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DE602008001436D1 - Positiv wirkende strahlungsempfindliche zusammensetzungen und elemente - Google Patents

Positiv wirkende strahlungsempfindliche zusammensetzungen und elemente

Info

Publication number
DE602008001436D1
DE602008001436D1 DE602008001436T DE602008001436T DE602008001436D1 DE 602008001436 D1 DE602008001436 D1 DE 602008001436D1 DE 602008001436 T DE602008001436 T DE 602008001436T DE 602008001436 T DE602008001436 T DE 602008001436T DE 602008001436 D1 DE602008001436 D1 DE 602008001436D1
Authority
DE
Germany
Prior art keywords
radiation
compositions
sensitive
elements
sensitive compositions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602008001436T
Other languages
English (en)
Inventor
Moshe Levanon
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Publication of DE602008001436D1 publication Critical patent/DE602008001436D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/36—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using a polymeric layer, which may be particulate and which is deformed or structurally changed with modification of its' properties, e.g. of its' optical hydrophobic-hydrophilic, solubility or permeability properties
    • B41M5/368—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using a polymeric layer, which may be particulate and which is deformed or structurally changed with modification of its' properties, e.g. of its' optical hydrophobic-hydrophilic, solubility or permeability properties involving the creation of a soluble/insoluble or hydrophilic/hydrophobic permeability pattern; Peel development
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/02—Positive working, i.e. the exposed (imaged) areas are removed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/06—Developable by an alkaline solution
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/26—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds
    • B41C2210/262—Phenolic condensation polymers, e.g. novolacs, resols

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Thermal Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Light Receiving Elements (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Printing Plates And Materials Therefor (AREA)
DE602008001436T 2007-02-28 2008-02-13 Positiv wirkende strahlungsempfindliche zusammensetzungen und elemente Active DE602008001436D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/679,962 US7399576B1 (en) 2007-02-28 2007-02-28 Positive-working radiation-sensitive composition and elements
PCT/US2008/001878 WO2008106010A1 (en) 2007-02-28 2008-02-13 Positive-working radiation-sensitive compositions and elements

Publications (1)

Publication Number Publication Date
DE602008001436D1 true DE602008001436D1 (de) 2010-07-15

Family

ID=39469304

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602008001436T Active DE602008001436D1 (de) 2007-02-28 2008-02-13 Positiv wirkende strahlungsempfindliche zusammensetzungen und elemente

Country Status (7)

Country Link
US (1) US7399576B1 (de)
EP (1) EP2114676B1 (de)
JP (1) JP5134015B2 (de)
CN (1) CN101622130B (de)
AT (1) ATE469761T1 (de)
DE (1) DE602008001436D1 (de)
WO (1) WO2008106010A1 (de)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7649030B2 (en) * 2007-01-25 2010-01-19 Hewlett-Packard Development Company, L.P. Polyurethane with fluoro-diols suitable for ink-jet printing
EP2047988B1 (de) * 2007-10-09 2014-03-12 Agfa Graphics N.V. Lithographiedruckplattenvorläufer
US8198011B2 (en) * 2008-02-04 2012-06-12 Eastman Kodak Company Method of imaging and developing positive-working imageable elements
EP2347321B1 (de) 2008-09-25 2013-09-18 Movea S.A Befehl durch gestikschnittstelle
US20100227269A1 (en) 2009-03-04 2010-09-09 Simpson Christopher D Imageable elements with colorants
US8383319B2 (en) 2009-08-25 2013-02-26 Eastman Kodak Company Lithographic printing plate precursors and stacks
US8298750B2 (en) * 2009-09-08 2012-10-30 Eastman Kodak Company Positive-working radiation-sensitive imageable elements
US8936899B2 (en) 2012-09-04 2015-01-20 Eastman Kodak Company Positive-working lithographic printing plate precursors and use
EP2316645B1 (de) 2009-10-27 2012-05-02 AGFA Graphics NV Neuartige Cyaninfarbstoffe und lithografische Druckerplattenvorläufer mit den Farbstoffen
ES2395993T3 (es) * 2010-03-19 2013-02-18 Agfa Graphics N.V. Precursor de plancha de impresión litográfica
US8530143B2 (en) 2010-11-18 2013-09-10 Eastman Kodak Company Silicate-free developer compositions
US8939080B2 (en) 2010-11-18 2015-01-27 Eastman Kodak Company Methods of processing using silicate-free developer compositions
US20120129093A1 (en) 2010-11-18 2012-05-24 Moshe Levanon Silicate-free developer compositions
US20120189770A1 (en) * 2011-01-20 2012-07-26 Moshe Nakash Preparing lithographic printing plates by ablation imaging
JP5466720B2 (ja) * 2011-03-31 2014-04-09 富士フイルム株式会社 平版印刷版原版及びその作製方法
US8632940B2 (en) 2011-04-19 2014-01-21 Eastman Kodak Company Aluminum substrates and lithographic printing plate precursors
US8722308B2 (en) 2011-08-31 2014-05-13 Eastman Kodak Company Aluminum substrates and lithographic printing plate precursors
JP5866179B2 (ja) * 2011-11-10 2016-02-17 イーストマン コダック カンパニー 平版印刷版前駆体及び平版印刷版の作製方法
US8647811B2 (en) 2012-01-12 2014-02-11 Eastman Kodak Company Positive-working lithographic printing plate precursors
US20130255515A1 (en) 2012-03-27 2013-10-03 Celin Savariar-Hauck Positive-working lithographic printing plate precursors
TWI495956B (zh) * 2014-01-28 2015-08-11 Daxin Materials Corp 感光性樹脂組合物、電子元件及其製造方法
US9229325B2 (en) 2014-02-25 2016-01-05 Eastman Kodak Company Method for making lithographic printing plates
WO2017032437A1 (en) * 2015-08-21 2017-03-02 Merck Patent Gmbh Patterned bank structures on substrates and formation method
US9588429B1 (en) 2015-09-03 2017-03-07 Eastman Kodak Company Lithographic developer composition and method of use

Family Cites Families (19)

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Publication number Priority date Publication date Assignee Title
JPS5560944A (en) * 1978-10-31 1980-05-08 Fuji Photo Film Co Ltd Image forming method
IT1169682B (it) * 1983-11-08 1987-06-03 I M G Ind Materiali Grafici Sp Composizione per fotoriproduzioni
US6255033B1 (en) 1999-07-30 2001-07-03 Creo, Ltd. Positive acting photoresist compositions and imageable element
CN1209392C (zh) 2001-05-14 2005-07-06 阿姆诺洼化学有限公司 由含侧氟碳基的环状单体得到的聚合物表面活性剂
WO2004081662A2 (en) 2003-03-14 2004-09-23 Creo Inc. Development enhancement of radiation-sensitive elements
US7282324B2 (en) * 2004-01-05 2007-10-16 Microchem Corp. Photoresist compositions, hardened forms thereof, hardened patterns thereof and metal patterns formed using them
TWI371657B (en) 2004-02-20 2012-09-01 Fujifilm Corp Positive resist composition for immersion exposure and method of pattern formation with the same
JP4391285B2 (ja) * 2004-03-26 2009-12-24 富士フイルム株式会社 感光性平版印刷版
JP2005275231A (ja) * 2004-03-26 2005-10-06 Fuji Photo Film Co Ltd 感光性平版印刷版
US7314691B2 (en) * 2004-04-08 2008-01-01 Samsung Electronics Co., Ltd. Mask pattern for semiconductor device fabrication, method of forming the same, method for preparing coating composition for fine pattern formation, and method of fabricating semiconductor device
US7449280B2 (en) * 2004-05-26 2008-11-11 Microchem Corp. Photoimageable coating composition and composite article thereof
US7279263B2 (en) * 2004-06-24 2007-10-09 Kodak Graphic Communications Canada Company Dual-wavelength positive-working radiation-sensitive elements
JP2006018203A (ja) * 2004-07-05 2006-01-19 Fuji Photo Film Co Ltd 平版印刷版原版
EP1621927B1 (de) 2004-07-07 2018-05-23 FUJIFILM Corporation Positiv arbeitende Resistzusammensetzung für einen Flüssigkeitseintauchbelichtungsprozess und Verfahren zur Herstellung von Mustern unter Verwendung dieser Zusammensetzung
JP4448767B2 (ja) 2004-10-08 2010-04-14 富士フイルム株式会社 ポジ型レジスト組成物及びそれを用いたパターン形成方法
US7947421B2 (en) 2005-01-24 2011-05-24 Fujifilm Corporation Positive resist composition for immersion exposure and pattern-forming method using the same
JP4511383B2 (ja) 2005-02-23 2010-07-28 富士フイルム株式会社 ポジ型レジスト組成物及びそれを用いたパターン形成方法
US8741537B2 (en) 2005-03-04 2014-06-03 Fujifilm Corporation Positive resist composition and pattern-forming method using the same
US20060257785A1 (en) * 2005-05-13 2006-11-16 Johnson Donald W Method of forming a photoresist element

Also Published As

Publication number Publication date
EP2114676B1 (de) 2010-06-02
JP5134015B2 (ja) 2013-01-30
US7399576B1 (en) 2008-07-15
CN101622130B (zh) 2011-08-03
JP2010520495A (ja) 2010-06-10
EP2114676A1 (de) 2009-11-11
CN101622130A (zh) 2010-01-06
WO2008106010A1 (en) 2008-09-04
ATE469761T1 (de) 2010-06-15

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