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DE60215852D1 - Defekt-pixel-kompensationsverfahren - Google Patents

Defekt-pixel-kompensationsverfahren

Info

Publication number
DE60215852D1
DE60215852D1 DE60215852T DE60215852T DE60215852D1 DE 60215852 D1 DE60215852 D1 DE 60215852D1 DE 60215852 T DE60215852 T DE 60215852T DE 60215852 T DE60215852 T DE 60215852T DE 60215852 D1 DE60215852 D1 DE 60215852D1
Authority
DE
Germany
Prior art keywords
slm
defective pixel
compensation method
pixel compensation
work piece
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60215852T
Other languages
English (en)
Other versions
DE60215852T2 (de
Inventor
Torbjoern Sandstroem
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Micronic Laser Systems AB
Original Assignee
Micronic Laser Systems AB
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Micronic Laser Systems AB filed Critical Micronic Laser Systems AB
Publication of DE60215852D1 publication Critical patent/DE60215852D1/de
Application granted granted Critical
Publication of DE60215852T2 publication Critical patent/DE60215852T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)
  • Color Television Image Signal Generators (AREA)
  • Liquid Crystal (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
DE60215852T 2001-11-28 2002-11-26 Defekt-pixel-kompensationsverfahren Expired - Lifetime DE60215852T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US995526 2001-11-28
US09/995,526 US6618185B2 (en) 2001-11-28 2001-11-28 Defective pixel compensation method
PCT/SE2002/002169 WO2003046665A1 (en) 2001-11-28 2002-11-26 Defective pixel compensation method

Publications (2)

Publication Number Publication Date
DE60215852D1 true DE60215852D1 (de) 2006-12-14
DE60215852T2 DE60215852T2 (de) 2007-09-06

Family

ID=25541923

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60215852T Expired - Lifetime DE60215852T2 (de) 2001-11-28 2002-11-26 Defekt-pixel-kompensationsverfahren

Country Status (9)

Country Link
US (2) US6618185B2 (de)
EP (1) EP1449033B1 (de)
JP (1) JP2005510862A (de)
KR (1) KR100919911B1 (de)
CN (1) CN1277154C (de)
AT (1) ATE344474T1 (de)
AU (1) AU2002356477A1 (de)
DE (1) DE60215852T2 (de)
WO (1) WO2003046665A1 (de)

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EP1449033B1 (de) 2006-11-02
CN1596388A (zh) 2005-03-16
US6618185B2 (en) 2003-09-09
CN1277154C (zh) 2006-09-27
JP2005510862A (ja) 2005-04-21
US20030099026A1 (en) 2003-05-29
KR20040064719A (ko) 2004-07-19
US20040047023A1 (en) 2004-03-11
ATE344474T1 (de) 2006-11-15
EP1449033A1 (de) 2004-08-25
WO2003046665A1 (en) 2003-06-05
KR100919911B1 (ko) 2009-10-06
DE60215852T2 (de) 2007-09-06
AU2002356477A1 (en) 2003-06-10

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