
DE69204853D1 (de) | Verfahren und vorrichtung zum kontrollieren der merkmale einer nockenwelle. | |
DE69106344D1 (de) | Verfahren und vorrichtung zum palettisieren. | |
DE3776821D1 (de) | Vorrichtung und verfahren zum beschichten. |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8327 | Change in the person/name/address of the patent owner |
Owner name: PHILIPS ELECTRONICS N.V., EINDHOVEN, NL |
|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |