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DE60327836D1 - PVD-Vorrichtung und Verfahren - Google Patents

PVD-Vorrichtung und Verfahren

Info

Publication number
DE60327836D1
DE60327836D1 DE60327836T DE60327836T DE60327836D1 DE 60327836 D1 DE60327836 D1 DE 60327836D1 DE 60327836 T DE60327836 T DE 60327836T DE 60327836 T DE60327836 T DE 60327836T DE 60327836 D1 DE60327836 D1 DE 60327836D1
Authority
DE
Germany
Prior art keywords
pvd device
pvd
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60327836T
Other languages
English (en)
Inventor
Ramgopal Darolia
Reed Roeder Corderman
Joseph David Rigney
Richard Arthur Nardil Jr
Michael James Weimer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
General Electric Co
Original Assignee
General Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Electric Co filed Critical General Electric Co
Application granted granted Critical
Publication of DE60327836D1 publication Critical patent/DE60327836D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/548—Controlling the composition

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physical Vapour Deposition (AREA)
DE60327836T 2003-02-07 2003-02-07 PVD-Vorrichtung und Verfahren Expired - Lifetime DE60327836D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP20030250791 EP1445344B1 (de) 2003-02-07 2003-02-07 PVD-Vorrichtung und Verfahren

Publications (1)

Publication Number Publication Date
DE60327836D1 true DE60327836D1 (de) 2009-07-16

Family

ID=32605419

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60327836T Expired - Lifetime DE60327836D1 (de) 2003-02-07 2003-02-07 PVD-Vorrichtung und Verfahren

Country Status (2)

Country Link
EP (1) EP1445344B1 (de)
DE (1) DE60327836D1 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070160775A1 (en) * 2006-01-10 2007-07-12 General Electric Company Physical vapor deposition process and apparatus therefor
DE102006025243A1 (de) 2006-05-29 2007-12-06 Rheinmetall Waffe Munition Gmbh Schutzschicht für Teile insbesondere einer Waffe, einer Lafette, eines Turmes oder dergleichen, insbesondere als Korrosionsschutz dieser Teile
DE102006025244A1 (de) 2006-05-29 2007-12-06 Rheinmetall Waffe Munition Gmbh Schutzschicht für Bauteile einer Waffe oder dergleichen
EP2025773A1 (de) * 2007-07-19 2009-02-18 Applied Materials, Inc. Vakuumverdampfungsvorrichtung für Feststoffe
JP5630165B2 (ja) * 2010-09-09 2014-11-26 国立大学法人金沢大学 スポレーション評価システムおよび画像処理プログラム、並びに消弧装置
DE102013108997A1 (de) * 2013-08-20 2015-02-26 Von Ardenne Gmbh Tiegelanordnung und Vakuumbeschichtungsanlage
RU2553148C1 (ru) * 2013-11-28 2015-06-10 Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Алтайский государственный университет" Способ получения монофазной интерметаллической тонкой пленки
RU2566129C1 (ru) * 2014-03-26 2015-10-20 Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Алтайский государственный университет" Способ получения тонкой нанокристаллической интерметаллической пленки на стеклянной подложке
CN108757742A (zh) * 2018-08-06 2018-11-06 哈尔滨轴承集团公司 一种改进中小型轴承无划痕支点的方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4403002A (en) * 1979-12-10 1983-09-06 Fuji Photo Film Co., Ltd. Vacuum evaporating apparatus
US5296274A (en) * 1989-05-10 1994-03-22 Movchan Boris A Method of producing carbon-containing materials by electron beam vacuum evaporation of graphite and subsequent condensation
JPH05156438A (ja) * 1991-12-09 1993-06-22 Nikon Corp 真空蒸着装置
JPH06322521A (ja) * 1993-05-13 1994-11-22 Toyobo Co Ltd 連続蒸着方法およびその装置
US6145470A (en) * 1998-12-11 2000-11-14 General Electric Company Apparatus for electron beam physical vapor deposition

Also Published As

Publication number Publication date
EP1445344B1 (de) 2009-06-03
EP1445344A1 (de) 2004-08-11

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition