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DE60336095D1 - Method for producing a porous SiOCH layer - Google Patents

Method for producing a porous SiOCH layer

Info

Publication number
DE60336095D1
DE60336095D1 DE60336095T DE60336095T DE60336095D1 DE 60336095 D1 DE60336095 D1 DE 60336095D1 DE 60336095 T DE60336095 T DE 60336095T DE 60336095 T DE60336095 T DE 60336095T DE 60336095 D1 DE60336095 D1 DE 60336095D1
Authority
DE
Germany
Prior art keywords
producing
porous sioch
sioch layer
porous
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60336095T
Other languages
German (de)
Inventor
Raymond Nicholas Vrtis
Mark Leonard O'neill
Jean Louise Vincent
Aaron Scott Lukas
Manchao Xiao
John Anthony Thomas Norman
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Air Products and Chemicals Inc
Original Assignee
Air Products and Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US10/150,798 external-priority patent/US6846515B2/en
Priority claimed from US10/409,468 external-priority patent/US7384471B2/en
Application filed by Air Products and Chemicals Inc filed Critical Air Products and Chemicals Inc
Application granted granted Critical
Publication of DE60336095D1 publication Critical patent/DE60336095D1/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
DE60336095T 2002-04-17 2003-04-16 Method for producing a porous SiOCH layer Expired - Lifetime DE60336095D1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US37310402P 2002-04-17 2002-04-17
US10/150,798 US6846515B2 (en) 2002-04-17 2002-05-17 Methods for using porogens and/or porogenated precursors to provide porous organosilica glass films with low dielectric constants
US10/409,468 US7384471B2 (en) 2002-04-17 2003-04-07 Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants

Publications (1)

Publication Number Publication Date
DE60336095D1 true DE60336095D1 (en) 2011-04-07

Family

ID=29218325

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60336095T Expired - Lifetime DE60336095D1 (en) 2002-04-17 2003-04-16 Method for producing a porous SiOCH layer

Country Status (1)

Country Link
DE (1) DE60336095D1 (en)

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